CN108368610A - 层压膜 - Google Patents

层压膜 Download PDF

Info

Publication number
CN108368610A
CN108368610A CN201680064665.6A CN201680064665A CN108368610A CN 108368610 A CN108368610 A CN 108368610A CN 201680064665 A CN201680064665 A CN 201680064665A CN 108368610 A CN108368610 A CN 108368610A
Authority
CN
China
Prior art keywords
film
gas
silicon oxide
amorphous carbon
electrode group
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN201680064665.6A
Other languages
English (en)
Chinese (zh)
Inventor
铃木哲也
二神油谷
白仓眀良
小野哉
小野一哉
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tetra Laval Holdings and Finance SA
Keio University
Original Assignee
Tetra Laval Holdings and Finance SA
Keio University
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tetra Laval Holdings and Finance SA, Keio University filed Critical Tetra Laval Holdings and Finance SA
Publication of CN108368610A publication Critical patent/CN108368610A/zh
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/54—Apparatus specially adapted for continuous coating
    • C23C16/545—Apparatus specially adapted for continuous coating for coating elongated substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/26—Deposition of carbon only
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/40—Oxides
    • C23C16/401—Oxides containing silicon
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Chemical Vapour Deposition (AREA)
  • Laminated Bodies (AREA)
CN201680064665.6A 2015-11-04 2016-11-04 层压膜 Pending CN108368610A (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2015217014A JP6427478B2 (ja) 2015-11-04 2015-11-04 薄膜積層フィルム、その製造方法及びその製造装置
JP2015-217014 2015-11-04
PCT/JP2016/082783 WO2017078133A1 (en) 2015-11-04 2016-11-04 Laminated film

Publications (1)

Publication Number Publication Date
CN108368610A true CN108368610A (zh) 2018-08-03

Family

ID=57442765

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201680064665.6A Pending CN108368610A (zh) 2015-11-04 2016-11-04 层压膜

Country Status (6)

Country Link
US (1) US10934624B2 (https=)
EP (1) EP3371339B1 (https=)
JP (1) JP6427478B2 (https=)
CN (1) CN108368610A (https=)
ES (1) ES2908465T3 (https=)
WO (1) WO2017078133A1 (https=)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP4596776A3 (en) * 2019-02-19 2025-10-29 Xefco Pty Ltd System for treatment and/or coating of substrates
CN111925552B (zh) * 2020-08-04 2022-11-22 佛山金万达科技股份有限公司 热塑性树脂薄膜的表面处理及所得产品
US11910726B2 (en) * 2021-02-26 2024-02-20 Metox International, Inc. Multi-stack susceptor reactor for high-throughput superconductor manufacturing

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11245327A (ja) * 1998-02-27 1999-09-14 Sony Corp 保護膜およびその形成方法
JP2003171770A (ja) * 2001-04-27 2003-06-20 Konica Corp プラズマ放電処理装置、プラズマ放電処理方法、その方法で製造された薄膜及び積層体、及び光学フィルム、光学フィルムを用いた偏光板及び表示装置
JP2008094447A (ja) * 2006-10-13 2008-04-24 Toppan Printing Co Ltd 薄膜被覆されたプラスチック容器

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3176558B2 (ja) 1996-02-09 2001-06-18 麒麟麦酒株式会社 コーティングフィルムおよびその製造方法
US6027793A (en) * 1997-11-03 2000-02-22 Alusuisse Technology & Management Ltd. Packaging film
JP4121619B2 (ja) 1998-06-08 2008-07-23 大日本印刷株式会社 透明バリア性フィルムおよびそれを使用した積層体
JP4809973B2 (ja) 2000-11-15 2011-11-09 積水化学工業株式会社 半導体素子の製造方法及びその装置
WO2003000559A1 (fr) * 2001-06-26 2003-01-03 Mitsubishi Shoji Plastics Corporation Dispositif de fabrication d'un recipient en plastique revetu d'un film de carbone sous forme de diamant amorphe, recipient ainsi obtenu et procede de fabrication dudit recipient
US7453705B2 (en) * 2002-05-07 2008-11-18 Alien Technology Corporation Barrier, such as a hermetic barrier layer for O/PLED and other electronic devices on plastic
JP4738724B2 (ja) 2003-02-18 2011-08-03 日本碍子株式会社 薄膜の製造方法
JP2005088452A (ja) * 2003-09-18 2005-04-07 Dainippon Printing Co Ltd ガスバリア性フィルム及びそれを用いてなる積層体
EP2123446A4 (en) 2007-02-06 2012-04-11 Konica Minolta Holdings Inc TRANSPARENT GASPERRFILM AND METHOD FOR PRODUCING A TRANSLUCENT GASPERRFILM
JP2009161782A (ja) * 2007-12-28 2009-07-23 Konica Minolta Business Technologies Inc 大気圧プラズマ処理装置
JP5223466B2 (ja) * 2008-05-30 2013-06-26 大日本印刷株式会社 ガスバリア性フィルム及びその製造方法
JP5780154B2 (ja) * 2009-03-04 2015-09-16 コニカミノルタ株式会社 薄膜を有する基材の製造方法
JP2010208277A (ja) * 2009-03-12 2010-09-24 Kanagawa Acad Of Sci & Technol プラスチック系材料およびその製造方法
JP6042156B2 (ja) 2012-09-27 2016-12-14 学校法人慶應義塾 積層体とその製造方法

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11245327A (ja) * 1998-02-27 1999-09-14 Sony Corp 保護膜およびその形成方法
JP2003171770A (ja) * 2001-04-27 2003-06-20 Konica Corp プラズマ放電処理装置、プラズマ放電処理方法、その方法で製造された薄膜及び積層体、及び光学フィルム、光学フィルムを用いた偏光板及び表示装置
JP2008094447A (ja) * 2006-10-13 2008-04-24 Toppan Printing Co Ltd 薄膜被覆されたプラスチック容器

Also Published As

Publication number Publication date
EP3371339A1 (en) 2018-09-12
JP6427478B2 (ja) 2018-11-21
ES2908465T3 (es) 2022-04-29
US10934624B2 (en) 2021-03-02
US20180320268A1 (en) 2018-11-08
JP2017087465A (ja) 2017-05-25
WO2017078133A1 (en) 2017-05-11
EP3371339B1 (en) 2022-01-05

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SE01 Entry into force of request for substantive examination
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Application publication date: 20180803