IL156485A0 - Cmp pad with long user life - Google Patents

Cmp pad with long user life

Info

Publication number
IL156485A0
IL156485A0 IL15648503A IL15648503A IL156485A0 IL 156485 A0 IL156485 A0 IL 156485A0 IL 15648503 A IL15648503 A IL 15648503A IL 15648503 A IL15648503 A IL 15648503A IL 156485 A0 IL156485 A0 IL 156485A0
Authority
IL
Israel
Prior art keywords
cmp pad
user life
long user
long
life
Prior art date
Application number
IL15648503A
Original Assignee
J G Systems Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by J G Systems Inc filed Critical J G Systems Inc
Priority to IL15648503A priority Critical patent/IL156485A0/en
Priority to US10/678,830 priority patent/US20040256055A1/en
Publication of IL156485A0 publication Critical patent/IL156485A0/en

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B24B37/11—Lapping tools
    • B24B37/20—Lapping pads for working plane surfaces
    • B24B37/26—Lapping pads for working plane surfaces characterised by the shape of the lapping pad surface, e.g. grooved
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B24B37/11—Lapping tools
    • B24B37/20—Lapping pads for working plane surfaces
    • B24B37/24—Lapping pads for working plane surfaces characterised by the composition or properties of the pad materials
IL15648503A 2003-06-17 2003-06-17 Cmp pad with long user life IL156485A0 (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
IL15648503A IL156485A0 (en) 2003-06-17 2003-06-17 Cmp pad with long user life
US10/678,830 US20040256055A1 (en) 2003-06-17 2003-10-03 CMP pad with long user life

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
IL15648503A IL156485A0 (en) 2003-06-17 2003-06-17 Cmp pad with long user life

Publications (1)

Publication Number Publication Date
IL156485A0 true IL156485A0 (en) 2004-01-04

Family

ID=32587638

Family Applications (1)

Application Number Title Priority Date Filing Date
IL15648503A IL156485A0 (en) 2003-06-17 2003-06-17 Cmp pad with long user life

Country Status (2)

Country Link
US (1) US20040256055A1 (en)
IL (1) IL156485A0 (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101974689A (en) * 2010-09-26 2011-02-16 金川集团有限公司 Method for processing material containing copper
CN109420973B (en) * 2017-09-05 2020-11-17 联华电子股份有限公司 Wafer polishing disk and use method thereof
CN107641835B (en) * 2017-10-23 2019-11-26 大连理工大学 A kind of method of semiconductor wafer optical electro-chemistry mechanical polishing

Family Cites Families (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5197999A (en) * 1991-09-30 1993-03-30 National Semiconductor Corporation Polishing pad for planarization
US6099394A (en) * 1998-02-10 2000-08-08 Rodel Holdings, Inc. Polishing system having a multi-phase polishing substrate and methods relating thereto
US5709598A (en) * 1993-06-02 1998-01-20 Dai Nippon Printing Co., Ltd. Abrasive tape and method of producing the same
US5489233A (en) * 1994-04-08 1996-02-06 Rodel, Inc. Polishing pads and methods for their use
US6090475A (en) * 1996-05-24 2000-07-18 Micron Technology Inc. Polishing pad, methods of manufacturing and use
WO1998016347A1 (en) * 1996-10-15 1998-04-23 Nippon Steel Corporation Semiconductor substrate polishing pad dresser, method of manufacturing the same, and chemicomechanical polishing method using the same dresser
US6435947B2 (en) * 1998-05-26 2002-08-20 Cabot Microelectronics Corporation CMP polishing pad including a solid catalyst
JP2000301450A (en) * 1999-04-19 2000-10-31 Rohm Co Ltd Cmp polishing pad and cmp processing device using it
WO2001045900A1 (en) * 1999-12-23 2001-06-28 Rodel Holdings, Inc. Self-leveling pads and methods relating thereto
US6537144B1 (en) * 2000-02-17 2003-03-25 Applied Materials, Inc. Method and apparatus for enhanced CMP using metals having reductive properties
US6652764B1 (en) * 2000-08-31 2003-11-25 Micron Technology, Inc. Methods and apparatuses for making and using planarizing pads for mechanical and chemical-mechanical planarization of microelectronic substrates
US7255637B2 (en) * 2000-09-08 2007-08-14 Applied Materials, Inc. Carrier head vibration damping
US20020090901A1 (en) * 2000-11-03 2002-07-11 3M Innovative Properties Company Flexible abrasive product and method of making and using the same
US7192340B2 (en) * 2000-12-01 2007-03-20 Toyo Tire & Rubber Co., Ltd. Polishing pad, method of producing the same, and cushion layer for polishing pad
WO2002070194A1 (en) * 2001-03-02 2002-09-12 Igc-Superpower, Llc Reel-to-reel substrate tape polishing system
US20020160692A1 (en) * 2001-04-27 2002-10-31 Applied Materials, Inc. Method for planarizing organosilicate layers
US6949128B2 (en) * 2001-12-28 2005-09-27 3M Innovative Properties Company Method of making an abrasive product
US6758734B2 (en) * 2002-03-18 2004-07-06 3M Innovative Properties Company Coated abrasive article
US7018268B2 (en) * 2002-04-09 2006-03-28 Strasbaugh Protection of work piece during surface processing
US6918820B2 (en) * 2003-04-11 2005-07-19 Eastman Kodak Company Polishing compositions comprising polymeric cores having inorganic surface particles and method of use

Also Published As

Publication number Publication date
US20040256055A1 (en) 2004-12-23

Similar Documents

Publication Publication Date Title
EP1800800A4 (en) Abrasive pad
IL156094A0 (en) Fixed abrasive cmp pad with built-in additives
IL174117A0 (en) Proactive user interface
IL177208A0 (en) Layered user interface
EP1738870A4 (en) Polisher
TWI372092B (en) Cmp pad having an overlapping stepped groove arrangement
GB2401297B (en) User interface
SG111222A1 (en) Polishing pad
TWI318109B (en) Powered toothbrush with improved ergonomics
PT1706832E (en) Improved user interface
EP1598038A4 (en) Inter-labium pad
DE602004001539D1 (en) polishing pad
IL156485A0 (en) Cmp pad with long user life
HK1096282A1 (en) Inter-labium pad
GB0313046D0 (en) Inflatable pad
EP1693031A4 (en) Inter-labial pad
GB0313913D0 (en) New use
GB0305655D0 (en) Battery life determination
HK1096281A1 (en) Inter-labial pad
GB0317594D0 (en) User support
GB0310748D0 (en) Portable seat
AU156331S (en) Sander
GB0321487D0 (en) Poochie pad
GB2398260B (en) Hand sander
GB0321184D0 (en) Pad