CN1073912C - 改进型抛光衬垫和它们的应用方法 - Google Patents

改进型抛光衬垫和它们的应用方法 Download PDF

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CN1073912C
CN1073912C CN95190278A CN95190278A CN1073912C CN 1073912 C CN1073912 C CN 1073912C CN 95190278 A CN95190278 A CN 95190278A CN 95190278 A CN95190278 A CN 95190278A CN 1073912 C CN1073912 C CN 1073912C
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李·梅尔布尔尼·库克
约翰·V·H·罗伯茨
查尔斯·威廉·詹金斯
拉易·拉加夫·皮莱
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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24D—TOOLS FOR GRINDING, BUFFING OR SHARPENING
    • B24D11/00—Constructional features of flexible abrasive materials; Special features in the manufacture of such materials
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B24B37/11—Lapping tools
    • B24B37/20—Lapping pads for working plane surfaces
    • B24B37/26—Lapping pads for working plane surfaces characterised by the shape of the lapping pad surface, e.g. grooved
    • A—HUMAN NECESSITIES
    • A47—FURNITURE; DOMESTIC ARTICLES OR APPLIANCES; COFFEE MILLS; SPICE MILLS; SUCTION CLEANERS IN GENERAL
    • A47L—DOMESTIC WASHING OR CLEANING; SUCTION CLEANERS IN GENERAL
    • A47L13/00—Implements for cleaning floors, carpets, furniture, walls, or wall coverings
    • A47L13/10—Scrubbing; Scouring; Cleaning; Polishing
    • A47L13/28—Polishing implements
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24D—TOOLS FOR GRINDING, BUFFING OR SHARPENING
    • B24D11/00—Constructional features of flexible abrasive materials; Special features in the manufacture of such materials
    • B24D11/001—Manufacture of flexible abrasive materials
    • B24D11/005—Making abrasive webs
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24D—TOOLS FOR GRINDING, BUFFING OR SHARPENING
    • B24D11/00—Constructional features of flexible abrasive materials; Special features in the manufacture of such materials
    • B24D11/02—Backings, e.g. foils, webs, mesh fabrics
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24D—TOOLS FOR GRINDING, BUFFING OR SHARPENING
    • B24D13/00—Wheels having flexibly-acting working parts, e.g. buffing wheels; Mountings therefor
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24D—TOOLS FOR GRINDING, BUFFING OR SHARPENING
    • B24D3/00—Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents
    • B24D3/02—Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents the constituent being used as bonding agent
    • B24D3/20—Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents the constituent being used as bonding agent and being essentially organic
    • B24D3/28—Resins or natural or synthetic macromolecular compounds
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24D—TOOLS FOR GRINDING, BUFFING OR SHARPENING
    • B24D2203/00—Tool surfaces formed with a pattern

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  • Mechanical Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
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Abstract

本发明提供一种由固态均匀聚合物薄片(5)组成的改进型抛光衬垫。上述薄片没有本征的吸收或输送研浆颗粒的能力，在应用期间有表面纹理或图形。它们具有同时存在的大(7)小(6)流通通路。这两种通路允许穿越抛光衬垫表面输送研浆。其中上述通路并不是材料构成的一部分而是用机械性方法制作到衬垫表面上的。在本发明的一个最佳形式中，衬垫纹理由粗纹理和细纹理组成。粗纹理在使用之前制作，细纹理则在衬垫使用期间在一个固定的经过选择的工作间隔用许多小的研磨尖状物进行研磨制作的。

Description

改进型抛光衬垫和它们的应用方法
本发明涉及一种用于在诸如玻璃，半导体，电介质/金属混合物以及集成电路上形成光滑的超级平面的抛光衬垫(pad)，特别是涉及到这种衬垫的表面纹理。
抛光一般说是把一个最初为粗糙的表面可控地研磨成一个平坦有光泽的最后的表面。这通常是这样来完成的：使紧靠近被抛光样品(2件)的衬垫以重复的规则的运动进行摩擦的同时，向抛光衬垫和2件之间的界面处供以包含有微细颗粒的悬浮体的溶液(研磨泥浆)。通常所用的衬垫是用已粘成毡的或者已编织好的天然纤维诸如羊毛，浸过聚氨甲酸乙酯的已粘成毡的聚酯，或各种类型的填充过聚氨甲酸乙酯的塑料。
这样一个系统的抛光速率受限于所采用的压力和速度以及在任一规定时刻与工件相接触的微细颗粒的浓度和研磨泥浆的化学活动性。为了增加抛光速率，泥浆的流动通路图形通常都被刻进抛光衬垫的表面中去以改善穿过工件表面的研磨泥浆流。此外，受这种图形化的影响而形成的接触表面面积的减小，使得在抛光期间提供较高的接触压力，因而增强了抛光速率。代表性的纹理化衬垫的例子是带沟槽的，带雕花的和带眼的以注册商品名称Suba和Politex出售的(美国)特拉华(Delaware)州奈瓦克(Newark)罗得尔(Rodcl)公司的衬垫。一种代表性的带沟槽的或带雕花的图形是具有0.008到0.014英寸深度的0.100英寸的方格。
在所涉及的工作中所提到的纹理一般都具有固定的大的尺寸。纹理的间隔或者深度所具有的尺寸应对未经矫正的视力能清楚地看得见，就是说可把它们做得成为粗的纹理。在大部分的所涉及的工作中，粗纹理由沟槽或间隔的一种规则的几何阵列组成以形成隆起的简单的多边形，螺旋形，皱纹状，用交叉线画成阴影的或者圆形的区域。这种纹理的典型的例子是美国专利第2701192号，它公开了这样的情况：用规则排列的同心的，辐射式的和用交叉线画成阴影的沟槽来改善研浆的均匀性。一个更近的美国专利(U.S.Patent)第5232875号上示出了一种在整个衬垫上布局的穿孔的规则阵列。这种阵列能使研浆通过衬垫流向工件与衬垫之间的交界面。美国专利第5177908给出了在衬垫表面上的沟槽或者穿孔的图形。这些沟槽或穿孔的大小或者密度从抛光衬垫的中心到圆周是不同的，为的是提供一种对工件恒定的或近乎恒定的接触比率。
一般地说，在使用衬垫之前粗纹理就已形成了；但美国专利第5081051号叙述了一种在抛光工艺过程中，连续地形成众多的环绕式粗沟槽的工艺。就如在该专利申请书中所说的(第3栏(col)，63-64行)，所用的衬垫是一种特别的衬垫，它本身“具有吸收诸如二氧化硅或其他有研磨作用的材料的能力”，即衬垫本身具有先在的多孔性或表面纹理。
进述同时应用具有不同的大小的沟槽和图形的唯一的有关文章是美国专利第5216843号，它公布了一种方法，用于在抛光工艺过程中在衬垫的表面上连续地产生小号的沟槽。就像在该专利申请书中(4栏，23-25行)所说的那样，所采用的衬垫是一种特殊的衬垫，它“具有输送有研磨作用的粒子物质，诸如二氧化硅粒子的能力”，即，把第2种类型的细纹理添加到已经存在的衬垫的多孔结构或表面纹理上去。这些细沟槽排他性地抄近穿过在较大的事先形成的沟槽(粗沟槽)之间的一个隆起区域以促进研浆输送。所示出的典型的粗沟槽是刻入圆形抛光衬垫的表面深约0.3mm，宽约0.3mm的许多同心圆沟槽。在衬垫转动期间，具有金刚石尖端的调节器臂在抛光过程中以一种振荡的辐射状的形式扫过衬垫的表面以产生穿跨衬垫表面的浅辐射状细沟槽。这些细沟槽，宽约0.04mm，深约0.04mm，将促进研浆在粗沟槽之间的区域内的输送。
虽然美国专利第5216843承认粗沟槽和细沟槽都对研浆输送作出了贡献，但是，却没有讲到任何尺寸间的相互关系或各自的密度。因此，尽管规定粗沟槽的密度范围为在每英寸2到32条粗沟槽之间，但却没有给出细沟槽的密度范围。而且，发明者们特别提到粗沟槽的存在是可选配的，而细沟槽，靠其自身输送研浆是足够的。除此这外，发明者们还讲到这种工艺仅限于这样的一些衬垫：这些衬垫允许在衬垫表面上输送研浆粒子。这样的衬垫，以实施形态中由特拉华州奈瓦克罗得尔公司生产的IC60衬垫为典型，具有很好地定义好的具有输送研浆能力的表面纹理，而且，具有当粗沟槽和细沟槽都不存在的时候，靠其自身也能进行值得重视的抛光活动的能力。事实上，作为一个例子，IC 60衬垫在这样一种未经修改的状态下以良好的效果广泛地被用于玻璃抛光工艺中。
发明者们所熟悉的所有的现有技术的抛光衬垫都是合成物或者多相材料，它们都具有一个本征细纹理，那是它们的生产方法带给它们的。表面细纹理源于体非均匀性、那是在制作衬垫期间蓄意引入的。当被剖开，被磨掉或者被暴露出来时，上述体纹理就变成了表面细纹理。在就用之前就业已存在的这种细纹理允许吸收和输送研浆粒子并可以提高抛光能力而无需进一步增添细的或粗的纹理到衬垫上。现有抛光衬垫的各种类别的例子如下：
1．浸过氨基甲酸乙酯的聚酯粘结物(美国专利第4927432号中所讲的即是这种例子之一)具有源自体内合成物的凸出的纤维顶端以及合成物所具有的空隙的细纹理。
2．特拉华州奈瓦克的罗得尔公司以商品名Politex所售出的那种类型的微孔氨基甲酸乙酯衬垫的表面纹理源于氨基甲酸乙酯膜体内圆柱形空隙构造的顶端。上述氨基甲酸乙酯膜生长在氨基甲酸乙酯粘结基底上。
3．由特拉华州奈瓦克的罗得尔公司生产的诸如IC-系列，MH-系列和LP-系列抛光衬垫是光气和/或喷气合成物氨基甲酸乙酯，它的表面构造由半圆形的凹陷组成，这些凹陷来源于已露出的中空球形组分的截面或者已掺合进来的气泡的截面。
4．充填以具有研磨作用的聚合物的衬垫诸如美国专利第5209760号所讲的那些衬垫具有一个独特的表面纹理，它由凸出和隐窝组成，凸出处有填充物颗粒，隐窝处则没有。
与此相反，聚合物的固态同质薄片，诸如聚氨基甲酸乙酯，聚碳酸酯，尼龙，或者聚酯已被证明为没有抛光能力，因而不能用作抛光衬垫。
由于需要合成物构造，故用于生产现有抛光衬垫的工艺，相对于生产具有等效尺寸和厚度的固态同质塑料来说是非常复杂的。此外，由于它们的生产工艺的不同，现有抛光衬垫的构造上有着重要的变化。例如，对上边的第(1)类衬垫来说在粘结密度上的变化，或对上边的第(3)类衬垫来说在充填物密度上的变化，都将使得在表面纹理上产生相应的变化。并在抛光性能上也产生相应变化。这种变化对那些技术上熟练的人来说是人所尽知的。而且，是现有抛光衬垫的最大的缺点之一。
此外，对发明者们来说，所有已知的现有抛光衬垫都具有有效的抛光性能而无需添加粗沟槽或者细沟槽，就是说，作为对性能的改进或改善两者都被加了上去，对抛光能力来说则不需要。
这样一来，人们高度期望提供一种表面纹理，这种纹理决不依赖于体材料中业已存在的非同质性。这将允许人们应用那些以前不能使用但高度期盼的材料来作抛光衬垫，同时在抛光能力上，性能稳定度上，性能可变性及造价上有相应的改善。
本发明提供一种改进的抛光衬垫。该抛光衬垫由不具有吸收或输送研浆颗粒的本征能力的固态均匀聚合物薄板组成。在使用期间，聚合物薄板上有表面纹理或者图形。表面纹理或图形由同时存在的大的和小的流通通路两者组成。上述流通通路允许穿过抛光衬垫的表面输送研浆。在抛光衬垫里边，上述通路并不是材料构造的一部分而是用机械性的方法制作在衬垫的表面上的。在本发明的一种推荐的形式下，衬垫的纹理由在使用之前制作的粗纹理和细纹理组成。细纹理是在衬垫使用期间用研磨法制作上的。这种研磨法使大量的小的有研磨作用的尖状物在规则的选择过的工作间隔上进行研磨。
参照附图来阅读本发明的概括和对下述实施形态的详细说明，将会弄得更明白。为了对本发明进行图示说明的目的，在附图中画出了先前所推荐的形态，但人们应当了解，本发明不受限于已画出的特定形态。在这些附图中：
图1是在上边已略述过的第(3)种现有抛光衬垫的剖面图。
图2是本发明的一种抛光衬垫的剖面图。
本发明的抛光衬垫的基本特点是它们具有同时有大的和小的流通通路的表面纹理。上述构造是用外部手段单独地制作到固态同质材料的表面上的，该材料基本上没有事先业已存在的体或面纹理。本发明的令人惊奇和未曾预料到的特点是：在衬垫表面上同时存在着的大的和小的流通通路靠其本身就足以产生一个所期望的高抛光能力。就如在下边的例子中要表明的那样，原本不具有抛光能力的材料可以容易而快速地被激活以给出所期望的高等级的抛光能力，完全等效于商业上可供使用的现有产品。
图1示出了现有技术产品的一个例子。图中的衬垫是由包含有大量球形空隙或气泡2的体塑料1组成的合成材料。在抛光衬垫3的最外边的表面上，露了出来的残迹或者使内部空隙2的剖面产生的一系列的表面凹窝将在衬垫表面上产生本征微构造，这种构造是必不可少的。凹窝4源于衬垫材料的业已存在着的合成物本性。本发明的一种衬垫示于图2。图2示出的是一种固态同质聚合物衬垫5。衬垫5基本上不具有微构造。在衬垫5的表面上有用外部手段制作的纹理。这些纹理为同时存在着的小号流通通路或者小隐窝6和大号流通通路或者大隐窝7。
本发明的衬垫所提供的另外的优点是：和现有抛光衬垫的抛光速率受控于体微构造且极大地决定于制作时间不同，可以用简单地改变所采用的粗细纹理的图形和密度的办法迅速而可控地调整抛光速率。纹理的应用快速可控，而且高度地可重复制作，因而将大大减小性能的可变性。与此相反，当把同一纹理应用到现有抛光衬垫的表面上的时候，来源于上述衬垫的合成物天性的业已存在着的表面纹理的可变性将产生明显地被增加了的可变性。
本发明的衬垫中的粗纹理由被隐窝(大隐窝)分隔开来的隆起区域组成。其尺寸经过选择的大隐窝对未受阻的研浆流起着通路的作用。本发明的最苛刻的粗纹理的特征是大隐窝之间的距离。它描述了这样一个距离：在这一距离之间研浆输送受控于所采用细纹理。实际上，大隐窝间隔的上限是5mm。实质上更大的横向尺寸的突出特点将显示出抛光速率被大大地减小，与所采用的细纹理类型无关。大隐窝间隔的下限是0.5mm。低于这一限值大隐窝将变得困难且将产生时间浪费。此外，低于这一下限尺寸限值，在大隐窝之间的凸出表面的结构完整性将要降低且使之遭受到歪斜或变形，因而降低抛光性能。
大隐窝的图形及其宽度和深度，只要遵守以上限制，实际上可以是任何所希望的图形和尺寸。事实上，大隐窝的宽度和深度一般在使大隐窝的深度至少等效于宽度的情况下，保持低于在大隐窝之间的凸出的衬垫表面的最大横向尺寸的50％。粗通路可以具有不超过衬垫厚度的90％任一所希望的深度。在给定的有限的侵蚀速率下较深的粗通路将给出较长的衬垫寿命。如果深度超过了衬垫厚度的90％，则衬垫的机械强度将会严重地降低因此应予避免。在现有技术中的任一所希望的图形，例如同心圆，正方格子，三角格子等等都可用于有助于给出凸出的表面地势，诸如同心环，矩形，三角形等等，并随着大隐窝密度的增加，总体抛光速率将会增加。在衬垫上边形成大隐窝的方法可以包括但并受限于加压，压印浮雕、铸模，切削或者光刻手段等等，如果基底聚合物可以用这些手段加工的话。取决于所用的图形，大隐窝的尺寸和衬垫材料的性质，人们还利用切削工具或者其他的具有适当的尺寸和空间的有研磨作用的装置在抛光工艺期间或即将进行抛光处理之前形成大隐窝。这种技术对那些具有较低范围的尺寸的大隐窝来说是最有效的。在原本存在于衬垫上的大隐窝已被磨损到不复存在的程度时，这种技术也可有效地用作用于使大隐窝再生的手段。在这种情况下，可被采用的最简单的大隐窝图形是同心圆或者理想的是随机定向的直线。大隐窝也不局限于单个固定不变的一套间隔，宽度和深度。在上边提到过的尺寸限制范围之内。一切都可被组合成具有良好的效果的所希望的任何一种图形和图形的组合。
本发明的衬垫中的细纹理由存在于粗纹理的隆起区域上的一组更细的构造构成。这些更细的纹理也用作不受阻研浆流的通路，尽管通路规模更小。因此，细纹理呈现出凸出表面特征和隐窝(小隐窝)的较小规模的组合，研浆在这种组合中流动。正是这样一种同时存在的宏观的和微观的流通通路的独特的组合，才得以使完全的，未受阻的和均匀的研浆流到衬垫表面的每一部分。
根据定义，小隐窝的尺寸要大大小于大隐窝的尺寸。因此，对于小隐窝尺寸的实用的上边界是0.25mm，或者是大隐窝之间的凸出的地势的最小尺寸的至少一半，就是说，这个凸出区域的尺寸的二等分之一。对小隐窝的低端的尺寸限值是至少要比用于进行抛光的研浆的平均颗粒直径大10倍。这一低端限值是根据小隐窝允许研浆不受阻地流动这一要求设定的。对于通路尺寸实质上比下限值还低的情况，粘度增加凝成固体的行为的概率，即颗粒相互碰撞所产生的断流对研浆粘稠度增加的比，将变为不堪忍受地高。于是，比如说，对于其平均颗粒直径为0.15μm的研浆来说，能够使用的最小细纹理直径是1.5μm。
生产细纹理的方法包括(但不受限于)压雕法，压印法，铸模法，切削法和光刻手段等等，如果基底聚合物可以用这些手段加工的话。在实践中，由于在应用期间塑料材料所表现出来的冷流(cold flow)的趋势，在现阶段，在应用上述衬垫期间，用锐利的具有研磨作用的装置切削一系列其大小和间隔都在上述限界之内的随机定向沟槽是令人喜欢的。因此，尽管事先存在的细纹理可被用于短期应用，在应用期间塑料材料的冷流或磨损将很快抹平这些细纹理，使得抛光速率大大地且迅速地降低。到最后，应用本发明的推荐形态的技术，在一种受控的形式下，或者是在两次使用之间，或者在持续应用期间(取决于所采用的特定的衬垫材料和抛光操作持续时间)不断地重新生成细纹理。因而对于那些相对地硬的和耐用材料诸如尼龙或聚氨基甲酸乙酯来说，它们对冷流效果相对地保持不变，已经发现在每次使用它们之前间歇性地细纹理再生对确保高的和均匀的抛光能力是足够的。对于其它衬垫材料，比如，聚乙烯或者聚四氟乙烯，它们对塑料流更为俯首贴耳，所以更希望在抛光工艺期间连续制作细纹理。对于任何一种特定的基底材料来说粗纹理和细纹理两者的最好的生成模式，都可针对它们的特殊用途由熟练的专业人员迅速地决定下来。
和对大隐窝情况相同，实际上任何小隐窝图形，只要它均匀地覆盖整个衬垫的凸出的表面而且处于上面提到过的尺寸限值范围之内都可以使用。一种令人偏爱的小隐窝图形是一系列随机定向的直线或者其宽度和深度随机变化的一组沟槽。这种随机化效果，在整个衬垫的表面区域上产生了特别令人满意的均匀性。因为这种类型的图形可以快速且不需什么经验的用下述方法制造，故还特别有用。上述制造方法为：转动一个且有研磨作用的盘或具有大量切削齿的衬垫来研磨上述衬垫的表面。这样的盘在现有技术的衬垫中通常被用作调节设备，因此，使用它的效果是更加经济。发明者们没有把调节盘本身作为本发明的一部分提出权利要求，但作为一种在衬垫表面上获得所希望的细纹理的手段这里简单地讲一讲它的应用。
当把上边所概述的本发明的基本特点应用到一种单层同质塑料材料上去的时候，沿用在美国专利第5257478号，美国专利第5212910号和美国专利第5287663号提到的结果，给它加上附加的具有不同的机械特性的底层以改变衬垫的歪斜性是可能的。这样一种多层化的抛光衬垫特别适合于半导体装置诸如集成电路大片的均匀抛光。这种集成电路大片具有大量的微细的凸出的地形，在大片表面的所有局部位置上这些凸出部分必须以高度均匀的形式去掉。把本发明的衬垫用作这样一种多层衬垫的外层接触部件将提供一个所能达到的机械性能的大大增强了的范围。特别是本发明使得可以把极其坚硬的薄塑料膜实际用作抛光材料，这些材料在此以前对这种用途是不能用的。在这样一种多层衬垫中把这样的薄的，高硬度材料用作外层接触部分将产生最小的小范围变形，有利于满意地抛除极其之小的小型表面凸起。同时，给出了一个高度的大范围屈从，这将会实现在大片的整个表面上抛除速率均匀性方面极大的改善。这体现了对现存技术的一个重大发展和改善。层状抛光衬垫，其非表面层或非表面层们实质上可比表面层有更大或更小的屈从性。
下述例子用于证明与现有技术相比本发明的基本特点。这些例子并不意味着任何意义上的限制性。对熟练的专业人员来说，通过审查这些例子和接下来的权利要求，追加的方法和应用将是明显的。
例1．为了说明现有技术抛光衬垫的工作模式，一个民用抛光衬垫(罗得尔(Rodel)IC1000)被用于抛光一套25片的硅大片。这种硅大片具有深度～1μm的热氧化表面层。此外，上述抛光衬垫属前边说过的第(3)类，由填充以中空球形微型气球的聚氨基甲酸乙酯矩阵构成。表面层的组分是二氧化硅。大片已在民用大片抛光机(Westech 372型)上用民用以二氧化硅为主的抛光研浆(Cabot SC-112)和粘有金刚石的衬垫调节器(RPC1)进行过抛光。上述衬垫调节器被用作抛光机器的一部分。衬垫在每一大片被抛光前30秒钟进行调节。就像上边所讨论过的那样，调节器的功能是在衬垫表面上产生一系列的随机定向的小线段或沟槽。抛光机的设定值(下边将予以概括)为了确保一种直接的性能比较对本例和所有其他例子都保持不变。所用的抛光条件为：压力：9 psi；台板速度：20rpm；托架速度：46rpm；抛光时间：2分。为了测试大片，抛除速率为每分钟约1400。
例2．一种平滑的固体，未经填充过，且基本上没有任何种类的事先存在着的表面纹理的同质聚氨基甲酸乙酯(Rodel JR111)。接下来被用于用例1中所列举的同一抛光机和抛光条件去抛光一套共25个样品的热氧化硅大片，只有一点例外：在本例中带金刚石的调节装置没有使用。因此，在这一测试中，在衬垫表面上没有现存的细纹理。没有观察到可测量的抛光能力(即抛除速率低于每分50)。在启动金刚石调节装置使得可在衬垫表面上形成细纹理之后，其余的大片就都被加工了。观察到的平均抛光速率为564/min。速率的变化很大。此外，大片之间的表面上所观察到的抛除速率具有高度非一致性。
例3．步距为0.05英寸，深度为0.012英寸的一套圆环形沟槽被刻入到平滑的，固体的，未填充的，尺寸和组分与例2相同的基本上是同质聚氨基甲酸乙酯的两块薄片上。一个薄片被用于抛光一套共25个样品的热氧化后的硅大片。所用抛光机器和条件与例1相同，只是在每一样品抛光之前没有用金刚石调节器产生细纹理。因而，在应用期间衬垫表面上只有粗纹理。观察到一个很低的抛光速率：570/min，表明全面缺乏好的抛光能力。从一个大片到另一个大片的抛光速率的不一致性是非常高的。
接着，用第2个薄片去抛光一套共25个样品的已热氧化的硅大片，采用的是例1中所列举的同样的抛光机器和条件，即在每一样片抛光之前用金刚石调节器产生细纹理使得在使用期间衬垫表面上存在有细纹理和粗纹理两者。和样片的第1个衬垫形成鲜明对照的是，观察到了高而均匀的抛光速率：1300/min，大片之间的抛光速率的不一致性是低的。完全等效于例1的不一致性。
例4．为了进一步说明在本发明的衬垫上同时维持粗细纹理的重要性，一套步距为0.055英寸，深度为0.010英寸的圆环形沟槽被刻到一块固态，未被填充，基本上为同质聚氨基甲酸乙酯但组分与前边的样品不同(Dow Isoplast 302EZ)的薄片上。所采用的粗纹理具有和例3相同的尺寸和图形。接着把薄片用于抛光一套共100片样品的已热氧化的硅大片。所用的抛光机器和条件与例1所列举的相同，即在对每一样片抛光之前用金刚石调节器产生细纹理。于是本样片的衬垫在应用期就有了表面纹理，这与本发明的讲述完全相同。人们观察到一个高而均匀的抛光速率：1584/min。大片之间的抛光速率不一致性低，等效于例1的不一致性。在这一时刻关断调节器(即不再更新细纹理)并再处理6个样品。抛光速率马上下降到低于200/min。在抛光之后对衬垫进行的检查表明当不用调节器时，就不存在细纹理，即尽管粗纹理不受影响，冷流和衬垫磨损完全除掉了细纹理。
例5．把一个0.003英寸厚的聚酯薄膜粘结到其尺寸和组分与例2相同的尚未纹理化的聚氨基甲酸乙酯薄片的表面上以构成一个分层的衬垫。用与前边的例子相同的条件再对一批共25片大片进行抛光。在对每一大片进行抛光之前用上边说过的金刚石调节器先制作上细纹理。因此，在应用期间在衬垫表面就仅有细纹理。
已观察到的平均抛除速率是每分钟63。
例6．已准备好其组分与例5相同的一块分层衬垫。在粘结聚酯表面层之后，把一套其步距为0.055英寸，深度为0.010英寸的圆环形沟槽刻入到衬垫表面上以形成粗纹理。再次用与上述各例相同的条件对一套共25枚大片进行抛光。
用上边说过的金刚石调节器在抛光每一大片之前都制作一次细纹理。因此，本例的衬垫在应用期间具有与本发明的讲解相一致的表面纹理。所观察到的平均抛除速率为1359/min，与前一例子的低速率形成鲜明的对比。
例7．作为倘应用本发明的讲述则可以应用的那些材料的种类广泛的一个进一步的表示，我们测试了多种通常已被发现不具有抛光能力的塑料材料。一种由步距为0.055英寸，深度为0.010英寸的一套圆环形沟槽组成的粗纹理以与前边的例子相同的形式刻进每一衬垫的表面。这些衬垫用于抛光25枚氧化物大片以决定速率。再一次应用相同的抛光条件。在对每一即将被抛光的大片用例1中所例举的条件进行抛光之前，用金刚石调节器调节衬垫表面以形成细纹理。于是，所有的被测试的衬垫在应用期间都具有与本发明的讲述一致的表面纹理。测试结果整理如下：
                   表1
    衬垫材料 平均抛光速率(/min)
丙烯酸类(Acrylic)聚合物    1330
聚碳酸酯(Polycarbonate)    1518
尼龙6(Nylon 6)             1195
PET(对苯二甲酸乙二醇       1395
聚酯，Polyethylenetere-
Phthalate)，高出聚氨
基甲酸乙酯基板0.003英寸
所有的材料都满意地表现出了高抛光速率，尽管在化学组分和机械性能上有了很大的变化。这些材料之中的任何一种都没人报导过说靠它们本身具有重要的抛光能力。

Claims (28)

1．一种改进型抛光衬垫，它由固态均匀聚合物薄片组成，该聚合物薄片没有本征的吸收或输送研浆颗粒的能力，上述薄片在使用时具有由大小流通通路构成的表面纹理或图形，该二种大小流通通路一起允许穿过抛光衬垫表面输运含有颗粒的抛光研浆，所说表面纹理是由外部手段在上述固态均匀聚合物薄片上单独制作的。
2．根据权利要求1所述的衬垫，其中在上述大的流通通路之间的凸出的表面具有根据下的尺寸范围：最大横向尺寸为从0.5mm到5mm。
3．根据权利要求1所述的衬垫，其中上述大流通通路的宽度和深度相等，且不超过上述大流通通路之间的凸出的表面的最大横向尺寸的一半。
4．根据权利要求1所述的衬垫，其中上述大流通通路的深度大于宽度，上述深度不超过上述衬垫的总体厚度的90％。
5．根据权利要求1所述的衬垫，其中上述大流通通路具有同时存在的若干种宽度和深度。
6．根据权利要求1所述的衬垫，其中上述固态均匀聚合物薄片是聚氨基甲酸乙酯。
7．根据权利要求1所述的衬垫，其中上述固态均匀聚合物薄片是聚碳酸酯。
8．根据权利要求1所述的衬垫，其中上述固态均匀聚合物薄片是尼龙。
9．根据权利要求1所述的衬垫，其中上述固态均匀聚合物薄片是丙烯酸(类)聚合物。
10．根据权利要求1所述的衬垫，其中上述固态均匀聚合物薄片是聚酯。
11．根据权利要求1,2,3,4或5的衬垫，其中上述大流通通路被安排为同心圆环形。
12．根据权利要求1,2,3,4或5的衬垫，其中上述大流通通路被安排为一种规则的正方格子图形以便产生外形基本上为矩形的凸出的表面地形。
13．根据权利要求1,2,3,4或5的衬垫，其中上述大流通通路被安排为一种规则的格子图形以产生其外形实质上是三角形的凸出的表面地形。
14．根据权利要求1,2,3,4或5的衬垫，其中上述大流通通路被安排为直线且彼此相对的取向是随机的。
15．根据权利要求1,2,3,4或5的衬垫，其中上述小流通通路的宽度固定的常数，其尺寸范围为从0.25mm到不小于抛光研浆中颗粒的平均尺寸的10倍。
16．根据权利要求1,2,3,4或5的衬垫，其中上述小流通通路具有其范围从0.25mm到不小于抛光研浆中的颗粒的平均尺寸的10倍的多种宽度和深度。
17．根据权利要求15的衬垫，其中上述小流通通路是直线，且彼此相对的取向是随机的。
18．根据权利要求16的衬垫，其中上述小流通通路是直线，且彼此相对的取向是随机的。
19．根据权利要求1所述的衬垫，是由两层或多层聚合物材料组成的层状抛光衬垫，其中表面层是由固态均匀聚合物薄片构成的。
20．根据权利要求19所述的衬垫，其中非表面层或非表面层们实质上比上述表面层有更大的屈从性。
21．根据权利要求19所述的衬垫，其中非表面层或非表面层们实质上比上述表面层有更小的屈从性。
22．用于抛光一种物品的表面的方法，其构成为：将所述物品压紧在抛光衬垫上同时在上述衬垫上提供含有颗粒的抛光研浆且在上述物品和上述衬垫之间有相对横向运动，在这里上述抛光衬垫由权利要求1所述的抛光衬垫组成。
23．根据权利要求22所述的方法，其中上述大流通通路是在使用之前制作好的。
24．根据权利要求22所述的方法，其中上述大流通通路是在抛光工艺处理期间每隔一段时间制作的。
25．根据权利要求22所述的方法，其中上述大流通通路是在抛光处理期间连续地制作的。
26．根据权利要求23,24或25所述的方法，其中上述小流通通路是在使用之前制作的。
27．根据权利要求23,24或25所述的方法，其中上述小流通通路在抛光处理期间每隔一段时间制作的。
28．根据权利要求23,24或25所述的方法，其中上述小流通通路在抛光处理期间连续地制作。
CN95190278A 1994-04-08 1995-03-30 改进型抛光衬垫和它们的应用方法 Expired - Lifetime CN1073912C (zh)

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TW362551U (en) 1999-06-21
DE701499T1 (de) 1996-10-24
MY112281A (en) 2001-05-31
DE69515579D1 (de) 2000-04-20
US5489233A (en) 1996-02-06

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