CN1096628C - 具有低金属离子含量的表面活性剂和由其产生的显影剂的生产方法 - Google Patents

具有低金属离子含量的表面活性剂和由其产生的显影剂的生产方法 Download PDF

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Publication number
CN1096628C
CN1096628C CN96197057A CN96197057A CN1096628C CN 1096628 C CN1096628 C CN 1096628C CN 96197057 A CN96197057 A CN 96197057A CN 96197057 A CN96197057 A CN 96197057A CN 1096628 C CN1096628 C CN 1096628C
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CN
China
Prior art keywords
exchange resin
ion exchange
solution
solvent
developer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CN96197057A
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English (en)
Chinese (zh)
Other versions
CN1196806A (zh
Inventor
M·D·拉曼
D·P·奥宾
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
AZ Electronic Materials Japan Co Ltd
Original Assignee
Clariant International Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Clariant International Ltd filed Critical Clariant International Ltd
Publication of CN1196806A publication Critical patent/CN1196806A/zh
Application granted granted Critical
Publication of CN1096628C publication Critical patent/CN1096628C/zh
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
CN96197057A 1995-09-26 1996-09-25 具有低金属离子含量的表面活性剂和由其产生的显影剂的生产方法 Expired - Fee Related CN1096628C (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US08/533,828 1995-09-26
US08/533,828 US5750031A (en) 1995-09-26 1995-09-26 Process for producing surfactant having a low metal ion level and developer produced therefrom

Publications (2)

Publication Number Publication Date
CN1196806A CN1196806A (zh) 1998-10-21
CN1096628C true CN1096628C (zh) 2002-12-18

Family

ID=24127598

Family Applications (1)

Application Number Title Priority Date Filing Date
CN96197057A Expired - Fee Related CN1096628C (zh) 1995-09-26 1996-09-25 具有低金属离子含量的表面活性剂和由其产生的显影剂的生产方法

Country Status (8)

Country Link
US (1) US5750031A (enExample)
EP (1) EP0852743B1 (enExample)
JP (1) JPH11512845A (enExample)
KR (1) KR100470514B1 (enExample)
CN (1) CN1096628C (enExample)
DE (1) DE69605207T2 (enExample)
TW (1) TW515933B (enExample)
WO (1) WO1997012281A1 (enExample)

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US5750031A (en) * 1995-09-26 1998-05-12 Clariant Finance (Bvi) Limited Process for producing surfactant having a low metal ion level and developer produced therefrom
US5962183A (en) * 1995-11-27 1999-10-05 Clariant Finance (Bvi) Limited Metal ion reduction in photoresist compositions by chelating ion exchange resin
US5936071A (en) * 1998-02-02 1999-08-10 Clariant Finance (Bvi) Limited Process for making a photoactive compound and photoresist therefrom
WO2002023598A2 (en) * 2000-09-15 2002-03-21 Infineon Technologies North America Corp. A method to reduce post-development defects without sacrificing throughput
US6531267B2 (en) * 2001-04-11 2003-03-11 Clariant Finance (Bvi) Limited Process for producing acid sensitive liquid composition containing a carbonate
KR100593668B1 (ko) * 2004-01-20 2006-06-28 삼성전자주식회사 세정액 조성물 및 이를 이용한 반도체 장치의 세정방법
JP5002360B2 (ja) * 2007-07-23 2012-08-15 富士フイルム株式会社 パターン形成方法
US8084406B2 (en) * 2007-12-14 2011-12-27 Lam Research Corporation Apparatus for particle removal by single-phase and two-phase media
JP5086893B2 (ja) * 2008-05-26 2012-11-28 花王株式会社 半導体デバイス用基板用の洗浄液
TWI453691B (zh) * 2012-09-21 2014-09-21 Cube Software Corp Examination of blood sampling number and test information integration system
WO2017169834A1 (ja) * 2016-03-31 2017-10-05 富士フイルム株式会社 半導体製造用処理液、及び、パターン形成方法
CN112859551A (zh) * 2021-03-04 2021-05-28 杭州格林达电子材料股份有限公司 一种芯片集成电路四甲基氢氧化铵显影液用非离子表面活性剂的提纯方法及其显影液

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DE69320468T2 (de) * 1992-03-06 1999-04-22 Clariant Finance (Bvi) Ltd., Road Town, Tortola Photoresists mit einem niedrigem grad metallionen
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US5286606A (en) * 1992-12-29 1994-02-15 Hoechst Celanese Corporation Process for producing a developer having a low metal ion level
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US5962183A (en) * 1995-11-27 1999-10-05 Clariant Finance (Bvi) Limited Metal ion reduction in photoresist compositions by chelating ion exchange resin

Also Published As

Publication number Publication date
WO1997012281A1 (en) 1997-04-03
DE69605207D1 (de) 1999-12-23
DE69605207T2 (de) 2000-07-13
CN1196806A (zh) 1998-10-21
KR100470514B1 (ko) 2005-09-15
EP0852743B1 (en) 1999-11-17
TW515933B (en) 2003-01-01
KR19990063687A (ko) 1999-07-26
JPH11512845A (ja) 1999-11-02
US5750031A (en) 1998-05-12
EP0852743A1 (en) 1998-07-15

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SE01 Entry into force of request for substantive examination
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Owner name: AZ ELECTRONIC MATERIALS JAPAN

Free format text: FORMER OWNER: CLARIANT INTERNATIONAL LTD.

Effective date: 20050819

C41 Transfer of patent application or patent right or utility model
TR01 Transfer of patent right

Effective date of registration: 20050819

Address after: Tokyo, Japan

Patentee after: AZ Electronic Materials Japan Co., Ltd.

Address before: Swiss Moose

Patentee before: Keralyant International Co., Ltd.

C19 Lapse of patent right due to non-payment of the annual fee
CF01 Termination of patent right due to non-payment of annual fee