CN108139673B - 包含金属氧化物的材料、其制备方法及其使用方法 - Google Patents

包含金属氧化物的材料、其制备方法及其使用方法 Download PDF

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Publication number
CN108139673B
CN108139673B CN201680057594.7A CN201680057594A CN108139673B CN 108139673 B CN108139673 B CN 108139673B CN 201680057594 A CN201680057594 A CN 201680057594A CN 108139673 B CN108139673 B CN 108139673B
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China
Prior art keywords
composition
solvent
metal salt
stabilizer
combinations
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CN201680057594.7A
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English (en)
Chinese (zh)
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CN108139673A (zh
Inventor
姚晖蓉
M·D·拉赫曼
D·麦肯齐
J·赵
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Wisdom Buy
Merck Patent GmbH
AZ Electronic Materials Japan Co Ltd
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Merck Patent GmbH
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/11—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D1/00—Coating compositions, e.g. paints, varnishes or lacquers, based on inorganic substances
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/091—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D5/00—Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
    • C09D5/006—Anti-reflective coatings
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D7/00—Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
    • C09D7/40—Additives
    • C09D7/48—Stabilisers against degradation by oxygen, light or heat

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Organic Chemistry (AREA)
  • Wood Science & Technology (AREA)
  • Materials Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Structural Engineering (AREA)
  • Architecture (AREA)
  • Inorganic Chemistry (AREA)
  • Materials For Photolithography (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Paints Or Removers (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
CN201680057594.7A 2015-12-22 2016-12-20 包含金属氧化物的材料、其制备方法及其使用方法 Active CN108139673B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US14/978,232 2015-12-22
US14/978,232 US10241409B2 (en) 2015-12-22 2015-12-22 Materials containing metal oxides, processes for making same, and processes for using same
PCT/EP2016/081970 WO2017108822A1 (en) 2015-12-22 2016-12-20 Materials containing metal oxides, processes for making same, and processes for using same

Publications (2)

Publication Number Publication Date
CN108139673A CN108139673A (zh) 2018-06-08
CN108139673B true CN108139673B (zh) 2021-06-15

Family

ID=57838322

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201680057594.7A Active CN108139673B (zh) 2015-12-22 2016-12-20 包含金属氧化物的材料、其制备方法及其使用方法

Country Status (8)

Country Link
US (1) US10241409B2 (enExample)
EP (1) EP3394675B1 (enExample)
JP (1) JP6838063B2 (enExample)
KR (1) KR102324679B1 (enExample)
CN (1) CN108139673B (enExample)
IL (1) IL257619A (enExample)
TW (1) TWI689555B (enExample)
WO (1) WO2017108822A1 (enExample)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP3360933A1 (de) * 2017-02-08 2018-08-15 Evonik Degussa GmbH Direkt-strukturierbare formulierungen auf der basis von metalloxid-prekursoren zur herstellung oxidischer schichten
US20210109451A1 (en) * 2019-10-11 2021-04-15 Merck Patent Gmbh Spin-on metal oxide materials of high etch resistance useful in image reversal technique and related semiconductor manufacturing processes
WO2024128013A1 (ja) * 2022-12-16 2024-06-20 Jsr株式会社 レジスト下層膜形成用組成物、半導体基板の製造方法、レジスト下層膜の形成方法及び金属化合物の製造方法
WO2025178071A1 (ja) * 2024-02-21 2025-08-28 株式会社巴川コーポレーション ドライエッチングマスク用組成物

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CN102548895A (zh) * 2009-09-28 2012-07-04 第一工业制药株式会社 含金属盐的组合物、基板及基板的制造方法
CN103681253A (zh) * 2012-09-23 2014-03-26 罗门哈斯电子材料有限公司 硬掩模
WO2014207142A1 (en) * 2013-06-28 2014-12-31 AZ Electronic Materials (Luxembourg) S.à.r.l. Spin-on compositions of soluble metal oxide carboxylates and methods of their use
WO2015053194A1 (ja) * 2013-10-07 2015-04-16 日産化学工業株式会社 ポリ酸を含むメタル含有レジスト下層膜形成組成物

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JP3383838B2 (ja) * 1999-02-25 2003-03-10 独立行政法人産業技術総合研究所 金属酸化物の製造方法及び微細パターンの形成方法
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JP5990541B2 (ja) * 2011-02-02 2016-09-14 アドヴェニラ エンタープライジーズ，インコーポレイテッド 溶液誘導ナノ複合体の前駆体溶液、薄膜を作製するための方法およびこのような方法によって作製される薄膜
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Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102548895A (zh) * 2009-09-28 2012-07-04 第一工业制药株式会社 含金属盐的组合物、基板及基板的制造方法
CN103681253A (zh) * 2012-09-23 2014-03-26 罗门哈斯电子材料有限公司 硬掩模
WO2014207142A1 (en) * 2013-06-28 2014-12-31 AZ Electronic Materials (Luxembourg) S.à.r.l. Spin-on compositions of soluble metal oxide carboxylates and methods of their use
WO2015053194A1 (ja) * 2013-10-07 2015-04-16 日産化学工業株式会社 ポリ酸を含むメタル含有レジスト下層膜形成組成物

Also Published As

Publication number Publication date
IL257619A (en) 2018-06-28
WO2017108822A1 (en) 2017-06-29
US10241409B2 (en) 2019-03-26
JP6838063B2 (ja) 2021-03-03
KR20180094850A (ko) 2018-08-24
EP3394675B1 (en) 2020-01-29
JP2019508509A (ja) 2019-03-28
US20170176860A1 (en) 2017-06-22
TWI689555B (zh) 2020-04-01
EP3394675A1 (en) 2018-10-31
CN108139673A (zh) 2018-06-08
KR102324679B1 (ko) 2021-11-10
TW201739847A (zh) 2017-11-16

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