IL257619A - Materials containing metal oxides, processes for their preparation and processes for their use - Google Patents

Materials containing metal oxides, processes for their preparation and processes for their use

Info

Publication number
IL257619A
IL257619A IL257619A IL25761918A IL257619A IL 257619 A IL257619 A IL 257619A IL 257619 A IL257619 A IL 257619A IL 25761918 A IL25761918 A IL 25761918A IL 257619 A IL257619 A IL 257619A
Authority
IL
Israel
Prior art keywords
processes
same
metal oxides
containing metal
materials containing
Prior art date
Application number
IL257619A
Other languages
English (en)
Hebrew (he)
Original Assignee
Az Electronic Mat Luxembourg Sarl
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Az Electronic Mat Luxembourg Sarl filed Critical Az Electronic Mat Luxembourg Sarl
Publication of IL257619A publication Critical patent/IL257619A/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/091—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D1/00—Coating compositions, e.g. paints, varnishes or lacquers, based on inorganic substances
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D5/00—Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
    • C09D5/006—Anti-reflective coatings
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D7/00—Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
    • C09D7/40—Additives
    • C09D7/48—Stabilisers against degradation by oxygen, light or heat
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/11—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Structural Engineering (AREA)
  • Architecture (AREA)
  • Inorganic Chemistry (AREA)
  • Materials For Photolithography (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Paints Or Removers (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
IL257619A 2015-12-22 2018-02-19 Materials containing metal oxides, processes for their preparation and processes for their use IL257619A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US14/978,232 US10241409B2 (en) 2015-12-22 2015-12-22 Materials containing metal oxides, processes for making same, and processes for using same
PCT/EP2016/081970 WO2017108822A1 (en) 2015-12-22 2016-12-20 Materials containing metal oxides, processes for making same, and processes for using same

Publications (1)

Publication Number Publication Date
IL257619A true IL257619A (en) 2018-06-28

Family

ID=57838322

Family Applications (1)

Application Number Title Priority Date Filing Date
IL257619A IL257619A (en) 2015-12-22 2018-02-19 Materials containing metal oxides, processes for their preparation and processes for their use

Country Status (8)

Country Link
US (1) US10241409B2 (enExample)
EP (1) EP3394675B1 (enExample)
JP (1) JP6838063B2 (enExample)
KR (1) KR102324679B1 (enExample)
CN (1) CN108139673B (enExample)
IL (1) IL257619A (enExample)
TW (1) TWI689555B (enExample)
WO (1) WO2017108822A1 (enExample)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP3360933A1 (de) * 2017-02-08 2018-08-15 Evonik Degussa GmbH Direkt-strukturierbare formulierungen auf der basis von metalloxid-prekursoren zur herstellung oxidischer schichten
US20210109451A1 (en) * 2019-10-11 2021-04-15 Merck Patent Gmbh Spin-on metal oxide materials of high etch resistance useful in image reversal technique and related semiconductor manufacturing processes
WO2024128013A1 (ja) * 2022-12-16 2024-06-20 Jsr株式会社 レジスト下層膜形成用組成物、半導体基板の製造方法、レジスト下層膜の形成方法及び金属化合物の製造方法
WO2025178071A1 (ja) * 2024-02-21 2025-08-28 株式会社巴川コーポレーション ドライエッチングマスク用組成物

Family Cites Families (36)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4646707A (en) 1981-03-30 1987-03-03 Pfefferle William C Method of operating catalytic ignition engines and apparatus therefor
US4491628A (en) 1982-08-23 1985-01-01 International Business Machines Corporation Positive- and negative-working resist compositions with acid generating photoinitiator and polymer with acid labile groups pendant from polymer backbone
DE69125634T2 (de) 1990-01-30 1998-01-02 Wako Pure Chem Ind Ltd Chemisch verstärktes Photolack-Material
US5843624A (en) 1996-03-08 1998-12-01 Lucent Technologies Inc. Energy-sensitive resist material and a process for device fabrication using an energy-sensitive resist material
US6808859B1 (en) 1996-12-31 2004-10-26 Hyundai Electronics Industries Co., Ltd. ArF photoresist copolymers
US7384680B2 (en) 1997-07-21 2008-06-10 Nanogram Corporation Nanoparticle-based power coatings and corresponding structures
US6952504B2 (en) 2001-12-21 2005-10-04 Neophotonics Corporation Three dimensional engineering of planar optical structures
US6599631B2 (en) 2001-01-26 2003-07-29 Nanogram Corporation Polymer-inorganic particle composites
US6849334B2 (en) 2001-08-17 2005-02-01 Neophotonics Corporation Optical materials and optical devices
US20090075083A1 (en) 1997-07-21 2009-03-19 Nanogram Corporation Nanoparticle production and corresponding structures
US8568684B2 (en) 2000-10-17 2013-10-29 Nanogram Corporation Methods for synthesizing submicron doped silicon particles
US6849377B2 (en) 1998-09-23 2005-02-01 E. I. Du Pont De Nemours And Company Photoresists, polymers and processes for microlithography
JP3383838B2 (ja) * 1999-02-25 2003-03-10 独立行政法人産業技術総合研究所 金属酸化物の製造方法及び微細パターンの形成方法
US6790587B1 (en) 1999-05-04 2004-09-14 E. I. Du Pont De Nemours And Company Fluorinated polymers, photoresists and processes for microlithography
US6890448B2 (en) 1999-06-11 2005-05-10 Shipley Company, L.L.C. Antireflective hard mask compositions
WO2001098834A1 (en) 2000-06-21 2001-12-27 Asahi Glass Company, Limited Resist composition
US6447980B1 (en) 2000-07-19 2002-09-10 Clariant Finance (Bvi) Limited Photoresist composition for deep UV and process thereof
KR100776551B1 (ko) 2001-02-09 2007-11-16 아사히 가라스 가부시키가이샤 레지스트 조성물
US6723435B1 (en) 2001-08-28 2004-04-20 Nanogram Corporation Optical fiber preforms
JP3737729B2 (ja) * 2001-09-26 2006-01-25 株式会社東芝 非水電解液電池および非水電解液
US6723488B2 (en) 2001-11-07 2004-04-20 Clariant Finance (Bvi) Ltd Photoresist composition for deep UV radiation containing an additive
US7521097B2 (en) 2003-06-06 2009-04-21 Nanogram Corporation Reactive deposition for electrochemical cell production
US8865271B2 (en) 2003-06-06 2014-10-21 Neophotonics Corporation High rate deposition for the formation of high quality optical coatings
KR101158298B1 (ko) 2003-12-26 2012-06-26 닛산 가가쿠 고교 가부시키 가이샤 하드 마스크용 도포형 질화막 형성 조성물
US7491431B2 (en) 2004-12-20 2009-02-17 Nanogram Corporation Dense coating formation by reactive deposition
US20060248665A1 (en) 2005-05-06 2006-11-09 Pluyter Johan G L Encapsulated fragrance materials and methods for making same
US8039201B2 (en) 2007-11-21 2011-10-18 Az Electronic Materials Usa Corp. Antireflective coating composition and process thereof
KR101315268B1 (ko) * 2009-09-28 2013-10-08 다이이치 고교 세이야쿠 가부시키가이샤 금속염 함유 조성물, 기판 및 기판의 제조 방법
KR101212626B1 (ko) * 2010-03-05 2012-12-14 연세대학교 산학협력단 금속산화물 박막 및 그 제조 방법, 금속산화물 박막용 용액
RU2590434C2 (ru) * 2011-02-02 2016-07-10 Адвенира Энтерпрайзис, Инк. Растворы-предшественники нанокомпозитов, нанесенных из раствора, способы получения тонких пленок и тонкие пленки, полученные этими способами
JP5823141B2 (ja) * 2011-03-09 2015-11-25 株式会社Adeka 酸化亜鉛系膜の製造方法
US8795774B2 (en) * 2012-09-23 2014-08-05 Rohm And Haas Electronic Materials Llc Hardmask
US9315636B2 (en) * 2012-12-07 2016-04-19 Az Electronic Materials (Luxembourg) S.A.R.L. Stable metal compounds, their compositions and methods
US9201305B2 (en) 2013-06-28 2015-12-01 Az Electronic Materials (Luxembourg) S.A.R.L. Spin-on compositions of soluble metal oxide carboxylates and methods of their use
JP6053725B2 (ja) * 2013-07-04 2016-12-27 国立大学法人京都大学 銅系ナノ粒子分散液とその製造方法及びその分散液から製造される銅導体膜が形成された基材
US9725618B2 (en) * 2013-10-07 2017-08-08 Nissan Chemical Industries, Ltd. Metal-containing resist underlayer film-forming composition containing polyacid

Also Published As

Publication number Publication date
KR102324679B1 (ko) 2021-11-10
KR20180094850A (ko) 2018-08-24
EP3394675A1 (en) 2018-10-31
US10241409B2 (en) 2019-03-26
CN108139673A (zh) 2018-06-08
EP3394675B1 (en) 2020-01-29
TWI689555B (zh) 2020-04-01
TW201739847A (zh) 2017-11-16
CN108139673B (zh) 2021-06-15
WO2017108822A1 (en) 2017-06-29
JP6838063B2 (ja) 2021-03-03
JP2019508509A (ja) 2019-03-28
US20170176860A1 (en) 2017-06-22

Similar Documents

Publication Publication Date Title
PT3283435T (pt) Composição, materiais particulados e métodos para preparação de materiais particulados
PL3105309T3 (pl) Proszek i granulka, sposób wytwarzania takiego proszku i granulki oraz ich zastosowanie
GB2544359B (en) Process and catalyst
PL3186001T3 (pl) Sorbent do wiązania metali, jego wytwarzanie i stosowanie do wiązania metali
HUE059771T2 (hu) Gombaellenes vegyületek és eljárások azok elõállítására
GB2552040B (en) Process for reducing nitrogen oxides
SG11201709414XA (en) Powdered titanium oxide, method for the production thereof, and use thereof
GB2562178B (en) Process for reducing nitrogen oxides
SG11201709884UA (en) Spout-equipped container and method for manufacturing same
ZA201900689B (en) New composition and process
PL3456687T3 (pl) Proszek tlenku magnezu i sposób jego wytwarzania
IL257434A (en) Mrka polypeptides, antibodies, and uses thereof
PL3145660T3 (pl) Proszek metalu
GB201412213D0 (en) Material,composition and method
IL257619A (en) Materials containing metal oxides, processes for their preparation and processes for their use
PT3350150T (pt) 1,1-difeniletilenos substituídos por alcenilfenoxilo, processos para a sua preparação e sua utilização
SG11201801556PA (en) Ethoxylation catalyst and manufacturing method therefor
GB201613244D0 (en) Powder and process
GB201502983D0 (en) Composition and process
GB201613243D0 (en) Powder and process
PL3263133T3 (pl) Związek pirydynonu i jego zastosowanie
GB201501593D0 (en) New compounds and processes
ZA201805350B (en) Precious metal compounds
PT3389858T (pt) Composição do catalisador, sua preparação e processo usando esta composição
GB201601514D0 (en) New processes and compounds