CN107479332A - Exposure method and device, the manufacture method of flat-panel monitor and manufacturing method - Google Patents

Abstract

The exposure device that processing is exposed to substrate (P) of the present invention, possesses：The substrate Y steppings conveyer (88) in the Y direction in X/Y plane is driven with the substrate holding (PH), relative exposure position (exposure area (IA)) that keep a part for substrate (P) in the state of flatness is ensured the fine motion microscope carrier moved in X-direction and by substrate (P).This occasion, the X-direction in the fine motion microscope carrier relative exposure region (IA) of a part for substrate (P) is kept to move in the state of flatness is ensured with substrate holding (PH), using the progress before and after Y direction movement of the substrate (P) of substrate Y steppings conveyer (88), the exposure-processed to multiple regions on substrate (P) is carried out according to this.

Description

Exposure method and device, the manufacture method of flat-panel monitor and manufacturing method

This case is the applying date for August in 2012 30 days, Application No. 201280042608.X, entitled " at substrate Manage device and substrate processing method using same, exposure method and exposure device and the manufacturer of manufacturing method and flat-panel monitor The divisional application of the patent application of method ".

Technical field

The present invention is on substrate board treatment and substrate processing method using same, exposure method and exposure device and element system Method and the manufacture method of flat-panel monitor are made, substrate is sequentially moved with to multiple on substrate especially with regard to relative to processing position Region, which carries out the substrate board treatment of set processing and substrate processing method using same, relative exposure position (processing position), makes substrate sequentially It is mobile so that the exposure method and exposure device of multiple regional exposures on substrate and using aforesaid substrate processing unit, on State the manufacture method of substrate processing method using same, the manufacturing method of above-mentioned exposure method or exposure device and flat-panel monitor.

Background technology

All the time, the electronic components (microcomponent) such as liquid crystal display cells, semiconductor element (integrated circuit etc.) are manufactured Photoetching process, the projection aligner (so-called stepper) or step of (step＆repeat) mode are mainly repeated using stepping Enter projection aligner (so-called scanning stepper (also known as scanning machine)) of scanning (step＆scan) mode etc..

In such a exposure device, surface scribbles glass plate or chip of sensing agent etc. (following, to be referred to as substrate) and is loaded In on baseplate carrier device.And the circuit pattern for being formed at mask (or graticule) is then with via optical systems such as projecting lens It is transferred to substrate by the irradiation of exposure light.

In recent years, the substrate of the exposure object thing of exposure device, substrate (rectangular glass base especially used for liquid crystal display element Plate), its size has the tendency of increasingly to maximize, and with this tendency, keeps the Substrate table of substrate also to maximize in exposure device, adjoint And the weight come increases the position control increasingly difficulty for causing substrate.To solve this problem, inventor will be previously it is proposed that a kind of will The weight for the being referred to as stem payment device (deadweight canveller) for keeping the deadweight of the Substrate table of substrate to be formed with cylindrical component adds With the exposure device of supporting (for example, referring to patent document 1).

In the existing exposure device possessed baseplate carrier device for the exposure device recorded comprising above-mentioned patent document 1 During exploitation, basic considers mode, to reach the purpose with high speed and high-precision positioning substrate, and makes baseplate carrier as far as possible Lightweight and exclusive PCR (vibration) realized.Past has also developed various only by substrate, entering to this substrate The substrate holding of row plane rectification, support to know the interferometer of substrate position with moving lens, integrally these platform, to drive Move VCM (voice coil motor) of this etc. and be loaded into fine motion load to carry out the needed part of bottom line of high accuracy positioning control Platform, and other parts part (electric base and supply cable etc.) is then loaded into the baseplate carrier device of coarse motion microscope carrier.

On the other hand, such as liquid crystal glass substrate, the newest the 10th from generation to generation on one side up to 3 meters with first-class more large-scale The tendency of change, be equipped with can adsorb the fine motion microscope carrier of the substrate holding for keeping this large substrate all also therewith maximization and its Weight also increases, and can not be referred to as light weight again.Such a substrate holding and support the maximization of this Substrate table etc. gradually into For various unfavorable conditions the reason for.For example, the weight that substrate all the more maximizes, then makes substrate 2 tie up mobile baseplate carrier device Also increase with amount of movement.Therefore, exposure device increasingly maximizes, and causes manufacturing cost increase, the manufacture of device and shipping time Increase.In addition, the mobile consuming time of substrate, and make it that manufacturing lead time is elongated.Therefore, it is desirable to there is one kind can be with high accuracy Guiding exposure object thing (substrate), it can further seek miniaturization, the exploitation of light-weighted bearing table device.

In exposure device, changed in the substrate of baseplate carrier, be that substrate is being kept to the substrate holding of substrate from absorption On take out of and (keep out of the way) after, and by new substrate move on (input) substrate holding into one action.However, existing exposure device In, it is the substrate holding for using the retaining surface with size identical with substrate.Therefore, if existing exposure device is not removed substrate If sending distance same in size, i.e., substrate can not be taken out of from substrate holding, also substrate can not be moved into substrate Keep on tool.

In addition, as it was previously stated, such as liquid crystal has the tendency of to maximize increasingly with glass substrate, therefore, the replacing palpus of substrate There is the considerable degree of time, therefore more hope develops the new equipment for the shortening that can realize substrate replacing construction.

The shortening of substrate replacing construction is not limited to exposure device, but using substrates such as glass substrates as the substrate dealt with objects The common problem of processing unit.

Prior art literature

Patent document

No. 2010/0018950 specification of [patent document 1] U.S. Patent Application Publication No..

The content of the invention

To the means to solve the problem

Inventor realize can with a high speed and high precision guidance object (substrate), further seek miniaturization, lightweight Bearing table device, observe bearing table device again.As a result, area is that 3m is diagonal and the substrate weight of thickness 0.7mm degree omits Less than 20kg, in contrast, the weight of the substrate holding of supporting substrates is about 1 ton.Therefore, supporting substrates keep the platform of tool also Become heavier.Also cognition is arrived again, if be able to can make to be connected to holding by if the substrate holding lightweight of leading section All part lightweights such as each composition part, Yi Jitai, weight payment device (stem) and guiding element under tool.

The dominant role of substrate holding is will be thin and be also easy to produce and tilt and/or the correction of the substrate of flexure is flat.Therefore, Existing substrate holding has the area roughly the same with substrate, and substrate is attached into substrate holding in a manner of such as vacuum suction Surface (above).Therefore, the substrate holding surface as datum plane flatness must be made it is high and for ensure rigidity and Increase thickness causes weight to increase.

On the other hand, in large-scale projection aligner of step-scan mode etc., can single exposure single exposure region It is small that (also known as irradiation area) is configured to the area all compared with substrate, and can not be exposed with single pass and make substrate blanket exposure. Therefore, moved by the way that scan exposure is repeated and is not accompanied by the stepping of exposure to make substrate blanket exposure.However, substrate must be tieed up It is only (irradiation area) in the scanning range of single exposure to maintain an equal level smooth, is only consolidating with the irradiation of projection optics system strictly speaking Fixed range of exposures.Scope in addition and it is not accompanied by the stepping movement of exposure, then need not especially takes notice of the flat of substrate Property.

Therefore, inventor by correct substrate be allowed to flat substrate holding be made with exposure field (field) substantially The width (compared with the slightly wide degree of exposure field) of equal cross scanning direction, the length of scanning direction are made at least compared with can single exposure Sweep length more than.Think simultaneously at the end of the single exposure by scanning, even if sweeping on the substrate of next exposure Exposure area (irradiation area) phase shift is retouched to substrate holding, carry out at this moment every time the alignment of plane rectification and substrate with It is scanned exposure.Consequently, it is possible to which the area of substrate holding can diminish, the platform of supporting also diminishes and causes fine motion Microscope carrier entirety small-size light-weight.

The present invention, be inventor it is above-mentioned consider under form, employ following composition.

The 1st substrate board treatment that 1st aspect of the invention provides, is to handle substrate, possesses：1st moving body, has The maintaining part that a part for the substrate is kept in the state of flatness is ensured, opposing substrate processing position be displaced into At least the 1st direction in the parallel set face in the face of the substrate；And step drive device, the substrate is driven in the set face Move in 2nd direction orthogonal with the 1st direction.

According to this invention, the 1st of a part for substrate is kept to move body phase in the state of flatness is ensured with maintaining part Movement to the 1st direction of substrate processing position, entered before and after being moved using the substrate of step drive device in the 2nd direction OK, the processing to multiple processed regions on substrate is carried out according to this accordingly, it is capable to reduce the maintaining part for keeping substrate and then make tool There is the moving body of the maintaining part small-sized and lightweight.Accordingly, the position controlling of moving body can be lifted and reduce processing substrate The production cost of device.

The 2nd substrate board treatment that 2nd aspect of the invention provides, is to handle substrate, possesses：1st moving body, has Keep the maintaining part of the part in the face of side opposite with the processed surface of the substrate of plane-parallel configuration, opposing substrate processing Position, toward at least the 1st direction movement in the set face parallel with the face of the substrate；A pair of the 1st supporting arrangements, clip the 1st Moving body the 2nd direction both sides orthogonal with the 1st direction in the set face are respectively configured, and have at least one of the substrate Point supported from below, in the size in the 1st direction and the 2nd direction be the bearing-surface more than equal with the substrate；And the 1st Carrying device, at least when the substrate is taken out of from the 1st moving body, at this in a manner of the substrate is in the 2nd direction displacement The substrate is transported in set face.

According to this invention, the maintaining part of the 1st moving body keeps the part in the face of the side opposite with processed surface of substrate.Also That is, the substrate retaining surface of maintaining part is set as small compared with substrate.Therefore, the 1st carrying device is taking out of substrate from the 1st moving body When, substrate is to be transported in a manner of in the 2nd direction displacement in set face, and now, the 1st carrying device only needs to make substrate toward The 2 direction displacements distance small compared with size of the substrate in the 2nd direction, after taking out of for end substrate.Therefore, compared with prior art, The substrate replacing construction for taking out of Distance Shortened point can be shortened.

3rd aspect of the invention provides a kind of manufacturing method, comprising：In the substrate board treatment of the 1st and the 2nd aspect Any one, possess to configure in substrate processing position, the processing region irradiation energy beam being set so as to pass through processing region Base plate exposure exposing optical system when, the action of base plate exposure is made using the substrate board treatment, and make upper after exposure State the action of substrate development.

4th aspect of the invention provides a kind of manufacture method of flat-panel monitor, comprising：At the substrate of the 1st and the 2nd aspect Any one of device is managed, is possessed to configuring in substrate processing position, the processing region irradiation energy beam being set so as to pass through During the exposing optical system of the base plate exposure of processing region, make to be used for flat-panel monitor as substrate using the substrate board treatment Base plate exposure action, and the action for making the aforesaid substrate after exposure develop.

The 1st substrate processing method using same that 5th aspect of the invention provides, to handle substrate, comprising：By a part for the substrate Moving body is held in the state of flatness is ensured, the moving body opposing substrate processing position is driven in the face with the substrate The 1st direction in parallel set face, the action of set processing is carried out with the region in the part to the substrate；And it is Make untreated areas on the substrate and the moving body to, and enter to be about to the substrate with respect to the moving body in the set face it is past The action of the stepper drive of the 2nd direction driving given amount orthogonal with the 1st direction.

According to the method, be by the set processing of carry out before and after stepper drive is carried out, it is multiple on substrate to handle Processed region.Accordingly, it is capable to make the moving body of holding substrate small-sized and lightweight.In this way, the position control of moving body can be lifted Property processed, the production cost for reducing substrate board treatment.

The 2nd substrate processing method using same that 6th aspect of the invention provides, to handle substrate, comprising：It will be configured to and horizontal plane The part in the face of the side opposite with processed surface of the parallel substrate is held in moving body in the state of flatness is ensured, will The moving body opposing substrate processing position is driven in the 1st direction in the set face parallel with the face of the substrate, with to the substrate The part in region carry out the action of set processing；And the substrate of the set processing will be applied in the set face 2nd direction orthogonal with the 1st direction, the short distance of the size in the 2nd direction compared with the substrate is transported, by the substrate from the shifting The action that kinetoplast takes out of.

According to the method, be will apply the substrate (substrate that processing is completed) of set processing in set face with the 1st direction The 2nd orthogonal direction transports the distance short compared with size of the substrate in the 2nd direction, and substrate is taken out of from moving body.Therefore, with showing There is technology to compare, the substrate replacing construction for taking out of Distance Shortened point can be shortened.

The 3rd substrate processing method using same that 7th aspect of the invention provides, is to handle substrate, comprising：Will be with plane-parallel The moving body that the face of the opposite side of processed surface of the substrate of configuration is kept in the state of flatness is ensured, opposing substrate Processing position is driven in the 1st direction in the set face parallel with the face of the substrate, with to multiple processed areas on the substrate The action of domain sequentially set processing；And determine according to the configuration of the plurality of processed region on the substrate with processing sequence The 1st direction position, moved toward the substrate is transported according to the configuration and the fixed direction of the order with what the moving body took out of Make.

It is in the configuration according to the region that is processed on substrate and the fixed set face of processing sequence by substrate according to the method The position in the 1st interior direction, transport according to above-mentioned configuration and the fixed direction of said sequence, to be taken out of from moving body.Therefore, Substrate can be taken out of from moving body along the path for taking out of shortest path.Therefore, not by the configuration in processed region and place on substrate Make restraining for sequence in order, and compared with perseverance in the 1st certain direction position toward the situation that equidirectional takes out of, substrate replacing can be shortened Time.

8th aspect of the invention provides a kind of manufacturing method, included in the substrate processing method using same of the 5th to the 7th aspect When any one makes the method for base plate exposure, the action of base plate exposure is made using the substrate processing method using same, and is made upper after exposure State the action of substrate development.

9th aspect of the invention provides a kind of manufacture method of flat-panel monitor, comprising：At the substrate of the 5th to the 7th aspect When any one in reason method makes the method for base plate exposure, make to be used for flat-panel monitor as substrate using the substrate processing method using same Base plate exposure action, and the action for making the aforesaid substrate after exposure develop.

10th aspect of the invention provides a kind of exposure method, exposes multi-piece substrate：In with 2 plate bases can be kept individually The base plate keeping device of the 1st and the 2nd holding area load 2 plate base, the exposure of the substrate in 2 plate base starts During untill terminating, the exposure of at least one processing region of another substrate is carried out.

The beginning starts the situation of the exposure of another substrate after the end exposure of a substrate in the method, with 2 plate bases Compare, the exposure to 2 plate bases can be terminated with shorter time.

11st aspect of the invention provides a kind of manufacturing method, comprising：Substrate is exposed with the exposure method of the 10th aspect The action of light, and the action for making the aforesaid substrate after exposure develop.

12nd aspect of the invention provides a kind of manufacture method of flat-panel monitor, comprising：With the exposure method of the 10th aspect Make the action of the base plate exposure for flat-panel monitor as substrate, and the action for making the aforesaid substrate after exposure develop.

13rd aspect of the invention provides a kind of exposure device, makes multiple regional exposures on substrate, possesses：Substrate keeps dress Put, there is the 1st and the 2nd holding area of the part that can keep substrate respectively；Moving body, it is provided with the substrate in a part and keeps Device, it is displaced into the 1st direction；And the 1st base-board conveying device, the 1st direction is displaced into moving body one, and make this Substrate is displaced into the 2nd direction intersected with the 1st direction.

According to this device, each part of 2 plate bases can be loaded into the 1st holding area of base plate keeping device respectively Domain, the 2nd holding area, aforesaid substrate holding meanss can be with being displaced into the 1st direction so that a base located at part thereof of moving body The action of the scanned exposure of the processing region of a part for plate is parallel, makes another substrate with the 1st base-board conveying device opposing substrate Holding meanss are displaced into the 2nd direction.Consequently, it is possible to for the 1st plate base a processing region (unexposed area) exposure After light terminates, make the substrate stepping mobile so that the exposure and stepping movement of next processing region (unexposed area) exposure are handed over Mutually alternate to carry out the exposure of the substrate, and the situation being exposed for the 2nd plate base with identical program is compared, and can shorten 2 The exposure-processed spent time of plate base.

14th aspect of the invention provides a kind of manufacturing method, comprising：Substrate is exposed with the exposure device of the 13rd aspect The action of light, and the action for making the aforesaid substrate after exposure develop.

15th aspect of the invention provides a kind of manufacture method of flat-panel monitor, comprising：With the exposure device of the 13rd aspect Make the action of the base plate exposure for flat-panel monitor as substrate, and the action for making the aforesaid substrate after exposure develop.

Brief description of the drawings

Fig. 1 is the figure of the composition for the exposure device that outline shows the 1st embodiment.

Fig. 2 is that top view is omitted in the part for the exposure device for showing the 1st embodiment.

Fig. 3 is to show the exposure device of the 1st embodiment from Fig. 1 +X direction, eliminate a part of outline side View.

Fig. 4 is the output for showing the main control unit formed centered on the control system of the exposure device of the 1st embodiment Enter the block diagram of relation.

Fig. 5 is illustrated with the figure of the series of actions for processing substrate of the exposure device progress of the 1st embodiment (1).

Fig. 6 is illustrated with the figure of the series of actions for processing substrate of the exposure device progress of the 1st embodiment (2).

Fig. 7 is illustrated with the figure of the series of actions for processing substrate of the exposure device progress of the 1st embodiment (3).

Fig. 8 is illustrated with the figure of the series of actions for processing substrate of the exposure device progress of the 1st embodiment (4).

Fig. 9 is illustrated with the figure of the series of actions for processing substrate of the exposure device progress of the 1st embodiment (5).

Figure 10 is illustrated with the figure of the series of actions for processing substrate of the exposure device progress of the 1st embodiment (6).

Figure 11 is illustrated with the figure of the series of actions for processing substrate of the exposure device progress of the 1st embodiment (7).

Figure 12 is illustrated with the figure of the series of actions for processing substrate of the exposure device progress of the 1st embodiment (8).

Figure 13 is illustrated with the figure of the series of actions for processing substrate of the exposure device progress of the 1st embodiment (9).

Figure 14 is the figure of the composition for the exposure device that outline shows the 2nd embodiment.

Figure 15 is the top view of a part for the exposure device for omitting the 2nd embodiment.

Figure 16 is to show the outline side view that the part of the exposure device of the 2nd embodiment from Figure 14 +X direction is omitted Figure.

Figure 17 is the top view for the exposure device possessed baseplate carrier device for showing the 3rd embodiment.

Figure 18 is to show the outline side view that the part of the exposure device of the 3rd embodiment from Figure 17 +X direction is omitted Figure

Figure 19 is the figure for the variation for illustrating the 3rd embodiment.

Figure 20 is the top view for the exposure device possessed baseplate carrier device for showing the 4th embodiment.

Figure 21 is to show the outline side view that the part of the exposure device of the 4th embodiment from Figure 20 +X direction is omitted Figure

Figure 22 is the figure of the composition for the exposure device that outline shows the 5th embodiment.

Figure 23 is the top view that the part for the exposure device for showing the 5th embodiment is omitted.

Figure 24 is to show the outline side view that the part of the exposure device of the 5th embodiment from Figure 22 +X direction is omitted Figure

Figure 25 is the top view that the part for the exposure device for showing the 6th embodiment is omitted.

Figure 26 be show by the XZ profiles of the exposure device of the 6th embodiment give part omission figure, and be to The figure (1) of series of actions when illustrating to carry out processing substrate with the exposure device.

Figure 27 is the figure of series of actions when illustrating to carry out processing substrate with the exposure device of the 6th embodiment (2).

Figure 28 is the figure of series of actions when illustrating to carry out processing substrate with the exposure device of the 6th embodiment (3).

Figure 29 is the figure of series of actions when illustrating to carry out processing substrate with the exposure device of the 6th embodiment (4).

Figure 30 is the figure of the composition for the exposure device that outline shows the 7th embodiment.

Figure 31 is the top view that the part for the exposure device for showing the 7th embodiment is omitted.

Figure 32 is side view (part omission, the portion for showing the exposure device of the 7th embodiment from Figure 30 +X direction Divide the figure shown with section).

Figure 33 is the output for showing the main control unit formed centered on the control system of the exposure device of the 7th embodiment Enter the block diagram of relation.

Figure 34 is illustrated with the figure of the series of actions for processing substrate of the exposure device progress of the 7th embodiment (1).

Figure 35 is illustrated with the figure of the series of actions for processing substrate of the exposure device progress of the 7th embodiment (2).

Figure 36 is illustrated with the figure of the series of actions for processing substrate of the exposure device progress of the 7th embodiment (3).

Figure 37 is illustrated with the figure of the series of actions for processing substrate of the exposure device progress of the 7th embodiment (4).

Figure 38 is illustrated with the figure of the series of actions for processing substrate of the exposure device progress of the 7th embodiment (5).

Figure 39 is illustrated with the figure of the series of actions for processing substrate of the exposure device progress of the 7th embodiment (6).

Figure 40 is illustrated with the figure of the series of actions for processing substrate of the exposure device progress of the 7th embodiment (7).

Figure 41 is illustrated with the figure of the series of actions for processing substrate of the exposure device progress of the 7th embodiment (8).

Figure 42 is illustrated with the figure of the series of actions for processing substrate of the exposure device progress of the 7th embodiment (9).

Figure 43 is illustrated with the figure of the series of actions for processing substrate of the exposure device progress of the 7th embodiment (10).

Figure 44 is illustrated with the figure of the series of actions for processing substrate of the exposure device progress of the 7th embodiment (11).

Figure 45 is illustrated with the figure of the series of actions for processing substrate of the exposure device progress of the 7th embodiment (12).

Figure 46 is illustrated with the figure of the series of actions for processing substrate of the exposure device progress of the 7th embodiment (13).

Figure 47 is illustrated with the figure of the series of actions for processing substrate of the exposure device progress of the 7th embodiment (14).

Figure 48 is illustrated with the figure of the series of actions for processing substrate of the exposure device progress of the 7th embodiment (15).

Figure 49 is illustrated with the figure of the series of actions for processing substrate of the exposure device progress of the 7th embodiment (16).

Figure 50 is the figure of the composition for the exposure device that outline shows the 8th embodiment.

Figure 51 is the top view that the part for the exposure device for showing the 8th embodiment is omitted.

Figure 52 is illustrated with the figure of the series of actions for processing substrate of the exposure device progress of the 8th embodiment (1).

Figure 53 is illustrated with the figure of the series of actions for processing substrate of the exposure device progress of the 8th embodiment (2).

Figure 54 is illustrated with the figure of the series of actions for processing substrate of the exposure device progress of the 8th embodiment (3).

Figure 55 is illustrated with the figure of the series of actions for processing substrate of the exposure device progress of the 8th embodiment (4).

Figure 56 is illustrated with the figure of the series of actions for processing substrate of the exposure device progress of the 8th embodiment (5).

Figure 57 is illustrated with the figure of the series of actions for processing substrate of the exposure device progress of the 8th embodiment (6).

Figure 58 is illustrated with the figure of the series of actions for processing substrate of the exposure device progress of the 8th embodiment (7).

Figure 59 is illustrated with the figure of the series of actions for processing substrate of the exposure device progress of the 8th embodiment (8).

Figure 60 is illustrated with the figure of the series of actions for processing substrate of the exposure device progress of the 8th embodiment (9).

Figure 61 is illustrated with the figure of the series of actions for processing substrate of the exposure device progress of the 8th embodiment (10).

Figure 62 is illustrated with the figure of the series of actions for processing substrate of the exposure device progress of the 8th embodiment (11).

Figure 63 is illustrated with the figure of the series of actions for processing substrate of the exposure device progress of the 8th embodiment (12).

Figure 64 is illustrated with the figure of the series of actions for processing substrate of the exposure device progress of the 8th embodiment (13).

Figure 65 is illustrated with the figure of the series of actions for processing substrate of the exposure device progress of the 8th embodiment (14).

Figure 66 is the figure for illustrating the variation using supporting member for substrate.

Figure 67 is the figure of the composition for the exposure device that outline shows the 9th embodiment.

Figure 68 is the top view that the part for the exposure device for showing the 9th embodiment is omitted.

Figure 69 is to show the outline side view that the part of the exposure device of the 9th embodiment from Figure 67 +X direction is omitted Figure.

Figure 70 is the figure that a part for the top view for capturing Figure 68 is amplified display.

Figure 71 is the output for showing the main control unit formed centered on the control system of the exposure device of the 9th embodiment Enter the block diagram of relation.

Figure 72 is with the exposure program explanation figure of the exposure device of the 9th embodiment progress (1).

Figure 73 is with the exposure program explanation figure of the exposure device of the 9th embodiment progress (2).

Figure 74 is with the exposure program explanation figure of the exposure device of the 9th embodiment progress (3).

Figure 75 A~Figure 75 D are Y stepwise operation of the exposure with substrate P 1 for the irradiation area SA1 for illustrating substrate P 2 The figure of parallel processing.

Figure 76 is with the exposure program explanation figure of the exposure device of the 9th embodiment progress (4).

Figure 77 is with the exposure program explanation figure of the exposure device of the 9th embodiment progress (5).

Figure 78 is with the exposure program explanation figure of the exposure device of the 9th embodiment progress (6).

Figure 79 is with the exposure program explanation figure of the exposure device of the 9th embodiment progress (7).

Figure 80 is with the exposure program explanation figure of the exposure device of the 9th embodiment progress (8).

Figure 81 is with the exposure program explanation figure of the exposure device of the 9th embodiment progress (9).

Figure 82 is with the exposure program explanation figure of the exposure device of the 9th embodiment progress (10).

Figure 83 is with the exposure program explanation figure of the exposure device of the 9th embodiment progress (11).

Figure 84 is with the exposure program explanation figure of the exposure device of the 9th embodiment progress (12).

Figure 85 is with the exposure program explanation figure of the exposure device of the 9th embodiment progress (13).

Figure 86 is with the exposure program explanation figure of the exposure device of the 9th embodiment progress (14).

Figure 87 is with the exposure program explanation figure of the exposure device of the 9th embodiment progress (15).

Figure 88 is with the exposure program explanation figure of the exposure device of the 9th embodiment progress (16).

Figure 89 is with the exposure program explanation figure of the exposure device of the 9th embodiment progress (17).

Figure 90 is with the exposure program explanation figure of the exposure device of the 9th embodiment progress (18).

Figure 91 is with the exposure program explanation figure of the exposure device of the 9th embodiment progress (19).

Figure 92 is with the exposure program explanation figure of the exposure device of the 9th embodiment progress (20).

Figure 93 is with the exposure program explanation figure of the exposure device of the 9th embodiment progress (21).

Figure 94 is with the exposure program explanation figure of the exposure device of the 9th embodiment progress (22).

Figure 95 is with the exposure program explanation figure of the exposure device of the 9th embodiment progress (23).

Figure 96 is with the exposure program explanation figure of the exposure device of the 9th embodiment progress (24).

Figure 97 is with the exposure program explanation figure of the exposure device of the 9th embodiment progress (25).

Figure 98 is with the exposure program explanation figure of the exposure device of the 9th embodiment progress (26).

Figure 99 is with the exposure program explanation figure of the exposure device of the 9th embodiment progress (27).

Figure 100 is with the exposure program explanation figure of the exposure device of the variation of the 9th embodiment progress (1).

Figure 101 is with the exposure program explanation figure of the exposure device of the variation of the 9th embodiment progress (2).

Figure 102 is with the exposure program explanation figure of the exposure device of the variation of the 9th embodiment progress (3).

Figure 103 is with the exposure program explanation figure of the exposure device of the variation of the 9th embodiment progress (4).

Figure 104 is with the exposure program explanation figure of the exposure device of the variation of the 9th embodiment progress (5).

Figure 105 is with the exposure program explanation figure of the exposure device of the variation of the 9th embodiment progress (6).

Figure 106 is with the exposure program explanation figure of the exposure device of the variation of the 9th embodiment progress (7).

Figure 107 is with the exposure program explanation figure of the exposure device of the variation of the 9th embodiment progress (8).

Figure 108 is with the exposure program explanation figure of the exposure device of the variation of the 9th embodiment progress (9).

Figure 109 is with the exposure program explanation figure of the exposure device of the variation of the 9th embodiment progress (10).

Figure 110 is with the exposure program explanation figure of the exposure device of the variation of the 9th embodiment progress (11).

Figure 111 is with the exposure program explanation figure of the exposure device of the variation of the 9th embodiment progress (12).

Figure 112 is with the exposure program explanation figure of the exposure device of the variation of the 9th embodiment progress (13).

Figure 113 is with the exposure program explanation figure of the exposure device of the variation of the 9th embodiment progress (14).

Figure 114 is with the exposure program explanation figure of the exposure device of the variation of the 9th embodiment progress (15).

Figure 115 is the top view that the part of the exposure device of the 10th embodiment is omitted.

Figure 116 is to show the outline that the part of the exposure device of the 10th embodiment from Figure 115 +X direction is omitted Side view.

Figure 117 is the figure of the effect for the exposure device for illustrating the 10th embodiment.

Figure 118 is the summary side elevation of the exposure device for the variation for showing the 10th embodiment.

Figure 119 is the top view that the part of the exposure device for the variation for showing the 10th embodiment is omitted.

Figure 120 is the figure of the composition for the exposure device that outline shows the 11st embodiment.

Reference

14 mask interferometer systems

16 lens barrel platforms

18 baseplate carrier pallets

20 side frames

24th, 24 ' coarse motion microscope carrier

26 fine motion microscope carriers

28 weight offset device

30A, 30B, 30A ', 30B ' X beams

32A, 32B coarse motion platform

33 supporting members

34 foots

35 supporting members

36 x-ray guiding elements

38A, 38B X stators

40A, 40B X can movers

42A, 42B x-ray motor

44 saddles

46A, 46B x-ray encoder system

48A, 48B gap sensor

50 main control units

51st, 51A, 51B keep tool suction and discharge switching device

52 fine motion microscope carrier drivetrains

54X X voice coil motors

54Y Y voice coil motors

54Z Z voice coil motors

56th, 59,60 stator

58th, 57,62 can mover

61x X frame components

61y Y frame components

64 baskets

65 holding units

66 air springs

68 Z saddles

69 supporting member for substrate

70 base wads

71 wrists

72 target plates

74 reflection type optical sensors

76 Z inclination measurements systems

78 levelling devices

78a fixed parts

78b movable parts

80 link device

82 X guides

84th, 84A~84J air flotation cells

84H ', 84I ' air flotation cells

85 gas supply devices

88 substrate Y stepping conveyers

88a movable parts

88b fixed parts

89 supporting members

90 drive devices

91 substrate X stepping conveyers

91a movable parts

91b fixed parts

92 position reading out device

94X₁、94X₂X moving lens

94Y Y moving lens

95 drive devices

96 speculum holding members

96A brackets

98 laser interferometer systems

98X X laser interferometer

98X₁、98X₂X interferometers

98Y Y laser interferometer

98Y₁、98Y₂Y interferometers

100th, 200,500,700,800,900,1000,1100 exposure device

102nd, 102A, 102B interferometer post

104th, 104 ' supporting member

110th, 110A, 100B, 110A ', 110B ' frameworks

112 supporting members

120 moving substrate Y stepping conveyers

The holding area of ADA1, ADA2 substrate holding

BD bodies

IA exposure areas

IL illumination lights

IOP illuminations system

F ground

M masks

MST mask microscope carriers

P, P1, P2, P3, P4 substrate

PH substrate holdings

PL projection optics system

PM alignment marks

PST baseplate carrier devices

PSTa~PSTi baseplate carrier devices

SA1~SA6 irradiation areas

Embodiment

《1st embodiment》

Hereinafter, the 1st embodiment is illustrated according to Fig. 1~Figure 13.

Fig. 1 is the figure of the composition for the exposure device 100 that outline shows the 1st embodiment, and Fig. 2 shows omission exposure device The top view of 100 part.Fig. 2 is equivalent to the part below the projection optics system PL compared with Fig. 1 (below more aftermentioned lens barrel platform Part) top view.Exposure device 100 is to be used for the system such as flat-panel monitor, liquid crystal display device (liquid crystal panel) Make.Exposure device 100 be for the display panel of liquid crystal display device etc. rectangle (square) glass substrate P (hereinafter referred to as For substrate P) be exposure object thing projection aligner.

Exposure device 100, possess illumination and be IOP, the mask microscope carrier MST for keeping mask M, projection optics system PL, be equipped with Mask microscope carrier MST and projection optics system PL etc. body BD (part is only shown in Fig. 1 etc.), include the fine motion for keeping substrate P The baseplate carrier device PST of microscope carrier 26 (Substrate table) and such control system etc..Hereinafter, it is mask M and substrate P phase when setting exposure Direction to projection optics system PL difference relative scannings is X-direction (X-direction), direction orthogonal with this in the horizontal plane is Y Direction of principal axis (Y-direction), the direction orthogonal with X-axis and Y-axis are Z-direction (Z-direction), around the rotation (inclination) of X-axis, Y-axis and Z axis Direction is then set to θ x, θ y and θ z directions to illustrate.

Illumination is IOP, and it with the illumination disclosed in such as 6,552, No. 775 specifications of U.S. Patent No. etc. is identical structure to be Into.That is, illumination is that IOP is to make the light from light source (not shown) (such as mercury vapor lamp) injection respectively via reflection (not shown) Mirror, spectroscope, optical gate (shutter), wavelength selective filters, various lens etc. and be used as exposure illumination light (illumination light) IL It is irradiated in mask M.Illumination light IL, using such as i lines (wavelength 365nm), g lines (wavelength 436nm), h lines (wavelength 405nm) Light (or synthesis light of above-mentioned i lines, g lines, h lines).In addition, illumination light IL wavelength can be by wavelength selective filters according to for example Required resolution is suitable to be switched.

In mask microscope carrier MST, its pattern plane is fixed with a manner of such as vacuum suction (or Electrostatic Absorption) (below Fig. 1) Mask M formed with circuit pattern etc..Mask microscope carrier MST, for example, by be fixed on the air bearing (not shown) of its bottom surface with Contactless state is supported on the mask platform (not shown) for the part for forming body BD.Mask microscope carrier MST is for example, by bag Mask microscope carrier drivetrain 12 (not shown in Fig. 1, reference picture 4) containing linear electric machine, scanning direction is driven in predetermined stroke (X-direction) and respectively it is appropriate by micro-move device in Y direction and θ z directions.Mask microscope carrier MST believes in the position in X/Y plane Breath (rotation information in the directions of z containing θ) is surveyed with mask laser interferometer system 14 (following, to claim " mask interferometer system ") Amount, this mask laser interferometer system 14 includes irradiates distance measuring light beam to the reflecting surface located at (or being formed at) mask microscope carrier MST Multiple laser interferometer.

Lower sections of the projection optics system PL in mask microscope carrier MST Fig. 1, the lens barrel for being supported in a body BD part are put down Platform 16.Projection optics system PL has identical with the projection optics system disclosed in such as No. 6,552,775 specifications of U.S. Patent No. Composition.That is, the view field of pattern images of the projection optics system PL comprising mask M is configured to for example jagged multiple projections Optical system (poly-lens projection optics system), its function is with having using Y direction as the single oblong-shaped image field of long side direction Projection optics system is equal.In this embodiment, each system of multiple projection optics systems, which is used with the equimultiple of such as both sides telecentricity, is Form upright erect image person.Also, the saw-toothed multiple view fields of projection optics system PL configuration are referred to as exposure region below Domain IA.

Therefore, when the illumination region on mask M is IOP illumination light IL illuminations from illumination, i.e., by by covering Film M illumination light IL, by projection optics system PL, by the projection image of the circuit pattern of the mask M in the illumination region, (part is just Standing statue) be formed at configuration scribbled on projection optics system PL image planes side, surface in the substrate P of photoresist (sensing agent) with above-mentioned photograph The illumination light IL of area pellucida domain conjugation irradiation area (exposure area) IA.And by mask microscope carrier MST with keeping the aftermentioned of substrate P Substrate holding PH (fine motion microscope carrier 26) synchronous driving, makes mask M be displaced into scanning side with respect to illumination region (illumination light IL) Substrate P is displaced into scanning direction (X-direction) to (X-direction) and relative exposure region (illumination light IL), carry out in substrate P The scan exposure of 1 irradiation (shot) region (zoning region), in the pattern of irradiation (shot) the region transfer mask M.That is, Exposure device 100 is IOP and projection optics system PL in the pattern that mask M is generated in substrate P by illumination, by using illumination light Being exposed in substrate P for inductive layer (photoresist layer) forms the pattern in IL substrate P.

Body BD, Fig. 3 such as Fig. 2 and by the part omission of the summary side elevation of exposure device 100 from +X direction It is shown, possess：It is parallel to each other and configured as long side direction using Y direction by being separated by both set a distances in X-direction on the F of ground A pair of (2) baseplate carrier pallets (hreinafter referred to as pallet) 18 that cuboid component is formed, in passing through one on a pair of pallets 18 Horizontal lens barrel platform 16 and mask platform (not shown) are supported to side frame 20.Also, pallet 18 is not limited to 2, can To be 1, can also be more than 3.

Each pallet 18 is to be arranged on by multiple antihunting devices 22 on the F of ground (reference picture 1 and Fig. 3).A pair of side frames 20, such as Shown in Fig. 2 and Fig. 3, the lower end of each side frame 20 is connected to Y direction one end and the other end above a pair of pallets 18 Portion.Lens barrel platform 16 is made up of the rectangular-shape component using Y direction as long side direction with X/Y plane configured in parallel, at a pair The both ends of Y direction are supported from below by a pair of side frames 20 on pallet 18.

Baseplate carrier device PST, as shown in figure 1, with coarse motion microscope carrier portion 24, fine motion microscope carrier 26 and weight payment device 28 Deng.Weight offsets device 28, as shown in Figures 1 and 3, configures the X/Y plane with X guide 82 on a pair of pallets 18 are configured at and puts down On above row.

Coarse motion microscope carrier portion 24, as shown in figure 3, with 2 (a pair) X beams 30A, 30B, 2 (a pair) coarse motion platform 32A, 32B and each multiple foots 34 supported respectively on the F of ground by 2 X beams 30A, 30B.

X beams 30A, 30B it is each by extending X-direction, YZ sections be rectangular box-like and internal hollow with flank Component is formed, in Y direction with predetermined distance configuration parallel to each other (1~Fig. 3 of reference picture).X beams 30A, 30B's is each, such as For shown in X beams 30A in Fig. 1, at long side direction (X-direction) both ends nearby with central portion 3 at, pass through 3 foots 34 In on the F of ground, opposed pair pallet 18 is supported with non-contact from below.In this way, coarse motion microscope carrier portion 24 is opposed pair frame Platform 18 separates in vibration.Also, the configuration of foot 34 and quantity can arbitrarily be set.In addition, X beams 30A, 30B be not limited to it is hollow Component can be middle real component, can also be YZ sections be I types rod member.

Above X beams 30A, 30B are each, in Y direction with predetermined distance it is parallel to each other be fixed with multiple (such as 2 (a pair)) extend the x-ray guiding element 36 of X-direction.Also, above X beams 30A, 30B are each, a pair of x-ray guiding elements Region between 36, it is fixed with X stators 38A, the 38B for extending X-direction.X stators 38A, 38B's is each, have comprising Such as the magnet unit of the multiple permanet magnets arranged in X-direction with predetermined distance.In this embodiment, such as Fig. 2 and Fig. 3 institutes Show, X beams 30A, 30B section shape, though width of the X beams 30A of+Y sides compared with the X beams 30B of-Y sides be big that is, the length of Y direction Degree is longer, but can also be same shape.

Coarse motion platform 32A, 32B, as shown in figure 3, configuration respectively is in X beams 30A, 30B each top.Positioned at-Y sides Coarse motion platform 32B is made up of the tabular component of vertical view rectangle, and the coarse motion platform 32A positioned at+Y sides then has recess by-Y side ends The tabular component for overlooking U-shaped is formed.In Fig. 3, coarse motion platform 32A and aftermentioned weight payment device 28 are all parts with profile Display.Below coarse motion platform 32A, 32B are each, fixed as shown in figure 3, being fixed with and being fixed on each X of X beams 30A, 30B Sub- 38A, 38B across given clearance (gap, clearance) to X can mover 40A, 40B.X can mover 40A, 40B it is each It is individual, such as comprising coil unit (not shown), respectively constituted coarse motion platform 32A, 32B together with X stators 38A, 38B with set Stroke drives x-ray motor 42A, 42B in X-direction.

Also, below coarse motion platform 32A, 32B are each, as shown in figure 3, be fixed with comprising rolling element (not shown) (for example, Multiple balls etc.), multiple saddles 44 for slidably engaging to each x-ray guiding element 36.Saddle 44, to each x-ray guiding element 36 are provided with such as 4 (reference pictures 1) in X-direction with predetermined distance, below coarse motion platform 32A, 32B are each, are fixed with example Such as add up to 8 saddles 44.Coarse motion platform 32A, 32B's is each, is led by multiple x-rays comprising x-ray guiding element 36 and saddle 44 Part device, it is straight to be guided in X-direction.

In addition, each in X beams 30A, 30B is fixed with using X-direction as cycle direction in Fig. 1~Fig. 3 although not shown X scales (scale), in each of coarse motion platform 32A, 32B, then be fixed with composition using X scales with obtain coarse motion platform 32A, 32B in X-ray encoder system 46A, 46B (reference picture 4) of the positional information of X-direction encoder head.

Coarse motion platform 32A, 32B is with main control unit 50 according to the output of above-mentioned encoder head in the position of X-direction (reference picture 4) is controlled by.Although also, it is same in Fig. 1 into Fig. 3 it is not shown, in each of coarse motion platform 32A, 32B, peace Equipped with measuring fine motion microscope carrier 26 to coarse motion platform 32A, 32B in the rate of travel of X-axis and Y direction (relative shift) Gap sensor 48A, 48B (reference picture 4) etc..Main control unit 50, in the relative movement measured with gap sensor 48A, 48B When amount reaches both situations of limit value, stop fine motion microscope carrier 26 and coarse motion platform 32A, 32B immediately.Certainly, it also may replace gap Sensor 48A, 48B or the machine along with the removable momentum for mechanically limiting relative coarse motion platform 32A, the 32B of fine motion microscope carrier 26 Tool brake component.

Herein, though declaration order is slightly inverted, fine motion microscope carrier 26 is then illustrated.Fine motion microscope carrier 26, can by Fig. 1 and Fig. 3 Know, it is made up of tabular (or box-shaped) component of vertical view rectangle, face mounted board keeps tool PH thereon.Substrate holding PH, The length of its X-direction and substrate P are equal, and the width (length) of Y direction is then about 1/2 (reference picture 2) of substrate P.Substrate Tool PH is kept, by a part (herein, being the part of Y direction about 1/2 of substrate P) for substrate P with such as vacuum suction (or electrostatic Absorption) mode adsorbed holding, and can spray upwards gas-pressurized (such as pressure-air) with the ejection pressure from below with Non-contact (suspension) mode supporting substrates P part (about the 1/2 of substrate P).Pressure-airs of the substrate holding PH to substrate P Ejection and vacuum suction switching, be by by substrate holding PH switching be connected to vavuum pump and pressure-air (not shown) The holding tool suction and discharge switching device 51 (reference picture 4) in source, is carried out with main control unit 50.

Fine motion microscope carrier 26 can be by (the reference picture of fine motion microscope carrier drivetrain 52 comprising multiple voice coil motors (or linear electric machine) 4), on coarse motion platform 32A micro-move device in 6DOF direction (X-axis, Y-axis, Z axis, θ x, θ y and θ z all directions).

In detail, as shown in figure 1, above coarse motion platform 32A+X side ends, stator is provided with by supporting member 33 56, with this to, in+X sides the side of fine motion microscope carrier 26 be fixed with together with stator 56 form X voice coil motors 54X can Mover 58.Herein, in fact, being that the X voice coil motors 54X of identical composition is separated by into both set a distances in Y direction to set a pair.

Also, as shown in figure 3, set on coarse motion platform 32A in the substantial middle position of Y direction by supporting member 35 Have stator 60, with this to, in+Y sides the side of fine motion microscope carrier 26, be fixed with together with stator 60 and form Y voice coil loudspeaker voice coils electricity Machine 54Y's can mover 62.Herein, in fact, being that the Y voice coil motors 54Y of identical composition is separated by into both set a distances in X-direction to set Put a pair.

Fine motion microscope carrier 26, it is by main control unit 50, is supported in aftermentioned weight using a pair of X voice coil motors 54X and supports Pin assembly 28 and it is synchronous with coarse motion platform 32A driving (being driven with coarse motion platform 32A in equidirectional with same speed), according to this with coarse motion platform 32A is displaced into X-direction with predetermined stroke together, is driven using a pair of Y voice coil motors 54Y, with respect to coarse motion platform 32A with Micro-stroke is displaced into Y direction.

Also, fine motion microscope carrier 26, is each or a pair of the Y voice coil loudspeaker voice coils electricity for making a pair of X voice coil motors 54X by control device 50 The driving force of machine 54Y each generation opposite direction each other, θ z directions are displaced into respect to coarse motion platform 32A.

In this embodiment, pass through the X sounds of each pair of above-mentioned x-ray motor 42A, 42B and fine motion microscope carrier drivetrain 52 Motor 54X and Y voice coil motor 54Y is enclosed, can make the relative projection optics system PL (reference picture 1) of fine motion microscope carrier 26 in X-direction with length Stroke moves (coarse motion), and in the 3DOF direction pettiness movement (fine motion) of X-axis, Y-axis and θ z directions.

Also, fine motion microscope carrier drivetrain 52, as shown in figure 1, with to by the micro-move device of fine motion microscope carrier 26 in remaining 3DOF Multiple, such as 4 Z voice coil motors 54Z in direction (all directions of θ x, θ y and Z axis).Multiple Z voice coil motors 54Z's is each by solid The stator 59 that is scheduled on above coarse motion platform 32A, be fixed on below fine motion microscope carrier 26 can mover 57 form, fit over corresponding fine motion Four corner portions below microscope carrier 26 (in Fig. 1, only show 2 in 4 Z voice coil motors 54Z, other 2 are then omitted diagram. In addition, only showing 1 in 4 Z voice coil motors 54Z in Fig. 3, other 3 are then omitted diagram).Above-mentioned each voice coil motor 54X, 54Y, 54Z stator are all installed in coarse motion platform 32A.Each voice coil motor 54X, 54Y, 54Z can be dynamic magnetic or moving-coil type It is any.Also, on to measure the position measurement system of the position of fine motion microscope carrier 26, being chatted after remaining.

In each top of coarse motion platform 32A, 32B, as shown in Figures 2 and 3, it is configured with the bearing-surface for overlooking rectangle 4 air flotation cells 84 of (above), are fixed on above coarse motion platform 32A, 32B by supporting member 86 respectively.

The bearing-surface (above) of each air flotation cell 84, it is the disc type of porous plastid or multiple micro holes with machinery (thrust type) air bearing constructs.Each air flotation cell 84 passes through the pressurization gas from gas supply device 85 (reference picture 4) The supply of body (such as pressure-air), and can be by a part of suspension bearing of substrate P.To the pressure-air of each air flotation cell 84 The on/off of supply, controlled with the main control unit 50 shown in Fig. 4.Herein, in Fig. 4, only shown to seek the convenience of drawing Pure gas feeding mechanism 85, but not limited to this, can be used supply pressure-air other to each air flotation cell 84 with gas Floating unit 84 is supplied with the gas supply device counted, or using the gas of more than 2 for being connected to multiple air flotation cells 84 Device.It is representational only to show single gas supply device 85 in Fig. 4.No matter whichever, be all to be distinguished by main control unit 50 Supply of the control gas supply device 85 to the pressure-air of each air flotation cell 84 on/off.

It is installed on the Y direction that each each 4 air flotation cells 84 of coarse motion platform 32A, 32B are disposed on substrate holding PH Both sides.It is set to above each air flotation cell 84 and same height or lower slightly above substrate holding PH.

As shown in Fig. 2 configuring in substrate holding PH Y direction side and each 4 air flotation cells 84 of opposite side, it is Overlook in the rectangular area of area (that is, about 1/2 of substrate P) roughly the same with substrate holding PH, in X-direction apart Predetermined distance and it is separated by gap slightly in Y direction and is configured in a manner of the row of 2 row 2.This occasion, above-mentioned each 4 air flotation cells 84 Suspension bearing can be subject to by about the 1/2 of substrate P.

As shown in the above description, in this embodiment, can by substrate holding PH with and substrate holding PH both sides Substrate P entirety is subject to suspension bearing by (± Y sides) adjacent each 2 air flotation cells 84.In addition, it can also pass through substrate holding PH Substrate P entirety is subject to suspension bearing with 4 air flotation cells 84 of substrate holding PH one side (+Y sides or-Y sides).

Aforesaid substrate keeps each 4 air flotation cells 84 of tool PH both sides (± Y sides), replaceable for vertical view and substrate holding 1 large-scale air flotation cell of the roughly the same areas of PH, each 2 air flotation cells 84 for being arranged in Y direction can also be put respectively It is changed to 1 air flotation cell of roughly the same area.But, to ensure the appropriate with being empty of aftermentioned substrate Y stepping conveyers Between, the air flotation cells of substrate holding PH+Y sides is identical in Y direction length with substrate holding PH and have X-axis with entirety The direction length rectangle bearing-surface slightly short compared with substrate holding PH, to being less than, X-direction is preferable by 2 dividers.

Substrate Y steppings conveyer 88 is the device for keeping substrate P to make it toward Y direction movement, is configured in substrate Keep in the tool PH air flotation cell 84 of+Y sides 4, between each 2 air flotation cells 84 of+X sides and-X sides.Substrate Y steppings Conveyer 88 is fixed on coarse motion platform 32A (reference picture 3) by supporting member 89.

Substrate Y steppings conveyer 88, as shown in figure 3, the back side for possessing sorbing substrate P moved toward Y direction it is movable The portion 88a and fixed part 88b for being fixed on coarse motion platform 32A.Movable part 88a, e.g. by can mover by be located at movable part 88a The drive device 90 (not shown, reference picture 4 in Fig. 3) that the linear electric machine that stator with being located at fixed part 88b is formed is formed, Y direction is driven in respect to coarse motion platform 32A.In substrate Y steppings conveyer 88, provided with the position for measuring movable part 88a The position reading out device 92 (not shown in Fig. 3, reference picture 4) of encoder etc..Also, drive device 90 is not limited to linear electric machine, Also can be made up of the drive mechanism using the electric rotating machine using ball screw or belt as driving source.

The movable part 88a of substrate Y steppings conveyer 88 Y direction shift motion is the Y direction length of substrate P About 1/2, the back side of adsorbable substrate P makes the universe in the exposure object region of substrate P be located on substrate holding PH.Therefore, exist When the stepping of the Y direction of substrate P is transported each time, the exposure area IA with respect to projection optics system PL will be held in substrate holding Tool PH substrate P is scanned in X-direction, as a result, can expose the universe in the exposure object region of substrate P.

Also, the movable part 88a (substrate adsorption face) of substrate Y steppings conveyer 88 due to need sorbing substrate P the back side, Or desorb and separated from substrate P, therefore also can be by the micro-move device of drive device 90 in Z-direction.

Also, in this embodiment, though substrate Y steppings conveyer 88 is mounted in coarse motion platform 32A, not limited to this, also It is mountable to fine motion microscope carrier 26.In addition, in described above, due to the movable part 88a of substrate Y steppings conveyer 88 need to carry out with The separation of substrate P, contact, therefore be set to and can also move in Z-direction, but not limited to this, for progress movable part 88a (substrates Adsorption plane) absorption to substrate P and the separation with substrate P, can also it fine motion microscope carrier 26 is displaced into Z-direction.

Weight offsets device 28, as shown in Figures 1 and 3, is made up of the cylindrical component for extending Z-direction, also known as the heart Post.Weight offsets device 28 and supports fine motion microscope carrier 26 from below by the aftermentioned device for being referred to as levelling device.Weight offsets device 28 configurations are in coarse motion platform 32A recess, and its first half is exposed to top compared with coarse motion platform 32A (and 32B), and its lower half is compared with coarse motion Platform 32A (and 32B) is exposed to lower section.

Weight offsets device 28, as shown in figure 3, with basket 64, air spring 66 and Z saddles 68 etc..Basket 64 is by+Z The bottomed tube component of side opening is formed.Below basket 64, bearing surface is installed towards multiple air bearing of-Z sides (following, to claim base wad (base pad)) 70.Air spring 66 is housed in the inside of basket 64.In air spring 66, from outside Supply pressurized gas (such as pressure-air).Z saddles 68 are by extending Z-direction, the cylindrical element of such as low clearance is formed, Insert in basket 64, be loaded on air spring 66.In Z saddles 68, provided with limiting the motion in direction beyond Z-direction Guiding element (not shown).As this guiding element, used such as air bearing or parallel flat spring.Parallel flat spring is by for example Spring steel plate of the thinner thickness parallel with X/Y plane etc. is formed, such as is formed using 6 flat springs.By 3 in 6 flat springs Piece flat spring around the upper end of Z saddles 68 3 at be configured to it is radial, by remaining 3 flat spring in the bottom of Z saddles 68 week 3 enclosed are sentenced with above-mentioned 3 flat springs in the overlapping mode of above-below direction, are configured to radial.And by one end of each flat spring Portion is arranged on the outer peripheral face of Z saddles 68, and the other end is installed on into basket 64.By the use of parallel flat spring, with flat spring Deflection determine stroke, therefore Z saddles 68 can be made it is shorter in Z-direction that is, as the construction into low clearance.But, Z Saddle 68 is formed as the occasion of guiding element without the image of Buddha with air bearing, corresponding longer stroke.In the top of Z saddles 68 (+Z sides Portion), (not shown) air bearing (following, claim sealing gasket seaking pad) of the bearing surface towards+Z sides is installed).Also, in basket Around body 64, as shown in Figures 1 and 3, it is fixed with and is configured to radial multiple wrists 71.It is provided with above the leading section of each wrist 71 Target plate 72, this target plate 72 are for multiple reflection type optical sensors (also known as level sensor) below fine motion microscope carrier 26 74 it is each.Reflection type optical sensor 74, in fact, more than being arranged at out-of-line 3.It is multiple anti-by these Emitting OPTICAL SENSORS 74, form the Z-direction position of measurement fine motion microscope carrier 26 and the Z of tilt quantity (rotation amount in θ x and θ y directions) Inclination measurement system 76 (reference picture 4).Also, to avoid the intricate of drawing in Fig. 3, reflection type optical sensor 74 only shows 1.

Levelling device 78 be by fine motion microscope carrier 26 tilt freely (with respect to X/Y plane in θ x and θ y directions swing freely) plus With the device of supporting.Levelling device 78 is that have fixed part 78a (display illustrated in Fig. 3 with cuboid component) and movable part 78b (display illustrated in Fig. 3 with bulbous member) spherical bearing or plan can be on one side like spherical bearing tectosome, fixed part 78a Movable part 78b is supported from below, while making movable part 78b be tilted with the axle (such as X-axis and Y-axis) in horizontal plane with micro travel. This occasion, the inclined recess in the θ x directions and θ y directions of allowing movable part 78b can be being formed for example above fixed part 78a.

(the sphere first half) is fixed on fine motion microscope carrier 26 above movable part 78b, fine motion microscope carrier 26 is relatively fixed portion 78a fascinates.Horizontal plane is made to below fixed part 78a, the guiding as the above-mentioned sealing gasket of weight payment device 28 Face, there is the bigger area of the bearing surface all compared with sealing gasket.In addition, fixed part 78a is installed in the Z of weight payment device 28 The non-contact supporting from below of the sealing gasket of saddle 68.

Weight offsets device 28, by the power of gravity direction upward caused by air spring 66, passes through Z saddles 68 and leveling Device 78 offsets the weight (gravity direction power directed downwardly) for being that (cancel) includes fine motion microscope carrier 26, mitigates according to this above-mentioned more Individual Z voice coil motors 54Z load.

Weight offsets device 28 and is connected to coarse motion platform 32A (reference picture 1) by a pair of link devices 80.A pair of link devices 80 Z location and weight payment device 28 are substantially uniform in the position of centre of gravity of Z-direction.Each link device 80 includes and X/Y plane Steel plate of parallel minimal thickness etc., also known as bend (flexure) device.Each being configured to and weight of a pair of link devices 80 + X the sides of payment device 28 stand facing each other each other with-X sides.It is each link device 80 configure basket 64 in weight payment device 28 with it is thick It is configured to parallel with X-axis between dynamic platform 32A, both is linked.Therefore, weight payment device 28 links device 80 by a pair Any one is drawn by coarse motion platform 32A, and is moved with the past X-direction of coarse motion platform 32A one.In addition, tune is passed through with non-contact side The top that leveling device 78 is supported in weight payment device 28 forms part (fine motion microscope carrier 26 and substrate holding PH etc.), passes through A pair of X voice coil motors 54X driving and with coarse motion platform 32A one past X-direction movement.Now, device 28 is offseted in weight, Due to tractive force can be acted in the parallel plane of the X/Y plane comprising the position of centre of gravity with the Z-direction, thus do not have around The effect of the torque (pitching moment) of the axle (Y-axis) orthogonal with moving direction (X-axis).

As described above, in this embodiment, coarse motion platform 32A, 32B, weight payment device 28, fine motion microscope carrier 26 and base are included (below, suitably the compositions such as plate holding tool PH are displaced into the moving body of X-direction with substrate P one (part for keeping substrate P) Title baseplate carrier (26,28,32A, 32B, PH)).

Also, on including levelling device 78, link device 80, the detailed structure of the weight payment device 28 of this embodiment Into, have revealed that in such as No. 2010/0018950 specification of U.S. Patent Application Publication No. (but, in this embodiment, due to Weight payment device 28 does not move toward Y direction, therefore without the link device of Y direction).In addition, although not shown, but to keep away Exempt from weight payment device 28 individually to move toward Y direction, also a limitation can be set by link device of Y direction etc..

X guide 82, as shown in Figures 1 and 2, there is the rectangular shape using X-direction as long side direction.X guide 82 is Above above-mentioned a pair of pallets 18 (+Z sides), configured in a manner of crossing a pair of pallets 18 and fixed.The long side of X guide 82 Direction (X-direction) is dimensioned so as to compared with a pair of the pallets 18 configured in X-direction with predetermined distance respectively in the chi of X-direction X-direction size and slightly longer (substantially equal) in the very little gap between a pair of pallets 18.

(face of+Z sides) is parallel with X/Y plane and to be made to flatness very high above X guide 82.In X guide 82 On, as shown in Figures 1 and 3, carrying weight payment device 28, supporting (being supported with contactless state) is suspended by base wad 70.X Be adjusted to above guiding element 82 it is almost parallel with horizontal plane (X/Y plane), its function be as weight payment device 28 move when Guide surface.The long side direction of X guide 82 is sized to the X-axis side compared with weight payment device 28 (that is, coarse motion platform 32A) It is slightly longer to removable momentum.Width size (Y direction size) above X guide 82 is configured to can be with multiple base wads 70 All bearing surfaces to size (reference picture 3).Though the material and manufacture method of X guide 82 are not particularly limited, for example, have with Cast iron etc. casts the situation formed, the situation formed with stone material (such as gabbro), with ceramics or CFRP (Carbon Fiver Reinforced Plastics) situation of formation such as material etc..Also, X guide 82 is with middle real component or internal with flank Empty component, the component for being shaped as cuboid are formed.Also, X guide 82 is not limited to cuboid component, can also be that YZ sections are I types Rod member.

In substrate holding PH-X sides side, as shown in Figures 1 and 2, consolidated by speculum holding member (not shown) Surely there are a pair of X moving lens 94X being made up of the plane mirror (or corner cube) with reflecting surface orthogonal to X-axis₁、94X₂。 Herein, a pair of X moving lens 94X₁、94X₂Also fine motion microscope carrier 26 can be fixed on by bearing.

In-Y sides the side of fine motion microscope carrier 26, as shown in figure 3, being fixed with by speculum holding member 96 by having and Y The Y moving lens 94Y that the strip plane mirror of the orthogonal reflecting surface of axle is formed.The XY of fine motion microscope carrier 26 (substrate holding PH) Positional information in plane, to use a pair of X moving lens 94X₁、94X₂And Y moving lens 94Y laser interferometer system is (below, Claim baseplate carrier interferometer system) 98 (reference pictures 4), are detected at any time with the capacity of decomposition of such as 0.5~1nm degree.Also, In fact, baseplate carrier interferometer system 98, as shown in Figures 2 and 4, possesses corresponding a pair of X moving lens 94X₁、94X₂X laser (hreinafter referred to as Y interferes interferometer (hreinafter referred to as X interferometers) 98X and corresponding Y moving lens 94Y Y laser interferometer Instrument) 98Y.X interferometer 98X and Y interferometers 98Y measurement result is provided to main control unit 50 (reference picture 4).

X interferometer 98X, as shown in figure 1, be with a pair of X moving lens 94X₁、94X₂To height installation it is solid at one end It is scheduled on the upper end of the L font interferometers post 102 of X guide 82 (or pallet 18 of-X sides).As X interferometer 98X, usable pair A pair of X moving lens 94X₁、94X₂It is each respectively irradiate interferometer beam (measuring beam) a pair of interferometers, also can be used penetrate Go out to be irradiated in a pair of X moving lens 94X₁、94X₂The multi-axis interferometer of each 2 measuring beams (surveying long light beam).Hereinafter, it is to set It is fixed that X interferometers 98X is formed with multi-axis interferometer.

Y interferometer 98Y, as shown in figure 3, configuration between 2 coarse motion platforms 32A, 32B, with Y moving lens 94Y to Mode is fixed on lower end and is fixed on above the supporting member 104 of pallet 18.As Y interferometer 98Y, can be used to Y moving lens 94Y A pair of interferometers of interferometer beam (measuring beam) are irradiated respectively, also can be used and 2 measuring beams are irradiated to Y moving lens 94Y Multi-axis interferometer.Hereinafter, it is that setting is formed Y interferometers 98Y with multi-axis interferometer.

This occasion, (it is with this face and projection during in exposure because Y interferometers 98Y is located at compared with substrate P surface in Z-direction The consistent mode of optical system PL image planes, carry out focusing, the leveling control of substrate P) low position, therefore the measurement knot of Y location Abbe error caused by the postural change (rolling) of the fine motion microscope carrier 26 when X-direction moves can be included in fruit.This occasion, Although not shown, but Y interferometer 98Y are used as, also can be used to Y moving lens 94Y irradiations except 2 measurements separated in X-direction Outside light beam, 3 interferometer beams of at least 1 measuring beam that this relative 2 measuring beams separate in Z-direction are also included The multi-axis interferometer of (measuring beam).Main control unit 50 can detect the rolling of fine motion microscope carrier 26 by the multi-axis interferometer (rolling) measure, according to the testing result, carry out in the Y location measurement result measured with Y interferometers 98Y contained above-mentioned Ah The amendment of shellfish error.

Also, fine motion microscope carrier 26 is in the positional information of θ x, θ y and Z-direction, it is (fixed by above-mentioned Z inclination measurements system 76 Reflection type optical sensor 74 more than at out-of-line 3 below fine motion microscope carrier 26), use the above-mentioned front end of wrist 71 Target plate 72 is obtained.Composition comprising Z inclination measurements system 76, the position measurement system of above-mentioned fine motion microscope carrier 26, have revealed that in Such as No. 2010/0018950 specification of U.S. Patent Application Publication No..Therefore, as Y interferometers 98Y micro- using not detecting Occasion of interferometer of pattern of rolling amount of dynamic load platform 26 etc., main control unit 50 can be obtained according to Z inclination measurements system 76 Fine motion microscope carrier 26 in the positional information (rolling amount) in θ y directions, carry out the Y location measurement result measured with Y interferometers 98Y In contained above-mentioned Abbe error amendment.

In addition, single fine motion microscope carrier 26 can not also be measured in the positional information of θ x, θ y and Z-direction, and by solid It is scheduled on and can be considered that (a body BD part, such as lens barrel are put down with the component of the top of fine motion microscope carrier 26 of projection optics system PL one Platform 16) oblique incidence mode (not shown) multiple spot focal position detection system (focus sensor), from top direct measurement substrate P In the positional information of θ x, θ y and Z-direction.Certainly, also measurable substrate P and fine motion microscope carrier 26 in the position of θ x, θ y and Z-direction Confidence ceases.

In the bottom of the lens barrel platform 16 above substrate holding PH, although not shown, but examined provided with multiple alignments Survey system.Alignment detection lie in X-axis be configured with Y direction with predetermined distance it is multiple.Substrate holding PH passes through fine motion microscope carrier 26 X-direction movement, and can by it is multiple alignment detection system under.At least one of alignment detection system, can be made can root The position in its XY direction is changed according to the configuration (irradiation number, taking face number) of area of the pattern in substrate P.

Each alignment detection system, has the microscope for for example possessing CCD camera, when the both positioning for being set in advance in substrate P When the alignment mark put is entered in the microscopical visual field, i.e., carried out by image processing to locating tab assembly, by the position of alignment mark Information (position offset information) delivers to the main control unit 50 of the position of control base board bearing table device PST movable part.

In Fig. 4, it is shown that formed centered on the control system of exposure device 100, plan as a whole the main control that control is formed each portion The block diagram of the import and export relation of device 50.Be in Fig. 4 show with baseplate carrier be associated each portion of composition.Main control unit 50 include work station (or microcomputer) etc., plan as a whole each portion of composition of control exposure device 100.

Secondly, a company of the processing substrate that the exposure device 100 of this embodiment for illustrating to form in the above described manner is carried out The action of string.Herein, as one, it is the situation for carrying out the exposure after the 2nd layer to substrate P, is subject to according to Fig. 5~Figure 13 Explanation.Also, the exposure area IA shown in Fig. 5~Figure 13, the photograph that illumination light IL is irradiated by projection optics system PL when being exposure Area pellucida domain, in fact, will not be formed when beyond exposure, but to make the position relationship between substrate P and projection optics system PL Clearly, all shown.

First, under the management of main control unit 50, carried out by mask carrying device (not shown) (mask loader) Mask M is loaded to the loading on mask microscope carrier MST and acted, and device is moved into by substrate (not shown), enters to be about to substrate P to remove Enter the action on (input) baseplate carrier device PST.In substrate P, in the exposure before front layer, such as shown in Fig. 5, except more Outside individual, such as 4 irradiation area SA1~SA4, it is provided with each irradiation area and is transferred simultaneously with the pattern of each irradiation area Multiple alignment marks (not shown).

Toward on baseplate carrier device PST when moving into, substrate P, as shown in figure 5, being loaded across substrate holding PH With 4 air flotation cells 84 of substrate holding PH+Y sides, a substrate holding PH absorption fixed substrates P part (whole base Plate P about 1/2), a part (whole substrate P remaining about 1/2) for 4 air flotation cells 84 then suspension bearing substrate P.Now, To enable at least two alignment mark in substrate P to enter the visual field of any alignment detection system and on substrate holding PH, It is that substrate P is assembled into 4 air flotation cells 84 across substrate holding PH and substrate holding PH+Y sides.

Afterwards, the relative projection of fine motion microscope carrier 26 is obtained by main control unit 50 to be directed at measuring method with existing identical Optical system PL position, the position substantially of fine motion microscope carrier 26 relative with substrate P.Also, pair of the substrate P relative to fine motion microscope carrier 26 Locating tab assembly can omit.

Then, main control unit 50 drives fine motion microscope carrier 26 to make substrate P according to above-mentioned measurement result by coarse motion platform 32A On at least two alignment mark be moved to it is any alignment detection system the visual field in, carry out substrate P relative to projection optics system PL's To locating tab assembly, according to as a result, seeking help to carry out the scanning starting position of the exposure of the irradiation area SA1 in substrate P.Herein, For the scanning being exposed, the acceleration area and deceleration interval before and after constant speed movement section during due to comprising scan exposure, because This strictly speaking, scanning starting position be accelerate starting position.Then, main control unit 50 drives coarse motion platform 32A, 32B and micro- Fine motion microscope carrier 26 is driven, substrate P is positioned at the scanning starting position (acceleration starting position).Now, such as the cross arrow in Fig. 5 Shown in head, X-axis of the fine motion microscope carrier 26 (substrate holding PH) with respect to coarse motion platform 32A, Y-axis and θ z directions (or 6DOF side are carried out To) accurate micro- Locating driver.In Fig. 5, it is shown that just completed to be positioned to carry out in substrate P by substrate P in this way The state of the scanning starting position (acceleration starting position) of irradiation area SA1 exposures.

Afterwards, the exposure actions of step-scan mode are carried out.

The exposure actions of step-scan mode, it is that multiple irradiation area SA1~SA4 in substrate P are sequentially exposed Processing.Substrate P, it is to accelerate the set acceleration time in X-direction when scanning motion, given time (these of constant speed driving afterwards It is exposed (scan exposure) in speed driving), the deceleration with acceleration time same time is carried out afterwards (below, by this substrate P Series of actions is referred to as X scanning motions).Also, substrate P is appropriate driven (when being moved between irradiation area) when stepwise operation Move in X-axis or Y direction (following, to claim X stepwise operations, Y stepwise operations respectively).In this embodiment, each irradiation area SAn (n =1,2,3, about 1/2 that maximum exposure width (width of Y direction) 4) is substrate P.

Specifically, exposure actions are to be carried out as follows.

From Fig. 5 state, baseplate carrier (26,28,32A, 32B, PH) is driven to-X as applied in Fig. 5 shown in white arrow Direction, to carry out the X scanning motions of substrate P.Now, mask M (mask microscope carrier MST) quilts synchronous with substrate P (fine motion microscope carrier 26) Drive to -X direction, and irradiation area SA1 passes through the exposure area of the view field of projection optics system PL mask M pattern IA, therefore, the scan exposure to irradiation area SA1 is carried out at this moment.Scan exposure is in (the substrate holding of fine motion microscope carrier 26 PH) toward in the constant speed movement after the acceleration of -X direction, illumination light IL is irradiated to substrate P through mask M, projection optics system PL and come Carry out.

When above-mentioned X scanning motions, main control unit 50 adsorbs by a part (about the 1/2 of substrate P entirety) for substrate P It is fixed on the substrate holding PH for being equipped on fine motion microscope carrier 26 and hangs a part (about the 1/2 of substrate P entirety) for substrate P It is floating be supported on 4 air flotation cells 84 on coarse motion platform 32A in the state of, driving baseplate carrier (26,28,32A, 32B, PH). Now, main control unit 50, will by x-ray motor 42A, 42B according to x-ray encoder system 46A, 46B measurement result Coarse motion platform 32A and 32B are driven in X-direction, and according to the survey of baseplate carrier interferometer system 98 and/or Z inclination measurements system 76 Measure result, driving fine motion microscope carrier drivetrain 52 (each voice coil motor 54X, 54Y, 54Z).In this way, substrate P i.e. with fine motion microscope carrier 26 into One, drawn in the state of suspension bearing is on by weight payment device 28 by coarse motion platform 32A and be displaced into X-direction, and By the relative driving from coarse motion platform 32A, and in X-axis, Y-axis, Z axis, θ x, θ y and θ z all directions (6DOF direction) quilt Accurate carry out position control.Also, main control unit 50 is in X scanning motions, it is same with fine motion microscope carrier 26 (substrate holding PH) Step, according to the measurement result of mask interferometer system 14, mask M mask microscope carrier MST turntable drivings will be kept in X-direction, And micro-move device is in Y direction and θ z directions.Shown in Fig. 6 and irradiation area SA1 scan exposure is terminated, keep substrate P The baseplate carrier (26,28,32A, 32B, PH) of a part is in the state stopped.

Secondly, main control unit 50 is the acceleration exposed into places one, as applied shown in white arrow in Fig. 6, enters to be about to substrate P The X stepwise operations of the substrate P slightly driven toward +X direction.The X stepwise operations of substrate P, it is to be scanned by main control unit 50 with X Act it is identical in the state of driving (but, position deviation on the move and being any limitation as tightly when be not so good as scanning motion) substrate Microscope carrier (26,28,32A, 32B, PH) is carried out.Shown in Fig. 7 baseplate carrier (26,28,32A, 32B, PH) be moved to It is irradiated the state of the scanning starting position of region SA2 exposure.Main control unit 50, with the X stepwise operations of substrate P simultaneously OK, return to mask microscope carrier MST and accelerate starting position.

Then, main control unit 50, as in Fig. 7 apply white arrow shown in, start substrate P (baseplate carrier (26,28,32A, 32B, PH)) accelerate with mask M (mask microscope carrier MST) -X direction, same sweep irradiation area SA2 with above-mentioned Retouch exposure.Shown in Fig. 8 and irradiation area SA2 scan exposure is terminated, baseplate carrier (26,28,32A, 32B, PH) stops State.

Secondly, the Y stepwise operations for making the unexposed area of substrate P be moved on substrate holding PH are carried out.This base Plate P Y stepwise operations, it is to be kept by main control unit 50 with the movable part 88a absorption of substrate Y steppings conveyer 88 in figure + Y side ends the back side of the substrate P of state shown in 8, and after releasing substrate holding PH to the absorption of the substrate P, by from The exhaust of substrate holding PH pressure-air makes the state of substrate P suspension with the exhaust of the pressure-air of air flotation cell 84 then Under, the movable part 88a of substrate Y steppings conveyer 88 as shown in blacking arrow in Fig. 9, drives to enter according to this toward -Y direction OK.In this way, opposing substrate keeps tool PH only substrate Ps to be moved toward -Y direction, unexposed irradiation area SA3, SA4 of substrate P into For with the state on substrate holding PH to being loaded to, 4 air flotation cells 84 across substrate holding PH and-Y sides.This When, substrate P is by substrate holding PH and the suspension bearing of air flotation cell 84.Then, by main control unit 50 by substrate holding PH switches to air-breathing (attraction) from exhaust.Accordingly, turn into that (substrate P is complete with a substrate holding PH absorption fixed substrate P part Body about 1/2) and with the shape of the part of 4 suspension bearing substrate Ps of air flotation cell 84 (substrate P all remaining about 1/2) State.And then after starting with absorption actions of the above-mentioned substrate holding PH to substrate P, substrate Y is released by main control unit 50 Absorption of the stepping conveyer 88 to substrate P.

Then, it is new to being pre-set on locating tab assembly that is, progress substrate P with respect to projection optics system PL to carry out substrate P A time irradiation area alignment mark measurement.When this is to locating tab assembly, aforesaid substrate P X stepwise operations are optionally carried out (the painting white arrow in reference picture 9), so that the alignment mark of measurement object is in the detection visual field of alignment detection system.

Substrate P with respect to projection optics system PL it is new to locating tab assembly after, i.e., such as schemed according to the result by main control unit 50 In 10 shown in crisscross arrows, the relative coarse motion platform 32A of fine motion microscope carrier 26 X-axis, Y-axis and θ z directions (or 6DOF direction) are carried out Accurate micro- Locating driver.

Then, by main control unit 50, as applied in Figure 10 shown in white arrow, beginning substrate P adds with mask M +X direction Speed, carry out the scan exposure similar to the above to irradiation area SA3.Show that the scanning to irradiation area SA3 exposes in Figure 11 The state that light terminates, baseplate carrier (26,28,32A, 32B, PH) stops.

Secondly, for enter places one exposure acceleration, by main control unit 50 enter to be about to baseplate carrier (26,28,32A, 32B, PH), as applied in Figure 11 shown in white arrow, the X stepwise operations slightly toward -X direction driving.Shown in Figure 12 baseplate carrier (26, 28th, 32A, 32B, PH) the mobile exposure for being most irradiated region SA4 scanning starting position state.

Then, by main control unit 50, as applied in Figure 12 shown in white arrow, start substrate P and mask M +X direction adds Speed, with the above-mentioned same scan exposure carried out to irradiation area SA4.The scanning to irradiation area SA4 is shown in Figure 13 The state that end exposure, baseplate carrier (26,28,32A, 32B, PH) stop.

As described above, the exposure device 100 of this embodiment, by being repeatedly scanned with exposure and stepwise operation, is carried out according to this Exposure (the overlapping transfer of mask M pattern) to substrate P all (all irradiation area SA1~SA4 on substrate).

Herein, said sequence, side are not limited to the exposure order and scanning direction of irradiation area SA1~SA4 in substrate P To.In addition, in order to only be carried out in the constant speed synchronizing moving of mask microscope carrier MST and fine motion microscope carrier 26 toward X-direction through projection Optical system PL illumination light IL also carries out the position (not shown) for covering blade (masking blade) to the irradiation in substrate P Put or the switch of optical gate etc..Also, also can by cover blade A/F be made it is variable, with form can change exposure area IA Width.

As described above, the exposure device 100 of this embodiment, loading substrate P and ensuring the flat of the substrate P The substrate holding PH kept substrate retaining surface (substrate loading surface) is adsorbed in the state of degree, it is only necessary to which existing substrate is kept About 1/2 area of tool is enough, therefore can make that substrate holding PH is small-sized, lightweight.In addition, to support through light-weighted base Plate keep tool PH fine motion microscope carrier 26 also can small-sized, lightweight, and can lift use each voice coil motor 54X, 54Y, 54Z progress The high speed of fine motion microscope carrier 26, high acceleration and deceleration driving and position controlling.Also, because substrate holding PH is through minimizing, therefore energy Shorten flatness process time, the lifting machining accuracy of the board holder.Furthermore in this embodiment, due to fine motion microscope carrier 26 move in Y direction without stepping, but only make substrate P past by the substrate Y steppings conveyer 88 on coarse motion platform 32A Y direction is moved with relatively low precision stepping, therefore can also make coarse motion platform 32A simple structure and small-sized, light weight, low cost Change.

The possessed baseplate carrier device PST of exposure device 100 of this embodiment, in substrate P in cross scan The multiaspect configuration that direction (Y direction) configures multiple irradiation areas is very effective.

Also, in above-mentioned embodiment, the substrate of substrate holding PH+Y sides and the air flotation cell of-Y sides is arranged respectively at Bearing-surface area (total area), might not must be about the 1/2 of substrate P, in addition, the size of its cross scanning direction also differs Fixed must be about 1/2 size of substrate P.Also i.e., it is possible to which air flotation cell with more small area, the substrate supporting face of size makes base Plate P suspends.This occasion, as air flotation cell, the air bearing construction for making gas stiffness high can be used, can also use gas stiffness Low air bearing construction and by the big fan of load capacity to produce air-flow, by way of the air-flow makes substrate P suspension.

《2nd embodiment》

Secondly, for the 2nd embodiment, it is illustrated according to Figure 14~Figure 16.Herein, with above-mentioned 1st embodiment phase With or equal composition part assign same or like symbol, and simplify or the description thereof will be omitted.

The composition of the exposure device 200 of the 2nd embodiment is schematically show in Figure 14, omission exposure dress is shown in Figure 15 Put the top view of 200 part.Also, the outline that the part of the exposure device 200 from +X direction is omitted is shown in Figure 16 Side view.But, Tu16Zhong, with above-mentioned Fig. 3 likewise, coarse motion platform 32A is shown with profile.

The exposure device 200 of this 2nd embodiment, baseplate carrier is set except substitution aforesaid substrate bearing table device PST Device PSTa point and above-mentioned 1st embodiment are mutually unusual, and composition of other parts etc. is identical with above-mentioned 1st embodiment.

Baseplate carrier device PSTa, from Figure 15 and Figure 16, it is with aforesaid substrate bearing table device PST deviation The coarse motion platform 32B of-Y sides in aforesaid substrate bearing table device PST possesseds 2 coarse motion platforms 32A, 32B is fallen, and therewith will The air flotation cell of substrate holding PH-Y sides is made fixed rather than movable.Hereinafter, centered on deviation, the 2nd implementation is illustrated The baseplate carrier device PSTa of form.

In substrate holding PH-Y sides, as shown in figure 15, air flotation cell 84A and air flotation cell 84B respectively with one for Y direction forms one group across gap arrangement slightly, and the group is arranged in X-direction with set order.Air flotation cell 84A With the bearing-surface with above-mentioned 84 roughly the same form and dimension of air flotation cell, air flotation cell 84B has to exist with air flotation cell 84A The bearing-surface that Y direction length is identical, X-direction length is 1/3 degree.

Air flotation cell 84A and 84B all equally constitute with air flotation cell 84.In this 2nd embodiment, 4 groups of air supportings have been used Unit 84A, 3 groups of air flotation cell 84B, add up to totally 7 groups.Total 7 groups air flotation cell 84A, 84B, it in Y direction width is base to be Plate P Y direction width about 1/2, X-direction length be that moving range when scanning mobile with substrate holding PH is substantially same In the rectangular area of equal length, configured in X-direction with predetermined distance.Total 7 groups air flotation cell 84A, 84B, such as Figure 16 institutes Show, to avoid contacting with pallet 18, be fixed on ground F framework 110.

As shown in figure 15, exposure area IA center and total 7 groups air flotation cell 84A, 84B configuring area center X position is substantially uniform, and 1 group of (a pair) air flotation cell 84B is configured with X-direction center.From this 1 group of air flotation cell 84B and this 1 Gap between the air flotation cell 84A of X-direction both sides adjacent group air flotation cell 84B, by from Y interferometers 98Y in X-axis A pair of measuring beams of direction separation are irradiated in Y moving lens 94Y.This occasion, Y interferometers 98Y are fixed on compared with 7 groups of air flotation cells 84A, 84B are located at the body BD of-Y sides side frame 20.Y interferometer 98Y, it is the rolling that use can measure fine motion microscope carrier 26 (rolling) multi-axis interferometer (reference picture 16) of amount.

Also, as shown in Figure 14 and Figure 16, the movable part of levelling device 78 is with can be in axle (such as X-axis and the Y in horizontal plane Axle) the Z saddles 68 of weight payment device 28 are installed in a manner of micro-stroke is inclined.Levelling device 78 can be made for example above It is fixed on (first half of sphere) and is fixed on fine motion microscope carrier 26, formed with the θ x for allowing levelling device 78 above Z saddle 68 Direction and θ y directions rotate the recess of (inclination).Or in contrast to this, levelling device 78 can be also made following (ball for example The lower half in face) Z saddles 68 are fixed on, it will allow for inclination of the fine motion microscope carrier 26 with respect to the θ x directions and θ y directions of levelling device 78 Recess, be formed at fine motion microscope carrier 26.No matter whichever, levelling device 78 all supports from below by Z saddles 68, allows fine motion microscope carrier Fascinating in the range of 26 axle (such as X-axis and Y-axis) minute angle in horizontal plane.

In the baseplate carrier device PSTa of 2nd embodiment, Z saddles 68 double as the fixed part for levelling device 78, do not set Sealing gasket is put, it is integrated that weight, which offsets device 28 with fine motion microscope carrier 26,.Further, since weight payment device 28 and fine motion microscope carrier 26 integrations, therefore and it is not provided with link device 80 (flexure devices) etc. that maximum weight payment device 28 moves alone.Base The composition of onboard table apparatus PSTa other parts is identical with baseplate carrier device PST.

According to the exposure device 200 of the embodiment of sheet the 2nd formed in the above described manner, except rib is obtained with the above-mentioned 1st in fact Apply outside the equal effect of exposure device 100 of form, due to not by air flotation cell 84A, 84B of substrate holding PH-Y sides It is equipped on coarse motion platform 32B and is affixed to the framework 110 separately set, therefore does not have air flotation cell 84A, 84B masking Y interference The situation of instrument 98Y measuring beam.Also, Y moving lens 94Y is also mountable to substrate holding PH side or pacified by bracket Loaded on fine motion microscope carrier 26.

《3rd embodiment》

Secondly, for the 3rd embodiment, it is illustrated according to Figure 17 and Figure 18.Herein, shape is implemented with the above-mentioned 1st, the 2nd The identical or equal composition part of state assigns same or like symbol, and simplifies or the description thereof will be omitted.

Figure 17 is the one of the exposure device possessed baseplate carrier device PSTb and body BD that show this 3rd embodiment Partial top view, Figure 18 are the summary side elevation of the exposure device of the 3rd embodiment from +X direction, but eliminate part Display.But with above-mentioned Figure 16 likewise, in Figure 18, coarse motion platform 32A (and 32B) is shown with profile.

Baseplate carrier device PSTb, it is as shown in figure 18, same with the baseplate carrier device PST of above-mentioned 1st embodiment Provided with 2 coarse motions platform 32A, 32B, but the coarse motion platform 32B in-Y sides does not carry air flotation cell, and with above-mentioned 2nd embodiment Baseplate carrier device PSTa is likewise, the air flotation cell of substrate holding PH-Y sides is arranged in the framework 110 set in addition The whole (reference picture 17) of substrate holding PH X-direction moving range.This occasion, the air flotation cell of-Y sides is also use with Total 7 groups air flotation cell 84A, 84B that 2nd embodiment equally configures.In addition, a pair of X voice coil motors 54X and multiple Z sounds A motor 54Z part (being show 1 Z voice coil motors 54Z 1 in Figure 18) is enclosed, is located at coarse motion platform 32B and fine motion microscope carrier 26 Between.

Further, Y moving lens 94Y configurations are in substrate holding PH-Y sides side and X moving lens 94X₁、94X₂Greatly Mutually level position is caused, the face of-Y sides of fine motion microscope carrier 26 is fixed on by bracket 96A.This occasion, due to will not produce Ah Shellfish error, therefore Y interferometers 98Y must not necessarily carry out the measurement of rolling amount.

This occasion, weight payment device 28 is also integrated with fine motion microscope carrier 26.Baseplate carrier device PSTb other portions Each portion beyond the composition and baseplate carrier device PSTb divided is formed, identical with above-mentioned 1st embodiment or the 2nd embodiment.

According to the exposure device of the embodiment of sheet the 3rd formed in the above described manner, except that can obtain and the above-mentioned 1st and the 2nd Outside 100, the 200 equal effect of exposure device of embodiment, X voice coil motor 54X and the Z voice coil motors of driving fine motion microscope carrier 26 54Z can be with well balanced two sides being distributed in coarse motion platform 32A, 32B, and obtain the electricity compared with the 2nd embodiment more high rigidity Machine configures (reference picture 18).

Also, in above-mentioned 3rd embodiment, though it is described for the situation provided with 2 coarse motion platforms 32A, 32B, not It is limited to this, also can be as shown in figure 19, set the coarse motion platform 32 of coarse motion platform 32A, 32B integration, and by the coarse motion platform 32 with can The mode of slip is arranged on 2 X beams 30A, 30B.

Also, in above-mentioned 1st~the 3rd embodiment and Figure 19 variation, though by substrate holding PH Y direction The air flotation cell of at least side is designed to be equipped on coarse motion platform 32A or 32 and can be movable in X-direction, but not limited to this, also The settable another moving body for following the movement of coarse motion platform, being made in carrying air flotation cell on another moving body can in X-direction It is dynamic.For example, in above-mentioned 1st embodiment, can be set along the coarse motion platform 32A+Y sides of mobile route and/or coarse motion platform 32B shifting Another moving body of the mobile route movement of-Y sides in dynamic path, on another moving body for example, by inverted L-shaped supporting Component is with the state carrying air flotation cell in Y direction close to substrate holding PH.

《4th embodiment》

Secondly, for the 4th embodiment, it is illustrated according to Figure 20 and Figure 21.Herein, it is real with the above-mentioned 1st, the 2nd and the 3rd Apply homomorphosis or equal composition part assigns same or like symbol, and simplify or the description thereof will be omitted.

Figure 20 illustrate in plan view the exposure device possessed baseplate carrier device PSTc and machine of this 4th embodiment A part for body, the summary side elevation of the exposure device of the 4th embodiment from Figure 20 +X direction is shown in Figure 21, but Some is omitted.

In baseplate carrier device PSTc, as shown in figure 21, with Figure 19 likewise, the coarse motion platform 32 being integrated is with slidably Mode be arranged on 2 X beams 30A, 30B, but in not carrying air flotation cell on coarse motion platform 32.In Figure 21, coarse motion platform 32 be with Profile is shown.Substrate holding PH-Y sides and the air flotation cell of+Y sides, with the 2nd, air supporting of-Y sides of the 3rd embodiment Unit is likewise, framework 110A, the 110B's being arranged to avoid contact with pallet 18 to be fixed on the F of ground is each.Also, substrate Keep tool PH-Y sides and+Y sides each air flotation cell, as shown in figure 20, be Y direction width be substrate P Y-axis side To width about 1/2, the length of X-direction be and moving range substantially equal length when substrate holding PH scannings are mobile In rectangular area, in X-direction with predetermined distance, in Y direction across gap configuration slightly.This occasion, the gas as-Y sides Floating unit, it is using total 7 group air flotation cell 84A, 84Bs for configuring same with the 2nd, the 3rd embodiment.On the other hand, as+ The air flotation cell of Y sides, as shown in figure 20, it is used in 4 groups configured in above-mentioned rectangular area in X-direction across given clearance (total 8) air flotation cell 84D.Air flotation cell 84D and the same composition of above-mentioned air flotation cell 84, the width and gas of Y direction Floating unit 84 is equal, but X-direction length is then slightly longer compared with air flotation cell 84.

In the framework 110A for 4 groups of air flotation cell 84D for being fixed with+Y sides, it is provided with X-direction with predetermined distance multiple (being 3 in Figure 20) aforesaid substrate Y steppings conveyer 88.Herein, in order to be made be located in substrate P it is any in movable area Position (position of Y direction) Shi Jieneng is sent to Y direction, therefore substrate Y with the movable part 88a sorbing substrates P back side Stepping conveyer 88 sets multiple.Each substrate Y steppings conveyer 88 is configured between the adjacent air flotation cell 84D of X-direction Gap.Above the movable part 88a of each substrate Y steppings conveyer 88, the adsorbable substrate being suspended on air flotation cell 84D P makes it mobile to Y direction and can desorb and be separated from substrate P.

The composition in each portion beyond the composition and baseplate carrier device PSTc of baseplate carrier device PSTc other parts with The embodiment of above-mentioned 1st, the 2nd or the 3rd is mutually same.

According to the exposure device of the embodiment of sheet the 4th formed in the above described manner, except can obtain and above-mentioned each embodiment The equal effect of exposure device outside, not exclusively substrate holding PH-Y sides, air flotation cell 84D and base positioned at+Y sides Plate Y steppings conveyer 88 separates with coarse motion platform 32 to be fixed on framework 110A, therefore the load for putting on coarse motion platform 32 is reduced, And the thrust of driving coarse motion platform 32 can be reduced.

《5th embodiment》

Secondly, for the 5th embodiment, it is illustrated according to Figure 22~Figure 24.Herein, with the above-mentioned 1st, the 2nd, the 3rd or The identical or equal composition part of 4th embodiment assigns same or like symbol, and simplifies or the description thereof will be omitted.

The composition of the exposure device 500 of the 5th embodiment is schematically show in Figure 22, exposure device is shown in Figure 23 The top view that 500 part is omitted.Also, Figure 24 shows the summary side elevation of the exposure device 500 from Figure 22 +X direction, But eliminate a part.Coarse motion platform 32 is shown with profile in Figure 24.

The exposure device 500 of this 5th embodiment, the substantially structure same with the exposure device of above-mentioned 4th embodiment Into, but baseplate carrier device PSTd and the baseplate carrier device PSTc parts of the 4th embodiment are different.Specifically, substrate carries Table apparatus PSTd, a pair of X moving lens 94X₁、94X₂Installation site and baseplate carrier device PSTc on fine motion microscope carrier 26 is different, Correspondingly, composition of X interferometers etc. is also different with baseplate carrier device PSTc.Hereinafter, centered on dissimilarity, is illustrated The exposure device 500 of 5 embodiments.

From Figure 22, Figure 23, Figure 24, a pair of X moving lens 94X₁、94X₂Pass through moving lens support (not shown) respectively Part is arranged near the X-direction center of the Y direction two sides of fine motion microscope carrier 26.Corresponding a pair of X moving lens 94X₁、94X₂, peace Equipped with to in a pair of X moving lens 94X₁、94X₂A pair of each X interferometers 98X₁、98X₂.A pair of X interferometers 98X₁、98X₂'s It is each, as shown in figure 24, it is separately fixed at the framework that each one end (bottom) is fixed on the L-shaped of-X side frames platform 18 (X interferometers framework) 102A, 102B other end (upper end).As framework 102A, 102B, for avoid with said frame 110A, 110B and it is displaced into the coarse motion platform 32 of X-direction and interferes and use L-shaped person.

Also, a pair of X moving lens 94X₁、94X₂It is provided in-X side end faces more+X the sides compared with substrate holding PH and compared with substrate (surface) low position above P, specifically, it is provided in only compared with position lower slightly below substrate holding PH.With one To X moving lens 94X₁、94X₂To a pair of X interferometers 98X₁、98X₂Configure position low above compared with substrate P and in Y-axis Direction is housed in the position in the gap between substrate holding PH and air flotation cell 84D or 84A.Accordingly, the base of this 5th embodiment In onboard table apparatus PSTd, a pair of X interferometers 98X₁、98X₂, such as compare Figure 23 and Figure 20 and understand, with the 4th embodiment (and 1st~the 3rd embodiment) X interferometers 98X compare, can be by X interferometers (a pair of X interferometers 98X₁、98X₂) configure from-X The nearer position of the pallet 18 of side.

Also, in baseplate carrier device PSTd, as shown in figure 23, to avoid the X moving lens 94X of+Y sides₁With by fine motion microscope carrier 26 drive the Y voice coil motors 54Y in Y direction to interfere with each other a little, and a pair of Y voice coil motors 54Y are mounted in be carried close to fine motion The position at the X-direction center (center) of platform 26.But not limited to this, as long as X moving lens 94X₁It will not that with Y voice coil motors 54Y This interference, a pair of Y voice coil motors 54Y can be installed at an arbitrary position.Although not shown, such as can be installed in the X-axis of fine motion microscope carrier 26 Direction two sides.This occasion, a pair of Y voice coil motors 54Y position, is desirable to the force action of driving force in fine motion microscope carrier The center of gravity driving that 26 position of centre of gravity that is, be configured to can carry out fine motion microscope carrier 26 is preferable.

The exposure device 500 of the embodiment of sheet the 5th formed in the above described manner, implement shape with the above-mentioned 4th except that can obtain Outside the equal effect of the exposure device of state, compared with the X interferometers 98X of the 4th embodiment (and the 1st~the 3rd embodiment), energy By a pair of X interferometers 98X₁、98X₂Configuration has framework 102A, 102B in the position for the pallet 18 for being closer to-X sides The advantages of gross weight is compared with the in light weight of interferometer post 102, rigidity increase.

《6th embodiment》

Secondly, for the 6th embodiment, it is illustrated according to Figure 25~Figure 29.Herein, with the above-mentioned 1st, the 2nd, the 3rd, The identical or equal composition part of 4 or the 5th embodiment assigns same or like symbol, and simplifies or the description thereof will be omitted.

The top view that the part of the exposure device of the 6th embodiment is omitted is shown in Figure 25.Also, is shown in Figure 26 The XZ profiles of the exposure device of 6 embodiments, but eliminate a part.

The exposure device of this 6th embodiment, substantially, is equally constituted with the exposure device of above-mentioned 5th embodiment, But baseplate carrier device PSTe and the baseplate carrier device PSTd parts of the 5th embodiment are different.

Specifically, baseplate carrier device PSTe, it is that use is not only Y-axis as substrate holding PH as shown in figure 25 Direction size, X-direction size is also small compared with the X-direction size of substrate P, is, for example, about the 1/2 of substrate P.And protected in substrate Tool PH X-direction both sides are held, are configured with a pair of air flotation cell (movable air-float unit) 84C.A pair of air flotation cell 84C's is each It is individual, it is above it and in a manner of substantially equal (lower slightly) height of substrate holding PH, to pass through supporting member as shown in figure 26 112 are fixed on above coarse motion platform 32.A pair of air flotation cell 84C's is each, for example, Y direction length and substrate holding PH it is same It is substantially equal or slightly short Deng (or compared with substrate holding PH slightly short), X-direction length and substrate holding PH.

In baseplate carrier device PSTe, a pair of X moving lens 94X₁、94X₂, it is by not shown from Figure 25 and Figure 26 Moving lens supporting member be fixed near the substrate holding PH Y direction both ends of-X sides side.Baseplate carrier device The composition of PSTe other parts is identical with the baseplate carrier device PSTd of the 4th embodiment.This occasion, a pair of X interferometers 98X₁、98X₂, with the 5th embodiment likewise, be arranged to can with fixed air flotation cell (84A, 84B) and coarse motion platform 32 On air flotation cell 84C in the case of do not produce interference, close to a pair of X moving lens 94X₁、94X₂。

Also, a pair of X interferometers 98X₁、98X₂, can be with the 5th embodiment likewise, installed in substrate holding PH both sides Face, X-direction center near.In this case, can be by X interferometers 98X₁、98X₂+ X sides are more leaned in configuration.In addition, a pair of X Moving lens 94X₁、94X₂Also substrate holding PH can not be resided at, and fine motion microscope carrier 26 is installed on by X moving lens scaffolds.

Then, according to Figure 26~Figure 29, company when illustrating to carry out processing substrate with the exposure device of this 6th embodiment The action of string.Herein, it is to lift to the irradiation area SA1 and SA2 (or irradiation area SA3 and SA4) of above-mentioned 1st embodiment at first The situation that is exposed illustrates.Also, Figure 26 into Figure 29, eliminates the diagram of fixed air flotation cell etc..In addition, this In 6 embodiments, comprising coarse motion platform 32, weight payment device 28, fine motion microscope carrier 26 and substrate holding PH etc., with substrate P one This moving body below, is referred to as baseplate carrier by the composition of body (part for keeping substrate P) toward the moving body of X-direction movement (26、28、32、PH)。

First, under the management of main control unit 50, enter to be about to mask carrying device (not shown) (mask loader) Mask M is loaded to the loading action on mask microscope carrier MST, and is moved into device with substrate (not shown) and entered to be about to substrate P to move into base Action is moved on onboard table apparatus PSTe.In substrate P, when each irradiation area is provided with the exposure before front layer, such as Shown in Figure 25, there are multiple adding up to together with 4 irradiation area SA1~SA4 with such as X-direction 2, Y direction 2, it is and each Multiple alignment marks (not shown) that the pattern of irradiation area is transferred simultaneously.

First, substrate P is assembled into one across substrate holding PH, with the multiple air flotation cell 84D of fixation of+Y sides Divide the air flotation cell 84C with+X sides.Now, sprayed above substrate holding PH, air flotation cell 84D and air flotation cell 84C Pressure-air, substrate P are suspended supporting.Then, air-breathing is switched to (to inhale from exhaust substrate holding PH by main control unit 50 Draw).Accordingly, i.e., with substrate holding PH, by a part for substrate P, (substrate P in the corresponding region comprising irradiation area SA1 is all About 1/4) absorption fix, turn into one with a multiple air flotation cell 84D part and air flotation cell 84C suspension bearing substrate Ps The partly state of (substrate P all remaining about 3/4).Then, with above-mentioned 1st embodiment identical method, be aligned Act (reference picture 26).

Secondly, as applied in Figure 26 shown in white arrow, substrate P (baseplate carrier (26,28,32, PH)) with mask M (masks Microscope carrier MST) it is synchronous moved toward -X direction, with above-mentioned 1st embodiment likewise, carrying out being adsorbed on substrate holding PH Substrate P initial irradiation area SA1 scan exposure.After the end exposure that irradiation area SA1 is shown in Figure 27, substrate Microscope carrier (26,28,32, PH) stop state.

Secondly, main control unit 50, used in the time point and dress is transported to the substrate Y steppings to position positioned at substrate P 88 movable part 88a (not shown in Figure 27, reference picture 25) the sorbing substrate P back side is put, is releasing substrate holding PH to base It is empty with the high pressure that the air flotation cell 84C of the exhaust of the pressure-air from substrate holding PH and+X sides continues after plate P absorption The exhaust of gas makes substrate P suspend.Accordingly, substrate P becomes what is only kept by the movable part 88a of substrate Y steppings conveyer 88 State.

Secondly, main control unit 50, maintaining only with the movable part 88a of this substrate Y steppings conveyer 88 to substrate P Under hold mode, by baseplate carrier (26,28,32, PH), as shown in the painting white arrow in Figure 27, drive in +X direction, start base Plate P X steppings.Accordingly, substrate P is i.e. in the state of the position before stopping at X steppings and starting, and substrate holding PH is with respect to this base Plate P is displaced into +X direction.Then, main control unit 50 reaches a time irradiation area SA2 for substrate P just in substrate holding PH During lower section, make baseplate carrier (26,28,32, PH) stop (reference picture 28).Now, substrate P is to be loaded across substrate to keep Have PH and the multiple air flotation cell 84D of fixation an of+Y sides part and the air flotation cell 84C of-X sides.From substrate holding PH, more Pressure-air is sprayed above individual air flotation cell 84D a part and air flotation cell 84C, substrate P is suspended supporting.

With aforesaid substrate P be carry out X steppings baseplate carrier (26,28,32, PH) driving it is parallel, main control unit 50 Mask microscope carrier MST is set to return to set acceleration starting position.

Afterwards, 88a pairs of the movable part of absorption and substrate Y stepping conveyer 88 of the substrate holding PH to substrate P is carried out The absorption of substrate P releases, determines using alignment mark new in substrate P to locating tab assembly, using the substrate P of fine motion microscope carrier 26 Position.Afterwards, baseplate carrier (26,28,32, PH) it is synchronous with mask microscope carrier MST, as in Figure 28 apply white arrow shown in, pass through past-X Direction is moved, and enters the irradiation area SA2 of places one scan exposure according to this.Irradiation area SA2 end exposure is shown in Figure 29 Afterwards, baseplate carrier (26,28,32, PH) stop state.

Afterwards, the exposure device 100 with above-mentioned 1st embodiment by substrate Y steppings conveyer 88 likewise, carried out The Y stepwise operations of substrate P, scan exposure is repeated after being positioned with alignment.

Using the exposure device of described above the 6th embodiment, the exposure device with above-mentioned 5th embodiment is obtained 500 equal effects.In addition, according to the exposure device of this 6th embodiment, due to be by substrate holding PH be made with 1 equal size of irradiation area (single exposure region), outside region suspension bearing is then subject to air flotation cell, therefore carry In the substrate holding PH of fine motion microscope carrier 26, compared with above-mentioned 1st to the 5th embodiment, can more small-sized, light weight.In addition, by In baseplate carrier (26,28,32, PH) only scan an irradiation area, therefore baseplate carrier (26,28,32, PH) X-direction More above-mentioned 1st to the 5th embodiment of stroke is short (about 1/2).Therefore, baseplate carrier device can be sought and possess substrate load The further miniaturization and the reduction of light weight exquisitenessization and cost of the exposure device of table apparatus.

Also, in described above, though after the scan exposure of irradiation area at first, substrate P is left, and is into places one The exposure of irradiation area make baseplate carrier (26,28,32, PH) toward +X direction movement (reference picture 27 and Figure 28), but can also leave Baseplate carrier (26,28,32, PH) and with substrate X steppings conveyer (not shown) only make substrate toward -X direction move, afterwards, Again by baseplate carrier (26,28,32, PH) be exposed toward the scanning of +X direction.Substrate X steppings conveyer can double as The moving into of substrate P, conveyance device.

Also, described above, in the 2nd embodiment into the 6th embodiment, though the air supporting list that will be separated with coarse motion microscope carrier Member is fixed on ground by framework, but produces when deceiving less of vibration, can also be fixed in pallet 18.

It is whole such as the baseplate carrier device and exposure device of the 1st~the 6th each embodiment of above-mentioned detailed description, remittance Under.Baseplate carrier device be not such as existing apparatus by sorbing substrate give plane rectification substrate holding be made it is same with substrate Equidimension, but be made with the exposure field commensurateiy wide of projection optics system (Y direction size), scanning direction (X-direction) The scanning length that length is then made the single exposure region for acting exposure on an equal basis or with single pass with the X-direction length of substrate is same Deng length.And then being suspended from the part that substrate holding exposes by mobile or fixed air flotation cell for substrate is propped up Hold.Therefore, substrate holding can easy small-sized, light weight and high accuracy (high flatness) is changed, and the control of fine motion microscope carrier can be lifted Property (position and speed controlling etc.) processed seeks high accuracy, high speed.Further, since it is that relative exposure field (is shone that coarse motion platform, which is made, Mingguang City IL irradiation area (exposure position)) only toward the mobile platform (microscope carrier) of 1 direction of principal axis (X-direction), therefore coarse motion microscope carrier portion Form simply, cost can be reduced.

Also, the stepping movement of substrate toward Y-direction is to be made only to make substrate move toward Y-direction by substrate Y steppings conveyer It is dynamic, therefore moving mass is light.In addition, the Y Stepping positionings of substrate are designed to more rough precision progress, therefore substrate Y is walked The cost for entering conveyer is also low.Simple coarse motion microscope carrier portion is formed, due to being separated with fine motion microscope carrier, therefore precision can be thicker Slightly, the composition part (coarse motion microscope carrier portion and substrate Y stepping conveyers etc.) comprising the more rough movable part of precision without using The ceramic component of light weight, high rigidity, and general industry can be used with material to make.It is therefore not necessary to using large-scale in order to make The needed big firing furnace of the light weight of change, high rigidity ceramic component and it is processed into needed large-scale grinder in high precision Tool etc..In addition, the composition part comprising the more rough movable part of precision is without using high-precision guiding element and high rigidity pressurized air Any one of bearing etc., and ball guiding element of ball or roller etc. etc. can be used to be made.Also, comprising precision it is more rough can The composition part in dynamic portion, without using being considered as necessary high thrust, the nothing of low ripple when to be carried out at high speed high accuracy positioning Iron core linear electric machine (voice coil motor) etc., and cored linear electric machine, ball screw driving or belt driving etc. can be used compared with valency Component that is honest and clean and being easier to maximization.

Furthermore by that by fine motion microscope carrier and coarse motion microscope carrier portion configured separate, can suppress to vibrate the transmission toward fine motion microscope carrier.

It is to be located at substrate in advance to be directed at the detection of detection system further, since toward the positioning after the stepping movement of X, Y-direction Alignment mark, fine motion microscope carrier is moved according to the testing result, therefore positioning precision during exposure is also high.

《7th embodiment》

Secondly, for the 7th embodiment, it is illustrated according to Figure 30~Figure 49.Herein, respectively implement with the above-mentioned 1st to the 6th Homomorphosis or equal composition part assign same or like symbol, and simplify or the description thereof will be omitted.

The composition of the exposure device 700 for showing the 7th embodiment of the outlines such as aftermentioned air flotation cell group is omitted in Figure 30, Figure 31 shows the top view that the part of exposure device 700 is omitted.Relatively projection optics system PL lower sections of the Figure 31 equivalent to Figure 30 Divide the top view (compared with the part below lens barrel platform).Also, Figure 32 shows the exposure device 700 from Figure 30 +X direction Side view (figure that part is omitted, partly shown with section).In addition, Figure 33, which is shown using exposure device 700, controls system in The heart is formed, and plans as a whole the block diagram of the import and export relation of the main control unit 50 in each portion of control composition.Figure 33 is then shown and substrate The associated each portion of composition of microscope carrier.Main control unit 50 includes work station (or microcomputer) etc., plans as a whole control exposure device 700 Each portion of composition.

The exposure device 700 of this 7th embodiment, it is to substitute aforesaid substrate with the deviation of above-mentioned 1st embodiment Bearing table device PST and be provided with baseplate carrier device PSTf, composition of other parts etc. is then identical with above-mentioned 1st embodiment.

Baseplate carrier device PSTf composition and baseplate carrier device PST, PSTa of described above, PSTb, PSTc, The possessed baseplate carrier device PSTd of exposure device 500 of above-mentioned 5th embodiment in PSTd, PSTe composition connects the most Closely.Therefore, below, for the possessed baseplate carrier device PSTf of exposure device 700 of this 7th embodiment, with and substrate It is illustrated centered on bearing table device PSTd dissimilarity.

Compare Figure 23 and Figure 31 to understand, baseplate carrier device PSTf and baseplate carrier device PSTd deviation is substrate Keep tool PH (fine motion microscope carrier 26) size, configuration substrate holding PH Y direction both sides air flotation cell group configuration And form and 1 substrate X stepping is respectively configured with the configuring area of the air flotation cell group of the Y direction both sides and transport dress Put 91.Understood in addition, comparing Figure 24 and Figure 32, a pair of X beams 30A, 30B Y direction possessed by baseplate carrier device PSTf Narrow width (about half degree) of the width compared with a pair of X beams possessed by baseplate carrier device PSTd.

Above X beams 30A, 30B are each, as shown in figure 32, only it is fixed with 1 in the center of Y direction and extends X-axis The x-ray guiding element 36 in direction.In this 7th embodiment, x-ray guiding element 36 has to be arranged included in X-direction with predetermined distance Multiple permanet magnets magnet unit, as X stators.Also, also can be outside x-ray guiding element 36, setting has magnetite The X stators of unit.Furthermore multiple, such as 2 x-ray guiding elements can be also set on X beams 30A, 30B.

Coarse motion platform 32, as shown in figure 32, with aforesaid substrate bearing table device PSTd likewise, being disposed on X beams 30A, 30B On.Coarse motion platform 32 is made up of vertical view rectangular plate-like component of the center formed with the opening for running through Z-direction.In Figure 32, coarse motion Platform 32 is shown together with weight payment device 28, with the side of fragmentary cross-sectional view.Below coarse motion platform 32, as shown in figure 32, relatively Each x-ray guiding element 36 is fixed with such as 4 (reference pictures 30), total 8 saddles 44 in X-direction with predetermined distance.Coarse motion platform 32, it is straight to be guided in X-direction by multiple x-ray guiding element devices comprising x-ray guiding element 36 Yu saddle 44.

Also, this occasion, each saddle 44 includes coil unit, by adding up to 8 coil units possessed by each saddle 44, with Above-mentioned X stators form coarse motion platform 32 the x-ray motor 42 (reference picture 33) driven with predetermined stroke in X-direction together.

Also, also can outside saddle 44, separately set X can mover, in this occasion, saddle 44 can include rolling element (such as Multiple balls etc.), be slidably sticked in each x-ray guiding element 36.

Also, it is fixed with X beams 30A, 30B intended party, such as in X beams 30A with X in Figure 30~Figure 32 although not shown Direction of principal axis is the X scales in cycle direction, and be fixed with composition in coarse motion platform 32 obtains coarse motion platform 32 in X-direction using X scales The encoder head of the x-ray encoder system 46 (reference picture 33) of positional information.Coarse motion platform 32 is in the position of X-direction It is controlled by according to the output of above-mentioned encoder head by main control unit 50 (reference picture 33).

Herein, though declaration order is slightly inverted, then explanation is mounted in the substrate holding PH above fine motion microscope carrier 26. Substrate holding PH, as shown in Figure 31, X-direction length is equal with substrate P and Y direction width (length) is then substrate P About 1/3.Substrate holding PH is by the part of substrate P (herein, be substrate P in about 1/3 part of Y direction) with such as vacuum Absorption (or Electrostatic Absorption) mode is adsorbed holding, and can be sprayed gas-pressurized (such as pressure-air) upwards and be passed through the ejection The pressure supporting substrates P in a manner of non-contact (suspension) from below part (about the 1/3 of substrate P).Substrate holding PH is to base The ejection of plate P pressure-air and the switching of vacuum suction, it is (not shown) true by the way that substrate holding PH switchings are connected to The holding tool suction and discharge switching device 51 (reference picture 33) of empty pump and source of high pressure air, because main control unit 50 is carried out.

In this 7th embodiment, fine motion microscope carrier 26 is also comprising multiple voice coil motors (or linear electric machine), for example comprising a pair X voice coil motors 54X, a pair of Y voice coil motors 54Y and 4 Z voice coil motor 54Z, pass through composition identical with above-mentioned 1st embodiment Fine motion microscope carrier drivetrain 52 (reference picture 33), by micro-move device in 6DOF direction (X-axis, Y-axis, Z axis, θ on coarse motion platform 32 X, θ y and θ z all directions).Also it is by above-mentioned x-ray motor 42 and fine motion microscope carrier drivetrain also, in this 7th embodiment 52 each pair X voice coil motor 54X and Y voice coil motor 54Y, makes fine motion microscope carrier 26 can be with respect to projection optics system PL (reference picture 30) (coarse motion) is moved with long stroke in X-direction and moved a little (fine motion) in the 3DOF direction of X-axis, Y-axis and θ z directions.

As shown in figure 32, in X beams 30A+Y sides and X beams 30B-Y sides, Y is compared with the framework of above-mentioned 5th embodiment Direction of principal axis width (length) larger pair of framework 110A, 110B's is each, is arranged on ground in a manner of avoiding contact with pallet 18 On the F of face.Air flotation cell group 84E, 84F are provided with above a pair of frames 110A, 110B is each.Also, a pair of frames 110A, 110B can also be provided on pallet 18.

Air flotation cell group 84E, 84F, as shown in FIG. 31 and 32, it is disposed on substrate holding PH Y direction both sides. Air flotation cell group 84E, 84F's is each, as shown in figure 31, be the width of Y direction and the Y direction width of substrate P it is equal, In the rectangular area of moving range substantially equal length when the length of X-direction and mobile substrate holding PH scannings, in X-axis Direction is formed with predetermined distance, in Y direction across multiple air flotation cells that gap slightly is distributed.In the IA of exposure area The heart and the X position at air flotation cell group 84E, 84F center are substantially uniform.It is to be set to keep with substrate above each air flotation cell Have equal or lower slightly above PH.

Air flotation cell group 84E, 84F each air flotation cell are respectively constituted, though size is different, with above-mentioned 1st embodiment Air flotation cell 84 equally constitute.The open and close (on, off) supplied the pressure-air of each air flotation cell are as shown in Figure 33 Main control unit 50 is controlled by.

As shown in the above description, in this 7th embodiment, substrate holding PH and substrate holding PH both sides can be passed through The entirety of at least one party's suspension bearing substrate P in air flotation cell group 84E, the 84F of (± Y sides).In addition, pass through substrate holding PH one side (+Y sides or-Y sides) air flotation cell group 84E or 84F also can suspension bearing substrate P entirety.

Also, air flotation cell group 84E, 84F, if having respectively wide with the width of above-mentioned Y direction and the Y direction of substrate P The rectangular area of moving range substantially equal length when degree is equal, the length of X-direction scans mobile with substrate holding PH If substantially equal total bearing area, also replaceable is single large-scale air flotation cell, or the size by each air flotation cell It is made different from Figure 31 situation and is distributed in above-mentioned rectangular area.

The substrate holding PH of each multiple air flotation cells of air flotation cell group 84E, 84F Y direction is formed in configuration In 2 rectangular areas of both sides, as shown in figure 31, the relative X by exposure area IA centers (projection optics system PL center) Axle, it is asymmetrical to be configured with multiple, such as 3 substrate Y steppings conveyers 88 and 1 substrate X steppings conveyer 91.Substrate Y steppings conveyer 88 and substrate X steppings conveyer 91 it is each, be configuration in the case of not interfering with air flotation cell In above-mentioned 2 rectangular areas.Herein, the quantity of substrate Y steppings conveyer 88 can be 2, can also be more than 4.

Substrate Y steppings conveyer 88 is the device for keeping substrate P (such as absorption) to make it be moved to Y direction, Under vertical view, 3 are configured in X-direction with predetermined distance in air flotation cell group 84E, 88F each inside.Each substrate Y steppings fortune Send device 88 to divide to be fixed on framework 110A or 110B (reference picture 32) by supporting member 89.Each substrate Y stepping conveyers 88, the back side for possessing sorbing substrate P is displaced into the movable part 88a of Y direction and is fixed on framework 110A or 110B fixed part 88b.Movable part 88a, as an example for, be by with located at movable part 88a can mover with located at fixed part 88b stator The drive device 90 (not shown in Figure 32, reference picture 33) that the linear electric machine of composition is formed, opposing frame 110A or 110B quilt Drive in Y direction.Read the position that the measurement movable part 88a encoder of position etc. is provided with substrate Y steppings conveyer 88 Take device 92 (not shown in Figure 32, reference picture 33).

The movable part 88a of each substrate Y steppings conveyer 88 Y direction shift motion is the Y direction length of substrate P About 2/3 (slightly short).In this 7th embodiment, due to the movable part 88a (substrate adsorptions of each substrate Y steppings conveyer 88 Face) also need the sorbing substrate P back side or desorb to be separated from substrate P, therefore also can by the micro-move device of drive device 90 in Z-direction.Also, in fact, though movable part 88a, which is sorbing substrate P, is displaced into Y direction, in following explanation, except must especially add Outside with the situation of difference, substrate Y steppings conveyer 88 and movable part 88a are not distinguished.

Substrate X steppings conveyer 91 is to keep (such as absorption) substrate P to make its device moved toward X-direction, Under vertical view, 1 is respectively configured with inside air flotation cell group 84E, 84F.Each substrate X steppings conveyer 91 is respectively by supporting structure Part 93 is fixed on framework 110A or 110B (reference picture 32).

Each substrate X steppings conveyer 91, as shown in figure 32, what the back side for possessing sorbing substrate P was displaced into X-direction can The dynamic portion 91a and fixed part 91b for being fixed on framework 110A or 110B.Movable part 91a linear electric machine for example, by being made up of (not shown in Figure 32, the reference picture 33) opposing frame of drive device 95 110A or 110B are driven in X-direction.In substrate X steppings Conveyer 91 is provided with (not shown in Figure 32, the reference of position reading out device 97 of the measurement movable part 91a encoder of position etc. Figure 33).Also, drive device 95 is not limited to linear electric machine, also can be by use the electric rotating machine of ball screw or belt to be used as drive The drive mechanism in dynamic source is formed.

The movable part 91a of each substrate X steppings conveyer 91 X-direction shift motion, for example, the X-axis side of substrate P To about 2 times of length.Each fixed part 91b+X side ends, expose certain length from the past+X sides of air flotation cell group 84E, 84F.

Also, due to each substrate X steppings conveyer 91 movable part 91a (substrate adsorption face) must sorbing substrate P the back side, With desorb to be separated from substrate P, therefore also can the micro-move device of driven device 95 in Z-direction.Also, in fact, movable part Though 91a, which is sorbing substrate P, is displaced into X-direction, it is right below, in addition to the situation that need especially distinguish, does not distinguish substrate X steps Enter conveyer 91 and movable part 91a.

Also, in described above, substrate Y steppings conveyer 88 and each movable part of substrate X steppings conveyer 91, by In must carry out with the separation of substrate P, contact, therefore Z-direction can be also displaced into, but not limited to this, for progress movable part (substrate Adsorption plane) absorption to substrate P and the separation with substrate P can also be that the substrate for the back side part that absorption keeps substrate P is protected Hold tool PH (fine motion microscope carrier 26) and be displaced into Z-direction.

Weight payment device 28 supports fine motion microscope carrier 26 from below by levelling device 78.Weight payment device 28 configures In the opening of coarse motion platform 32, its first half is exposed to top, its lower half compared with coarse motion platform 32 and is exposed to lower section compared with coarse motion platform 32.

Weight offsets device 28, as shown in figure 32, has basket 64, air spring 66 and Z saddles 68 etc., for example, with The later each embodiment identical of above-mentioned 2nd embodiment is formed.That is, the baseplate carrier device of this 7th embodiment In PSTf, Z saddles 68 double as the fixed part for levelling device 78, are not provided with sealing gasket, weight payment device 28 and fine motion microscope carrier 26 integrations.Also, because weight payment device 28 is integrated with fine motion microscope carrier 26, therefore maximum weight payment device 28 is independent Link device 80 (flexure devices) of motion etc. is simultaneously not provided with.Fine motion microscope carrier 26, be by with Figure 32 with bulbous member The spherical bearing that schematically shows intends levelling device 78 like spherical bearing tectosome, inclination freely (with respect to X/Y plane in θ x and θ y directions swing freely) be supported on Z saddles 68.

Weight offset device 28 and by levelling device 78 be supported in weight offset device 28 top form part it is (micro- Dynamic load platform 26 and substrate holding PH etc.), by a pair of X voice coil motors 54X effect, X is displaced into coarse motion platform 32 one Direction of principal axis.That is, top forms part (fine motion microscope carrier 26 and substrate holding PH etc.), by the control of main control unit 50, The driving synchronous with coarse motion platform 32 of weight payment device 28 is supported in (with the Tongfang of coarse motion platform 32 using a pair of X voice coil motors 54X To, with speed drive), X-direction is displaced into predetermined stroke together with coarse motion platform 32 according to this.Also, top forms part (fine motion Microscope carrier 26 and substrate holding PH etc.), by the control of main control unit 50, pass through a pair of X voice coil motors 54X, a pair of Y voice coil loudspeaker voice coils Motor 54Y and 4 Z voice coil motor 54Z, with respect to coarse motion platform 32 by micro-move device in 6DOF direction.

In this 7th embodiment, coarse motion platform 32, weight payment device 28, fine motion microscope carrier 26 and substrate holding PH are included Deng, form with substrate P be integrally displaced into X-direction moving body (it is following, appropriate title baseplate carrier (26,28,32, PH)).

As shown in Figure 30 and Figure 31, near the X-direction center of the Y direction two sides of fine motion microscope carrier 26, lead to respectively Moving lens supporting member (not shown) is crossed, same with the 5th embodiment is provided with by flat with reflecting surface orthogonal to X-axis A pair of X moving lens 94X that face speculum (or corner cube) is formed₁、94X₂.In-Y sides the side of fine motion microscope carrier 26, such as Figure 32 It is shown, by speculum holding member (not shown), it is fixed with by the strip plane reflection with reflecting surface orthogonal to Y-axis The Y moving lens 94Y that mirror is formed.

In this 7th embodiment, the positional information in the X/Y plane of fine motion microscope carrier 26 (substrate holding PH), be with it is above-mentioned Each embodiment it is same pass through baseplate carrier interferometer system 98 (reference picture 33), such as the resolution with 0.5~1nm degree Power is detected at any time.Also, in fact, baseplate carrier interferometer system 98, as shown in Figure 31 and Figure 33, possesses and is moved with a pair of X Index glass 94X₁、94X₂Corresponding a pair of X laser interferometer (hreinafter referred to as X interferometers) 98X₁、98X₂And with Y moving lens 94Y Corresponding a pair of Y laser interferometer (hreinafter referred to as Y interferometers) 98Y₁、98Y₂.X interferometers 98X₁、98X₂And Y interferometers 98Y₁、98Y₂Measurement result be provided to main control unit 50 (reference picture 33).

A pair of X interferometers 98X₁、98X₂It is each, be to be separately fixed at each one end (bottom) as shown in figure 32 It is fixed on the other end from framework (X interferometers framework) 102A, the 102B of +X direction interference with L-shaped of-X side frames platform 18 (upper end).Herein, as framework 102A, 102B, due to being the thing using L-shaped, therefore can avoid framework 102A, 102B with it is upper State framework 110A, 110B and be displaced into the interference of the coarse motion platform 32 of X-direction.

Also, a pair of X interferometers 98X₁、98X₂It is and a pair of X moving lens 94X₁、94X₂To low above compared with substrate P Position in Y direction configure in the position in the gap that can be contained between substrate holding PH and air flotation cell group 84E or 84F. Accordingly, in the baseplate carrier device PSTf of this embodiment, a pair of X interferometers 98X₁、98X₂With being arranged on substrate holding PH's The situation of position outside X-direction moving range is compared, and is configurable on the position for the pallet 18 for being closer to-X sides.

Also, X interferometers 98X₁、98X₂In intended party, such as X interferometers 98X₂, it is use by 2 as shown in figure 30 X moving lens 94X is irradiated in the interferometer beam (measuring beam) of Z-direction separation₂Multi-axis interferometer.After its reason remains Chat.

Also, as X interferometers, however it is not limited to a pair of X moving lens 94X₁、94X₂Each irradiate interferometer beam respectively A pair of X interferometers 98X of (measuring beam)₁、98X₂, also injection can be used to include and be irradiated in a pair of X moving lens 94X₁、94X₂'s The multi-axis interferometer of a plurality of measuring beam of each at least each 1 measuring beam.

A pair of Y interferometers 98Y₁、98Y₂, as shown in figure 31, be disposed on form air flotation cell group 84F closest to substrate Keep between the air flotation cell row of tool PH the 1st row and the air flotation cell row of the adjacent with this 2nd row and with forming the 1st row gas The adjacent air flotation cell near X-direction center of floating cell columns to each other 2 at gap to position.Between this is at 2 Gap is the Y-axis relative to logical exposure area IA centers into symmetrical gap.A pair of Y interferometers 98Y₁、98Y₂, as shown in figure 32, it is By and Y moving lens 94Y to and with formed air flotation cell group 84F air flotation cell separate (non-contact) in a manner of, be fixed on and set Supporting member 104 ' above said frame 110B is above.It is from a pair of Y interferometers 98Y in this embodiment₁、98Y₂Respectively Measuring beam (surveying long light beam) is irradiated to Y moving lens 94Y by gap at above-mentioned 2.Also, will supporting Y interferometers 98Y₁、98Y₂'s When supporting member is installed on framework 110B situation, to make the measuring basis of Y interferometers be projection optics system PL, framework 110B is most It is that can be located at the pallet 18 integrated with projection optics system PL well.Or it can not will also support Y interferometers 98Y₁、98Y₂Supporting Component 104 ' is fixed on the framework 110B for being located at ground and is directly fixed on pallet 18.

As Y interferometers, it is not limited to do a pair of Y of 94Y other irradiation interferometer beams (measuring beam) of Y moving lens Interferometer 98Y₁、98Y₂, the multi-axis interferometer that 2 measuring beams are irradiated to Y moving lens 94Y also can be used.

In this embodiment, X interferometers 98X₁、98X₂It is located at the surface compared with substrate P (during in exposure, to make in Z-direction This face is consistent with projection optics system PL image planes, carries out focusing, the leveling control of substrate P) low position, therefore the survey of X position Measure Abbe caused by the postural change (pitching, pitching) that fine motion microscope carrier 26 when X-direction moves can be included in result Error.Main control unit 50 passes through the X interferometers 98X that is formed with above-mentioned multi-axis interferometer₂The pitching amount of fine motion microscope carrier 26 is detected, According to the testing result, X interferometers 98X is carried out₁、98X₂Contained above-mentioned Abbe error repaiies in the X position measurement result measured Just.That is, to carry out the amendment of the Abbe error, as X interferometers 98X₂, it is use to X moving lens 94X₂It is irradiated in Z axis side The multi-axis interferometer of 2 interferometer beams (measuring beam) that is, the pitching amount of detectable fine motion microscope carrier 26 to separation.

The composition of baseplate carrier device PSTf other parts is identical with baseplate carrier device PSTd.Also, baseplate carrier fills Each portion of composition and above-mentioned each embodiment beyond putting is identical (30~Figure 33 of reference picture).

Then, the one of the processing substrate that the exposure device 700 for the embodiment of sheet the 7th for illustrating to form in the above described manner is carried out The action of consecutive.Herein, it is the situation for carrying out the 2nd layer of later exposure to substrate P, according to Figure 34~figure as one 49 are illustrated.Also, the exposure area IA shown in Figure 34~Figure 49, illumination light IL shines through projection optics system PL when being exposure The illumination region penetrated, in fact, will not be formed when beyond exposure, but to close the position between substrate P and projection optics system PL System is clearly shown at any time.

First, under the management of main control unit 50, carried out by mask carrying device (not shown) (mask loader) Mask M is loaded to the loading on mask microscope carrier MST and acted, and device is moved into by substrate (not shown) and enters to be about to substrate P to remove Enter and move into action on (input) baseplate carrier device PSTf.In substrate P, the exposure before front layer is provided with each irradiation area Light time, such as shown in Figure 31, there is multiple total 6 irradiation area SA1~SA4 with such as X-direction 2, Y direction 3 Together, the multiple alignment marks (not shown) being transferred simultaneously with the pattern of each irradiation area.

Main control unit 50, as shown in figure 34, moved into device is moved into substrate above the air flotation cell group 84F of-Y sides Substrate P, using air flotation cell group 84F by suspension bearing, while being inhaled using the substrate X steppings conveyer 91 of-Y sides Attached holding, as shown in blacking arrow in Figure 34, transported toward -X direction.

Secondly, main control unit 50, kept using the absorption of substrate Y steppings conveyer 88 of the most+X sides of-Y sides by gas The substrate P of floating one-element group 84F suspension bearings, and release substrate X steppings 91 absorption to substrate P of conveyer.Then, main control Device 50, using substrate Y steppings conveyer 88, substrate P is transported in +Y direction as shown in dotted arrow in Figure 34.

Accordingly, as shown in figure 35, substrate P is to be loaded-Y the sides across substrate holding PH and substrate holding PH An air flotation cell group 84F part.Now, substrate P is by substrate holding PH and air flotation cell group 84F part suspension branch Hold.Then, substrate holding PH is switched into attraction from exhaust by main control unit 50.Accordingly, become with substrate holding PH adsorbs a fixed substrate P part (about the 1/3 of substrate P entirety), with air flotation cell group 84F a part of suspension bearing substrate The state of a P part (substrate P all remaining about 2/3).Now, appoint to enter at least two alignment mark in substrate P One alignment detects the visual field of system and come on substrate holding PH, and substrate P is loaded across substrate holding PH and air supporting list A first group 84F part.

And then after aforesaid substrate keeps absorption actions of the tool PH to substrate P to start, released by main control unit 50 Substrate Y steppings 88 absorption to substrate P of conveyer, substrate Y steppings conveyer 88 (movable part 88a) are returned to shown in Figure 36 - Y sides movement limit positions position of readiness.Now, substrate X steppings conveyer 91 (movable part 91a), also by main control Device 50, return to the position of readiness of the movement of-X sides shown in Figure 36 limit positions.

Afterwards, by main control unit 50, to obtain fine motion microscope carrier 26 with existing identical alignment measuring method, (substrate is protected Hold tool PH) relative projection optics system PL position, the Position Approximate of fine motion microscope carrier 26 relative with substrate P.Also, substrate P is mutually in micro- Dynamic load platform 26 can omit to locating tab assembly.

Then, main control unit 50 drives fine motion microscope carrier 26 to make in substrate P according to above-mentioned measurement result by coarse motion platform 32 At least two alignment mark be moved to it is any alignment detection system the visual field in, with carry out substrate P with respect to projection optics system PL pair Locating tab assembly, according to the result, obtain to carry out the scanning starting position of the exposure of the irradiation area SA1 in substrate P.Herein, it is The scanning being exposed, acceleration area and deceleration interval is included before and after constant speed movement section during due to scan exposure, therefore Strictly speaking, scanning starting position is to accelerate starting position.Then, main control unit 50 drives coarse motion platform 32 and micro-move device fine motion Microscope carrier 26, substrate P is positioned at the scanning starting position (acceleration starting position).Now, (the substrate holding of fine motion microscope carrier 26 is carried out Have PH) relative to accurate micro- Locating driver of the X-axis of coarse motion platform 32, Y-axis and θ z directions (or 6DOF direction).In Figure 36 Show in this way to be positioned at substrate P and (accelerate to carry out the scanning starting position of irradiation area SA1 exposure in substrate P Starting position) a moment afterwards state.

Afterwards, the exposure actions of step-scan mode are carried out.

The exposure actions of step-scan mode are sequentially to be exposed place to multiple irradiation area SA1~SA6 in substrate P Reason.Substrate P is to accelerate the set acceleration time in X-direction, afterwards by given time etc. at scanning motion (X scanning motions) Speed driving (in the driving of this constant speed, is exposed (scan exposure)), then carries out the deceleration with acceleration time same time afterwards. Also, substrate is in X-axis or Y direction (following, difference by appropriate driving (when being moved between irradiation area) in stepwise operation Claim X stepwise operations, Y stepwise operations).In this embodiment, the maximum exposure of each irradiation area SAn (n=1,2,3,4,5,6) is wide Spend about 1/3 that (width of Y direction) is substrate P.

Specifically, exposure actions are to carry out in the following manner.

From Figure 36 state, baseplate carrier (26,28,32, PH) as applied in Figure 36 shown in white arrow, be driven to-X sides To carrying out P X scanning motions.Now, mask M (mask microscope carrier MST) is synchronous with substrate P (fine motion microscope carrier 26) by past -X direction Driving, irradiation area SA1 can be by the exposure area IA of the view field of projection optics system PL mask M patterns, therefore, in this Scan exposures of the Shi Jinhang to irradiation area SA1.Scan exposure, it is in the past -X direction of fine motion microscope carrier 26 (substrate holding PH) Acceleration after constant speed movement in, illumination light IL is irradiated to substrate P via mask M, projection optics system PL and carried out.

When above-mentioned X scanning motions, main control unit 50 adsorbs by a part (about the 1/3 of substrate P entirety) for substrate P It is fixed on the substrate holding PH for being mounted in fine motion microscope carrier 26, a part (about the 2/3 of substrate P entirety) suspension branch by substrate P In the state of holding on air flotation cell group 84F, driving baseplate carrier (26,28,32, PH).Now, main control unit 50 is according to X The measurement result of linear encoder system 46 is driven coarse motion platform 32 in X-direction by x-ray motor 42, and is carried according to substrate Platform interferometer system 98, the measurement result of Z inclination measurements system 76, driving fine motion microscope carrier drivetrain 52 (each voice coil motor 54X, 54Y、54Z).Accordingly, substrate P i.e. together with fine motion microscope carrier 26, by one be supported on weight payment device 28 in the state of, X-direction is displaced into by a pair of X voice coil motors 54X effect and the one of coarse motion platform 32, and by from coarse motion platform 32 Relative driving, accurate position control is carried out in X-axis, Y-axis, Z axis, θ x, θ y and θ z all directions (6DOF direction).In addition, Main control unit 50 is synchronous with fine motion microscope carrier 26 (substrate holding PH) when X scanning motions, according to mask interferometer system 14 Measurement result will keep mask M mask microscope carrier MST turntable drivings and micro-move device is in Y direction and θ z sides in X-direction To.Shown in Figure 37 and irradiation area SA1 scan exposure terminated, keep a part for substrate P baseplate carrier (26,28, 32nd, PH) stop state.

Then, main control unit 50, to enter the acceleration of the exposure of places one, applied in Figure 37 shown in white arrow, enter to be about to substrate P Slightly drive the X stepwise operations in the substrate P of +X direction.The X stepwise operations of substrate P, it is with dynamic with X scannings by main control unit 50 Make same state-driven (but, position deviation on the move and be any limitation as not as strict as scanning motion) baseplate carrier (26,28,32, PH) carry out.Main control unit 50 and the X stepwise operations of substrate P are parallel, mask microscope carrier MST is returned to acceleration Starting position.

Then, after X stepwise operations, main control unit 50 start substrate P (baseplate carrier (26,28,32, PH)) and mask M (mask microscope carrier MST) -X direction accelerates, similar to the above to be scanned exposure to irradiation area SA2.Shown in Figure 38 Irradiation area SA2 scan exposure is terminated, baseplate carrier (26,28,32, PH) state that stops.

Then, the Y stepwise operations for making the unexposed area of substrate P be moved on substrate holding PH are carried out.This base Plate P Y stepwise operations, it is with (the movable part of substrate Y steppings conveyer 88 of-Y sides and most-X sides by main control unit 50 88a) absorption keeps the back side in the substrate P of state shown in Figure 38, is releasing absorption of the substrate holding PH to the substrate P Afterwards, in the exhaust by the pressure-air from substrate holding PH and the row of the air flotation cell group 84F pressure-air to continue Gas makes in the state of substrate P suspends, as shown in dotted arrow in Figure 38, with substrate Y steppings conveyer 88 by the past+Y sides of substrate P Carried out according to this to conveyance.In this way, opposing substrate keeps tool PH only substrate Ps to be moved toward +Y direction, as shown in figure 39, substrate P is quilt Be assembled into unexposed irradiation area SA3, SA4 to in substrate holding PH, across substrate holding PH and air flotation cell group The state of a 84E part and an air flotation cell group 84F part.Now, substrate P is by substrate holding PH and air flotation cell A group 84E part and air flotation cell group 84F a part of suspension bearing.Then, by main control unit 50 by substrate holding PH switches to air-breathing (attraction) from exhaust.Accordingly, become with a substrate holding PH absorption fixed substrates P part (substrate P It is all about 1/3), with the one of an air flotation cell group 84E part and air flotation cell group 84F a part of suspension bearing substrate P The partly state of (substrate P all remaining about 2/3).And then absorption actions of the tool PH to substrate P is kept to open in aforesaid substrate After beginning, substrate Y steppings 88 absorption to substrate P of conveyer is released by main control unit 50.

Then, it is new to being pre-set on locating tab assembly that is, progress substrate P with respect to projection optics system PL to carry out substrate P A time irradiation area alignment mark measurement.When this is to locating tab assembly, to make the alignment mark of measurement object enter alignment In the detection visual field for detecting system, aforesaid substrate P X stepwise operations (the painting white arrow of reference picture 40) are optionally carried out.

Then, when substrate P with respect to projection optics system PL it is new to locating tab assembly at the end of, i.e., by the basis of main control unit 50 The result, carry out the X-axis of the relative coarse motion platform 32 of fine motion microscope carrier 26, Y-axis and θ z directions (or 6DOF direction) it is accurate micro- fixed Position driving.

Then, the acceleration of substrate P and mask M +X direction (whitewashes arrow in reference picture 41 by control device 50 Head), carry out the scan exposure same as described above to irradiation area SA3.Show that the scanning to irradiation area SA3 exposes in Figure 41 Light terminates, baseplate carrier (26,28,32, PH) stop state.

Secondly, be the acceleration exposed into places one by main control unit 50, and enter to be about to baseplate carrier (26,28,32, PH) Toward -X direction driving substrate P X stepwise operations and make mask microscope carrier MST return to accelerate starting position action after, start base Plate P and mask M +X direction accelerate (the painting white arrow in reference picture 42), by with it is above-mentioned it is same in a manner of carry out to irradiation area SA4 scan exposure.Shown in Figure 42 and irradiation area SA4 scan exposure terminated, baseplate carrier (26,28,32, PH) stop State only.

Then, the Y stepwise operations for making the unexposed area of substrate P be moved on substrate holding PH are carried out.In this During the Y stepwise operations of substrate P, main control unit 50 is with (the movable part of substrate Y steppings conveyer 88 of-Y sides and most+X sides 88a) absorption keeps the back side in the substrate P of state shown in Figure 42, is releasing absorption of the substrate holding PH to the substrate P Afterwards, in the exhaust by the pressure-air from substrate holding PH and air flotation cell group 84E and the 84F pressure-air to continue Exhaust make in the state of substrate P suspends, as shown in blacking arrow in Figure 42, with substrate Y steppings conveyer 88 toward +Y direction Transport substrate P.In this way, opposing substrate keeps tool PH only substrate Ps to move (reference picture 43) toward Y direction.Now, in above-mentioned-Y The shorter occasion of the stroke of the substrate Y steppings conveyer 88 of side, it can be transported by the substrate Y steppings of the use+Y sides of main control unit 50 Send the conveyance (reference picture 44) that device 88 continues substrate P.Continued to carry out this, main control unit 50 can walk the substrate Y of+Y sides Enter conveyer 88 (movable part 88a) to drive in -Y direction in advance, make it in substrate holding PH nearby standby (reference picture 43)。

It is moved to substrate toward +Y direction driving, unexposed irradiation area SA5, SA6 by substrate Y steppings conveyer 88 and is protected The substrate P on tool PH is held, one part (about the 1/3 of substrate P entirety) is fixed again by substrate holding PH absorption In substrate holding PH, and a part (substrate P all remaining about 2/3) is then suspended branch by an air flotation cell group 84E part Hold.And then after aforesaid substrate keeps absorption actions of the tool PH to substrate P to start, substrate Y steps are released by main control unit 50 Enter absorption of the conveyer 88 to substrate P.Then, carry out substrate P with respect to projection optics system PL newly to locating tab assembly, Yi Jijin The measurement of time irradiation area alignment mark pre-set in row substrate P.When this is to locating tab assembly, to make measurement object Alignment mark optionally carries out aforesaid substrate P X stepwise operations (in reference picture 45 in the detection visual field of alignment detection system Painting white arrow).

Starting the aforesaid substrate P new eve to locating tab assembly, the air flotation cell group 84F in-Y sides, with not shown Substrate move into device and put into new substrate P (reference picture 45).Now, the movable part of the substrate X steppings conveyer 91 of-Y sides Position that 91a is moved near the Limitation Of Movement position of+X sides that is, the position being moved to below the substrate P newly put into, in this Position is standby.Also, the movable part 88a of the substrate Y steppings conveyer 88 of-Y sides and most-X sides, be by main control unit 50, As shown in blacking arrow in Figure 45, the Limitation Of Movement position of-Y sides is moved to.

On the other hand, (holding) is fixed to a part in substrate holding PH substrate P, when substrate P is with respect to projected light Be PL it is new to locating tab assembly at the end of, i.e., the relative coarse motion of fine motion microscope carrier 26 is carried out according to the result by main control unit 50 Accurate micro- Locating driver of the X-axis of platform 32, Y-axis and θ z directions (or 6DOF direction).Then, according to above-mentioned 1st irradiated region Program same with SA2 occasion domain SA1, the exposure to last 2 irradiation areas SA5, SA6 is carried out by main control unit 50. Shown in Figure 46 and then to the state after last irradiation area SA6 end exposure.

With above-mentioned exposing parallel to irradiation area SA5, SA6, the substrate P newly put into is by main control unit 50 with-Y The substrate X steppings conveyer 91 of side, which is adsorbed, keeps past-X sides conveyance (reference picture 46).

On the other hand, the substrate P of the exposure to all irradiation area SA1~SA6, the use+Y of main control unit 50 are finished The substrate Y steppings conveyer 88 of side and most-X sides, transported as applied the past+Y sides shown in white arrow in Figure 47 with dotted line, from base Plate keeps exiting and being carried on air flotation cell group 84E completely on tool PH.With this substantially simultaneously, the substrate P newly put into then by The substrate Y steppings conveyer 88 of the use-Y sides of main control unit 50 and most-X sides, as shown in blacking arrow in Figure 47 it is past+ Y sides transport, and irradiation area SA1, SA2 are located on substrate holding PH (reference picture 47).

The substrate P for the completion exposure being carried on air flotation cell group 84E, by the substrate of the use+Y sides of main control unit 50 X steppings conveyer 91, as shown in Figure 48 blacking arrow, transported toward +X direction, with the past+X of substrate conveyance device (not shown) Direction takes out of (reference picture 48, Figure 49).

It is parallel with taking out of for the substrate P of above-mentioned completion exposure, substrate P on to substrate holding PH carry out with it is above-mentioned After same alignment actions, that is, the +X direction for starting substrate P and mask M accelerates, by with it is above-mentioned it is same in a manner of carry out to initial Irradiation area SA2 scan exposure (reference picture 48, Figure 49).It is same when afterwards, with exposure to above-mentioned 1st plate base P Program, be repeated the action such as alignment (X steppings, Y steppings) to remaining irradiation area on the 2nd plate base P, exposure and Alignment (X steppings, Y steppings), exposure to the 3rd later substrate etc. act.

But, on the 2nd plate base P, the described above initially carried out by the above-mentioned exposure on to irradiation area SA2 can Know, in this embodiment, the 1st (odd number piece) substrate P and the 2nd (even slice) substrate P irradiation area exposure sequentially It is different.The exposure order of the 1st (odd number piece) substrate P is irradiation area SA1, SA2, SA3, SA4, SA5, SA6, relative to This, the exposure of the 2nd (even slice) substrate P is then irradiation area SA2, SA1, SA4, SA3, SA6, SA5 order.Certainly, expose Fairing sequence is not limited to this.

As described above, according to the exposure device 700 of this 7th embodiment, can obtain and above-mentioned 1st embodiment The equal effect of exposure device 100.In addition, the exposure device 700 of this 7th embodiment, is equipped on fine motion microscope carrier 26 Substrate holding PH is to maintain the part in the face of side opposite with the exposed surface of substrate P (processed surface).That is, substrate is kept It is small compared with substrate P to have PH substrate retaining surface, specifically, is set to about 1/3.Therefore, the instruction according to main control unit 50, When substrate Y steppings conveyer 88 takes out of substrate P from fine motion microscope carrier 26 (substrate holding PH), substrate P is toward Y direction The mode of displacement is transported in X/Y plane, and now, substrate Y steppings conveyer 88 only makes substrate P movement compared with the Y-axis of substrate P The small distance of direction size (width or length) that is, only make substrate P in the Y direction size of Y direction displacement and substrate P About 1/3 substrate holding PH Y direction width same distance, taking out of for substrate P terminate (referring for example to Figure 46, figure 47).In this way, in this embodiment, the displacement (taking out of distance) of substrate when substrate P takes out of is small compared with the size of substrate, because This is compared with prior art, and can shorten substrate takes out of the time.

Also, according to the exposure device 700 of this 7th embodiment, in the scan exposure knot to final irradiation area in substrate P The time point of beam, the substrate P that fine motion microscope carrier 26 (substrate holding PH) exposes in the position of a certain X-direction completion slide to Y direction side from substrate holding PH to take out of and (keep out of the way), with making from Y direction opposite side for this parallel (substantially simultaneously) Substrate P before exposure is slided to move on (input) substrate holding PH (reference picture 46 and Figure 47).

Also it is to make substrate P toward Y-axis in addition, when the substrate P before by exposure moves into fine motion microscope carrier 26 (substrate holding PH) The mode of direction displacement, according to the instruction of main control unit 50, removed by substrate Y steppings conveyer 88 in X/Y plane Send, now, substrate Y steppings conveyer 88 only needs the Y direction size (width for making substrate P toward Y direction displacement compared with substrate P Or length) small distance that is, with substrate holding PH Y direction width (about the 1/3 of the Y direction size of substrate P) phase Same distance, that is, terminate moving into for substrate P.Therefore, except substrate take out of the time in addition to, the time of moving into of substrate also can more previously contract It is short, as a result, the replacing construction of substrate can be shortened.

Also, main control unit 50 is configuration and the substrate holding PH of exposure order of the irradiation area in response to substrate P X-direction position, carry out that slip of the substrate P toward Y direction side from substrate holding PH takes out of and substrate P is from Y-axis side Slip on to opposite side toward substrate holding PH is moved into.Therefore, without as existing substrate is changed when as, make substrate holding PH The substrate for being moved to decision changes position (for example, position near the Limitation Of Movement position of +X direction).Accordingly, can be further Shortening substrate replacing construction.

Herein, the explanation in above-mentioned embodiment, though illustrate what the substrate P that exposure is completed took out of from substrate holding PH Direction is taken out of, is all the situation of +Y direction in any substrate, but the configuration of irradiation area and exposure order in optic placode, certainly At least one party in even number plate base and odd number plate base can be taken out of from substrate holding PH toward -Y direction.That is, In this embodiment, main control unit 50 is in a manner of most short, according to irradiation area in substrate P by the replacing construction of substrate Configuration and exposure order substrate holding PH X-direction position, the configuration and exposure of irradiation area toward in response to substrate P The direction (+Y direction or -Y direction) of order takes out of substrate P.Therefore, with no matter irradiation area (processed region) on substrate Configure and why is processing sequence, all compared in certain X position, toward the situation that equidirectional takes out of, when can shorten substrate replacing Between.

Also, the Y direction size of air flotation cell group 84E, 84F of substrate holding PH Y direction both sides bearing-surface, Be not limited to it is equal with the Y direction size of substrate P, can it is big compared with it, also can be smaller.

In addition, the Y direction size of substrate holding PH substrate retaining surface is not limited to the Y direction size of substrate P 1/3, can be 1/2,1/4 etc., as long as the Y direction size of substrate holding PH substrate retaining surface is compared with the Y-axis side of substrate P To more than the as low as a certain degree of size.In fact, the size for being set to the irradiation area with being formed in substrate P is equal (slightly big).

《8th embodiment》

Secondly, for the 8th embodiment, it is illustrated according to Figure 50~Figure 65.Herein, respectively implement with the above-mentioned 1st to the 7th Homomorphosis or equal composition part assign same or like symbol, and simplify or the description thereof will be omitted.

In Figure 50, air flotation cell group 84E, 84F etc. are omitted, the exposure device 800 for showing the 8th embodiment of outline Form.Also, Figure 51 is the top view for the part for eliminating exposure device 800.Figure 51 is equivalent to the projection optics system compared with Figure 50 The top view of part (compared with the part of the lower section of lens barrel platform 16) below PL.

The exposure device 800 of this 8th embodiment, the substantially 700 same structure of exposure device with above-mentioned 7th embodiment Into, but some is different by the baseplate carrier device PSTf of baseplate carrier device PSTg and the 7th embodiment.

Specifically, it is that use is not only Y as substrate holding PH as shown in figure 51 in baseplate carrier device PSTg The thing of direction of principal axis size and X-direction size (such as about 1/2 of substrate P) also small compared with the X-direction size of substrate P.Substrate is protected The Y direction size for holding tool PH is about the 1/2 of the Y direction size of substrate P.In addition, in substrate holding PH X-direction two Side is configured with a pair of the air flotation cells independent with substrate holding PH and fine motion microscope carrier 26 (movable air-float unit) 84G.A pair of gas Floating unit 84G's is each, is with the side of substantially equal (only lower slightly) height of its above and substrate holding PH as shown in figure 50 Formula, it is fixed on by supporting member 112 above coarse motion platform 32.A pair of air flotation cell 84G's is each, such as the length of Y direction Degree and substrate holding PH equal (or compared with substrate holding PH slightly short) and X-direction length is such as substrate holding About the 1/2 of PH.

Also, between substrate holding PH and a pair of air flotation cell 84G are each, as shown in figure 51, a pair of movements are configured with Substrate Y steppings conveyer 120.Dress is transported in each and aforesaid substrate Y steppings of a pair of moving substrate Y steppings conveyers 120 Put 88 to equally constitute, as shown in figure 50, be equipped on coarse motion platform 32.The movable part 120a of each moving substrate Y steppings conveyer 120 The fixed part 120b that can be relatively fixed on coarse motion platform 32 is displaced into Y direction.Therefore, each moving substrate Y stepping conveyers 120 can be displaced into X-direction together with coarse motion platform 32, and only can transport substrate P in Y direction.

Also, in the configuring area for a pair of air flotation cell groups 84E, 84F for being configured at substrate holding PH Y direction both sides Inside, it is each configured with transporting and filling with 3 substrate Y steppings conveyers 88 of the 7th embodiment identical and 1 substrate X stepping Put 91.But, as shown in figure 51, in this 8th embodiment, the 3 of each inside of air flotation cell group 84E, 84F configuring area Individual substrate Y steppings conveyer 88 and 1 substrate X steppings conveyer 91, it is the X-axis at the relative center by exposure area IA Balanced configuration.Further, since such a balanced configuration relation is employed, a pair of Y interferometers 98Y₁、98Y₂Allocation position with it is above-mentioned 7th embodiment is compared, and is relatively partial to+Y sides.

It is the slightly wide person of X beams 30A, 30B using Y direction width compared with the 7th embodiment also, as X beam 30A, 30B.In Above X beams 30A, 30B, for example, with aforesaid substrate bearing table device PST etc. it is same be fixed with each 2 x-ray guiding elements 36, in this X stators 38 are fixed between 2 x-ray guiding elements 36.The each multiple saddles 44 of each 2 x-ray guiding elements 36 are sticked in be consolidated It is scheduled on below coarse motion platform 32.Below coarse motion platform 32, it is fixed with together with X stators 38 and forms not scheming for x-ray motor The X shown can mover.

The composition of baseplate carrier device PSTg other parts is identical with the baseplate carrier device PSTf of the 7th embodiment. This occasion, a pair of X interferometers 98X₁、98X₂It is to be fixed into and the air supporting on fixed air flotation cell group 84E, 84F and coarse motion platform 32 Any one of unit 84G will not all produce interference, and can be close to a pair of X moving lens 94X₁、94X₂。

The composition of baseplate carrier device PSTg other parts is identical with the baseplate carrier device PSTf of the 7th embodiment. Therefore, in baseplate carrier device PSTg, kept comprising coarse motion platform 32, weight payment device 28, fine motion microscope carrier 26 and substrate The compositions such as tool PH are integrally displaced into the moving body of X-direction with substrate P.In this 8th embodiment, below, also by this moving body It is appropriate be referred to as baseplate carrier (26,28,32, PH).

Secondly, a series of action for the processing substrate that the exposure device 800 of this 8th embodiment is carried out is illustrated.Herein, For as an example, it is the occasion for carrying out the 2nd layer of later exposure to substrate P, is illustrated according to Figure 52~Figure 65.Also, Exposure area IA shown in Figure 52~Figure 65, illumination light IL passes through the illumination region of projection optics system PL irradiations when being exposure, In fact, will not be formed when beyond exposure, but to make the position relationship between substrate P and projection optics system PL clearly add at any time With display.

First, under the management of main control unit 50, carried out by mask carrying device (not shown) (mask loader) Mask M is loaded to the loading on mask microscope carrier MST and acted, and device is moved into by substrate (not shown) and enters to be about to substrate P to remove Enter and move into action on (input) baseplate carrier device PSTf.In substrate P, the exposure before front layer is provided with each irradiation area Light time, such as shown in Figure 51, there is multiple total 4 irradiation area SA1~SA4 with such as X-direction 2, Y direction 2 Together, the multiple alignment marks (not shown) being transferred simultaneously with the pattern of each irradiation area.

First, sequentially, as shown in figure 52, substrate P is filled according to the 1st plate base P identicals in above-mentioned 7th embodiment Carry into the air flotation cell group 84F of-Y sides across substrate holding PH Yu a substrate holding PH part.Now, substrate P is By a substrate holding PH and air flotation cell group 84F part and the air flotation cell 84G suspension bearings of+X sides.Then, by master control Substrate holding PH is switched to air-breathing (attraction) by device 50 processed from exhaust.Accordingly, turn into adsorb with substrate holding PH and fix A part (substrate P of the corresponding rectangular area comprising irradiation area SA1 all about 1/4) for substrate P, with air flotation cell group The state of a part for a 84F part and air flotation cell 84G suspension bearing substrate Ps (substrate P all remaining about 3/4).This When, protected to make at least two alignment mark in substrate P enter the visual field of any alignment detection system (not shown) and coming substrate Hold on tool PH, substrate P is to be assembled into the part and air flotation cell 84G across substrate holding PH and air flotation cell group 84F.

And then after aforesaid substrate keeps absorption actions of the tool PH to substrate P to start, base is released by main control unit 50 Plate Y steppings 88 absorption to substrate P of conveyer.Now, substrate Y steppings conveyer 88 (movable part 88a) and substrate X steppings Conveyer 91 (movable part 91a), respectively according to the instruction of main control unit 50, return to the standby position that limit positions are moved in-Y sides Put, the position of readiness of-X sides movement limit positions.

Afterwards, fine motion microscope carrier 26 is obtained with respect to projected light to be directed at measuring method with existing identical by main control unit 50 Be PL position, the general position of fine motion microscope carrier 26 relative with substrate P.Also, substrate P can be also omitted with respect to fine motion microscope carrier 26 To locating tab assembly.

Then, main control unit 50 drives fine motion microscope carrier 26 so that substrate P according to above-mentioned measurement result by coarse motion platform 32 On at least two alignment mark be moved to it is any alignment detection system the visual field in, carry out pair of the substrate P with respect to projection optics system PL Locating tab assembly, obtains that (acceleration starts to carry out the scanning starting position of exposure of the irradiation area SA1 in substrate P according to the result Position).Then, main control unit 50 drives coarse motion platform 32 and micro-move device fine motion microscope carrier 26, and substrate P is positioned at into the scanning and started Position (acceleration starting position).Now, X-axis, Y-axis and θ z directions (or the 6DOF of the relative coarse motion platform 32 of fine motion microscope carrier 26 are carried out Direction) accurate micro- Locating driver.Show and just completed substrate P being positioned in this way to carry out in substrate P in Figure 52 State behind the scanning starting position (acceleration starting position) of irradiation area SA1 exposure.

Afterwards, the exposure actions of step-scan mode are carried out.

The exposure actions of step-scan mode, it is that multiple irradiation area SA1~SA4 in substrate P are sequentially exposed Processing.Also it is the above-mentioned X scanning motions for carrying out substrate P, when stepwise operation when scanning motion in this 8th embodiment (when being moved between irradiation area), carry out the X stepwise operations or Y stepwise operations of substrate P.Herein, in this 8th embodiment, substrate P Though Y stepwise operations it is identical with the 7th embodiment, the X stepwise operations of substrate P are then as described later with the 7th embodiment phase It is different.In this 8th embodiment, the maximum exposure width (width of Y direction) of each irradiation area SAn (n=1,2,3,4) is base About the 1/2 of plate P.

Specifically, exposure actions are to carry out in the following manner.

Baseplate carrier (26,28,32, PH), from Figure 52 state, as applied in Figure 52 shown in white arrow, be driven to-X sides To carrying out the X scanning motions of substrate P.Now, mask M (mask microscope carrier MST) is driven synchronous with substrate P (fine motion microscope carrier 26) Trend -X direction, irradiation area SA1 can pass through the exposure region of the view field of the projection optics system PL mask M projected pattern Domain IA, therefore, in now carrying out the scan exposure to irradiation area SA1.Scan exposure is in (the substrate holding of fine motion microscope carrier 26 PH) toward in the constant speed movement after the acceleration of -X direction, illumination light IL is irradiated to substrate P through mask M, projection optics system PL and come Carry out.

When above-mentioned X scanning motions, main control unit 50 makes a part for substrate P (about the 1/4 of substrate P entirety) absorption The substrate holding PH that is fixed on fine motion microscope carrier 26, make a part (the substrate P all about 3/4) suspension bearing of substrate P in In the state of an air flotation cell group 84F part and the air flotation cell 84G of+X sides, driving baseplate carrier (26,28,32, PH).This When, main control unit 50 by with it is above-mentioned it is same in a manner of, coarse motion platform 32 is driven in X-direction and drives fine motion microscope carrier drivetrain 52.Accordingly, substrate P i.e. together with fine motion microscope carrier 26, by one be supported on weight payment device 28 in the state of, pass through one Effect to X voice coil motors 54X, X-direction is displaced into coarse motion platform 32 one, and passes through the relative drive from coarse motion platform 32 It is dynamic, it is carried out at the precise position control of X-axis, Y-axis, Z axis, θ x, θ y and θ z all directions (6DOF direction).In addition, main control Device 50 is synchronous with fine motion microscope carrier 26 (substrate holding PH) to sweep the mask microscope carrier MST for keeping mask M when X scanning motions Driving (in Y direction and θ z directions micro-move device) is retouched in X-direction.The scan exposure to irradiation area SA1 is shown in Figure 53 Terminate, baseplate carrier (26,28,32, PH) stop state.

Secondly, the X stepwise operations for making a time irradiation area SA2 for substrate P be moved on substrate holding PH are carried out. The X stepwise operations of this substrate P are the back side of substrate P of state as shown in main control unit 50 by Figure 53 with the substrate of-Y sides X steppings conveyer 91 (movable part 91a) is adsorbed holding, and after substrate holding PH absorption is released, by from The exhaust of substrate holding PH pressure-air and the air flotation cell group 84F and+X side air flotation cell 84G pressure-air to continue Exhaust, substrate P is suspended.Accordingly, substrate P becomes the shape only kept by substrate X steppings conveyer 91 (movable part 91a) State.

Secondly, main control unit 50 is maintaining the situation only with substrate X steppings conveyer 91 to the hold mode of substrate P Under, as in Figure 53 apply white arrow shown in, start by baseplate carrier (26,28,32, PH) drive in the substrate P of +X direction X step Enter.Accordingly, i.e., in the state of substrate P stops at the position before X steppings start, substrate holding PH moves relative to this substrate P In +X direction.Then, when main control unit 50 reaches a time irradiation area SA2 for substrate P underface in substrate holding PH, Even if baseplate carrier (26,28,32, PH) stop (reference picture 54).Now, substrate P be assembled into across substrate holding PH with An air flotation cell group 84F part and the air flotation cell 84G of-X sides.From substrate holding PH, air flotation cell group 84F and air supporting Pressure-air is sprayed above unit 84G, substrate P is suspended supporting.

With the baseplate carriers of the above-mentioned X steppings for substrate P (26,28,32, PH) driving it is parallel, main control unit 50 Mask microscope carrier MST is set to return to set acceleration starting position.

Afterwards, absorption and substrate X stepping conveyer 91 absorption to substrate P of the substrate holding PH to substrate P are carried out Release, the positioning (reference with the substrate P to locating tab assembly and using fine motion microscope carrier 26 using alignment mark new in substrate P White arrow is applied in Figure 54).Afterwards, baseplate carrier (26,28,32, PH) it is synchronous with mask microscope carrier MST, as applied white arrow in Figure 55 It is shown, -X direction is displaced into, enters the irradiation area SA2 of places one scan exposure according to this.Irradiation area SA2 is shown in Figure 56 End exposure after, baseplate carrier (26,28,32, PH) stop state.

Secondly, the Y stepwise operations for making a time irradiation area SA3 for substrate P be moved on substrate holding PH are carried out. The Y stepwise operations of this substrate P are to be carried out as follows.That is, main control unit 50 is by the back side of the substrate P in state shown in Figure 56 Holding is adsorbed with the moving substrate Y steppings conveyer 120 (movable part 120a) of-X sides, and releases substrate holding PH Absorption to substrate P.Afterwards, main control unit 50, in the exhaust and air supporting by the pressure-air from substrate holding PH In the state of the exhaust of the one-element group 84F and air flotation cell 84G pressure-air to continue makes substrate P suspension, such as dotted line in Figure 56 Apply shown in white arrow, transported substrate P toward +Y direction with the moving substrate Y steppings conveyer 120 of-X sides.Accordingly, only substrate P opposing substrates keep tool PH to move (reference picture 57) toward +Y direction.Now, the moving substrate Y steppings conveyer 120 of-X sides Stroke deficiency situation when, main control unit 50 can be used positioned at most-X sides+Y sides substrate Y steppings conveyer 88 The conveyance (the blacking arrow in reference picture 58) for the substrate P that continues.

Now, substrate P is to be assembled into the part across substrate holding PH and air flotation cell group 84E and the gas of-X sides Floating unit 84G.Pressure-air, substrate P quilt are sprayed above substrate holding PH, air flotation cell group 84E and air flotation cell 84G Suspension bearing.

Afterwards, absorption and moving substrate Y stepping conveyer 120 of the substrate holding PH to substrate P are carried out to substrate P Absorption is released, (joined using the positioning of the substrate P to locating tab assembly and using fine motion microscope carrier 26 of alignment mark new in substrate P According to the painting white arrow in Figure 57 or Figure 58).Afterwards, baseplate carrier (26,28,32, PH), such as Figure 59 synchronous with mask microscope carrier MST Shown in middle painting white arrow, +X direction movement is displaced into, enters the irradiation area SA3 of places one scan exposure according to this.Shown in Figure 60 After irradiation area SA3 end exposure, baseplate carrier (26,28,32, PH) state that stops.

Secondly, the X stepwise operations for making a time irradiation area SA4 for substrate P be moved on substrate holding PH are carried out. The X stepwise operations of this substrate P are to be carried out as follows.

That is, main control unit 50 transports at the back side of the substrate P in state shown in Figure 60 with the substrate X steppings of+Y sides Device 91 (movable part 91a) is adsorbed holding, and after releasing substrate holding PH absorption, the height from substrate holding PH The exhaust and the exhaust of the air flotation cell group 84E and-X side air flotation cell 84G pressure-air to continue for pressing air hang substrate P It is floating.Accordingly, substrate P turns into the state only kept by substrate X steppings conveyer 91 (movable part 91a).

Then, main control unit 50 is maintaining only situation of the substrate X steppings conveyer 91 to the hold mode of substrate P Under, as applied in Figure 60 shown in white arrow, start by baseplate carrier (26,28,32, PH) drive X steppings in -X direction.Accordingly, Substrate P, i.e., stop at baseplate carrier (26,28,32, PH) X steppings start before position in the state of, substrate holding PH -X direction is displaced into respect to this substrate P.Then, main control unit 50 reaches a time irradiated region for substrate P in substrate holding PH During domain SA4 underface, make baseplate carrier (26,28,32, PH) stop (reference picture 61).Now, substrate P be assembled into across A substrate holding PH and air flotation cell group 84E part and the air flotation cell 84G of+X sides.From substrate holding PH, air supporting list Pressure-air is sprayed above first group 84E and air flotation cell 84G, substrate P is suspended supporting.

With aforesaid substrate microscope carrier (26,28,32, PH) stepper drive it is parallel, main control unit 50 returns mask microscope carrier MST To set acceleration starting position.

Afterwards, absorption and substrate X stepping conveyer 91 absorption to substrate P of the substrate holding PH to substrate P are carried out Release, the positioning (reference picture 61 to locating tab assembly, with the substrate P using fine motion microscope carrier 26 using alignment mark new in substrate P Middle painting white arrow).Afterwards, as in Figure 62 apply white arrow shown in, by baseplate carrier (26,28,32, PH) with mask microscope carrier MST Synchronizing moving enters the irradiation area SA4 of places one scan exposure in +X direction according to this.Show irradiation area SA4's in Figure 63 After end exposure, baseplate carrier (26,28,32, PH) stop state.

Before the scan exposure of the irradiation area SA4 on aforesaid substrate P, the substrate X steppings conveyer 91 of-Y sides can Dynamic portion 91a prepares moving into for a time substrate, is driven by main control unit 50 to the standby position near the Limitation Of Movement position of+X sides Put, it is standby (blacking arrow reference in Figure 62) in the position.

Then, it is parallel with the scan exposure of the irradiation area SA4 on aforesaid substrate P, dress is moved into by substrate (not shown) The substrate P that newly will be put on air flotation cell group 84F is put, by main control unit 50 with the substrate X steppings conveyer 91 of-Y sides (movable part 91a) is adsorbed holding conveyance to-X sides (applying white arrow in reference picture 63).

On the other hand, to the substrate P of all irradiation area SA1~SA4 end exposure, by the use+X of main control unit 50 The moving substrate Y steppings conveyer 120 of side, the past+Y sides conveyance as shown in Figure 63 with dotted arrow, from substrate holding Exit and be carried on the air flotation cell group 84E of+Y sides completely on PH.Now, the moving substrate Y steppings in above-mentioned+X sides are transported During the situation of the stroke deficiency of device 120, the substrate Y steppings conveyer 88 of+Y sides and most+X sides can be used in main control unit 50 The conveyance (reference picture 64) of substrate is carried out to continue.With this substantially simultaneously, the substrate P newly put into, made by main control unit 50 With the substrate Y steppings conveyer 88 of-Y sides and most+X sides, as shown in blacking arrow in Figure 64, past+Y sides conveyance, make irradiated region Domain SA1 is located on substrate holding (reference picture 64).

The substrate P for the completion exposure being transported on air flotation cell group 84E, by the substrate of the use+Y sides of main control unit 50 X steppings conveyer 91 is transported toward +X direction, and (reference picture 64, figure are taken out of toward +X direction by substrate conveyance device (not shown) 65)。

It is parallel with taking out of for the substrate P of above-mentioned completion exposure, substrate holding PH substrate P is held in a part, After alignment actions same as described above are carried out, that is, start the acceleration of substrate P and mask M +X direction, with it is above-mentioned same Mode carries out the scan exposure (reference picture 65) to irradiation area SA1 at first.Afterwards, with the exposure to above-mentioned 1st plate base P Light time identical order, the alignment (X steppings, Y steppings) to remaining irradiation area in the 2nd later substrate P is repeated, exposes Light etc. acts, and alignment (X steppings, Y steppings) to the 3rd later substrate, exposure etc. act.This occasion, odd number piece Any one of substrate P and the substrate P of even slice, all it is with irradiation area SA1, SA2, SA3, SA4 sequential exposure.

The exposure device 800 of the embodiment of sheet the 8th from the description above, except that can obtain and above-mentioned 7th embodiment The equal effect of exposure device 700 outside, can by substrate holding PH, carry the substrate holding PH fine motion microscope carrier 26 and branch Hold this weight payment device 28, do compared with the 1st embodiment more light weight, exquisiteness.

《Variation》

In the exposure device of above-mentioned each embodiment, it also can be used and substrate P kept integral and air flotation cell can be passed through Make the supporting member for substrate of its frame-shaped integrally to be suspended with substrate P.Hereinafter, as one, for by such a supporting member for substrate Suitable for the situation of the exposure device 800 of the 8th embodiment, it is illustrated according to Figure 66.

Supporting member for substrate 69, as shown in Figure 66, there is the profile for overlooking rectangular (substantially square shape), by central portion With penetrated in Z-direction vertical view rectangular aperture portion, thickness direction size small (thin) frame-shaped component form.Substrate supporting structure Part 69, there are a pair using X-direction as long side direction, the plate-like members parallel with X/Y plane using predetermined distance in Y direction X frame components 61x, a pair of X frame components 61x put down respectively in+X sides, the end of-X sides by long side direction and XY of Y direction The Y frame components 61y of the parallel plate-like members in face is connected.A pair of X frame component 61x's and a pair of Y frame components 61y is each, From the viewpoint of rigidity and lightweight is ensured, with the fibre such as GFRP (Glass Fiber Reinforced Plastics) It is preferable that dimension strengthens the former such as synthetic resin material or ceramics.

Above the X frame components 61x of-Y sides, the Y moving lens 94Y that there is reflecting surface in the face of-Y sides is fixed with.Also, Above the Y frame components 61y of-X sides, it is fixed with and is moved by the X that there is the plane mirror of reflecting surface to form in the face of-X sides Index glass 94X.This occasion, X moving lens, Y moving lens need not be all set in any one of substrate holding PH and fine motion microscope carrier 26.

Positional information (rotation information in the directions of z containing θ) in the X/Y plane of supporting member for substrate 69 (that is, substrate P), it is To survey a pair of X interferometers 98X of long light beam comprising the reflecting surface irradiation to X moving lens 94X₁、98X₂And to the anti-of Y moving lens 94Y Penetrate a pair of Y interferometers 98Y that long light beam is surveyed in face irradiation₁、98Y₂Aforesaid substrate microscope carrier interferometer system 98, with such as 0.5nm journeys The capacity of decomposition of degree is detected at any time.

Also, X interferometers, Y interferometers are considered respectively in the mobile possible range of supporting member for substrate 69, it is at least one Corresponding moving lens can be irradiated to by surveying long light beam, come optical axis number or the interval for setting its number of units and/or surveying long light beam.Therefore, respectively The number of units (optical axis number) of interferometer is not limited to 2, the shift motion of optic placode supporting member, for example, can only be 1 (1 axle), Or more than 3 (3 axle).

Supporting member for substrate 69 has multiple, such as 4 ends (periphery edge) by substrate P from below with vacuum suction The holding unit 65 kept.4 holding units 65 be in X-direction separation, it is each each other in a pair of X frame components 61x To to being provided with 2 to face.Also, the quantity and configuration not limited to this of holding unit, such as visual size of substrate, easily scratch The appropriate addition such as curvature.In addition, holding unit is also mountable to Y frame components.Holding unit 65, have and be for example provided with above it For the section L-shaped substrate loading component of the absorption layer of the sorbing substrate P in a manner of vacuum suction, with by the substrate loading component X frame components 61x parallel flat spring is connected to, substrate loading component is configured to relative X frame components 61x in X-direction and Y-axis side It can not be rotated to its position of the rigid restraint by parallel flat spring, and by the elasticity of flat spring toward θ x directions and past Z axis side To displacement (dynamic up and down).With such a holding unit 65 and the substrate holding frame for the 69 identical composition of supporting member for substrate for possessing this, Such as detailed it is exposed in No. 2011/0042874 specification of U.S. Patent Application Publication No..

In Figure 66 variation, in the X steppings of substrate P or Y stepwise operations or substrate P to baseplate carrier device PSTg Take out of fashionable, main control unit 50 can transport dress by movable part 91a or substrate the Y stepping of substrate X steppings conveyer 91 88 movable part 88a is put, to adsorb any X frames component 61x or any Y frame component 61y for keeping supporting member for substrate 69, also may be used Absorption keeps substrate P.

, can be by being fixed on X moving lens 94X, Y moving lens 94Y of supporting member for substrate 69 with base in Figure 66 variation Onboard interferometer system 98 measures the position of substrate P, therefore, the 1st is carried out to substrate P in the exposure device using this variation , also can be according to the positional information of the substrate P measured with baseplate carrier interferometer system 98, according to design load during the situation of the exposure of layer Sufficiently to enter to be about to the positioning for accelerating starting position that substrate P positioning most carries out the exposure of each irradiation area in high precision.

If in addition, can in supporting member for substrate 69 Y frame component 61y, X frame components 61x formed equivalent to X moving lens 94X, If the reflecting surface of Y moving lens 94Y reflecting surface, X moving lens 94X, Y moving lens 94Y need might not be set.This occasion, The lightweight of supporting member for substrate 69 can be made to be not provided with part of such moving lens.

When supporting member for substrate can be only used for the exposure to the 1st layer of substrate P, also can also it make in the exposure after the 2nd layer With.The former situation, when exposure after the 2nd layer, the position of fine motion microscope carrier 26 must be measured with baseplate carrier interferometer system 98, Therefore a pair of the X moving lens 94X that for example will must be made up of above-mentioned corner cube₁、94X₂And the Y moving lens 94Y being made up of strip mirror Installed in above-mentioned 8th embodiment identical position.In addition, in this occasion, though also can be by baseplate carrier interferometer system 98 The position of fine motion microscope carrier 26 when supporting member for substrate 69 (substrate P) when being used for the exposure of first layer and the 2nd layer of exposure The measurement of information, but not limited to this, the substrate interferometer system of the position of supporting member for substrate 69 (substrate P) can will be also measured, Separate with baseplate carrier interferometer system 98 and separately set.

Also, as supporting member for substrate, however it is not limited to the component of frame-shaped, a part of shape jaggy of frame also can be used Supporting member for substrate.Such as the 8th of above-mentioned No. 2011/0042874 specification of U.S. Patent Application Publication No. can be used to implement The substrate holding frame of disclosed vertical view U-shaped in form.As long as in addition, will not be to substrate scan exposure when action bring If dysgenic composition, driving in the X/Y plane of assisting base plate supporting member 69, such as auxiliary X-shaft direction can be newly set Long stroke driving drive mechanism.

Also, in described above, though representational be described by taking the 8th embodiment as an example, the above-mentioned 1st~the 7th is each In embodiment, aforesaid substrate supporting member can be also used for the supporting of substrate P certainly.

Also, in the above-mentioned 7th, the 8th embodiment, though in substrate holding PH Y direction side and opposite side With setting air flotation cell group 84E, 84F situation to be described on the framework of the configured separate such as coarse motion platform 32 and fine motion microscope carrier 26, But at least one party in air flotation cell group 84E, 84F can be also made be equipped on coarse motion platform 32 and can be movable in X-direction Form, and not limited to this, another moving body for following the movement of coarse motion platform also can be set, air supporting list is carried on another moving body First group and it is movable in X-direction.This occasion, also can follow the coarse motion platform 32 for being equipped with air flotation cell group or coarse motion platform movement On another moving body, aforesaid substrate Y stepping conveyer 88 of the configuration inside air flotation cell group is set.In addition, air flotation cell Though group 84E, 84F are to be arranged at ground by framework, also may be disposed on pallet.

《9th embodiment》

Secondly, for the 9th embodiment, it is illustrated according to Figure 67~Figure 99.Herein, respectively implement with the above-mentioned 1st to the 8th Homomorphosis or equal composition part assign same or like symbol, and simplify or the description thereof will be omitted.

Air flotation cell group etc., the composition of the exposure device 900 for showing the 9th embodiment of outline are omitted in Figure 67.Figure The top view that the part of exposure device 900 is omitted is shown in 68, that is, shows Figure 67 projection optics system PL section below The top view of (part below more aftermentioned lens barrel platform).Figure 69 shows this 9th embodiment from Figure 67 +X direction Exposure device part omit summary side elevation.Figure 70 is that a part for the top view for capturing Figure 68 is amplified display Figure.Figure 71 is to show formed centered on the control system of exposure device 900, plan as a whole the main control unit 50 that control is formed each portion The block diagram of import and export relation.Figure 71 shows that with baseplate carrier be each portion of associated composition.Main control unit 50 includes work Stand (or microcomputer) etc., plan as a whole each portion of composition of control exposure device 900.

Exposure device 900, possess illumination and be IOP, the mask microscope carrier MST for keeping mask M, projection optics system PL, carry and cover Film microscope carrier MST and projection optics system PL etc. body BD (part is only shown in Figure 67 etc.), include the (substrate of fine motion microscope carrier 26 Platform) baseplate carrier device PSTh and these control system etc., it is generally speaking, each with above-mentioned 1st~the 8th embodiment Exposure device equally constitutes.However, in baseplate carrier device PSTh 2 plate bases can be kept (to show substrate P 1 and base in Figure 67 Plate P2) an each part point, it is different from aforesaid substrate bearing table device PST~PSTg.

Baseplate carrier device PSTh, as shown in Figure 67 and Figure 69, there is coarse motion microscope carrier portion 24, fine motion microscope carrier 26 and weight to support Pin assembly 28 etc..Above fine motion microscope carrier 26, from Figure 67 and Figure 69, substrate holding PH is equipped with.Substrate holding PH, From Figure 68, with substrate (P1, P2) on an equal basis, the width (length) of Y direction is then substrate (P1, P2) to the length of X-direction About 1/3.

X-direction central portion above substrate holding PH, as shown in Figure 70, provided with will its above be divided into 2 guarantors Hold region ADA1, ADA2 groove 150 parallel with Y-axis.2 holding areas ADA1, ADA2 split with groove 150, can be only each other Vertical being adsorbed in a manner of such as vacuum suction (or Electrostatic Absorption) keeps substrate P 1, a P2 part (herein, to be substrate P 1, P2 In 1/6 region of each substrate of about 1/3 part of Y direction ,+X sides or-X sides half portion), and pressurization gas is sprayed upwards Body (such as pressure-air) by the ejection pressure from below in a manner of non-contact (suspension) supporting substrates P1, P2 a part (about 1/6 region of each substrate).

By ejection and vacuum suction of substrate holding PH holding area ADA1, ADA2 to the pressure-air of each substrate Switching, be by by the other switching of substrate holding PH holding area ADA1, ADA2 be connected to vavuum pump (not shown) with Holding tool suction and discharge switching device 51A, 51B (reference picture 71) of source of high pressure air, is carried out by main control unit 50.

Coarse motion microscope carrier portion 24, as shown in Figure 69, have 2 (a pair) X beams 30A, 30B, 2 (a pair) coarse motion platform 32A, 32B, each multiple foots 34 with supporting 2 X beams 30A, 30B on the F of ground.Coarse motion platform 32A, 32B then with it is for example above-mentioned 2 coarse motion platforms that baseplate carrier device PST possesses equally constitute.

In each top of coarse motion platform 32A, 32B, as shown in Figure 68 and Figure 69, be configured with it is multiple, have herein for each 8 The air flotation cell 84H of the bearing-surface (above) of rectangle is overlooked, the upper of coarse motion platform 32A, 32B is fixed on by supporting member 86 respectively Face.Each 8 air flotation cell 84H, respectively in exposure area IA (projection optics system PL)+Y sides ,-Y sides, it is that Y direction is Substrate P 1, the 2/3 of P2 size and the area in X-direction for the substrate P 1 and P2 total size substantially comparable size of X-direction In domain, 2 dimension arrangements.Be set to above each air flotation cell 84H with it is equal above substrate holding PH or lower slightly.Below Explanation in, by above-mentioned each 8 air flotation cell 84H be referred to as+Y sides air flotation cell group 84H, with the air flotation cells of-Y sides Group 84H.

Also, in substrate holding PH X-direction both sides, as shown in Figure 68, each pair air flotation cell 84I is configured with.Respectively A pair of air flotation cell 84I, as shown in Figure 67, in a manner of above it with substantially equal (only lower slightly) height of substrate holding PH, It is fixed on by XZ sections for the supporting member 112 of L-shaped above coarse motion platform 32A.Each air flotation cell 84I, such as Y direction 1/2 slightly short, X-direction length of the length compared with substrate holding PH it is 1/2 slightly short compared with substrate holding PH.

In X beams 30A+Y sides and X beams 30B-Y sides, as shown in Figure 69, by with pallet 18 it is discontiguous in a manner of, respectively A pair of frames 110A, 110B is provided with ground F.Above a pair of frames 110A, 110B is each, it is provided with multiple, for example Each 4 air flotation cell 84J (reference picture 68).

Each 4 air flotation cell 84J, as shown in Figure 68 and Figure 69, it is arranged respectively at above-mentioned+Y sides air flotation cell group 84H+Y Side ,-Y sides air flotation cell group 84H-Y sides.Each 4 air flotation cell 84J's is each, as shown in Figure 68, the width of Y direction For substrate P 1, substantially the 1/3 of Y direction length of P2, X-direction length of the length of X-direction compared with substrate holding PH 1/2 is slightly short.In the following description, above-mentioned each 4 air flotation cell 84J are referred to as the air flotation cell group 84J of+Y sides ,-Y sides Air flotation cell group 84J.The air flotation cell group 84J's of+Y sides and-Y sides is each, is in the Y-axis that Y direction size is substrate P Substantially 1/3 and X-direction size of direction length are that substrate P 1 and P2 X-direction adds up to the area of size substantially comparable size In domain, X-direction is arranged in.The X position at exposure area IA center and+Y sides and the air flotation cell group 84J of-Y sides center It is substantially uniform.Be set as above each air flotation cell 84J with it is equal above substrate holding PH or lower slightly.

Above-mentioned air flotation cell 84H, 84I and 84J each bearing-surface (above) be porous plastid or by machinery have it is more The disc type air bearing construction of individual micro hole.Each air flotation cell 84H, 84I and 84J can be by from (the ginsengs of gas supply device 85 According to Figure 71) gas-pressurized (such as pressure-air) supply, a part for suspension bearing substrate (such as P1, P2).To each gas The on/off of floating unit 84H, 84I and 84J pressure-air supply, be due to main control unit 50 shown in Figure 71 it is other plus With control.

As shown in the above description, in this embodiment, can be suspended branch by+Y sides or-Y sides air flotation cell group 84H and 84J Hold the entirety of 2 plate bases.Also, the holding area ADA1 and a pair of the air flotation cell 84I and+Y of+X sides that pass through substrate holding PH 4 air flotation cell 84H of side or-Y sides can the plate base of suspension bearing 1 entirety.In addition, the holding by substrate holding PH Region ADA2 can the chip base of suspension bearing 1 with a pair of air flotation cell 84I of-X sides and 4 air flotation cell 84H of+Y sides or-Y sides The entirety of plate.Further, substrate holding PH and substrate holding PH+Y sides or 4 air flotation cells of-Y sides are passed through 84H can the plate base of suspension bearing 1 entirety.

Also, if air flotation cell group 84H, 84J have the total bearing area substantially equal with above-mentioned each rectangular area respectively Words, also replaceable is single large-scale air flotation cell, or the size of each air flotation cell is made and the different general of Figure 68 situation Be distributed in above-mentioned rectangular area.Also may replace a pair of air flotation cell 84I using the area of bearing-surface is 2 times single Air flotation cell.Because air flotation cell makes substrate suspend, therefore without being laid in comprehensively close, as long as the suspension energy regarding air flotation cell Power (load capacity) it is appropriate commitment positions are configured at predetermined distance.

Between+X sides and each pair air flotation cell 84I and substrate holding PH of-X sides, as shown in Figure 68 and Figure 70, It is configured with a pair of substrate Y steppings conveyers 88.

Each substrate Y steppings conveyer 88, it is to keep (such as absorption) substrate (such as P1 or P2) to move it in Y The device of direction of principal axis, it is fixed on above above-mentioned supporting member 112 (reference picture 67).Each substrate Y steppings conveyer 88, such as scheme Shown in 67 and Figure 70, possess fixed part 88b and the suction be fixed on coarse motion platform 32A by supporting member 112 and extend Y direction Attached substrate (such as P1 or P2) back side and the movable part 88a that can be moved in Y direction along fixed part 88b.In this embodiment, respectively The movable part 88a of substrate Y steppings conveyer 88 is in the shift motion of Y direction and substrate holding PH Y direction width On an equal basis.

Also, in fact, though movable part 88a, which is sorbing substrate P, is displaced into Y direction, in following explanation, except special palpus Outside the situation being distinguished by, substrate Y steppings conveyer 88 is not distinguished with movable part 88a to be used.

Between+Y sides and the air flotation cell group 84H and substrate holding PH of-Y sides, as shown in Figure 68 and Figure 70, configuration There are a pair of substrate X steppings conveyers 91.

Substrate X steppings conveyer 91 is to keep (such as absorption) substrate (such as P1 or P2) to move it in X-axis The device in direction ,+Y sides, a pair of the gas of-Y sides of the+X sides half portion for being configured at substrate holding PH are fixed on by supporting member Floating unit 84H is each with the face of substrate holding PH oncoming lanes (reference picture 69).

Each substrate X steppings conveyer 91, as shown in Figure 69 and Figure 70, possess and be fixed on together with air flotation cell 84H slightly Dynamic platform 32A or 32B extend the fixed part 91b of X-direction and sorbing substrate (such as P1 or P2) back side can be in X-direction edge The movable part 91a of fixed part 91b movements.Movable part 91a be for example, by formed with linear electric machine drive device 95 (Figure 69 and It is not shown in Figure 70, reference picture 71), X-direction is driven in respect to coarse motion platform 32A or 32B.In substrate X stepping conveyers 91, (not shown, the reference in Figure 69 and Figure 70 of the position reading out device 97 of encoder of position etc. provided with measurement movable part 91a Figure 71).Certainly, drive device 95 is not limited to linear electric machine, also can by using use the electric rotating machine of ball screw or belt as The drive mechanism of driving source is formed.

The movable part 91a of each substrate X steppings conveyer 91 is in the X-axis that the shift motion of X-direction is substrate holding Substantially 1/2 (slightly longer) of direction length.Each fixed part 91b-X side ends, from respectively by the fixed past-X of air flotation cell 84H Side protrudes certain length.

Also, the back of the body due to the necessary sorbing substrate P of the movable part 91a (substrate adsorption face) of each substrate X steppings conveyer 91 Face is desorbed from substrate P separation, therefore also can be by the micro-move device of drive device 95 in Z-direction.In addition, in fact, can Though dynamic portion 91a is that sorbing substrate P is displaced into Y direction, in following explanation, in addition to the situation that must be especially distinguished by, and base Plate Y steppings conveyer 91 is not distinguished with movable part 91a to be used.

Also, in this embodiment, in order to substrate Y steppings conveyer 88 and substrate X steppings conveyer 91 it is each can Dynamic portion (substrate adsorption face) absorption to substrate P and separated with substrate, fine motion microscope carrier 26 also may move in Z-direction.

Weight offsets device 28, as shown in Figure 69, has basket 64, air spring 66 and Z saddles 68 etc., for example, with it is above-mentioned Each embodiment after 2nd embodiment equally constitutes.That is, in the baseplate carrier device PSTh of this 9th embodiment, Z Saddle 68 doubles as the fixed part for levelling device 78, is not provided with sealing gasket, and weight payment device 28 and fine motion microscope carrier 26 are integrally Change.Also, because weight payment device 28 is integrated with fine motion microscope carrier 26, therefore be not provided with maximum weight payment device 28 and individually transport Dynamic link device 80 (flexure devices) etc..Fine motion microscope carrier 26, schematically shown by having in Figure 69 with bulbous member Spherical bearing or intend like the levelling device 78 of spherical bearing tectosome tilted on Z saddles 68 freely (with respect to X/Y plane in θ x and θ y directions swing freely) be supported by.

The top composition part that weight payment device 28 and weight payment device 28 are supported in by levelling device 78 is (micro- Dynamic load platform 26 and substrate holding PH etc.), by a pair of X voice coil motors 54X effect, X-axis is integrally displaced into coarse motion platform 32A Direction.That is, that is, top forms part (fine motion microscope carrier 26 and substrate holding PH etc.), passes through the control of main control unit 50 System, the driving synchronous with coarse motion platform 32A of weight payment device 28 is supported in (with coarse motion platform 32A using a pair of X voice coil motors 54X It is equidirectional, with speed drive), X-direction is displaced into predetermined stroke together with coarse motion platform 32A according to this.Also, top forms part (fine motion microscope carrier 26 and substrate holding PH etc.), by the control of main control unit 50, by a pair of X voice coil motors 54X, a pair Y voice coil motors 54Y and 4 Z voice coil motor 54Z, with respect to coarse motion platform 32A by micro-move device in 6DOF direction.

In this 9th embodiment, coarse motion platform 32A (and 32B), weight payment device 28, fine motion microscope carrier 26 and substrate are included Tool PH etc. is kept, forms moving body (following, the appropriate title baseplate carrier that X-direction is integrally displaced into substrate (P1, P2) (PH、26、28、32A、32B))。

In the exposure device 900 of this 9th embodiment, the position in the X/Y plane of fine motion microscope carrier 26 (substrate holding PH) Information, added at any time by baseplate carrier interferometer system 98 (reference picture 71), such as with the capacity of decomposition of 0.5~1nm degree With detection.The baseplate carrier interferometer system 98 of this 9th embodiment, compare Figure 67~Figure 69 and Figure 30~Figure 32 and understand, be Equally constituted with the baseplate carrier interferometer system 98 of above-mentioned 7th embodiment.But, the exposure device of this 9th embodiment In 900, as shown in Figure 69, Y interferometers 98Y₁、98Y₂Be below air flotation cell 84H, with Y moving lens 94Y to, in X-axis side Configured to predetermined distance.Y interferometers 98Y₁、98Y₂The each of a pair of pallets 18 is fixed on by supporting member 104 respectively.

The composition of baseplate carrier device PSTh other parts is identical with such as baseplate carrier device PSTa, PSTf.Also, Each portion of composition and above-mentioned each embodiment beyond baseplate carrier device is identical (67~Figure 71 of reference picture).

Then, the base plate exposure processing that the exposure device 900 of this embodiment for illustrating to form in the above described manner is carried out Series of actions.Herein, for as an example, be for carrying out the occasion of the 2nd layer of later exposure to substrate P, according to equivalent to To illustrate the exposure program of the series of actions program (that is, exposure program) of the exposure-processed of substrate illustrate figure (11~ Figure 72~Figure 74 27), Figure 76~Figure 99 and show a substrate irradiation area exposure and the Y steppings of another substrate Figure 75 A~Figure 75 D of the concurrent activity of action are illustrated.Also, in Figure 72~Figure 99, to make explanation it can be readily appreciated that entering one Step is simplified Figure 70 and only display base plate keeps tool PH, substrate.In addition, the exposure area IA shown in Figure 72~Figure 99, Illumination light IL passes through the illumination region of projection optics system PL irradiations when being exposure, in fact, will not be formed when beyond exposure, but To make the position relationship between substrate P and projection optics system PL clearly be shown at any time.Also, herein, it is directed to each substrate 2 faces (2 scanning), Y direction are taken to take the situation for taking 6 faces (total 6 scanning) exposure in 3 faces (3 scanning) to be said in X-direction It is bright.

First, under the management of main control unit 50, will be covered by mask carrying device (not shown) (mask loader) Film M is loaded to mask microscope carrier MST, and moves into device by substrate (not shown) and 2 plate base P1, P2 are moved into (input) substrate On bearing table device PSTh.In substrate P 1, P2 each when each irradiation area is provided with exposure before front layer, such as Figure 72 Deng shown in, provided with it is multiple with such as X-direction 2, Y direction 3 add up to 6 irradiation area SA1~SA6 together with, it is and each Multiple alignment mark PM (reference picture 70) that the pattern of irradiation area is transferred simultaneously.Also, in Figure 70, each irradiation area is eliminated Diagram.

This occasion, device is moved into by 2 plate base P2, P1 by substrate, such as blacking arrow in Figure 72 and applied shown in white arrow, Transport in +Y direction and -Y direction, move into position shown in Figure 68, Figure 70 and Figure 72.This occasion, substrate P 2 are assembled into across base Plate keeps one of tool PH holding area ADA1 and a pair of the air flotation cell 84I of+X sides and air flotation cell group 84H of-Y sides Point, and substrate P 1 is then assembled into the holding area ADA2 across substrate holding PH and a pair of the air flotation cell 84I and+Y of-X sides The air flotation cell group 84H of a side part.Now, substrate P 2 is by a pair of substrate holding PH holding area ADA1 and+X sides Air flotation cell 84I and the air flotation cell group 84H of-Y sides a part of suspension bearing, substrate P 1 is then by substrate holding PH guarantor Hold region ADA2 and a pair of the air flotation cell 84I and the air flotation cell group 84H of+Y sides of-X sides a part of suspension bearing.Certainly, The direction that each substrate is not necessarily required to each arrow from Figure 72 is moved into.For example, also can be from the outer of top (+Z sides) or X-direction Side is moved into.

Then, substrate holding PH holding area ADA1, ADA2 is switched into attraction from exhaust by main control unit 50. Accordingly, substrate P 2, a P1 part (about the 1/6 of substrate entirety) i.e. adsorbed holding area for being fixed on substrate holding PH ADA1, ADA2, turn into substrate P 2, a P1 part (substrate all remaining about 5/6) by a pair of air flotation cell 84I and air supporting list The state of first group 84H a part of suspension bearing.

Afterwards, (the substrate guarantor of fine motion microscope carrier 26 is obtained by being directed at measuring method with existing identical by main control unit 50 Hold tool PH) relative projection optics system PL position, the approximate location of fine motion microscope carrier 26 relative with substrate P 1, P2.Also, substrate P 1, P2 can omit to fine motion microscope carrier 26 to locating tab assembly.

Then, main control unit 50 drives fine motion microscope carrier 26 so that substrate according to above-mentioned measurement result by coarse motion platform 32A At least two alignment mark PM (not shown in Figure 72, reference picture 70) on P1 is moved in the visual field of any alignment detection system, is entered Row substrate P 1, to locating tab assembly, and according to the result, is obtained to carry out irradiation area SA1 in substrate P 1 with respect to projection optics system PL Exposure scanning starting position.Herein, before and after the constant speed movement section when scanning to be exposed is included in scan exposure Acceleration area and deceleration interval, therefore, strictly speaking, scanning starting position be accelerate starting position.Then, main control unit 50 driving coarse motion platform 32A, 32B simultaneously drive fine motion microscope carrier 26 a little, and substrate P 1 is positioned at into the scanning starting position, and (acceleration starts Position).Now, fine motion microscope carrier 26 (substrate holding PH) is carried out to coarse motion platform 32A in X-axis, Y-axis and θ z directions (or 6DOF Direction) accurate micro- Locating driver.Shown in Figure 73 substrate P 1 (and substrate holding PH) has just been positioned in this way for Carry out the state of the scanning starting position (acceleration starting position) of irradiation area SA1 exposure in substrate P 1.

Then, from Figure 73 states, as applied in Figure 73 shown in white arrow, by baseplate carrier (PH, 26,28,32A, 32B) it is past- X-direction drives, and carries out the X scanning motions of substrate P 1.Now, by main control unit 50 by keep mask M mask microscope carrier MST with Substrate holding PH (fine motion microscope carrier 26) is synchronous to be driven toward -X direction, and the irradiation area SA1 of substrate P 1 passes through projection optics system The exposure area IA of the view field of PL mask M patterns, therefore, in now carrying out the scan exposure to irradiation area SA1.It is main Control device 50, in fact, being synchronous with fine motion microscope carrier 26 (substrate holding PH), is interfered when X scanning motions according to mask The measurement result of instrument system 14, by mask microscope carrier MST turntable drivings in X-direction and micro-move device is in Y direction and θ z directions.

Scan exposure is in the constant speed movement after acceleration of the fine motion microscope carrier 26 (substrate holding PH) toward -X direction, thoroughly Cross mask M, projection optics system PL and illumination light IL is irradiated to substrate P 1 to carry out.

When above-mentioned X scanning motions, main control unit 50 makes a part for substrate P 1 (about the 1/6 of the entirety of substrate P 1) suction The attached holding area ADA2 for being fixed on substrate holding PH, make a part (about the 5/6 of the entirety of substrate P 1) suspension branch of substrate P 1 The part in the air flotation cell group 84H of+Y sides and a pair of air flotation cell 84I of-X sides are held, and make a part (base of substrate P 2 A part (the substrate P 2 about 1/6) adsorbed the holding area ADA1 for being fixed on substrate holding PH, make substrate P 2 all plate P2 It is all about 5/6) suspension bearing in the air flotation cell group 84H of-Y sides a part and+X sides a pair of air flotation cell 84I shape Under state, baseplate carrier (PH, 26,28,32A, 32B) is driven.

Now, main control unit 50 passes through x-ray electricity respectively according to x-ray encoder system 46A, 46B measurement result Machine 42A, 42B drive coarse motion platform 32A, 32B in X-direction, and according to baseplate carrier interferometer system 98, Z inclination measurements system 76 measurement result driving fine motion microscope carrier drivetrain 52 (each voice coil motor 54X, 54Y, 54Z).Accordingly, substrate P 1, P2 i.e. with it is micro- Dynamic load platform 26 is integral, passes through the movement of X voice coil motors 54X and coarse motion platform 32A one.Also, weight payment device 28 also with it is micro- Dynamic load platform 26 is integral, is driven by X voice coil motors 54X.In addition, substrate P 1, P2 and fine motion microscope carrier 26 are integral, by from thick Dynamic platform 32A relative driving, in X-axis, Y-axis, Z axis, θ x, θ y and θ z all directions (6DOF direction) by accurate position control System.

Shown in Figure 74 and the irradiation area SA1 of substrate P 1 scan exposure terminated, baseplate carrier (PH, 26,28, 32A, 32B) stop state.

Then, with new to locating tab assembly that is, progress with respect to projection optics system PL with above-mentioned same carries out substrate P 2 Irradiation area (this occasion, being the irradiation area SA1 in the substrate P 2) use pair of time exposure object pre-set in substrate P 2 The measurement of fiducial mark note.

Then, when substrate P 2 with respect to projection optics system PL it is new to locating tab assembly at the end of, main control unit 50 is basis The result, to enter the acceleration of the exposure of places one, as applied in Figure 74 shown in white arrow, enter to be about to substrate P 2 (and substrate holding PH) The X stepwise operations of the substrate P 2 (and substrate holding PH) somewhat driven toward +X direction.The X stepwise operations of substrate P 2 are by master control With the state-driven same with X scanning motions, (but, position deviation on the move is not as strict as scanning motion device 50 processed Limitation) baseplate carrier (PH, 26,28,32A, 32B) carries out.Main control unit 50, it is parallel with the X stepwise operations of substrate P 2, make Mask microscope carrier MST, which is returned to, accelerates starting position.It is just fixed by substrate P 2 (and substrate holding PH) in this way to be shown in Figure 76 State on for progress substrate P 2 behind the scanning starting position (acceleration starting position) of irradiation area SA1 exposure.

Then, after X stepwise operations, main control unit 50, as applied in Figure 76 shown in white arrow, starting substrate P 2, (substrate carries Platform (PH, 26,28,32A, 32B)) accelerate with mask M (mask microscope carrier MST) -X direction, by with it is above-mentioned it is same in a manner of compare Penetrate region SA1 and be scanned exposure.It is parallel with this, main control unit 50, as shown in blacking arrow in Figure 76, enter to be about to substrate The Y stepwise operations for the substrate P 1 that P1 is transported on substrate holding PH toward -Y direction.The Y stepwise operations of this substrate P 1, are by leading Control device 50 by holding area ADA2 from attract to switch to exhaust, to release the absorption of substrate P 1, and the substrate of use-X sides Y steppings conveyer 88 by substrate P 1 toward the -Y direction conveyance Y stepping roughly equal with the Y direction width of irradiation area away from From come carry out.Herein, substrate Y steppings conveyer 88, the time point of exhaust, absorption are switched to from attraction in holding area ADA2 Keep substrate P 1.

In Figure 75 A~Figure 75 D, it is shown that the irradiation area SA1 of substrate P 2 exposure and the Y stepwise operations of substrate P 1 are parallel When, the change of the position of each substrate etc. passed through with the time.From Figure 75 A~Figure 75 D visually it was found from, in this embodiment, a base The scan exposure of plate (P2) can carry out (parallel) simultaneously with the Y stepwise operations of another substrate (P1).This is due to be used for The substrate Y steppings conveyer 88 of Y steppings is to be fixed in coarse motion platform 32A, and can be kept with coarse motion platform 32A one with substrate Has the event of PH synchronizing movings.

In this occasion, main control unit 50 in the scan exposure of a substrate, can also make the Y stepwise operations of another substrate temporary When stop, and carry out the Y stepwise operations of another substrate in the acceleration before and after the scan exposure of a substrate and in slowing down.In this way, The Y stepwise operations that can prevent another substrate really are had undesirable effect to the scan exposure of a substrate (such as with substrate Y steppings The mode for the vibration cause that the reaction force of the driving force of conveyer 88 will not turn into fine motion microscope carrier 26 drives fine motion microscope carrier 26 Result, cause position control accuracy (and mask M and synchronization accuracy of substrate P 2) drop of fine motion microscope carrier 26 in scan exposure It is low).

Shown in Figure 75 D and Figure 77 and the scan exposure of the irradiation area SA1 in substrate P 2 is terminated, baseplate carrier (PH, 26th, 28,32A, 32B) state that stops.Now, substrate P 1 finishes Y stepwise operations, and the irradiation area SA2 in substrate P 1 is located at On substrate holding PH holding area ADA2.

Afterwards, substrate holding PH holding area ADA2 is switched into attraction, substrate from exhaust by main control unit 50 P1 1/6 part for including irradiation area SA2, i.e., it is adsorbed to be fixed on holding area ADA2.Now, its remaining part of substrate P 1 Divide the part and-X that (about 5/6) is the air flotation cell group 84H by the air flotation cell group 84H an of+Y sides part ,-Y sides A pair of air flotation cell 84I suspension bearings of side.

Then, substrate P 1 is carried out to locating tab assembly that is, set in advance in substrate P 1 with respect to the new of projection optics system PL The measurement for time irradiation area SA2 alignment marks put.Before this is to locating tab assembly, the above-mentioned identical with substrate P 1 is carried out X stepwise operations (apply white arrow) in reference picture 77, so that the alignment mark of measurement object is positioned at the detection visual field of alignment detection system It is interior.

Then, when substrate P 1 with respect to projection optics system PL it is new to locating tab assembly at the end of, by the basis of main control unit 50 The result, enter to be about to substrate P 1 (and substrate holding PH) be positioned at for carry out substrate P 1 on irradiation area SA2 exposure plus Fast starting position and the relative coarse motion platform 32A of fine motion microscope carrier 26 are in the precision of X-axis, Y-axis and θ z directions (or 6DOF direction) Micro- Locating driver.The state after just having terminated this positioning is shown in Figure 78.Also, in the following description, for fine motion microscope carrier 26 Accurate micro- Locating driver with respect to coarse motion platform 32A, omits its record.

Then, substrate P 1 and mask M (whitewashes arrow in the acceleration of +X direction in reference picture 78 by main control unit 50 Head), carry out the scan exposure of the irradiation area SA2 same as described above to substrate P 1.It is parallel with this, by main control unit 50, it is as shown in blacking arrow in Figure 78, substrate P 2 is above-mentioned with substrate P 2 in being transported on substrate holding PH toward +Y direction Identical Y stepwise operations.

Shown in Figure 79 and the scan exposure of the irradiation area SA2 in substrate P 1 terminated, baseplate carrier (PH, 26,28, 32A, 32B) stop state.Now, substrate P 2 finishes Y stepwise operations, and the irradiation area SA2 in substrate P 2 is located at substrate guarantor On the holding area ADA1 for holding tool PH.

Afterwards, substrate holding PH holding area ADA1 is switched into attraction, substrate from exhaust by main control unit 50 P2 1/6 part comprising irradiation area SA2 is i.e. adsorbed to be fixed on holding area ADA1.Now, its remaining part of substrate P 2 Divide (about 5/6) then by the air flotation cell group 84H an of+Y sides part, the air flotation cell group 84H of-Y sides a part and+X A pair of air flotation cell 84I suspension bearings of side.

Then, substrate P 2 is carried out to locating tab assembly that is, set in advance in substrate P 2 with respect to the new of projection optics system PL The measurement for time irradiation area SA2 alignment marks put.Before this beginning to locating tab assembly, for make measurement object to fiducial mark Note in the detection visual field of alignment detection system, (in reference picture 79 whitewash by the X stepwise operations same as described above for carrying out substrate P 2 Arrow).

Then, when substrate P 2 with respect to projection optics system PL it is new to locating tab assembly at the end of, by the basis of main control unit 50 The result, enter to be about to substrate P 2 (and substrate holding PH) be positioned at for carry out substrate P 2 on irradiation area SA2 exposure plus Fast starting position.The state after just having terminated this positioning is shown in Figure 80.

Then, substrate P 2 and mask M -X direction accelerates (to whitewash arrow in reference picture 80 by main control unit 50 Head), carry out the scan exposure of the irradiation area SA2 same as described above to substrate P 2.It is parallel with this, by main control unit 50, as shown in blacking arrow in Figure 80, enter to be about to substrate P 1 in the upper of the substrate P 1 transported on substrate holding PH toward -Y direction State identical Y stepwise operations.

Shown in Figure 81 and the scan exposure of the irradiation area SA2 in substrate P 2 terminated, baseplate carrier (PH, 26,28, 32A, 32B) stop state.Now, substrate P 1 finishes Y stepwise operations, and the irradiation area SA3 in substrate P 1 is located at substrate guarantor On the holding area ADA2 for holding tool PH.

Afterwards, substrate holding PH holding area ADA2 is switched into attraction, substrate from exhaust by main control unit 50 P1 1/6 part comprising irradiation area SA3 is i.e. adsorbed to be fixed on holding area ADA2.Now, the remainder of substrate P 1 (about 5/6) is by the air flotation cell group 84H part and a pair of air flotation cell 84I suspension bearings of-X sides of-Y sides.

Then, substrate P 1 is carried out to locating tab assembly that is, set in advance in substrate P 1 with respect to the new of projection optics system PL The measurement for time irradiation area SA3 alignment marks put.Before this beginning to locating tab assembly, for make measurement object to fiducial mark Note in the detection visual field of alignment detection system, (in reference picture 81 whitewash by the X stepwise operations same as described above for carrying out substrate P 1 Arrow).

Then, when substrate P 1 with respect to projection optics system PL it is new to locating tab assembly at the end of, by the basis of main control unit 50 The result, enter to be about to substrate P 1 (and substrate holding PH) be positioned at for carry out substrate P 1 on irradiation area SA3 exposure plus Fast starting position.The state after just having terminated this positioning is shown in Figure 82.

Then, substrate P 1 and mask M +X direction accelerates (applying white arrow in reference picture 82) by main control unit 50, Carry out the scan exposure of the irradiation area SA3 same as described above to substrate P 1.It is parallel with this, by main control unit 50, such as In Figure 82 shown in blacking arrow, enter to be about to substrate P 2 in the above-mentioned identical of the substrate P 2 transported on substrate holding PH toward +Y direction Y stepwise operations.

Shown in Figure 83 and the scan exposure of the irradiation area SA3 in substrate P 1 terminated, baseplate carrier (PH, 26,28, 32A, 32B) stop state.Now, substrate P 2 finishes Y stepwise operations, and the irradiation area SA3 in substrate P 2 is located at substrate guarantor On the holding area ADA1 for holding tool PH.

Afterwards, substrate holding PH holding area ADA1 is switched into attraction, substrate from exhaust by main control unit 50 P2 1/6 part comprising irradiation area SA3 is i.e. adsorbed to be fixed on holding area ADA1.Now, the remainder of substrate P 2 (about 5/6) is by the air flotation cell group 84H part and a pair of air flotation cell 84I suspension bearings of+X sides of+Y sides.

Then, substrate P 2 is carried out to locating tab assembly that is, set in advance in substrate P 2 with respect to the new of projection optics system PL The measurement for time irradiation area SA3 alignment marks put.Before this beginning to locating tab assembly, for make measurement object to fiducial mark Note in the detection visual field of alignment detection system, (in reference picture 83 whitewash by the X stepwise operations same as described above for carrying out substrate P 2 Arrow).

Then, when substrate P 2 with respect to projection optics system PL it is new to locating tab assembly at the end of, by the basis of main control unit 50 The result, enter to be about to substrate P 2 (and substrate holding PH) be positioned at for carry out substrate P 2 on irradiation area SA3 exposure plus Fast starting position.The state after just having terminated this positioning is shown in Figure 84.

Then, substrate P 2 and mask M -X direction accelerates (to whitewash arrow in reference picture 84 by main control unit 50 Head), carry out the scan exposure of the irradiation area SA3 same as described above to substrate P 2.It is parallel with this, by main control unit 50, as shown in blacking arrow in Figure 84, enter to be about to substrate P 1 in the upper of the substrate P 1 transported on substrate holding PH toward -Y direction State identical Y stepwise operations.Due to this Y stepwise operation, substrate P 1 completely disengages from substrate holding PH, all by-Y sides Air flotation cell group 84H a part and-Y sides air flotation cell group 84J a part of suspension bearing.

Shown in Figure 85 and the scan exposure of the irradiation area SA3 in substrate P 2 terminated, baseplate carrier (PH, 26,28, 32A, 32B) stop state.Now, substrate P 1 exits from substrate holding PH.

Afterwards, substrate holding PH holding area ADA1 is switched to exhaust by main control unit 50 from attraction, and with+Y Substrate X steppings conveyer 91 (reference picture 70) absorption of side keeps substrate P 2, as applied in Figure 85 shown in white arrow, in-X sides To conveyance X step distances (substantially 2 times of distances of the X-direction length of irradiation area).Parallel with this, main control unit 50 is logical Substrate X steppings conveyer 91 (reference picture 70) absorption for crossing-Y sides keeps substrate P 1, as shown in blacking arrow in Figure 85, in+ X-direction transports X step distances.Herein, conveyance and substrate P 2 of the substrate P 1 toward +X direction are not make toward the conveyance of -X direction Carried out in the case of both interference.

At the end of the X step distances conveyance that aforesaid substrate P1 and substrate P 2 are shown in Figure 86, two substrates P1, P2 are with respect to base Plate keeps tool PH position relationship.

From Figure 86 state, by main control unit 50, substrate is kept using the absorption of substrate Y steppings conveyer 88 of+X sides P1, and release substrate X steppings 91 absorption to substrate P 1 of conveyer of-Y sides.In addition, as shown in blacking arrow in Figure 86, The stepping that the +Y direction of substrate P 1 is carried out by the substrate Y steppings conveyer 88 of+X sides is moved.In this way, substrate P 1 and substrate P 2 Though mutual position is to reverse on, substrate holding PH, turn on substrate holding PH and Figure 72 identicals position Relation (reference picture 87).

Then, substrate holding PH holding area ADA1, ADA2 is switched into attraction from exhaust by main control unit 50. Accordingly, substrate P 1, a P2 part (about the 1/6 of substrate entirety) adsorbed holding area for being fixed on substrate holding PH are turned into ADA1, ADA2, pass through a pair of air flotation cell 84I and air flotation cell group 84H a part of suspension bearing substrate P 1, a P2 part The state of (substrate all remaining about 5/6).

Then, with new to locating tab assembly that is, progress with respect to projection optics system PL with above-mentioned same carries out substrate P 1 Irradiation area (this occasion, being the irradiation area SA4 in the substrate P 1) use pair of time exposure object pre-set in substrate P 1 The measurement of fiducial mark note.

Then, when substrate P 1 with respect to projection optics system PL it is new to locating tab assembly at the end of, main control unit 50 is basis The result, driving coarse motion platform 32A, 32B and micro-move device fine motion microscope carrier 26, to enter the acceleration of the exposure of places one, by (and the base of substrate P 1 Plate keeps tool PH) it is positioned at the scanning starting position (acceleration starting position).Shown in Figure 87 in this way by substrate P 1 (and Substrate holding PH) just it is positioned to carry out the scanning starting position of irradiation area SA4 exposure in substrate P 1 (acceleration start bit Put) after state.

Then, main control unit 50, as in Figure 87 apply white arrow shown in, start substrate P 1 (baseplate carrier (PH, 26,28, 32A, 32B)) accelerate with mask M (mask microscope carrier MST) +X direction, and the above-mentioned same scanning carried out to irradiation area SA4 Exposure.

Shown in Figure 88 and the irradiation area SA4 of substrate P 1 scan exposure terminated, baseplate carrier (PH, 26,28, 32A, 32B) stop state.

Then, with new to locating tab assembly that is, progress with respect to projection optics system PL with above-mentioned same carries out substrate P 2 Irradiation area (this occasion, being the irradiation area SA4 in the substrate P 2) use pair of time exposure object pre-set in substrate P 2 The measurement of fiducial mark note.

Then, when substrate P 2 with respect to projection optics system PL it is new to locating tab assembly at the end of, main control unit 50 and according to The result, to enter the acceleration of the exposure of places one, as applied in Figure 88 shown in white arrow, same to enter to be about to substrate P 2 with above-mentioned The X stepwise operations for the substrate P 2 (and substrate holding PH) that (and substrate holding PH) slightly drives toward -X direction.Shown in Figure 89 In this way enter to be about to substrate P 2 (and substrate holding PH) to be just positioned to carry out the exposure of irradiation area SA4 in substrate P 2 Scanning starting position (acceleration starting position) after state.

Then, main control unit 50, as in Figure 89 apply white arrow shown in, start substrate P 2 (baseplate carrier (PH, 26,28, 32A, 32B)) accelerate with mask M (mask microscope carrier MST) +X direction, to be scanned with above-mentioned same to irradiation area SA4 Exposure.Parallel, main control unit 50 with this, as shown in blacking arrow in Figure 89, by substrate P 1 on substrate holding PH it is past+ Y-direction conveyance carries out the Y stepwise operations similar to the above with substrate P 1.

Shown in Figure 90 and the scan exposure of irradiation area SA4 in substrate P 2 terminated, baseplate carrier (PH, 26,28, 32A, 32B) stop state.Now, substrate P 1 finishes Y stepwise operations, and the irradiation area SA5 in substrate P 1 is located at substrate guarantor On the holding area ADA1 for holding tool PH.

Afterwards, substrate holding PH holding area ADA1 is switched into attraction, substrate from exhaust by main control unit 50 P1 1/6 part comprising irradiation area SA5 is i.e. adsorbed to be fixed on holding area ADA1.Now, the remainder of substrate P 1 (about 5/6) is a part and the+X sides of the air flotation cell group 84H by the air flotation cell group 84H an of+Y sides part ,-Y sides A pair of air flotation cell 84I be subject to suspension bearing.

Then, substrate P 1 is carried out to locating tab assembly that is, set in advance in substrate P 1 with respect to the new of projection optics system PL The measurement for time irradiation area SA5 alignment marks put.Before this beginning to locating tab assembly, for make measurement object to fiducial mark Note in the detection visual field of alignment detection system, (in reference picture 90 whitewash by the X stepwise operations same as described above for carrying out substrate P 1 Arrow).

Then, when substrate P 1 with respect to projection optics system PL it is new to locating tab assembly at the end of, by the basis of main control unit 50 The result, enter to be about to substrate P 1 (and substrate holding PH) be positioned at for carry out substrate P 1 on irradiation area SA5 exposure plus Fast starting position.The state after just having terminated this positioning is shown in Figure 91.

Then, substrate P 1 and mask M -X direction accelerates (to whitewash arrow in reference picture 91 by main control unit 50 Head), carry out the scan exposure of the irradiation area SA5 same as described above to substrate P 1.It is parallel with this, by main control unit 50, as shown in blacking arrow in Figure 91, enter to be about to substrate P 2 in the upper of the substrate P 2 transported on substrate holding PH toward -Y direction State identical Y stepwise operations.

Shown in Figure 92 and the scan exposure of irradiation area SA5 in substrate P 1 terminated, baseplate carrier (PH, 26,28, 32A, 32B) stop state.Now, substrate P 2 finishes Y stepwise operations, and the irradiation area SA5 in substrate P 2 is located at substrate guarantor On the holding area ADA2 for holding tool PH.

Afterwards, substrate holding PH holding area ADA2 is switched into attraction, substrate from exhaust by main control unit 50 P2 1/6 part comprising irradiation area SA5 is i.e. adsorbed to be fixed on holding area ADA2.Now, its remaining part of substrate P 2 Divide the part and-X that (about 5/6) is the air flotation cell group 84H by the air flotation cell group 84H an of+Y sides part ,-Y sides A pair of air flotation cell 84I suspension bearings of side.

Then, substrate P 2 is carried out to locating tab assembly that is, set in advance in substrate P 2 with respect to the new of projection optics system PL The measurement for time irradiation area SA5 alignment marks put.Before this beginning to locating tab assembly, for make measurement object to fiducial mark Note in the detection visual field of alignment detection system, (in reference picture 92 whitewash by the X stepwise operations same as described above for carrying out substrate P 2 Arrow).

Then, when substrate P 2 with respect to projection optics system PL it is new to locating tab assembly at the end of, by the basis of main control unit 50 The result, enter to be about to substrate P 2 (and substrate holding PH) be positioned at for carry out substrate P 2 on irradiation area SA5 exposure plus Fast starting position.The state after just having terminated this positioning is shown in Figure 93.

Then, substrate P 2 and mask M +X direction accelerates (applying white arrow in reference picture 93) by main control unit 50, Carry out the scan exposure of the irradiation area SA5 same as described above to substrate P 2.It is parallel with this, by main control unit 50, such as In Figure 93 shown in blacking arrow, enter to be about to substrate P 1 in the above-mentioned identical of the substrate P 1 transported on substrate holding PH toward +Y direction Y stepwise operations.

Shown in Figure 94 and the scan exposure of the irradiation area SA5 in substrate P 2 terminated, baseplate carrier (PH, 26,28, 32A, 32B) stop state.Now, substrate P 1 finishes Y stepwise operations, and the irradiation area SA6 in substrate P 1 is located at substrate guarantor On the holding area ADA1 for holding tool PH.

Afterwards, substrate holding PH holding area ADA1 is switched into attraction, substrate from exhaust by main control unit 50 P1 1/6 part comprising irradiation area SA6 is i.e. adsorbed to be fixed on holding area ADA1.Now, the remainder of substrate P 1 (about 5/6) is a pair of air flotation cell 84I suspension bearings by the air flotation cell group 84H an of+Y sides part and+X sides.

Then, substrate P 1 is carried out to locating tab assembly that is, set in advance in substrate P 1 with respect to the new of projection optics system PL The measurement for time irradiation area SA6 alignment marks put.Before this beginning to locating tab assembly, for make measurement object to fiducial mark Note in the detection visual field of alignment detection system, (in reference picture 94 whitewash by the X stepwise operations same as described above for carrying out substrate P 1 Arrow).

Then, when substrate P 2 with respect to projection optics system PL it is new to locating tab assembly at the end of, by the basis of main control unit 50 The result, enter to be about to substrate P 1 (and substrate holding PH) be positioned at for carry out substrate P 1 on irradiation area SA6 exposure plus Fast starting position.The state after just having terminated this positioning is shown in Figure 95.

Then, substrate P 1 and mask M -X direction accelerates (to whitewash arrow in reference picture 95 by main control unit 50 Head), carry out the scan exposure of the irradiation area SA6 same as described above to substrate P 1.It is parallel with this, by main control unit 50, as shown in blacking arrow in Figure 95, enter to be about to substrate P 2 in the upper of the substrate P 2 transported on substrate holding PH toward -Y direction State identical Y stepwise operations.

Shown in Figure 96 and the scan exposure of irradiation area SA6 in substrate P 1 terminated, baseplate carrier (PH, 26,28, 32A, 32B) stop state.Now, substrate P 2 finishes Y stepwise operations, and the irradiation area SA6 in substrate P 2 is located at substrate guarantor On the holding area ADA2 for holding tool PH.

Afterwards, substrate holding PH holding area ADA2 is switched into attraction, substrate from exhaust by main control unit 50 P2 1/6 part comprising irradiation area SA6 is i.e. adsorbed to be fixed on holding area ADA2.Now, the remainder of substrate P 2 (about 5/6) is a pair of air flotation cell 84I suspension bearings by the air flotation cell group 84H an of-Y sides part and-X sides.

Then, substrate P 2 is carried out to locating tab assembly that is, set in advance in substrate P 2 with respect to the new of projection optics system PL The measurement for time irradiation area SA6 alignment marks put.Before this beginning to locating tab assembly, for make measurement object to fiducial mark Note in the detection visual field of alignment detection system, (in reference picture 96 whitewash by the X stepwise operations same as described above for carrying out substrate P 2 Arrow).

Then, when substrate P 2 with respect to projection optics system PL it is new to locating tab assembly at the end of, by the basis of main control unit 50 The result, enter to be about to substrate P 2 (and substrate holding PH) be positioned at for carry out substrate P 2 on irradiation area SA6 exposure plus Fast starting position.The state after just having terminated this positioning is shown in Figure 97.

Then, the acceleration of substrate P 2 and mask M +X direction (whitewashes arrow in reference picture 97 by main control unit 50 Head), carry out the irradiation area SA6 scan exposures similar to the above to substrate P 2.

Shown in Figure 98 and the scan exposure of irradiation area SA6 in substrate P 2 terminated, baseplate carrier (PH, 26,28, 32A, 32B) stop state.

Afterwards, substrate holding PH holding area ADA1, ADA2 is switched into exhaust from attraction by main control unit 50, And substrate P 2 is kept with substrate Y steppings conveyer 88 (reference picture 70) absorption of-X sides, as shown in blacking arrow in Figure 98 , taken out of (conveyance) toward -Y direction.Parallel with this, main control unit 50 is with (the ginseng of substrate Y steppings conveyer 88 of+X sides According to Figure 70) absorption holding substrate P 1, as applied in Figure 98 shown in white arrow, taken out of (conveyance) toward +Y direction.

Then, as shown in Figure 99, the substrate P 1 of exposure will be completed, P2 takes out of and new substrate P 3, P4 is same with Figure 72 Remove to (moving into) substrate holding PH.Direction is moved into and taken out of to this occasion, each substrate, also must be not necessarily in Figure 99 The direction of arrow.For example, it can also move into and/or take out of from top or X-direction.

As described above, the exposure device 900 of this 9th embodiment, makes to be equipped with small-sized (substrate due to being made 1/3 size) substrate holding PH fine motion microscope carrier 26 is displaced into 1 axle (X-axis) direction, and substrate is displaced into 2 axles (X-axis and Y Axle) direction, therefore baseplate carrier device PSTh miniaturizations can be made, with above-mentioned each embodiment likewise, obtaining with base The various effects that plate keeps tool PH and baseplate carrier device PSTh miniaturization and come.Furthermore the exposure dress of this 9th embodiment 900 are put, the respective part of 2 plate bases can be equipped on substrate holding PH holding area respectively by main control unit 50 ADA1, ADA2, substrate holding PH, with forming part thereof of baseplate carrier toward X-direction movement so that the part of a substrate The action of irradiation area scan exposure is parallel, another substrate opposing substrate is kept tool PH toward Y with substrate Y steppings conveyer 88 Direction of principal axis moves.Accordingly, with for the 1st plate base, the exposure in 1 irradiation area (unexposed area) is alternately repeated After end, make the substrate stepping mobile so that the exposure and stepping of a secondary irradiation area (unexposed area) exposure are moved to carry out The exposure of the substrate, and the situation being exposed for the 2nd plate base with same program is compared, and can shorten the exposure of 2 plate bases The time required to processing.In addition, this embodiment, the exposure for the plate base of carry out 2 that can be interacted, make the Y stepping times of a substrate with The X sweep times of another substrate are completely overlapped, therefore if being considered for 1 plate base, can be with (the scan exposure of 1 irradiation area Required time+alignment time) × scanning times (number of irradiation area)+α, specifically, can be with being protected without substrate in substrate The existing step-scan mode for holding the replacement on tool is exposed processor substantially with the time of degree, is exposed processing.

Also, in above-mentioned 9th embodiment, it is by 2 plate bases while moves into substrate holding PH (baseplate carrier device PST) Take out of above and from substrate holding PH (baseplate carrier device PSTh) simultaneously., also can be as following however, in exposure device 900 As the variation of explanation, by 2 plate bases, interaction is moved into and from substrate holding PH (baseplate carrier device PSTh) each one Take out of.

《The variation of 9th embodiment》

Figure 100 is comparable to Figure 85 of exposure program explanation figure in above-mentioned 9th embodiment (13) figure, according to master control The instruction of device 50 processed, substrate P 1 is taken out of at this time point to baseplate carrier device PSTh's by conveyance device (not shown) Outside (the blacking block arrow in reference picture 100).- X sides the half of substrate P 1, can be still unexposed as shown in Figure 100 State, can also be exposed in advance.

Main control unit 50, when being exited completely from substrate holding PH during substrate P 1 is taken out of way, with the base of+Y sides Plate X steppings conveyer 91 (reference picture 70) absorption keeps substrate P 2, as applied in Figure 100 shown in white arrow, is transported in -X direction X step distances (distance of substantially 2 times of the X-direction length of irradiation area).

The opposing substrate of substrate P 2 keeps tool PH's at the end of aforesaid substrate P2 X step distances conveyance is shown in Figure 101 Position relationship.Now, new substrate P 3 has been moved on air flotation cell the group 84H and 84J of-Y sides.

From Figure 101 state, controlled by main control unit 50, adsorbed and protected using the substrate Y steppings conveyer 88 of+X sides Substrate P 3 is held, as shown in blacking arrow in Figure 101, carries out the +Y direction stepping movement of substrate P 3.Accordingly, turn into shown in Figure 102 State, substrate P 2 turn into and substrate P in Figure 72 1 and the identical position relationship of substrate P 2 with substrate P 3 on substrate holding PH.

Then, substrate holding PH holding area ADA1, ADA2 is switched to attraction by main control unit 50 from exhaust.According to This, substrate P 3, a P2 part (about the 1/6 of substrate entirety) i.e. adsorbed holding area for being fixed on substrate holding PH ADA1, ADA2, turn into a pair of air flotation cell 84I and air flotation cell group 84H a part of suspension bearing substrate P 3, one of P2 The state of point (substrate all remaining about 5/6).

Secondly, substrate P 3 is new to secondary one of advance facility on locating tab assembly that is, substrate P 3 with respect to projection optics system PL The measurement of irradiation area (this occasion, being the irradiation area SA1 in the substrate P 3) alignment mark of exposure object, i.e., with it is above-mentioned same The progress of sample.

Then, when substrate P 3 with respect to projection optics system PL it is new to locating tab assembly at the end of, main control unit 50 is that root should As a result, coarse motion platform 32A, 32B and micro-move device fine motion microscope carrier 26 are driven, to enter the acceleration of the exposure of places one, by (and the substrate of substrate P 3 Keep tool PH) it is positioned at the scanning starting position (acceleration starting position).Shown in Figure 102 in this way by substrate P 3 (and Substrate holding PH) just it is positioned to carry out the scanning starting position of irradiation area SA1 exposure in substrate P 3 (acceleration start bit Put) after state.

Then, main control unit 50, as in Figure 102 apply white arrow shown in, start substrate P 3 (baseplate carrier (PH, 26,28, 32A, 32B)) acceleration with mask M (mask microscope carrier MST) +X direction, and above-mentioned same irradiation area SA1 is scanned Exposure.

Shown in Figure 103 and the irradiation area SA1 of substrate P 3 scan exposure terminated, baseplate carrier (PH, 26,28, 32A, 32B) stop state.

Secondly, substrate P 2 is new to secondary one of advance facility on locating tab assembly that is, substrate P 2 with respect to projection optics system PL The measurement of irradiation area (this occasion, being the irradiation area SA4 in the substrate P 2) alignment mark of exposure object, i.e., with it is above-mentioned same The progress of sample.

Then, when substrate P 2 with respect to projection optics system PL it is new to locating tab assembly at the end of, main control unit 50 is that root should As a result, coarse motion platform 32A, 32B and micro-move device fine motion microscope carrier 26 are driven, to enter the acceleration of the exposure of places one, by (and the substrate of substrate P 2 Keep tool PH), as applied in Figure 103 shown in white arrow, with it is above-mentioned it is same carry out slightly toward -X direction driving substrate P 2 (and Substrate holding PH) X stepwise operations.Show in Figure 104 and in this way just positioned substrate P 2 (and substrate holding PH) State on for progress substrate P 2 behind the scanning starting position (acceleration starting position) of irradiation area SA4 exposure.

Then, main control unit 50, as in Figure 104 apply white arrow shown in, start substrate P 2 (baseplate carrier (PH, 26,28, 32A, 32B)) acceleration with mask M (mask microscope carrier MST) +X direction, and above-mentioned same irradiation area SA4 is scanned Exposure.Parallel, main control unit 50, as shown in blacking arrow in Figure 104, by substrate P 3 in past on substrate holding PH with this +Y direction is transported to carry out the Y stepwise operations same as described above of substrate P 3.

Figure 105 is shown to be terminated to the scan exposure of irradiation area SA4 in substrate P 2, baseplate carrier (PH, 26,28,32A, 32B) the state stopped.Now, substrate P 3 finishes stepwise operation, and the irradiation area SA2 in substrate P 3 is located at substrate holding On PH holding area ADA1.

Afterwards, substrate holding PH holding area ADA1 is switched to attraction, substrate P 3 by main control unit 50 from exhaust 1/6 part comprising irradiation area SA2 i.e. adsorbed be fixed on holding area ADA1.Now, the remainder of substrate P 3 is (about 5/6) by a pair of the air flotation cell group 84H an of+Y sides part, the air flotation cell group 84H an of-Y sides part and+X sides Air flotation cell 84I suspension bearings.

Then, substrate P 3 is carried out to locating tab assembly that is, set in advance in substrate P 3 with respect to the new of projection optics system PL The measurement for time irradiation area SA2 alignment marks put.Before this is to locating tab assembly, to make the alignment mark position of measurement object In in the detection visual field of alignment detection system, the above-mentioned X stepwise operations (applying white arrow in reference picture 105) of substrate P 3 are carried out.

Then, when substrate P 3 with respect to projection optics system PL it is new to locating tab assembly at the end of, by the basis of main control unit 50 The result, enter to be about to substrate P 3 (and substrate holding PH) be positioned at for carry out substrate P 3 on irradiation area SA2 exposure plus Fast starting position.The state after just having terminated this positioning is shown in Figure 106.

Then, substrate P 3 and mask M -X direction accelerates (to whitewash arrow in reference picture 106 by main control unit 50 Head), carry out the scan exposure of the irradiation area SA2 same as described above to substrate P 3.It is parallel with this, by main control unit 50, as shown in blacking arrow in Figure 106, enter to be about to substrate P 2 in the substrate P 2 transported on substrate holding PH toward -Y direction Above-mentioned identical Y stepwise operations.

Shown in Figure 107 and the scan exposure of irradiation area SA2 in substrate P 3 terminated, baseplate carrier (PH, 26,28, 32A, 32B) stop state.Now, substrate P 2 finishes Y stepwise operations, and the irradiation area SA5 in substrate P 2 is located at substrate guarantor On the holding area ADA2 for holding tool PH.

Afterwards, substrate holding PH holding area ADA2 is switched into attraction, substrate from exhaust by main control unit 50 P2 1/6 part comprising irradiation area SA5 is i.e. adsorbed to be fixed on holding area ADA2.Now, the remainder of substrate P 2 (about 5/6) is a pair of air flotation cell 84I suspension bearings by the air flotation cell group 84H an of-Y sides part and-X sides.

Then, substrate P 2 is carried out to locating tab assembly that is, set in advance in substrate P 2 with respect to the new of projection optics system PL The measurement for time irradiation area SA5 alignment marks put.Before this is to locating tab assembly, to make the alignment mark position of measurement object In in the detection visual field of alignment detection system, the above-mentioned X stepwise operations (applying white arrow in reference picture 107) of substrate P 2 are carried out.

Then, when substrate P 2 with respect to projection optics system PL it is new to locating tab assembly at the end of, by the basis of main control unit 50 The result, enter to be about to substrate P 2 (and substrate holding PH) be positioned at for carry out substrate P 2 on irradiation area SA5 exposure plus Fast starting position.The state after just having terminated this positioning is shown in Figure 108.

Then, substrate P 2 and mask M +X direction accelerates (to whitewash arrow in reference picture 108 by main control unit 50 Head), carry out the scan exposure of the irradiation area SA5 same as described above to substrate P 2.It is parallel with this, by main control unit 50, as shown in blacking arrow in Figure 108, enter to be about to substrate P 2 in the upper of the substrate P 3 transported on substrate holding PH toward +Y direction State identical Y stepwise operations.

Shown in Figure 109 and the scan exposure of irradiation area SA5 in substrate P 2 terminated, baseplate carrier (PH, 26,28, 32A, 32B) stop state.Now, substrate P 3 finishes Y stepwise operations, and the irradiation area SA3 in substrate P 3 is located at substrate guarantor On the holding area ADA1 for holding tool PH.

Afterwards, substrate holding PH holding area ADA1 is switched into attraction, substrate from exhaust by main control unit 50 P3 1/6 part comprising irradiation area SA3 is i.e. adsorbed to be fixed on holding area ADA1.Now, the remainder of substrate P 2 (about 5/6) is a pair of air flotation cell 84I suspension bearings by the air flotation cell group 84H an of+Y sides part and+X sides.

Then, substrate P 3 is carried out to locating tab assembly that is, set in advance in substrate P 3 with respect to the new of projection optics system PL The measurement for time irradiation area SA3 alignment marks put.Before this is to locating tab assembly, to make the alignment mark position of measurement object In in the detection visual field of alignment detection system, the above-mentioned X stepwise operations (applying white arrow in reference picture 109) of substrate P 3 are carried out.

Then, when substrate P 3 with respect to projection optics system PL it is new to locating tab assembly at the end of, by the basis of main control unit 50 The result, enter to be about to substrate P 3 (and substrate holding PH) be positioned at for carry out substrate P 3 on irradiation area SA3 exposure plus Fast starting position.The state after just having terminated this positioning is shown in Figure 110.

Then, substrate P 3 and mask M -X direction accelerates (to whitewash arrow in reference picture 110 by main control unit 50 Head), carry out the scan exposure of the irradiation area SA3 same as described above to substrate P 3.It is parallel with this, by main control unit 50, as shown in blacking arrow in Figure 110, enter to be about to substrate P 2 in the substrate P 2 transported on substrate holding PH toward -Y direction Above-mentioned identical Y stepwise operations.

Shown in Figure 111 and the scan exposure of irradiation area SA3 in substrate P 3 terminated, baseplate carrier (PH, 26,28, 32A, 32B) stop state.Now, substrate P 2 finishes Y stepwise operations, and the irradiation area SA6 in substrate P 2 is located at substrate guarantor On the holding area ADA2 for holding tool PH.

Afterwards, substrate holding PH holding area ADA2 is switched into attraction, substrate from exhaust by main control unit 50 P2 1/6 part comprising irradiation area SA6 is i.e. adsorbed to be fixed on holding area ADA2.Now, the remainder of substrate P 2 (about 5/6) is a pair of air flotation cell 84I suspension bearings by the air flotation cell group 84H an of-Y sides part and-X sides.

Then, substrate P 2 is carried out to locating tab assembly that is, set in advance in substrate P 2 with respect to the new of projection optics system PL The measurement for time irradiation area SA6 alignment marks put.Before this is to locating tab assembly, to make the alignment mark position of measurement object In in the detection visual field of alignment detection system, the above-mentioned X stepwise operations (applying white arrow in reference picture 111) of substrate P 2 are carried out.

Then, when substrate P 2 with respect to projection optics system PL it is new to locating tab assembly at the end of, by the basis of main control unit 50 The result, enter to be about to substrate P 2 (and substrate holding PH) be positioned at for carry out substrate P 2 on irradiation area SA3 exposure plus Fast starting position.The state after just having terminated this positioning is shown in Figure 112.

Then, substrate P 2 and mask M +X direction accelerates (to whitewash arrow in reference picture 110 by main control unit 50 Head), carry out the scan exposure of the irradiation area SA6 same as described above to substrate P 2.

Figure 113 is shown to be terminated to the scan exposure of irradiation area SA6 in substrate P 2, baseplate carrier (PH, 26,28,32A, 32B) the state stopped.

Afterwards, substrate holding PH holding area ADA1, ADA2 is switched to exhaust by main control unit 50 from attraction, and Substrate P 2 is kept with substrate Y steppings conveyer 88 (reference picture 70) absorption of-X sides, as shown in blacking arrow in Figure 113, Taken out of (conveyance) toward -Y direction.Parallel with this, main control unit 50 is with (the reference picture of substrate X steppings conveyer 91 of+Y sides 70) absorption keeps substrate P 3.Then, the time point exited completely from substrate holding PH in substrate P 2, main control unit 50, As applied in Figure 113 shown in white arrow, the X step distances for carrying out substrate P 3 in -X direction transport.

Afterwards, as shown in Figure 114, the substrate P 2 of the comprehensive end exposure of substrate is taken out of, the guarantor in substrate holding PH Hold and new substrate P 4 is moved on the ADA1 of region.

Afterwards, to the substrate P 3 and unexposed substrate P 4 of the end exposures of 3 irradiation areas, it is repeated and above-mentioned base Plate P2 is handled with the identical of substrate P 3.

As previously discussed, this variation is due to changing simultaneously without 2 of substrate and (moving into, take out of), therefore exposure pair The irradiation area change of elephant and the efficiency of substrate replacement operation are better.Specifically, in the exposure journey of above-mentioned 9th embodiment In sequence 13 and 14 (Figure 85 and Figure 86) shown in, without originally substrate P 1 implement X-axis and Y-axis 2 axles move.Also, by In substrate move into and take out of be it is each carry out 1, even if substrate is moved into and taken out of and required (not shown) move into device and remove It is only each 1 to go out device, also replacement operation can be carried out with the short time.

Also, in above-mentioned 9th embodiment and its variation, though with by substrate holding PH holding area ADA1, ADA2 is made about 1/6 area of substrate respectively, and correspondence X-direction 2 face (2 scanning) and the face of Y direction 3 (3 scanning) takes 6 faces The situation of (exposure scan number) is described, but not limited to this, also can be by substrate holding PH holding area ADA1, ADA2 point It is not set as about 1/4 area of substrate.This occasion, it can also correspond to the face of X-direction 2 (2 scanning) and the face of Y direction 2 (2 scanning) Take the situation in 4 faces.

Also, the configuration relation for 2 plate bases that aforesaid substrate keeps configuring on tool PH and the order of exposure area change are only One, it is not limited to this.For example, in above-mentioned 9th embodiment and its variation, though carried out for interaction to 2 plate bases In a side and the opposing party scan exposure (therefore, another substrate and the Y stepwise operations of a substrate be with this it is parallel interact into Situation OK) is described, but the side in 2 plate bases might not be needed to interact progress with the scan exposure of the opposing party.No Cross, be desirable to holding area ADA1, ADA2 being loaded into 2 plate bases on substrate holding PH, at least one of a substrate is shone It is at least partly parallel that the scan exposure in region, which is penetrated, with the Y stepwise operations of another substrate, and one be desirable in 2 plate bases During the exposure of substrate starts untill terminating, the exposure of at least one irradiation area of another substrate is carried out.In this way, with 2 The situation for the exposure for just starting another substrate after the end exposure of a substrate in substrate is compared, and can be terminated with shorter time to 2 The exposure of plate base.

In addition, in above-mentioned 9th embodiment and variation, though lift using with 2 holding areas split with groove portion 2 Substrate holding PH situation exemplified by, but not limited to this, independent 2 substrate holdings arrangement can be also fixed on 1 it is micro- On dynamic load platform.

Also, though substrate X steppings conveyer 91 and substrate Y steppings conveyer 88 are disposed on substrate holding PH week Side, but as long as 2 plate base opposing substrates can be made to keep tool PH mobile as position relationship similar to the above, substrate X The configuration of stepping conveyer 91 and substrate Y steppings conveyer 88, quantity etc. all can be selected arbitrarily.But, substrate Y steppings are transported Send device 88 to carry out (parallel) simultaneously to transport the scan exposure of irradiation area on a substrate and the Y steppings of another substrate, Therefore it is necessarily placed on mounted board holding tool PH fine motion microscope carrier 26 or the moving body integrally moved with substrate holding PH.

《10th embodiment》

Secondly, for the 10th embodiment, it is illustrated according to Figure 115~Figure 117.Herein, with above-mentioned 9th embodiment Identical or equal composition part assigns same or like symbol, and simplifies or the description thereof will be omitted.

Figure 115 is the top view of a part for the exposure device 1000 for eliminating the 10th embodiment.Also, Figure 116 be from+ X-direction observation exposure device 1000, the summary side elevation for eliminating a part.But, Tu116Zhong, with above-mentioned Figure 69 likewise, Coarse motion platform 32 is all being shown with profile for part with weight payment device 28.

The exposure device 1000 of this 10th embodiment, is with above-mentioned 9th embodiment deviation, substitutes aforesaid substrate Bearing table device PSTh and be provided with baseplate carrier device PSTi, composition of other parts etc. is then identical with above-mentioned 9th embodiment.

Baseplate carrier device PSTi, as shown in Figure 116, substitute above-mentioned coarse motion microscope carrier portion 24 and possess coarse motion microscope carrier portion 24 '. Coarse motion microscope carrier portion 24 ', as shown in Figure 116, there is 2 (a pair) X beams 30A ', 30B ', coarse motion platform 32 and by 2 X beams 30A ', 30B ' each multiple foots 34 supported on the F of ground.

Coarse motion platform 32 is to substitute such as 2 coarse motion platform 32A and 32B of aforesaid substrate bearing table device PSTh possesseds and set Person, from Figure 115 and Figure 116, have coarse motion platform 32A and 32B integration and reduce the shape of Y direction size.

Each portion in coarse motion microscope carrier portion 24 ' is formed, by the exposure device of the 4th embodiment with for example illustrating before is had Standby baseplate carrier device PSTc is identical, therefore detailed description will be omitted.

In baseplate carrier device PSTi, as shown in Figure 116, the air flotation cell of substrate holding PH Y direction both sides with Coarse motion platform 32 is separated, is arranged on the F of ground.Furthermore with this change, a pair of substrate Y steppings conveyers 88 and a pair of substrate X steps That enters conveyer 91 is installed on fine motion microscope carrier 26.

In X beams 30A '+Y sides and X beams 30B '-Y sides, as shown in Figure 116, a pair of frames 110A ', 110B ' it is each It is arranged in a manner of it will not be contacted with pallet 18 on the F of ground.Above a pair of frames 110A ', 110B ', provided with a pair of gas Floating one-element group 84H's ' is each.

A pair of air flotation cell group 84H's ' is each, as shown in Figure 115 and Figure 116, configures in substrate holding PH Y-axis side To both sides.A pair of air flotation cell group 84H's ' is each, is compared with substrate (such as P1 or P2) in Y direction width as shown in Figure 115 Y direction width is slightly short, X-direction length and substrate holding PH and aftermentioned a pair of air flotation cells group 84I ' are in exposure program In the rectangular area of middle moving range substantially equal length, by being separated by what given clearance was distributed in X-direction and Y direction Multiple air flotation cells are formed.The X position substantially one at exposure area IA center and center each a pair of air flotation cell group 84H ' Cause.It is to be set to and equal above substrate holding PH or summary above a pair of air flotation cell group 84H ' each air flotation cell It is low.

Also, in baseplate carrier device PSTi, in substrate holding PH X-direction both sides, substitute each pair above-mentioned air supporting Unit 84I is configured with each of a pair of air flotation cell group 84I '.A pair of air flotation cell group 84I ', as shown in Figure 115, respectively by X-direction with predetermined distance configure it is multiple, such as 3 formed in the elongated rectangle air flotation cell of Y direction.Each air flotation cell Interval of the Y direction length compared with a pair of air flotation cell group 84H ' to each other it is slightly short.A pair of air flotation cell group 84I's ' is each, is The mode same with air flotation cell 84I is fixed on above coarse motion platform 32.

Respectively constitute a pair of air flotation cell group 84H ' and a pair of air flotation cell group 84I ' each air flotation cell bearing-surface (on Face), with above-mentioned air flotation cell 84 likewise, being porous plastid or the mechanical disc type air bearing structure with multiple micro holes Make.Each air flotation cell can be by the supply of the gas-pressurized (such as pressure-air) from above-mentioned gas feeding mechanism, and suspend branch Hold a part for substrate.The on/off supplied the pressure-air of each air flotation cell, is controlled by by main control unit 50.

In this 10th embodiment, by above-mentioned a pair of air flotation cells group 84H ' and a pair of air flotation cell group 84I ', even if Be in substrate with baseplate carrier (PH, 26,28,32) in X-direction, such as total-travel mobile when, can also prevent hanging down for substrate, Suspension bearing substrate.

Also, a pair of air flotation cell group 84H ', as long as having the total bearing area substantially equal with above-mentioned rectangular area respectively If, replaceable is single large-scale air flotation cell, and also the shape of each air flotation cell or size can be made different from Figure 115 Those shown, it is distributed in above-mentioned rectangular area.Likewise, a pair of air flotation cell group 84I ' are directed to, also can be by each air supporting list The shape or size of member are made different from Figure 115 those shown.

Also, in baseplate carrier device PSTi, as shown in Figure 116, a pair of substrate X steppings conveyers 91 are disposed on substrate Tool PH Y direction both sides are kept, fine motion microscope carrier 26 is fixed on by supporting member.Likewise, dress is transported in a pair of substrate Y steppings Put 88 also to configure in substrate holding PH X-direction both sides, (the reference picture of fine motion microscope carrier 26 is fixed on by supporting member 115)。

Further, a pair of Y interferometers 98Y₁、98Y₂, it is in composition-Y sides air flotation cell group 84H ' as shown in Figure 115 The 1st multiple air flotation cells of row close to substrate holding PH in, the adjacent air flotation cell near X-direction center each other Between 2 at gap to position, be fixed on side frame 20.Gap at 2, it is relative paired by the Y-axis at exposure area IA centers The gap of title.In this embodiment, from a pair of Y interferometers 98Y₁、98Y₂Respectively by gap at above-mentioned 2, measuring beam (is surveyed Long light beam) it is irradiated in Y moving lens 94Y.

The composition of baseplate carrier device PSTi other parts is identical with aforesaid substrate bearing table device PSTh.

In addition, it can also be set and aforesaid substrate X steppings conveyer 91 and base near a pair of air flotation cell group 84H ' The different another base-board conveying device (not shown) of plate Y steppings conveyer 88, moving into and removing for substrate is carried out by this device Go out.

The exposure device 1000 of this 10th embodiment, is with the identical of exposure device 900 with above-mentioned 9th embodiment Program carries out a series of actions such as substrate replacing, alignment and exposure.

The exposure device 1000 of the embodiment of sheet the 10th according to the above description, it can obtain and above-mentioned 9th embodiment The equal effect of exposure device 900.In addition, in exposure device 1000, due to substrate holding PH Y direction both sides Air flotation cell group 84H ' is formed by fixation and in multiple air flotation cells of X-direction wide scope configuration, therefore is changed in substrate When, substrate can be made standby on fixed air flotation cell group 84H ' in advance, and substrate can be carried out more more efficiently and with the short time Change.In Figure 117, as one, show shown in the exposure program explanation figure (15) in the variation of above-mentioned 9th embodiment Substrate change (reference picture 114), the top view of the situation carried out with the exposure device 1000 of this 10th embodiment.This Close, from Figure 117, before exposure program 15, can with exposure program 14 (reference picture 113), make new substrate P 4 standby The position of diagram.In addition, illustrate 2 plate bases shown in figure (27) simultaneously in the exposure program for carrying out above-mentioned 9th embodiment When changing the situation of (reference picture 99), it can also make 2 new substrates standby on a pair of air flotation cell group 84H ' in advance, therefore energy Efficient and high speed carry out substrate replacing.

Also, according to the exposure device 1000 of this 10th embodiment, due to being the Y direction both sides for making substrate holding PH Air flotation cell group 84H ' separated from baseplate carrier (coarse motion platform 32), therefore the load of baseplate carrier (coarse motion platform 32) can be mitigated, Lift the controlling of baseplate carrier.Further, since air flotation cell group 84H ' each air flotation cell is motionless, therefore have no measurement The Y interferometers 98Y of the Y direction position of fine motion microscope carrier 26₁、98Y₂Measuring beam by the anxiety of air flotation cell masking.Therefore, may be used By Y interferometers 98Y₁、98Y₂Be arranged on the device body of (- Y sides) on the outside of air flotation cell group 84H ' side frame 20 (reference picture 115, Figure 116).

Also, in the exposure device 1000 of this 10th embodiment, movable air flotation cell, substrate X steppings can be transported dress Put 91 and substrate Y steppings conveyer 88 be arranged on the coarse motion that is separated with substrate holding PH (that is, fine motion microscope carrier 26) mechanicalness Platform 32, also can one be installed on substrate holding PH or fine motion microscope carrier 26.

《The variation of 10th embodiment》

Also, in the 10th embodiment, a part for a pair of air flotation cell group 84H ' multiple air flotation cells can will be also formed Baseplate carrier (coarse motion platform 32 or fine motion microscope carrier 26) is installed on, as described above as the 1st embodiment, is made movable air flotation cell. For example, the gas of substrate holding PH-Y sides such as the variation shown in Figure 118 and Figure 119, can be formed with fixed air flotation cell Floating one-element group 84H ', is equipped on baseplate carrier (coarse motion platform 32) by the air flotation cell group 84H of+Y sides of substrate holding and is made Movably.In addition, fixed air flotation cell group 84H ', in Figure 118, though the body BD (exposure devices with mounted board microscope carrier Body) mechanically and in vibration separate and be located on the F of ground, but also may be disposed on body BD.

《11st embodiment》

Secondly, for the 11st embodiment, it is illustrated according to Figure 120.Outline shows this 11st implementation in Figure 120 The composition of the exposure device 1100 of form.Shown in such Figure 120, exposure device 1100, the exposure with above-mentioned each embodiment fills Difference is put to be in it is that AL is located at the substrate for loading substrate P 1, P2 etc. to detect the multiple alignments for the alignment mark for detecting substrate Keep tool PH.

Substrate P 1, P2 for the exposure device 1100 of this 11st embodiment etc., the correspondence in the back side (face of-Z sides) Multiple alignment detections are that the commitment positions of any one in AL are provided with least two alignment mark.Each alignment mark, such as with multiple Graduation mark, can be that AL determines substrate opposing substrate and keeps tool PH position (or to deviate the position of reference position by being directed at detection Offset).

The other parts of exposure device 1100, comprising baseplate carrier device PSTh, be the exposure with above-mentioned 9th embodiment Device 900 equally constitutes.Therefore, the exposure device 1100 of basic 11st embodiment, can obtain and the exposure of the 9th embodiment The equal effect of device 900.In addition, in exposure device 1100, even in the baseplate carrier comprising fine motion microscope carrier 26 In movement, can also carry out substrate to locating tab assembly.Specifically, main control unit 50 can to 2 plate bases, for example to substrate A substrate in P1, P2 carry out in X scannings to another substrate opposing substrate holding tool PH to locating tab assembly.Therefore, master control Device 50 processed can be such that another substrate is carried with fine motion immediately after the X ends of scan of a substrate according to the above-mentioned result to locating tab assembly Platform 26 (substrate holding PH) moves a little together, corrects the position of another substrate according to this.Consequently, it is possible to can be in a substrate Scan exposure terminate after immediately begin to the scan exposure of another substrate, and productivity ratio can be lifted.

Also, in exposure device 1100, alignment detection is that AL is not limited to be located at substrate holding PH, also may be provided in carrying base Plate keeps tool PH fine motion microscope carrier 26.

Also, in the exposure device of above-mentioned 9th~the 11st each embodiment, the air supporting list that will can also be equipped on coarse motion platform Member, substrate Y steppings conveyer, substrate X stepping conveyers etc. are equipped on fine motion microscope carrier, or are set and followed the movement of coarse motion platform Another moving body, in carrying air flotation cell on another moving body to be made in the movable composition of X-direction.This occasion, also Aforesaid substrate Y steppings conveyer 88 can be set on carrying air flotation cell, another moving body for following the movement of coarse motion platform.This Outside, in above-mentioned 9th~the 11st each embodiment, substrate X steppings conveyer 91 can be also configured outside baseplate carrier.

Also, in above-mentioned 1st~the 11st each embodiment, though substrate holding PH Y direction width is set to substrate About 1/3 or 1/2, as long as but substrate holding PH Y direction width it is obvious compared with substrate holding PH Y direction width If short, however it is not limited to this.As long as substrate holding PH Y direction width and exposure field width (the Y side of projection optics system To) with degree more than.For example, the exposure field width (Y-direction) of projection optics system is if (n is more than 2 to the about 1/n of substrate Integer) if, then substrate holding PH width can be also made to the about 1/n of the Y-direction size of substrate.This occasion, configuration In the Y direction width of the air flotation cell of substrate holding PH Y direction both sides, to suppress the flexure of substrate, preferably divide Pact (n-1)/n of the Y direction size of substrate is not made.In addition, substrate Y stepping conveyers, also with substrate can be made completely The Y strokes of all region movements on substrate holding are preferable.

Also, in above-mentioned each embodiment, though it is directed to prevent the purpose of the flexure of substrate P from using the feelings of air flotation cell Shape is described, but not limited to this, and the substrate that can also possess contact-type rolling bearing (using roller or ball etc.) hangs down and prevented Device, to replace at least a portion of the air flotation cell of above-mentioned each embodiment.To prevent the flexure of substrate P, tool also can be used The substrate of bearing components beyond standby air flotation cell, rolling bearing hangs down anti-locking apparatus.

Also, in above-mentioned each embodiment, weight payment device (stem) can carry such as the 1st embodiment using with fine motion Platform segregator (reference picture 1, Fig. 3), also can such as the 2nd~the 11st embodiment use and the one-piece type person of fine motion microscope carrier.In addition, also Can the wrist without the target of level sensor.Also, levelling gear opposite can be configured up and down with weight payment mechanism part.As was noted, The construction of weight payment device is simultaneously defined in above-mentioned each embodiment.

It is described also, though above-mentioned each embodiment is the situation for being directed to the mounted board of fine motion microscope carrier 26 holding tool PH, But not limited to this, during the feelings of the ceramic grade of materials'use as fine motion microscope carrier, etching and processing etc. can be imposed to its upper, will be had Aforesaid substrate with keeping substrate keeps the maintaining part of the tool equal functions of PH to be integrally formed with fine motion microscope carrier.

Also, the common composition part possessed of above-mentioned each embodiment, also having not necessarily must be by the exposure device person of possessing. For example, substrate P is kept into the feelings come the so-called longitudinal type exposure device that is exposed etc. parallel with the face of horizontal plane During shape, because will not produce that substrate deadweight causes hangs down, therefore the substrate supporting device of air flotation cell etc. is not necessarily required to Set.In addition, weight payment device is also nonessential.This occasion, though it is necessary to make the mobile microscope carrier that substrate holding moves , but the movement microscope carrier can be so-called rough micro-moving mechanism microscope carrier or single 6DOF microscope carriers.Importantly, mobile microscope carrier can be (to be less than X-direction) drives substrate holding in X/Y plane, certainly, if if the driving in 6DOF direction can be carried out, More preferably.Furthermore as long as form each other will not contradiction, each portion of composition of above-mentioned 1st~the 11st embodiment can arbitrarily be subject to Combination.

Also, above-mentioned each embodiment, though the sweep type for for exposure device system act with the step-scan of substrate P The occasion of the projection aligner of exposure is described, but not limited to this, and above-mentioned each embodiment is also applicable to stepping engagement (step＆stitch) exposure of the projection aligner of mode and proximity (proximity) mode without using projection optics system Electro-optical device.

Also, in the exposure device of above-mentioned each embodiment, illumination light can be ArF PRKs (wavelength 193nm), Ultraviolet light, the F of KrF PRKs (wavelength 248nm) etc.₂The vacuum-ultraviolet light of laser (wavelength 157nm) etc..In addition, conduct Illumination light, can be used for example will vibrate the single of the infrared bands or visible band from dfb semiconductor laser or optical-fiber laser Wavelength laser, for example to be amplified doped with the fiber amplifier of erbium (or both erbium and ytterbium) as vacuum-ultraviolet light, and with Nonlinear optical crystal is converted wavelength into the harmonic wave of ultraviolet light.In addition, Solid State Laser (wavelength also can be used：355nm、 266nm) etc..

Also, each above-mentioned embodiment, though possess multiple optical systems (projecting optical unit) for projection optics system PL The situation of the projection optics system of poly-lens mode is described, but the quantity not limited to this of projecting optical unit, if having 1 with It is upper.Can also be for example using the large-scale speculum of offner types in addition, being not limited to the projection optics system of poly-lens mode Projection optics system etc..

Also, the projection optics system PL in above-mentioned each embodiment, though for being done using projection multiplying power for the situation of equimultiple Explanation, but not limited to this, projection optics system can also be reduce system or amplification system any.

Also, in above-mentioned each embodiment, though it is used in the mask substrate of transmitance formed with set light-shielding pattern The light transmission type mask of (or phase pattern, dim light pattern), but also may replace this mask and use such as U.S. Patent No. 6, Transmission pattern, reflection graphic patterns or illuminated diagram are formed according to the electronic data of pattern to be exposed disclosed by No. 778,257 specifications The electronics mask (variable shaping mask) of case, for example using non-luminescent type image display element (be also known as spacial light modulater) A kind of DMD (Digital Micro-mirror Device) variable shaping mask.

Also, the exposure device of above-mentioned each embodiment, particularly to making size (include in external diameter, diagonal, one side extremely It is few one) it is the exposure that more than 500mm substrate, the flat-panel monitor such as liquid crystal display cells (FPD) are exposed with large substrate Electro-optical device is particularly effective.This be because the present invention be in response to substrate maximization into therefore.

In addition, the exposure device of above-mentioned each embodiment can be used, the liquid crystal display cells of microcomponent are manufactured.First, will Pattern image is formed at photosensitive substrate (scribbling glass substrate of photoresistance etc.), so-called photoetching process.By this photoetching process, in The predetermined pattern for including multiple electrodes etc. is formed on photosensitive substrate.Afterwards, exposed substrate walks via development step, etching Suddenly, each step of photoresistance stripping step etc., in forming predetermined pattern on substrate.Then, assembled through colored filter forming step, unit Step and module assembling step etc., obtain the liquid crystal display cells of microcomponent.

Also, above-mentioned each embodiment, though as substrate board treatment being described for exposure device, is not limited to This, also can be in the exposure device such as possessing ink jet type functional liquid and assign the element fabricating device or inspection Check devices of device Substrate board treatment in addition, at least part embodiment being applicable in above-mentioned 1st to the 11st embodiment.

In addition, quote described above cited on all publications of exposure device etc., International Publication, United States Patent (USP) Shen Please prospectus and US Patent specification a part of the announcement as this specification record.

Industrial applicability

The substrate board treatment and substrate processing method using same of the present invention is suitable for the processing of large substrate.Also, the exposure of the present invention Light method and exposure device are suitable for the exposure of large substrate.In addition, the manufacturing method and flat-panel monitor of the present invention Manufacture method is suitable for the manufacture of liquid crystal display cells etc..

Claims (24)

1. a kind of exposure device, it possesses：

1st support, adsorb a part for simultaneously bearing objects；

2nd support, the non-contact other parts for supporting the object；

Projection optics system, the part of the object to being supported by the 1st and the 2nd support irradiate illumination light.

2. exposure device as claimed in claim 1, it is further equipped with relative to the projection optics system, and relative driving supporting should The drive division for the scanning direction that 1st and the 2nd past optical axis direction with the projection optics system of support of object intersects.

3. exposure device as claimed in claim 2, wherein, the drive division relative to a side of the 1st and the 2nd support branch Bearing portion, the relative support for driving the opposing party.

4. exposure device as claimed in claim 2 or claim 3, wherein, the drive division is inhaled relative to the 2nd support, relative driving 1st support of the part that is attached and supporting the object.

5. the exposure device as any one of claim 2 to 4, wherein, the 2nd support, handed over the scanning direction The set direction of fork, it is configured at the both sides of the 1st support.

6. the exposure device as any one of claim 1 to 5, it is further equipped with adsorbing and supports the 3rd of the object Support；

3rd support system can relative driving relative to the 1st support.

7. the exposure device as any one of claim 2 to 5, it is further equipped with adsorbing and supports the 3rd of the object Support；

3rd support, can relative driving relative to the 1st support in the set direction intersected with the scanning direction.

8. a kind of exposure device, it possesses：

1st support, adsorb a part for simultaneously bearing objects；

2nd support, the non-contact other parts for supporting the object；

Projection optics system, at least part irradiation illumination light to the object；And

Drive division, relative to the support of a side of the 1st and the 2nd support, the relative support for driving the opposing party.

9. a kind of exposure device, it possesses：

1st support, adsorb a part for simultaneously bearing objects；

2nd support, configured side by side in set direction and the 1st support, and the non-contact other parts for supporting the object；And

Drive division is relative to drive the 1st support in the set direction relative to the 2nd support.

10. exposure device as claimed in claim 9, it is further equipped with being somebody's turn to do to what is supported by the 1st and the 2nd support The projection optics system of the part irradiation illumination light of object；

The direction that the optical axis of the set direction system and the projection optics system intersects.

11. the exposure device as any one of claim 1 to 10, wherein, the 2nd support has under the object The gas supply hole of gas is supplied in face.

12. the exposure device as any one of claim 1 to 11, wherein, the 1st support, which has, attracts the object The suction hole of following gas.

13. the exposure device as any one of claim 1 to 12, wherein, the 1st support, which has, supplies the object The supply orifice of following gas.

14. the exposure device as any one of claim 1 to 13, wherein, the 2nd support is by porous plastid institute shape Into.

15. the exposure device as any one of claim 1 to 14, it is further equipped with using energy beam to the object shape Into the patterning device of predetermined pattern.

16. exposure device as claimed in claim 15, wherein, the objects system is used in the substrate of flat-panel monitor.

17. exposure device as claimed in claim 16, wherein, the length or diagonal length system 500mm on the substrate at least one side More than.

18. a kind of manufacture method of flat-panel monitor, it is included：

Exposure device described in usage right requirement 16 or 17 makes the action that the object exposes；And

The action for making the object after exposure develop.

19. a kind of manufacturing method, it is included：

Exposure device described in usage right requirement 15 makes the action that the object exposes；And

The action for making the object after exposure develop.

20. a kind of exposure method, it makes object scan exposure, comprising：

Adsorb and support the action of a part for the object；

The action of the non-contact other parts for supporting the object；

The action of illumination light at least is irradiated to a part for the object through projection optics system；And

It is relative to drive the past optical axis side with the projection optics system of the object relative to the projection optics system in the scan exposure Action to the scanning direction of intersection.

21. a kind of exposure method, it is included：

By the absorption of the 1st support and the action of a part for bearing objects；

By the action of the non-contact other parts for supporting the object of the 2nd support；

The action of illumination light at least is irradiated to a part for the object through projection optics system；And

Relative to the support of a side of the 1st and the 2nd support, the action of the support of relative driving the opposing party.

22. a kind of exposure method, it is included：

Adsorb the action of a simultaneously part for bearing objects；

The object that non-contact part for being supported on set direction and the object of the adsorbed supporting configures side by side its The action of his part；And

It is relative to drive the adsorbed supporting in the set direction relative to this by the other parts of the object of non-contact supporting The object a part of action.

23. a kind of manufacture method of flat-panel monitor, it, which is included, makes by the exposure any one of claim 20 to 22 The action of object development after method exposure.

24. a kind of manufacturing method, it, which is included, makes to expose by the exposure method any one of claim 20 to 22 The action of object development afterwards.