CN109790600A - NiTa系合金、靶材及磁记录介质 - Google Patents

NiTa系合金、靶材及磁记录介质 Download PDF

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Publication number
CN109790600A
CN109790600A CN201780058756.3A CN201780058756A CN109790600A CN 109790600 A CN109790600 A CN 109790600A CN 201780058756 A CN201780058756 A CN 201780058756A CN 109790600 A CN109790600 A CN 109790600A
Authority
CN
China
Prior art keywords
alloy
amount
nita
system alloy
magnetic recording
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN201780058756.3A
Other languages
English (en)
Chinese (zh)
Inventor
井本未由纪
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sanyo Special Steel Co Ltd
Original Assignee
Sanyo Special Steel Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sanyo Special Steel Co Ltd filed Critical Sanyo Special Steel Co Ltd
Publication of CN109790600A publication Critical patent/CN109790600A/zh
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/62—Record carriers characterised by the selection of the material
    • G11B5/73—Base layers, i.e. all non-magnetic layers lying under a lowermost magnetic recording layer, e.g. including any non-magnetic layer in between a first magnetic recording layer and either an underlying substrate or a soft magnetic underlayer
    • G11B5/7368—Non-polymeric layer under the lowermost magnetic recording layer
    • G11B5/7371—Non-magnetic single underlayer comprising nickel
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C19/00—Alloys based on nickel or cobalt
    • C22C19/03—Alloys based on nickel or cobalt based on nickel
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C27/00—Alloys based on rhenium or a refractory metal not mentioned in groups C22C14/00 or C22C16/00
    • C22C27/02—Alloys based on vanadium, niobium, or tantalum
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C30/00—Alloys containing less than 50% by weight of each constituent
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C30/00—Alloys containing less than 50% by weight of each constituent
    • C22C30/02—Alloys containing less than 50% by weight of each constituent containing copper
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C30/00—Alloys containing less than 50% by weight of each constituent
    • C22C30/04—Alloys containing less than 50% by weight of each constituent containing tin or lead
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/62—Record carriers characterised by the selection of the material
    • G11B5/73—Base layers, i.e. all non-magnetic layers lying under a lowermost magnetic recording layer, e.g. including any non-magnetic layer in between a first magnetic recording layer and either an underlying substrate or a soft magnetic underlayer
    • G11B5/7368—Non-polymeric layer under the lowermost magnetic recording layer
    • G11B5/7373—Non-magnetic single underlayer comprising chromium
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/62—Record carriers characterised by the selection of the material
    • G11B5/73—Base layers, i.e. all non-magnetic layers lying under a lowermost magnetic recording layer, e.g. including any non-magnetic layer in between a first magnetic recording layer and either an underlying substrate or a soft magnetic underlayer
    • G11B5/7368—Non-polymeric layer under the lowermost magnetic recording layer
    • G11B5/7377—Physical structure of underlayer, e.g. texture
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
    • G11B5/851—Coating a support with a magnetic layer by sputtering

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physical Vapour Deposition (AREA)
  • Manufacturing Of Magnetic Record Carriers (AREA)
  • Powder Metallurgy (AREA)
  • Magnetic Record Carriers (AREA)
CN201780058756.3A 2016-09-27 2017-09-26 NiTa系合金、靶材及磁记录介质 Pending CN109790600A (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2016187722A JP2018053280A (ja) 2016-09-27 2016-09-27 ＮｉＴａ系合金、ターゲット材および磁気記録媒体
JP2016-187722 2016-09-27
PCT/JP2017/034762 WO2018062189A1 (ja) 2016-09-27 2017-09-26 ＮｉＴａ系合金、ターゲット材及び磁気記録媒体

Publications (1)

Publication Number Publication Date
CN109790600A true CN109790600A (zh) 2019-05-21

Family

ID=61760792

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201780058756.3A Pending CN109790600A (zh) 2016-09-27 2017-09-26 NiTa系合金、靶材及磁记录介质

Country Status (5)

Country Link
JP (1) JP2018053280A (ja)
CN (1) CN109790600A (ja)
MY (1) MY190782A (ja)
TW (1) TW201817890A (ja)
WO (1) WO2018062189A1 (ja)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109811195A (zh) * 2019-03-18 2019-05-28 河北四通新型金属材料股份有限公司 一种高纯镍钽中间合金及其制备方法
TWI769081B (zh) * 2021-09-17 2022-06-21 光洋應用材料科技股份有限公司 鉻鎳鈦合金靶材及其製法
CN114892042B (zh) * 2022-04-20 2022-12-13 嘉兴鸷锐新材料科技有限公司 一种耐高温铁镍合金及其制备方法和应用

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0340213A (ja) * 1989-07-06 1991-02-21 Furukawa Electric Co Ltd:The 磁気記録媒体
US20050202663A1 (en) * 2004-03-11 2005-09-15 Masakatsu Tsuchiaki Method of manufacturing semiconductor device and semiconductor device
JP2013127111A (ja) * 2011-11-17 2013-06-27 Mitsubishi Materials Corp スパッタリングターゲットおよびその製造方法
CN103221999A (zh) * 2010-11-22 2013-07-24 山阳特殊制钢株式会社 磁记录介质的籽晶层用合金及溅射靶材

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6233735A (ja) * 1985-08-06 1987-02-13 Mitsui Eng & Shipbuild Co Ltd 高耐食アモルフアス合金
JPS62235448A (ja) * 1986-04-03 1987-10-15 Nec Corp 非晶質合金
US7828913B1 (en) * 2004-08-03 2010-11-09 Huddleston James B Peritectic, metastable alloys containing tantalum and nickel
JP6514664B2 (ja) * 2016-05-25 2019-05-15 山陽特殊製鋼株式会社 スパッタリングターゲット材

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0340213A (ja) * 1989-07-06 1991-02-21 Furukawa Electric Co Ltd:The 磁気記録媒体
US20050202663A1 (en) * 2004-03-11 2005-09-15 Masakatsu Tsuchiaki Method of manufacturing semiconductor device and semiconductor device
CN103221999A (zh) * 2010-11-22 2013-07-24 山阳特殊制钢株式会社 磁记录介质的籽晶层用合金及溅射靶材
JP2013127111A (ja) * 2011-11-17 2013-06-27 Mitsubishi Materials Corp スパッタリングターゲットおよびその製造方法

Also Published As

Publication number Publication date
TW201817890A (zh) 2018-05-16
MY190782A (en) 2022-05-12
JP2018053280A (ja) 2018-04-05
WO2018062189A1 (ja) 2018-04-05

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