CN108630579B - 制造装置及电子零件的制造方法 - Google Patents

制造装置及电子零件的制造方法 Download PDF

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Publication number
CN108630579B
CN108630579B CN201810208327.6A CN201810208327A CN108630579B CN 108630579 B CN108630579 B CN 108630579B CN 201810208327 A CN201810208327 A CN 201810208327A CN 108630579 B CN108630579 B CN 108630579B
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China
Prior art keywords
semiconductor package
imaging
suction mechanism
opening
arrangement member
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CN201810208327.6A
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English (en)
Chinese (zh)
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CN108630579A (zh
Inventor
今井一郎
深井元树
片冈昌一
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Towa Corp
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Towa Corp
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67121—Apparatus for making assemblies not otherwise provided for, e.g. package constructions
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/6838—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping with gripping and holding devices using a vacuum; Bernoulli devices
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67092—Apparatus for mechanical treatment
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67242—Apparatus for monitoring, sorting or marking
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67242—Apparatus for monitoring, sorting or marking
    • H01L21/67259—Position monitoring, e.g. misposition detection or presence detection
    • H01L21/67265—Position monitoring, e.g. misposition detection or presence detection of substrates stored in a container, a magazine, a carrier, a boat or the like
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/68—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/68—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
    • H01L21/681—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment using optical controlling means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
    • H01L21/77—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
    • H01L21/78—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00—Details of semiconductor or other solid state devices
    • H01L23/552—Protection against radiation, e.g. light or electromagnetic waves

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Power Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Health & Medical Sciences (AREA)
  • Electromagnetism (AREA)
  • Toxicology (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Dicing (AREA)
  • Encapsulation Of And Coatings For Semiconductor Or Solid State Devices (AREA)
CN201810208327.6A 2017-03-16 2018-03-14 制造装置及电子零件的制造方法 Active CN108630579B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2017051101A JP6626027B2 (ja) 2017-03-16 2017-03-16 製造装置および電子部品の製造方法
JP2017-051101 2017-03-16

Publications (2)

Publication Number Publication Date
CN108630579A CN108630579A (zh) 2018-10-09
CN108630579B true CN108630579B (zh) 2022-05-10

Family

ID=63706247

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CN201810208327.6A Active CN108630579B (zh) 2017-03-16 2018-03-14 制造装置及电子零件的制造方法

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Country Link
JP (1) JP6626027B2 (enExample)
KR (1) KR102089097B1 (enExample)
CN (1) CN108630579B (enExample)
TW (1) TWI707444B (enExample)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102143715B1 (ko) * 2019-01-31 2020-08-11 한미반도체 주식회사 테이핑 시스템 및 테이핑 방법
JP7498674B2 (ja) * 2021-01-18 2024-06-12 Ｔｏｗａ株式会社 搬送機構、切断装置及び切断品の製造方法
JP7645142B2 (ja) 2021-07-15 2025-03-13 Ｔｏｗａ株式会社 加工装置、及び加工品の製造方法

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6412637A (en) * 1987-07-06 1989-01-17 Yamatake Honeywell Co Ltd Automatic restoration system of loopback type
JPH0494600A (ja) * 1990-08-11 1992-03-26 Tdk Corp 電子部品装着方法及び装置
JPH0758495A (ja) * 1993-08-20 1995-03-03 Toshiba Corp 電子部品装着装置および電子部品装着位置補正方法
JP2770817B2 (ja) * 1996-06-19 1998-07-02 日本電気株式会社 チップマウント装置及び方法
KR100434832B1 (ko) * 2001-05-29 2004-06-07 주식회사 탑 엔지니어링 플립칩본더장치 및 그 작동방법
EP1535312B1 (en) * 2002-07-17 2007-09-26 Matsushita Electric Industrial Co., Ltd. Method and apparatus for picking up semiconductor chip and suction and exfoliation tool up therefor
JP2007281503A (ja) * 2007-06-01 2007-10-25 Renesas Technology Corp チップ移載装置、およびチップ移載方法
JP2010135574A (ja) * 2008-12-05 2010-06-17 Alpha- Design Kk 移載装置
KR101360007B1 (ko) * 2012-09-27 2014-02-07 한미반도체 주식회사 플립칩 본딩장치
AT512859B1 (de) * 2012-05-11 2018-06-15 Hanmi Semiconductor Co Ltd Halbleiterchip Wende- und Befestigungseinrichtung
JP6000902B2 (ja) * 2013-06-24 2016-10-05 Ｔｏｗａ株式会社 電子部品用の収容治具、その製造方法及び個片化装置
JP6017382B2 (ja) * 2013-07-29 2016-11-02 Ｔｏｗａ株式会社 個片化された電子部品の搬送装置及び搬送方法
JP6355717B2 (ja) * 2014-03-24 2018-07-11 株式会社Ｆｕｊｉ ダイ実装システム及びダイ実装方法
JP6382039B2 (ja) * 2014-09-04 2018-08-29 Ｔｏｗａ株式会社 切断装置並びに吸着機構及びこれを用いる装置
US20160111375A1 (en) * 2014-10-17 2016-04-21 Tango Systems, Inc. Temporary bonding of packages to carrier for depositing metal layer for shielding
JP5845546B1 (ja) * 2014-10-31 2016-01-20 アキム株式会社 搬送装置、組立装置および組立方法
JP6320323B2 (ja) * 2015-03-04 2018-05-09 Ｔｏｗａ株式会社 製造装置、搬送方法、搬送プログラム、および搬送プログラムを格納した記録媒体
KR102247600B1 (ko) * 2015-03-16 2021-05-03 한화정밀기계 주식회사 본딩 장치 및 본딩 방법
KR101590593B1 (ko) * 2015-12-03 2016-02-02 제너셈(주) 반도체패키지의 스퍼터링 방법

Also Published As

Publication number Publication date
KR102089097B1 (ko) 2020-03-13
TWI707444B (zh) 2020-10-11
JP2018157010A (ja) 2018-10-04
KR20180106876A (ko) 2018-10-01
TW201843799A (zh) 2018-12-16
CN108630579A (zh) 2018-10-09
JP6626027B2 (ja) 2019-12-25

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