CN1102260A - 感光性树脂 - Google Patents

感光性树脂 Download PDF

Info

Publication number
CN1102260A
CN1102260A CN94102642A CN94102642A CN1102260A CN 1102260 A CN1102260 A CN 1102260A CN 94102642 A CN94102642 A CN 94102642A CN 94102642 A CN94102642 A CN 94102642A CN 1102260 A CN1102260 A CN 1102260A
Authority
CN
China
Prior art keywords
photoresist
polymkeric substance
molecule
methyl
photosensitive resin
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN94102642A
Other languages
English (en)
Chinese (zh)
Inventor
宫崎忠一
水盛正英
本村美树
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sanyo Chemical Industries Ltd
Original Assignee
Sanyo Chemical Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sanyo Chemical Industries Ltd filed Critical Sanyo Chemical Industries Ltd
Publication of CN1102260A publication Critical patent/CN1102260A/zh
Pending legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D11/00Inks
    • C09D11/02Printing inks
    • C09D11/10Printing inks based on artificial resins
    • C09D11/101Inks specially adapted for printing processes involving curing by wave energy or particle radiation, e.g. with UV-curing following the printing
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F8/00Chemical modification by after-treatment
    • C08F8/44Preparation of metal salts or ammonium salts
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03CPHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00Photosensitive materials
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/008Azides
    • G03F7/012Macromolecular azides; Macromolecular additives, e.g. binders
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2800/00Copolymer characterised by the proportions of the comonomers expressed
    • C08F2800/10Copolymer characterised by the proportions of the comonomers expressed as molar percentages

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • General Chemical & Material Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Wood Science & Technology (AREA)
  • Materials For Photolithography (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
CN94102642A 1993-03-05 1994-03-05 感光性树脂 Pending CN1102260A (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP5071091A JPH06258823A (ja) 1993-03-05 1993-03-05 感光性樹脂
JP71091/93 1993-03-05

Publications (1)

Publication Number Publication Date
CN1102260A true CN1102260A (zh) 1995-05-03

Family

ID=13450526

Family Applications (1)

Application Number Title Priority Date Filing Date
CN94102642A Pending CN1102260A (zh) 1993-03-05 1994-03-05 感光性树脂

Country Status (6)

Country Link
US (1) US5424368A (enExample)
JP (1) JPH06258823A (enExample)
KR (1) KR940022195A (enExample)
CN (1) CN1102260A (enExample)
DE (1) DE4407292A1 (enExample)
TW (1) TW260759B (enExample)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5725978A (en) * 1995-01-31 1998-03-10 Basf Aktiengesellschaft Water-soluble photosensitive resin composition and a method of forming black matrix patterns using the same
JPH09157652A (ja) * 1995-12-07 1997-06-17 Nitto Denko Corp 架橋型液晶ポリマー及びその配向フィルム
JPH112716A (ja) * 1997-06-13 1999-01-06 Canon Inc カラーフィルタ、これを用いた液晶素子及びこれらの製造方法、並びに該製造方法に用いられるインクジェット用インク
JP2917989B1 (ja) * 1998-03-16 1999-07-12 日本電気株式会社 多孔状感光体及びその作製法
US6348299B1 (en) * 1999-07-12 2002-02-19 International Business Machines Corporation RIE etch resistant nonchemically amplified resist composition and use thereof
CN101813887B (zh) * 2010-04-12 2012-05-09 东莞长联新材料科技有限公司 一种提高重氮感光胶热稳定性的方法

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1512814A (en) * 1975-08-13 1978-06-01 Ciba Geigy Ag Epoxide resins
US4229514A (en) * 1978-12-29 1980-10-21 Konishiroku Photo Industry Co., Ltd. Photosensitive composition
JPS6045239A (ja) * 1983-08-22 1985-03-11 Hitachi Chem Co Ltd 微細パタ−ンの製造法
JP2643155B2 (ja) * 1987-07-08 1997-08-20 株式会社日立製作所 感光性組成物及びそれを用いたパターン形成方法
US5254431A (en) * 1988-02-03 1993-10-19 Vickers Plc Radiation-sensitive polymers having sulfonyl urthane side chains and azide containing side chains in a mixture with diazo compounds containing
JP2628692B2 (ja) * 1988-05-31 1997-07-09 株式会社日立製作所 パターン形成方法及びカラーブラウン管の製造方法
JPH0450205A (ja) * 1990-06-18 1992-02-19 Hitachi Ltd 水溶性感光性化合物およびその合成方法とそれを用いた感光性組成物

Also Published As

Publication number Publication date
US5424368A (en) 1995-06-13
DE4407292A1 (de) 1994-09-08
TW260759B (enExample) 1995-10-21
KR940022195A (ko) 1994-10-20
JPH06258823A (ja) 1994-09-16

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