CN108987470B - 薄膜晶体管、显示面板及薄膜晶体管的制作方法 - Google Patents
薄膜晶体管、显示面板及薄膜晶体管的制作方法 Download PDFInfo
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- CN108987470B CN108987470B CN201810779917.4A CN201810779917A CN108987470B CN 108987470 B CN108987470 B CN 108987470B CN 201810779917 A CN201810779917 A CN 201810779917A CN 108987470 B CN108987470 B CN 108987470B
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- 239000010409 thin film Substances 0.000 title claims abstract description 47
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 23
- 239000011521 glass Substances 0.000 claims abstract description 55
- 239000000758 substrate Substances 0.000 claims abstract description 50
- 229910044991 metal oxide Inorganic materials 0.000 claims abstract description 16
- 150000004706 metal oxides Chemical class 0.000 claims abstract description 16
- BPUBBGLMJRNUCC-UHFFFAOYSA-N oxygen(2-);tantalum(5+) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Ta+5].[Ta+5] BPUBBGLMJRNUCC-UHFFFAOYSA-N 0.000 claims abstract description 10
- 229910001404 rare earth metal oxide Inorganic materials 0.000 claims abstract description 10
- 229910001936 tantalum oxide Inorganic materials 0.000 claims abstract description 9
- URLJKFSTXLNXLG-UHFFFAOYSA-N niobium(5+);oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Nb+5].[Nb+5] URLJKFSTXLNXLG-UHFFFAOYSA-N 0.000 claims abstract description 8
- 229910000314 transition metal oxide Inorganic materials 0.000 claims abstract description 8
- XHCLAFWTIXFWPH-UHFFFAOYSA-N [O-2].[O-2].[O-2].[O-2].[O-2].[V+5].[V+5] Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[V+5].[V+5] XHCLAFWTIXFWPH-UHFFFAOYSA-N 0.000 claims abstract description 7
- 229910003440 dysprosium oxide Inorganic materials 0.000 claims abstract description 7
- NLQFUUYNQFMIJW-UHFFFAOYSA-N dysprosium(iii) oxide Chemical compound O=[Dy]O[Dy]=O NLQFUUYNQFMIJW-UHFFFAOYSA-N 0.000 claims abstract description 7
- 229910052733 gallium Inorganic materials 0.000 claims abstract description 7
- 229910052738 indium Inorganic materials 0.000 claims abstract description 7
- 229910000484 niobium oxide Inorganic materials 0.000 claims abstract description 7
- MMKQUGHLEMYQSG-UHFFFAOYSA-N oxygen(2-);praseodymium(3+) Chemical compound [O-2].[O-2].[O-2].[Pr+3].[Pr+3] MMKQUGHLEMYQSG-UHFFFAOYSA-N 0.000 claims abstract description 7
- UZLYXNNZYFBAQO-UHFFFAOYSA-N oxygen(2-);ytterbium(3+) Chemical compound [O-2].[O-2].[O-2].[Yb+3].[Yb+3] UZLYXNNZYFBAQO-UHFFFAOYSA-N 0.000 claims abstract description 7
- 229910003447 praseodymium oxide Inorganic materials 0.000 claims abstract description 7
- 229910003451 terbium oxide Inorganic materials 0.000 claims abstract description 7
- SCRZPWWVSXWCMC-UHFFFAOYSA-N terbium(iii) oxide Chemical compound [O-2].[O-2].[O-2].[Tb+3].[Tb+3] SCRZPWWVSXWCMC-UHFFFAOYSA-N 0.000 claims abstract description 7
- 229910001935 vanadium oxide Inorganic materials 0.000 claims abstract description 7
- 229910003454 ytterbium oxide Inorganic materials 0.000 claims abstract description 7
- 229940075624 ytterbium oxide Drugs 0.000 claims abstract description 7
- 229910052725 zinc Inorganic materials 0.000 claims abstract description 7
- 238000000034 method Methods 0.000 claims description 41
- 229910052751 metal Inorganic materials 0.000 claims description 39
- 239000002184 metal Substances 0.000 claims description 39
- 230000008569 process Effects 0.000 claims description 24
- 238000000623 plasma-assisted chemical vapour deposition Methods 0.000 claims description 12
- 239000011810 insulating material Substances 0.000 claims description 7
- 239000002243 precursor Substances 0.000 claims description 7
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 claims description 6
- 239000007769 metal material Substances 0.000 claims description 6
- 238000000059 patterning Methods 0.000 claims description 5
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 claims description 4
- 239000005388 borosilicate glass Substances 0.000 claims description 4
- 229910000077 silane Inorganic materials 0.000 claims description 4
- 239000005361 soda-lime glass Substances 0.000 claims description 4
- CSDREXVUYHZDNP-UHFFFAOYSA-N alumanylidynesilicon Chemical compound [Al].[Si] CSDREXVUYHZDNP-UHFFFAOYSA-N 0.000 claims 1
- 239000010410 layer Substances 0.000 description 170
- 238000010586 diagram Methods 0.000 description 13
- 239000000463 material Substances 0.000 description 8
- 239000004065 semiconductor Substances 0.000 description 7
- 239000010408 film Substances 0.000 description 6
- 239000001257 hydrogen Substances 0.000 description 5
- 229910052739 hydrogen Inorganic materials 0.000 description 5
- -1 hydrogen ions Chemical class 0.000 description 5
- 239000011241 protective layer Substances 0.000 description 5
- 238000005516 engineering process Methods 0.000 description 4
- 239000005354 aluminosilicate glass Substances 0.000 description 3
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 3
- 238000005530 etching Methods 0.000 description 3
- 229910021645 metal ion Inorganic materials 0.000 description 3
- 239000001301 oxygen Substances 0.000 description 3
- 229910052760 oxygen Inorganic materials 0.000 description 3
- 238000000206 photolithography Methods 0.000 description 3
- 239000002356 single layer Substances 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- 230000007704 transition Effects 0.000 description 3
- 239000004642 Polyimide Substances 0.000 description 2
- 229910052581 Si3N4 Inorganic materials 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 2
- 230000009471 action Effects 0.000 description 2
- 229910001413 alkali metal ion Inorganic materials 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- 229910021529 ammonia Inorganic materials 0.000 description 2
- 238000000231 atomic layer deposition Methods 0.000 description 2
- UMIVXZPTRXBADB-UHFFFAOYSA-N benzocyclobutene Chemical compound C1=CC=C2CCC2=C1 UMIVXZPTRXBADB-UHFFFAOYSA-N 0.000 description 2
- 239000000969 carrier Substances 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 238000009792 diffusion process Methods 0.000 description 2
- 238000006073 displacement reaction Methods 0.000 description 2
- GNTDGMZSJNCJKK-UHFFFAOYSA-N divanadium pentaoxide Chemical compound O=[V](=O)O[V](=O)=O GNTDGMZSJNCJKK-UHFFFAOYSA-N 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 229910052737 gold Inorganic materials 0.000 description 2
- 229910000449 hafnium oxide Inorganic materials 0.000 description 2
- WIHZLLGSGQNAGK-UHFFFAOYSA-N hafnium(4+);oxygen(2-) Chemical compound [O-2].[O-2].[Hf+4] WIHZLLGSGQNAGK-UHFFFAOYSA-N 0.000 description 2
- 230000003993 interaction Effects 0.000 description 2
- 229910052750 molybdenum Inorganic materials 0.000 description 2
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 2
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 2
- 229920002120 photoresistant polymer Polymers 0.000 description 2
- 238000005240 physical vapour deposition Methods 0.000 description 2
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 2
- 229920001721 polyimide Polymers 0.000 description 2
- 239000004926 polymethyl methacrylate Substances 0.000 description 2
- 238000002360 preparation method Methods 0.000 description 2
- 150000002910 rare earth metals Chemical group 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 2
- 229910052814 silicon oxide Inorganic materials 0.000 description 2
- 229910052709 silver Inorganic materials 0.000 description 2
- 229910052719 titanium Inorganic materials 0.000 description 2
- 239000010936 titanium Substances 0.000 description 2
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 2
- 229910001928 zirconium oxide Inorganic materials 0.000 description 2
- 229910021417 amorphous silicon Inorganic materials 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- ZKATWMILCYLAPD-UHFFFAOYSA-N niobium pentoxide Inorganic materials O=[Nb](=O)O[Nb](=O)=O ZKATWMILCYLAPD-UHFFFAOYSA-N 0.000 description 1
- 238000001259 photo etching Methods 0.000 description 1
- 230000008707 rearrangement Effects 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- PBCFLUZVCVVTBY-UHFFFAOYSA-N tantalum pentoxide Inorganic materials O=[Ta](=O)O[Ta](=O)=O PBCFLUZVCVVTBY-UHFFFAOYSA-N 0.000 description 1
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/02—Semiconductor bodies ; Multistep manufacturing processes therefor
- H01L29/12—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by the materials of which they are formed
- H01L29/24—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by the materials of which they are formed including, apart from doping materials or other impurities, only semiconductor materials not provided for in groups H01L29/16, H01L29/18, H01L29/20, H01L29/22
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/66007—Multistep manufacturing processes
- H01L29/66969—Multistep manufacturing processes of devices having semiconductor bodies not comprising group 14 or group 13/15 materials
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/76—Unipolar devices, e.g. field effect transistors
- H01L29/772—Field effect transistors
- H01L29/78—Field effect transistors with field effect produced by an insulated gate
- H01L29/786—Thin film transistors, i.e. transistors with a channel being at least partly a thin film
- H01L29/78603—Thin film transistors, i.e. transistors with a channel being at least partly a thin film characterised by the insulating substrate or support
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/76—Unipolar devices, e.g. field effect transistors
- H01L29/772—Field effect transistors
- H01L29/78—Field effect transistors with field effect produced by an insulated gate
- H01L29/786—Thin film transistors, i.e. transistors with a channel being at least partly a thin film
- H01L29/7869—Thin film transistors, i.e. transistors with a channel being at least partly a thin film having a semiconductor body comprising an oxide semiconductor material, e.g. zinc oxide, copper aluminium oxide, cadmium stannate
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- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Ceramic Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Manufacturing & Machinery (AREA)
- Thin Film Transistor (AREA)
Abstract
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CN201810779917.4A CN108987470B (zh) | 2018-07-16 | 2018-07-16 | 薄膜晶体管、显示面板及薄膜晶体管的制作方法 |
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CN201810779917.4A CN108987470B (zh) | 2018-07-16 | 2018-07-16 | 薄膜晶体管、显示面板及薄膜晶体管的制作方法 |
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CN108987470A CN108987470A (zh) | 2018-12-11 |
CN108987470B true CN108987470B (zh) | 2021-01-01 |
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Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
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CN109638070B (zh) * | 2018-12-12 | 2021-01-15 | 广州新视界光电科技有限公司 | 氧化物半导体材料、薄膜晶体管及制备方法和显示面板 |
CN109638082B (zh) * | 2018-12-12 | 2021-05-25 | 华南理工大学 | 薄膜晶体管以及制备方法 |
CN110098261A (zh) * | 2019-05-05 | 2019-08-06 | 华南理工大学 | 一种薄膜晶体管及其制作方法、显示基板、面板、装置 |
CN110767745A (zh) * | 2019-09-18 | 2020-02-07 | 华南理工大学 | 复合金属氧化物半导体及薄膜晶体管与应用 |
CN110797395A (zh) * | 2019-09-18 | 2020-02-14 | 华南理工大学 | 掺杂型金属氧化物半导体及薄膜晶体管与应用 |
Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2011201874A (ja) * | 2010-03-05 | 2011-10-13 | Sumitomo Chemical Co Ltd | 多環式化合物及び有機半導体デバイス |
CN102683423A (zh) * | 2012-05-08 | 2012-09-19 | 东莞彩显有机发光科技有限公司 | 一种顶栅结构金属氧化物薄膜晶体管及其制作方法 |
CN105552080A (zh) * | 2016-01-13 | 2016-05-04 | 广州新视界光电科技有限公司 | 基于金属氧化物薄膜晶体管的非挥发性存储器的制备方法 |
CN105575819A (zh) * | 2016-02-26 | 2016-05-11 | 华南理工大学 | 一种顶栅结构金属氧化物薄膜晶体管及其制备方法 |
CN106298879A (zh) * | 2016-09-27 | 2017-01-04 | 广州新视界光电科技有限公司 | 有源层材料、薄膜晶体管及垂直和顶栅结构tft的制作方法 |
CN106356306A (zh) * | 2016-11-14 | 2017-01-25 | 深圳市华星光电技术有限公司 | 顶栅型薄膜晶体管的制作方法及顶栅型薄膜晶体管 |
CN107146816A (zh) * | 2017-04-10 | 2017-09-08 | 华南理工大学 | 一种氧化物半导体薄膜及由其制备的薄膜晶体管 |
-
2018
- 2018-07-16 CN CN201810779917.4A patent/CN108987470B/zh active Active
Patent Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2011201874A (ja) * | 2010-03-05 | 2011-10-13 | Sumitomo Chemical Co Ltd | 多環式化合物及び有機半導体デバイス |
CN102683423A (zh) * | 2012-05-08 | 2012-09-19 | 东莞彩显有机发光科技有限公司 | 一种顶栅结构金属氧化物薄膜晶体管及其制作方法 |
CN105552080A (zh) * | 2016-01-13 | 2016-05-04 | 广州新视界光电科技有限公司 | 基于金属氧化物薄膜晶体管的非挥发性存储器的制备方法 |
CN105575819A (zh) * | 2016-02-26 | 2016-05-11 | 华南理工大学 | 一种顶栅结构金属氧化物薄膜晶体管及其制备方法 |
CN106298879A (zh) * | 2016-09-27 | 2017-01-04 | 广州新视界光电科技有限公司 | 有源层材料、薄膜晶体管及垂直和顶栅结构tft的制作方法 |
CN106356306A (zh) * | 2016-11-14 | 2017-01-25 | 深圳市华星光电技术有限公司 | 顶栅型薄膜晶体管的制作方法及顶栅型薄膜晶体管 |
CN107146816A (zh) * | 2017-04-10 | 2017-09-08 | 华南理工大学 | 一种氧化物半导体薄膜及由其制备的薄膜晶体管 |
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Application publication date: 20181211 Assignee: Shenzhen Yonghang Technology Co.,Ltd. Assignor: SOUTH CHINA University OF TECHNOLOGY Contract record no.: X2021980006808 Denomination of invention: Thin film transistor, display panel and manufacturing method of thin film transistor Granted publication date: 20210101 License type: Exclusive License Record date: 20210726 |
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Effective date of registration: 20230424 Address after: Unit 604, Building 4, Unit 2, Zone 58, Science Park, No. 2 Qingwu Road, Science Park Community, Yuehai Street, Nanshan District, Shenzhen City, Guangdong Province, 518057 Patentee after: Shenzhen Yonghang Technology Co.,Ltd. Address before: 510641 No. five, 381 mountain road, Guangzhou, Guangdong, Tianhe District Patentee before: SOUTH CHINA University OF TECHNOLOGY |