CN107383035A - 2‑((1S3aR7aR)‑5‑叔丁氧羰基四氢呋喃并[3,4]哌啶‑1)乙酸制法 - Google Patents
2‑((1S3aR7aR)‑5‑叔丁氧羰基四氢呋喃并[3,4]哌啶‑1)乙酸制法 Download PDFInfo
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- CN107383035A CN107383035A CN201710530560.1A CN201710530560A CN107383035A CN 107383035 A CN107383035 A CN 107383035A CN 201710530560 A CN201710530560 A CN 201710530560A CN 107383035 A CN107383035 A CN 107383035A
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- compound
- 1s3ar7ar
- acetic acid
- tertbutyloxycarbonyls
- piperidines
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- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D491/00—Heterocyclic compounds containing in the condensed ring system both one or more rings having oxygen atoms as the only ring hetero atoms and one or more rings having nitrogen atoms as the only ring hetero atoms, not provided for by groups C07D451/00 - C07D459/00, C07D463/00, C07D477/00 or C07D489/00
- C07D491/02—Heterocyclic compounds containing in the condensed ring system both one or more rings having oxygen atoms as the only ring hetero atoms and one or more rings having nitrogen atoms as the only ring hetero atoms, not provided for by groups C07D451/00 - C07D459/00, C07D463/00, C07D477/00 or C07D489/00 in which the condensed system contains two hetero rings
- C07D491/04—Ortho-condensed systems
- C07D491/044—Ortho-condensed systems with only one oxygen atom as ring hetero atom in the oxygen-containing ring
- C07D491/048—Ortho-condensed systems with only one oxygen atom as ring hetero atom in the oxygen-containing ring the oxygen-containing ring being five-membered
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- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D211/00—Heterocyclic compounds containing hydrogenated pyridine rings, not condensed with other rings
- C07D211/04—Heterocyclic compounds containing hydrogenated pyridine rings, not condensed with other rings with only hydrogen or carbon atoms directly attached to the ring nitrogen atom
- C07D211/06—Heterocyclic compounds containing hydrogenated pyridine rings, not condensed with other rings with only hydrogen or carbon atoms directly attached to the ring nitrogen atom having no double bonds between ring members or between ring members and non-ring members
- C07D211/36—Heterocyclic compounds containing hydrogenated pyridine rings, not condensed with other rings with only hydrogen or carbon atoms directly attached to the ring nitrogen atom having no double bonds between ring members or between ring members and non-ring members with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to ring carbon atoms
- C07D211/60—Carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D211/00—Heterocyclic compounds containing hydrogenated pyridine rings, not condensed with other rings
- C07D211/04—Heterocyclic compounds containing hydrogenated pyridine rings, not condensed with other rings with only hydrogen or carbon atoms directly attached to the ring nitrogen atom
- C07D211/06—Heterocyclic compounds containing hydrogenated pyridine rings, not condensed with other rings with only hydrogen or carbon atoms directly attached to the ring nitrogen atom having no double bonds between ring members or between ring members and non-ring members
- C07D211/36—Heterocyclic compounds containing hydrogenated pyridine rings, not condensed with other rings with only hydrogen or carbon atoms directly attached to the ring nitrogen atom having no double bonds between ring members or between ring members and non-ring members with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to ring carbon atoms
- C07D211/60—Carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals
- C07D211/62—Carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals attached in position 4
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- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D213/00—Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members
- C07D213/02—Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members having three double bonds between ring members or between ring members and non-ring members
- C07D213/04—Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members having three double bonds between ring members or between ring members and non-ring members having no bond between the ring nitrogen atom and a non-ring member or having only hydrogen or carbon atoms directly attached to the ring nitrogen atom
- C07D213/60—Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members having three double bonds between ring members or between ring members and non-ring members having no bond between the ring nitrogen atom and a non-ring member or having only hydrogen or carbon atoms directly attached to the ring nitrogen atom with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to ring carbon atoms
- C07D213/78—Carbon atoms having three bonds to hetero atoms, with at the most one bond to halogen, e.g. ester or nitrile radicals
- C07D213/79—Acids; Esters
- C07D213/80—Acids; Esters in position 3
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D213/00—Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members
- C07D213/02—Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members having three double bonds between ring members or between ring members and non-ring members
- C07D213/04—Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members having three double bonds between ring members or between ring members and non-ring members having no bond between the ring nitrogen atom and a non-ring member or having only hydrogen or carbon atoms directly attached to the ring nitrogen atom
- C07D213/60—Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members having three double bonds between ring members or between ring members and non-ring members having no bond between the ring nitrogen atom and a non-ring member or having only hydrogen or carbon atoms directly attached to the ring nitrogen atom with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to ring carbon atoms
- C07D213/78—Carbon atoms having three bonds to hetero atoms, with at the most one bond to halogen, e.g. ester or nitrile radicals
- C07D213/79—Acids; Esters
- C07D213/803—Processes of preparation
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07B—GENERAL METHODS OF ORGANIC CHEMISTRY; APPARATUS THEREFOR
- C07B2200/00—Indexing scheme relating to specific properties of organic compounds
- C07B2200/07—Optical isomers
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- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Pharmaceuticals Containing Other Organic And Inorganic Compounds (AREA)
Abstract
Description
Claims (9)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
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CN201710530560.1A CN107383035B (zh) | 2017-06-29 | 2017-06-29 | 2-((1S3aR7aR)-5-叔丁氧羰基四氢呋喃并[3,4]哌啶-1)乙酸制法 |
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CN201710530560.1A CN107383035B (zh) | 2017-06-29 | 2017-06-29 | 2-((1S3aR7aR)-5-叔丁氧羰基四氢呋喃并[3,4]哌啶-1)乙酸制法 |
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CN107383035A true CN107383035A (zh) | 2017-11-24 |
CN107383035B CN107383035B (zh) | 2019-06-25 |
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CN201710530560.1A Active CN107383035B (zh) | 2017-06-29 | 2017-06-29 | 2-((1S3aR7aR)-5-叔丁氧羰基四氢呋喃并[3,4]哌啶-1)乙酸制法 |
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Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN113549063A (zh) * | 2020-04-23 | 2021-10-26 | 南京药石科技股份有限公司 | 一种光学异构的八氢-2H-吡咯并[3,4-c]吡啶-2-羧酸叔丁酯的制备方法 |
Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4529587A (en) * | 1982-02-19 | 1985-07-16 | Lever Brothers Company | Method of reducing sebum on the hair and skin |
CA2434044A1 (en) * | 2001-01-11 | 2002-07-18 | Bristol-Myers Squibb Pharma Company | 1,2-disubstituted cyclic inhibitors of matrix metallorproteases and tnf-alpha |
CN103374005A (zh) * | 2012-04-11 | 2013-10-30 | 江苏先声药物研究有限公司 | 取代呋喃并哌啶衍生物的合成新方法 |
CN104177363A (zh) * | 2013-05-24 | 2014-12-03 | 江苏先声药物研究有限公司 | 双环杂环胺类Hedgehog信号通路抑制剂 |
CN105418620A (zh) * | 2014-09-23 | 2016-03-23 | 天津药明康德新药开发有限公司 | 一种4-(叔丁氧羰基)八氢呋喃并[3,2-b]吡啶-6-羧酸的合成方法 |
CN105669686A (zh) * | 2014-11-19 | 2016-06-15 | 上海合全药业股份有限公司 | 一种6-(叔丁氧羰基)八氢呋喃[2,3-c]吡啶-4-羧酸的合成方法 |
-
2017
- 2017-06-29 CN CN201710530560.1A patent/CN107383035B/zh active Active
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4529587A (en) * | 1982-02-19 | 1985-07-16 | Lever Brothers Company | Method of reducing sebum on the hair and skin |
CA2434044A1 (en) * | 2001-01-11 | 2002-07-18 | Bristol-Myers Squibb Pharma Company | 1,2-disubstituted cyclic inhibitors of matrix metallorproteases and tnf-alpha |
CN103374005A (zh) * | 2012-04-11 | 2013-10-30 | 江苏先声药物研究有限公司 | 取代呋喃并哌啶衍生物的合成新方法 |
CN104177363A (zh) * | 2013-05-24 | 2014-12-03 | 江苏先声药物研究有限公司 | 双环杂环胺类Hedgehog信号通路抑制剂 |
CN105418620A (zh) * | 2014-09-23 | 2016-03-23 | 天津药明康德新药开发有限公司 | 一种4-(叔丁氧羰基)八氢呋喃并[3,2-b]吡啶-6-羧酸的合成方法 |
CN105669686A (zh) * | 2014-11-19 | 2016-06-15 | 上海合全药业股份有限公司 | 一种6-(叔丁氧羰基)八氢呋喃[2,3-c]吡啶-4-羧酸的合成方法 |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN113549063A (zh) * | 2020-04-23 | 2021-10-26 | 南京药石科技股份有限公司 | 一种光学异构的八氢-2H-吡咯并[3,4-c]吡啶-2-羧酸叔丁酯的制备方法 |
CN113549063B (zh) * | 2020-04-23 | 2024-04-05 | 南京药石科技股份有限公司 | 一种光学异构的八氢-2H-吡咯并[3,4-c]吡啶-2-羧酸叔丁酯的制备方法 |
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Address after: 201507 No. 9 Yuegong Road, Jinshan District, Shanghai Chemical Industry Zone, Jinshan District, Shanghai Applicant after: SHANGHAI SYNTHEALL PHARMACEUTICALS CO.,LTD. Applicant after: SHANGHAI SYNTHEALL PHARMACEUTICALS RESEARCH Co.,Ltd. Applicant after: CHANGZHOU HEQUAN PHARMACEUTICAL Co.,Ltd. Applicant after: CHANGZHOU HEQUAN NEW DRUG RESEARCH AND DEVELOPMENT CO.,LTD. Applicant after: WUXI HEQUAN MEDICINE Co.,Ltd. Applicant after: Wuxi Yaoming Biotechnology Co.,Ltd. Address before: 201507 No. 9 Yuegong Road, Jinshan District, Shanghai Chemical Industry Zone, Jinshan District, Shanghai Applicant before: SHANGHAI SYNTHEALL PHARMACEUTICALS CO.,LTD. Applicant before: SHANGHAI SYNTHEALL PHARMACEUTICALS RESEARCH Co.,Ltd. Applicant before: CHANGZHOU HEQUAN PHARMACEUTICAL Co.,Ltd. Applicant before: CHANGZHOU HEQUAN NEW DRUG RESEARCH AND DEVELOPMENT CO.,LTD. Applicant before: WUXI YAOMING KANGDE PHARMACEUTICAL CO.,LTD. Applicant before: WUXI APPTEC BIOTECHNOLOGY CO.,LTD. |
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Effective date of registration: 20190104 Address after: 201507 No. 9 Yuegong Road, Jinshan District, Shanghai Chemical Industry Zone, Jinshan District, Shanghai Applicant after: SHANGHAI SYNTHEALL PHARMACEUTICALS CO.,LTD. Applicant after: SHANGHAI SYNTHEALL PHARMACEUTICALS RESEARCH Co.,Ltd. Applicant after: CHANGZHOU HEQUAN PHARMACEUTICAL Co.,Ltd. Applicant after: WUXI HEQUAN MEDICINE Co.,Ltd. Applicant after: Wuxi Yaoming Biotechnology Co.,Ltd. Address before: 201507 No. 9 Yuegong Road, Jinshan District, Shanghai Chemical Industry Zone, Jinshan District, Shanghai Applicant before: SHANGHAI SYNTHEALL PHARMACEUTICALS CO.,LTD. Applicant before: SHANGHAI SYNTHEALL PHARMACEUTICALS RESEARCH Co.,Ltd. Applicant before: CHANGZHOU HEQUAN PHARMACEUTICAL Co.,Ltd. Applicant before: CHANGZHOU HEQUAN NEW DRUG RESEARCH AND DEVELOPMENT CO.,LTD. Applicant before: WUXI HEQUAN MEDICINE Co.,Ltd. Applicant before: Wuxi Yaoming Biotechnology Co.,Ltd. |
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TA01 | Transfer of patent application right | ||
TA01 | Transfer of patent application right |
Effective date of registration: 20190505 Address after: 201507 No. 9 Yuegong Road, Jinshan District, Shanghai Chemical Industry Zone, Jinshan District, Shanghai Applicant after: SHANGHAI SYNTHEALL PHARMACEUTICALS CO.,LTD. Applicant after: SHANGHAI SYNTHEALL PHARMACEUTICALS RESEARCH Co.,Ltd. Applicant after: CHANGZHOU HEQUAN PHARMACEUTICAL Co.,Ltd. Applicant after: WUXI HEQUAN MEDICINE Co.,Ltd. Address before: 201507 No. 9 Yuegong Road, Jinshan District, Shanghai Chemical Industry Zone, Jinshan District, Shanghai Applicant before: SHANGHAI SYNTHEALL PHARMACEUTICALS CO.,LTD. Applicant before: SHANGHAI SYNTHEALL PHARMACEUTICALS RESEARCH Co.,Ltd. Applicant before: CHANGZHOU HEQUAN PHARMACEUTICAL Co.,Ltd. Applicant before: WUXI HEQUAN MEDICINE Co.,Ltd. Applicant before: Wuxi Yaoming Biotechnology Co.,Ltd. |
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