JPS5540477A - Production of diffraction grating - Google Patents

Production of diffraction grating

Info

Publication number
JPS5540477A
JPS5540477A JP11393378A JP11393378A JPS5540477A JP S5540477 A JPS5540477 A JP S5540477A JP 11393378 A JP11393378 A JP 11393378A JP 11393378 A JP11393378 A JP 11393378A JP S5540477 A JPS5540477 A JP S5540477A
Authority
JP
Japan
Prior art keywords
substrate
films
diffraction grating
glass
polished
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP11393378A
Other languages
Japanese (ja)
Inventor
Shigeo Matsushita
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp, Nippon Electric Co Ltd filed Critical NEC Corp
Priority to JP11393378A priority Critical patent/JPS5540477A/en
Publication of JPS5540477A publication Critical patent/JPS5540477A/en
Pending legal-status Critical Current

Links

Landscapes

  • Diffracting Gratings Or Hologram Optical Elements (AREA)

Abstract

PURPOSE: To enable the diffraction grating having the grooves of nearly desired shapes to be created by cutting and polishing the multilayer films laminated with the specific dielectric films in the film thickness direction then etching the polished surfaces.
CONSTITUTION: SiO2 and B2O3 are simultaneously evaporated toward a glass substrate 4 from vapor sources 5, 6 in a vacuum vessel, whereby SiO2-B2O3 glass is formed on the substrate 4. At this time the composition of the glass is so controlled as to become the concentrations shown in the figure, thus the galss films 7 of 1000 or more layers whose concentrations change periodically are formed. Next, the substrate 4 is withdrawn from the vacuum system and is cut and polished in the direction perpendicular to the films 7. Thereafter, the substrate 4 with its polished surface 10 being faced downward is dipped in the hydrofluoric acid of the etching solution, whereby the surface 10 is etched according to the concentrations of the composition B2O3 which is easy to be etched. As a result, the diffraction grating formed with the grooves 11 having the saw tooth form section as illustrated is obtained.
COPYRIGHT: (C)1980,JPO&Japio
JP11393378A 1978-09-14 1978-09-14 Production of diffraction grating Pending JPS5540477A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11393378A JPS5540477A (en) 1978-09-14 1978-09-14 Production of diffraction grating

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11393378A JPS5540477A (en) 1978-09-14 1978-09-14 Production of diffraction grating

Publications (1)

Publication Number Publication Date
JPS5540477A true JPS5540477A (en) 1980-03-21

Family

ID=14624823

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11393378A Pending JPS5540477A (en) 1978-09-14 1978-09-14 Production of diffraction grating

Country Status (1)

Country Link
JP (1) JPS5540477A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1105927C (en) * 1997-07-15 2003-04-16 三星电子株式会社 Fabrication method for uniform planar optical waveguide
CN103645533A (en) * 2013-12-13 2014-03-19 聊城大学 Preparing method of nanoscale optical grating

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1105927C (en) * 1997-07-15 2003-04-16 三星电子株式会社 Fabrication method for uniform planar optical waveguide
CN103645533A (en) * 2013-12-13 2014-03-19 聊城大学 Preparing method of nanoscale optical grating

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