CN108475019B - 黑色感光性树脂组合物 - Google Patents

黑色感光性树脂组合物 Download PDF

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Publication number
CN108475019B
CN108475019B CN201780007126.3A CN201780007126A CN108475019B CN 108475019 B CN108475019 B CN 108475019B CN 201780007126 A CN201780007126 A CN 201780007126A CN 108475019 B CN108475019 B CN 108475019B
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carbon atoms
bond
alkyl
general formula
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CN108475019A (zh
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松平桂典
三原大树
六谷翔
筱塚豊史
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Adeka Corp
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    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C251/00—Compounds containing nitrogen atoms doubly-bound to a carbon skeleton
    • C07C251/32—Oximes
    • C07C251/62—Oximes having oxygen atoms of oxyimino groups esterified
    • C07C251/64—Oximes having oxygen atoms of oxyimino groups esterified by carboxylic acids
    • C07C251/66—Oximes having oxygen atoms of oxyimino groups esterified by carboxylic acids with the esterifying carboxyl groups bound to hydrogen atoms, to acyclic carbon atoms or to carbon atoms of rings other than six-membered aromatic rings
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C323/00—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups
    • C07C323/23—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and nitrogen atoms, not being part of nitro or nitroso groups, bound to the same carbon skeleton
    • C07C323/46—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and nitrogen atoms, not being part of nitro or nitroso groups, bound to the same carbon skeleton having at least one of the nitrogen atoms, not being part of nitro or nitroso groups, further bound to other hetero atoms
    • C07C323/47—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and nitrogen atoms, not being part of nitro or nitroso groups, bound to the same carbon skeleton having at least one of the nitrogen atoms, not being part of nitro or nitroso groups, further bound to other hetero atoms to oxygen atoms
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D17/00—Pigment pastes, e.g. for mixing in paints
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Nonlinear Science (AREA)
  • Optics & Photonics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Mathematical Physics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Materials For Photolithography (AREA)
  • Optical Filters (AREA)
  • Liquid Crystal (AREA)
CN201780007126.3A 2016-03-29 2017-03-16 黑色感光性树脂组合物 Active CN108475019B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2016-066888 2016-03-29
JP2016066888 2016-03-29
PCT/JP2017/010575 WO2017169819A1 (ja) 2016-03-29 2017-03-16 黒色感光性樹脂組成物

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CN108475019B true CN108475019B (zh) 2022-02-11

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JP (1) JP7041615B2 (ja)
KR (1) KR102400771B1 (ja)
CN (1) CN108475019B (ja)
TW (1) TWI722153B (ja)
WO (1) WO2017169819A1 (ja)

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Publication number Priority date Publication date Assignee Title
WO2018062105A1 (ja) * 2016-09-30 2018-04-05 株式会社Ｄｎｐファインケミカル カラーフィルタ用感光性着色樹脂組成物、カラーフィルタ、及び表示装置
JP7187538B2 (ja) * 2018-03-30 2022-12-12 太陽インキ製造株式会社 アルカリ現像型光硬化性熱硬化性樹脂組成物
US20210271163A1 (en) * 2018-06-29 2021-09-02 Adeka Corporation Oxime ester compound and photopolymerization initiator containing same
JP7253883B2 (ja) * 2018-07-03 2023-04-07 東京応化工業株式会社 レジスト組成物及びレジストパターン形成方法
CN109411788B (zh) * 2018-09-28 2021-07-13 北京化工大学 氮杂螺环阳离子负载型聚联苯碱性膜及其制备方法
JP7313136B2 (ja) * 2018-11-29 2023-07-24 東京応化工業株式会社 感光性樹脂組成物、パターン化された硬化膜の製造方法、及びパターン化された硬化膜
JP7247676B2 (ja) * 2019-03-15 2023-03-29 三菱ケミカル株式会社 感光性着色樹脂組成物、硬化物、及び画像表示装置
CN113646882A (zh) * 2019-03-27 2021-11-12 东丽株式会社 感光性树脂组合物、感光性树脂片、中空结构的制造方法及电子部件
TWI744014B (zh) 2020-09-29 2021-10-21 新應材股份有限公司 黑色樹脂組成物、硬化膜以及黑色濾光片
CN112601374B (zh) * 2020-11-16 2021-12-07 淮安特创科技有限公司 线路板的激光烧油返工方法

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CN101528682A (zh) * 2006-12-27 2009-09-09 株式会社艾迪科 肟酯化合物和含有该化合物的光聚合引发剂
CN101657759A (zh) * 2007-08-01 2010-02-24 株式会社艾迪科 碱显影性感光性树脂组合物和β-二酮化合物
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CN102317863A (zh) * 2009-02-13 2012-01-11 株式会社Lg化学 光活性化合物和含有该化合物的光敏树脂组合物
CN101876788A (zh) * 2009-04-01 2010-11-03 东洋油墨制造株式会社 感光性着色组合物及滤色器
CN102086171A (zh) * 2009-11-27 2011-06-08 株式会社艾迪科 肟酯化合物及含有该化合物的光聚合引发剂
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CN103298782A (zh) * 2011-03-25 2013-09-11 株式会社艾迪科 肟酯化合物以及含有该化合物的光聚合引发剂
CN103502888A (zh) * 2011-04-28 2014-01-08 旭硝子株式会社 负型感光性树脂组合物、固化膜、分隔壁和黑色矩阵及其制造方法、滤色器以及有机el元件
CN103492948A (zh) * 2011-08-04 2014-01-01 株式会社Lg化学 光敏化合物及包括其的光敏树脂组合物
JP2013114249A (ja) * 2011-12-01 2013-06-10 Toppan Printing Co Ltd 黒色感光性樹脂組成物およびカラーフィルタ
CN103309154A (zh) * 2012-03-12 2013-09-18 东京应化工业株式会社 感光性树脂组合物、滤色器、显示装置、光聚合引发剂以及化合物
CN104395824A (zh) * 2012-11-01 2015-03-04 株式会社艾迪科 碱显影性感光性组合物
JP2015041104A (ja) * 2013-08-22 2015-03-02 東友ファインケム株式会社 着色感光性樹脂組成物、これを含むカラーフィルタおよび表示装置
CN104423148A (zh) * 2013-08-22 2015-03-18 东友精细化工有限公司 着色感光性树脂组合物、包含其的滤色器和显示装置
JP2015099313A (ja) * 2013-11-20 2015-05-28 凸版印刷株式会社 黒色感光性樹脂組成物、ブラックマトリックス、カラーフィルタ、液晶表示装置およびエレクトロルミネッセンス表示装置
CN104834181A (zh) * 2014-02-07 2015-08-12 东友精细化工有限公司 着色感光性树脂组合物、包含其的滤色器和显示装置
JP2015200774A (ja) * 2014-04-08 2015-11-12 凸版印刷株式会社 カラーフィルタ基板並びに液晶表示装置
CN105278242A (zh) * 2014-07-15 2016-01-27 东京应化工业株式会社 感光性组合物

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KR102400771B1 (ko) 2022-05-23
TW201802595A (zh) 2018-01-16
JPWO2017169819A1 (ja) 2019-02-14
TWI722153B (zh) 2021-03-21
WO2017169819A1 (ja) 2017-10-05
CN108475019A (zh) 2018-08-31
KR20180121872A (ko) 2018-11-09
JP7041615B2 (ja) 2022-03-24

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