CN111243985A - 用于处理衬底的衬底处理设备 - Google Patents
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Abstract
本公开涉及衬底处理设备,所述衬底处理设备具有第一反应器和第二反应器,每个反应器配置有升降机以将具有衬底的舟皿转移到所述反应器。所述设备具有舟皿转移装置以在衬底装载站、第一升降机和/或第二升降机与冷却站之间转移所述具有衬底的舟皿。所述衬底装载站和所述冷却站可布置在所述第一升降机和所述第二升降机的相对侧上。
Description
技术领域
本公开大体上涉及一种用于处理多个衬底的衬底处理设备。更具体地说,本公开涉及衬底处理设备,所述衬底处理设备包括用于处理舟皿中的多个衬底的第一反应器和第二反应器。所述设备可具有第一升降机和第二升降机,以分别向和从第一反应器和第二反应器转移具有衬底的舟皿。所述设备可具有衬底处置机器人,所述衬底处置机器人被构造且布置成在舟皿与衬底匣盒之间转移衬底。
背景技术
容纳多个衬底的匣盒可通过匣盒处置器在衬底处理设备中转移,所述匣盒处置器可在匣盒出入端口、匣盒站和/或存储装置之间转移匣盒。存储装置可包括匣盒存储回转料架,用于存储多个匣盒。衬底处置机器人可被构造且布置成将衬底从匣盒站处的匣盒转移到衬底舟皿,以用多个衬底填充舟皿。
为提高生产率,所述衬底处理设备可设有第一反应器和第二反应器。第一升降机或第二升降机可分别将填充的舟皿移动到第一反应器或第二反应器中以处理衬底。在反应器中处理后,舟皿可用相应的升降机降低并冷却。冷却后,已处理衬底可用衬底处置机器人从舟皿转移到匣盒。
由于在衬底处理设备可能位于的洁净室制造场所中存在有限空间,所以可能有益的是将衬底处理设备的宽度设计得尽可能小。衬底处理设备的有限宽度可使得有可能将更多的处理设备并排堆叠,在一排中紧靠彼此。
发明内容
提供本概述是为了以简化的形式引入一系列概念。下文在实例实施例的详细描述中更详细地描述这些概念。本概述不打算标识所要求保护的主题的关键特征或必要特征,也不打算用于限制所要求保护的主题的范围。
根据目标,可能需要提供具有有限宽度的衬底处理设备。
因此,可提供衬底处理设备,所述衬底处理设备包括用于处理舟皿中的多个衬底的第一反应器和第二反应器。所述设备可具有第一升降机和第二升降机,以分别向和从第一反应器和第二反应器转移具有衬底的舟皿。所述设备可具有衬底处置机器人,所述衬底处置机器人被构造且布置成在舟皿与衬底匣盒之间转移衬底。所述设备可包括舟皿转移装置以舟皿转移装置以用于在以下各项之间转移具有衬底的舟皿:衬底装载站,在此处可将衬底用衬底处置机器人转移到舟皿;所述第一升降机和/或所述第二升降机;以及冷却站,其被构造且布置成冷却具有已处理衬底的舟皿。所述设备可在所述第一升降机和所述第二升降机的相对侧上构造且布置有所述衬底装载站和所述冷却站。
在衬底装载站和冷却站位于第一升降机和第二升降机的相对侧上的情况下,冷却站可能不会增加设备的宽度。有限的宽度可使得有可能并排堆叠更多处理设备,在洁净室制造场所中在一排内紧靠彼此。
出于概述本发明和优于现有技术而实现的优势的目的,上文中描述了本发明的某些目标和优势。当然,应当理解,未必所有这些目的或优点都可根据本发明的任何特定实施例来实现。因此,例如,所属领域的技术人员将认识到,本发明可按实现或优化如本文中所教示或建议的一种优势或一组优势但不一定实现如本文中可能教示或建议的其它目的或优势的方式来实施或进行。
所有这些实施例都旨在落入本文中所公开的本发明的范围内。对于所属领域的技术人员来说,这些和其它实施例将从参考附图的某些实施例的以下详细描述变得显而易见,本发明不限于所公开的任何特定实施例。
附图说明
虽然本说明书以具体地指出并明确地要求保护被视为本发明实施例的内容的权利要求书结束,但在结合附图阅读时,可根据本公开的实施例的某些实例的描述更容易地确定本公开的实施例的优势,在附图中:
图1A示出根据实施例的炉的实例的示意性俯视图。
图1B示出图1A的一部分的放大。
图1C示出图1A的实施例的一部分的侧视图。
图2示出根据另一实施例的炉的实例的示意性俯视图。
具体实施方式
尽管下文公开了某些实施例和实例,但所属领域的技术人员将理解,本发明延伸超出了本发明具体公开的实施例和/或用途以及显而易见的修改和其等效物。因此,希望本发明所公开的范围不应受下文所描述特定公开实施例的限制。本文中呈现的图解不打算作为任何特定材料、结构或装置的实际视图,而仅仅是用以描述本公开的实施例的理想化图示。
如本文所使用,术语“衬底”或“晶片”可指可使用的或上面可形成装置、电路或膜的任何一种或多种下层材料。术语“半导体装置结构”可指代经过处理或经过部分处理的半导体结构的任何部分,其包含或限定待形成于半导体衬底上或半导体衬底中的半导体装置的有源或无源部件的至少一部分。
图1A到1C示出例如根据实施例的炉1的衬底处理设备的实例。炉1可包括具有由两个侧壁5(见图1A)连接的前壁4和后壁6的外壳2。
炉1可包括存储装置(未示出),例如用于存储多个晶片匣盒C的匣盒存储回转料架,所述晶片匣盒各自容纳多个衬底。匣盒存储回转料架可包括多个用于支撑匣盒的平台级。平台级可连接到安装成可围绕竖直轴线旋转的中心支撑件。每个平台级被配置成容纳数个匣盒C。驱动组件可以可操作地连接到中心支撑件,以使中心支撑件随数个平台级一起围绕竖直轴线旋转。
炉1可具有具有匣盒处置器臂9的匣盒处置器7,所述匣盒处置器臂被配置成在匣盒存储回转料架、邻近于炉1的外壳2的前壁4的匣盒出入端口11和/或匣盒站15之间转移匣盒C。匣盒处置器7可包括升降机构,用于到达不同高度处的匣盒。用于存储匣盒的每个平台级都可在其中具有切口,切口被设定大小和形状以允许匣盒处置器臂9竖直地穿过其中,且允许平台级在其上支撑匣盒C。
可设置分离匣盒处置器7与衬底处置机器人35的内壁19。壁可具有邻近于匣盒站15的可闭合衬底接取开口33,所述开口可被构造且布置成还打开匣盒C。关于用于打开匣盒的可闭合衬底接取开口33的更多信息可从以引用的方式并入本文中的美国专利第6,481,945号中获得。匣盒站15可设有匣盒转盘16以使匣盒C转动和/或将其压靠到可闭合衬底接取开口33。
衬底处理设备可包括设有衬底处置臂36以转移衬底的衬底处置机器人35。衬底可从位于匣盒站15上的匣盒C通过可闭合衬底接取开口33传递到衬底装载站38处的衬底舟皿B,且反之亦然。炉可包括衬底处置腔室37,其中容纳衬底处置机器人35。
炉1可设有第一反应器和第二反应器45以用于处理多个衬底。使用两个反应器可提高炉1的生产率。
外壳2可具有在炉1的全长上延伸的第一和第二侧壁5。炉的侧壁5之间的可限定设备的宽度的距离可在1.3米与2米之间,优选在1.5米与1.8米之间,且最优选在1.6米与1.7米之间,例如约为1.65米。炉1的维护可从炉的后侧6或前侧4执行,使得可能无需在侧壁5中设置门。因此,侧壁5可构造成没有进行维护的主门。因此,多个炉1可并排定位在半导体制造工厂的洁净室中。相邻炉的侧壁5可因此定位地非常接近,或甚至压靠彼此。
有利地,多个炉的前侧4可形成壁,在对粒子具有极严格要求的所谓“洁净室”的非常洁净环境中,所述壁可与匣盒输送装置介接。相邻炉的背侧6可与维护通道(较之于前侧4对粒子具有较不严格的要求)介接。维护通道可用于从炉1的背侧进行维护。
图1B示出图1A的一部分的细节的俯视图,且图1C示出图1B的一部分的侧视图。图1B和1C示出第一反应器和第二反应器45可分别设有第一升降机和第二升降机46。反应器45和升降机46可设置于处理模块49中。升降机可被构造且布置成在处理模块49的下部区域53与反应器45之间转移具有多个衬底的舟皿。每个升降机46可包括舟皿支撑臂48,所述舟皿支撑臂具有被配置成用作舟皿支撑件的支承表面且可在竖直方向上移动。
可在衬底处置器35与处理模块49的下部区域之间设置闸阀63,从而在下部区域中形成微环境。衬底装载站38可构造且布置有舟皿支撑件54,以在处理模块中支撑具有衬底的舟皿B。被构造且布置有舟皿支撑件54以支撑具有衬底的舟皿以冷却具有已处理衬底的舟皿的冷却站47也可设置在处理模块49中。舟皿支撑件54可被构造且布置成在水平平面中静止。
可设置舟皿转移装置50以在第一升降机和第二升降机46、衬底装载站38与冷却站47之间转移具有衬底的舟皿。舟皿转移装置50可被构造且布置成在保持舟皿B竖直的同时在下部区域内的多个舟皿位置之间转移舟皿B。转移可为基本上水平的。
舟皿转移装置50可包括两个舟皿转移机器人,每个反应器45有一个。每个舟皿转移机器人可设有两个舟皿转移臂51。舟皿转移臂51可以是可旋转的,以在衬底装载站38、升降机46和/或冷却站47之间水平地转移舟皿。衬底装载站38、升降机46或冷却站47可竖直地移动例如几厘米的短距离,以拾取舟皿或将舟皿从舟皿转移臂51放下到固持器处。衬底装载站38和冷却站47的舟皿支撑件54可设有可移动顶部表面52以拾取舟皿或放下舟皿B。舟皿转移臂51可设有固持器以固持舟皿。舟皿B可由固持器固持为竖直。在舟皿B下方,可设置反应器门55,当舟皿B被移动到反应器45中时,所述反应器门配合在反应器开口56中。例如2、3或4个舟皿B的多个舟皿可在炉1中同时使用。
或者,舟皿转移臂51可竖直地移动例如几厘米的短距离,以拾取舟皿或将舟皿放在衬底装载站38、升降机46或冷却站47处。
或者,舟皿转移装置50可包括三个或四个用于舟皿的固持器。通过每反应器使用超过两个固持器,有可能将舟皿保持在衬底装载站38和冷却站47的固持器上,使得可能不需要舟皿支撑件。
或者,舟皿转移臂51可被构造且布置成将舟皿在衬底装载站38、升降机46与冷却站47之间水平地移位。舟皿转移臂51的固持器可具有U形以固持舟皿。关于被构造且布置成使舟皿移位的舟皿传递臂的更多信息可从以引用方式并入本文的美国专利第7,198,447号中获得。
衬底装载站38和冷却站47可被构造且布置在第一升降机和第二升降机46的相对侧上以保持炉1的宽度有限。例如,衬底装载站38可被构造且布置在第一升降机和第二升降机46前方,且冷却站47可被构造且布置在第一升降机和第二升降机46后方以保持炉1的宽度有限。
冷却站47可用于冷却具有刚刚处理的热衬底的舟皿。冷却站47可设有气体提取器60,所述气体提取器被构造且布置成提取热气体以冷却衬底。冷却站47可设有气体入口58以向冷却站47提供气体。所述设备可包括两个冷却站47。气体入口58和气体提取器60可流体地连接到泵以在冷却站处在衬底上产生气流。可设置热交换器以冷却气流且加速冷却容纳区中的衬底的冷却。气体入口58和气体提取器60可被构造且布置成产生水平气流以冷却衬底。或者,气体入口58和气体提取器60可被构造且布置成产生通过微环境的向下气流以减少颗粒污染。
俯视图中的衬底处理设备可配置成大体U形(见图1A)。舟皿转移装置50和反应器45可被构造且布置在U形的底部部分中。维护区域43可被构造且布置在U形的支腿之间。两个U形的支腿之间的距离可在60与120cm之间,更优选地在80与100cm之间且最优选地约为90cm,以允许维护工人的足够空间。后门可设置在U形的支腿之间以在不使用时闭合维护区域43。大体U形也可包含V形。
所述设备可被构造且布置成允许从维护区域43维护反应器45,通过维护工人维护第一反应器和第二反应器两者。例如,由维护工人对加热线、加热传感器及/或反应器45的处理气体接口(出口和/或入口)进行维护。两个反应器45可邻近于同一维护区域43构造且布置,以允许从同一维护区域43维护两个反应器45。可设置维护门41以允许维护。维护门可设置在冷却站后方,以允许从工具背面进行维护。
因此,维护工人可能无需进入炉1的外壳2以对反应器45进行维护作业。因此,可最小化维护工人受伤和/或下部区域和/或反应器45被污染的风险。在外壳外部进行维护还可提高维护的速度和/或准确性。由于同一维护区域43用于两个反应器45,因此可减小包含维护区域43的炉1的总占用面积。
处理模块49可设有维护门41,所述维护门可在维护区域43的方向上打开。两个处理模块49可设有单独维护门41以允许维护工人从同一维护区域43维护每个反应器45。处理模块49的维护门41还可允许从同一维护区域43维护炉的下部区域,以维护舟皿转移装置50、冷却站47、气体入口58、气体提取器60、闸阀63、升降机46、衬底装载站38和/或舟皿B。
或者,每处理模块29可设置两个维护门:用于接取反应器45的顶部维护门,以及用于接取炉1的下部区域53的底部维护门。
闸阀63可设置在衬底处置腔室37与处理模块49之间。闸阀63可在维护期间向衬底处置机器人35闭合,使得在经由另一处理模块维护衬底处置机器人35的同时,两个处理模块中的一个可继续工作。
对反应器45中的一个的维护可不干扰反应器45中的另一个,因为两者被构造为单独单元。闸阀63可在一个反应器的维护期间闭合,使得另一反应器和衬底处置机器人35可继续工作。
反应器45可具有处理气体接口(出口和/或入口),其可连接到气体排放管或处理气体递送系统。处理气体接口可邻近于维护区域43而设置,以便使得它们在维护期间易于接取。
处理气体递送系统可设置(部分地)在被构造且布置成将处理气体提供至第一和/或第二反应器45的气体柜67中。气体柜可设置在U形的支腿的顶部附近。将气体柜设置在U形的顶部附近使得易于接近以进行维护。此外,如果气体柜需要被调整或放大,那么这种位置提供灵活性,因为在设备的背侧存在空间,其中不存在如衬底处置机器人或匣盒处置器等关键部件。
气体排放管可被构造且布置成从第一反应器和第二反应器中的至少一个移除处理气体,且还可设置在U形的支腿的顶部附近。在U形的支腿中提供气体排放管使得易于接近以进行维护。气体排放管可设有可能需要定期维护的泵和洗涤器。此外,如果气体排放管需要被调整或延伸,那么这种位置提供了灵活性,因为在设备的背侧存在空间,其中不存在例如衬底处置机器人和/或匣盒处置器等关键部件。
容纳衬底处置机器人35的衬底处置腔室37可为微环境闭合体。衬底处置腔室37可设有气体入口39和气体提取器41,所述气体入口和气体提取器可流体连接到泵以提供通过衬底处置腔室37的气流。气体入口39和气体提取器41可被构造且布置成在衬底处置腔室37中形成水平气流。
或者,气体入口39可设置在气体提取器41下方以在衬底处置腔室37中产生(部分)向下流动。向下流动可为优选的,因为颗粒污染可用向下流动最小化。
衬底处置机器人35可被构造且布置成在朝向处理模块49中的一个的第一方向上且在朝向处理模块49中的另一个的第二方向上转移衬底。第一方向与第二方向可彼此具有90到180、优选地110至130且最优选地约120度的角度。
衬底处置机器人35可被构造且布置成将衬底在第三方向上转移到匣盒站15(图1A中)。第一、第二与第三方向可彼此具有90到180、优选地110至130且最优选地约120度的角度。
图2示出根据另一实施例的炉的实例的示意性俯视图,其可包括外壳2,所述外壳具有由两个侧壁5连接的前壁4和后壁6。炉1可具有设有匣盒处置器臂9的匣盒处置器7,所述匣盒处置器臂被配置成在匣盒存储回转料架、邻近于炉1的外壳2的前壁4的匣盒出入端口11和/或匣盒站15之间转移匣盒C。匣盒处置器7可包括升降机构,用于到达不同高度处的匣盒。
可设置分离匣盒处置器7与衬底处置机器人35的内壁19。所述壁可具有邻近于匣盒站15的可闭合衬底接取开口33,所述开口可被构造且布置成还打开匣盒C。匣盒站15可设有匣盒转盘16以使匣盒C转动和/或将其压靠到可闭合衬底接取开口33。
衬底处理设备可包括设有衬底处置臂36以转移衬底的衬底处置机器人35。衬底可从位于匣盒站15上的匣盒C通过可闭合衬底接取开口33传递到衬底装载站38处的衬底舟皿B,且反之亦然。衬底装载站38可被构造且布置有舟皿支撑件以支撑具有衬底的舟皿。炉可包括衬底处置腔室37,其中容纳衬底处置机器人35。
外壳2可具有在炉1的全长上延伸的第一和第二侧壁5。炉的侧壁5之间的可限定设备的宽度的距离可在1.3米与2米之间,优选在1.5米与1.8米之间,且最优选在1.6米与1.7米之间,例如约为1.65米炉1的维护可从炉的后侧6或前侧4执行,使得可能无需在侧壁5中设置门。因此,侧壁5可构造成没有进行维护的主门。因此,多个炉1可并排定位在半导体制造工厂的洁净室中。相邻炉的侧壁5可因此定位地非常接近,或甚至压靠彼此。
有利地,多个炉的前侧4可形成壁,在对粒子具有极严格要求的所谓“洁净室”的非常洁净环境中,所述壁可与匣盒输送装置介接。相邻炉的背侧6可与维护通道(较之于前侧4对粒子具有较不严格的要求)介接。维护通道可用于从炉1的背侧进行维护。
炉1可设有第一反应器和第二反应器(图2中未示出,但与图1b和1c中相同),且设有第一升降机和第二升降机46,所述第一升降机和第二升降机被配置成在下部区域(图2中未示出,但与图1b和1c中相同)与反应器之间转移具有多个衬底的舟皿。每个升降机46可包括舟皿支撑臂48,所述舟皿支撑臂具有被配置成用作舟皿支撑件的支承表面且可在竖直方向上移动。反应器和升降机46可设置在处理模块中。
被构造且布置有舟皿支撑件以支撑具有衬底的舟皿以冷却具有已处理衬底的舟皿的冷却站47可设置在处理模块49中。
舟皿转移装置50可设置在处理模块49中,以在第一升降机和第二升降机46、衬底装载站38与冷却站47之间转移具有衬底的舟皿。舟皿转移装置50可被构造且布置成在保持舟皿B竖直的同时在下部区域内的多个舟皿位置之间转移舟皿B。转移可为基本上水平的。
舟皿转移装置50可包括三个舟皿转移机器人61、62、63。每个舟皿转移机器人可设有单个舟皿转移臂51。舟皿转移臂51可以是可旋转的,以在衬底装载站38、升降机46中的一个和/或冷却站47之间水平地转移舟皿。衬底装载站38、升降机46或冷却站47可竖直地移动例如几厘米的短距离,以拾取舟皿或将舟皿从舟皿转移臂51放下到固持器处。衬底装载站38和冷却站47的舟皿支撑件可设有可移动顶部表面以拾取舟皿或放下舟皿。舟皿转移臂51可设有固持器以固持舟皿。舟皿B可由固持器固持为竖直。例如2、3或4个舟皿B的多个舟皿可在炉1中同时使用。
衬底装载站38和冷却站47可被构造且布置在第一升降机和第二升降机46的相对侧上以保持炉1的宽度有限。衬底装载站38可被构造且布置在第一升降机和第二升降机46前方。冷却站47可被构造且布置成在第一升降机和第二升降机46后方静止。
冷却站47可用于冷却具有刚刚处理的热衬底的舟皿。冷却站47可设有被构造且布置成提取热气体以冷却衬底的气体提取器。冷却站47可设有气体入口以向冷却站47提供气体。所述设备可包括两个冷却站47。俯视图中的衬底处理设备可配置成大体U形(见图2)。
舟皿转移装置50和反应器可被构造且布置在U形的底部部分中。维护区域43可被构造且布置在U形的支腿之间。两个U形的支腿之间的距离可在60与120cm之间,更优选地在80与100cm之间且最优选地约为90cm,以允许维护工人的足够空间。后门41可设置在U形的支腿之间以在不使用时闭合维护区域43。大体U形也可包含V形。
所述设备可被构造且布置成允许维护工人从维护区域43维护第一反应器和第二反应器两者。例如,由维护工人对加热线、加热传感器及/或反应器的处理气体接口(出口和/或入口)进行维护。两个反应器可邻近于同一维护区域43构造且布置,以允许从同一维护区域43维护两个反应器。可设置维护门41以允许维护。维护门可设置在冷却站后方,以允许从工具背面进行维护。
因此,维护工人可能无需进入炉1的外壳2以对反应器进行维护作业。因此,可最小化维护工人受伤和/或下部区域和/或反应器被污染的风险。在外壳外部进行维护还可提高维护的速度和/或准确性。通过使用同一维护区域43用于两个反应器,可减小包含维护区域43的炉1的总占用面积。
处理模块49可设有一个维护门41,所述维护门可在维护区域43的方向上打开。处理模块49可设有单独的维护门41,以允许维护工人从同一维护区域43维护每个反应器。处理模块49的维护门41还可允许从同一维护区域43维护炉的下部区域,以维护舟皿转移装置50、冷却站47、气体入口、气体提取器、升降机46、衬底装载站38和/或舟皿B。
或者,每处理模块49可设置两个维护门。例如,用于接取反应器的顶部维护门以及用于接取炉1的下部区域的底部维护门。
反应器45可具有处理气体接口(出口和/或入口),其可连接到气体排放管或处理气体递送系统。处理气体接口可邻近于维护区域43而设置,以便使得它们在维护期间易于接取。
处理气体递送系统可设置(部分地)在被构造且布置成将处理气体提供至第一和/或第二反应器45的气体柜67中。气体柜可设置在U形的支腿的顶部附近。将气体柜设置在U形的顶部附近使得易于接近以进行维护。此外,如果气体柜需要被调整或放大,那么这种位置提供灵活性,因为在设备的背侧存在空间,其中不存在如衬底处置机器人或匣盒处置器等关键部件。
气体排放管可被构造且布置成从第一反应器和第二反应器中的至少一个移除处理气体,且还可设置在U形的支腿的顶部附近。在U形的支腿中提供气体排放管使得易于接近以进行维护。气体排放管可设有可能需要定期维护的泵和洗涤器。此外,如果气体排放管需要被调整或延伸,那么这种位置提供了灵活性,因为在设备的背侧存在空间,其中不存在例如衬底处置机器人和/或匣盒处置器等关键部件。
尽管上文已经参考附图描述了本发明的示例性实施例,但是应理解,本发明不限于这些实施例。在实施所要求保护的发明时,所属领域的技术人员根据对附图、公开内容和所附权利要求的研究可理解且实现公开的实施例的变化。
贯穿本说明书对“一实施例”或“实施例”的引用意指结合实施例描述的特定特征、结构或特性包含在本发明的至少一个实施例中。因此,在整个本说明书中,在不同位置中出现短语“在一个实施例中”或“在一实施例中”未必都是指同一个实施例。此外,应注意,一个或多个实施例的具体特征、结构或特征可任何合适的方式组合,以形成新的、未明确描述的实施例。
Claims (23)
1.一种衬底处理设备,所述衬底处理设备包括:
第一反应器和第二反应器,其用于处理舟皿中的多个衬底;
第一升降机和第二升降机,其分别向和从所述第一反应器和所述第二反应器转移具有衬底的舟皿;
衬底处置机器人,其被构造且布置成在衬底装载站处的舟皿与衬底匣盒之间转移衬底,其中所述设备包括舟皿转移装置以用于在以下各项之间转移具有衬底的舟皿:
所述衬底装载站,
所述第一升降机和所述第二升降机;以及
冷却站,其被构造且布置成冷却具有已处理衬底的舟皿,且所述设备在所述第一升降机和所述第二升降机的相对侧上构造且布置有所述衬底装载站和所述冷却站。
2.根据权利要求1所述的衬底处理设备,其中所述第一升降机和所述第二升降机中的至少一个、所述衬底装载站和所述冷却站包括舟皿支撑件,所述舟皿支撑件被构造且布置成支撑所述具有衬底的舟皿。
3.根据权利要求2所述的衬底处理设备,其中所述舟皿支撑件被构造且布置成在水平平面中静止。
4.根据权利要求2所述的衬底处理设备,其中所述舟皿支撑件为所述第一升降机或所述第二升降机的一部分,且被构造且布置成能在竖直方向上移动。
5.根据权利要求1所述的衬底处理设备,其中所述衬底装载站被构造且布置在所述第一升降机和所述第二升降机前方,且所述冷却站在所述第一升降机和所述第二升降机后方。
6.根据权利要求5所述的衬底处理设备,其中维护门设置在所述冷却站后方以允许从工具背面进行维护。
7.根据权利要求1所述的衬底处理设备,其中所述设备包括两个冷却站。
8.根据权利要求1所述的衬底处理设备,其中所述冷却站设有被构造且布置成提取热气体以冷却所述衬底的气体提取器。
9.根据权利要求1所述的衬底处理设备,其中所述设备包括两个衬底装载站,且所述衬底处置机器人被构造且布置成在第一衬底装载站或第二衬底装载站处的舟皿与所述衬底匣盒之间转移衬底。
10.根据权利要求1所述的衬底处理设备,其中俯视图中的所述衬底处理设备被配置成大体U形,且被构造且布置成向所述第一反应器和所述第二反应器中的至少一个提供处理气体的气体柜设置在所述U形的支腿的顶部中。
11.根据权利要求10所述的衬底处理设备,其中维护区域配置在所述U形的所述支腿之间。
12.根据权利要求1所述的衬底处理设备,其中所述设备包括外壳,所述外壳具有与在工具的全长上延伸的第一侧壁和第二侧壁连接的前壁和后壁,其中在所述侧壁中未设置门。
13.根据权利要求1所述的衬底处理设备,其中工具的宽度在1.3米与2米之间,优选在1.5米与1.8米之间,且最优选在1.6米与1.7米之间。
14.根据权利要求1所述的衬底处理设备,其中所述舟皿转移装置包括设有舟皿支撑件的可移动舟皿支撑臂,所述舟皿支撑件被配置成支撑衬底舟皿且被构造且布置成能在水平方向上移动。
15.根据权利要求14所述的衬底处理设备,其中舟皿转移机构包括多个可移动舟皿支撑臂,所述多个可移动舟皿支撑臂设有被配置成支撑所述衬底舟皿的支承表面。
16.根据权利要求14所述的衬底处理设备,其中所述舟皿支撑臂安装成能围绕枢转点旋转,以允许所述舟皿支撑件能在所述水平方向上移动。
17.根据权利要求1所述的衬底处理设备,其中所述舟皿转移装置包括至少两个舟皿转移机器人,用于在所述衬底装载站、所述第一升降机和所述第二升降机与所述冷却站之间转移舟皿。
18.根据权利要求17所述的衬底处理设备,其中所述两个舟皿转移机器人中的至少一个专用于所述第一升降机和所述第二升降机中的一个,且所述两个舟皿转移机器人中的另一个专用于所述第一升降机和所述第二升降机中的另一个。
19.根据权利要求17所述的衬底处理设备,其中所述舟皿转移装置包括至少三个舟皿转移机器人,用于在所述衬底装载站、所述第一升降机和所述第二升降机与所述冷却站之间转移舟皿。
20.根据权利要求1所述的衬底处理设备,其中闸阀设置于所述衬底处置器与所述第一升降机和所述第二升降机中的至少一个之间以形成微环境。
21.根据权利要求20所述的衬底处理设备,其中所述微环境能够设有气体入口和气体提取器,所述气体入口和所述气体提取器能够流体连接到泵以提供通过所述微环境的气流。
22.根据权利要求1所述的衬底处理设备,其中所述设备被构造且布置成同时处置在两个与四个之间的舟皿。
23.根据权利要求1所述的衬底处理设备,其中所述设备包括设有匣盒处置器臂的匣盒处置器,所述匣盒处置器臂被配置成在匣盒站、匣盒出入端口和/或匣盒存储装置之间转移匣盒且能随升降机构一起上下移动,且所述匣盒存储装置包含用于支撑匣盒的多个平台级,每个平台级中包括至少一个切口,所述切口被设定大小和形状以允许所述匣盒处置器臂垂直通过且允许所述平台级在其上支撑匣盒,且所述设备包括隔离所述匣盒处置器与所述衬底处置机器人的壁,所述壁具有邻近于所述匣盒站的可闭合衬底接取开口。
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US6732006B2 (en) * | 2002-02-06 | 2004-05-04 | Asm International Nv | Method and system to process semiconductor wafers |
US9146551B2 (en) * | 2012-11-29 | 2015-09-29 | Asm Ip Holding B.V. | Scheduler for processing system |
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