CN109324485A - Exposure method, manufacturing method and substrate processing method using same - Google Patents

Abstract

The exposure device that processing is exposed to substrate (P) of the invention, has: there is the substrate holding (PH) for keeping a part of substrate (P) in the state of ensuring flatness, relative exposure position (exposure area (IA)) to drive with by substrate (P) in the substrate Y stepping conveyer (88) of the Y direction in X/Y plane in the mobile fine motion microscope carrier of X-direction.This occasion, keep the X-direction in the fine motion microscope carrier relative exposure region (IA) of a part of substrate (P) mobile in the state of ensuring flatness with substrate holding (PH), it is being carried out before and after Y direction movement using the substrate (P) of substrate Y stepping conveyer (88), is carrying out the exposure-processed to the multiple regions on substrate (P) accordingly.

Description

Exposure method, manufacturing method and substrate processing method using same

This case be on August 30th, 2012 the applying date, it is entitled " at substrate application No. is 201280042608.X Manage the manufacturer of device and substrate processing method using same, exposure method and exposure device and manufacturing method and flat-panel monitor The divisional application of the patent application of method ".

Technical field

The present invention relates to substrate board treatment and substrate processing method using same, exposure method and exposure device and element systems The manufacturing method for making method and flat-panel monitor moves substrate sequentially to multiple on substrate especially with regard to relative to processing position Region, which carries out the substrate board treatment of set processing and substrate processing method using same, relative exposure position (processing position), makes substrate sequentially It is mobile so that exposure method and exposure device and use aforesaid substrate processing unit that the multiple regions on substrate exposes, on State the manufacturing method of substrate processing method using same, the manufacturing method of above-mentioned exposure method or exposure device and flat-panel monitor.

Background technique

All the time, the electronic components (microcomponent) such as liquid crystal display element, semiconductor element (integrated circuit etc.) are manufactured Photoetching process mainly repeats the projection aligner (so-called stepper) or step of (step&repeat) mode using stepping Into the projection aligner (so-called scanning stepper (also known as scanning machine)) etc. of scanning (step&scan) mode.

In such exposure device, surface is coated with (hereinafter, being referred to as substrate) such as glass plate or the chips of induction agent and is loaded In on baseplate carrier device.And the circuit pattern for being formed in exposure mask (or graticule) is then via optical systems such as projecting lens It is transferred to substrate by the irradiation of exposure light.

In recent years, the substrate of the exposure object object of exposure device, substrate (rectangular glass base especially used for liquid crystal display element Plate), size has the tendency that increasingly enlargement, with this tendency, keeps the Substrate table of substrate also enlarged in exposure device, adjoint And the weight increasing come causes the position control of substrate increasingly difficult.To solve this problem, inventor will be previously it is proposed that a kind of will The self weight of the Substrate table of substrate is kept to add with the weight payment device (self weight canveller) for being known as stem that cylindrical component is constituted With the exposure device of bearing (for example, referring to patent document 1).

In the baseplate carrier device that the existing exposure device for the exposure device recorded comprising above patent document 1 has When exploitation, basic considers mode, to reach the purpose with high speed and high-precision positioning substrate, and makes baseplate carrier as far as possible Lightweight and exclusive PCR (vibration) realized.Past also developed it is various only by substrate, to this substrate into The substrate holding of row plane rectification, the interferometer moving lens to know substrate position, the platform for integrally supporting these, with drive It moves the needed part of bottom line that VCM (voice coil motor) of this etc. is progress high accuracy positioning control and is loaded into fine motion load Platform, and other parts component (electric base and supply cable etc.) is then loaded into the baseplate carrier device of coarse motion microscope carrier.

On the other hand, such as liquid crystal glass substrate, the newest 10th from generation to generation on one side up to 3 meters with first-class more large-scale The tendency of change, equipped with can adsorb the fine motion microscope carrier that keeps the substrate holding of this large substrate entirety it is also enlarged therewith and its Weight also increases, and can not be known as light weight again.The enlargement of such substrate holding and the Substrate table for supporting this etc. gradually at The reason of for various unfavorable conditions.For example, substrate all the more enlargement, so that substrate 2 is tieed up the weight of mobile baseplate carrier device Also increase with amount of movement.Therefore, exposure device is increasingly enlarged, causes manufacturing cost increase, the manufacture of device and shipping time Increase.In addition, the mobile consuming time of substrate, and make manufacturing lead time elongated.Therefore, it is desirable to have it is a kind of can be with high precision Guidance exposure object object (substrate), the exploitation that can further seek miniaturization, light-weighted bearing table device.

It in exposure device, is replaced in the substrate of baseplate carrier, is in the substrate holding that substrate is kept to substrate from absorption On move out and (keep out of the way) after, and by new substrate move on (investment) substrate holding into one movement.However, existing exposure device In, it is the substrate holding using the retaining surface with size identical as substrate.Therefore, if existing exposure device is not removed substrate If sending distance same in size, i.e., substrate can not be moved out from substrate holding, also substrate can not be moved in substrate It keeps on tool.

In addition, as previously mentioned, such as liquid crystal glass substrate has the tendency that enlargement increasingly, therefore, the replacement palpus of substrate There are considerable degree of time, therefore the new equipment that more hope develops the shortening for being able to achieve substrate replacing construction.

The shortening of substrate replacing construction is not limited to exposure device, but take substrates such as glass substrates as the substrate of process object The common project of processing unit.

Existing technical literature

Patent document

No. 2010/0018950 specification of [patent document 1] U.S. Patent Application Publication No..

Summary of the invention

To the means to solve the problem

Inventor realize can with high speed and high precision guidance object (substrate), further seek miniaturization, lightweight Bearing table device, observe bearing table device again.As a result, area is 3m diagonally and the substrate weight of thickness 0.7mm degree omits Lower than 20kg, in contrast, the weight of the substrate holding of supporting substrates is about 1 ton.Therefore, supporting substrates keep the platform of tool also Become heavier.Also cognition is arrived again, if can make to be connected to holding by if the substrate holding lightweight for being located at front end Each composition part, Yi Jitai, weight under tool offset all part lightweights such as device (stem) and guiding element.

The dominant role of substrate holding is will be thin and be also easy to produce the substrate of tilting and/or flexure to correct be flat.Therefore, Existing substrate holding has the area roughly the same with substrate, and substrate is attached to substrate holding in a manner of such as vacuum suction Surface (above).Therefore, as the substrate holding surface of datum plane flatness must be made it is high and for ensure rigidity and Increasing thickness causes weight to increase.

On the other hand, in large-scale projection aligner of step-scan mode etc., can single exposure single exposure region (also known as irradiation area) be configured to it is small compared with the area of substrate entirety, and can not with single pass expose make substrate blanket exposure. Therefore, make substrate blanket exposure by the way that scan exposure is repeated and is not accompanied by the stepping movement of exposure.However, substrate must be tieed up Maintaining an equal level smooth is only (irradiation area) in the scanning range of single exposure, is only consolidating with the irradiation of projection optics system strictly speaking Fixed range of exposures.Range in addition to this and the stepping for being not accompanied by exposure it is mobile in, then need not especially take notice of the flat of substrate Property.

Therefore, inventor by correct substrate be allowed to flat substrate holding be made with exposure field (field) substantially The width (compared with the slightly wide degree of exposure field) of same cross scanning direction, the length of scanning direction are made at least compared with can single exposure Sweep length more than.Thought simultaneously at the end of through the single exposure of scanning, even if sweeping on the substrate of next exposure Retouch in exposure area (irradiation area) phase shift to substrate holding, carry out at this moment every time the alignment of plane rectification and substrate with It is scanned exposure.In this way, which the area of substrate holding can become smaller, the platform of bearing also becomes smaller and makes fine motion Microscope carrier entirety small-size light-weight.

The present invention, be inventor it is above-mentioned consider under form, use composition below.

The 1st substrate board treatment that 1st aspect of the invention provides, is to handle substrate, have: the 1st moving body has The maintaining part that a part of the substrate is kept in the state of ensuring flatness, opposing substrate processing position be displaced into At least the 1st direction in the parallel set face in the face of the substrate；And step drive device, which is driven in the set face It moves in 2nd direction orthogonal with the 1st direction.

According to the invention, the 1st moving body phase of a part of substrate is kept in the state of ensuring flatness with maintaining part Movement to the 1st direction of substrate processing position, be using the substrate of step drive device in the 2nd direction it is mobile before and after into Therefore row, carries out the processing to multiple regions processed on substrate accordingly, can reduce the maintaining part for keeping substrate and then make to have There is the moving body of the maintaining part small-sized and lightweight.Accordingly, the position control of moving body can be promoted and reduce processing substrate The production cost of device.

The 2nd substrate board treatment that 2nd aspect of the invention provides, is to handle substrate, have: the 1st moving body has Keep the maintaining part that a part in the face of the processed surface opposite side of the substrate of configuration is parallel to the horizontal plane, opposing substrate processing Position, at least the 1st direction in the set face parallel with the face of the substrate are mobile；A pair of 1st supporting arrangement, clips the 1st Moving body the 2nd direction two sides orthogonal with the 1st direction in the set face are respectively configured, and have at least one of the substrate It point supported from below, in the size in the 1st direction and the 2nd direction be the bearing surface more than same with the substrate；And the 1st Carrying device, at least when moving out the substrate from the 1st moving body, at this in such a way that the substrate is in the displacement of the 2nd direction The substrate is transported in set face.

According to the invention, the maintaining part of the 1st moving body keeps a part with the face of processed surface opposite side of substrate.Also That is, the substrate retaining surface of maintaining part is set as small compared with substrate.Therefore, the 1st carrying device is moving out substrate from the 1st moving body When, substrate is transported in set face in a manner of in the displacement of the 2nd direction, at this point, the 1st carrying device only needs to make substrate toward the The small distance of size of the 2 directions displacement compared with substrate in the 2nd direction, after moving out for end substrate.Therefore, it is compared with the prior art, It can be shortened the substrate replacing construction for moving out Distance Shortened point.

3rd aspect of the invention provides a kind of manufacturing method, includes: in the substrate board treatment of the 1st and the 2nd aspect Any one, have to configuration in substrate processing position, the processing region irradiation energy beam being set so as to pass through processing region Base plate exposure exposing optical system when, the movement of base plate exposure is made using the substrate board treatment, and make exposure after it is upper State the movement of substrate development.

4th aspect of the invention provides a kind of manufacturing method of flat-panel monitor, includes: at the substrate of the 1st and the 2nd aspect Any one of device is managed, is had to configuration in substrate processing position, the processing region irradiation energy beam being set so as to pass through When the exposing optical system of the base plate exposure of processing region, the substrate board treatment is used to make as substrate for flat-panel monitor Base plate exposure movement, and make exposure after aforesaid substrate development movement.

The 1st substrate processing method using same that 5th aspect of the invention provides includes: by a part of the substrate to handle substrate Moving body is held in the state of ensuring flatness, by moving body opposing substrate processing position driving in the face with the substrate The 1st direction in parallel set face, the movement of set processing is carried out with the region in a part to the substrate；And it is Make the untreated areas and moving body opposite direction on the substrate, and carries out the substrate is past in the set face with respect to the moving body 2nd direction orthogonal with the 1st direction drives the movement of both quantitative stepper drive.

According to the method, be by carrying out set processing before and after carrying out stepper drive, it is multiple on substrate to handle Region processed.Therefore, can make to keep the moving body of substrate small-sized and lightweight.In this way, the position control of moving body can be promoted Property processed, the production cost for reducing substrate board treatment.

The 2nd substrate processing method using same that 6th aspect of the invention provides includes: will be configured to and horizontal plane handling substrate The parallel substrate is held in moving body with a part in the face of processed surface opposite side in the state of ensuring flatness, will The moving body opposing substrate handles position driving in the 1st direction in the set face parallel with the face of the substrate, to the substrate The a part in region carry out the movement of set processing；And the substrate of the set processing will be applied in the set face 2nd direction orthogonal with the 1st direction transports the distance short compared with the size in the 2nd direction of the substrate, by the substrate from the shifting The movement that kinetoplast moves out.

According to the method, be will apply the substrate (processing complete substrate) of set processing in set face with the 1st direction The 2nd orthogonal direction transports the short distance of the size compared with substrate in the 2nd direction, and substrate is moved out from moving body.Therefore, and now There is technology to compare, can be shortened the substrate replacing construction for moving out Distance Shortened point.

The 3rd substrate processing method using same that 7th aspect of the invention provides, is included: will be parallel to the horizontal plane to handle substrate The moving body that the face of the processed surface opposite side of the substrate of configuration is kept in the state of ensuring flatness, opposing substrate Position driving is handled in the 1st direction in the set face parallel with the face of the substrate, to multiple areas processed on the substrate The movement of domain sequentially set processing；And determine according to the configuration of multiple region processed on the substrate with processing sequence The 1st direction position, moved toward the substrate is transported according to the configuration and the fixed direction of the sequence with what the moving body moved out Make.

It is by substrate according to the configuration in region processed on substrate and the fixed set face of processing sequence according to the method The position in the 1st interior direction, conveying is according to above-mentioned configuration and the fixed direction of said sequence, to move out from moving body.Therefore, Substrate can be moved out from moving body along the shortest path in path is moved out.Therefore, the not configuration by region processed on substrate and place It makes restraining for sequence in order, and is compared in the 1st certain direction position toward the situation that the same direction moves out with perseverance, can be shortened substrate replacement Time.

8th aspect of the invention provides a kind of manufacturing method, included in the substrate processing method using same of the 5th to the 7th aspect When any one makes the method for base plate exposure, the movement of base plate exposure is made using the substrate processing method using same, and is made upper after exposure State the movement of substrate development.

9th aspect of the invention provides a kind of manufacturing method of flat-panel monitor, includes: at the substrate of the 5th to the 7th aspect When any one in reason method makes the method for base plate exposure, the substrate processing method using same is used to make as substrate for flat-panel monitor Base plate exposure movement, and make exposure after aforesaid substrate development movement.

10th aspect of the invention provides a kind of exposure method, exposes multi-piece substrate: can keep 2 plate bases individually in having The base plate keeping device of the 1st and the 2nd holding area load 2 plate base, the exposure of the substrate in 2 plate base starts During until terminating, the exposure of at least one processing region of another substrate is carried out.

According to the situation of the exposure for another substrate of beginning that begins after the end exposure of the substrate in the method, with 2 plate bases It compares, the exposure to 2 plate bases can be terminated with shorter time.

11st aspect of the invention provides a kind of manufacturing method, includes: exposing substrate with the exposure method of the 10th aspect The movement of light, and make the movement of the aforesaid substrate development after exposure.

12nd aspect of the invention provides a kind of manufacturing method of flat-panel monitor, includes: with the exposure method of the 10th aspect Make the movement of the base plate exposure for flat-panel monitor as substrate, and makes the movement of the aforesaid substrate development after exposure.

13rd aspect of the invention provides a kind of exposure device, exposes the multiple regions on substrate, has: substrate keeps dress It sets, there is the 1st and the 2nd holding area of a part that can keep substrate respectively；Moving body is equipped with the substrate in a part and keeps Device is displaced into the 1st direction；And the 1st base-board conveying device, it is displaced into the 1st direction with moving body one, and make this Substrate is displaced into the 2nd direction intersected with the 1st direction.

According to this device, each a part of 2 plate bases can be loaded into respectively to the 1st holding area of base plate keeping device Domain, the 2nd holding area, aforesaid substrate holding meanss can be displaced into the 1st direction so that a base with part thereof of moving body is set to The movement of the scanned exposure of the processing region of a part of plate is parallel, makes another substrate with the 1st base-board conveying device opposing substrate Holding meanss are displaced into the 2nd direction.In this way, with the 1st plate base is directed in the exposure of a processing region (unexposed area) After light, keep the substrate stepping mobile so that the exposure and stepping movement of next processing region (unexposed area) exposure are handed over It mutually alternates to carry out the exposure of the substrate, and is compared for the 2nd plate base with the situation that identical program is exposed, can be shortened 2 The exposure-processed spent time of plate base.

14th aspect of the invention provides a kind of manufacturing method, includes: exposing substrate with the exposure device of the 13rd aspect The movement of light, and make the movement of the aforesaid substrate development after exposure.

15th aspect of the invention provides a kind of manufacturing method of flat-panel monitor, includes: with the exposure device of the 13rd aspect Make the movement of the base plate exposure for flat-panel monitor as substrate, and makes the movement of the aforesaid substrate development after exposure.

Detailed description of the invention

Fig. 1 is the figure of the composition for the exposure device that outline shows the 1st implementation form.

Fig. 2 is to show that top view is omitted in the part of the exposure device of the 1st implementation form.

Fig. 3 is to show the exposure device of the 1st implementation form from the +X direction of Fig. 1, a part of outline side is omitted View.

Fig. 4 is the output for showing the main control unit constituted centered on the control system of the exposure device of the 1st implementation form Enter the block diagram of relationship.

Fig. 5 be to illustrate to carry out with the exposure device of the 1st implementation form be the series of actions of processing substrate figure (1).

Fig. 6 be to illustrate to carry out with the exposure device of the 1st implementation form be the series of actions of processing substrate figure (2).

Fig. 7 be to illustrate to carry out with the exposure device of the 1st implementation form be the series of actions of processing substrate figure (3).

Fig. 8 be to illustrate to carry out with the exposure device of the 1st implementation form be the series of actions of processing substrate figure (4).

Fig. 9 be to illustrate to carry out with the exposure device of the 1st implementation form be the series of actions of processing substrate figure (5).

Figure 10 be to illustrate to carry out with the exposure device of the 1st implementation form be the series of actions of processing substrate figure (6).

Figure 11 be to illustrate to carry out with the exposure device of the 1st implementation form be the series of actions of processing substrate figure (7).

Figure 12 be to illustrate to carry out with the exposure device of the 1st implementation form be the series of actions of processing substrate figure (8).

Figure 13 be to illustrate to carry out with the exposure device of the 1st implementation form be the series of actions of processing substrate figure (9).

Figure 14 is the figure of the composition for the exposure device that outline shows the 2nd implementation form.

Figure 15 is the top view for omitting a part of exposure device of the 2nd implementation form.

Figure 16 is the outline side view for showing the part of the exposure device of the 2nd implementation form from the +X direction of Figure 14 and omitting Figure.

Figure 17 is the top view for the baseplate carrier device for showing that the exposure device of the 3rd implementation form has.

Figure 18 is the outline side view for showing the part of the exposure device of the 3rd implementation form from the +X direction of Figure 17 and omitting Figure

Figure 19 is the figure to illustrate the variation of the 3rd implementation form.

Figure 20 is the top view for the baseplate carrier device for showing that the exposure device of the 4th implementation form has.

Figure 21 is the outline side view for showing the part of the exposure device of the 4th implementation form from the +X direction of Figure 20 and omitting Figure

Figure 22 is the figure of the composition for the exposure device that outline shows the 5th implementation form.

Figure 23 is the top view for showing the part of the exposure device of the 5th implementation form and omitting.

Figure 24 is the outline side view for showing the part of the exposure device of the 5th implementation form from the +X direction of Figure 22 and omitting Figure

Figure 25 is the top view for showing the part of the exposure device of the 6th implementation form and omitting.

Figure 26 be show the XZ sectional view by the exposure device of the 6th implementation form give part omission figure, and be to Illustrate the figure (1) of series of actions when carrying out processing substrate with the exposure device.

Figure 27 is the figure to illustrate series of actions when carrying out processing substrate with the exposure device of the 6th implementation form (2).

Figure 28 is the figure to illustrate series of actions when carrying out processing substrate with the exposure device of the 6th implementation form (3).

Figure 29 is the figure to illustrate series of actions when carrying out processing substrate with the exposure device of the 6th implementation form (4).

Figure 30 is the figure of the composition for the exposure device that outline shows the 7th implementation form.

Figure 31 is the top view for showing the part of the exposure device of the 7th implementation form and omitting.

Figure 32 is side view (the part omission, portion for showing the exposure device of the 7th implementation form from the +X direction of Figure 30 Divide the figure shown with section).

Figure 33 is the output for showing the main control unit constituted centered on the control system of the exposure device of the 7th implementation form Enter the block diagram of relationship.

Figure 34 be to illustrate to carry out with the exposure device of the 7th implementation form be the series of actions of processing substrate figure (1).

Figure 35 be to illustrate to carry out with the exposure device of the 7th implementation form be the series of actions of processing substrate figure (2).

Figure 36 be to illustrate to carry out with the exposure device of the 7th implementation form be the series of actions of processing substrate figure (3).

Figure 37 be to illustrate to carry out with the exposure device of the 7th implementation form be the series of actions of processing substrate figure (4).

Figure 38 be to illustrate to carry out with the exposure device of the 7th implementation form be the series of actions of processing substrate figure (5).

Figure 39 be to illustrate to carry out with the exposure device of the 7th implementation form be the series of actions of processing substrate figure (6).

Figure 40 be to illustrate to carry out with the exposure device of the 7th implementation form be the series of actions of processing substrate figure (7).

Figure 41 be to illustrate to carry out with the exposure device of the 7th implementation form be the series of actions of processing substrate figure (8).

Figure 42 be to illustrate to carry out with the exposure device of the 7th implementation form be the series of actions of processing substrate figure (9).

Figure 43 be to illustrate to carry out with the exposure device of the 7th implementation form be the series of actions of processing substrate figure (10).

Figure 44 be to illustrate to carry out with the exposure device of the 7th implementation form be the series of actions of processing substrate figure (11).

Figure 45 be to illustrate to carry out with the exposure device of the 7th implementation form be the series of actions of processing substrate figure (12).

Figure 46 be to illustrate to carry out with the exposure device of the 7th implementation form be the series of actions of processing substrate figure (13).

Figure 47 be to illustrate to carry out with the exposure device of the 7th implementation form be the series of actions of processing substrate figure (14).

Figure 48 be to illustrate to carry out with the exposure device of the 7th implementation form be the series of actions of processing substrate figure (15).

Figure 49 be to illustrate to carry out with the exposure device of the 7th implementation form be the series of actions of processing substrate figure (16).

Figure 50 is the figure of the composition for the exposure device that outline shows the 8th implementation form.

Figure 51 is the top view for showing the part of the exposure device of the 8th implementation form and omitting.

Figure 52 be to illustrate to carry out with the exposure device of the 8th implementation form be the series of actions of processing substrate figure (1).

Figure 53 be to illustrate to carry out with the exposure device of the 8th implementation form be the series of actions of processing substrate figure (2).

Figure 54 be to illustrate to carry out with the exposure device of the 8th implementation form be the series of actions of processing substrate figure (3).

Figure 55 be to illustrate to carry out with the exposure device of the 8th implementation form be the series of actions of processing substrate figure (4).

Figure 56 be to illustrate to carry out with the exposure device of the 8th implementation form be the series of actions of processing substrate figure (5).

Figure 57 be to illustrate to carry out with the exposure device of the 8th implementation form be the series of actions of processing substrate figure (6).

Figure 58 be to illustrate to carry out with the exposure device of the 8th implementation form be the series of actions of processing substrate figure (7).

Figure 59 be to illustrate to carry out with the exposure device of the 8th implementation form be the series of actions of processing substrate figure (8).

Figure 60 be to illustrate to carry out with the exposure device of the 8th implementation form be the series of actions of processing substrate figure (9).

Figure 61 be to illustrate to carry out with the exposure device of the 8th implementation form be the series of actions of processing substrate figure (10).

Figure 62 be to illustrate to carry out with the exposure device of the 8th implementation form be the series of actions of processing substrate figure (11).

Figure 63 be to illustrate to carry out with the exposure device of the 8th implementation form be the series of actions of processing substrate figure (12).

Figure 64 be to illustrate to carry out with the exposure device of the 8th implementation form be the series of actions of processing substrate figure (13).

Figure 65 be to illustrate to carry out with the exposure device of the 8th implementation form be the series of actions of processing substrate figure (14).

Figure 66 is the figure to illustrate the variation using supporting member for substrate.

Figure 67 is the figure of the composition for the exposure device that outline shows the 9th implementation form.

Figure 68 is the top view for showing the part of the exposure device of the 9th implementation form and omitting.

Figure 69 is the outline side view for showing the part of the exposure device of the 9th implementation form from the +X direction of Figure 67 and omitting Figure.

Figure 70 is that a part of the top view of acquisition Figure 68 is amplified the figure of display.

Figure 71 is the output for showing the main control unit constituted centered on the control system of the exposure device of the 9th implementation form Enter the block diagram of relationship.

Figure 72 is the exposure program explanatory diagram (1) carried out with the exposure device of the 9th implementation form.

Figure 73 is the exposure program explanatory diagram (2) carried out with the exposure device of the 9th implementation form.

Figure 74 is the exposure program explanatory diagram (3) carried out with the exposure device of the 9th implementation form.

Figure 75 A~Figure 75 D is the Y stepwise operation to the exposure and substrate P 1 that illustrate the irradiation area SA1 of substrate P 2 The figure of parallel processing.

Figure 76 is the exposure program explanatory diagram (4) carried out with the exposure device of the 9th implementation form.

Figure 77 is the exposure program explanatory diagram (5) carried out with the exposure device of the 9th implementation form.

Figure 78 is the exposure program explanatory diagram (6) carried out with the exposure device of the 9th implementation form.

Figure 79 is the exposure program explanatory diagram (7) carried out with the exposure device of the 9th implementation form.

Figure 80 is the exposure program explanatory diagram (8) carried out with the exposure device of the 9th implementation form.

Figure 81 is the exposure program explanatory diagram (9) carried out with the exposure device of the 9th implementation form.

Figure 82 is the exposure program explanatory diagram (10) carried out with the exposure device of the 9th implementation form.

Figure 83 is the exposure program explanatory diagram (11) carried out with the exposure device of the 9th implementation form.

Figure 84 is the exposure program explanatory diagram (12) carried out with the exposure device of the 9th implementation form.

Figure 85 is the exposure program explanatory diagram (13) carried out with the exposure device of the 9th implementation form.

Figure 86 is the exposure program explanatory diagram (14) carried out with the exposure device of the 9th implementation form.

Figure 87 is the exposure program explanatory diagram (15) carried out with the exposure device of the 9th implementation form.

Figure 88 is the exposure program explanatory diagram (16) carried out with the exposure device of the 9th implementation form.

Figure 89 is the exposure program explanatory diagram (17) carried out with the exposure device of the 9th implementation form.

Figure 90 is the exposure program explanatory diagram (18) carried out with the exposure device of the 9th implementation form.

Figure 91 is the exposure program explanatory diagram (19) carried out with the exposure device of the 9th implementation form.

Figure 92 is the exposure program explanatory diagram (20) carried out with the exposure device of the 9th implementation form.

Figure 93 is the exposure program explanatory diagram (21) carried out with the exposure device of the 9th implementation form.

Figure 94 is the exposure program explanatory diagram (22) carried out with the exposure device of the 9th implementation form.

Figure 95 is the exposure program explanatory diagram (23) carried out with the exposure device of the 9th implementation form.

Figure 96 is the exposure program explanatory diagram (24) carried out with the exposure device of the 9th implementation form.

Figure 97 is the exposure program explanatory diagram (25) carried out with the exposure device of the 9th implementation form.

Figure 98 is the exposure program explanatory diagram (26) carried out with the exposure device of the 9th implementation form.

Figure 99 is the exposure program explanatory diagram (27) carried out with the exposure device of the 9th implementation form.

Figure 100 is the exposure program explanatory diagram (1) carried out with the exposure device of the variation of the 9th implementation form.

Figure 101 is the exposure program explanatory diagram (2) carried out with the exposure device of the variation of the 9th implementation form.

Figure 102 is the exposure program explanatory diagram (3) carried out with the exposure device of the variation of the 9th implementation form.

Figure 103 is the exposure program explanatory diagram (4) carried out with the exposure device of the variation of the 9th implementation form.

Figure 104 is the exposure program explanatory diagram (5) carried out with the exposure device of the variation of the 9th implementation form.

Figure 105 is the exposure program explanatory diagram (6) carried out with the exposure device of the variation of the 9th implementation form.

Figure 106 is the exposure program explanatory diagram (7) carried out with the exposure device of the variation of the 9th implementation form.

Figure 107 is the exposure program explanatory diagram (8) carried out with the exposure device of the variation of the 9th implementation form.

Figure 108 is the exposure program explanatory diagram (9) carried out with the exposure device of the variation of the 9th implementation form.

Figure 109 is the exposure program explanatory diagram (10) carried out with the exposure device of the variation of the 9th implementation form.

Figure 110 is the exposure program explanatory diagram (11) carried out with the exposure device of the variation of the 9th implementation form.

Figure 111 is the exposure program explanatory diagram (12) carried out with the exposure device of the variation of the 9th implementation form.

Figure 112 is the exposure program explanatory diagram (13) carried out with the exposure device of the variation of the 9th implementation form.

Figure 113 is the exposure program explanatory diagram (14) carried out with the exposure device of the variation of the 9th implementation form.

Figure 114 is the exposure program explanatory diagram (15) carried out with the exposure device of the variation of the 9th implementation form.

Figure 115 is the top view that the part of the exposure device of the 10th implementation form is omitted.

Figure 116 is the outline for showing the part of the exposure device of the 10th implementation form from the +X direction of Figure 115 and omitting Side view.

Figure 117 is the figure to the effect for illustrating the exposure device of the 10th implementation form.

Figure 118 is the outline side view for showing the exposure device of variation of the 10th implementation form.

Figure 119 is the top view for showing the part of the exposure device of variation of the 10th implementation form and omitting.

Figure 120 is the figure of the composition for the exposure device that outline shows the 11st implementation form.

Appended drawing reference

14 exposure mask interferometer systems

16 lens barrel platforms

18 baseplate carrier pallets

20 side frames

24,24 ' coarse motion microscope carrier

26 fine motion microscope carriers

28 weight offset device

30A, 30B, 30A ', 30B ' X beam

32A, 32B coarse motion platform

33 supporting members

34 foots

35 supporting members

36 x-ray guiding elements

38A, 38B X stator

40A, 40B X can movers

42A, 42B x-ray motor

44 saddles

46A, 46B x-ray encoder system

The gap 48A, 48B sensor

50 main control units

51,51A, 51B keep tool suction and discharge switching device

52 fine motion microscope carriers driving system

54X X voice coil motor

54Y Y voice coil motor

54Z Z voice coil motor

56,59,60 stator

It 58,57,62 can mover

61x X frame component

61y Y frame component

64 baskets

65 holding units

66 air springs

68 Z saddles

69 supporting member for substrate

70 base wads

71 wrists

72 target plates

74 reflection type optical sensors

76 Z inclination measurement systems

78 levelling devices

78a fixed part

78b movable part

80 connection devices

82 X guides

84,84A~84J air flotation cell

84H ', 84I ' air flotation cell

85 gas supply devices

88 substrate Y stepping conveyers

88a movable part

88b fixed part

89 supporting members

90 driving devices

91 substrate X stepping conveyers

91a movable part

91b fixed part

92 position reading out device

94X₁、94X₂X moving lens

94Y Y moving lens

95 driving devices

96 reflecting mirror holding members

96A bracket

98 laser interferometer systems

98X X laser interferometer

98X₁、98X₂X interferometer

98Y Y laser interferometer

98Y₁、98Y₂Y interferometer

100,200,500,700,800,900,1000,1100 exposure device

102,102A, 102B interferometer column

104,104 ' supporting member

110,110A, 100B, 110A ', 110B ' frame

112 supporting members

120 moving substrate Y stepping conveyers

The holding area of ADA1, ADA2 substrate holding

BD body

The exposure area IA

IL illumination light

IOP illumination system

The ground F

M exposure mask

MST exposure mask microscope carrier

P, P1, P2, P3, P4 substrate

PH substrate holding

PL projection optics system

PM alignment mark

PST baseplate carrier device

PSTa~PSTi baseplate carrier device

SA1~SA6 irradiation area

Specific embodiment

" the 1st implementation form "

Hereinafter, illustrating the 1st implementation form according to Fig. 1~Figure 13.

Fig. 1 is the figure of the composition for the exposure device 100 that outline shows the 1st implementation form, and Fig. 2 shows omission exposure device The top view of 100 a part.Fig. 2 is equivalent to the part below the projection optics system PL compared with Fig. 1 (below more aftermentioned lens barrel platform Part) top view.Exposure device 100 is for the system such as flat-panel monitor, liquid crystal display device (liquid crystal display panel) It makes.Exposure device 100 be with rectangle (square) the glass substrate P of display panel for liquid crystal display device etc. (hereinafter referred to as For substrate P) be exposure object object projection aligner.

Exposure device 100, have illumination be IOP, keep the exposure mask microscope carrier MST of exposure mask M, projection optics system PL, equipped with The body BD (a part is only shown in Fig. 1 etc.) of exposure mask microscope carrier MST and projection optics system PL etc., the fine motion comprising keeping substrate P The baseplate carrier device PST of microscope carrier 26 (Substrate table) and this etc. control system etc..Hereinafter, being exposure mask M and substrate P phase when setting exposure Direction to projection optics system PL difference relative scanning is X-direction (X-direction), direction orthogonal with this in the horizontal plane is Y Axis direction (Y-direction), the direction orthogonal with X-axis and Y-axis are Z-direction (Z-direction), around the rotation (inclination) of X-axis, Y-axis and Z axis Direction is set to θ x, θ y and the direction θ z then to be illustrated.

Illumination is IOP, be with such as 6,552, No. 775 specifications of U.S. Patent No. etc. it is revealed illumination be identical structure At.Also that is, it is to make the light projected from light source (not shown) (such as mercury vapor lamp) respectively through not shown reflection that illumination, which is IOP, Mirror, spectroscope, optical gate (shutter), wavelength selective filters, various lens etc. and as exposure illumination light (illumination light) IL It is irradiated in exposure mask M.Illumination light IL uses such as i line (wavelength 365nm), g line (wavelength 436nm), h line (wavelength 405nm) etc. Light (or synthesis light of above-mentioned i line, g line, h line).In addition, the wavelength of illumination light IL can be by wavelength selective filters according to for example What required resolution was suitable for is switched.

In exposure mask microscope carrier MST, its pattern plane is fixed in a manner of such as vacuum suction (or Electrostatic Absorption) (below Fig. 1) It is formed with the exposure mask M of circuit pattern etc..Exposure mask microscope carrier MST, for example, by be fixed on the air bearing (not shown) of its bottom surface with Contactless state is supported on the exposure mask platform (not shown) of a part for constituting body BD.Exposure mask microscope carrier MST is for example, by packet Exposure mask microscope carrier driving containing linear electric machine is 12 (not showing in Fig. 1, reference Fig. 4), is driven in scanning direction with predetermined stroke (X-direction) and respectively it is appropriate by micro-move device in Y direction and the direction θ z.Exposure mask microscope carrier MST believes in the position in X/Y plane Breath (rotation information in the direction z containing θ) is surveyed with exposure mask laser interferometer system 14 (hereinafter, claiming " exposure mask interferometer system ") Amount, this exposure mask laser interferometer system 14 include to irradiate distance measuring light beam to the reflecting surface set on (or being formed in) exposure mask microscope carrier MST Multiple laser interferometer.

Lower section of the projection optics system PL in Fig. 1 of exposure mask microscope carrier MST, the lens barrel for being supported in a part of body BD are flat Platform 16.Projection optics system PL has identical as such as revealed projection optics system of No. 6,552,775 specifications of U.S. Patent No. Composition.Also that is, the view field that projection optics system PL includes the pattern image of exposure mask M is configured to for example jagged multiple projections Optical system (poly-lens projection optics system), function with have using Y direction as the single oblong-shaped image field of longitudinal direction Projection optics system is equal.In this implementation form, each system of multiple projection optics systems, which uses with the equimultiple of such as two sides telecentricity, is Form upright erect image person.Also, the saw-toothed multiple view fields of the configuration of projection optics system PL are referred to as exposure region below Domain IA.

Therefore, when the illumination region on exposure mask M is the illumination light IL illumination of IOP from illumination, i.e., by by covering The illumination light IL of film M, by projection optics system PL, by the projection image of the circuit pattern of the exposure mask M in the illumination region, (part is just Standing statue) be formed in configuration in the substrate P that the image planes side of projection optics system PL, surface are coated with photoresist (induction agent) with above-mentioned photograph Irradiation area (exposure area) IA of the illumination light IL of area pellucida domain conjugation.And passes through exposure mask microscope carrier MST and keep the aftermentioned of substrate P The synchronous driving of substrate holding PH (fine motion microscope carrier 26), opposite illumination region (illumination light IL) makes exposure mask M be displaced into scanning side To (X-direction) and relative exposure region (illumination light IL) is displaced into substrate P scanning direction (X-direction), carries out in substrate P The scan exposure of the 1 irradiation region (shot) (zoning region), in the pattern of irradiation (shot) the region transfer mask M.Also that is, Exposure device 100 is IOP and projection optics system PL in the pattern for generating exposure mask M in substrate P by illumination, by using illumination light Being exposed in substrate P for inductive layer (photoresist layer) forms the pattern in the substrate P of IL.

Body BD, as Fig. 2 and by from +X direction the outline side view of exposure device 100 a part omit Fig. 3 It is shown, have: parallel to each other and configured as longitudinal direction using Y direction by being separated by both set a distances in X-direction on the F of ground Cuboid component constitute a pair (2) baseplate carrier pallet (hreinafter referred to as pallet) 18, on a pair of of pallet 18 pass through one Horizontal lens barrel platform 16 and exposure mask platform (not shown) are supported to side frame 20.Also, pallet 18 is not limited to 2, it can To be 1, can also be 3 or more.

Each pallet 18 is arranged on the F of ground (referring to Fig.1 and Fig. 3) by multiple antihunting devices 22.A pair of of side frame 20, such as Shown in Fig. 2 and Fig. 3, the lower end of each side frame 20 is connected to Y direction one end and the other end above a pair of of pallet 18 Portion.Lens barrel platform 16 with X/Y plane configured in parallel by being constituted by the rectangular-shape component of longitudinal direction of Y direction, in a pair The both ends of Y direction are supported from below by a pair of of side frame 20 on pallet 18.

Baseplate carrier device PST, as shown in Figure 1, having coarse motion microscope carrier portion 24, fine motion microscope carrier 26 and weight to offset device 28 Deng.Weight offsets device 28, and as shown in Figures 1 and 3, configuration is flat with the X/Y plane of X guide 82 on being configured at a pair of of pallet 18 On the upper surface of row.

Coarse motion microscope carrier portion 24, as shown in figure 3, have 2 (a pair) X beam 30A, 30B, 2 (a pair) coarse motion platform 32A, 32B and by each multiple foots 34 supported on the F of ground respectively of 2 X beams 30A, 30B.

X beam 30A, 30B it is each by extending X-direction, YZ section be rectangular box-like and internal hollow with flank Component is constituted, in Y direction with predetermined distance configuration parallel to each other (referring to Fig.1~Fig. 3).X beam 30A, 30B's is each, such as For shown in X beam 30A in Fig. 1, at longitudinal direction (X-direction) both ends nearby with central portion 3 at, pass through 3 foots 34 In on the F of ground, opposed pair pallet 18 is supported with non-contact from below.In this way, coarse motion microscope carrier portion 24 is opposed pair frame Platform 18 separates in vibration.Also, the configuration of foot 34 and quantity can arbitrarily be set.In addition, X beam 30A, 30B be not limited to it is hollow Component can be middle real component, can also be the rod member that YZ section is I type.

It is the upper surface of each in X beam 30A, 30B, in Y direction with predetermined distance it is parallel to each other be fixed with multiple (such as 2 (a pair)) extend the x-ray guiding element 36 of X-direction.Also, the upper surface of each in X beam 30A, 30B, a pair of of x-ray guiding element Region between 36 is fixed with X stator 38A, the 38B for extending X-direction.X stator 38A, 38B's is each, have comprising Such as the magnet unit of the multiple permanet magnets arranged in X-direction with predetermined distance.In this implementation form, such as Fig. 2 and Fig. 3 institute Show, the section shape of X beam 30A, 30B, though width of the X beam 30A of the side+Y compared with the X beam 30B of the side-Y be big that is, the length of Y direction Degree is longer, but can also be same shape.

Coarse motion platform 32A, 32B, as shown in figure 3, the top that configuration respectively is each in X beam 30A, 30B.Positioned at the side-Y Coarse motion platform 32B is made of the tabular component of vertical view rectangle, and the coarse motion platform 32A positioned at the side+Y then has recess portion by the side end-Y The tabular component for overlooking U-shaped is constituted.In Fig. 3, coarse motion platform 32A and aftermentioned weight payment device 28 are all parts with sectional view Display.Below coarse motion platform 32A, 32B are each, fixed as shown in figure 3, being fixed with and being fixed on each X of X beam 30A, 30B Sub- 38A, 38B can mover 40A, 40B across the X of given clearance (gap, clearance) opposite direction.X can mover 40A, 40B it is each It is a, such as comprising coil unit (not shown), respectively constituted together with X stator 38A, 38B by coarse motion platform 32A, 32B with set Stroke drives in x-ray motor 42A, 42B of X-direction.

Also, below coarse motion platform 32A, 32B are each, as shown in figure 3, be fixed with comprising rolling element (not shown) (for example, Multiple balls etc.), multiple saddles 44 that each x-ray guiding element 36 is slidably engaged.Saddle 44, to each x-ray guiding element 36 are equipped with such as 4 (referring to Fig.1) in X-direction with predetermined distance, below coarse motion platform 32A, 32B are each, are fixed with example Such as add up to 8 saddles 44.Coarse motion platform 32A, 32B's is each, leads by the inclusion of x-ray guiding element 36 and multiple x-rays of saddle 44 Part device, it is straight to be guided in X-direction.

In addition, in FIG. 1 to FIG. 3 although not shown, each in X beam 30A, 30B is fixed with using X-direction as period direction X scale (scale), in each of coarse motion platform 32A, 32B, then be fixed with composition using X scale with find out coarse motion platform 32A, 32B in The encoder head of x-ray encoder system 46A, 46B (referring to Fig. 4) of the location information of X-direction.

Coarse motion platform 32A, 32B is according to the output of above-mentioned encoder head with main control unit 50 in the position of X-direction (referring to Fig. 4) is controlled.Although also, similarly not shown into Fig. 3 in Fig. 1, in each of coarse motion platform 32A, 32B, peace Equipped with to measure fine motion microscope carrier 26 to coarse motion platform 32A, 32B in the rate of travel (relative shift) of X-axis and Y direction Gap sensor 48A, 48B (referring to Fig. 4) etc..Main control unit 50, in the relative movement measured with gap sensor 48A, 48B When amount reaches both situations of limit value, stop fine motion microscope carrier 26 and coarse motion platform 32A, 32B immediately.Certainly, it also may replace gap Sensor 48A, 48B or along with mechanically limitation fine motion microscope carrier 26 with respect to coarse motion platform 32A, 32B removable momentum machine Tool brake component.

Herein, though declaration order is slightly inverted, then illustrate fine motion microscope carrier 26.Fine motion microscope carrier 26, can by Fig. 1 and Fig. 3 It knows, is made of plate (or box-shaped) component of vertical view rectangle, face mounted board keeps tool PH thereon.Substrate holding PH, The length of its X-direction and substrate P are same, and the width (length) of Y direction is then about 1/2 (referring to Fig. 2) of substrate P.Substrate Tool PH is kept, by a part (herein, being about 1/2 part of Y direction of substrate P) of substrate P with such as vacuum suction (or electrostatic Absorption) mode adsorbed holding, and can spray upwards gas-pressurized (such as pressure-air) with the ejection pressure from below with A part (about the 1/2 of substrate P) of non-contact (suspension) mode supporting substrates P.Pressure-air of the substrate holding PH to substrate P Ejection and vacuum suction switching, be by by substrate holding PH switching be connected to vacuum pump and pressure-air (not shown) The holding tool suction and discharge switching device 51 (referring to Fig. 4) in source, is carried out with main control unit 50.

It is 52 (referring to figure that fine motion microscope carrier 26 can be driven by the fine motion microscope carrier comprising multiple voice coil motors (or linear electric machine) 4), on coarse motion platform 32A micro-move device in 6DOF direction (X-axis, Y-axis, all directions of Z axis, θ x, θ y and θ z).

In detail, as shown in Figure 1, above the side end+X of coarse motion platform 32A, stator is equipped with by supporting member 33 56, it is opposite with this, in the side+X side of fine motion microscope carrier 26 be fixed with together with stator 56 constitute X voice coil motor 54X can Mover 58.Herein, in fact, being that the X voice coil motor 54X of identical composition is separated by both set a distance setting a pair in Y direction.

Also, as shown in figure 3, being set in the substantial middle position of Y direction by supporting member 35 on coarse motion platform 32A There is stator 60, is fixed with together with stator 60 in the side+Y side of fine motion microscope carrier 26 with this opposite direction and constitutes Y voice coil electricity Machine 54Y's can mover 62.Herein, in fact, being that the Y voice coil motor 54Y of identical composition is separated by both set a distances in X-direction to set Set a pair.

Fine motion microscope carrier 26 is to be supported in aftermentioned weight by main control unit 50 using a pair of of X voice coil motor 54X and support Pin assembly 28 and driving (being driven with coarse motion platform 32A in equidirectional with same speed) synchronous with coarse motion platform 32A, accordingly with coarse motion platform 32A is displaced into X-direction together with predetermined stroke, is driven using a pair of of Y voice coil motor 54Y, opposite coarse motion platform 32A with Micro-stroke is displaced into Y direction.

Also, fine motion microscope carrier 26, is each or a pair of of the Y voice coil electricity for making a pair of of X voice coil motor 54X by control device 50 The driving force of each generation of machine 54Y opposite direction each other, opposite coarse motion platform 32A are displaced into the direction θ z.

It is the 52 X sound of each pair by above-mentioned x-ray motor 42A, 42B and the driving of fine motion microscope carrier in this implementation form Motor 54X and Y voice coil motor 54Y are enclosed, can make the opposite projection optics system PL (referring to Fig.1) of fine motion microscope carrier 26 in X-direction with length Stroke is mobile (coarse motion), and mobile (fine motion) in the 3DOF direction pettiness of X-axis, Y-axis and the direction θ z.

Also, fine motion microscope carrier driving be 52, as shown in Figure 1, have to by 26 micro-move device of fine motion microscope carrier in remaining 3DOF Multiple, such as 4 Z voice coil motor 54Z in direction (all directions of θ x, θ y and Z axis).Multiple Z voice coil motor 54Z's is each by solid The stator 59 that is scheduled on above coarse motion platform 32A, be fixed below fine motion microscope carrier 26 can mover 57 constitute, fit over corresponding fine motion (in Fig. 1,2 in 4 Z voice coil motor 54Z, other 2 then illustration omitted are only shown at four corners below microscope carrier 26. In addition, only show 1 in 4 Z voice coil motor 54Z in Fig. 3, other 3 then illustration omitted).Above-mentioned each voice coil motor 54X, The stator of 54Y, 54Z are all mounted on coarse motion platform 32A.Each voice coil motor 54X, 54Y, 54Z can be dynamic magnetic or moving-coil type It is any.Also, the position about the position to measure fine motion microscope carrier 26 measures system, chatted after remaining.

In each top coarse motion platform 32A, 32B, as shown in Figures 2 and 3, it is configured with the bearing surface for overlooking rectangle 4 air flotation cells 84 of (above) are fixed on the upper surface of coarse motion platform 32A, 32B by supporting member 86 respectively.

The bearing surface (above) of each air flotation cell 84 is porous plastid or the disc type with mechanical multiple micro holes (thrust type) air bearing construction.Each air flotation cell 84 passes through the pressurization gas from gas supply device 85 (referring to Fig. 4) The supply of body (such as pressure-air), and can be by a part of suspension bearing of substrate P.To the pressure-air of each air flotation cell 84 The on/off of supply is with main control unit 50 shown in Fig. 4 control.Herein, it in Fig. 4, is only shown to seek the convenience of drawing Pure gas feeding mechanism 85, but not limited to this, it can be used to each air flotation cell 84 other supply pressure-airs and gas Floating unit 84 is supplied with the gas supply device counted, or using 2 or more gas for being connected to multiple air flotation cells 84 Device.It is representative only to show single gas supply device 85 in Fig. 4.No matter whichever, be all to be distinguished by main control unit 50 Control gas supply device 85 to the on/off of the supply of the pressure-air of each air flotation cell 84.

It is installed on the Y direction that each each 4 air flotation cells 84 of coarse motion platform 32A, 32B are disposed on substrate holding PH Two sides.The upper surface of each air flotation cell 84 is set to same high or slightly lower with the upper surface of substrate holding PH.

As shown in Fig. 2, configuration is in the Y direction side of substrate holding PH and each 4 air flotation cells 84 of the other side In the rectangular area for overlooking area (that is, about 1/2 of substrate P) roughly the same with substrate holding PH, apart in X-direction Predetermined distance and it is separated by gap slightly in Y direction and is configured in a manner of 2 row, 2 column.This occasion, above-mentioned each 4 air flotation cells 84 It can be subject to suspension bearing for about the 1/2 of substrate P.

As shown in the above description, in this implementation form, can by substrate holding PH with and substrate holding PH two sides Substrate P entirety is subject to suspension bearing by (side ± Y) adjacent each 2 air flotation cells 84.In addition, can also pass through substrate holding PH Substrate P entirety is subject to suspension bearing with 4 air flotation cells 84 of the unilateral side (side+Y or the side-Y) of substrate holding PH.

Aforesaid substrate keeps each 4 air flotation cells 84 of the tool two sides PH (side ± Y), replaceable for vertical view and substrate holding 1 large-scale air flotation cell of the roughly the same area of PH also can set respectively each 2 air flotation cells 84 for being arranged in Y direction It is changed to 1 air flotation cell of roughly the same area.But, to ensure the appropriate with emptying of aftermentioned substrate Y stepping conveyer Between, the air flotation cell of the side+Y of substrate holding PH is identical in Y direction length as substrate holding PH with entirety and has X-axis The direction length rectangle bearing surface slightly short compared with substrate holding PH, to being less than, X-direction is preferable by 2 dividers.

Substrate Y stepping conveyer 88 is the device to keep substrate P to keep it mobile toward Y direction, is configured in substrate It keeps in the air flotation cell 84 of the side+Y 4 of tool PH, between each 2 air flotation cells 84 of the side+X and the side-X.Substrate Y stepping Conveyer 88 is fixed on coarse motion platform 32A by supporting member 89 (referring to Fig. 3).

Substrate Y stepping conveyer 88, as shown in figure 3, having the back side of sorbing substrate P toward mobile movable of Y direction The portion 88a and fixed part 88b for being fixed on coarse motion platform 32A.Movable part 88a, e.g. by can mover by be located at movable part 88a The driving device 90 (not shown in Fig. 3, reference Fig. 4) that the linear electric machine constituted with the stator for being located at fixed part 88b is constituted, Opposite coarse motion platform 32A is driven in Y direction.In substrate Y stepping conveyer 88, equipped with the position for measuring movable part 88a The position reading out device 92 (not shown in Fig. 3, reference Fig. 4) of encoder etc..Also, driving device 90 is not limited to linear electric machine, It also can be by being constituted using the driving mechanism for using the rotating electric machine of ball screw or belt as driving source.

The Y direction shift motion of the movable part 88a of substrate Y stepping conveyer 88 is the Y direction length of substrate P About 1/2, the back side of adsorbable substrate P is located at the universe in the exposure object region of substrate P on substrate holding PH.Therefore, exist When the stepping of the Y direction of substrate P is transported each time, the exposure area IA of opposite projection optics system PL will be held in substrate holding The substrate P for having PH is scanned in X-direction, as a result, the universe in the exposure object region of substrate P can be made to expose.

Also, the movable part 88a (substrate adsorption face) of substrate Y stepping conveyer 88 due to need sorbing substrate P the back side, Or desorb and separated from substrate P, therefore it also can be by 90 micro-move device of driving device in Z-direction.

Also, in this implementation form, though substrate Y stepping conveyer 88 is mounted in coarse motion platform 32A, but not limited to this, also It is mountable to fine motion microscope carrier 26.In addition, in above description, due to the movable part 88a of substrate Y stepping conveyer 88 need to carry out with Separation, the contact of substrate P, therefore being set to also can be mobile in Z-direction, but not limited to this, to carry out movable part 88a (substrate Adsorption plane) to the absorption of substrate P and with the separation of substrate P, also fine motion microscope carrier 26 can be made to be displaced into Z-direction.

Weight offsets device 28, and as shown in Figures 1 and 3, the cylindrical component by extending Z-direction is constituted, also known as the heart Column.Weight offsets device 28 and supports fine motion microscope carrier 26 from below by the aftermentioned device for being known as levelling device.Weight offsets device 28 configurations are in the recess portion of coarse motion platform 32A, and the upper half is exposed to top compared with coarse motion platform 32A (and 32B), and lower half is compared with coarse motion Platform 32A (and 32B) is exposed to lower section.

Weight offsets device 28, as shown in figure 3, having basket 64, air spring 66 and Z saddle 68 etc..Basket 64 is by+Z The bottomed tube component of side opening is constituted.Below basket 64, multiple air bearing of the bearing surface towards the side-Z are installed (hereinafter, claiming base wad (base pad)) 70.Air spring 66 is housed in the inside of basket 64.In air spring 66, from outside Supply pressurized gas (such as pressure-air).Z saddle 68 is made of the cylindrical element for extending Z-direction, such as low clearance, It is inserted into basket 64, is loaded on air spring 66.In Z saddle 68, equipped with to limit movement of the Z-direction with outside direction Guiding element (not shown).It is using such as air bearing or parallel flat spring etc. as this guiding element.Parallel flat spring is by for example Spring steel plate of the thinner thickness parallel with X/Y plane etc. is constituted, such as is constituted using 6 flat springs.By 3 in 6 flat springs Piece flat spring around 68 upper end of Z saddle 3 at be configured to it is radial, by remaining 3 flat spring in 68 lower end of Z saddle week It in such a way that up and down direction is overlapped, is configured to radial at 3 enclosed by with above-mentioned 3 flat springs.And by one end of each flat spring Portion is mounted on the outer peripheral surface of Z saddle 68, and the other end is installed on basket 64.By the use of parallel flat spring, with flat spring Deflection determine stroke, therefore Z saddle 68 can be made it is shorter in Z-direction that is, as the construction at low clearance.But, Z Saddle 68 is constituted as the occasion of guiding element without the image of Buddha with air bearing, corresponding longer stroke.In the top (side+Z of Z saddle 68 Portion), (not shown) air bearing (hereinafter, claim gasket seaking pad) of the bearing surface towards the side+Z is installed).Also, in basket Around body 64, as shown in Figures 1 and 3, it is fixed with and is configured to radial multiple wrists 71.It is equipped with above the front end of each wrist 71 Target plate 72, this target plate 72 are multiple reflection type optical sensors (also known as level sensor) for being mounted below fine motion microscope carrier 26 74 it is each.Reflection type optical sensor 74, in fact, more than being arranged at out-of-line 3.It is multiple anti-by these Emitting OPTICAL SENSORS 74 constitutes the Z-direction position of measurement fine motion microscope carrier 26 and the Z of tilt quantity (rotation amount in the direction θ x and θ y) Inclination measurement system 76 (referring to Fig. 4).Also, reflection type optical sensor 74 only shows 1 to avoid the intricate of drawing in Fig. 3.

Levelling device 78 is added what the inclination of fine motion microscope carrier 26 (was swung freely with respect to X/Y plane in the direction x and θ y θ) freely With the device of bearing.Levelling device 78 is that have fixed part 78a (display illustrated in Fig. 3 with cuboid component) and movable part The spherical bearing of 78b (display illustrated in Fig. 3 with bulbous member) is quasi- like spherical bearing tectosome, and fixed part 78a can be on one side From below support movable part 78b, on one side with micro travel make movable part 78b in horizontal plane axis (such as X-axis and Y-axis) inclination. This occasion can allow the direction θ x of movable part 78b and the inclined recess portion in the direction θ y in such as the upper surface of fixed part 78a formation.

The upper surface of movable part 78b (the spherical surface upper half) is fixed on fine motion microscope carrier 26, makes fine motion microscope carrier 26 that can fix portion relatively 78a fascinates.Horizontal plane is made to below fixed part 78a, the guidance of the above-mentioned gasket as weight payment device 28 Face has the area bigger compared with the bearing surface of gasket entirety.In addition, fixed part 78a is installed in the Z of weight payment device 28 The non-contact bearing from below of the gasket of saddle 68.

Weight offsets device 28, and the power of the gravity direction generated by air spring 66 upward passes through Z saddle 68 and leveling Device 78 come offset (cancel) include fine motion microscope carrier 26 the weight (gravity direction power directed downwardly) for being, mitigate accordingly above-mentioned more The load of a Z voice coil motor 54Z.

Weight payment device 28 is connected to coarse motion platform 32A (referring to Fig.1) by a pair of device 80 that links.A pair of connection device 80 Z location and weight payment device 28 are roughly the same in the position of centre of gravity of Z-direction.Each connection device 80 includes and X/Y plane The steel plate etc. of parallel thin thickness, also known as bending (flexure) device.Each being configured to and weight of a pair of connection device 80 The side+X of payment device 28 stands facing each other each other with the side-X.Each connection device 80 configuration is in the basket 64 of weight payment device 28 and thick It is configured to parallel with X-axis between dynamic platform 32A, the two is linked.Therefore, weight payment device 28 passes through a pair of of connection device 80 Any one is drawn by coarse motion platform 32A, and mobile with the past X-direction of coarse motion platform 32A one.In addition, passing through tune with non-contact side Leveling device 78 is supported in the top composition part (fine motion microscope carrier 26 and substrate holding PH etc.) of weight payment device 28, passes through The driving of a pair of of X voice coil motor 54X and it is mobile with the past X-direction of coarse motion platform 32A one.At this point, device 28 is offseted in weight, Since tractive force can be acted in comprising the plane parallel with the X/Y plane of the position of centre of gravity of the Z-direction, do not have around The effect of the torque (pitching moment) of the axis (Y-axis) orthogonal with moving direction (X-axis).

As described above, including coarse motion platform 32A, 32B, weight payment device 28, fine motion microscope carrier 26 and base in this implementation form Plate keeps the compositions such as tool PH and substrate P one (a part for keeping substrate P) to be displaced into the moving body of X-direction (hereinafter, appropriate Title baseplate carrier (26,28,32A, 32B, PH)).

Also, about levelling device 78, connection device 80, the detailed structure of the weight payment device 28 of this implementation form is included At, have revealed that in such as No. 2010/0018950 specification of U.S. Patent Application Publication No. (but, in this implementation form, due to Weight offsets device 28 not toward Y direction movement, and there is no need to the connection devices of Y direction).In addition, although not shown, but to keep away It is individually mobile toward Y direction to exempt from weight payment device 28, also can set a limitation by connection device of Y direction etc..

X guide 82 has using X-direction as the rectangular shape of longitudinal direction as shown in Figures 1 and 2.X guide 82 is In the upper surface of above-mentioned a pair of of pallet 18 (side+Z), configures and fix in a manner of crossing a pair of of pallet 18.The long side of X guide 82 Direction (X-direction) is dimensioned to compared with a pair of of the pallet 18 configured in X-direction with predetermined distance respectively in the ruler of X-direction It is the X-direction size in the gap between very little and a pair of of pallet 18 and slightly longer (substantially same).

The upper surface of X guide 82 (face of the side+Z) is parallel with X/Y plane and to be made to flatness very high.In X guide 82 On, as shown in Figures 1 and 3, carrying weight offsets device 28, is suspended bearing (supporting with contactless state) by base wad 70.X The upper surface of guiding element 82 be adjusted to it is substantially parallel with horizontal plane (X/Y plane), when function is mobile as weight payment device 28 Guide surface.The longitudinal direction of X guide 82 is sized to offset the X-axis side of device 28 (that is, coarse motion platform 32A) compared with weight It is slightly longer to removable momentum.The width direction size (Y direction size) of the upper surface of X guide 82 is configured to can be with multiple base wads 70 The size of all bearing surface opposite directions (referring to Fig. 3).Though the material and manufacturing method of X guide 82 are not particularly limited, for example, have with Cast iron etc. casts the situation formed, the situation formed with stone material (such as gabbro), with ceramics or CFRP (Carbon Fiver Reinforced Plastics) formation such as material situation etc..Also, X guide 82 is that have in flank with middle real component or inside Empty component, the component that shape is cuboid are formed.It can also be YZ section be I type also, X guide 82 is not limited to cuboid component Rod member.

It is as shown in Figures 1 and 2, solid by reflecting mirror holding member (not shown) in the side-X side of substrate holding PH Surely there is a pair of of the X moving lens 94X being made of the plane mirror (or corner cube) with reflecting surface orthogonal to X-axis₁、94X₂。 Herein, a pair of of X moving lens 94X₁、94X₂Also fine motion microscope carrier 26 can be fixed on by support.

In the side-Y side of fine motion microscope carrier 26, as shown in figure 3, being fixed with by reflecting mirror holding member 96 by having and Y The Y moving lens 94Y that the strip plane mirror of the orthogonal reflecting surface of axis is constituted.The XY of fine motion microscope carrier 26 (substrate holding PH) Location information in plane, to use a pair of of X moving lens 94X₁、94X₂And Y moving lens 94Y laser interferometer system (hereinafter, Claim baseplate carrier interferometer system) 98 (referring to Fig. 4), it is detected at any time with the capacity of decomposition of such as 0.5~1nm degree.Also, In fact, baseplate carrier interferometer system 98 has corresponding a pair of X moving lens 94X as shown in Figures 2 and 4₁、94X₂X laser Y laser interferometer (the hreinafter referred to as Y interference of interferometer (hreinafter referred to as X interferometer) 98X and corresponding Y moving lens 94Y Instrument) 98Y.The measurement result of X interferometer 98X and Y interferometer 98Y is provided to main control unit 50 (referring to Fig. 4).

X interferometer 98X, as shown in Figure 1, be with a pair of of X moving lens 94X₁、94X₂Opposite height installation is solid at one end It is scheduled on the upper end of the L font interferometer column 102 of X guide 82 (or pallet 18 of the side-X).As X interferometer 98X, usable pair A pair of of X moving lens 94X₁、94X₂It is each respectively irradiate interferometer beam (measuring beam) a pair of of interferometer, also can be used penetrate It is irradiated in a pair of of X moving lens 94X out₁、94X₂The multi-axis interferometer of each 2 measuring beams (surveying long light beam).Hereinafter, being to set It is fixed that X interferometer 98X is constituted with multi-axis interferometer.

Y interferometer 98Y, as shown in figure 3, configuration is between 2 coarse motion platforms 32A, 32B, with opposite with Y moving lens 94Y Mode is fixed on lower end and is fixed on above the supporting member 104 of pallet 18.As Y interferometer 98Y, can be used to Y moving lens 94Y A pair of of the interferometer for irradiating interferometer beam (measuring beam) respectively, also can be used and irradiates 2 measuring beams to Y moving lens 94Y Multi-axis interferometer.Hereinafter, being that setting with multi-axis interferometer is constituted Y interferometer 98Y.

This occasion (is with this face and projection when exposure since Y interferometer 98Y is located in Z-direction compared with substrate P surface The consistent mode of the image planes of optical system PL carries out focusing, the leveling control of substrate P) low position, therefore the measurement knot of Y location Abbe error caused by the postural change (rolling) of fine motion microscope carrier 26 when can be comprising X-direction movement in fruit.This occasion, Although not shown, but as Y interferometer 98Y, 2 measurements irradiated to Y moving lens 94Y in addition to separating in X-direction also can be used Outside light beam, 3 interferometer beams of at least 1 measuring beam also separated comprising this opposite 2 measuring beams in Z-direction The multi-axis interferometer of (measuring beam).Main control unit 50 can detect the rolling of fine motion microscope carrier 26 by the multi-axis interferometer (rolling) measure, according to the testing result, carry out contained in the Y location measurement result measured with Y interferometer 98Y above-mentioned Ah The amendment of shellfish error.

Also, fine motion microscope carrier 26 in the location information of θ x, θ y and Z-direction, is (fixed by above-mentioned Z inclination measurement system 76 Reflection type optical sensor 74 more than at out-of-line 3 below fine motion microscope carrier 26), use above-mentioned 71 front end of wrist Target plate 72 is found out.Comprising Z inclination measurement system 76, above-mentioned fine motion microscope carrier 26 position measurement system composition, have revealed that in Such as No. 2010/0018950 specification of U.S. Patent Application Publication No..Therefore, as Y interferometer 98Y micro- using not detecting The occasion etc. of the interferometer of the pattern of the rolling amount of dynamic load platform 26, main control unit 50 can be found out according to Z inclination measurement system 76 Fine motion microscope carrier 26 in the location information (rolling amount) in the direction θ y, carry out the Y location measurement result measured with Y interferometer 98Y Contained in above-mentioned Abbe error amendment.

In addition to this, single fine motion microscope carrier 26 can not also be measured in the location information of θ x, θ y and Z-direction, and by solid It is scheduled on and can be considered that (a part of body BD, such as lens barrel are flat with the component of 26 top of fine motion microscope carrier of projection optics system PL one Platform 16) oblique incidence mode (not shown) multiple spot focal position detection system (focus sensor), directly measure substrate P from top In the location information of θ x, θ y and Z-direction.Certainly, substrate P and fine motion microscope carrier 26 also be can measure in the position of θ x, θ y and Z-direction Confidence breath.

In the lower end for the lens barrel platform 16 being located above substrate holding PH, although not shown, but it is equipped with multiple alignments and examines Survey system.Alignment detection lie in X-axis in Y direction with predetermined distance configured with multiple.Substrate holding PH passes through fine motion microscope carrier 26 X-direction movement, and can be by multiple alignment detection systems under.At least part of alignment detection system, can be made can root The position in its direction XY is changed according to the configuration (irradiation number takes face number) of area of the pattern in substrate P.

Each alignment detection system, has the microscope for for example having CCD camera, when the both positioning for being set in advance in substrate P When the alignment mark set is entered in the microscopical visual field, i.e., carried out by image processing to locating tab assembly, by the position of alignment mark Information (positional shift information) send the main control unit 50 of the position of the movable part to control base board bearing table device PST.

In Fig. 4, it is shown that constituted centered on the control system of exposure device 100, plan as a whole the main control that control is constituted each portion The block diagram of the import and export relationship of device 50.Be in Fig. 4 show be with baseplate carrier associated each portion of composition.Main control unit 50 include work station (or microcomputer) etc., plan as a whole each portion of composition of control exposure device 100.

Secondly, a company of the processing substrate that the exposure device 100 of this implementation form that explanation is constituted in the above described manner carries out The movement of string.It herein, as an example, is to be subject to for the situation of the exposure after carrying out the 2nd layer to substrate P according to Fig. 5~Figure 13 Explanation.Also, exposure area IA shown in Fig. 5~Figure 13, illumination light IL passes through the photograph of projection optics system PL irradiation when being exposure Area pellucida domain, in fact, not will form when other than exposure, but to make the positional relationship between substrate P and projection optics system PL It is clear, all shown.

Firstly, being carried out under the management of main control unit 50 by exposure mask carrying device (not shown) (exposure mask loader) Exposure mask M is loaded to the loading movement on exposure mask microscope carrier MST, and device is moved in by substrate (not shown), substrate P is removed Enter the movement on (investment) baseplate carrier device PST.In substrate P, in the pervious exposure of front layer, such as shown in Fig. 5, except more Except a, such as 4 irradiation area SA1~SA4, it is equipped in each irradiation area and is transferred simultaneously with the pattern of each irradiation area Multiple alignment marks (not shown).

Toward on baseplate carrier device PST when moving in, substrate P, as shown in figure 5, being loaded across substrate holding PH With 4 air flotation cells 84 of the side+Y of substrate holding PH, substrate holding PH adsorbs a part (entire base of fixed substrate P Plate P about 1/2), a part (entire substrate P remaining about 1/2) of 4 air flotation cells 84 then suspension bearing substrate P.At this point, To make at least two alignment mark in substrate P can enter the visual field of any alignment detection system and being located on substrate holding PH, It is 4 air flotation cells 84 being assembled into substrate P across substrate holding PH and the side substrate holding PH+Y.

Later, by main control unit 50 with existing identical alignment measurement method, find out that fine motion microscope carrier 26 is opposite to be projected The position of optical system PL, fine motion microscope carrier 26 opposite with substrate P rough position.Also, pair of the substrate P relative to fine motion microscope carrier 26 Locating tab assembly can omit.

Then, main control unit 50 drives fine motion microscope carrier 26 to make substrate P according to above-mentioned measurement result by coarse motion platform 32A On at least two alignment mark be moved to it is any alignment detection system the visual field in, carry out substrate P relative to projection optics system PL's To locating tab assembly, according to as a result, seeking help as the scanning starting position of the exposure of the irradiation area SA1 in progress substrate P.Herein, For the scanning being exposed, the acceleration area and deceleration interval before and after constant speed movement section when due to comprising scan exposure, because This strictly speaking, scanning starting position be accelerate starting position.Then, main control unit 50 drives coarse motion platform 32A, 32B and micro- Fine motion microscope carrier 26 is driven, substrate P is located in the scanning starting position (accelerating starting position).At this point, such as the cross arrow in Fig. 5 Shown in head, progress fine motion microscope carrier 26 (substrate holding PH) X-axis, Y-axis of coarse motion platform 32A and the direction θ z relatively (or 6DOF side To) accurate micro- Locating driver.In Fig. 5, it is shown that just complete for substrate P to be located in carry out in substrate P by this method The state of the scanning starting position (accelerating starting position) of irradiation area SA1 exposure.

Later, the exposure actions of step-scan mode are carried out.

The exposure actions of step-scan mode are sequentially exposed to multiple irradiation area SA1~SA4 in substrate P Processing.Substrate P is to accelerate the set acceleration time in X-direction when scanning motion, and constant speed drives given time (these later (scan exposure) is exposed in speed driving), the deceleration with acceleration time same time is carried out later (hereinafter, by this substrate P Series of actions is known as X scanning motion).Also, substrate P is appropriate driven (when moving between irradiation area) when stepwise operation It moves in X-axis or Y direction (hereinafter, claiming X stepwise operation, Y stepwise operation respectively).In this implementation form, each irradiation area SAn (n =1,2,3,4) about 1/2 that maximum exposure width (width of Y direction) is substrate P.

Specifically, exposure actions are to carry out as follows.

From the state of Fig. 5, baseplate carrier (26,28,32A, 32B, PH) is driven to-X shown in white arrow as applied in Fig. 5 Direction, to carry out the X scanning motion of substrate P.At this point, exposure mask M (exposure mask microscope carrier MST) quilt synchronous with substrate P (fine motion microscope carrier 26) It drives to -X direction, and irradiation area SA1 passes through the exposure area of the view field of the pattern of the exposure mask M of projection optics system PL Therefore IA carries out the scan exposure to irradiation area SA1 at this moment.Scan exposure is in 26 (substrate holding of fine motion microscope carrier PH) into the constant speed movement after the acceleration of -X direction, substrate P irradiation illumination light IL is come through exposure mask M, projection optics system PL It carries out.

When above-mentioned X scanning motion, main control unit 50 is adsorbed by a part (about the 1/2 of substrate P entirety) of substrate P It is fixed on the substrate holding PH for being equipped on fine motion microscope carrier 26 and hangs a part of substrate P (about the 1/2 of substrate P entirety) In the state of on floating 4 air flotation cells 84 being supported on coarse motion platform 32A, drive substrate microscope carrier (26,28,32A, 32B, PH). At this point, measurement result of the main control unit 50 according to x-ray encoder system 46A, 46B, it will by x-ray motor 42A, 42B Coarse motion platform 32A and 32B drive in X-direction, and according to the survey of baseplate carrier interferometer system 98 and/or Z inclination measurement system 76 Amount is as a result, driving fine motion microscope carrier driving is 52 (each voice coil motor 54X, 54Y, 54Z).In this way, substrate P i.e. with fine motion microscope carrier 26 at One is drawn by coarse motion platform 32A in the state that suspension bearing is on by weight payment device 28 and is displaced into X-direction, and By the opposite driving from coarse motion platform 32A, and in all directions of X-axis, Y-axis, Z axis, θ x, θ y and θ z (6DOF direction) quilt Accurate carry out position control.Also, main control unit 50 is in X scanning motion, it is same with fine motion microscope carrier 26 (substrate holding PH) Step will keep the exposure mask microscope carrier MST turntable driving of exposure mask M in X-direction according to the measurement result of exposure mask interferometer system 14, And micro-move device is in Y direction and the direction θ z.The scan exposure to irradiation area SA1 is shown in Fig. 6 to be terminated, and substrate P is kept The baseplate carrier (26,28,32A, 32B, PH) of a part is in the state stopped.

Secondly, main control unit 50 is to carry out time acceleration of an exposure to carry out as applied shown in white arrow in Fig. 6 by substrate P The X stepwise operation of the substrate P slightly driven toward +X direction.The X stepwise operation of substrate P is to be scanned by main control unit 50 with X Act it is identical in the state of driving (but, position deviation on the move and not as good as scanning motion when strict limits) substrate Microscope carrier (26,28,32A, 32B, PH) carries out.Shown in Fig. 7 baseplate carrier (26,28,32A, 32B, PH) be moved to It is irradiated the state of the scanning starting position of the exposure of region SA2.Main control unit 50, simultaneously with the X stepwise operation of substrate P Row returns to exposure mask microscope carrier MST and accelerates starting position.

Then, main control unit 50, if in Fig. 7 apply white arrow shown in, start substrate P (baseplate carrier (26,28,32A, 32B, PH)) accelerate with the -X direction of exposure mask M (exposure mask microscope carrier MST), similarly sweep irradiation area SA2 with above-mentioned Retouch exposure.The scan exposure to irradiation area SA2 is shown in Fig. 8 to be terminated, and baseplate carrier (26,28,32A, 32B, PH) stops State.

Secondly, carrying out the Y stepwise operation be moved to the unexposed area of substrate P on substrate holding PH.This base The Y stepwise operation of plate P is kept with the movable part 88a absorption of substrate Y stepping conveyer 88 in figure by main control unit 50 The side end+Y the back side of the substrate P of state shown in 8, and after releasing substrate holding PH to the absorption of the substrate P, by coming from The state that the exhaust of the pressure-air of substrate holding PH and the exhaust of the pressure-air of air flotation cell 84 then make substrate P suspend Under, by the movable part 88a of substrate Y stepping conveyer 88, as shown in blacking arrow in Fig. 9, toward -Y direction driving come accordingly into Row.In this way, opposing substrate keeps tool PH, only substrate P is mobile toward -Y direction, unexposed irradiation area SA3, SA4 of substrate P at For with it is opposite on substrate holding PH, across substrate holding PH and 4 air flotation cells 84 of the side-Y the state that loads.This When, substrate P is by substrate holding PH and 84 suspension bearing of air flotation cell.Then, by main control unit 50 by substrate holding PH switches to air-breathing (attraction) from exhaust.Accordingly, become with substrate holding PH absorption fixed substrate P a part (substrate P is complete Body about 1/2) and with the shape of a part of 4 84 suspension bearing substrate Ps of air flotation cell (substrate P all remaining about 1/2) State.And then after starting with above-mentioned substrate holding PH to the absorption movement of substrate P, substrate Y is released by main control unit 50 Absorption of the stepping conveyer 88 to substrate P.

Then, it is new to presetting on locating tab assembly that is, progress substrate P with respect to projection optics system PL to carry out substrate P A time irradiation area alignment mark measurement.When this is to locating tab assembly, the X stepwise operation of aforesaid substrate P is optionally carried out (referring to the painting white arrow in Fig. 9), so that the alignment mark of measurement object is located in the detection visual field of alignment detection system.

Substrate P with respect to projection optics system PL it is new to locating tab assembly after, i.e., by main control unit 50 according to this as a result, as schemed In 10 shown in crisscross arrows, the X-axis, Y-axis and the direction θ z (or 6DOF direction) of the opposite coarse motion platform 32A of fine motion microscope carrier 26 are carried out Accurate micro- Locating driver.

Then, by main control unit 50, if applied shown in white arrow in Figure 10, the +X direction of beginning substrate P and exposure mask M add Speed carries out the scan exposure similar to the above to irradiation area SA3.Show that the scanning to irradiation area SA3 exposes in Figure 11 The state that light terminates, baseplate carrier (26,28,32A, 32B, PH) stops.

Secondly, to carry out the acceleration of time one exposure, by main control unit 50 carry out by baseplate carrier (26,28,32A, 32B, PH), as applied the X stepwise operation shown in white arrow, slightly driven toward -X direction in Figure 11.Shown in Figure 12 baseplate carrier (26, 28,32A, 32B, PH) the mobile exposure for being most irradiated region SA4 scanning starting position state.

Then, started substrate P if applied in Figure 12 shown in white arrow by main control unit 50 and the +X direction of exposure mask M adds Speed, similarly to carry out scan exposure to irradiation area SA4 with above-mentioned.The scanning to irradiation area SA4 is shown in Figure 13 The state that end exposure, baseplate carrier (26,28,32A, 32B, PH) stop.

As described above, the exposure device 100 of this implementation form is carried out accordingly by being repeatedly scanned with exposure and stepwise operation Exposure to substrate P all (all irradiation area SA1~SA4 on substrate) (overlapping of the pattern of exposure mask M transfers).

Herein, said sequence, side are not limited to the exposure sequence and scanning direction of irradiation area SA1~SA4 in substrate P To.In addition, in order to only carry out in the constant speed synchronizing moving of exposure mask microscope carrier MST and fine motion microscope carrier 26 toward X-direction through projection The illumination light IL of optical system PL also carries out the position of masking blade (masking blade) (not shown) to the irradiation in substrate P It sets or the switch of optical gate etc..Also, the opening width for covering blade can be also made it is variable, with constitute can change exposure area IA Width.

As described above, the exposure device 100 of this implementation form is loading substrate P and is ensuring the flat of the substrate P The substrate retaining surface (substrate loading surface) of the substrate holding PH kept is adsorbed in the state of degree, it is only necessary to which existing substrate is kept About 1/2 area of tool, that is, enough, therefore can make that substrate holding PH is small-sized, lightweight.In addition, to support through light-weighted base Plate keep tool PH fine motion microscope carrier 26 also can small-sized, lightweight, and can promote use each voice coil motor 54X, 54Y, 54Z progress The high speed of fine motion microscope carrier 26, high acceleration and deceleration driving and position control.Also, since substrate holding PH is through minimizing, energy Shorten the flatness process time of the board holder, promote machining accuracy.Furthermore in this implementation form, due to fine motion microscope carrier 26 is mobile without stepping in Y direction, but only makes substrate P past by the substrate Y stepping conveyer 88 on coarse motion platform 32A Y direction is mobile with lower precision stepping, therefore can also make the simple structure and small-sized, light weight, low cost of coarse motion platform 32A Change.

The baseplate carrier device PST that the exposure device 100 of this implementation form has, in substrate P in cross scan The multi-panel configuration that direction (Y direction) configures multiple irradiation areas is very effective.

Also, being arranged respectively at the substrate of the side+Y of substrate holding PH and the air flotation cell of the side-Y in above-mentioned implementation form Bearing surface area (total area) might not must be about the 1/2 of substrate P, in addition, the size of its cross scanning direction is also different Fixed must be about 1/2 size of substrate P.Also that is, can have the air flotation cell in the substrate supporting face of more small area, size to make base Plate P suspends.This occasion can be used the air bearing construction for keeping gas stiffness high, gas stiffness also can be used as air flotation cell Low air bearing construction and by the big fan of load capacity come generate air-flow, in such a way that the air-flow makes substrate P suspension.

" the 2nd implementation form "

Secondly, being directed to the 2nd implementation form, it is illustrated according to Figure 14~Figure 16.Herein, with above-mentioned 1st implementation form phase With or same composition part assign same or like symbol, and simplify or the description thereof will be omitted.

The composition of the exposure device 200 of the 2nd implementation form is schematically shown in Figure 14, and omission exposure dress is shown in Figure 15 Set the top view of 200 a part.Also, showing the outline that the part of the exposure device 200 from +X direction is omitted in Figure 16 Side view.But, Tu16Zhong, with above-mentioned Fig. 3 likewise, coarse motion platform 32A is shown with sectional view.

Baseplate carrier is arranged in addition to replacing aforesaid substrate bearing table device PST in the exposure device 200 of this 2nd implementation form The point of device PSTa and above-mentioned 1st implementation form are mutually unusual, and composition of other parts etc. is identical as above-mentioned 1st implementation form.

Baseplate carrier device PSTa, by Figure 15 and Figure 16 it is found that being with the deviation of aforesaid substrate bearing table device PST The coarse motion platform 32B of the side-Y in 2 coarse motion platforms 32A, 32B that aforesaid substrate bearing table device PST has is fallen, and therewith will The air flotation cell of the side substrate holding PH-Y is made fixed rather than movable.Hereinafter, illustrating the 2nd implementation centered on deviation The baseplate carrier device PSTa of form.

In the side-Y of substrate holding PH, as shown in figure 15, air flotation cell 84A and air flotation cell 84B respectively with one for Y direction constitutes one group across gap arrangement slightly, which is arranged in X-direction with set sequence.Air flotation cell 84A Bearing surface with form and dimension roughly the same with above-mentioned air flotation cell 84, air flotation cell 84B has to exist with air flotation cell 84A The bearing surface that Y direction length is identical, X-direction length is 1/3 degree.

Air flotation cell 84A and 84B are all equally constituted with air flotation cell 84.In this 2nd implementation form, 4 groups of air bearings have been used Unit 84A, 3 groups of air flotation cell 84B add up to totally 7 groups.It is base that total 7 groups air flotation cell 84A, 84B, which are in Y direction width, The Y direction width of plate P about 1/2, X-direction length be that moving range when scanning mobile with substrate holding PH is substantially same In the rectangular area of equal length, configured in X-direction with predetermined distance.Total 7 groups air flotation cell 84A, 84B, such as Figure 16 institute Show, to avoid contacting with pallet 18, is fixed on the frame 110 of ground F.

As shown in figure 15, the center of exposure area IA and the configuring area center of total 7 groups air flotation cell 84A, 84B X position is roughly the same, is configured with 1 group of (a pair) air flotation cell 84B in X-direction center.From this 1 group of air flotation cell 84B and this 1 Gap between the air flotation cell 84A of the adjacent X-direction two sides group air flotation cell 84B, by from Y interferometer 98Y in X-axis A pair of of measuring beam of direction separation is irradiated in Y moving lens 94Y.This occasion, Y interferometer 98Y are fixed on compared with 7 groups of air flotation cells 84A, 84B are located at the side frame 20 of the body BD of the side-Y.Y interferometer 98Y is using the rolling for being capable of measuring fine motion microscope carrier 26 (rolling) multi-axis interferometer (referring to Fig.1 6) measured.

Also, as shown in Figure 14 and Figure 16, the movable part of levelling device 78 is with can be in axis (such as X-axis and the Y in horizontal plane Axis) the Z saddle 68 of weight payment device 28 is installed in such a way that micro-stroke is inclined.Levelling device 78 can be made for example above It is fixed on (upper half of spherical surface) and is fixed on fine motion microscope carrier 26, the θ x for allowing levelling device 78 is formed in the upper surface of Z saddle 68 Direction and the direction θ y rotate the recess portion of (inclination).Alternatively, in contrast to this, levelling device 78 can be also made following (ball for example The lower half in face) it is fixed on Z saddle 68, it will allow for inclination of the fine motion microscope carrier 26 with respect to the direction θ x and the direction θ y of levelling device 78 Recess portion, be formed in fine motion microscope carrier 26.No matter whichever, levelling device 78 all supports by Z saddle 68 from below, allows fine motion microscope carrier Fascinating within the scope of 26 axis (such as X-axis and Y-axis) minute angle in horizontal plane.

In the baseplate carrier device PSTa of 2nd implementation form, the fixed part that Z saddle 68 doubles as levelling device 78 is not set Gasket is set, it is integrated that weight, which offsets device 28 with fine motion microscope carrier 26,.Further, since weight payment device 28 and fine motion microscope carrier 26 integrations, therefore and the connection device 80 (flexure device) etc. that moves alone of not set maximum weight payment device 28.Base The composition of the other parts of plate bearing table device PSTa is identical as baseplate carrier device PST.

According to the exposure device 200 of the 2nd implementation form of sheet constituted in the above described manner, in addition to rib is obtained with the above-mentioned 1st in fact It applies outside the same effect of exposure device 100 of form, due to not by air flotation cell 84A, 84B of the side substrate holding PH-Y It is equipped on coarse motion platform 32B and is affixed to the frame 110 being separately arranged, therefore do not have air flotation cell 84A, 84B masking Y interference The situation of the measuring beam of instrument 98Y.Also, Y moving lens 94Y is also mountable to the side of substrate holding PH or is pacified by bracket Loaded on fine motion microscope carrier 26.

" the 3rd implementation form "

Secondly, being directed to the 3rd implementation form, it is illustrated according to Figure 17 and Figure 18.Herein, implement shape with the above-mentioned 1st, the 2nd The identical or same composition part of state assigns same or like symbol, and simplifies or the description thereof will be omitted.

Figure 17 is the one of the baseplate carrier device PSTb and body BD that show that the exposure device of this 3rd implementation form has Partial top view, Figure 18 are the outline side view of the exposure device of the 3rd implementation form from +X direction, but part is omitted Display.But with above-mentioned Figure 16 likewise, in Figure 18, coarse motion platform 32A (and 32B) is shown with sectional view.

Baseplate carrier device PSTb, it is as shown in figure 18, same as the baseplate carrier device PST of above-mentioned 1st implementation form Equipped with 2 coarse motions platform 32A, 32B, but the coarse motion platform 32B in the side-Y does not carry air flotation cell, and with above-mentioned 2nd implementation form Baseplate carrier device PSTa is likewise, the air flotation cell of the side substrate holding PH-Y is mounted in frame 110 set in addition The whole (referring to Fig.1 7) of the X-direction moving range of substrate holding PH.This occasion, the air flotation cell of the side-Y, be also using with Total 7 groups air flotation cell 84A, 84B that 2nd implementation form equally configures.In addition, a pair of X voice coil motor 54X and multiple Z sounds The a part (being 1 for showing 1 Z voice coil motor 54Z in Figure 18) for enclosing motor 54Z, is located at coarse motion platform 32B and fine motion microscope carrier 26 Between.

Further, Y moving lens 94Y configuration is in the side-Y side of substrate holding PH and X moving lens 94X₁、94X₂Greatly Mutually level position is caused, the face of the side-Y of fine motion microscope carrier 26 is fixed on by bracket 96A.This occasion, due to will not generate Ah Shellfish error, therefore Y interferometer 98Y must not necessarily carry out the measurement of rolling amount.

This occasion, it is also integrated with fine motion microscope carrier 26 that weight, which offsets device 28,.Other portions of baseplate carrier device PSTb Each portion other than the composition and baseplate carrier device PSTb divided is constituted, identical as above-mentioned 1st implementation form or the 2nd implementation form.

According to the exposure device of the 3rd implementation form of sheet constituted in the above described manner, in addition to that can obtain and the above-mentioned 1st and the 2nd Outside the same effect of exposure device 100,200 of implementation form, X voice coil motor 54X and the Z voice coil motor of fine motion microscope carrier 26 is driven 54Z can obtain the electricity compared with the 2nd implementation form more high rigidity with well balanced two sides being distributed in coarse motion platform 32A, 32B Machine configures (referring to Fig.1 8).

Also, in above-mentioned 3rd implementation form, though it is described for the situation equipped with 2 coarse motion platforms 32A, 32B, not It is limited to this, also can be as shown in figure 19, it is arranged the integrated coarse motion platform 32 of coarse motion platform 32A, 32B, and by the coarse motion platform 32 with can The mode of sliding is mounted on 2 X beams 30A, 30B.

Also, in the variation of above-mentioned 1st~the 3rd implementation form and Figure 19, though by the Y direction of substrate holding PH The air flotation cell of at least side is designed to be equipped on coarse motion platform 32A or 32 and can be movable in X-direction, but not limited to this, also Settable to follow the mobile another moving body of coarse motion platform, being made in carrying air flotation cell on another moving body can in X-direction It is dynamic.For example, in above-mentioned 1st implementation form, the side+Y of the settable movement routine along coarse motion platform 32A and/or the shifting of coarse motion platform 32B The mobile another moving body of the movement routine of the side-Y in dynamic path, on another moving body for example, by inverted L-shaped bearing Component is to carry air flotation cell in state of the Y direction close to substrate holding PH.

" the 4th implementation form "

Secondly, being directed to the 4th implementation form, it is illustrated according to Figure 20 and Figure 21.Herein, real with the above-mentioned 1st, the 2nd and the 3rd It applies homomorphosis or same composition part and assigns same or like symbol, and simplify or the description thereof will be omitted.

Figure 20 illustrates in plan view the baseplate carrier device PSTc and machine that the exposure device of this 4th implementation form has A part of body shows the outline side view of the exposure device of the 4th implementation form from the +X direction of Figure 20 in Figure 21, but Some is omitted.

In baseplate carrier device PSTc, as shown in figure 21, with Figure 19 likewise, the coarse motion platform 32 being integrated is with slidably Mode be mounted on 2 X beams 30A, 30B, but in not carrying air flotation cell on coarse motion platform 32.

In Figure 21, coarse motion platform 32 is shown with sectional view.The side-Y of substrate holding PH and the air flotation cell of the side+Y, with The air flotation cell of the side-Y of 2nd, the 3rd implementation form is likewise, being fixed on and being set on the F of ground Wei pallet 18 is avoided contact with Frame 110A, 110B it is each.Also, the side-Y of substrate holding PH and each air flotation cell of the side+Y are as shown in figure 20 It is to be scanned with substrate holding PH in about the 1/2 of the Y direction width that the width of Y direction the is substrate P, length of X-direction In the rectangular area of moving range substantially equal length when mobile, in X-direction with predetermined distance, in Y direction across a little Microgap configuration.This occasion is using total 7 configured same as the 2nd, the 3rd implementation form as the air flotation cell of the side-Y Group air flotation cell 84A, 84B.On the other hand, the air flotation cell as the side+Y is used in above-mentioned rectangular area as shown in figure 20 Interior 4 groups of (8 total) air flotation cell 84D configured in X-direction across given clearance.Air flotation cell 84D and above-mentioned air bearing list Member 84 is similarly constituted, and the width and air flotation cell 84 of Y direction are same, but X-direction length is then slightly longer compared with air flotation cell 84.

In the frame 110A for 4 groups of air flotation cell 84D for being fixed with the side+Y, it is provided in X-direction with predetermined distance multiple (being 3 in Figure 20) aforesaid substrate Y stepping conveyer 88.Herein, in order to be made be located in substrate P it is any in movable area Position (position of Y direction) Shi Jieneng is sent to Y direction, therefore substrate Y with the back side of movable part 88a sorbing substrate P Stepping conveyer 88 is arranged multiple.Each configuration of substrate Y stepping conveyer 88 is between the adjacent air flotation cell 84D of X-direction Gap.The upper surface of the movable part 88a of each substrate Y stepping conveyer 88, the adsorbable substrate being suspended on air flotation cell 84D P keeps it mobile to Y direction and can desorb and separate from substrate P.

The compositions of the other parts of baseplate carrier device PSTc and the composition in each portion other than baseplate carrier device PSTc with The implementation form of above-mentioned 1st, the 2nd or the 3rd is mutually same.

According to the exposure device of the 4th implementation form of sheet constituted in the above described manner, removing can be obtained and above-mentioned each implementation form The same effect of exposure device outside, not only side-Y of substrate holding PH, air flotation cell 84D and base positioned at the side+Y Plate Y stepping conveyer 88 is separated with coarse motion platform 32 to be fixed on frame 110A, therefore the load for being applied to coarse motion platform 32 is reduced, And it can be reduced the thrust of driving coarse motion platform 32.

" the 5th implementation form "

Secondly, being directed to the 5th implementation form, 2~Figure 24 is illustrated according to fig. 2.Herein, with the above-mentioned 1st, the 2nd, the 3rd or The identical or same composition part of 4th implementation form assigns same or like symbol, and simplifies or the description thereof will be omitted.

The composition of the exposure device 500 of the 5th implementation form is schematically shown in Figure 22, shows exposure device in Figure 23 The top view that 500 part is omitted.Also, Figure 24 shows the outline side view of the exposure device 500 from the +X direction of Figure 22, But a part is omitted.Coarse motion platform 32 is shown with sectional view in Figure 24.

The exposure device 500 of this 5th implementation form, structure substantially same as the exposure device of above-mentioned 4th implementation form At, but baseplate carrier device PSTd is different with the baseplate carrier part device PSTc of the 4th implementation form.Specifically, substrate carries Platform device PSTd, a pair of of X moving lens 94X₁、94X₂Installation site on fine motion microscope carrier 26 is different with baseplate carrier device PSTc, Correspondingly, composition of X interferometer etc. is also different with baseplate carrier device PSTc.Hereinafter, illustrating centered on dissimilarity The exposure device 500 of 5 implementation forms.

By Figure 22, Figure 23, Figure 24 it is found that a pair of X moving lens 94X₁、94X₂Pass through moving lens supporting part (not shown) respectively Part is mounted near the X-direction center of the Y direction two sides of fine motion microscope carrier 26.Corresponding a pair of X moving lens 94X₁、94X₂, peace Equipped with against a pair of of X moving lens 94X₁、94X₂Each a pair of of X interferometer 98X₁、98X₂.A pair of of X interferometer 98X₁、98X₂'s It is each, as shown in figure 24, it is separately fixed at the frame that each one end (lower end) is fixed on the L-shaped of-X side frame platform 18 The other end (upper end) of (X interferometer frame) 102A, 102B.As frame 102A, 102B, for avoid with said frame 110A, 110B and the coarse motion platform 32 for being displaced into X-direction interfere and use L-shaped person.

Also, a pair of X moving lens 94X₁、94X₂It is to be arranged in compared with the side end face the substrate holding PH-X more side+X and compared with substrate The upper surface of P (surface) low position, specifically, being arranged in only compared with position slightly lower below substrate holding PH.With one To X moving lens 94X₁、94X₂Opposite direction, a pair of of X interferometer 98X₁、98X₂Configuration is in the position low compared with the upper surface of substrate P and in Y-axis Direction is housed in the position in the gap between substrate holding PH and air flotation cell 84D or 84A.Accordingly, the base of this 5th implementation form In plate bearing table device PSTd, a pair of of X interferometer 98X₁、98X₂, such as compare Figure 23 and Figure 20 it is found that with the 4th implementation form (and 1st~the 3rd implementation form) X interferometer 98X compare, can be by X interferometer (a pair of of X interferometer 98X₁、98X₂) configure from-X The closer position of pallet 18 of side.

Also, in baseplate carrier device PSTd, as shown in figure 23, for the X moving lens 94X for avoiding the side+Y₁With by fine motion microscope carrier 26 drive interfere with each other in the Y voice coil motor 54Y of Y direction a little, and a pair of of Y voice coil motor 54Y is mounted in be carried close to fine motion The position at the X-direction center (center) of platform 26.But not limited to this, as long as X moving lens 94X₁It will not that with Y voice coil motor 54Y This interference, a pair of of Y voice coil motor 54Y are mountable at an arbitrary position.Although not shown, such as the mountable X-axis in fine motion microscope carrier 26 Direction two sides.This occasion, the position of a pair of of Y voice coil motor 54Y, is desirable to the force action of driving force in fine motion microscope carrier The center of gravity driving that 26 position of centre of gravity that is, be configured to can carry out fine motion microscope carrier 26 is preferable.

The exposure device 500 of the 5th implementation form of sheet constituted in the above described manner implements shape with the above-mentioned 4th in addition to that can obtain Outside the same effect of the exposure device of state, compared with the X interferometer 98X of the 4th implementation form (and the 1st~the 3rd implementation form), energy By a pair of of X interferometer 98X₁、98X₂Configuration has frame 102A, 102B in the position for the pallet 18 for being closer to the side-X The advantages of total weight increases compared with light-weight, the rigidity of interferometer column 102.

" the 6th implementation form "

Secondly, being directed to the 6th implementation form, 5~Figure 29 is illustrated according to fig. 2.Herein, with the above-mentioned 1st, the 2nd, the 3rd, The identical or same composition part of 4 or the 5th implementation form assigns same or like symbol, and simplifies or the description thereof will be omitted.

The top view that the part of the exposure device of the 6th implementation form is omitted is shown in Figure 25.Also, showing in Figure 26 The XZ sectional view of the exposure device of 6 implementation forms, but a part is omitted.

The exposure device of this 6th implementation form is substantially equally constituted with the exposure device of above-mentioned 5th implementation form, But baseplate carrier device PSTe is different with the baseplate carrier part device PSTd of the 5th implementation form.

It is using being not only Y-axis as substrate holding PH as shown in figure 25 specifically, baseplate carrier device PSTe Direction size, X-direction size is also small compared with the X-direction size of substrate P, is, for example, about the 1/2 of substrate P.And it is protected in substrate The X-direction two sides of tool PH are held, a pair of air flotation cell (movable air-float unit) 84C is configured with.A pair of of air flotation cell 84C's is each It is a, it is to pass through supporting member above it and in a manner of substantially same (slightly lower) height of substrate holding PH as shown in figure 26 112 are fixed on the upper surface of coarse motion platform 32.A pair of of air flotation cell 84C's is each, for example, Y direction length and substrate holding PH it is same It is substantially same or slightly short Deng (or compared with substrate holding PH slightly short), X-direction length and substrate holding PH.

In baseplate carrier device PSTe, a pair of of X moving lens 94X₁、94X₂, by Figure 25 and Figure 26 it is found that being by not shown Moving lens supporting member be fixed near the Y direction both ends of the side-X side of substrate holding PH.Baseplate carrier device The composition of the other parts of PSTe is identical as the baseplate carrier device PSTd of the 4th implementation form.This occasion, a pair of of X interferometer 98X₁、98X₂, with the 5th implementation form likewise, be arranged to can with fixed air flotation cell (84A, 84B) and coarse motion platform 32 On air flotation cell 84C do not generate interference in the case of, close to a pair of X moving lens 94X₁、94X₂。

Also, a pair of X interferometer 98X₁、98X₂, can be with the 5th implementation form likewise, being mounted on the two sides of substrate holding PH Face, X-direction center near.It in this case, can be by X interferometer 98X₁、98X₂The side+X is more leaned in configuration.In addition, a pair of X Moving lens 94X₁、94X₂Also substrate holding PH can not be resided at, and fine motion microscope carrier 26 is installed on by X moving lens scaffold.

Then, 6~Figure 29 according to fig. 2 illustrates company when carrying out processing substrate with the exposure device of this 6th implementation form The movement of string.It herein, is to lift to the irradiation area SA1 and SA2 (or irradiation area SA3 and SA4) of above-mentioned 1st implementation form at first The situation that is exposed is illustrated.Also, the diagram of fixed air flotation cell etc. into Figure 29, is omitted in Figure 26.In addition, this In 6 implementation forms, comprising coarse motion platform 32, weight payment device 28, fine motion microscope carrier 26 and substrate holding PH etc., with substrate P one The composition of body (a part for the keeping substrate P) moving body mobile toward X-direction, hereinafter, this moving body is known as baseplate carrier (26、28、32、PH)。

Firstly, under the management of main control unit 50, with exposure mask carrying device (not shown) (exposure mask loader) carry out by Exposure mask M is loaded to the loading movement on exposure mask microscope carrier MST, and is moved in device with substrate (not shown) and carried out substrate P moving in base Movement is moved on plate bearing table device PSTe.In substrate P, when each irradiation area is equipped with the exposure before front layer, such as Shown in Figure 25, have together with multiple total 4 irradiation area SA1~SA4 with such as X-direction 2, Y direction 2, and it is each Multiple alignment marks (not shown) that the pattern of irradiation area is transferred simultaneously.

Firstly, being assembled into substrate P across substrate holding PH, one with the multiple air flotation cell 84D of fixation of the side+Y Divide the air flotation cell 84C with the side+X.At this point, being sprayed from the upper surface of substrate holding PH, air flotation cell 84D and air flotation cell 84C Pressure-air, substrate P are suspended bearing.Then, substrate holding PH air-breathing is switched to from exhaust by main control unit 50 (to inhale Draw).Accordingly, i.e., with substrate holding PH, by a part of substrate P, (substrate P in the corresponding region comprising irradiation area SA1 is all About 1/4) absorption fix, become one with a part of multiple air flotation cell 84D and air flotation cell 84C suspension bearing substrate P The partially state of (substrate P all remaining about 3/4).Then, it in method identical with above-mentioned 1st implementation form, is aligned Movement (referring to Figure 26).

Secondly, as applied in Figure 26 shown in white arrow, substrate P (baseplate carrier (26,28,32, PH)) and exposure mask M (exposure mask Microscope carrier MST) synchronize it is mobile toward -X direction, with above-mentioned 1st implementation form likewise, carrying out being adsorbed on substrate holding PH Substrate P initial irradiation area SA1 scan exposure.After the end exposure for showing irradiation area SA1 in Figure 27, substrate The state that microscope carrier (26,28,32, PH) stops.

Secondly, main control unit 50, uses the substrate Y stepping positioned at the opposite position of substrate P to transport dress in the time point The back side for setting 88 movable part 88a (not shown in Figure 27, reference Figure 25) sorbing substrate P, is releasing substrate holding PH to base After the absorption of plate P, since the self-reference substrate high pressure that keeps exhaust and the air flotation cell 84C of the side+X of the pressure-air of tool PH to connect it is empty The exhaust of gas makes substrate P suspend.Accordingly, substrate P becomes only by the movable part 88a holding of substrate Y stepping conveyer 88 State.

Secondly, main control unit 50, is maintaining only with the movable part 88a of this substrate Y stepping conveyer 88 to substrate P Under hold mode, by baseplate carrier (26,28,32, PH), as shown in the painting white arrow in Figure 27, driving starts base in +X direction The X stepping of plate P.Accordingly, substrate P is i.e. in the state of the position before stopping at X stepping and starting, and substrate holding PH is with respect to this base Plate P is displaced into +X direction.Then, main control unit 50 reaches a time irradiation area SA2 for substrate P just in substrate holding PH When lower section, stop baseplate carrier (26,28,32, PH) (referring to Figure 28).At this point, substrate P is to be loaded across substrate to keep Have a part of the multiple air flotation cell 84D of fixation of PH and the side+Y and the air flotation cell 84C of the side-X.From substrate holding PH, more The upper surface of a part of a air flotation cell 84D and air flotation cell 84C spray pressure-air, and substrate P is suspended bearing.

Parallel, the main control unit 50 with the driving for the baseplate carrier (26,28,32, PH) that aforesaid substrate P is progress X stepping Exposure mask microscope carrier MST is set to return to set acceleration starting position.

Later, substrate holding PH is carried out to 88a pairs of movable part of the absorption of substrate P and substrate Y stepping conveyer 88 The absorption of substrate P releases, is determined using alignment mark new in substrate P to locating tab assembly, using the substrate P of fine motion microscope carrier 26 Position.Later, baseplate carrier (26,28,32, PH) is synchronous with exposure mask microscope carrier MST, as applied shown in white arrow in Figure 28, passes through past-X Direction is mobile, carries out the scan exposure of a time irradiation area SA2 accordingly.

After the end exposure for showing irradiation area SA2 in Figure 29, the state of baseplate carrier (26,28,32, PH) stopping.

Later, with the exposure device 100 of above-mentioned 1st implementation form likewise, being carried out by substrate Y stepping conveyer 88 Scan exposure is repeated after being positioned with alignment in the Y stepwise operation of substrate P.

Using the exposure device of described above the 6th implementation form, the exposure device with above-mentioned 5th implementation form is obtained 500 same effects.In addition to this, according to the exposure device of this 6th implementation form, due to be substrate holding PH is made with 1 same size of irradiation area (single exposure region), except region suspension bearing is then subject to air flotation cell, therefore carry In the substrate holding PH of fine motion microscope carrier 26, compared with above-mentioned 1st to the 5th implementation form, it can more small-sized, light weight.In addition, by An irradiation area, therefore the X-direction of baseplate carrier (26,28,32, PH) are only scanned in baseplate carrier (26,28,32, PH) More above-mentioned 1st to the 5th implementation form of stroke is short (about 1/2).Therefore, baseplate carrier device can be sought and have substrate load The exposure device of platform device further minimizes and the reduction of light weight exquisiteness and cost.

Also, though leaving substrate P after the scan exposure of irradiation area at first, and being to carry out secondary one in above description It is mobile (referring to Figure 27 and Figure 28) toward +X direction that the exposure of irradiation area makes baseplate carrier (26,28,32, PH), but can also leave Baseplate carrier (26,28,32, PH) and only make substrate mobile toward -X direction with substrate X stepping conveyer (not shown), later, It is exposed again by baseplate carrier (26,28,32, PH) toward the scanning of +X direction.Substrate X stepping conveyer can double as The moving in of substrate P, conveyance device.

Also, above description, in the 2nd implementation form into the 6th implementation form, though the air bearing list that will be separated with coarse motion microscope carrier Member is fixed on ground by frame, but generates when deceiving less of vibration, can also be fixed in pallet 18.

For the baseplate carrier device and exposure device of the 1st~the 6th each implementation form of above-mentioned detailed description, remittance is whole such as Under.The substrate holding that sorbing substrate gives plane rectification is made same with substrate by baseplate carrier device not such as existing apparatus Equidimension, but be made with the exposure field commensurateiy wide of projection optics system (Y direction size), scanning direction (X-direction) Length is then made on an equal basis or long same with the scanning in the single exposure region of single pass movement exposure with the X-direction length of substrate Deng length.And substrate slave substrate holding expose part then pass through mobile or fixed air flotation cell is suspended prop up It holds.Therefore, substrate holding can readily small-sized, light weight and high-precision (high flatness) be changed, and can promote the control of fine motion microscope carrier Property (position and speed controlling etc.) processed seeks high-precision, high speed.Further, since it is that relative exposure field (is shone that coarse motion platform, which is made, The irradiation area (exposure position) of Mingguang City IL) the only platform (microscope carrier) mobile toward 1 axis direction (X-direction), therefore coarse motion microscope carrier portion It constitutes simply, cost can be reduced.

Also, the stepping movement of substrate toward Y-direction is to be made to move substrate toward Y-direction by substrate Y stepping conveyer It is dynamic, therefore moving mass is light.In addition, the Y Stepping positioning of substrate is designed to carry out with more rough precision, therefore substrate Y is walked Cost into conveyer is also low.Simple coarse motion microscope carrier portion is constituted, due to being separated with fine motion microscope carrier, precision can be relatively thick Slightly, the composition part (coarse motion microscope carrier portion and substrate Y stepping conveyer etc.) comprising the more rough movable part of precision without using The ceramic component of light weight, high rigidity, and general industry can be used with material to make.It is therefore not necessary to using in order to make large size The needed big firing furnace of the light weight of change, high rigidity ceramic component and the grinder that its high-precision is processed to needed large size Tool etc..In addition, the composition part comprising the more rough movable part of precision is without using high-precision guiding element and high rigidity pressurized air Any one of bearing etc., and ball guiding element that ball or idler wheel can be used etc. etc. is made.Also, comprising precision it is more rough can The composition part in dynamic portion, without using being considered the nothing of necessary high thrust, low ripple when to be carried out at high speed high accuracy positioning Iron core linear electric machine (voice coil motor) etc., and can be using cored linear electric machine, ball screw driving or belt driving etc. compared with valence Component that is honest and clean and being easier to enlargement.

Furthermore by can inhibit the transmitting vibrated toward fine motion microscope carrier for fine motion microscope carrier and coarse motion microscope carrier portion configured separate.

Further, since being to be directed at detection system detection and be set to substrate in advance toward the positioning after the stepping movement of X, Y-direction Alignment mark moves fine motion microscope carrier according to the testing result, therefore positioning accuracy when exposure is also high.

" the 7th implementation form "

Secondly, being directed to the 7th implementation form, it is illustrated according to Figure 30~Figure 49.Herein, respectively implement with the above-mentioned 1st to the 6th Homomorphosis or same composition part assign same or like symbol, and simplify or the description thereof will be omitted.

The composition of the exposure device 700 for showing the 7th implementation form of the outlines such as aftermentioned air flotation cell group is omitted in Figure 30, Figure 31 shows the top view that the part of exposure device 700 is omitted.Figure 31 is equivalent to the lower section relatively projection optics system PL of Figure 30 Divide the top view of (compared with the part below lens barrel platform).Also, Figure 32 shows the exposure device 700 from the +X direction of Figure 30 Side view (figure that part is omitted, partially shown with section).In addition, during Figure 33 shows with the control system of exposure device 700 and is The heart is constituted, and plans as a whole the block diagram of the import and export relationship of the main control unit 50 in each portion of control composition.Figure 33 is then shown and substrate Microscope carrier is associated to constitute each portion.Main control unit 50 includes work station (or microcomputer) etc., plans as a whole control exposure device 700 Each portion of composition.

The exposure device 700 of this 7th implementation form is to replace aforesaid substrate with the deviation of above-mentioned 1st implementation form Bearing table device PST and be provided with baseplate carrier device PSTf, composition of other parts etc. is then identical as above-mentioned 1st implementation form.

The composition of baseplate carrier device PSTf and above explained baseplate carrier device PST, PSTa, PSTb, PSTc, The composition for the baseplate carrier device PSTd that the exposure device 500 of above-mentioned 5th implementation form in PSTd, PSTe has connects the most Closely.Therefore, hereinafter, for the baseplate carrier device PSTf that the exposure device 700 of this 7th implementation form has, with and substrate It is illustrated centered on the dissimilarity of bearing table device PSTd.

Compare Figure 23 and Figure 31 it is found that the deviation of baseplate carrier device PSTf and baseplate carrier device PSTd is substrate The configuration of the size, the air flotation cell group configured in the Y direction two sides of substrate holding PH that keep tool PH (fine motion microscope carrier 26) And it constitutes and respectively transports dress configured with 1 substrate X stepping in the configuring area of the air flotation cell group of the Y direction two sides Set 91.In addition, compare Figure 24 and Figure 32 it is found that a pair of X beam 30A, 30B possessed by baseplate carrier device PSTf Y direction Width is narrow compared with the width of a pair of X beam possessed by baseplate carrier device PSTd (about half degree).

It is the upper surface of each in X beam 30A, 30B, as shown in figure 32,1 is only fixed in the center of Y direction and extends X-axis The x-ray guiding element 36 in direction.In this 7th implementation form, x-ray guiding element 36, which has, to be arranged included in X-direction with predetermined distance Multiple permanet magnets magnet unit, as be X stator.Also, also can be except x-ray guiding element 36, being arranged has magnetite The X stator of unit.Furthermore multiple, such as 2 x-ray guiding elements can be also set on X beam 30A, 30B.

Coarse motion platform 32, as shown in figure 32, with aforesaid substrate bearing table device PSTd likewise, being disposed on X beam 30A, 30B On.Coarse motion platform 32 is made of the vertical view rectangular plate-like component that center is formed with the opening for running through Z-direction.In Figure 32, coarse motion Platform 32 is shown together, with the side of fragmentary cross-sectional view with weight payment device 28.It is in coarse motion platform 32 in the following, as shown in figure 32, relatively Each x-ray guiding element 36 is fixed with such as 4 (referring to Figure 30) in X-direction with predetermined distance, adds up to 8 saddles 44.Coarse motion platform 32, it is straight to be guided in X-direction by multiple x-ray guiding element devices comprising x-ray guiding element 36 Yu saddle 44.

Also, this occasion, each saddle 44 includes coil unit, by adding up to 8 coil units possessed by each saddle 44, with Above-mentioned X stator is constituted together by coarse motion platform 32 with predetermined stroke driving in the x-ray motor 42 of X-direction (referring to Figure 33).

Also, also can except saddle 44, separately be arranged X can mover, in this occasion, saddle 44 may include rolling element (such as Multiple balls etc.), be slidably sticked in each x-ray guiding element 36.

Also, in Figure 30~Figure 32 although not shown, being fixed in the intended party of X beam 30A, 30B, such as in X beam 30A with X Axis direction is the X scale in period direction, is fixed with composition in coarse motion platform 32 and finds out coarse motion platform 32 in X-direction using X scale The encoder head of the x-ray encoder system 46 (referring to Figure 33) of location information.Coarse motion platform 32 is in the position of X-direction It is controlled according to the output of above-mentioned encoder head by main control unit 50 (referring to Figure 33).

Herein, though declaration order is slightly inverted, then explanation is mounted in the substrate holding PH above fine motion microscope carrier 26. Substrate holding PH, as shown in Figure 31, X-direction length is same with substrate P and Y direction width (length) is then substrate P About 1/3.Substrate holding PH is by a part (being herein, substrate P in about 1/3 part of Y direction) of substrate P with such as vacuum Absorption (or Electrostatic Absorption) mode is adsorbed holding, and can be sprayed gas-pressurized (such as pressure-air) upwards and be passed through the ejection A part (about the 1/3 of substrate P) of the pressure supporting substrates P in a manner of non-contact (suspension) from below.Substrate holding PH is to base The ejection of the pressure-air of plate P and the switching of vacuum suction are (not shown) true by the way that substrate holding PH switching to be connected to The holding tool suction and discharge switching device 51 (referring to Figure 33) of sky pump and source of high pressure air, since main control unit 50 carries out.

In this 7th implementation form, fine motion microscope carrier 26 is also comprising multiple voice coil motors (or linear electric machine), for example comprising a pair X voice coil motor 54X, a pair of Y voice coil motor 54Y and 4 Z voice coil motor 54Z, pass through composition identical as above-mentioned 1st implementation form The driving of fine motion microscope carrier be 52 (referring to Figure 33), by micro-move device in 6DOF direction (X-axis, Y-axis, Z axis, θ on coarse motion platform 32 X, all directions of θ y and θ z).Also, being also to be by above-mentioned x-ray motor 42 and the driving of fine motion microscope carrier in this 7th implementation form 52 each pair X voice coil motor 54X and Y voice coil motor 54Y makes fine motion microscope carrier 26 can be with respect to projection optics system PL (referring to Figure 30) In X-direction (fine motion) is moved with long stroke mobile (coarse motion) and a little in the 3DOF direction of X-axis, Y-axis and the direction θ z.

As shown in figure 32, in the side+Y of X beam 30A and the side-Y of X beam 30B, Y is compared with the frame of above-mentioned 5th implementation form Axis direction width (length) larger pair of frame 110A, 110B's is each, and the mode to avoid contact pallet 18 is arranged in ground On the F of face.Air flotation cell group 84E, 84F are provided in a pair of frames 110A, 110B is the upper surface of each.Also, a pair of frames 110A, 110B can also be arranged on pallet 18.

Air flotation cell group 84E, 84F are disposed on the Y direction two sides of substrate holding PH as shown in FIG. 31 and 32. Air flotation cell group 84E, 84F's is each, as shown in figure 31, be the width of Y direction and the Y direction width of substrate P it is same, In the rectangular area of moving range substantially equal length when length and substrate holding the PH scanning of X-direction are mobile, in X-axis Direction is constituted with predetermined distance, in Y direction across multiple air flotation cells that gap slightly is distributed.In the IA of exposure area The heart and the X position at the center of air flotation cell group 84E, 84F are roughly the same.The upper surface of each air flotation cell is to be set to keep with substrate Have same or slightly lower above PH.

Each air flotation cell of air flotation cell group 84E, 84F are respectively constituted, though size is different, with above-mentioned 1st implementation form Air flotation cell 84 equally constitute.Open and close (on, off) to the pressure-air supply of each air flotation cell are as shown in Figure 33 Main control unit 50 is controlled.

As shown in the above description, in this 7th implementation form, substrate holding PH and the two sides substrate holding PH can be passed through The entirety of at least one party's suspension bearing substrate P in air flotation cell group 84E, the 84F of (side ± Y).In addition, passing through substrate holding PH unilateral side (side+Y or the side-Y) air flotation cell group 84E or 84F also can suspension bearing substrate P entirety.

Also, air flotation cell group 84E, 84F, if being respectively provided with wide with the Y direction of the width of above-mentioned Y direction and substrate P The rectangular area of degree same, X-direction length and moving range substantially equal length when substrate holding PH scanning movement If substantially same total bearing area, also replaceable is single large-scale air flotation cell, or by the size of each air flotation cell It is made different from the situation of Figure 31 and is distributed in above-mentioned rectangular area.

The Y direction of the substrate holding PH of each multiple air flotation cells of air flotation cell group 84E, 84F is constituted in configuration In 2 rectangular areas of two sides, as shown in figure 31, the opposite X for passing through the center exposure area IA (center of projection optics system PL) Axis, it is asymmetrical to be configured with multiple, such as 3 substrate Y stepping conveyers 88 and 1 substrate X stepping conveyer 91.Substrate Y stepping conveyer 88 and substrate X stepping conveyer 91 it is each, be configuration in the case of not interfering with air flotation cell In above-mentioned 2 rectangular areas.Herein, the quantity of substrate Y stepping conveyer 88 can be 2, can also be 4 or more.

Substrate Y stepping conveyer 88 is the device to keep substrate P (such as absorption) to keep it mobile to Y direction, Under vertical view, 3 are configured with predetermined distance in X-direction in air flotation cell group 84E, 88F each inside.Each substrate Y stepping fortune It send device 88 to divide to be fixed on frame 110A or 110B by supporting member 89 (referring to Figure 32).Each substrate Y stepping conveyer 88, the back side for having sorbing substrate P is displaced into the movable part 88a of Y direction and is fixed on the fixed part of frame 110A or 110B 88b.Movable part 88a, as an example for, be by be set to movable part 88a can mover be set to fixed part 88b stator The driving device 90 (not shown in Figure 32, reference Figure 33) that the linear electric machine of composition is constituted, opposing frame 110A or 110B quilt It drives in Y direction.It is read in the position that substrate Y stepping conveyer 88 is equipped with encoder of position of measurement movable part 88a etc. Take device 92 (not shown in Figure 32, reference Figure 33).

The Y direction shift motion of the movable part 88a of each substrate Y stepping conveyer 88 is the Y direction length of substrate P About 2/3 (slightly short).In this 7th implementation form, due to the movable part 88a (substrate adsorption of each substrate Y stepping conveyer 88 Face) also need the back side of sorbing substrate P or desorb to be separated from substrate P, therefore also can by 90 micro-move device of driving device in Z-direction.Also, in following explanation, removing especially to add in fact, though movable part 88a is that sorbing substrate P is displaced into Y direction Outside with the situation of difference, substrate Y stepping conveyer 88 and movable part 88a are not distinguished.

Substrate X stepping conveyer 91 is the device to keep (such as absorption) substrate P to keep it mobile toward X-direction, Under vertical view, 1 is respectively configured with inside air flotation cell group 84E, 84F.Each substrate X stepping conveyer 91 passes through bearing structure respectively Part 93 is fixed on frame 110A or 110B (referring to Figure 32).

Each substrate X stepping conveyer 91, as shown in figure 32, what the back side for having sorbing substrate P was displaced into X-direction can The dynamic portion 91a and fixed part 91b for being fixed on frame 110A or 110B.Movable part 91a is for example, by being made of linear electric machine Driving device 95 (it is not shown in Figure 32, referring to Figure 33) opposing frame 110A or 110B driving in X-direction.In substrate X stepping Conveyer 91 is equipped with (not shown in Figure 32, the reference of position reading out device 97 of encoder of position of measurement movable part 91a etc. Figure 33).Also, driving device 95 is not limited to linear electric machine, it also can be by use the rotating electric machine of ball screw or belt as drive The driving mechanism in dynamic source is constituted.

The X-direction shift motion of the movable part 91a of each substrate X stepping conveyer 91, for example, the X-axis side of substrate P To about 2 times of length.Certain length is exposed from the past side+X air flotation cell group 84E, 84F in the side end+X of each fixed part 91b.

Also, due to each substrate X stepping conveyer 91 movable part 91a (substrate adsorption face) must sorbing substrate P the back side, With desorb to be separated from substrate P, therefore also can 95 micro-move device of driven device in Z-direction.Also, in fact, movable part Though 91a is that sorbing substrate P is displaced into X-direction, it is right below, in addition to the situation that need especially distinguish, does not distinguish substrate X step Into conveyer 91 and movable part 91a.

Also, in above description, substrate Y stepping conveyer 88 and each movable part of substrate X stepping conveyer 91, by In must carry out with the separation of substrate P, contact, therefore can also be displaced into Z-direction, but not limited to this, for progress movable part (substrate Adsorption plane) to the absorption of substrate P and with the separation of substrate P, can also be the substrate guarantor of back side a part that absorption keeps substrate P It holds tool PH (fine motion microscope carrier 26) and is displaced into Z-direction.

Weight payment device 28 supports fine motion microscope carrier 26 by levelling device 78 from below.Weight offsets the configuration of device 28 and exists In the opening of coarse motion platform 32, the upper half is exposed to top, its lower half compared with coarse motion platform 32 and is exposed to lower section compared with coarse motion platform 32.

Weight offsets device 28, as shown in figure 32, has basket 64, air spring 66 and Z saddle 68 etc., for example, with The later identical composition of each implementation form of above-mentioned 2nd implementation form.Also that is, the baseplate carrier device of this 7th implementation form In PSTf, Z saddle 68 offsets device 28 and fine motion microscope carrier as the fixed part for levelling device 78, not set gasket, weight 26 integrations.Also, maximum weight offsets the independent of device 28 since weight payment device 28 is integrated with fine motion microscope carrier 26 Connection device 80 (flexure device) of movement etc. is simultaneously not set.Fine motion microscope carrier 26, be by in Figure 32 with bulbous member The spherical bearing that schematically shows or the quasi- levelling device 78 like spherical bearing tectosome, inclination freely (with respect to X/Y plane in θ x and The direction θ y swing freely) be supported on Z saddle 68.

Weight payment device 28 and by levelling device 78 be supported in weight offset device 28 top composition part it is (micro- Dynamic load platform 26 and substrate holding PH etc.), by the effect of a pair of of X voice coil motor 54X, X is displaced into coarse motion platform 32 one Axis direction.Also that is, top composition part (fine motion microscope carrier 26 and substrate holding PH etc.), by the control of main control unit 50, The driving synchronous with coarse motion platform 32 of weight payment device 28 is supported in (with 32 Tongfang of coarse motion platform using a pair of of X voice coil motor 54X To, with speed drive), X-direction is displaced into predetermined stroke together with coarse motion platform 32 accordingly.Also, top composition part (fine motion Microscope carrier 26 and substrate holding PH etc.), by the control of main control unit 50, pass through a pair of of X voice coil motor 54X, a pair of Y voice coil Motor 54Y and 4 Z voice coil motor 54Z, opposite coarse motion platform 32 is by micro-move device in 6DOF direction.

In this 7th implementation form, include coarse motion platform 32, weight payment device 28, fine motion microscope carrier 26 and substrate holding PH Deng constituting and be integrally displaced into the moving body (hereinafter, title baseplate carrier appropriate (26,28,32, PH)) of X-direction with substrate P.

As shown in Figure 30 and Figure 31, near the X-direction center of the Y direction two sides of fine motion microscope carrier 26, lead to respectively Moving lens bearing part (not shown) is crossed, is similarly equipped with the 5th implementation form by flat with reflecting surface orthogonal to X-axis A pair of of X moving lens 94X that face reflecting mirror (or corner cube) is constituted₁、94X₂.In the side-Y side of fine motion microscope carrier 26, such as Figure 32 It is shown, by reflecting mirror holding member (not shown), it is fixed with by the strip plane reflection with reflecting surface orthogonal to Y-axis The Y moving lens 94Y that mirror is constituted.

In this 7th implementation form, the location information in the X/Y plane of fine motion microscope carrier 26 (substrate holding PH), be with it is above-mentioned Each implementation form similarly passes through baseplate carrier interferometer system 98 (referring to Figure 33), such as with the resolution of 0.5~1nm degree Power is detected at any time.Also, in fact, baseplate carrier interferometer system 98 has and moves with a pair of X as shown in Figure 31 and Figure 33 Index glass 94X₁、94X₂Corresponding a pair of X laser interferometer (hreinafter referred to as X interferometer) 98X₁、98X₂And with Y moving lens 94Y Corresponding a pair of Y laser interferometer (hreinafter referred to as Y interferometer) 98Y₁、98Y₂.X interferometer 98X₁、98X₂And Y interferometer 98Y₁、98Y₂Measurement result be provided to main control unit 50 (referring to Figure 33).

A pair of of X interferometer 98X₁、98X₂It is each, be to be separately fixed at each one end (lower end) as shown in figure 32 It is fixed on the other end of frame (X interferometer frame) 102A, the 102B of slave +X direction interference with L-shaped of-X side frame platform 18 (upper end).Herein, as frame 102A, 102B, due to being the object using L-shaped, can avoid frame 102A, 102B with it is upper It states frame 110A, 110B and is displaced into the interference of the coarse motion platform 32 of X-direction.

Also, a pair of X interferometer 98X₁、98X₂It is and a pair of of X moving lens 94X₁、94X₂Opposite direction, low compared with the upper surface of substrate P Position in Y direction configure the gap that can be contained between substrate holding PH and air flotation cell group 84E or 84F position. Accordingly, in the baseplate carrier device PSTf of this implementation form, a pair of of X interferometer 98X₁、98X₂Be arranged in substrate holding PH's The situation of position outside X-direction moving range is compared, and the position for being closer to the pallet 18 of the side-X is configurable on.

Also, X interferometer 98X₁、98X₂In intended party, such as X interferometer 98X₂, it is using by 2 as shown in figure 30 X moving lens 94X is irradiated in the interferometer beam (measuring beam) of Z-direction separation₂Multi-axis interferometer.After its reason remains It chats.

Also, as X interferometer, however it is not limited to a pair of of X moving lens 94X₁、94X₂Each irradiate interferometer beam respectively A pair of of X interferometer 98X of (measuring beam)₁、98X₂, also can be used and project comprising being irradiated in a pair of of X moving lens 94X₁、94X₂'s The multi-axis interferometer of a plurality of measuring beam of each at least each 1 measuring beam.

A pair of of Y interferometer 98Y₁、98Y₂, as shown in figure 31, be disposed on constitute air flotation cell group 84F closest to substrate Keep between the air flotation cell column of the 1st column of tool PH and the air flotation cell column of adjacent with this 2nd column and with constitute the 1st column gas The adjacent air flotation cell of floating cell columns being located near X-direction center to each other 2 at gap opposite direction position.Between this is at 2 Gap is the Y-axis relative to the center logical exposure area IA into symmetrical gap.A pair of of Y interferometer 98Y₁、98Y₂, as shown in figure 32, it is By and Y moving lens 94Y it is opposite and in a manner of separating (non-contact) with the air flotation cell for being constituted air flotation cell group 84F, be fixed on and set Supporting member 104 ' above said frame 110B is above.It is from a pair of of Y interferometer 98Y in this implementation form₁、98Y₂Respectively Measuring beam (surveying long light beam) is irradiated to Y moving lens 94Y by gap at above-mentioned 2.Also, Y interferometer 98Y will be supported₁、98Y₂'s When supporting member is installed on the situation of frame 110B, for the measuring basis projection optics system PL for making Y interferometer, frame 110B is most It is that can be located at and the integrated pallet 18 of projection optics system PL well.Alternatively, can not will also support Y interferometer 98Y₁、98Y₂Bearing Component 104 ' is fixed on the frame 110B for being located at ground and is directly fixed on pallet 18.

As Y interferometer, it is not limited to dry to a pair of of Y of Y moving lens 94Y other irradiations interferometer beam (measuring beam) Interferometer 98Y₁、98Y₂, the multi-axis interferometer that 2 measuring beams are irradiated to Y moving lens 94Y also can be used.

In this implementation form, X interferometer 98X₁、98X₂It is located at the surface compared with substrate P (when exposure, to make in Z-direction This face is consistent with the image planes of projection optics system PL, carries out focusing, the leveling control of substrate P) low position, therefore the survey of X position Abbe caused by the postural change (pitching, pitching) of fine motion microscope carrier 26 when can be comprising because of X-direction movement in amount result Error.Main control unit 50 passes through the X interferometer 98X that is constituted with above-mentioned multi-axis interferometer₂The pitching amount of fine motion microscope carrier 26 is detected, According to the testing result, X interferometer 98X is carried out₁、98X₂Above-mentioned Abbe error contained in the X position measurement result measured is repaired Just.Also that is, to carry out the amendment of the Abbe error, as X interferometer 98X₂, it is using to X moving lens 94X₂It is irradiated in Z axis side To separation 2 interferometer beams (measuring beam), also can be detected fine motion microscope carrier 26 pitching amount multi-axis interferometer.

The composition of the other parts of baseplate carrier device PSTf is identical as baseplate carrier device PSTd.Also, baseplate carrier fills Each portion of composition and above-mentioned each implementation form other than setting is identical (referring to Figure 30~Figure 33).

Then, illustrate the one of the processing substrate that the exposure device 700 of the 7th implementation form of sheet constituted in the above described manner carries out The movement of consecutive.It herein, as an example, is for the situation for carrying out the 2nd layer of later exposure to substrate P, according to Figure 34~figure 49 are illustrated.Also, exposure area IA shown in Figure 34~Figure 49, illumination light IL shines through projection optics system PL when being exposure The illumination region penetrated, in fact, not will form when other than exposure, but to close the position between substrate P and projection optics system PL System is clear and is shown at any time.

Firstly, being carried out under the management of main control unit 50 by exposure mask carrying device (not shown) (exposure mask loader) Exposure mask M is loaded to the loading movement on exposure mask microscope carrier MST, and device is moved in by substrate (not shown) and remove substrate P Enter and moves in movement on (investment) baseplate carrier device PSTf.In substrate P, the exposure before front layer is equipped in each irradiation area Light time, such as shown in Figure 31, there is multiple total 6 irradiation area SA1~SA4 with such as X-direction 2, Y direction 3 Together, the multiple alignment marks (not shown) being transferred simultaneously with the pattern of each irradiation area.

Main control unit 50 is moved in device is moved in substrate above the air flotation cell group 84F of the side-Y as shown in figure 34 Substrate P, using air flotation cell group 84F by suspension bearing, on one side inhaled using the substrate X stepping conveyer 91 of the side-Y Attached holding is transported as shown in blacking arrow in Figure 34 toward -X direction.

Secondly, main control unit 50, is kept using the absorption of substrate Y stepping conveyer 88 of the side most+X of the side-Y by gas The substrate P of floating one-element group 84F suspension bearing, and release absorption of the substrate X stepping conveyer 91 to substrate P.Then, main control Device 50 is transported substrate P in +Y direction as shown in dotted arrow in Figure 34 using substrate Y stepping conveyer 88.

Accordingly, as shown in figure 35, substrate P is loaded across the side-Y of substrate holding PH and substrate holding PH A part of air flotation cell group 84F.At this point, substrate P is the branch that suspended by a part of substrate holding PH and air flotation cell group 84F It holds.Then, substrate holding PH is switched to attraction from exhaust by main control unit 50.Accordingly, it becomes with substrate holding PH adsorbs a part (about the 1/3 of substrate P entirety) of fixed substrate P, with a part of suspension bearing substrate of air flotation cell group 84F The state of a part (substrate P all remaining about 2/3) of P.At this point, appointing to enter at least two alignment mark in substrate P One is directed at the visual field of detection system and comes on substrate holding PH, and substrate P is loaded across substrate holding PH and air bearing list A part of first group 84F.

And then it after aforesaid substrate keeps tool PH to start the absorption movement of substrate P, is released by main control unit 50 Absorption of the substrate Y stepping conveyer 88 to substrate P, substrate Y stepping conveyer 88 (movable part 88a) return to shown in Figure 36 The mobile limit positions in the side-Y position of readiness.At this point, substrate X stepping conveyer 91 (movable part 91a), also by main control Device 50 returns to the position of readiness of the mobile limit positions in the side-X shown in Figure 36.

Later, by main control unit 50, to find out fine motion microscope carrier 26 with existing identical alignment measurement method, (substrate is protected Hold tool PH) position of opposite projection optics system PL, fine motion microscope carrier 26 opposite with substrate P Position Approximate.Also, substrate P is mutually in micro- Dynamic load platform 26 can omit locating tab assembly.

Then, main control unit 50 drives fine motion microscope carrier 26 to make in substrate P according to above-mentioned measurement result by coarse motion platform 32 At least two alignment mark be moved to it is any alignment detection system the visual field in, with carry out substrate P with respect to projection optics system PL pair Locating tab assembly, according to this as a result, finding out to carry out the scanning starting position of the exposure of the irradiation area SA1 in substrate P.Herein, it is The front and back of the scanning being exposed, constant speed movement section when due to scan exposure includes acceleration area and deceleration interval, Strictly speaking, scanning starting position is to accelerate starting position.Then, main control unit 50 drives coarse motion platform 32 and micro-move device fine motion Substrate P is positioned at the scanning starting position (accelerating starting position) by microscope carrier 26.At this point, carrying out fine motion microscope carrier 26, (substrate is kept Have PH) relative to the X-axis of coarse motion platform 32, accurate micro- Locating driver in Y-axis and the direction θ z (or 6DOF direction).In Figure 36 It shows and is by this method located in substrate P to carry out the scanning starting position of the exposure of irradiation area SA1 in substrate P and (accelerating Starting position) a moment afterwards state.

Later, the exposure actions of step-scan mode are carried out.

The exposure actions of step-scan mode are sequentially to be exposed place to multiple irradiation area SA1~SA6 in substrate P Reason.Substrate P is to accelerate the set acceleration time in X-direction, later by given time etc. at scanning motion (X scanning motion) Speed driving (in the driving of this constant speed, is exposed (scan exposure)), then carries out the deceleration with acceleration time same time later. Also, substrate is in X-axis or Y direction by driving appropriate (hereinafter, respectively (when moving between irradiation area) in stepwise operation Claim X stepwise operation, Y stepwise operation).In this implementation form, the maximum exposure of each irradiation area SAn (n=1,2,3,4,5,6) is wide Spend about 1/3 that (width of Y direction) is substrate P.

Specifically, exposure actions are to carry out in the following manner.

From the state of Figure 36, baseplate carrier (26,28,32, PH) is driven to the side-X as applied shown in white arrow in Figure 36 To carrying out the X scanning motion of P.At this point, exposure mask M (exposure mask microscope carrier MST) is synchronous with substrate P (fine motion microscope carrier 26) by past -X direction Driving, irradiation area SA1 can be by the exposure area IA of the view field of the exposure mask M pattern of projection optics system PL, therefore, in this Scan exposure of the Shi Jinhang to irradiation area SA1.Scan exposure is in the past -X direction of fine motion microscope carrier 26 (substrate holding PH) Acceleration after constant speed movement in, illumination light IL is irradiated to substrate P via exposure mask M, projection optics system PL and is carried out.

When above-mentioned X scanning motion, main control unit 50 is adsorbed by a part (about the 1/3 of substrate P entirety) of substrate P It is fixed on the substrate holding PH for being mounted in fine motion microscope carrier 26, a part (about the 2/3 of substrate P entirety) suspension branch by substrate P It holds in the state of on air flotation cell group 84F, drive substrate microscope carrier (26,28,32, PH).At this point, main control unit 50 is according to X Coarse motion platform 32 is driven by x-ray motor 42 and is carried in X-direction, and according to substrate by the measurement result of linear encoder system 46 Platform interferometer system 98, the measurement result of Z inclination measurement system 76, driving fine motion microscope carrier driving be 52 (each voice coil motor 54X, 54Y,54Z).Accordingly, substrate P i.e. with fine motion microscope carrier 26 together, by one be supported on weight payment device 28 in the state of, It is displaced into X-direction by 32 one of the effect of a pair of of X voice coil motor 54X and coarse motion platform, and by from coarse motion platform 32 Opposite driving carries out accurate position control in all directions (6DOF direction) of X-axis, Y-axis, Z axis, θ x, θ y and θ z.In addition, Main control unit 50 is synchronous with fine motion microscope carrier 26 (substrate holding PH) when X scanning motion, according to exposure mask interferometer system 14 Measurement result the exposure mask microscope carrier MST turntable driving of exposure mask M will be kept in X-direction, and micro-move device is in Y direction and the side z θ To.The scan exposure to irradiation area SA1 is shown in Figure 37 to be terminated, keep a part of substrate P baseplate carrier (26,28, 32, PH) stop state.

Then, main control unit 50 apply shown in white arrow in Figure 37, carry out substrate P to carry out time acceleration of an exposure It slightly drives in the X stepwise operation of the substrate P of +X direction.The X stepwise operation of substrate P is by main control unit 50 with dynamic with X scanning Make same state-driven (but, position deviation on the move and stringent not as good as scanning motion limit) baseplate carrier (26,28,32, PH) carry out.Main control unit 50 and the X stepwise operation of substrate P are parallel, and exposure mask microscope carrier MST is made to return to acceleration Starting position.

Then, after X stepwise operation, main control unit 50 starts substrate P (baseplate carrier (26,28,32, PH)) and exposure mask The -X direction of M (exposure mask microscope carrier MST) accelerates, similar to the above to be scanned exposure to irradiation area SA2.It is shown in Figure 38 The scan exposure of irradiation area SA2 is terminated, the state that baseplate carrier (26,28,32, PH) stops.

Then, the Y stepwise operation be moved to the unexposed area of substrate P on substrate holding PH is carried out.This base The Y stepwise operation of plate P is by main control unit 50 with the 88 (movable part of substrate Y stepping conveyer of the side-Y and the most side-X 88a) absorption keeps the back side of the substrate P in state shown in Figure 38, is releasing absorption of the substrate holding PH to the substrate P Afterwards, by the pressure-air from substrate holding PH exhaust and air flotation cell group 84F connecting pressure-air row In the state that gas makes substrate P suspend, as shown in dotted arrow in Figure 38, with substrate Y stepping conveyer 88 by the past side+Y of substrate P It is carried out accordingly to conveying.In this way, opposing substrate keeps tool PH, only substrate P is mobile toward +Y direction, as shown in figure 39, substrate P, that is, quilt Be assembled into unexposed irradiation area SA3, SA4 against substrate holding PH, across substrate holding PH and air flotation cell group The state of a part of a part and air flotation cell group 84F of 84E.At this point, substrate P is by substrate holding PH and air flotation cell A part of group 84E and a part of suspension bearing of air flotation cell group 84F.Then, by main control unit 50 by substrate holding PH is switched to air-breathing (attraction) from exhaust.Accordingly, it becomes with a part (substrate P of substrate holding PH absorption fixed substrate P It is all about 1/3), with the one of a part of air flotation cell group 84E and a part of suspension bearing substrate P of air flotation cell group 84F The partially state of (substrate P all remaining about 2/3).And then tool PH is kept to open the absorption movement of substrate P in aforesaid substrate After beginning, absorption of the substrate Y stepping conveyer 88 to substrate P is released by main control unit 50.

Then, it is new to presetting on locating tab assembly that is, progress substrate P with respect to projection optics system PL to carry out substrate P A time irradiation area alignment mark measurement.When this is to locating tab assembly, to make the alignment mark of measurement object enter alignment In the detection visual field of detection system, optionally carry out the X stepwise operation of aforesaid substrate P (referring to the painting white arrow of Figure 40).

Then, when substrate P with respect to projection optics system PL it is new to locating tab assembly at the end of, i.e., by 50 basis of main control unit This is as a result, carry out the micro- fixed of the precision of the X-axis of the opposite coarse motion platform 32 of fine motion microscope carrier 26, Y-axis and the direction θ z (or 6DOF direction) Position driving.

Then, the acceleration of substrate P and the +X direction of exposure mask M (whitewashes arrow referring in Figure 41 by control device 50 Head), carry out the scan exposure same as described above to irradiation area SA3.Show that the scanning to irradiation area SA3 exposes in Figure 41 Light terminates, the state that baseplate carrier (26,28,32, PH) stops.

Secondly, being to carry out time acceleration of an exposure, and carry out baseplate carrier (26,28,32, PH) by main control unit 50 Toward -X direction drive substrate P X stepwise operation and make exposure mask microscope carrier MST return to accelerate starting position movement after, start base The +X direction of plate P and exposure mask M accelerate (referring to the painting white arrow in Figure 42), by with it is above-mentioned it is same in a manner of carry out to irradiation area The scan exposure of SA4.The scan exposure to irradiation area SA4 is shown in Figure 42 to be terminated, and baseplate carrier (26,28,32, PH) stops State only.

Then, the Y stepwise operation be moved to the unexposed area of substrate P on substrate holding PH is carried out.In this When the Y stepwise operation of substrate P, main control unit 50 is with the 88 (movable part of substrate Y stepping conveyer of the side-Y and the most side+X 88a) absorption keeps the back side of the substrate P in state shown in Figure 42, is releasing absorption of the substrate holding PH to the substrate P Afterwards, in the pressure-air of exhaust and the connecting of air flotation cell group 84E and 84F by the pressure-air from substrate holding PH Exhaust so that substrate P is suspended in the state of, as shown in blacking arrow in Figure 42, with substrate Y stepping conveyer 88 toward +Y direction Transport substrate P.In this way, opposing substrate keeps tool PH, only substrate P is mobile (referring to Figure 43) toward Y direction.At this point, in above-mentioned-Y The shorter occasion of the stroke of the substrate Y stepping conveyer 88 of side can be transported by the substrate Y stepping of 50 side use+Y of main control unit The conveying for sending device 88 to connect substrate P (referring to Figure 44).To carry out this connecting, main control unit 50 can walk the substrate Y of the side+Y Into conveyer 88 (movable part 88a) driving in advance in -Y direction, make it in the nearby standby (referring to figure of substrate holding PH 43)。

It is moved to substrate toward +Y direction driving, unexposed irradiation area SA5, SA6 by substrate Y stepping conveyer 88 and is protected The substrate P on tool PH is held, part of it (about the 1/3 of substrate P entirety) is fixed again by the absorption of substrate holding PH In substrate holding PH, and a part (substrate P all remaining about 2/3) is then suspended branch by a part of air flotation cell group 84E It holds.And then after aforesaid substrate keeps tool PH to start the absorption movement of substrate P, substrate Y step is released by main control unit 50 Absorption into conveyer 88 to substrate P.Then, carry out substrate P with respect to projection optics system PL newly to locating tab assembly, Yi Jijin The measurement of a pre-set irradiation area alignment mark in row substrate P.When this is to locating tab assembly, to make measurement object Alignment mark is located in the detection visual field of alignment detection system, optionally carries out the X stepwise operation of aforesaid substrate P (referring in Figure 45 Painting white arrow).

In the new eve to locating tab assembly for starting aforesaid substrate P, air flotation cell group 84F in the side-Y, with not shown Substrate move in device and put into new substrate P (referring to Figure 45).At this point, the movable part of the substrate X stepping conveyer 91 of the side-Y Position that 91a is moved near the Limitation Of Movement position of the side+X that is, it is moved to the position below the substrate P newly put into, in this Position is standby.Also, the movable part 88a of the substrate Y stepping conveyer 88 of the side-Y and the most side-X, be by main control unit 50, As shown in blacking arrow in Figure 45, the Limitation Of Movement position of the side-Y is moved to.

On the other hand, (holding) is fixed in the substrate P of substrate holding PH, when substrate P is with respect to projected light to a part Be PL it is new to locating tab assembly at the end of, i.e., by main control unit 50 according to this as a result, carrying out fine motion microscope carrier 26 with respect to coarse motion The micro- Locating driver of precision of the X-axis of platform 32, Y-axis and the direction θ z (or 6DOF direction).Then, according to above-mentioned 1st irradiated region SA1 program same as the occasion of SA2 in domain carries out the exposure to last 2 irradiation areas SA5, SA6 by main control unit 50. It is shown in Figure 46 and then to the state after the end exposure of last irradiation area SA6.

With above-mentioned exposing parallel to irradiation area SA5, SA6, the substrate P newly put into is by main control unit 50 with-Y The substrate X stepping conveyer 91 of side, which is adsorbed, keeps the past side-X conveying (referring to Figure 46).

On the other hand, finish the substrate P of the exposure to all irradiation area SA1~SA6,50 use+Y of main control unit The substrate Y stepping conveyer 88 of side and the most side-X, as applied the past side+Y conveying shown in white arrow in Figure 47 with dotted line, from base Plate keeps exiting and being carried on air flotation cell group 84E completely on tool PH.Substantially simultaneously with this, the substrate P newly put into then by The substrate Y stepping conveyer 88 of 50 side use-Y of main control unit and the most side-X, past as shown in blacking arrow in Figure 47+ The conveying of the side Y, irradiation area SA1, SA2 are located on substrate holding PH (referring to Figure 47).

It is carried to the substrate P of the completion exposure on air flotation cell group 84E, by the substrate of 50 side use+Y of main control unit X stepping conveyer 91 transports, with the past+X of substrate conveyance device (not shown) as shown in the blacking arrow of Figure 48 toward +X direction Direction moves out (referring to Figure 48, Figure 49).

With above-mentioned completion exposure substrate P move out it is parallel, on substrate holding PH substrate P carry out with it is above-mentioned After same alignment actions, that is, the +X direction for starting substrate P and exposure mask M accelerates, by with it is above-mentioned it is same in a manner of carry out to initial Irradiation area SA2 scan exposure (referring to Figure 48, Figure 49).It is same when later, with exposure to above-mentioned 1st plate base P Program, be repeated the alignment to remaining irradiation area on the 2nd plate base P (X stepping, Y stepping), exposure etc. movement and To the movement such as the alignment (X stepping, Y stepping) of the 3rd later substrate, exposure.

It but, can by the above description that the above-mentioned exposure about to irradiation area SA2 initially carries out about the 2nd plate base P Know, in this implementation form, the 1st (odd number piece) substrate P and the 2nd (even slice) substrate P irradiation area exposure sequentially It is different.The exposure sequence of the 1st (odd number piece) substrate P is irradiation area SA1, SA2, SA3, SA4, SA5, SA6, relative to This, the exposure of the 2nd (even slice) substrate P is then the sequence of irradiation area SA2, SA1, SA4, SA3, SA6, SA5.Certainly, it exposes Fairing sequence is not limited to this.

As described above, it according to the exposure device 700 of this 7th implementation form, can obtain and above-mentioned 1st implementation form The same effect of exposure device 100.In addition to this, the exposure device 700 of this 7th implementation form, is equipped on fine motion microscope carrier 26 Substrate holding PH is to maintain a part with the face of the exposed surface of substrate P (processed surface) opposite side.Also that is, substrate is kept The substrate retaining surface for having PH is small compared with substrate P, specifically, being set to about 1/3.Therefore, the instruction of foundation main control unit 50, When substrate Y stepping conveyer 88 moves out substrate P from fine motion microscope carrier 26 (substrate holding PH), substrate P is toward Y direction The mode of displacement is transported in X/Y plane, at this point, substrate Y stepping conveyer 88 only makes the mobile Y-axis compared with substrate P of substrate P The small distance of direction size (width or length) that is, only make substrate P in Y direction displacement and the Y direction size of substrate P The Y direction distance of same size of about 1/3 substrate holding PH, moving out for substrate P terminate (referring for example to Figure 46, figure 47).In this way, the moving distance (moving out distance) of substrate when substrate P moves out is small compared with the size of substrate in this implementation form, because This is compared with the prior art, and can be shortened substrate moves out the time.

Also, according to the exposure device 700 of this 7th implementation form, in the scan exposure knot to irradiation area final in substrate P The time point of beam, fine motion microscope carrier 26 (substrate holding PH) can be such that the substrate P for completing to expose slides in the position of a certain X-direction Y direction side is made with moving out and (keeping out of the way) from substrate holding PH with the slave Y direction other side of this parallel (substantially simultaneously) Substrate P sliding before exposure is to move on (investment) substrate holding PH (referring to Figure 46 and Figure 47).

In addition, being also to make substrate P toward Y-axis when the substrate P before exposure is moved in fine motion microscope carrier 26 (substrate holding PH) The mode of direction displacement is removed in X/Y plane according to the instruction of main control unit 50 by substrate Y stepping conveyer 88 It send, at this point, substrate Y stepping conveyer 88 only needs the Y direction size (width for making substrate P toward Y direction displacement compared with substrate P Or length) small distance that is, with the Y direction width of substrate holding PH (about the 1/3 of the Y direction size of substrate P) phase Same distance terminates moving in for substrate P.Therefore, in addition to substrate move out the time other than, the time of moving in of substrate also can more previously contract It is short, as a result, can be shortened the replacing construction of substrate.

Also, main control unit 50 is the configuration of the irradiation area in response to substrate P and the substrate holding PH of exposure sequence X-direction position, carry out that substrate P sliding of past Y direction side from substrate holding PH moves out and substrate P is from Y-axis side Sliding on to the other side toward substrate holding PH is moved in.Therefore, without as when existing substrate is replaced, make substrate holding PH It is moved to substrate replacement position (for example, position near the Limitation Of Movement position of +X direction) of decision.It accordingly, can be further Shortening substrate replacing construction.

Herein, the explanation in above-mentioned implementation form, though illustrate what the substrate P that exposure is completed was moved out from substrate holding PH Move out direction, be all the situation of +Y direction in any substrate, but in optic placode irradiation area configuration and exposure sequence, certainly At least one party in even number plate base and odd number plate base can be moved out from substrate holding PH toward -Y direction.Also that is, In this implementation form, main control unit 50 be by the replacing construction of substrate be it is shortest in a manner of, according to irradiation area in substrate P Configuration and exposure sequence substrate holding PH X-direction position, the configuration and exposure of irradiation area toward in response to substrate P The direction (+Y direction or -Y direction) of sequence moves out substrate P.Therefore, with no matter irradiation area (region processed) on substrate It configures and why is processing sequence, all compared in certain X position, toward the situation that the same direction moves out, when can shorten substrate replacement Between.

Also, the Y direction size of the bearing surface of air flotation cell group 84E, 84F of the Y direction two sides of substrate holding PH, Be not limited to it is same with the Y direction size of substrate P, can it is big compared with it, also can be smaller.

In addition, the Y direction size of the substrate retaining surface of substrate holding PH is not limited to the Y direction size of substrate P 1/3, can be 1/2,1/4 etc., as long as the Y direction size of the substrate retaining surface of substrate holding PH is compared with the Y-axis side of substrate P To more than the as low as a certain degree of size.In fact, being set to same with the size of the irradiation area formed in substrate P (slightly big).

" the 8th implementation form "

Secondly, being directed to the 8th implementation form, it is illustrated according to Figure 50~Figure 65.Herein, respectively implement with the above-mentioned 1st to the 7th Homomorphosis or same composition part assign same or like symbol, and simplify or the description thereof will be omitted.

In Figure 50, air flotation cell group 84E, 84F etc. are omitted, the exposure device 800 for showing the 8th implementation form of outline It constitutes.Also, Figure 51 is the top view that a part of exposure device 800 is omitted.Figure 51 is equivalent to the projection optics system compared with Figure 50 The top view of part (compared with the part of 16 lower section of lens barrel platform) below PL.

The exposure device 800 of this 8th implementation form, substantially with the same structure of exposure device 700 of above-mentioned 7th implementation form At, but some is different with the baseplate carrier device PSTf of the 7th implementation form by baseplate carrier device PSTg.

It is using being not only Y as substrate holding PH as shown in figure 51 specifically, in baseplate carrier device PSTg The object of axis direction size and X-direction size (such as about 1/2 of substrate P) also small compared with the X-direction size of substrate P.Substrate is protected The Y direction of tool PH is held having a size of about the 1/2 of the Y direction size of substrate P.In addition, in the X-direction two of substrate holding PH Side is configured with and substrate holding PH and independent a pair of air flotation cell (movable air-float unit) 84G of fine motion microscope carrier 26.A pair of of gas Floating unit 84G's is each, is with above it the and side of substantially same (only slightly lower) height of substrate holding PH as shown in figure 50 Formula is fixed on the upper surface of coarse motion platform 32 by supporting member 112.A pair of of air flotation cell 84G's is each, such as the length of Y direction Degree and substrate holding PH same (or compared with substrate holding PH slightly short) and X-direction length is such as substrate holding About the 1/2 of PH.

Also, between substrate holding PH and a pair of of air flotation cell 84G are each, as shown in figure 51, configured with a pair of mobile Substrate Y stepping conveyer 120.Dress is transported in each and aforesaid substrate Y stepping of a pair of of moving substrate Y stepping conveyer 120 It sets 88 to equally constitute, as shown in figure 50, is equipped on coarse motion platform 32.The movable part 120a of each moving substrate Y stepping conveyer 120 Can the relatively fixed fixed part 120b on coarse motion platform 32 be displaced into Y direction.Therefore, each moving substrate Y stepping conveyer 120 can move together with coarse motion platform 32 in X-direction, and can only transport substrate P in Y direction.

Also, the configuring area of a pair of of air flotation cell group 84E, 84F in the Y direction two sides for being configured at substrate holding PH Inside, is each configured with 3 substrate Y steppings conveyer 88 identical with the 7th implementation form and 1 substrate X stepping is transported and filled Set 91.But, as shown in figure 51, in this 8th implementation form, the 3 of each inside of the configuring area of air flotation cell group 84E, 84F A substrate Y stepping conveyer 88 and 1 substrate X stepping conveyer 91 are the X-axis at the opposite center by exposure area IA Balanced configuration.Further, since using such balanced configuration relationship, a pair of of Y interferometer 98Y₁、98Y₂Allocation position with it is above-mentioned 7th implementation form is compared, and the side+Y is relatively partial to.

Also, being the slightly wide person of X beam 30A, 30B using Y direction width compared with the 7th implementation form as X beam 30A, 30B.In The upper surface of X beam 30A, 30B, such as each 2 x-ray guiding elements 36 are similarly fixed with aforesaid substrate bearing table device PST etc., in this X stator 38 is fixed between 2 x-ray guiding elements 36.The each multiple saddles 44 of each 2 x-ray guiding elements 36 are sticked in be consolidated It is scheduled below coarse motion platform 32.Below coarse motion platform 32, it is fixed with and constitutes not scheming for x-ray motor together with X stator 38 The X shown can mover.

The composition of the other parts of baseplate carrier device PSTg is identical as the baseplate carrier device PSTf of the 7th implementation form. This occasion, a pair of of X interferometer 98X₁、98X₂It is to be fixed into and the air bearing on fixed air flotation cell group 84E, 84F and coarse motion platform 32 Any one of unit 84G will not all generate interference, and can be close to a pair of X moving lens 94X₁、94X₂。

The composition of the other parts of baseplate carrier device PSTg is identical as the baseplate carrier device PSTf of the 7th implementation form. It therefore, in baseplate carrier device PSTg, is kept comprising coarse motion platform 32, weight payment device 28, fine motion microscope carrier 26 and substrate The compositions such as tool PH and substrate P are integrally displaced into the moving body of X-direction.In this 8th implementation form, hereinafter, also by this moving body It is appropriate to be known as baseplate carrier (26,28,32, PH).

Secondly, illustrating a series of movement for the processing substrate that the exposure device 800 of this 8th implementation form carries out.Herein, It is to be illustrated for the occasion for carrying out the 2nd layer of later exposure to substrate P according to Figure 52~Figure 65 for as an example.Also, Exposure area IA shown in Figure 52~Figure 65, illumination light IL penetrates the illumination region of projection optics system PL irradiation when being exposure, In fact, not will form when other than exposure, but add at any time to keep the positional relationship between substrate P and projection optics system PL clear With display.

Firstly, being carried out under the management of main control unit 50 by exposure mask carrying device (not shown) (exposure mask loader) Exposure mask M is loaded to the loading movement on exposure mask microscope carrier MST, and device is moved in by substrate (not shown) and remove substrate P Enter and moves in movement on (investment) baseplate carrier device PSTf.In substrate P, the exposure before front layer is equipped in each irradiation area Light time, such as shown in Figure 51, there is multiple total 4 irradiation area SA1~SA4 with such as X-direction 2, Y direction 2 Together, the multiple alignment marks (not shown) being transferred simultaneously with the pattern of each irradiation area.

Firstly, substrate P is filled as shown in figure 52 according to sequence identical with the 1st plate base P in above-mentioned 7th implementation form Carry into a part of the air flotation cell group 84F of the side-Y across substrate holding PH Yu substrate holding PH.At this point, substrate P is By the air flotation cell 84G suspension bearing of a part of substrate holding PH and air flotation cell group 84F and the side+X.Then, by master control Substrate holding PH is switched to air-breathing (attraction) from exhaust by device 50 processed.Accordingly, become to adsorb with substrate holding PH and fix A part (substrate P of the corresponding rectangular area comprising irradiation area SA1 all about 1/4) of substrate P, with air flotation cell group The state of a part (substrate P all remaining about 3/4) of a part of 84F and air flotation cell 84G suspension bearing substrate P.This When, it is protected to make at least two alignment mark in substrate P enter the visual field of any alignment detection system (not shown) and coming substrate It holds on tool PH, substrate P is a part and the air flotation cell 84G being assembled into across substrate holding PH and air flotation cell group 84F.

And then after aforesaid substrate keeps tool PH to start the absorption movement of substrate P, base is released by main control unit 50 Absorption of the plate Y stepping conveyer 88 to substrate P.At this point, substrate Y stepping conveyer 88 (movable part 88a) and substrate X stepping Conveyer 91 (movable part 91a) returns to the standby position of the mobile limit positions in the side-Y respectively according to the instruction of main control unit 50 It sets, the position of readiness of the mobile limit positions in the side-X.

Later, by main control unit 50 to find out fine motion microscope carrier 26 with respect to projected light with existing identical alignment measurement method Be the general position of the position of PL, fine motion microscope carrier 26 opposite with substrate P.Also, can also omit substrate P with respect to fine motion microscope carrier 26 To locating tab assembly.

Then, main control unit 50 drives fine motion microscope carrier 26 so that substrate P according to above-mentioned measurement result by coarse motion platform 32 On at least two alignment mark be moved to it is any alignment detection system the visual field in, carry out pair of the substrate P with respect to projection optics system PL Locating tab assembly, finds out that (acceleration starts to carry out the scanning starting position of exposure of the irradiation area SA1 in substrate P according to the result Position).Then, main control unit 50 drives coarse motion platform 32 and micro-move device fine motion microscope carrier 26, and substrate P is positioned at the scanning and is started Position (accelerates starting position).At this point, carrying out fine motion microscope carrier 26 with respect to the X-axis of coarse motion platform 32, Y-axis and the direction θ z (or 6DOF Direction) the micro- Locating driver of precision.It shows and just completes for substrate P to be located in by this method to carry out in substrate P in Figure 52 State behind the scanning starting position (accelerating starting position) of the exposure of irradiation area SA1.

Later, the exposure actions of step-scan mode are carried out.

The exposure actions of step-scan mode are sequentially exposed to multiple irradiation area SA1~SA4 in substrate P Processing.It is also the above-mentioned X scanning motion for carrying out substrate P, when stepwise operation when scanning motion in this 8th implementation form (when moving between irradiation area) carries out the X stepwise operation or Y stepwise operation of substrate P.Herein, in this 8th implementation form, substrate P Though Y stepwise operation it is identical as the 7th implementation form, the X stepwise operation of substrate P is then as described later with the 7th implementation form phase It is different.In this 8th implementation form, the maximum exposure width (width of Y direction) of each irradiation area SAn (n=1,2,3,4) is base About the 1/2 of plate P.

Specifically, exposure actions are to carry out in the following manner.

Baseplate carrier (26,28,32, PH) is driven to the side-X from the state of Figure 52 as applied shown in white arrow in Figure 52 To carrying out the X scanning motion of substrate P.At this point, exposure mask M (exposure mask microscope carrier MST) is driven synchronous with substrate P (fine motion microscope carrier 26) Trend -X direction, irradiation area SA1 can pass through the exposure region of the view field of the pattern of the projection optics system PL exposure mask M projected Domain IA, therefore, in carrying out the scan exposure to irradiation area SA1 at this time.Scan exposure is in 26 (substrate holding of fine motion microscope carrier PH) into the constant speed movement after the acceleration of -X direction, substrate P irradiation illumination light IL is come through exposure mask M, projection optics system PL It carries out.

When above-mentioned X scanning motion, main control unit 50 is in a part (about the 1/4 of the substrate P entirety) absorption for making substrate P The substrate holding PH that is fixed on fine motion microscope carrier 26, make a part (the substrate P all about 3/4) suspension bearing of substrate P in In the state of a part of air flotation cell group 84F and the air flotation cell 84G of the side+X, drive substrate microscope carrier (26,28,32, PH).This When, main control unit 50 by with it is above-mentioned it is same in a manner of, by coarse motion platform 32 driving in X-direction and drive fine motion microscope carrier driving system 52.Accordingly, substrate P i.e. with fine motion microscope carrier 26 together, by one be supported on weight payment device 28 in the state of, pass through one Effect to X voice coil motor 54X, the X-direction that is displaced into 32 one of coarse motion platform, and pass through the opposite drive from coarse motion platform 32 It is dynamic, it is carried out at the precise position control of all directions (6DOF direction) of X-axis, Y-axis, Z axis, θ x, θ y and θ z.In addition, main control Device 50 is synchronous with fine motion microscope carrier 26 (substrate holding PH) that the exposure mask microscope carrier MST of exposure mask M will be kept to sweep when X scanning motion Driving (in Y direction and the direction θ z micro-move device) is retouched in X-direction.The scan exposure to irradiation area SA1 is shown in Figure 53 Terminate, the state that baseplate carrier (26,28,32, PH) stops.

Secondly, carrying out to make a time irradiation area SA2 for substrate P be moved to the X stepwise operation on substrate holding PH. The X stepwise operation of this substrate P is by the back side of the substrate P of state shown in Figure 53 as main control unit 50 with the substrate of the side-Y X stepping conveyer 91 (movable part 91a) is adsorbed holding, and after the absorption for releasing substrate holding PH, by coming from The pressure-air of the connecting of the exhaust and side air flotation cell group 84F and+X air flotation cell 84G of the pressure-air of substrate holding PH Exhaust, so that substrate P is suspended.Accordingly, substrate P becomes the shape only kept by substrate X stepping conveyer 91 (movable part 91a) State.

Secondly, main control unit 50 is maintaining only with substrate X stepping conveyer 91 to the situation of the hold mode of substrate P Under, start to drive baseplate carrier (26,28,32, PH) into the X step in the substrate P of +X direction shown in white arrow as applied in Figure 53 Into.Accordingly, i.e., in the state that substrate P stops at the position before X stepping starts, substrate holding PH is mobile relative to this substrate P In +X direction.Then, main control unit 50 is when substrate holding PH reaches the underface of a time irradiation area SA2 for substrate P, Even if baseplate carrier (26,28,32, PH) stops (referring to Figure 54).At this point, substrate P be assembled into across substrate holding PH with A part of air flotation cell group 84F and the air flotation cell 84G of the side-X.From substrate holding PH, air flotation cell group 84F and air bearing The upper surface of unit 84G sprays pressure-air, and substrate P is suspended bearing.

With above-mentioned in order to which the driving of the baseplate carrier (26,28,32, PH) of the X stepping of substrate P is parallel, main control unit 50 Exposure mask microscope carrier MST is set to return to set acceleration starting position.

Later, absorption of the substrate holding PH to the absorption and substrate X stepping conveyer 91 of substrate P to substrate P is carried out It releases, the positioning (reference with the substrate P to locating tab assembly and using fine motion microscope carrier 26 using alignment mark new in substrate P White arrow is applied in Figure 54).Later, baseplate carrier (26,28,32, PH) is synchronous with exposure mask microscope carrier MST, as applied white arrow in Figure 55 It is shown, it is displaced into -X direction, carries out the scan exposure of a time irradiation area SA2 accordingly.Irradiation area SA2 is shown in Figure 56 End exposure after, baseplate carrier (26,28,32, PH) stop state.

Secondly, carrying out to make a time irradiation area SA3 for substrate P be moved to the Y stepwise operation on substrate holding PH. The Y stepwise operation of this substrate P is to carry out as follows.Also that is, main control unit 50 will be in the back side of the substrate P of state shown in Figure 56 Holding is adsorbed with the moving substrate Y stepping conveyer 120 (movable part 120a) of the side-X, and releases substrate holding PH Absorption to substrate P.Later, main control unit 50, in the exhaust and air bearing by the pressure-air from substrate holding PH In the state that the exhaust of the pressure-air of the connecting of one-element group 84F and air flotation cell 84G makes substrate P suspend, such as dotted line in Figure 56 It applies shown in white arrow, is transported substrate P toward +Y direction with the moving substrate Y stepping conveyer 120 of the side-X.Accordingly, only substrate P opposing substrate keeps tool PH mobile (referring to Figure 57) toward +Y direction.At this point, the moving substrate Y stepping conveyer 120 of the side-X Stroke insufficient situation when, the substrate Y stepping conveyer 88 positioned at the side+Y of the most side-X can be used in main control unit 50 Connect the conveying of substrate P (referring to the blacking arrow in Figure 58).

At this point, substrate P is the gas for being assembled into a part and the side-X across substrate holding PH and air flotation cell group 84E Floating unit 84G.Pressure-air, substrate P quilt are sprayed from the upper surface of substrate holding PH, air flotation cell group 84E and air flotation cell 84G Suspension bearing.

Later, substrate holding PH is carried out to the absorption of substrate P and moving substrate Y stepping conveyer 120 to substrate P Absorption is released, (is joined using the positioning of the substrate P to locating tab assembly and using fine motion microscope carrier 26 of alignment mark new in substrate P According to the painting white arrow in Figure 57 or Figure 58).Later, baseplate carrier (26,28,32, PH), such as Figure 59 synchronous with exposure mask microscope carrier MST Shown in middle painting white arrow, it is displaced into +X direction movement, carries out the scan exposure of a time irradiation area SA3 accordingly.It is shown in Figure 60 After the end exposure of irradiation area SA3, state that baseplate carrier (26,28,32, PH) stops.

Secondly, carrying out to make a time irradiation area SA4 for substrate P be moved to the X stepwise operation on substrate holding PH. The X stepwise operation of this substrate P is to carry out as follows.

Also that is, main control unit 50 transports at the back side of the substrate P in state shown in Figure 60 with the substrate X stepping of the side+Y Device 91 (movable part 91a) is adsorbed holding, and after releasing the absorption of substrate holding PH, the height from substrate holding PH The exhaust of the pressure-air of the exhaust of air and the connecting of the side air flotation cell group 84E and-X air flotation cell 84G is pressed to keep substrate P outstanding It is floating.Accordingly, substrate P becomes the state only kept by substrate X stepping conveyer 91 (movable part 91a).

Then, main control unit 50 is maintaining the case where only substrate X stepping conveyer 91 is to the hold mode of substrate P Under, if applied shown in white arrow in Figure 60, start to drive baseplate carrier (26,28,32, PH) in the X stepping of -X direction.Accordingly, Substrate P, i.e., in the state of the position before the X stepping for stopping at baseplate carrier (26,28,32, PH) starts, substrate holding PH This opposite substrate P is displaced into -X direction.Then, main control unit 50 reaches a time irradiated region for substrate P in substrate holding PH When the underface of domain SA4, stop baseplate carrier (26,28,32, PH) (referring to Figure 61).At this point, substrate P be assembled into across A part of substrate holding PH and air flotation cell group 84E and the air flotation cell 84G of the side+X.From substrate holding PH, air bearing list The upper surface of first group 84E and air flotation cell 84G sprays pressure-air, and substrate P is suspended bearing.

Parallel with the stepper drive of aforesaid substrate microscope carrier (26,28,32, PH), main control unit 50 returns exposure mask microscope carrier MST To set acceleration starting position.

Later, absorption of the substrate holding PH to the absorption and substrate X stepping conveyer 91 of substrate P to substrate P is carried out It releases, using positioning (reference Figure 61 to locating tab assembly and the substrate P for using fine motion microscope carrier 26 of alignment mark new in substrate P Middle painting white arrow).Later, as applied shown in white arrow in Figure 62, pass through baseplate carrier (26,28,32, PH) and exposure mask microscope carrier MST Synchronizing moving carries out the scan exposure of a time irradiation area SA4 in +X direction accordingly.Show irradiation area SA4's in Figure 63 After end exposure, the state of baseplate carrier (26,28,32, PH) stopping.

Before the scan exposure of the irradiation area SA4 on aforesaid substrate P, the substrate X stepping conveyer 91 of the side-Y can Dynamic portion 91a prepares moving in for a time substrate, by the standby position near the driving to the Limitation Of Movement position of the side+X of main control unit 50 It sets, it is standby (blacking arrow reference in Figure 62) in the position.

Then, parallel with the scan exposure of the irradiation area SA4 on aforesaid substrate P, dress is moved in by substrate (not shown) It sets by the substrate P on new investment air flotation cell group 84F, by main control unit 50 with the substrate X stepping conveyer 91 of the side-Y (movable part 91a) is adsorbed holding conveying to the side-X (referring to white arrow is applied in Figure 63).

On the other hand, to the substrate P of the end exposure of all irradiation area SA1~SA4, by 50 use+X of main control unit The moving substrate Y stepping conveyer 120 of side, as transported in Figure 63 with the side past+Y shown in dotted arrow, from substrate holding It exits and is carried on the air flotation cell group 84E of the side+Y completely on PH.At this point, the moving substrate Y stepping in the above-mentioned side+X is transported When the insufficient situation of the stroke of device 120, the substrate Y stepping conveyer 88 of the side+Y and the most side+X is can be used in main control unit 50 To connect the conveying for carrying out substrate (referring to Figure 64).Substantially simultaneously with this, the substrate P newly put into is made by main control unit 50 With the substrate Y stepping conveyer 88 of the side-Y and the most side+X, as shown in blacking arrow in Figure 64, the past side+Y conveying makes irradiated region Domain SA1 is located on substrate holding (referring to Figure 64).

It is transported to the substrate P of the completion exposure on air flotation cell group 84E, by the substrate of 50 side use+Y of main control unit X stepping conveyer 91 is transported toward +X direction, is moved out toward +X direction (referring to Figure 64, figure by substrate conveyance device (not shown) 65)。

It is parallel with moving out for the substrate P of above-mentioned completion exposure, the substrate P of substrate holding PH is held in a part, After carrying out alignment actions same as described above, that is, start the acceleration of substrate P and the +X direction of exposure mask M, with it is above-mentioned same Mode carries out the scan exposure to irradiation area SA1 at first (referring to Figure 65).Later, with the exposure to above-mentioned 1st plate base P Light time identical sequence is repeated the alignment (X stepping, Y stepping) to remaining irradiation area in the 2nd later substrate P, exposes The movement such as light, and the alignment (X stepping, Y stepping) of the 3rd later substrate, exposure etc. are acted.This occasion, odd number piece Any one of substrate P and the substrate P of even slice are all with the sequential exposure of irradiation area SA1, SA2, SA3, SA4.

The exposure device 800 of the 8th implementation form of sheet from the description above, in addition to that can obtain and above-mentioned 7th implementation form The same effect of exposure device 700 outside, can by substrate holding PH, carry the fine motion microscope carrier 26 and branch of substrate holding PH Hold this weight payment device 28, do compared with the 1st implementation form more light weight, exquisiteness.

" variation "

In the exposure device of above-mentioned each implementation form, it also can be used and substrate P kept integral and air flotation cell can be passed through The supporting member for substrate for the frame-shaped for making it integrally suspend with substrate P.Hereinafter, as an example, for by such supporting member for substrate The situation of exposure device 800 suitable for the 8th implementation form, is illustrated according to Figure 66.

Supporting member for substrate 69 has the profile overlooked in rectangle (substantially square shape), by central portion as shown in Figure 66 It is constituted with the vertical view rectangular aperture portion that is penetrated through in Z-direction, small (thin) frame member of thickness direction size.Substrate supporting structure Part 69 has a pair using X-direction as longitudinal direction, the plate-like members parallel with X/Y plane in Y direction using predetermined distance X frame component 61x, a pair of of X frame component 61x respectively in the side+X, the end of the side-X, using Y direction as the flat with XY of longitudinal direction The Y frame component 61y of the parallel plate-like members in face is connected.A pair of of X frame component 61x's and a pair of Y frame component 61y is each, From the viewpoint of ensuring rigidity and lightweight, with fibres such as such as GFRP (Glass Fiber Reinforced Plastics) It is preferable that dimension strengthens the formers such as synthetic resin material or ceramics.

Above the X frame component 61x of the side-Y, it is fixed with the Y moving lens 94Y that there is reflecting surface in the face of the side-Y.Also, The upper surface of Y frame component 61y in the side-X is fixed with and is moved by the X that there is in the face in the side-X the plane mirror of reflecting surface to constitute Index glass 94X.This occasion, all need not setting X moving lens, Y moving lens in any one of substrate holding PH and fine motion microscope carrier 26.

Location information (rotation information in the direction z containing θ) in the X/Y plane of supporting member for substrate 69 (that is, substrate P) is To survey a pair of of X interferometer 98X of long light beam comprising the reflecting surface irradiation to X moving lens 94X₁、98X₂And to the anti-of Y moving lens 94Y Penetrate a pair of of Y interferometer 98Y that long light beam is surveyed in face irradiation₁、98Y₂Aforesaid substrate microscope carrier interferometer system 98, with such as 0.5nm journey The capacity of decomposition of degree is detected at any time.

Also, X interferometer, Y interferometer are to consider respectively in the mobile possible range of supporting member for substrate 69, at least one Corresponding moving lens can be irradiated to by surveying long light beam, to set its number of units and/or survey optical axis number or the interval of long light beam.Therefore, respectively The number of units (optical axis number) of interferometer is not limited to 2, the shift motion of optic placode supporting member, for example, can be only 1 (1 axis), Or 3 (3 axis) or more.

Supporting member for substrate 69 has multiple, such as 4 ends (outer peripheral edge portion) by substrate P from below with vacuum suction The holding unit 65 kept.4 holding units 65 are to separate in X-direction, is each each other in a pair of of X frame component 61x Opposite opposite surface is equipped with 2.Also, the quantity of holding unit and configuration are without being limited thereto, such as visual size of substrate, easily scratch The addition appropriate such as curvature.In addition, holding unit is also mountable to Y frame component.Holding unit 65, have for example its above be equipped with For the absorption layer of the sorbing substrate P in a manner of vacuum suction section L-shaped substrate loading component, with by the substrate loading component It is connected to the parallel flat spring of X frame component 61x, substrate loading component is configured to opposite X frame component 61x in X-direction and Y-axis side It can not be rotated toward the direction θ x to by its position of the rigid restraint of parallel flat spring, and by the elasticity of flat spring toward Z axis side To displacement (dynamic up and down).With the substrate holding frame of such holding unit 65 and the identical composition of supporting member for substrate 69 for having this, Such as detailed it is exposed in No. 2011/0042874 specification of U.S. Patent Application Publication No..

In the variation of Figure 66, in the X stepping of substrate P or Y stepwise operation or substrate P to baseplate carrier device PSTg Move out fashionable, main control unit 50 can pass through the movable part 91a of substrate X stepping conveyer 91 or substrate Y stepping and transport dress 88 movable part 88a is set, to adsorb any X frame component 61x or any Y frame component 61y that keep supporting member for substrate 69, also may be used Absorption keeps substrate P.

It, can be by being fixed on X moving lens 94X, Y moving lens 94Y of supporting member for substrate 69 with base in the variation of Figure 66 Onboard interferometer system 98 measures the position of substrate P, therefore, carries out the 1st to substrate P in the exposure device using this variation It, also can be according to the location information of the substrate P measured with baseplate carrier interferometer system 98, according to design value when the situation of the exposure of layer Adequately to carry out the positioning for the acceleration starting position that substrate P is positioned to the exposure for most carrying out each irradiation area in high precision.

In addition, if can in Y frame component 61y, X frame component 61x of supporting member for substrate 69 formed be equivalent to X moving lens 94X, If the reflecting surface of the reflecting surface of Y moving lens 94Y, X moving lens 94X, Y moving lens 94Y might not need be set.This occasion, 69 lightweight of supporting member for substrate can be made to be not provided with part of the grade moving lens.

When supporting member for substrate can be only used for the exposure to the 1st layer of substrate P, also can also it make in the exposure after the 2nd layer With.The former situation when exposure after the 2nd layer, must measure the position of fine motion microscope carrier 26 with baseplate carrier interferometer system 98, Therefore a pair of of the X moving lens 94X that must for example will be made of above-mentioned corner cube₁、94X₂And the Y moving lens 94Y being made of strip mirror It is mounted on position identical with above-mentioned 8th implementation form.In addition, in this occasion, though it also can be by baseplate carrier interferometer system 98 The position of fine motion microscope carrier 26 when the supporting member for substrate 69 (substrate P) being used for when the exposure of first layer and the 2nd layer of exposure The measurement of information, but not limited to this, the substrate interferometer system of the position of supporting member for substrate 69 (substrate P) can will be also measured, It separates with baseplate carrier interferometer system 98 and is separately arranged.

Also, as supporting member for substrate, however it is not limited to which a part of shape jaggy of frame also can be used in the component of frame-shaped Supporting member for substrate.Such as the 8th of No. 2011/0042874 specification of above-mentioned U.S. Patent Application Publication No. can be used to implement The substrate holding frame of disclosed vertical view U-shaped in form.As long as in addition, will not be to substrate scan exposure when movement bring If dysgenic composition, driving in the X/Y plane of assisting base plate supporting member 69, such as auxiliary X-shaft direction can be newly set Long stroke driving driving mechanism.

Also, though representative be described by taking the 8th implementation form as an example, the above-mentioned 1st~the 7th is each in above description In implementation form, aforesaid substrate supporting member can be also used for the bearing of substrate P certainly.

Also, in the above-mentioned 7th, the 8th implementation form, though in the Y direction side of substrate holding PH and the other side It is described with the situation that air flotation cell group 84E, 84F are arranged on the frame of the configured separates such as coarse motion platform 32 and fine motion microscope carrier 26, But at least one party in air flotation cell group 84E, 84F can be also made be equipped on coarse motion platform 32 and can be movable in X-direction It constitutes, and without being limited thereto, also settable another moving body for following the movement of coarse motion platform, carries air bearing list on another moving body First group and it is movable in X-direction.This occasion, also can be to follow the coarse motion platform 32 for being equipped with air flotation cell group or coarse motion platform mobile On another moving body, aforesaid substrate Y stepping conveyer 88 of the setting configuration inside air flotation cell group.In addition, air flotation cell Though group 84E, 84F are to be set to ground by frame, also may be disposed on pallet.

" the 9th implementation form "

Secondly, being directed to the 9th implementation form, it is illustrated according to Figure 67~Figure 99.Herein, respectively implement with the above-mentioned 1st to the 8th Homomorphosis or same composition part assign same or like symbol, and simplify or the description thereof will be omitted.

Air flotation cell group etc., the composition of the exposure device 900 for showing the 9th implementation form of outline are omitted in Figure 67.Figure The top view that the part of exposure device 900 is omitted is shown in 68, that is, shows the projection optics system PL section below of Figure 67 The top view of (part below more aftermentioned lens barrel platform).Figure 69 shows this 9th implementation form from the +X direction of Figure 67 Exposure device part omit outline side view.Figure 70 is that a part of the top view of acquisition Figure 68 is amplified display Figure.Figure 71 is to show constituted centered on the control system of exposure device 900, plan as a whole the main control unit 50 that control is constituted each portion The block diagram of import and export relationship.Figure 71 shows that with baseplate carrier be associated each portion of composition.Main control unit 50 includes work It stands (or microcomputer) etc., plans as a whole each portion of composition of control exposure device 900.

Exposure device 900 has illumination and is IOP, the exposure mask microscope carrier MST for keeping exposure mask M, projection optics system PL, carries and cover It the body BD (a part is only shown in Figure 67 etc.) of film microscope carrier MST and projection optics system PL etc., include 26 (substrate of fine motion microscope carrier Platform) baseplate carrier device PSTh and these control system etc., it is generally speaking, each with above-mentioned 1st~the 8th implementation form Exposure device equally constitutes.However, 2 plate bases can be kept (to show substrate P 1 and base in Figure 67 in baseplate carrier device PSTh Plate P2) each a part point, it is different from aforesaid substrate bearing table device PST~PSTg.

Baseplate carrier device PSTh as shown in Figure 67 and Figure 69 there is coarse motion microscope carrier portion 24, fine motion microscope carrier 26 and weight to support Pin assembly 28 etc..Above fine motion microscope carrier 26, by Figure 67 and Figure 69 it is found that equipped with substrate holding PH.Substrate holding PH, By Figure 68 it is found that the length of X-direction and substrate (P1, P2) on an equal basis, the width (length) of Y direction is then substrate (P1, P2) About 1/3.

X-direction central portion above substrate holding PH, as shown in Figure 70, equipped with it is divided into 2 guarantors above Hold the slot 150 parallel with Y-axis of region ADA1, ADA2.It, can each other solely with 2 holding areas ADA1, ADA2 that slot 150 is divided It is vertical to adsorb that keep substrate P 1, a part of P2 (herein, be substrate P 1, P2 in a manner of such as vacuum suction (or Electrostatic Absorption) In 1/6 region of each substrate of about 1/3 part of Y direction, the side+X or the side-X half portion), and pressurization gas is sprayed upwards Body (such as pressure-air) by the ejection pressure from below in a manner of non-contact (suspension) supporting substrates P1, P2 a part (about 1/6 region of each substrate).

By holding area ADA1, ADA2 of substrate holding PH to the ejection of the pressure-air of each substrate and vacuum suction Switching, be by by the other switching of holding area ADA1, ADA2 of substrate holding PH be connected to vacuum pump (not shown) with Holding tool suction and discharge switching device 51A, 51B (referring to Figure 71) of source of high pressure air, is carried out by main control unit 50.

Coarse motion microscope carrier portion 24, as shown in Figure 69, have 2 (a pair) X beam 30A, 30B, 2 (a pair) coarse motion platform 32A, 32B, each multiple foots 34 with bearing 2 X beams 30A, 30B on the F of ground.Coarse motion platform 32A, 32B then with it is for example above-mentioned 2 coarse motion platforms that baseplate carrier device PST has equally constitute.

In each top coarse motion platform 32A, 32B, as shown in Figure 68 and Figure 69, configured with it is multiple, herein have for each 8 The air flotation cell 84H of the bearing surface (above) of rectangle is overlooked, the upper of coarse motion platform 32A, 32B is fixed on by supporting member 86 respectively Face.Each 8 air flotation cell 84H, the side+Y in exposure area IA (projection optics system PL), the side-Y, are that Y direction is respectively Substrate P 1 the 2/3 of the size of P2 and adds up to the area of size substantially comparable size in the X-direction that X-direction is substrate P 1 and P2 In domain, 2-dimensional arrangement.The upper surface of each air flotation cell 84H is set to same or slightly lower with the upper surface of substrate holding PH.Below Explanation in, by above-mentioned each 8 air flotation cell 84H be referred to as the side+Y air flotation cell group 84H, with the air flotation cell of the side-Y Group 84H.

Also, as shown in Figure 68, being configured with each pair air flotation cell 84I in the X-direction two sides of substrate holding PH.Respectively A pair of of air flotation cell 84I, as shown in Figure 67, in a manner of above it with substantially same (only slightly lower) height of substrate holding PH, The upper surface of coarse motion platform 32A is fixed on by the supporting member 112 that XZ section is L-shaped.Each air flotation cell 84I, such as Y direction Length it is 1/2 slightly short compared with substrate holding PH compared with 1/2 slightly short, X-direction the length of substrate holding PH.

In the side+Y of X beam 30A and the side-Y of X beam 30B, as shown in Figure 69, by with pallet 18 it is discontiguous in a manner of, respectively A pair of frames 110A, 110B is equipped in ground F.It is the upper surface of each in a pair of frames 110A, 110B, it is provided with multiple, for example Each 4 air flotation cell 84J (referring to Figure 68).

Each 4 air flotation cell 84J are arranged respectively at the+Y of the above-mentioned side+Y air flotation cell group 84H as shown in Figure 68 and Figure 69 Side, the side-Y air flotation cell group 84H the side-Y.Each 4 air flotation cell 84J's is each, as shown in Figure 68, the width of Y direction For substrate P 1, substantially the 1/3 of the Y direction length of P2, X-direction length of the length compared with substrate holding PH of X-direction 1/2 is slightly short.In the following description, above-mentioned each 4 air flotation cell 84J are referred to as the air flotation cell group 84J of the side+Y, the side-Y Air flotation cell group 84J.The air flotation cell group 84J's of the side+Y and the side-Y is each, is the Y-axis in Y direction having a size of substrate P Substantially 1/3 and X-direction of direction length add up to the area of size substantially comparable size having a size of the X-direction of substrate P 1 and P2 In domain, it is arranged in X-direction.The X position at the center of the air flotation cell group 84J at the center and the side+Y and the side-Y of exposure area IA It is roughly the same.The upper surface of each air flotation cell 84J is set as same or slightly lower with the upper surface of substrate holding PH.

Above-mentioned air flotation cell 84H, 84I and 84J each bearing surface (above) be porous plastid or by it is mechanical have it is more The disc type air bearing of a micro hole constructs.Each air flotation cell 84H, 84I and 84J can be by from (the ginsengs of gas supply device 85 According to Figure 71) gas-pressurized (such as pressure-air) supply, a part of suspension bearing substrate (such as P1, P2).To each gas The on/off of the pressure-air supply of floating unit 84H, 84I and 84J, be as shown in Figure 71 main control unit 50 it is other plus With control.

As shown in the above description, it in this implementation form, can be suspended branch by the side+Y or the side-Y air flotation cell group 84H and 84J Hold the entirety of 2 plate bases.Also, passing through the holding area ADA1 of substrate holding PH and a pair of of the air flotation cell 84I and+Y of the side+X 4 air flotation cell 84H of side or the side-Y can 1 plate base of suspension bearing entirety.In addition, passing through the holding of substrate holding PH A pair of of the air flotation cell 84I and the side+Y of region ADA2 and the side-X or 4 air flotation cell 84H of the side-Y can 1 chip bases of suspension bearing The entirety of plate.Further, pass through substrate holding PH and the side+Y of substrate holding PH or 4 air flotation cells of the side-Y 84H can 1 plate base of suspension bearing entirety.

Also, if air flotation cell group 84H, 84J are respectively provided with the total bearing area substantially same with above-mentioned each rectangular area Words, also replaceable is single large-scale air flotation cell, or the size of each air flotation cell is made to be made incite somebody to action different with the situation of Figure 68 Be distributed in above-mentioned rectangular area.Also may replace a pair of of air flotation cell 84I using the area of bearing surface is 2 times single Air flotation cell.Since air flotation cell makes substrate suspend, there is no need to be laid in comprehensively close, as long as the suspension energy of view air flotation cell Power (load capacity) is appropriate to be configured at commitment positions with predetermined distance.

Between the side+X and each pair air flotation cell 84I and substrate holding PH of the side-X, as shown in Figure 68 and Figure 70, Configured with a pair of of substrate Y stepping conveyer 88.

Each substrate Y stepping conveyer 88 is to keep (such as absorption) substrate (such as P1 or P2) to move it in Y The device of axis direction is fixed on the upper surface of above-mentioned supporting member 112 (referring to Figure 67).Each substrate Y stepping conveyer 88 is such as schemed Shown in 67 and Figure 70, has and fixed part 88b and the suction that coarse motion platform 32A extends Y direction are fixed on by supporting member 112 The attached substrate back side (such as P1 or P2) and the movable part 88a that can be moved in Y direction along fixed part 88b.In this implementation form, respectively The movable part 88a of substrate Y stepping conveyer 88 is in the shift motion of Y direction and the Y direction width of substrate holding PH On an equal basis.

Also, in fact, though movable part 88a is that sorbing substrate P is displaced into Y direction, in following explanation, in addition to special palpus Outside the situation being distinguished, substrate Y stepping conveyer 88 and movable part 88a do not distinguish be subject to using.

Between the side+Y and the air flotation cell group 84H and substrate holding PH of the side-Y, as shown in Figure 68 and Figure 70, configuration There is a pair of of substrate X stepping conveyer 91.

Substrate X stepping conveyer 91 is to keep (such as absorption) substrate (such as P1 or P2) to move it in X-axis The device in direction is fixed on the side+Y for the side+X half portion for being configured at substrate holding PH, a pair of of gas of the side-Y by supporting member The each face with the oncoming lane substrate holding PH floating unit 84H (referring to Figure 69).

Each substrate X stepping conveyer 91 has and is fixed on together with air flotation cell 84H slightly as shown in Figure 69 and Figure 70 Dynamic platform 32A or 32B extend the fixed part 91b of X-direction and the back side sorbing substrate (such as P1 or P2) can be in X-direction edge Fixed part 91b mobile movable part 91a.Movable part 91a be for example, by constituted with linear electric machine driving device 95 (Figure 69 and Not shown in Figure 70, referring to Figure 71), opposite coarse motion platform 32A or 32B is driven in X-direction.In substrate X stepping conveyer 91, (not shown, the reference in Figure 69 and Figure 70 of the position reading out device 97 of encoder of position etc. equipped with measurement movable part 91a Figure 71).Certainly, driving device 95 is not limited to linear electric machine, also can by using use the rotating electric machine of ball screw or belt as The driving mechanism of driving source is constituted.

The movable part 91a of each substrate X stepping conveyer 91 is in the X-axis that the shift motion of X-direction is substrate holding Substantially 1/2 (slightly longer) of direction length.The side end-X of each fixed part 91b, from the fixed past-X of air flotation cell 84H respectively Side protrudes certain length.

Also, due to the back of the necessary sorbing substrate P of the movable part 91a (substrate adsorption face) of each substrate X stepping conveyer 91 Face is desorbed from substrate P separation, therefore also can be by 95 micro-move device of driving device in Z-direction.In addition, in fact, can Though dynamic portion 91a is that sorbing substrate P is displaced into Y direction, in following explanation, other than the situation that must be especially distinguished, and base Plate Y stepping conveyer 91 and movable part 91a do not distinguish be subject to using.

Also, in this implementation form, in order to substrate Y stepping conveyer 88 and substrate X stepping conveyer 91 it is each can Dynamic portion (substrate adsorption face) is separated to the absorption of substrate P and with substrate, and fine motion microscope carrier 26 is also moved in Z-direction.

Weight offsets device 28, as shown in Figure 69, has basket 64, air spring 66 and Z saddle 68 etc., for example, with it is above-mentioned Each implementation form after 2nd implementation form equally constitutes.Also that is, in the baseplate carrier device PSTh of this 9th implementation form, Z The fixed part that saddle 68 doubles as levelling device 78, not set gasket, and 26 one of weight payment device 28 and fine motion microscope carrier Change.Also, not set maximum weight payment device 28 is individually transported since weight payment device 28 is integrated with fine motion microscope carrier 26 Dynamic connection device 80 (flexure device) etc..Fine motion microscope carrier 26 is to be schematically shown by having in Figure 69 with bulbous member Spherical bearing or the quasi- levelling device 78 like spherical bearing tectosome tilted on Z saddle 68 freely (with respect to X/Y plane in θ x and The direction θ y swing freely) supported.

The top composition part for being supported in weight payment device 28 and weight payment device 28 by levelling device 78 is (micro- Dynamic load platform 26 and substrate holding PH etc.), by the effect of a pair of of X voice coil motor 54X, X-axis is integrally displaced into coarse motion platform 32A Direction.Also that is, that is, top composition part (fine motion microscope carrier 26 and substrate holding PH etc.) passes through the control of main control unit 50 System is supported in the driving synchronous with coarse motion platform 32A of weight payment device 28 (with coarse motion platform 32A using a pair of of X voice coil motor 54X It is equidirectional, with speed drive), X-direction is displaced into predetermined stroke together with coarse motion platform 32A accordingly.Also, top composition part (fine motion microscope carrier 26 and substrate holding PH etc.) passes through a pair of of X voice coil motor 54X, a pair by the control of main control unit 50 Y voice coil motor 54Y and 4 Z voice coil motor 54Z, opposite coarse motion platform 32A is by micro-move device in 6DOF direction.

In this 9th implementation form, include coarse motion platform 32A (and 32B), weight payment device 28, fine motion microscope carrier 26 and substrate Tool PH etc. is kept, constitutes and is integrally displaced into the moving body of X-direction (hereinafter, title baseplate carrier appropriate with substrate (P1, P2) (PH、26、28、32A、32B))。

In the exposure device 900 of this 9th implementation form, the position in the X/Y plane of fine motion microscope carrier 26 (substrate holding PH) Information is added at any time by baseplate carrier interferometer system 98 (referring to Figure 71), such as with the capacity of decomposition of 0.5~1nm degree With detection.The baseplate carrier interferometer system 98 of this 9th implementation form, compares Figure 67~Figure 69 and Figure 30~Figure 32 it is found that being It is equally constituted with the baseplate carrier interferometer system 98 of above-mentioned 7th implementation form.But, the exposure device of this 9th implementation form In 900, as shown in Figure 69, Y interferometer 98Y₁、98Y₂It is below air flotation cell 84H, with Y moving lens 94Y opposite direction, in X-axis side It is configured to predetermined distance.Y interferometer 98Y₁、98Y₂The each of a pair of of pallet 18 is fixed on by supporting member 104 respectively.

The composition of the other parts of baseplate carrier device PSTh is identical as such as baseplate carrier device PSTa, PSTf etc..Also, Each portion of composition and above-mentioned each implementation form other than baseplate carrier device is identical (referring to Figure 67~Figure 71).

Then, illustrate the base plate exposure processing that the exposure device 900 of this implementation form constituted in the above described manner carries out Series of actions.It herein, is for carrying out the occasion of the 2nd layer of later exposure to substrate P, according to being equivalent to for as an example To illustrate the series of actions program (also that is, exposure program) of the exposure-processed of substrate exposure program explanatory diagram (11~ 27) Figure 72~Figure 74, Figure 76~Figure 99 and show a substrate irradiation area exposure and the Y stepping of another substrate Figure 75 A~Figure 75 D of the concurrent activity of movement is illustrated.Also, in Figure 72~Figure 99, to make explanation it can be readily appreciated that into one Step is simplified Figure 70 and only display base plate keeps tool PH, substrate.In addition, exposure area IA shown in Figure 72~Figure 99, Illumination light IL penetrates the illumination region of projection optics system PL irradiation when being exposure, in fact, not will form when other than exposure, but It is shown at any time to keep the positional relationship between substrate P and projection optics system PL clear.Also, being for each substrate herein It is said in the situation for taking 6 faces (total 6 scanning) exposure that X-direction takes 2 faces (2 scanning), Y direction to take 3 faces (3 scanning) It is bright.

Firstly, will be covered under the management of main control unit 50 by exposure mask carrying device (not shown) (exposure mask loader) Film M is loaded to exposure mask microscope carrier MST, and moves in device by substrate (not shown) and 2 plate base P1, P2 are moved in (investment) substrate On bearing table device PSTh.In substrate P 1, each when each irradiation area is equipped with exposure before front layer, such as Figure 72 of P2 It is and each together with multiple total 6 irradiation area SA1~SA6 with such as X-direction 2, Y direction 3 Deng shown in Multiple alignment mark PM that the pattern of irradiation area is transferred simultaneously (referring to Figure 70).Also, each irradiation area is omitted in Figure 70 Diagram.

This occasion moves in device for 2 plate base P2, P1 by substrate, such as blacking arrow in Figure 72 and applies shown in white arrow, It transports in +Y direction and -Y direction, moves in position shown in Figure 68, Figure 70 and Figure 72.This occasion, substrate P 2 are assembled into across base Plate keeps one of the air flotation cell group 84H of the holding area ADA1 of tool PH and a pair of of the air flotation cell 84I and side-Y of the side+X Point, and substrate P 1 is then assembled into the holding area ADA2 across substrate holding PH and a pair of of the air flotation cell 84I and+Y of the side-X A part of the air flotation cell group 84H of side.At this point, substrate P 2 is by a pair of the holding area ADA1 of substrate holding PH and the side+X A part of suspension bearing of air flotation cell 84I and the air flotation cell group 84H of the side-Y, substrate P 1 is then by the guarantor of substrate holding PH Hold a part of suspension bearing of a pair of of air flotation cell 84I of region ADA2 and the side-X and the air flotation cell group 84H of the side+Y.Certainly, The direction that each substrate is not necessarily required to each arrow from Figure 72 is moved in.For example, also can be from the outer of top (side+Z) or X-direction Side is moved in.

Then, holding area ADA1, ADA2 of substrate holding PH is switched to attraction from exhaust by main control unit 50. Accordingly, substrate P 2, a part of P1 (about the 1/6 of substrate entirety) are adsorbed the holding area for being fixed on substrate holding PH ADA1, ADA2 become substrate P 2, a part of P1 (substrate all remaining about 5/6) by a pair of of air flotation cell 84I and air bearing list The state of a part of suspension bearing of first group 84H.

Later, by main control unit 50 by finding out (the substrate guarantor of fine motion microscope carrier 26 with the existing identical measurement method that is aligned Hold tool PH) position of opposite projection optics system PL, fine motion microscope carrier 26 opposite with substrate P 1, P2 approximate location.Also, substrate P 1, P2 can omit locating tab assembly to fine motion microscope carrier 26.

Then, main control unit 50 drives fine motion microscope carrier 26 so that substrate according to above-mentioned measurement result by coarse motion platform 32A At least two alignment mark PM (not shown in Figure 72, referring to Figure 70) on P1 is moved in the visual field of any alignment detection system, into Row substrate P 1 with respect to projection optics system PL to locating tab assembly, and according to this as a result, finding out to carry out irradiation area SA1 in substrate P 1 Exposure scanning starting position.Herein, the constant speed movement section front and back scanned when being included in scan exposure to be exposed Acceleration area and deceleration interval, therefore, strictly speaking, scanning starting position be accelerate starting position.Then, main control unit 50 driving coarse motion platform 32A, 32B simultaneously drive fine motion microscope carrier 26 a little, and substrate P 1 is positioned at the scanning starting position, and (acceleration starts Position).At this point, carrying out fine motion microscope carrier 26 (substrate holding PH) to coarse motion platform 32A in X-axis, Y-axis and the direction θ z (or 6DOF Direction) the micro- Locating driver of precision.Shown in Figure 73 substrate P 1 (and substrate holding PH) has just been positioned at by this method for Carry out the state of the scanning starting position (accelerating starting position) of the exposure of irradiation area SA1 in substrate P 1.

Then, from Figure 73 state, as applied in Figure 73 shown in white arrow, by baseplate carrier (PH, 26,28,32A, 32B) it is past- X-direction driving, carries out the X scanning motion of substrate P 1.At this point, by main control unit 50 will keep exposure mask M exposure mask microscope carrier MST with Substrate holding PH (fine motion microscope carrier 26) is synchronized to be driven toward -X direction, and the irradiation area SA1 of substrate P 1 passes through projection optics system The exposure area IA of the view field of the exposure mask M pattern of PL, therefore, in carrying out the scan exposure to irradiation area SA1 at this time.It is main Control device 50 when X scanning motion, in fact, be it is synchronous with fine motion microscope carrier 26 (substrate holding PH), interfered according to exposure mask The measurement result of instrument system 14, by exposure mask microscope carrier MST turntable driving in X-direction, and micro-move device in Y direction and the direction θ z.

Scan exposure is in the constant speed movement after the acceleration in fine motion microscope carrier 26 (substrate holding PH) toward -X direction, thoroughly It crosses exposure mask M, projection optics system PL and illumination light IL is irradiated to substrate P 1 to carry out.

When above-mentioned X scanning motion, main control unit 50 makes a part of substrate P 1 (about the 1/6 of 1 entirety of substrate P) suction The attached holding area ADA2 for being fixed on substrate holding PH makes a part (about the 5/6 of 1 entirety of substrate P) suspension branch of substrate P 1 A part in the air flotation cell group 84H of the side+Y and a pair of of air flotation cell 84I of the side-X are held, and makes a part (base of substrate P 2 1/6) plate P2 entirety about adsorbs the holding area ADA1 for being fixed on substrate holding PH, make a part (substrate P 2 of substrate P 2 It is all about 5/6) suspension bearing in a part of the air flotation cell group 84H of the side-Y and the shape of a pair of of air flotation cell 84I of the side+X Under state, drive substrate microscope carrier (PH, 26,28,32A, 32B).

At this point, measurement result of the main control unit 50 according to x-ray encoder system 46A, 46B, passes through x-ray electricity respectively Machine 42A, 42B drive coarse motion platform 32A, 32B in X-direction, and according to baseplate carrier interferometer system 98, Z inclination measurement system 76 measurement result driving fine motion microscope carrier driving is 52 (each voice coil motor 54X, 54Y, 54Z).Accordingly, substrate P 1, P2 i.e. with it is micro- Dynamic load platform 26 is integral, passes through the movement of X voice coil motor 54X and coarse motion platform 32A one.Also, weight payment device 28 also with it is micro- Dynamic load platform 26 is integral, is driven by X voice coil motor 54X.In addition, substrate P 1, P2 and fine motion microscope carrier 26 are integral, by from thick The opposite driving of dynamic platform 32A, in X-axis, Y-axis, Z axis, θ x, θ y and θ z all directions (6DOF direction) by accurate position control System.

The scan exposure to the irradiation area SA1 of substrate P 1 is shown in Figure 74 to be terminated, baseplate carrier (PH, 26,28, 32A, 32B) stop state.

Then, to locating tab assembly that is, to be carried out with the above-mentioned same substrate P 2 that carries out with respect to the new of projection optics system PL Irradiation area (this occasion is the irradiation area SA1 in the substrate P 2) use pair of a pre-set exposure object in substrate P 2 The measurement of fiducial mark note.

Then, when substrate P 2 with respect to projection optics system PL it is new to locating tab assembly at the end of, main control unit 50 is basis This to carry out time acceleration of an exposure as applied shown in white arrow in Figure 74 as a result, carry out substrate P 2 (and substrate holding PH) The X stepwise operation of the substrate P 2 (and substrate holding PH) slightly driven toward +X direction.The X stepwise operation of substrate P 2 is by master control (but, position deviation on the move is stringent unlike as scanning motion with state-driven same with X scanning motion for device 50 processed Limitation) baseplate carrier (PH, 26,28,32A, 32B) carries out.Main control unit 50, it is parallel with the X stepwise operation of substrate P 2, make Exposure mask microscope carrier MST, which is returned to, accelerates starting position.It is just fixed by substrate P 2 (and substrate holding PH) by this method to show in Figure 76 State behind the scanning starting position (accelerating starting position) to carry out the exposure of irradiation area SA1 in substrate P 2.

Then, after X stepwise operation, main control unit 50, if applied shown in white arrow in Figure 76, starting substrate P 2, (substrate is carried Platform (PH, 26,28,32A, 32B)) accelerate with the -X direction of exposure mask M (exposure mask microscope carrier MST), by with it is above-mentioned it is same in a manner of compare It penetrates region SA1 and is scanned exposure.Parallel with this, main control unit 50 is carried out as shown in blacking arrow in Figure 76 by substrate P1 is on substrate holding PH toward the Y stepwise operation of the substrate P 1 of -Y direction conveying.The Y stepwise operation of this substrate P 1, is by leading Control device 50 by holding area ADA2 from attract be switched to exhaust, the absorption to release substrate P 1, and the substrate of the side use-X Y stepping conveyer 88 by substrate P 1 toward the -Y direction conveying Y stepping roughly equal with the Y direction width of irradiation area away from From come carry out.Herein, substrate Y stepping conveyer 88 is adsorbed in holding area ADA2 from the time point for being switched to exhaust is attracted Keep substrate P 1.

In Figure 75 A~Figure 75 D, it is shown that the exposure of the irradiation area SA1 of substrate P 2 and the Y stepwise operation of substrate P 1 are parallel When, the position of each substrate passed through at any time etc. variation.From Figure 75 A~Figure 75 D visually it is found that in this implementation form, a base The scan exposure of plate (P2) and the Y stepwise operation of another substrate (P1) can carry out simultaneously (parallel).This is due to being used for The substrate Y stepping conveyer 88 of Y stepping is to be fixed in coarse motion platform 32A, and can keep with coarse motion platform 32A one with substrate Has the event of PH synchronizing moving.

In this occasion, main control unit 50 also in the scan exposure of a substrate, can make the Y stepwise operation of another substrate temporary When stop, and carry out the Y stepwise operation of another substrate in the acceleration before and after the scan exposure of a substrate and in slowing down.In this way, It can prevent the Y stepwise operation of another substrate from causing adverse effect (such as with substrate Y stepping the scan exposure of one substrate really The mode for the vibration cause that the reaction force of the driving force of conveyer 88 will not become fine motion microscope carrier 26 drives fine motion microscope carrier 26 As a result, the position control accuracy (and synchronization accuracy of exposure mask M and substrate P 2) of the fine motion microscope carrier 26 in scan exposure is caused to drop It is low).

The scan exposure to the irradiation area SA1 in substrate P 2 is shown in Figure 75 D and Figure 77 to be terminated, baseplate carrier (PH, 26,28,32A, 32B) stop state.At this point, substrate P 1 finishes Y stepwise operation, the irradiation area SA2 in substrate P 1 is located at On the holding area ADA2 of substrate holding PH.

Later, the holding area ADA2 of substrate holding PH is switched to attraction, substrate from exhaust by main control unit 50 1/6 part comprising irradiation area SA2 of P1, that is, be adsorbed and be fixed on holding area ADA2.At this point, its remaining part of substrate P 1 Dividing (about 5/6) is a part and-X of the air flotation cell group 84H by a part of the air flotation cell group 84H of the side+Y, the side-Y A pair of of air flotation cell 84I suspension bearing of side.

Then, substrate P 1 is carried out to locating tab assembly that is, set in advance in substrate P 1 with respect to the new of projection optics system PL The measurement for time irradiation area SA2 alignment mark set.Before this is to locating tab assembly, carry out above-mentioned identical with substrate P 1 X stepwise operation (referring to white arrow is applied in Figure 77), so that the alignment mark of measurement object is located at the detection visual field of alignment detection system It is interior.

Then, when substrate P 1 with respect to projection optics system PL it is new to locating tab assembly at the end of, by 50 basis of main control unit Should as a result, substrate P 1 (and substrate holding PH) is positioned at for carry out the exposure of irradiation area SA2 in substrate P 1 plus Fast starting position and the opposite coarse motion platform 32A of fine motion microscope carrier 26 are in the precision of X-axis, Y-axis and the direction θ z (or 6DOF direction) Micro- Locating driver.The state after terminating this positioning is shown just in Figure 78.Also, in the following description, for fine motion microscope carrier 26 Accurate micro- Locating driver of opposite coarse motion platform 32A, omits its record.

Then, by main control unit 50 substrate P 1 and exposure mask M in +X direction acceleration (referring to whitewashing arrow in Figure 78 Head), carry out the scan exposure of the irradiation area SA2 same as described above to substrate P 1.It is parallel with this, by main control unit 50, it is as shown in blacking arrow in Figure 78, substrate P 2 is above-mentioned with substrate P 2 in transporting on substrate holding PH toward +Y direction Identical Y stepwise operation.

The scan exposure to the irradiation area SA2 in substrate P 1 is shown in Figure 79 to be terminated, baseplate carrier (PH, 26,28, 32A, 32B) stop state.At this point, substrate P 2 finishes Y stepwise operation, the irradiation area SA2 in substrate P 2 is located at substrate guarantor On the holding area ADA1 for holding tool PH.

Later, the holding area ADA1 of substrate holding PH is switched to attraction, substrate from exhaust by main control unit 50 1/6 part comprising irradiation area SA2 of P2, which is adsorbed, is fixed on holding area ADA1.At this point, its remaining part of substrate P 2 Divide (about 5/6) then by a part of the air flotation cell group 84H of the side+Y, a part and+X of the air flotation cell group 84H of the side-Y A pair of of air flotation cell 84I suspension bearing of side.

Then, substrate P 2 is carried out to locating tab assembly that is, set in advance in substrate P 2 with respect to the new of projection optics system PL The measurement for time irradiation area SA2 alignment mark set.Before this beginning to locating tab assembly, for make measurement object to fiducial mark Note is located in the detection visual field of alignment detection system, carries out the X stepwise operation same as described above of substrate P 2 (referring to whitewashing in Figure 79 Arrow).

Then, when substrate P 2 with respect to projection optics system PL it is new to locating tab assembly at the end of, by 50 basis of main control unit Should as a result, substrate P 2 (and substrate holding PH) is positioned at for carry out the exposure of irradiation area SA2 in substrate P 2 plus Fast starting position.The state after terminating this positioning is shown just in Figure 80.

Then, the -X direction of substrate P 2 and exposure mask M accelerate (referring to whitewashing arrow in Figure 80 by main control unit 50 Head), carry out the scan exposure of the irradiation area SA2 same as described above to substrate P 2.It is parallel with this, by main control unit 50, as shown in blacking arrow in Figure 80, carry out substrate P 1 in the upper of the substrate P 1 transported on substrate holding PH toward -Y direction State identical Y stepwise operation.

The scan exposure to the irradiation area SA2 in substrate P 2 is shown in Figure 81 to be terminated, baseplate carrier (PH, 26,28, 32A, 32B) stop state.At this point, substrate P 1 finishes Y stepwise operation, the irradiation area SA3 in substrate P 1 is located at substrate guarantor On the holding area ADA2 for holding tool PH.

Later, the holding area ADA2 of substrate holding PH is switched to attraction, substrate from exhaust by main control unit 50 1/6 part comprising irradiation area SA3 of P1, which is adsorbed, is fixed on holding area ADA2.At this point, the rest part of substrate P 1 (about 5/6) is by a part of the air flotation cell group 84H of the side-Y and a pair of of air flotation cell 84I suspension bearing of the side-X.

Then, substrate P 1 is carried out to locating tab assembly that is, set in advance in substrate P 1 with respect to the new of projection optics system PL The measurement for time irradiation area SA3 alignment mark set.Before this beginning to locating tab assembly, for make measurement object to fiducial mark Note is located in the detection visual field of alignment detection system, carries out the X stepwise operation same as described above of substrate P 1 (referring to whitewashing in Figure 81 Arrow).

Then, when substrate P 1 with respect to projection optics system PL it is new to locating tab assembly at the end of, by 50 basis of main control unit Should as a result, substrate P 1 (and substrate holding PH) is positioned at for carry out the exposure of irradiation area SA3 in substrate P 1 plus Fast starting position.The state after terminating this positioning is shown just in Figure 82.

Then, substrate P 1 and the +X direction of exposure mask M accelerate (referring to white arrow is applied in Figure 82) by main control unit 50, Carry out the scan exposure of the irradiation area SA3 same as described above to substrate P 1.It is parallel with this, by main control unit 50, such as In Figure 82 shown in blacking arrow, carry out substrate P 2 in the above-mentioned identical of the substrate P 2 transported on substrate holding PH toward +Y direction Y stepwise operation.

The scan exposure to the irradiation area SA3 in substrate P 1 is shown in Figure 83 to be terminated, baseplate carrier (PH, 26,28, 32A, 32B) stop state.At this point, substrate P 2 finishes Y stepwise operation, the irradiation area SA3 in substrate P 2 is located at substrate guarantor On the holding area ADA1 for holding tool PH.

Later, the holding area ADA1 of substrate holding PH is switched to attraction, substrate from exhaust by main control unit 50 1/6 part comprising irradiation area SA3 of P2, which is adsorbed, is fixed on holding area ADA1.At this point, the rest part of substrate P 2 (about 5/6) is by a part of the air flotation cell group 84H of the side+Y and a pair of of air flotation cell 84I suspension bearing of the side+X.

Then, substrate P 2 is carried out to locating tab assembly that is, set in advance in substrate P 2 with respect to the new of projection optics system PL The measurement for time irradiation area SA3 alignment mark set.Before this beginning to locating tab assembly, for make measurement object to fiducial mark Note is located in the detection visual field of alignment detection system, carries out the X stepwise operation same as described above of substrate P 2 (referring to whitewashing in Figure 83 Arrow).

Then, when substrate P 2 with respect to projection optics system PL it is new to locating tab assembly at the end of, by 50 basis of main control unit Should as a result, substrate P 2 (and substrate holding PH) is positioned at for carry out the exposure of irradiation area SA3 in substrate P 2 plus Fast starting position.The state after terminating this positioning is shown just in Figure 84.

Then, the -X direction of substrate P 2 and exposure mask M accelerate (referring to whitewashing arrow in Figure 84 by main control unit 50 Head), carry out the scan exposure of the irradiation area SA3 same as described above to substrate P 2.It is parallel with this, by main control unit 50, as shown in blacking arrow in Figure 84, carry out substrate P 1 in the upper of the substrate P 1 transported on substrate holding PH toward -Y direction State identical Y stepwise operation.Due to this Y stepwise operation, substrate P 1 is completely disengaged from substrate holding PH, all by the side-Y Air flotation cell group 84H a part and the side-Y air flotation cell group 84J a part of suspension bearing.

The scan exposure to the irradiation area SA3 in substrate P 2 is shown in Figure 85 to be terminated, baseplate carrier (PH, 26,28, 32A, 32B) stop state.At this point, substrate P 1 is exited from substrate holding PH.

Later, the holding area ADA1 of substrate holding PH is switched to exhaust from attraction by main control unit 50, and with+Y Substrate X stepping conveyer 91 (referring to Figure 70) absorption of side keeps substrate P 2, as applied in Figure 85 shown in white arrow, in the side-X To conveying X step distance (substantially 2 times of distances of the X-direction length of irradiation area).Parallel with this, main control unit 50 is logical Substrate X stepping conveyer 91 (referring to Figure 70) absorption for crossing the side-Y keeps substrate P 1, as shown in blacking arrow in Figure 85, in+ X-direction transports X step distance.Herein, conveying and substrate P 2 of the substrate P 1 toward +X direction are not make toward the conveying of -X direction The two carries out in the case where interfering.

At the end of the X step distance conveying for showing aforesaid substrate P1 and substrate P 2 in Figure 86, two substrates P1, P2 are with respect to base Plate keeps the positional relationship of tool PH.

From the state of Figure 86, by main control unit 50, substrate is kept using the absorption of substrate Y stepping conveyer 88 of the side+X P1, and release absorption of the substrate X stepping conveyer 91 of the side-Y to substrate P 1.In addition, as shown in blacking arrow in Figure 86, The stepping for carrying out the +Y direction of substrate P 1 by the substrate Y stepping conveyer 88 of the side+X is mobile.In this way, substrate P 1 and substrate P 2 Though mutual position is to reverse on, substrate holding PH, become position identical with Figure 72 on substrate holding PH Relationship (referring to Figure 87).

Then, holding area ADA1, ADA2 of substrate holding PH is switched to attraction from exhaust by main control unit 50. Accordingly, become substrate P 1, a part of P2 (about the 1/6 of substrate entirety) is adsorbed the holding area for being fixed on substrate holding PH ADA1, ADA2 pass through a part of suspension bearing substrate P 1, a part of P2 of a pair of of air flotation cell 84I and air flotation cell group 84H The state of (substrate all remaining about 5/6).

Then, to locating tab assembly that is, to be carried out with the above-mentioned same substrate P 1 that carries out with respect to the new of projection optics system PL Irradiation area (this occasion is the irradiation area SA4 in the substrate P 1) use pair of a pre-set exposure object in substrate P 1 The measurement of fiducial mark note.

Then, when substrate P 1 with respect to projection optics system PL it is new to locating tab assembly at the end of, main control unit 50 is basis It should be as a result, driving coarse motion platform 32A, 32B and micro-move device fine motion microscope carrier 26, to carry out time acceleration of an exposure, by (and the base of substrate P 1 Plate keeps tool PH) it is positioned at the scanning starting position (accelerating starting position).Shown in Figure 87 by this method by substrate P 1 (and Substrate holding PH) it is just positioned to carry out the scanning starting position of the exposure of irradiation area SA4 in substrate P 1 and (accelerating start bit Set) after state.

Then, main control unit 50, if in Figure 87 apply white arrow shown in, start substrate P 1 (baseplate carrier (PH, 26,28, 32A, 32B)) accelerate with the +X direction of exposure mask M (exposure mask microscope carrier MST) and the above-mentioned scanning similarly carried out to irradiation area SA4 Exposure.

The scan exposure to the irradiation area SA4 of substrate P 1 is shown in Figure 88 to be terminated, baseplate carrier (PH, 26,28, 32A, 32B) stop state.

Then, to locating tab assembly that is, to be carried out with the above-mentioned same substrate P 2 that carries out with respect to the new of projection optics system PL Irradiation area (this occasion is the irradiation area SA4 in the substrate P 2) use pair of a pre-set exposure object in substrate P 2 The measurement of fiducial mark note.

Then, when substrate P 2 with respect to projection optics system PL it is new to locating tab assembly at the end of, main control unit 50 and according to This is as a result, to carry out time acceleration of an exposure, as applied in Figure 88 shown in white arrow, similarly to carry out substrate P 2 with above-mentioned The X stepwise operation for the substrate P 2 (and substrate holding PH) that (and substrate holding PH) slightly drives toward -X direction.It is shown in Figure 89 It carries out for substrate P 2 (and substrate holding PH) being just positioned at by this method to carry out the exposure of irradiation area SA4 in substrate P 2 Scanning starting position (accelerate starting position) after state.

Then, main control unit 50, if in Figure 89 apply white arrow shown in, start substrate P 2 (baseplate carrier (PH, 26,28, 32A, 32B)) accelerate with the +X direction of exposure mask M (exposure mask microscope carrier MST), to be similarly scanned to irradiation area SA4 with above-mentioned Exposure.Parallel, main control unit 50 with this, as shown in blacking arrow in Figure 89, by substrate P 1 it is past on substrate holding PH+ Y-direction conveying carries out the Y stepwise operation similar to the above with substrate P 1.

The scan exposure to irradiation area SA4 in substrate P 2 is shown in Figure 90 to be terminated, baseplate carrier (PH, 26,28, 32A, 32B) stop state.At this point, substrate P 1 finishes Y stepwise operation, the irradiation area SA5 in substrate P 1 is located at substrate guarantor On the holding area ADA1 for holding tool PH.

Later, the holding area ADA1 of substrate holding PH is switched to attraction, substrate from exhaust by main control unit 50 1/6 part comprising irradiation area SA5 of P1, which is adsorbed, is fixed on holding area ADA1.At this point, the rest part of substrate P 1 (about 5/6) is a part, a part of the air flotation cell group 84H of the side-Y and the side+X by the air flotation cell group 84H of the side+Y A pair of of air flotation cell 84I be subject to suspension bearing.

Then, substrate P 1 is carried out to locating tab assembly that is, set in advance in substrate P 1 with respect to the new of projection optics system PL The measurement for time irradiation area SA5 alignment mark set.Before this beginning to locating tab assembly, for make measurement object to fiducial mark Note is located in the detection visual field of alignment detection system, carries out the X stepwise operation same as described above of substrate P 1 (referring to whitewashing in Figure 90 Arrow).

Then, when substrate P 1 with respect to projection optics system PL it is new to locating tab assembly at the end of, by 50 basis of main control unit Should as a result, substrate P 1 (and substrate holding PH) is positioned at for carry out the exposure of irradiation area SA5 in substrate P 1 plus Fast starting position.The state after terminating this positioning is shown just in Figure 91.

Then, the -X direction of substrate P 1 and exposure mask M accelerate (referring to whitewashing arrow in Figure 91 by main control unit 50 Head), carry out the scan exposure of the irradiation area SA5 same as described above to substrate P 1.It is parallel with this, by main control unit 50, as shown in blacking arrow in Figure 91, carry out substrate P 2 in the upper of the substrate P 2 transported on substrate holding PH toward -Y direction State identical Y stepwise operation.

The scan exposure to irradiation area SA5 in substrate P 1 is shown in Figure 92 to be terminated, baseplate carrier (PH, 26,28, 32A, 32B) stop state.At this point, substrate P 2 finishes Y stepwise operation, the irradiation area SA5 in substrate P 2 is located at substrate guarantor On the holding area ADA2 for holding tool PH.

Later, the holding area ADA2 of substrate holding PH is switched to attraction, substrate from exhaust by main control unit 50 1/6 part comprising irradiation area SA5 of P2, which is adsorbed, is fixed on holding area ADA2.At this point, its remaining part of substrate P 2 Dividing (about 5/6) is a part and-X of the air flotation cell group 84H by a part of the air flotation cell group 84H of the side+Y, the side-Y A pair of of air flotation cell 84I suspension bearing of side.

Then, substrate P 2 is carried out to locating tab assembly that is, set in advance in substrate P 2 with respect to the new of projection optics system PL The measurement for time irradiation area SA5 alignment mark set.Before this beginning to locating tab assembly, for make measurement object to fiducial mark Note is located in the detection visual field of alignment detection system, carries out the X stepwise operation same as described above of substrate P 2 (referring to whitewashing in Figure 92 Arrow).

Then, when substrate P 2 with respect to projection optics system PL it is new to locating tab assembly at the end of, by 50 basis of main control unit Should as a result, substrate P 2 (and substrate holding PH) is positioned at for carry out the exposure of irradiation area SA5 in substrate P 2 plus Fast starting position.The state after terminating this positioning is shown just in Figure 93.

Then, substrate P 2 and the +X direction of exposure mask M accelerate (referring to white arrow is applied in Figure 93) by main control unit 50, Carry out the scan exposure of the irradiation area SA5 same as described above to substrate P 2.It is parallel with this, by main control unit 50, such as In Figure 93 shown in blacking arrow, carry out substrate P 1 in the above-mentioned identical of the substrate P 1 transported on substrate holding PH toward +Y direction Y stepwise operation.

The scan exposure to the irradiation area SA5 in substrate P 2 is shown in Figure 94 to be terminated, baseplate carrier (PH, 26,28, 32A, 32B) stop state.At this point, substrate P 1 finishes Y stepwise operation, the irradiation area SA6 in substrate P 1 is located at substrate guarantor On the holding area ADA1 for holding tool PH.

Later, the holding area ADA1 of substrate holding PH is switched to attraction, substrate from exhaust by main control unit 50 1/6 part comprising irradiation area SA6 of P1, which is adsorbed, is fixed on holding area ADA1.At this point, the rest part of substrate P 1 (about 5/6) is a pair of of air flotation cell 84I suspension bearing by a part of the air flotation cell group 84H of the side+Y and the side+X.

Then, substrate P 1 is carried out to locating tab assembly that is, set in advance in substrate P 1 with respect to the new of projection optics system PL The measurement for time irradiation area SA6 alignment mark set.Before this beginning to locating tab assembly, for make measurement object to fiducial mark Note is located in the detection visual field of alignment detection system, carries out the X stepwise operation same as described above of substrate P 1 (referring to whitewashing in Figure 94 Arrow).

Then, when substrate P 2 with respect to projection optics system PL it is new to locating tab assembly at the end of, by 50 basis of main control unit Should as a result, substrate P 1 (and substrate holding PH) is positioned at for carry out the exposure of irradiation area SA6 in substrate P 1 plus Fast starting position.The state after terminating this positioning is shown just in Figure 95.

Then, the -X direction of substrate P 1 and exposure mask M accelerate (referring to whitewashing arrow in Figure 95 by main control unit 50 Head), carry out the scan exposure of the irradiation area SA6 same as described above to substrate P 1.It is parallel with this, by main control unit 50, as shown in blacking arrow in Figure 95, carry out substrate P 2 in the upper of the substrate P 2 transported on substrate holding PH toward -Y direction State identical Y stepwise operation.

The scan exposure to irradiation area SA6 in substrate P 1 is shown in Figure 96 to be terminated, baseplate carrier (PH, 26,28, 32A, 32B) stop state.At this point, substrate P 2 finishes Y stepwise operation, the irradiation area SA6 in substrate P 2 is located at substrate guarantor On the holding area ADA2 for holding tool PH.

Later, the holding area ADA2 of substrate holding PH is switched to attraction, substrate from exhaust by main control unit 50 1/6 part comprising irradiation area SA6 of P2, which is adsorbed, is fixed on holding area ADA2.At this point, the rest part of substrate P 2 (about 5/6) is a pair of of air flotation cell 84I suspension bearing by a part of the air flotation cell group 84H of the side-Y and the side-X.

Then, substrate P 2 is carried out to locating tab assembly that is, set in advance in substrate P 2 with respect to the new of projection optics system PL The measurement for time irradiation area SA6 alignment mark set.Before this beginning to locating tab assembly, for make measurement object to fiducial mark Note is located in the detection visual field of alignment detection system, carries out the X stepwise operation same as described above of substrate P 2 (referring to whitewashing in Figure 96 Arrow).

Then, when substrate P 2 with respect to projection optics system PL it is new to locating tab assembly at the end of, by 50 basis of main control unit Should as a result, substrate P 2 (and substrate holding PH) is positioned at for carry out the exposure of irradiation area SA6 in substrate P 2 plus Fast starting position.The state after terminating this positioning is shown just in Figure 97.

Then, by main control unit 50 the acceleration of the +X direction of substrate P 2 and exposure mask M (referring to whitewashing arrow in Figure 97 Head), carry out the irradiation area SA6 scan exposure similar to the above to substrate P 2.

The scan exposure to irradiation area SA6 in substrate P 2 is shown in Figure 98 to be terminated, baseplate carrier (PH, 26,28, 32A, 32B) stop state.

Later, holding area ADA1, ADA2 of substrate holding PH is switched to exhaust from attraction by main control unit 50, And substrate P 2 is kept with the substrate Y stepping conveyer 88 of the side-X (referring to Figure 70) absorption, as shown in blacking arrow in Figure 98 , (conveying) is moved out toward -Y direction.Parallel with this, main control unit 50 is with (the ginseng of substrate Y stepping conveyer 88 of the side+X According to Figure 70) absorption holding substrate P 1, as applied shown in white arrow in Figure 98, past +Y direction moves out (conveying).

Then, as shown in Figure 99, the substrate P 1 of exposure will be completed, P2 is moved out and new substrate P 3, P4 is same as Figure 72 Remove to (moving in) substrate holding PH.Direction is moved in and moved out to this occasion, each substrate, also must be not necessarily in Figure 99 Arrow direction.For example, also can move in and/or move out from top or X-direction.

As described above, the exposure device 900 of this 9th implementation form, makes to be equipped with small-sized (substrate due to being made 1/3 size) the fine motion microscope carrier 26 of substrate holding PH is displaced into 1 axis (X-axis) direction, and substrate is only made to be displaced into 2 axis (X-axis and Y Axis) direction, therefore baseplate carrier device PSTh miniaturization can be made, with above-mentioned each implementation form likewise, obtaining with base Plate keeps the miniaturization of tool PH and baseplate carrier device PSTh and next various effects.Furthermore the exposure dress of this 9th implementation form 900 are set, the respective a part of 2 plate bases can be equipped on respectively the holding area of substrate holding PH by main control unit 50 ADA1, ADA2, substrate holding PH, with the part thereof of baseplate carrier of composition toward X-direction movement so that the part of a substrate The movement of irradiation area scan exposure is parallel, makes another substrate opposing substrate keep tool PH toward Y with substrate Y stepping conveyer 88 Axis direction is mobile.Accordingly, and for the 1st plate base, the exposure in 1 irradiation area (unexposed area) is alternately repeated After, keep the substrate stepping mobile so that the exposure and stepping of a secondary irradiation area (unexposed area) exposure are mobile to carry out The exposure of the substrate, and compared for the 2nd plate base with the situation that same program is exposed, it can be shortened the exposure of 2 plate bases The time required to processing.In addition, this implementation form, the exposure for 2 plate base of carry out that can be interacted, make the Y stepping time of a substrate with The X sweep time of another substrate is completely overlapped, therefore if considering for 1 plate base, can be with (the scan exposure of 1 irradiation area Required time+alignment time) × scanning times (number of irradiation area)+α, specifically, can be protected with without substrate in substrate The existing step-scan mode for holding the replacement on tool is exposed processor substantially with the time of degree, is exposed processing.

Also, being by 2 plate bases while to move in substrate holding PH (baseplate carrier device PST) in above-mentioned 9th implementation form Above and simultaneously moved out from substrate holding PH (baseplate carrier device PSTh).It, also can be as following however, in exposure device 900 As the variation of explanation, by 2 plate bases, interaction is moved in and from substrate holding PH (baseplate carrier device PSTh) each one It moves out.

" variation of the 9th implementation form "

Figure 100 is comparable to the figure of Figure 85 of exposure program explanatory diagram in above-mentioned 9th implementation form (13), according to master control The instruction of device 50 processed is moved out substrate P 1 to baseplate carrier device PSTh's at this time point by conveyance device (not shown) External (referring to Fig.1 00 in blacking block arrow).The side-X the half of substrate P 1 can be still unexposed as shown in Figure 100 State can also be exposed in advance.

Main control unit 50, when substrate P 1 is moved out and exited completely from substrate holding PH on the way, with the base of the side+Y Plate X stepping conveyer 91 (referring to Figure 70) absorption keeps substrate P 2, as applied shown in white arrow in Figure 100, transports in -X direction X step distance (distance of substantially 2 times of the X-direction length of irradiation area).

2 opposing substrate of substrate P keeps tool PH's at the end of showing the X step distance conveying of aforesaid substrate P2 in Figure 101 Positional relationship.At this point, new substrate P 3 has been moved on air flotation cell the group 84H and 84J of the side-Y.

It from the state of Figure 101, is controlled by main control unit 50, is adsorbed and protected using the substrate Y stepping conveyer 88 of the side+X Substrate P 3 is held, as shown in blacking arrow in Figure 101, the +Y direction stepping for carrying out substrate P 3 is mobile.Accordingly, become shown in Figure 102 State, substrate P 2 become positional relationship identical with substrate P 2 with substrate P 1 in Figure 72 with substrate P 3 on substrate holding PH.

Then, holding area ADA1, ADA2 of substrate holding PH is switched to attraction from exhaust by main control unit 50.According to This, substrate P 3, a part of P2 (about the 1/6 of substrate entirety) are adsorbed the holding area for being fixed on substrate holding PH ADA1, ADA2 become with a part of suspension bearing substrate P 3 of a pair of of air flotation cell 84I and air flotation cell group 84H, one of P2 The state of point (substrate all remaining about 5/6).

Secondly, substrate P 3 is new to secondary the one of facility preparatory on locating tab assembly that is, substrate P 3 with respect to projection optics system PL The measurement of irradiation area (this occasion is the irradiation area SA1 in the substrate P 3) alignment mark of exposure object, i.e., with it is above-mentioned same The progress of sample.

Then, when substrate P 3 with respect to projection optics system PL it is new to locating tab assembly at the end of, main control unit 50 is that root should As a result, driving coarse motion platform 32A, 32B and micro-move device fine motion microscope carrier 26, to carry out time acceleration of an exposure, by (and the substrate of substrate P 3 Keep tool PH) it is positioned at the scanning starting position (accelerating starting position).Shown in Figure 102 by this method by substrate P 3 (and Substrate holding PH) it is just positioned to carry out the scanning starting position of the exposure of irradiation area SA1 in substrate P 3 and (accelerating start bit Set) after state.

Then, main control unit 50, if in Figure 102 apply white arrow shown in, start substrate P 3 (baseplate carrier (PH, 26,28, 32A, 32B)) with the acceleration of the +X direction of exposure mask M (exposure mask microscope carrier MST) and above-mentioned similarly irradiation area SA1 is scanned Exposure.

The scan exposure to the irradiation area SA1 of substrate P 3 is shown in Figure 103 to be terminated, baseplate carrier (PH, 26,28, 32A, 32B) stop state.

Secondly, substrate P 2 is new to secondary the one of facility preparatory on locating tab assembly that is, substrate P 2 with respect to projection optics system PL The measurement of irradiation area (this occasion is the irradiation area SA4 in the substrate P 2) alignment mark of exposure object, i.e., with it is above-mentioned same The progress of sample.

Then, when substrate P 2 with respect to projection optics system PL it is new to locating tab assembly at the end of, main control unit 50 is that root should As a result, driving coarse motion platform 32A, 32B and micro-move device fine motion microscope carrier 26, to carry out time acceleration of an exposure, by (and the substrate of substrate P 2 Keep tool PH), as in Figure 103 apply white arrow shown in, with it is above-mentioned similarly carry out slightly toward -X direction drive substrate P 2 (and Substrate holding PH) X stepwise operation.It shows in Figure 104 and has by this method just positioned substrate P 2 (and substrate holding PH) State behind the scanning starting position (accelerating starting position) to carry out the exposure of irradiation area SA4 in substrate P 2.

Then, main control unit 50, if in Figure 104 apply white arrow shown in, start substrate P 2 (baseplate carrier (PH, 26,28, 32A, 32B)) with the acceleration of the +X direction of exposure mask M (exposure mask microscope carrier MST) and above-mentioned similarly irradiation area SA4 is scanned Exposure.Parallel, main control unit 50, as shown in blacking arrow in Figure 104, by substrate P 3 in past on substrate holding PH with this +Y direction is transported to carry out the Y stepwise operation same as described above of substrate P 3.

Figure 105 shows that the scan exposure to irradiation area SA4 in substrate P 2 terminates, baseplate carrier (PH, 26,28,32A, 32B) the state stopped.At this point, substrate P 3 finishes stepwise operation, the irradiation area SA2 in substrate P 3 is located at substrate holding On the holding area ADA1 of PH.

Later, the holding area ADA1 of substrate holding PH is switched to attraction, substrate P 3 from exhaust by main control unit 50 1/6 part comprising irradiation area SA2 be adsorbed and be fixed on holding area ADA1.At this point, the rest part of substrate P 3 is (about 5/6) by a pair of a part of the air flotation cell group 84H of the side+Y, a part of the air flotation cell group 84H of the side-Y and the side+X Air flotation cell 84I suspension bearing.

Then, substrate P 3 is carried out to locating tab assembly that is, set in advance in substrate P 3 with respect to the new of projection optics system PL The measurement for time irradiation area SA2 alignment mark set.Before this is to locating tab assembly, for the alignment mark position for making measurement object In the above-mentioned X stepwise operation (referring to Fig.1 05 in apply white arrow) in the detection visual field of alignment detection system, carrying out substrate P 3.

Then, when substrate P 3 with respect to projection optics system PL it is new to locating tab assembly at the end of, by 50 basis of main control unit Should as a result, substrate P 3 (and substrate holding PH) is positioned at for carry out the exposure of irradiation area SA2 in substrate P 3 plus Fast starting position.The state after terminating this positioning is shown just in Figure 106.

Then, the -X direction of substrate P 3 and exposure mask M accelerate (to whitewash arrow in 06 referring to Fig.1 by main control unit 50 Head), carry out the scan exposure of the irradiation area SA2 same as described above to substrate P 3.It is parallel with this, by main control unit 50, as shown in blacking arrow in Figure 106, carry out substrate P 2 in the substrate P 2 transported on substrate holding PH toward -Y direction Above-mentioned identical Y stepwise operation.

The scan exposure to irradiation area SA2 in substrate P 3 is shown in Figure 107 to be terminated, baseplate carrier (PH, 26,28, 32A, 32B) stop state.At this point, substrate P 2 finishes Y stepwise operation, the irradiation area SA5 in substrate P 2 is located at substrate guarantor On the holding area ADA2 for holding tool PH.

Later, the holding area ADA2 of substrate holding PH is switched to attraction, substrate from exhaust by main control unit 50 1/6 part comprising irradiation area SA5 of P2, which is adsorbed, is fixed on holding area ADA2.At this point, the rest part of substrate P 2 (about 5/6) is a pair of of air flotation cell 84I suspension bearing by a part of the air flotation cell group 84H of the side-Y and the side-X.

Then, substrate P 2 is carried out to locating tab assembly that is, set in advance in substrate P 2 with respect to the new of projection optics system PL The measurement for time irradiation area SA5 alignment mark set.Before this is to locating tab assembly, for the alignment mark position for making measurement object In the above-mentioned X stepwise operation (referring to Fig.1 07 in apply white arrow) in the detection visual field of alignment detection system, carrying out substrate P 2.

Then, when substrate P 2 with respect to projection optics system PL it is new to locating tab assembly at the end of, by 50 basis of main control unit Should as a result, substrate P 2 (and substrate holding PH) is positioned at for carry out the exposure of irradiation area SA5 in substrate P 2 plus Fast starting position.The state after terminating this positioning is shown just in Figure 108.

Then, the +X direction of substrate P 2 and exposure mask M accelerate (to whitewash arrow in 08 referring to Fig.1 by main control unit 50 Head), carry out the scan exposure of the irradiation area SA5 same as described above to substrate P 2.It is parallel with this, by main control unit 50, as shown in blacking arrow in Figure 108, carry out substrate P 2 in the upper of the substrate P 3 transported on substrate holding PH toward +Y direction State identical Y stepwise operation.

The scan exposure to irradiation area SA5 in substrate P 2 is shown in Figure 109 to be terminated, baseplate carrier (PH, 26,28, 32A, 32B) stop state.At this point, substrate P 3 finishes Y stepwise operation, the irradiation area SA3 in substrate P 3 is located at substrate guarantor On the holding area ADA1 for holding tool PH.

Later, the holding area ADA1 of substrate holding PH is switched to attraction, substrate from exhaust by main control unit 50 1/6 part comprising irradiation area SA3 of P3, which is adsorbed, is fixed on holding area ADA1.At this point, the rest part of substrate P 2 (about 5/6) is a pair of of air flotation cell 84I suspension bearing by a part of the air flotation cell group 84H of the side+Y and the side+X.

Then, substrate P 3 is carried out to locating tab assembly that is, set in advance in substrate P 3 with respect to the new of projection optics system PL The measurement for time irradiation area SA3 alignment mark set.Before this is to locating tab assembly, for the alignment mark position for making measurement object In the above-mentioned X stepwise operation (referring to Fig.1 09 in apply white arrow) in the detection visual field of alignment detection system, carrying out substrate P 3.

Then, when substrate P 3 with respect to projection optics system PL it is new to locating tab assembly at the end of, by 50 basis of main control unit Should as a result, substrate P 3 (and substrate holding PH) is positioned at for carry out the exposure of irradiation area SA3 in substrate P 3 plus Fast starting position.The state after terminating this positioning is shown just in Figure 110.

Then, the -X direction of substrate P 3 and exposure mask M accelerate (to whitewash arrow in 10 referring to Fig.1 by main control unit 50 Head), carry out the scan exposure of the irradiation area SA3 same as described above to substrate P 3.It is parallel with this, by main control unit 50, as shown in blacking arrow in Figure 110, carry out substrate P 2 in the substrate P 2 transported on substrate holding PH toward -Y direction Above-mentioned identical Y stepwise operation.

The scan exposure to irradiation area SA3 in substrate P 3 is shown in Figure 111 to be terminated, baseplate carrier (PH, 26,28, 32A, 32B) stop state.At this point, substrate P 2 finishes Y stepwise operation, the irradiation area SA6 in substrate P 2 is located at substrate guarantor On the holding area ADA2 for holding tool PH.

Later, the holding area ADA2 of substrate holding PH is switched to attraction, substrate from exhaust by main control unit 50 1/6 part comprising irradiation area SA6 of P2, which is adsorbed, is fixed on holding area ADA2.At this point, the rest part of substrate P 2 (about 5/6) is a pair of of air flotation cell 84I suspension bearing by a part of the air flotation cell group 84H of the side-Y and the side-X.

Then, substrate P 2 is carried out to locating tab assembly that is, set in advance in substrate P 2 with respect to the new of projection optics system PL The measurement for time irradiation area SA6 alignment mark set.Before this is to locating tab assembly, for the alignment mark position for making measurement object In the above-mentioned X stepwise operation (referring to Fig.1 11 in apply white arrow) in the detection visual field of alignment detection system, carrying out substrate P 2.

Then, when substrate P 2 with respect to projection optics system PL it is new to locating tab assembly at the end of, by 50 basis of main control unit Should as a result, substrate P 2 (and substrate holding PH) is positioned at for carry out the exposure of irradiation area SA3 in substrate P 2 plus Fast starting position.The state after terminating this positioning is shown just in Figure 112.

Then, the +X direction of substrate P 2 and exposure mask M accelerate (to whitewash arrow in 10 referring to Fig.1 by main control unit 50 Head), carry out the scan exposure of the irradiation area SA6 same as described above to substrate P 2.

Figure 113 shows that the scan exposure to irradiation area SA6 in substrate P 2 terminates, baseplate carrier (PH, 26,28,32A, 32B) the state stopped.

Later, holding area ADA1, ADA2 of substrate holding PH is switched to exhaust from attraction by main control unit 50, and Substrate P 2 is kept with substrate Y stepping conveyer 88 (referring to Figure 70) absorption of the side-X, as shown in blacking arrow in Figure 113, (conveying) is moved out toward -Y direction.Parallel with this, main control unit 50 is with the substrate X stepping conveyer 91 of the side+Y (referring to figure 70) absorption keeps substrate P 3.Then, the time point exited completely from substrate holding PH in substrate P 2, main control unit 50, If applied in Figure 113 shown in white arrow, carries out substrate P 3 and transported in the X step distance of -X direction.

Later, as shown in Figure 114, the substrate P 2 of the comprehensive end exposure of substrate is moved out, in the guarantor of substrate holding PH It holds and moves in new substrate P 4 on the ADA1 of region.

Later, it to the substrate P 3 and unexposed substrate P 4 of the end exposure of 3 irradiation areas, is repeated and above-mentioned base Plate P2 processing identical with substrate P 3.

As previously discussed, this variation due to 2 without substrate while being replaced and (moving in, move out), exposure pair The irradiation area of elephant changes and the efficiency of substrate replacement operation is better.Specifically, in the exposure journey of above-mentioned 9th implementation form In sequence 13 and 14 (Figure 85 and Figure 86) shown in, 2 axis without the X-axis and Y-axis implemented originally in substrate P 1 are mobile.Also, by In substrate move in and move out be it is each carry out 1, even if substrate is moved in and is moved out and required (not shown) move in device and remove Only each 1, device out also can carry out replacement operation with the short time.

Also, in above-mentioned 9th implementation form and its variation, though with by the holding area ADA1 of substrate holding PH, ADA2 is made about 1/6 area of substrate respectively, and correspondence 2 face of X-direction (2 scanning) and 3 face of Y direction (3 scanning) takes 6 faces The situation of (exposure scan number) is described, but not limited to this, it also can be by holding area ADA1, ADA2 of substrate holding PH point It is not set as about 1/4 area of substrate.This occasion can also correspond to 2 face of X-direction (2 scanning) and 2 face of Y direction (2 scanning) Take the situation in 4 faces.

Also, aforesaid substrate keeps the configuration relation of 2 plate bases configured on tool PH and the sequence of exposure area change is only An example, it's not limited to that.For example, in above-mentioned 9th implementation form and its variation, though it carries out for interaction to 2 plate bases In a side and another party scan exposure (therefore, the Y stepwise operation of another substrate and a substrate be the interaction parallel with this into Row) situation be described, but the side in 2 plate bases might not be needed to interact progress with the scan exposure of another party.No It crosses, is desirable to holding area ADA1, ADA2 being loaded into 2 plate bases on substrate holding PH, at least one of a substrate is shone The Y stepwise operation of the scan exposure and another substrate of penetrating region is at least partly parallel, and one be desirable in 2 plate bases During the exposure of substrate starts until terminating, the exposure of at least one irradiation area of another substrate is carried out.In this way, with 2 The situation for the exposure for just starting another substrate after the end exposure of a substrate in substrate is compared, and can be terminated with shorter time to 2 The exposure of plate base.

In addition, in above-mentioned 9th implementation form and variation, though it lifts using with 2 holding areas divided with groove portion 2 Substrate holding PH situation for, but not limited to this, also can by independent 2 substrate holdings arrange be fixed on 1 it is micro- On dynamic load platform.

Also, though substrate X stepping conveyer 91 and substrate Y stepping conveyer 88 are disposed on the week of substrate holding PH Side, but as long as if 2 plate base opposing substrates can be made to keep tool PH mobile and become positional relationship similar to the above, substrate X Configuration, the quantity etc. of stepping conveyer 91 and substrate Y stepping conveyer 88 all can be selected arbitrarily.But, substrate Y stepping is transported It send device 88 that must carry out (parallel) simultaneously to transport the Y stepping of the scan exposure and another substrate of irradiation area on a substrate, Therefore mounted board is necessarily placed to keep on the fine motion microscope carrier 26 for having PH or the moving body integrally moved with substrate holding PH.

" the 10th implementation form "

Secondly, being directed to the 10th implementation form, it is illustrated according to Figure 115~Figure 117.Herein, with above-mentioned 9th implementation form Identical or same composition part assigns same or like symbol, and simplifies or the description thereof will be omitted.

Figure 115 is the top view that a part of exposure device 1000 of the 10th implementation form is omitted.Also, Figure 116 be from+ X-direction observation exposure device 1000, the outline side view that a part is omitted.But, Tu116Zhong, with above-mentioned Figure 69 likewise, Coarse motion platform 32 is all being shown with sectional view for part with weight payment device 28.

The exposure device 1000 of this 10th implementation form, is with above-mentioned 9th implementation form deviation, replaces aforesaid substrate Bearing table device PSTh and be provided with baseplate carrier device PSTi, composition of other parts etc. is then identical as above-mentioned 9th implementation form.

Baseplate carrier device PSTi replaces above-mentioned coarse motion microscope carrier portion 24 and has coarse motion microscope carrier portion 24 ' as shown in Figure 116. Coarse motion microscope carrier portion 24 ' has 2 (a pair) X beam 30A ', 30B ', coarse motion platform 32 and by 2 X beams as shown in Figure 116 Each multiple foots 34 supported on the F of ground of 30A ', 30B '.

Coarse motion platform 32 is 2 coarse motion platform 32A and 32B for replacing such as aforesaid substrate bearing table device PSTh to have and is arranged Person, by Figure 115 and Figure 116 it is found that having coarse motion platform 32A and 32B integration and reducing the shape of Y direction size.

Each portion in coarse motion microscope carrier portion 24 ' is constituted, by being had with the exposure device of the 4th implementation form for example illustrated before Standby baseplate carrier device PSTc is identical, therefore detailed description will be omitted.

In baseplate carrier device PSTi, as shown in Figure 116, the air flotation cell of the Y direction two sides of substrate holding PH with The separation of coarse motion platform 32 is arranged on the F of ground.Furthermore with this change, a pair of of substrate Y stepping conveyer 88 and a pair of substrate X step Fine motion microscope carrier 26 is installed on into conveyer 91.

In the side+Y of X beam 30A ' and the side-Y of X beam 30B ', as shown in Figure 116, a pair of frames 110A ', 110B ' it is each It is arranged on the F of ground in a manner of it will not be contacted with pallet 18.In the upper surface of a pair of frames 110A ', 110B ', it is equipped with a pair of of gas Floating one-element group 84H's ' is each.

A pair of of air flotation cell group 84H's ' is each, as shown in Figure 115 and Figure 116, configures in the Y-axis side of substrate holding PH To two sides.A pair of of air flotation cell group 84H's ' is each, is in Y direction width compared with substrate (such as P1 or P2) as shown in Figure 115 Y direction width is slightly short, X-direction length and substrate holding PH and aftermentioned a pair of air flotation cell group 84I ' are in exposure program In the rectangular area of middle moving range substantially equal length, by being separated by what given clearance was distributed in X-direction and Y direction Multiple air flotation cells are constituted.The X position substantially one at the center of the exposure area IA center each with a pair of of air flotation cell group 84H ' It causes.The upper surface of each air flotation cell of a pair of of air flotation cell group 84H ' is to be set to same or slightly with the upper surface of substrate holding PH It is low.

Also, in the X-direction two sides of substrate holding PH, replacing each pair above-mentioned air bearing in baseplate carrier device PSTi Unit 84I is configured with each of a pair of of air flotation cell group 84I '.A pair of of air flotation cell group 84I ', as shown in Figure 115, respectively by X-direction with predetermined distance configure it is multiple, such as 3 constituted in the elongated rectangle air flotation cell of Y direction.Each air flotation cell The interval to each other more a pair of of air flotation cell group 84H ' of Y direction length it is slightly short.A pair of of air flotation cell group 84I's ' is each, is Mode same as air flotation cell 84I is fixed on the upper surface of coarse motion platform 32.

Respectively constitute each air flotation cell of a pair of of air flotation cell group 84H ' and a pair of of air flotation cell group 84I ' bearing surface (on Face), with above-mentioned air flotation cell 84 likewise, being porous plastid or the mechanical disc type air bearing structure with multiple micro holes It makes.Each air flotation cell can be by the supply of the gas-pressurized (such as pressure-air) from above-mentioned gas feeding mechanism, and suspend branch Hold a part of substrate.It to the on/off of the pressure-air supply of each air flotation cell, is controlled by main control unit 50.

In this 10th implementation form, by above-mentioned a pair of air flotation cell group 84H ' and a pair of of air flotation cell group 84I ', even if Be in substrate with baseplate carrier (PH, 26,28,32) when X-direction, such as total-travel mobile, can also prevent hanging down for substrate, Suspension bearing substrate.

Also, a pair of of air flotation cell group 84H ', as long as being respectively provided with the total bearing area substantially same with above-mentioned rectangular area If, replaceable is single large-scale air flotation cell, and also the shape of each air flotation cell or size can be made different from Figure 115 Those shown is distributed in above-mentioned rectangular area.Likewise, for a pair of of air flotation cell group 84I ', it also can be by each air bearing list The shape or size of member are made different from Figure 115 those shown.

Also, as shown in Figure 116, a pair of of substrate X stepping conveyer 91 is disposed on substrate in baseplate carrier device PSTi The Y direction two sides for keeping tool PH, are fixed on fine motion microscope carrier 26 by supporting member.Likewise, dress is transported in a pair of of substrate Y stepping It sets 88 also to configure in the X-direction two sides of substrate holding PH, fine motion microscope carrier 26 is fixed on (referring to figure by supporting member 115)。

Further, a pair of of Y interferometer 98Y₁、98Y₂, it is in the side composition-Y air flotation cell group 84H ' as shown in Figure 115 The 1st multiple air flotation cells of column close to substrate holding PH in, the adjacent air flotation cell near X-direction center each other Between 2 at gap opposite direction position, be fixed on side frame 20.Gap at 2 is opposite pairs of by the Y-axis at the center exposure area IA The gap of title.In this implementation form, from a pair of of Y interferometer 98Y₁、98Y₂Pass through gap at above-mentioned 2 respectively, measuring beam (is surveyed Long light beam) it is irradiated in Y moving lens 94Y.

The composition of the other parts of baseplate carrier device PSTi is identical as aforesaid substrate bearing table device PSTh.

In addition, can also be arranged and aforesaid substrate X stepping conveyer 91 and base near a pair of of air flotation cell group 84H ' The different another base-board conveying device (not shown) of plate Y stepping conveyer 88 carries out moving in and removing for substrate by this device Out.

The exposure device 1000 of this 10th implementation form, is with identical with the exposure device 900 of above-mentioned 9th implementation form Program carries out a series of movements such as substrate replacement, alignment and exposure.

The exposure device 1000 of the 10th implementation form of sheet according to the above description can get and above-mentioned 9th implementation form The same effect of exposure device 900.In addition to this, in exposure device 1000, due to the Y direction two sides of substrate holding PH Air flotation cell group 84H ' is to constitute by fixation and in multiple air flotation cells of X-direction wide scope configuration, therefore replace in substrate When, substrate can be made standby on fixed air flotation cell group 84H ' in advance, and more efficiently and with the short time can carry out substrate more It changes.In Figure 117, as an example, display will be shown in the exposure program explanatory diagram (15) in the variation of above-mentioned 9th implementation form Substrate replace (referring to Fig.1 14), with the top view for the situation that the exposure device 1000 of this 10th implementation form carries out.This Close, by Figure 117 it is found that before exposure program 15, can with exposure program 14 (referring to Fig.1 13), keep new substrate P 4 standby The position of diagram.In addition, 2 plate bases shown in the exposure program explanatory diagram (27) for carrying out above-mentioned 9th implementation form are simultaneously When the situation of replacement (referring to Figure 99), it can also make 2 new substrates standby on a pair of of air flotation cell group 84H ' in advance, therefore energy Efficient and high speed carry out substrate replacement.

Also, according to the exposure device 1000 of this 10th implementation form, due to being the Y direction two sides for making substrate holding PH Air flotation cell group 84H ' separated from baseplate carrier (coarse motion platform 32), therefore the load of baseplate carrier (coarse motion platform 32) can be mitigated, Promote the controlling of baseplate carrier.Further, since each air flotation cell of air flotation cell group 84H ' is motionless, therefore have no measurement The Y interferometer 98Y of the Y direction position of fine motion microscope carrier 26₁、98Y₂Measuring beam by the anxiety of air flotation cell masking.Therefore, may be used By Y interferometer 98Y₁、98Y₂The side frame 20 of the device noumenon of (side-Y) on the outside of air flotation cell group 84H ' is set (referring to Fig.1 15, Figure 116).

Also, dress can be transported in movable air flotation cell, substrate X stepping in the exposure device 1000 of this 10th implementation form Set 91 and substrate Y stepping conveyer 88 be mounted on the coarse motion separated with substrate holding PH (that is, fine motion microscope carrier 26) mechanicalness Platform 32, also can one be installed on substrate holding PH or fine motion microscope carrier 26.

" variation of the 10th implementation form "

Also, can will also constitute a part of multiple air flotation cells of a pair of of air flotation cell group 84H ' in the 10th implementation form It is installed on baseplate carrier (coarse motion platform 32 or fine motion microscope carrier 26), such as above-mentioned 1st implementation form, is made movable air flotation cell. For example, can the variation as shown in Figure 118 and Figure 119, the gas of the side-Y of substrate holding PH is constituted with fixed air flotation cell Floating one-element group 84H ', is equipped on baseplate carrier (coarse motion platform 32) for the air flotation cell group 84H of the side+Y of substrate holding and is made Movably.In addition, fixed air flotation cell group 84H ', in Figure 118, though the body BD (exposure device with mounted board microscope carrier Ontology) mechanically and in vibration separates and be located on the F of ground, but also may be disposed on body BD.

" the 11st implementation form "

Secondly, being directed to the 11st implementation form, it is illustrated according to Figure 120.Outline shows this 11st implementation in Figure 120 The composition of the exposure device 1100 of form.Shown in such Figure 120, exposure device 1100, the exposure with above-mentioned each implementation form is filled It sets and is different in, the multiple alignment detection system AL that will test the alignment mark of substrate are located at the substrate for loading substrate P 1, P2 etc. Keep tool PH.

Correspondence for the originally substrate P 1 of the exposure device 1100 of the 11st implementation form, P2 etc., in the back side (face of the side-Z) The commitment positions of any one in multiple alignment detection system AL are equipped at least two alignment mark.Each alignment mark, such as with multiple Graduation mark, can by alignment detection system AL measure substrate opposing substrate keep tool PH position (or deviate base position position Offset).

The other parts of exposure device 1100 include baseplate carrier device PSTh, are the exposures with above-mentioned 9th implementation form Device 900 equally constitutes.Therefore, the exposure device 1100 of basic 11st implementation form can obtain and the exposure of the 9th implementation form The same effect of device 900.In addition to this, in exposure device 1100, even in the baseplate carrier comprising fine motion microscope carrier 26 In movement, also can be carried out substrate to locating tab assembly.Specifically, main control unit 50 can to 2 plate bases, for example to substrate A substrate in P1, P2 carried out in X scanning to another substrate opposing substrate holding tool PH to locating tab assembly.Therefore, master control Device 50 processed can be such that immediately another substrate and fine motion carries after the X end of scan of a substrate according to the above-mentioned result to locating tab assembly Platform 26 (substrate holding PH) moves a little together, corrects the position of another substrate accordingly.In this way, can be in a substrate Scan exposure after immediately begin to the scan exposure of another substrate, and productivity can be promoted.

Also, alignment detection system AL is not limited to be located at substrate holding PH in exposure device 1100, carrying base also may be provided in Plate keeps the fine motion microscope carrier 26 of tool PH.

Also, in the exposure device of above-mentioned 9th~the 11st each implementation form, the air bearing list that can will also be equipped on coarse motion platform Member, substrate Y stepping conveyer, substrate X stepping conveyer etc. are equipped on fine motion microscope carrier, or the movement of coarse motion platform is followed in setting Another moving body, on another moving body carry air flotation cell to be made the composition movable in X-direction.This occasion, also Aforesaid substrate Y stepping conveyer 88 can be set in carrying air flotation cell, following on the mobile another moving body of coarse motion platform.This Outside, in above-mentioned 9th~the 11st each implementation form, substrate X stepping conveyer 91 can also be configured outside baseplate carrier.

Also, in above-mentioned 1st~the 11st each implementation form, though the Y direction width of substrate holding PH is set as substrate About 1/3 or 1/2, as long as but substrate holding PH Y direction width it is apparent compared with the Y direction width of substrate holding PH If short, however it is not limited to this.As long as the exposure field width (side Y of the Y direction width of substrate holding PH and projection optics system To) with degree more than.For example, the exposure field width (Y-direction) of projection optics system is if (n is 2 or more to the about 1/n of substrate Integer) if, then the width of substrate holding PH can be also made to the about 1/n of the Y-direction size of substrate.This occasion, configuration Preferably divide in the Y direction width of the air flotation cell of the Y direction two sides of substrate holding PH for the flexure for inhibiting substrate It is not made pact (n-1)/n of the Y direction size of substrate.In addition, substrate Y stepping conveyer, also can make substrate completely to have The mobile Y stroke in region of the entirety on substrate holding is preferable.

Also, in above-mentioned each implementation form, though the feelings of air flotation cell are used for the purpose for being the flexure for preventing substrate P Shape is described, but not limited to this, the substrate that can also have contact-type rolling bearing (using roller or ball etc.) hangs down and prevents Device, come replace above-mentioned each implementation form air flotation cell at least part.For the flexure for preventing substrate P, tool also can be used The substrate of bearing components other than standby air flotation cell, rolling bearing hangs down anti-locking apparatus.

Also, weight payment device (stem) can be carried such as the 1st implementation form using with fine motion in above-mentioned each implementation form Platform segregator (referring to Fig.1, Fig. 3), also can such as the 2nd~the 11st implementation form use and the one-piece type person of fine motion microscope carrier.In addition, also It can be without the wrist of the target of level sensor.Also, levelling mechanism opposite up and down can be configured with weight payment mechanism part.As was noted, The construction of weight payment device is simultaneously defined in above-mentioned each implementation form.

Though also, above-mentioned each implementation form be directed to 26 mounted board of fine motion microscope carrier keep tool PH situation be described, But not limited to this, when the feelings of materials'use ceramics as fine motion microscope carrier etc., etching and processing etc. can be imposed to its upper, will be had It is integrally formed with the maintaining part for keeping the aforesaid substrate of substrate to keep the tool same function of PH with fine motion microscope carrier.

Also, the above-mentioned common composition part having of each implementation form, also having not necessarily must be by the had person of exposure device. For example, substrate P is kept into the feelings come the so-called longitudinal type exposure device that is exposed etc. parallel with the face of horizontal plane When shape, due to will not generate substrate self weight cause hang down, the substrate supporting device of air flotation cell etc. is not necessarily required to Setting.In addition, weight payment device is also nonessential.This occasion, though it is necessary to the mobile microscope carrier for keeping substrate holding mobile , but the movement microscope carrier can be so-called rough micro-moving mechanism microscope carrier or individually 6DOF microscope carrier.Importantly, mobile microscope carrier can be (to X-direction is less than), drive substrate keeps tool in X/Y plane, certainly, if if can be carried out the driving in 6DOF direction, More preferably.Furthermore as long as constitute each other will not contradiction, each portion of composition of above-mentioned 1st~the 11st implementation form can arbitrarily be subject to Combination.

Also, above-mentioned each implementation form, though the sweep type acted with the step-scan of substrate P is carried out for exposure device system The occasion of the projection aligner of exposure is described, but not limited to this, above-mentioned each implementation form is also applicable to stepping engagement (step&stitch) exposure of the projection aligner of mode and proximity (proximity) mode without using projection optics system Electro-optical device.

Also, in the exposure device of above-mentioned each implementation form, illumination light can be ArF excimer laser (wavelength 193nm), Ultraviolet light, the F of KrF excimer laser (wavelength 248nm) etc.₂The vacuum-ultraviolet light of laser (wavelength 157nm) etc..In addition, conduct Illumination light, can be used for example will vibrate the single of infrared bands out or visible band from dfb semiconductor laser or optical-fiber laser Wavelength laser, for example to be amplified doped with the fiber amplifier of erbium (or both erbium and ytterbium) as vacuum-ultraviolet light, and with Nonlinear optical crystal is converted wavelength into the harmonic wave of ultraviolet light.In addition, also can be used Solid State Laser (wavelength: 355nm, 266nm) etc..

Also, each above-mentioned implementation form, though have multiple optical systems (projecting optical unit) for projection optics system PL The situation of the projection optics system of poly-lens mode is described, but the quantity of projecting optical unit is without being limited thereto, if having 1 with It is upper.It can also be for example using offner type large size reflecting mirror in addition, being not limited to the projection optics system of poly-lens mode Projection optics system etc..

Also, the projection optics system PL in above-mentioned each implementation form, though it is done for using the situation that projection multiplying power is equimultiple Explanation, but not limited to this, projection optics system can also be reduce system or amplification system any.

Also, being formed with set light-shielding pattern though being used in the mask substrate of transmitance in above-mentioned each implementation form The light transmission type exposure mask of (or phase pattern, dim light pattern), but also may replace this exposure mask and use such as U.S. Patent No. 6, Transmission pattern, reflection graphic patterns or illuminated diagram are formed according to the electronic data of pattern to be exposed disclosed by No. 778,257 specifications The electronics exposure mask (variable forming exposure mask) of case, for example using non-luminescent type image display element (also known as spacial light modulater) A kind of variable forming exposure mask of DMD (Digital Micro-mirror Device).

Also, the exposure device of above-mentioned each implementation form, especially to make size (comprising in outer diameter, diagonal line, one side extremely It is one few) it is the exposure that substrate, the flat-panel monitor such as liquid crystal display element (FPD) of 500mm or more are exposed with large substrate Electro-optical device is particularly effective.This be because the present invention be in response to substrate enlargement into therefore.

In addition, the exposure device of above-mentioned each implementation form can be used, the liquid crystal display element of microcomponent is manufactured.Firstly, will Pattern image is formed in photosensitive substrate (glass substrate etc. for being coated with photoresist), so-called photoetching process.By this photoetching process, in The predetermined pattern comprising multiple electrodes etc. is formed on photosensitive substrate.Later, exposed substrate is walked via development step, etching Suddenly, each step of photoresist stripping step etc., in forming predetermined pattern on substrate.Then, it is assembled through colored filter forming step, unit Step and module assembling step etc. obtain the liquid crystal display element of microcomponent.

Also, above-mentioned each implementation form is not limited to though as substrate board treatment being described for exposure device This, also can assign the element fabricating device of device in for example having ink jet type functional liquid or examine the exposure devices such as Check device Substrate board treatment in addition, at least partly implementation form being applicable in above-mentioned 1st to the 11st implementation form.

In addition, quoting described above cited about all bulletins of exposure device etc., International Publication, United States Patent (USP) Shen Please prospectus and US Patent specification a part for being recorded as this specification of announcement.

Industrial availability

Substrate board treatment and substrate processing method using same of the invention is suitable for the processing of large substrate.Also, exposure of the invention Light method and exposure device are suitable for the exposure of large substrate.In addition, manufacturing method and flat-panel monitor of the invention Manufacturing method is suitable for the manufacture of liquid crystal display element etc..

Claims (1)

1. a kind of exposure method, exposes multi-piece substrate:

In having the base plate keeping device for the 1st and the 2nd holding area that can keep 2 plate bases individually to load 2 plate base, at this During the exposure of a substrate in 2 plate bases starts until terminating, at least one processing region of another substrate is carried out Exposure.