CN110718474B - 封装方法、离型件及其制作方法 - Google Patents
封装方法、离型件及其制作方法 Download PDFInfo
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- CN110718474B CN110718474B CN201910825786.3A CN201910825786A CN110718474B CN 110718474 B CN110718474 B CN 110718474B CN 201910825786 A CN201910825786 A CN 201910825786A CN 110718474 B CN110718474 B CN 110718474B
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- 238000000034 method Methods 0.000 title claims abstract description 27
- 238000004806 packaging method and process Methods 0.000 title claims abstract description 25
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 22
- 238000005538 encapsulation Methods 0.000 claims abstract description 8
- 239000000463 material Substances 0.000 claims description 19
- 239000004809 Teflon Substances 0.000 claims description 8
- 229920006362 Teflon® Polymers 0.000 claims description 8
- 239000004033 plastic Substances 0.000 claims description 8
- 229920003023 plastic Polymers 0.000 claims description 8
- 239000002245 particle Substances 0.000 claims description 6
- 238000000926 separation method Methods 0.000 claims description 6
- 239000000853 adhesive Substances 0.000 claims description 5
- 230000001070 adhesive effect Effects 0.000 claims description 5
- 238000007731 hot pressing Methods 0.000 claims description 5
- 238000003825 pressing Methods 0.000 claims description 2
- 239000011248 coating agent Substances 0.000 abstract description 9
- 238000000576 coating method Methods 0.000 abstract description 9
- 238000010924 continuous production Methods 0.000 abstract description 3
- 239000010410 layer Substances 0.000 description 35
- 238000000465 moulding Methods 0.000 description 15
- 229920000139 polyethylene terephthalate Polymers 0.000 description 9
- 239000005020 polyethylene terephthalate Substances 0.000 description 9
- 239000012790 adhesive layer Substances 0.000 description 2
- 239000003292 glue Substances 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- -1 Polyethylene Terephthalate Polymers 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 238000005429 filling process Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000012858 packaging process Methods 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 229920001343 polytetrafluoroethylene Polymers 0.000 description 1
- 239000004810 polytetrafluoroethylene Substances 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 239000000741 silica gel Substances 0.000 description 1
- 229910002027 silica gel Inorganic materials 0.000 description 1
- 239000012815 thermoplastic material Substances 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/50—Assembly of semiconductor devices using processes or apparatus not provided for in a single one of the subgroups H01L21/06 - H01L21/326, e.g. sealing of a cap to a base of a container
- H01L21/56—Encapsulations, e.g. encapsulation layers, coatings
- H01L21/565—Moulds
- H01L21/566—Release layers for moulds, e.g. release layers, layers against residue during moulding
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67126—Apparatus for sealing, encapsulating, glassing, decapsulating or the like
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Containers And Plastic Fillers For Packaging (AREA)
- Packages (AREA)
Abstract
Description
Claims (12)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201910825786.3A CN110718474B (zh) | 2019-09-03 | 2019-09-03 | 封装方法、离型件及其制作方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201910825786.3A CN110718474B (zh) | 2019-09-03 | 2019-09-03 | 封装方法、离型件及其制作方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN110718474A CN110718474A (zh) | 2020-01-21 |
CN110718474B true CN110718474B (zh) | 2022-08-16 |
Family
ID=69210265
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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CN201910825786.3A Active CN110718474B (zh) | 2019-09-03 | 2019-09-03 | 封装方法、离型件及其制作方法 |
Country Status (1)
Country | Link |
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CN (1) | CN110718474B (zh) |
Family Cites Families (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7595017B2 (en) * | 2002-01-31 | 2009-09-29 | Stmicroelectronics, Inc. | Method for using a pre-formed film in a transfer molding process for an integrated circuit |
KR20090018032A (ko) * | 2006-04-25 | 2009-02-19 | 아사히 가라스 가부시키가이샤 | 반도체 수지 몰드용 이형 필름 |
CN101506961B (zh) * | 2006-08-18 | 2011-01-05 | 旭硝子株式会社 | 半导体树脂模塑用脱模膜 |
KR100849181B1 (ko) * | 2007-04-12 | 2008-07-30 | 삼성전자주식회사 | 반도체 패키지, 이의 제조방법, 및 이를 제조하기 위한반도체 패키지 몰딩장치 및 몰딩방법 |
CN101992619A (zh) * | 2009-08-13 | 2011-03-30 | 许西岳 | 预压模内转印薄膜的模内转印方法 |
WO2014203872A1 (ja) * | 2013-06-18 | 2014-12-24 | 積水化学工業株式会社 | 離型フィルム |
CN105705307B (zh) * | 2013-11-07 | 2018-06-12 | 旭硝子株式会社 | 脱模膜、以及半导体封装体的制造方法 |
DE112015001137T5 (de) * | 2014-03-07 | 2016-11-24 | Asahi Glass Company, Limited | Formwerkzeugtrennfilm und Verfahren zur Herstellung eines eingekapselten Körpers |
JP6738672B2 (ja) * | 2016-07-04 | 2020-08-12 | 倉敷紡績株式会社 | 離型フィルムおよび半導体パッケージの製造方法 |
CN107123604A (zh) * | 2017-06-01 | 2017-09-01 | 中芯长电半导体(江阴)有限公司 | 一种双面成型的封装方法 |
CN208649214U (zh) * | 2018-07-31 | 2019-03-26 | 苏州思锐达新材料有限公司 | 低温成型离型载带 |
-
2019
- 2019-09-03 CN CN201910825786.3A patent/CN110718474B/zh active Active
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Publication number | Publication date |
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CN110718474A (zh) | 2020-01-21 |
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Address after: 518109 Foxconn H5 plant 101, No. 2, Donghuan 2nd Road, Fukang community, Longhua street, Longhua District, Shenzhen, Guangdong Province; plant 5, building C09, 4th floor, building C07, 2nd floor, building C08, 3rd floor, 4th floor, building C04, zone B, Foxconn Hongguan science and Technology Park, Fucheng Dasan community, Guanlan street, Guangdong Province Applicant after: Fulian Yuzhan Technology (Shenzhen) Co.,Ltd. Address before: 518109 Guangzhou Guanlan Foxconn Hongguan Science Park B workshop 5 C09 buildings 4 floors, C07 buildings 2 floors, C08 buildings 3 floors 4 floors, C04 buildings 1 floors Applicant before: SHENZHENSHI YUZHAN PRECISION TECHNOLOGY Co.,Ltd. |
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