JP6427478B2 - 薄膜積層フィルム、その製造方法及びその製造装置 - Google Patents

薄膜積層フィルム、その製造方法及びその製造装置 Download PDF

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Publication number
JP6427478B2
JP6427478B2 JP2015217014A JP2015217014A JP6427478B2 JP 6427478 B2 JP6427478 B2 JP 6427478B2 JP 2015217014 A JP2015217014 A JP 2015217014A JP 2015217014 A JP2015217014 A JP 2015217014A JP 6427478 B2 JP6427478 B2 JP 6427478B2
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Japan
Prior art keywords
thin film
film
based thin
amorphous carbon
silicon oxide
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JP2015217014A
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English (en)
Japanese (ja)
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JP2017087465A5 (https=
JP2017087465A (ja
Inventor
鈴木　哲也
哲也 鈴木
裕也 二神
裕也 二神
昌 白倉
昌 白倉
小野　和也
和也 小野
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Keio University
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Keio University
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Publication date
Priority to JP2015217014A priority Critical patent/JP6427478B2/ja
Application filed by Keio University filed Critical Keio University
Priority to EP16804917.9A priority patent/EP3371339B1/en
Priority to ES16804917T priority patent/ES2908465T3/es
Priority to CN201680064665.6A priority patent/CN108368610A/zh
Priority to US15/773,499 priority patent/US10934624B2/en
Priority to PCT/JP2016/082783 priority patent/WO2017078133A1/en
Publication of JP2017087465A publication Critical patent/JP2017087465A/ja
Publication of JP2017087465A5 publication Critical patent/JP2017087465A5/ja
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Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/54—Apparatus specially adapted for continuous coating
    • C23C16/545—Apparatus specially adapted for continuous coating for coating elongated substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/26—Deposition of carbon only
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/40—Oxides
    • C23C16/401—Oxides containing silicon
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Chemical Vapour Deposition (AREA)
  • Laminated Bodies (AREA)
JP2015217014A 2015-11-04 2015-11-04 薄膜積層フィルム、その製造方法及びその製造装置 Active JP6427478B2 (ja)

Priority Applications (6)

Application Number Priority Date Filing Date Title
JP2015217014A JP6427478B2 (ja) 2015-11-04 2015-11-04 薄膜積層フィルム、その製造方法及びその製造装置
ES16804917T ES2908465T3 (es) 2015-11-04 2016-11-04 Película laminada
CN201680064665.6A CN108368610A (zh) 2015-11-04 2016-11-04 层压膜
US15/773,499 US10934624B2 (en) 2015-11-04 2016-11-04 Laminated film
EP16804917.9A EP3371339B1 (en) 2015-11-04 2016-11-04 Laminated film
PCT/JP2016/082783 WO2017078133A1 (en) 2015-11-04 2016-11-04 Laminated film

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2015217014A JP6427478B2 (ja) 2015-11-04 2015-11-04 薄膜積層フィルム、その製造方法及びその製造装置

Publications (3)

Publication Number Publication Date
JP2017087465A JP2017087465A (ja) 2017-05-25
JP2017087465A5 JP2017087465A5 (https=) 2018-06-28
JP6427478B2 true JP6427478B2 (ja) 2018-11-21

Family

ID=57442765

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2015217014A Active JP6427478B2 (ja) 2015-11-04 2015-11-04 薄膜積層フィルム、その製造方法及びその製造装置

Country Status (6)

Country Link
US (1) US10934624B2 (https=)
EP (1) EP3371339B1 (https=)
JP (1) JP6427478B2 (https=)
CN (1) CN108368610A (https=)
ES (1) ES2908465T3 (https=)
WO (1) WO2017078133A1 (https=)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP4596776A3 (en) * 2019-02-19 2025-10-29 Xefco Pty Ltd System for treatment and/or coating of substrates
CN111925552B (zh) * 2020-08-04 2022-11-22 佛山金万达科技股份有限公司 热塑性树脂薄膜的表面处理及所得产品
US11910726B2 (en) * 2021-02-26 2024-02-20 Metox International, Inc. Multi-stack susceptor reactor for high-throughput superconductor manufacturing

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3176558B2 (ja) 1996-02-09 2001-06-18 麒麟麦酒株式会社 コーティングフィルムおよびその製造方法
US6027793A (en) * 1997-11-03 2000-02-22 Alusuisse Technology & Management Ltd. Packaging film
JPH11245327A (ja) * 1998-02-27 1999-09-14 Sony Corp 保護膜およびその形成方法
JP4121619B2 (ja) 1998-06-08 2008-07-23 大日本印刷株式会社 透明バリア性フィルムおよびそれを使用した積層体
JP4809973B2 (ja) 2000-11-15 2011-11-09 積水化学工業株式会社 半導体素子の製造方法及びその装置
JP4000830B2 (ja) * 2001-04-27 2007-10-31 コニカミノルタホールディングス株式会社 プラズマ放電処理装置
WO2003000559A1 (fr) * 2001-06-26 2003-01-03 Mitsubishi Shoji Plastics Corporation Dispositif de fabrication d'un recipient en plastique revetu d'un film de carbone sous forme de diamant amorphe, recipient ainsi obtenu et procede de fabrication dudit recipient
US7453705B2 (en) * 2002-05-07 2008-11-18 Alien Technology Corporation Barrier, such as a hermetic barrier layer for O/PLED and other electronic devices on plastic
JP4738724B2 (ja) 2003-02-18 2011-08-03 日本碍子株式会社 薄膜の製造方法
JP2005088452A (ja) * 2003-09-18 2005-04-07 Dainippon Printing Co Ltd ガスバリア性フィルム及びそれを用いてなる積層体
JP2008094447A (ja) * 2006-10-13 2008-04-24 Toppan Printing Co Ltd 薄膜被覆されたプラスチック容器
EP2123446A4 (en) 2007-02-06 2012-04-11 Konica Minolta Holdings Inc TRANSPARENT GASPERRFILM AND METHOD FOR PRODUCING A TRANSLUCENT GASPERRFILM
JP2009161782A (ja) * 2007-12-28 2009-07-23 Konica Minolta Business Technologies Inc 大気圧プラズマ処理装置
JP5223466B2 (ja) * 2008-05-30 2013-06-26 大日本印刷株式会社 ガスバリア性フィルム及びその製造方法
JP5780154B2 (ja) * 2009-03-04 2015-09-16 コニカミノルタ株式会社 薄膜を有する基材の製造方法
JP2010208277A (ja) * 2009-03-12 2010-09-24 Kanagawa Acad Of Sci & Technol プラスチック系材料およびその製造方法
JP6042156B2 (ja) 2012-09-27 2016-12-14 学校法人慶應義塾 積層体とその製造方法

Also Published As

Publication number Publication date
EP3371339A1 (en) 2018-09-12
ES2908465T3 (es) 2022-04-29
US10934624B2 (en) 2021-03-02
US20180320268A1 (en) 2018-11-08
JP2017087465A (ja) 2017-05-25
CN108368610A (zh) 2018-08-03
WO2017078133A1 (en) 2017-05-11
EP3371339B1 (en) 2022-01-05

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