CN109841605A - 电子封装件及其制法 - Google Patents
电子封装件及其制法 Download PDFInfo
- Publication number
- CN109841605A CN109841605A CN201711353996.4A CN201711353996A CN109841605A CN 109841605 A CN109841605 A CN 109841605A CN 201711353996 A CN201711353996 A CN 201711353996A CN 109841605 A CN109841605 A CN 109841605A
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- electronic
- electronic component
- bearing structure
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- packing piece
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Classifications
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Abstract
一种电子封装件及其制法,包括于承载结构上设置一具有导电体的电子元件,再以包覆层包覆该电子元件,之后将电子装置设于该包覆层上,以利用该导电体电性连接该承载结构与该电子装置,而降低该电子封装件的整体厚度。
Description
技术领域
本发明有关一种电子封装件及其制法,尤指一种封装堆叠结构及其制法。
背景技术
随着半导体封装技术的演进,半导体装置(Semiconductor device)已开发出不同的封装型态,而为提升电性功能及节省封装空间,业界遂发展出堆叠多个封装结构以形成封装堆叠结构(Package on
Package,POP)的封装型态,此种封装型态能发挥系统封装(SiP)异质整合特性,可将不同功用的电子元件,例如:记忆体、中央处理器、绘图处理器、影像应用处理器等,藉由堆叠设计达到系统的整合,而适用于各种轻薄短小型电子产品。
图1为悉知封装堆叠结构1的剖面示意图。如图1所示,该封装堆叠结构1包含有半导体元件11、下层封装基板10、上层封装基板12、多个支撑焊球13、电子装置16(如记忆体晶片或记忆体封装结构)以及封装胶体14。该半导体元件11以覆晶方式设于该下层封装基板10上,且该电子装置16也以覆晶方式设于于该上层封装基板12上。该些支撑焊球13用以连结且电性耦接该下层封装基板10与该上层封装基板12。该封装胶体14包覆该些支撑焊球13与该半导体元件11。可选择性地,形成底胶19于该半导体元件11与该下层封装基板10之间。
然而,前述悉知封装堆叠结构1中,该上层封装基板12为有机封装基板,其可为具有核心层120或无核心(coreless)型式,然其厚度d极厚,约为150至800微米(um),故该封装堆叠结构1的整体厚度D难以降低,因而无法符合现今终端电子产品轻薄短小的需求。
此外,即使采用厚度d最薄的上层封装基板12,然因该支撑焊球13的高度R需大于该半导体元件11的高度r,以避免该半导体元件11碰撞该上层封装基板12而损坏的问题,故该封装堆叠结构1的整体厚度D因受限于该支撑焊球13的高度R而难以缩减至小于240微米。
因此,如何克服悉知技术中的种种问题,实已成目前亟欲解决的课题。
发明内容
鉴于上述悉知技术的缺失,本发明提供一种电子封装件及其制法,可降低该电子封装件的整体厚度。
本发明的电子封装件,包括:承载结构;电子元件,其设于该承载结构上,其中,该电子元件具有相对的第一侧与第二侧,并以该第一侧结合于该承载结构上;导电体,其形成于该电子元件中并连通该第一侧与第二侧且电性连接该承载结构;包覆层,其形成于该承载结构上以包覆该电子元件,且令该导电体外露出该包覆层;以及电子装置,其接置于该包覆层上且电性连接该导电体。
本发明复提供一种电子封装件的制法,包括:设置至少一电子元件于一承载结构上,其中,该电子元件具有相对的第一侧与第二侧,并以该第一侧结合于该承载结构上,且于该电子元件中形成有多个连通该第一侧与第二侧且电性连接该承载结构的导电体;形成包覆层于该承载结构上以包覆该电子元件,且令该导电体外露出该包覆层;以及接置电子装置于该包覆层上,且令该电子装置电性连接该导电体。
前述的电子封装件及其制法中,该电子元件于该第一侧或第二侧设有多个电极垫,以电性连接该承载结构。
前述的电子封装件及其制法中,该导电体凸伸出该电子元件的第二侧。
前述的电子封装件及其制法中,该电子装置与该包覆层之间形成有绝缘材。例如,该绝缘材为介电材、封装材或非导电性薄膜。
由上可知,本发明的电子封装件及其制法,主要藉由该电子元件中形成该导电体,以利用该导电体电性连接该承载结构与该电子装置,故相较于悉知技术,本发明的电子封装件能省略悉知上层封装基板与支撑焊球的配置,因而不仅能省略材料使用及制程步骤,且能大幅降低该电子封装件的整体厚度,以符合电子产品轻薄短小的趋势。
附图说明
图1为悉知封装堆叠结构的剖面示意图;
图2A至图2D为本发明的电子封装件的制法的剖视示意图;
图2E为图2D的另一实施例的局部剖视示意图;以及
图3及图4为图2D的其它不同实施例的剖视示意图。
符号说明
1 封装堆叠结构
10 下层封装基板
11 半导体元件
12 上层封装基板
120 核心层
13 支撑焊球
14 封装胶体
16,26 电子装置
19,29 底胶
2,3,4 电子封装件
20 承载结构
21,41 电子元件
21a 第一侧
21b 第二侧
210,410 电极垫
22 导电凸块
23 导电体
23a 第一端部
23b 第二端部
24,34 包覆层
24a 第一表面
24b 第二表面
25 焊锡材料
260 导电元件
27,28 绝缘材
42 焊线
D,d,H,h,T,t 厚度
R,r 高度。
具体实施方式
以下藉由特定的具体实施例说明本发明的实施方式,熟悉此技艺的人士可由本说明书所揭示的内容轻易地了解本发明的其他优点及功效。
须知,本说明书所附图式所绘示的结构、比例、大小等,均仅用以配合说明书所揭示的内容,以供熟悉此技艺的人士的了解与阅读,并非用以限定本发明可实施的限定条件,故不具技术上的实质意义,任何结构的修饰、比例关系的改变或大小的调整,在不影响本发明所能产生的功效及所能达成的目的下,均应仍落在本发明所揭示的技术内容得能涵盖的范围内。同时,本说明书中所引用的如“上”、“第一”、“第二”及“一”等的用语,也仅为便于叙述的明了,而非用以限定本发明可实施的范围,其相对关系的改变或调整,在无实质变更技术内容下,当也视为本发明可实施的范畴。
请参阅图2A至图2D,其为本发明的电子封装件的制法的剖视示意图。
如图2A所示,于一承载结构20上设置至少一具有多个导电体23的电子元件21。
于本实施例中,该承载结构20为如具有核心层与线路结构的封装基板(substrate)或无核心层(coreless)的线路结构,其具有多个线路层,如扇出(fan out)型重布线路层(redistribution layer,简称RDL)。应可理解地,该承载结构也可为其它可供承载如晶片等电子元件21的承载单元,例如导线架(leadframe),并不限于上述。
此外,该电子元件21为主动元件、被动元件或其二者组合,且该主动元件为例如半导体晶片,而该被动元件为例如电阻、电容及电感。例如,该电子元件21为半导体晶片,其具有相对的第一侧21a(于此视为作用面)与第二侧21b(于此视为非作用面),且该第一侧21a具有多个电极垫210,令该电极垫210藉由多个如焊锡材料的导电凸块22以覆晶方式电性连接该承载结构20。或者,如图4所示,该电子元件41也可于该第二侧21b(于此视为作用面)上配置该电极垫410,并藉由多个焊线42以打线方式电性连接该承载结构20。然而,有关该电子元件电性连接该承载结构的方式不限于上述。
又,该导电体23为以硅穿孔(Through-silicon via,简称TSV)制程制作成如铜柱的金属柱以穿设于该电子元件21中,且该导电体23具有相对的第一端部23a与第二端部23b,且该第一端部23a外露出该第一侧21a,以令该第一端部23a藉由多个如焊锡材料的导电凸块22电性连接该承载结构20。
另外,可选择性形成底胶29于该承载结构20与该电子元件21的第一侧21a之间,以包覆该些导电凸块22。
如图2B所示,形成一包覆层24于该承载结构20上以包覆该电子元件21。
于本实施例中,利用压合(lamination)或模压(molding)或其它方式形成该包覆层24,其材质可为介电材或封装材,如聚酰亚胺(polyimide,简称PI)、干膜(dry film)、环氧树脂(epoxy)或封装化合物(molding compound),但并不限于上述。
此外,该包覆层24定义有相对的第一表面24a与第二表面24b,使该包覆层24以其第一表面24a结合该承载结构20。
又,如图3所示,包覆层34可选择性形成于该承载结构20与该电子元件21的第一侧21a之间,以包覆该些导电凸块22。
另外,如图4所示,该包覆层24包覆该些焊线42。
如图2C所示,移除该包覆层24的部分材质与该电子元件21的部分材质,使该导电体23外露出该包覆层24,且该导电体23连通该电子元件21的第一侧21a与第二侧21b。
于本实施例中,该导电体23的第二端部23b凸伸出该电子元件21的第二侧21b。例如,是以整平制程移除该电子元件21的第二侧21b的部分材质,使该导电体23的第二端部23b与该电子元件21的第二侧21b共平面(齐平),再蚀刻该电子元件21的第二侧21b的部分材质,以令该导电体23的第二端部23b凸伸出该电子元件21的第二侧21b。
具体地,藉由研磨或切除等适当方式,移除该包覆层24的第二表面24b的部分材质、该导电体23的第二端部23b的部分材质与该电子元件21的第二侧21b的部分材质,使该包覆层24的第二表面24b、该导电体23的第二端部23b与该电子元件21的第二侧21b共平面(齐平),此时,该电子元件21(或该包覆层24、或该导电体23)的厚度T小于100微米。接着,以干式蚀刻制程,如电浆方式、反应式离子蚀刻(Reactive Ion Etching,简称RIE)或其它蚀刻方式,移除该电子元件21的第二侧21b约10微米厚度t的材质,以令该导电体23的第二端部23b凸伸出该电子元件21的第二侧21b。
此外,有关该导电体23的第二端部23b外露出该包覆体24的方式并不限于上述,且该导电体23连通该电子元件21的第一侧21a与第二侧21b的方式也不限于上述。
另外,可于该承载结构20的底面(植球侧)上形成多个如焊球的焊锡材料25,以供接置一电路板。
如图2D所示,将一电子装置26藉由多个导电元件260设于该包覆层24的第二表面24b上,且该电子装置26透过该些导电元件260电性连接该导电体23,以成为封装堆叠(Package on Package,简称POP)型式的电子封装件2。
于本实施例中,该电子装置26例如为高频宽记忆体(High Bandwidth Memory,简称HBM)型式的封装结构,且该导电元件260为例如含有焊锡材料的导电凸块。
此外,于该电子装置26设于该包覆层24的第二表面24b上后,藉由绝缘材27包覆该些导电元件260以保护该些导电元件260及增加该电子封装件2的刚性强度,其中,该绝缘材27的材质为介电材或封装材。
或者,如图2E所示,可先于该电子装置26上形成一包覆该些导电元件260的绝缘材28,以于该绝缘材28结合于该包覆层24的第二表面24b上,而使该些导电元件260对应焊接结合及电性连接该些导电体23时,得以透过该绝缘材28保护该些导电元件260及增加该电子封装件2的刚性强度,其中,该绝缘材28可具有助焊(flux)的功能,其为非导电性薄膜(Non-conductive Film,简称NCF),例如,异方性导电胶(Anisotropic conductive paste,简称ACP)、异方性导电胶膜(Anisotropic Conductive Film,简称ACF)。
因此,本发明的制法藉由该电子元件21,41中形成该导电体23,以利用该导电体23电性连接该承载结构20与该电子装置26,故相较于悉知技术,本发明的电子封装件能省略悉知上层封装基板与支撑焊球的配置,因而不仅能省略材料使用及制程步骤,以降低制作成本,且其整体厚度H(省略导电元件260)仅需考量该电子元件21,41的最终厚度h(或该导电体23的厚度T),因而能大幅降低该电子封装件2,3,4的整体厚度H,使该厚度H小于240微米,以符合电子产品轻薄短小的趋势。
本发明还提供一种电子封装件2,3,4,包括:一承载结构20、一电子元件21,41、多个导电体23、一包覆层24,34以及一电子装置26。
所述的电子元件21,41设于该承载结构20上,其中,该电子元件21具有相对的第一侧21a与第二侧21b,该电子元件21以第一侧21a结合于该承载结构20上。
所述的导电体23形成于该电子元件21,41中并连通该第一侧21a与第二侧21b且电性连接该承载结构20。
所述的包覆层24,34形成于该承载结构20上以包覆该电子元件21,41,且令该导电体23外露出该包覆层24,34。
所述的电子装置26接置于该包覆层24,34上且电性连接该导电体23。
于一实施例中,该电子元件21,41具有设于第一侧21a或第二侧21b的电极垫210,410,以电性连接该承载结构20。
于一实施例中,该导电体23凸伸出该电子元件21,41的第二侧21b。
于一实施例中,该电子装置26与该包覆层24,34之间形成有绝缘材27,28。例如,该绝缘材27,28为介电材、封装材或非导电性薄膜。
综上所述,本发明的电子封装件及其制法,主要藉由在电子元件中形成导电体,以利用该导电体电性连接用以承载该电子元件的承载结构与设于该承载结构上的电子装置,故本发明的电子封装件及其制法不仅能省略悉知上层封装基板与支撑焊球的配置,且能降低制作成本及电子封装件的整体厚度。
上述实施例仅用以例示性说明本发明的原理及其功效,而非用于限制本发明。任何熟习此项技艺的人士均可在不违背本发明的精神及范畴下,对上述实施例进行修改。因此本发明的权利保护范围,应如权利要求书所列。
Claims (10)
1.一种电子封装件,其特征在于,包括:
承载结构;
电子元件,其设于该承载结构上,其中,该电子元件具有相对的第一侧与第二侧,并以该第一侧结合至该承载结构上;
多个导电体,其形成于该电子元件中并连通该第一侧与第二侧且电性连接该承载结构;
包覆层,其形成于该承载结构上以包覆该电子元件,且令该导电体外露出该包覆层;以及
电子装置,其接置于该包覆层上且电性连接该导电体。
2.根据权利要求1所述的电子封装件,其特征在于,该电子元件于该第一侧或第二侧设有多个电极垫,以电性连接该承载结构。
3.根据权利要求1所述的电子封装件,其特征在于,该导电体凸伸出该电子元件的第二侧。
4.根据权利要求1所述的电子封装件,其特征在于,该电子装置与该包覆层之间形成有绝缘材。
5.根据权利要求4所述的电子封装件,其特征在于,该绝缘材为介电材、封装材或非导电性薄膜。
6.一种电子封装件的制法,其特征在于,包括:
设置至少一电子元件于一承载结构上,其中,该电子元件具有相对的第一侧与第二侧,并以该第一侧结合于该承载结构上,且于该电子元件中形成有多个连通该第一侧与第二侧且电性连接该承载结构的导电体;
形成包覆层于该承载结构上以包覆该电子元件,且令该导电体外露出该包覆层;以及
接置电子装置于该包覆层上,且令该电子装置电性连接该导电体。
7.根据权利要求6所述的电子封装件的制法,其特征在于,该电子元件于该第一侧或第二侧设有多个电极垫,以电性连接该承载结构。
8.根据权利要求6所述的电子封装件的制法,其特征在于,该导电体凸伸出该电子元件的第二侧。
9.根据权利要求6所述的电子封装件的制法,其特征在于,该电子装置与该包覆层之间形成有绝缘材。
10.根据权利要求9所述的电子封装件的制法,其特征在于,该绝缘材为介电材、封装材或非导电性薄膜。
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US9461029B2 (en) * | 2014-06-27 | 2016-10-04 | Samsung Electronics Co., Ltd. | Semiconductor packages and methods for fabricating the same |
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US10600708B2 (en) | 2020-03-24 |
US20190164861A1 (en) | 2019-05-30 |
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