CN1105927C - 均匀平面光波导的制造方法 - Google Patents

均匀平面光波导的制造方法 Download PDF

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Publication number
CN1105927C
CN1105927C CN98103201A CN98103201A CN1105927C CN 1105927 C CN1105927 C CN 1105927C CN 98103201 A CN98103201 A CN 98103201A CN 98103201 A CN98103201 A CN 98103201A CN 1105927 C CN1105927 C CN 1105927C
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CN
China
Prior art keywords
chemical vapor
vapor deposition
optical waveguide
deposition
group
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Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CN98103201A
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English (en)
Chinese (zh)
Other versions
CN1205444A (zh
Inventor
郑善太
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Samsung Electronics Co Ltd
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Samsung Electronics Co Ltd
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Filing date
Publication date
Application filed by Samsung Electronics Co Ltd filed Critical Samsung Electronics Co Ltd
Publication of CN1205444A publication Critical patent/CN1205444A/zh
Application granted granted Critical
Publication of CN1105927C publication Critical patent/CN1105927C/zh
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/56—After-treatment
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/40—Oxides
    • C23C16/401—Oxides containing silicon
    • C23C16/402—Silicon dioxide
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/453—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating passing the reaction gases through burners or torches, e.g. atmospheric pressure CVD
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/40—Oxides
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01P—WAVEGUIDES; RESONATORS, LINES, OR OTHER DEVICES OF THE WAVEGUIDE TYPE
    • H01P11/00—Apparatus or processes specially adapted for manufacturing waveguides or resonators, lines, or other devices of the waveguide type
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01P—WAVEGUIDES; RESONATORS, LINES, OR OTHER DEVICES OF THE WAVEGUIDE TYPE
    • H01P3/00—Waveguides; Transmission lines of the waveguide type
    • H01P3/10—Wire waveguides, i.e. with a single solid longitudinal conductor

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Optical Integrated Circuits (AREA)
CN98103201A 1997-07-15 1998-07-13 均匀平面光波导的制造方法 Expired - Fee Related CN1105927C (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
KR32888/97 1997-07-15
KR32888/1997 1997-07-15
KR1019970032888A KR100509510B1 (ko) 1997-07-15 1997-07-15 균일한 평면 광도파로 제작방법

Publications (2)

Publication Number Publication Date
CN1205444A CN1205444A (zh) 1999-01-20
CN1105927C true CN1105927C (zh) 2003-04-16

Family

ID=19514551

Family Applications (1)

Application Number Title Priority Date Filing Date
CN98103201A Expired - Fee Related CN1105927C (zh) 1997-07-15 1998-07-13 均匀平面光波导的制造方法

Country Status (4)

Country Link
JP (1) JP2902640B2 (ja)
KR (1) KR100509510B1 (ja)
CN (1) CN1105927C (ja)
GB (1) GB2327280B (ja)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN111448501A (zh) * 2017-12-15 2020-07-24 株式会社Lg化学 可穿戴设备

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2373343A (en) * 2001-03-16 2002-09-18 Bookham Technology Plc Rib waveguide for connection to an optical component
CN100356216C (zh) * 2005-12-29 2007-12-19 天津大学 在光学玻璃表面制备长周期条形波导光栅的方法
JP2009205112A (ja) * 2008-02-29 2009-09-10 Sumitomo Electric Ind Ltd 光導波体および光導波体製造方法
JP6004550B2 (ja) * 2012-12-20 2016-10-12 日本碍子株式会社 種結晶基板、複合基板および機能素子

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4086001A (en) * 1975-01-13 1978-04-25 Honeywell Inc. Planar optical waveguide
US4169009A (en) * 1977-03-30 1979-09-25 United Technologies Corporation Large area microstructure processing
JPS5540477A (en) * 1978-09-14 1980-03-21 Nec Corp Production of diffraction grating
JPS5930508A (ja) * 1982-08-12 1984-02-18 Matsushita Electric Ind Co Ltd 光導波路
EP0297652A1 (en) * 1987-06-25 1989-01-04 Koninklijke Philips Electronics N.V. Method of manufacturing a planar optical component
US5613995A (en) * 1993-04-23 1997-03-25 Lucent Technologies Inc. Method for making planar optical waveguides

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0563296A (ja) * 1991-09-03 1993-03-12 Mitsubishi Electric Corp 光導波路の形成方法
JPH0727937A (ja) * 1993-07-09 1995-01-31 Sumitomo Electric Ind Ltd 光導波路の製造方法
JPH07294760A (ja) * 1994-04-22 1995-11-10 Sumitomo Electric Ind Ltd 光導波路の製造方法
JP3674061B2 (ja) * 1994-10-31 2005-07-20 株式会社日立製作所 薄膜多層回路基板および光導波路の製造方法

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4086001A (en) * 1975-01-13 1978-04-25 Honeywell Inc. Planar optical waveguide
US4169009A (en) * 1977-03-30 1979-09-25 United Technologies Corporation Large area microstructure processing
JPS5540477A (en) * 1978-09-14 1980-03-21 Nec Corp Production of diffraction grating
JPS5930508A (ja) * 1982-08-12 1984-02-18 Matsushita Electric Ind Co Ltd 光導波路
EP0297652A1 (en) * 1987-06-25 1989-01-04 Koninklijke Philips Electronics N.V. Method of manufacturing a planar optical component
US5613995A (en) * 1993-04-23 1997-03-25 Lucent Technologies Inc. Method for making planar optical waveguides

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN111448501A (zh) * 2017-12-15 2020-07-24 株式会社Lg化学 可穿戴设备
CN111448501B (zh) * 2017-12-15 2022-03-15 株式会社Lg化学 可穿戴设备
US11681154B2 (en) 2017-12-15 2023-06-20 Lg Chem, Ltd. Wearable device including a plastic lens substrate

Also Published As

Publication number Publication date
KR100509510B1 (ko) 2005-10-21
GB2327280B (en) 1999-08-11
CN1205444A (zh) 1999-01-20
JP2902640B2 (ja) 1999-06-07
KR19990010190A (ko) 1999-02-05
GB9815126D0 (en) 1998-09-09
JPH1172637A (ja) 1999-03-16
GB2327280A (en) 1999-01-20

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