CN107015302A - 基于介质镜的多光谱滤波器阵列 - Google Patents

基于介质镜的多光谱滤波器阵列 Download PDF

Info

Publication number
CN107015302A
CN107015302A CN201611247730.7A CN201611247730A CN107015302A CN 107015302 A CN107015302 A CN 107015302A CN 201611247730 A CN201611247730 A CN 201611247730A CN 107015302 A CN107015302 A CN 107015302A
Authority
CN
China
Prior art keywords
layer
group
optical
mirror
thickness
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN201611247730.7A
Other languages
English (en)
Chinese (zh)
Inventor
G.J.奥肯富斯
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Only Yahweh Solutions Ltd By Share Ltd
Original Assignee
Only Yahweh Solutions Ltd By Share Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Only Yahweh Solutions Ltd By Share Ltd filed Critical Only Yahweh Solutions Ltd By Share Ltd
Publication of CN107015302A publication Critical patent/CN107015302A/zh
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F39/00—Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
    • H10F39/80—Constructional details of image sensors
    • H10F39/805—Coatings
    • H10F39/8053—Colour filters
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
    • G01J3/12—Generating the spectrum; Monochromators
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
    • G01J3/12—Generating the spectrum; Monochromators
    • G01J3/26—Generating the spectrum; Monochromators using multiple reflection, e.g. Fabry-Perot interferometer, variable interference filters
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
    • G01J3/28—Investigating the spectrum
    • G01J3/2803—Investigating the spectrum using photoelectric array detector
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
    • G01J3/28—Investigating the spectrum
    • G01J3/30—Measuring the intensity of spectral lines directly on the spectrum itself
    • G01J3/36—Investigating two or more bands of a spectrum by separate detectors
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/28—Interference filters
    • G02B5/285—Interference filters comprising deposited thin solid films
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/28—Interference filters
    • G02B5/285—Interference filters comprising deposited thin solid films
    • G02B5/288—Interference filters comprising deposited thin solid films comprising at least one thin film resonant cavity, e.g. in bandpass filters
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F39/00—Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
    • H10F39/011—Manufacture or treatment of image sensors covered by group H10F39/12
    • H10F39/024—Manufacture or treatment of image sensors covered by group H10F39/12 of coatings or optical elements
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F39/00—Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
    • H10F39/10—Integrated devices
    • H10F39/12—Image sensors
    • H10F39/15—Charge-coupled device [CCD] image sensors
    • H10F39/156—CCD or CID colour image sensors
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F39/00—Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
    • H10F39/10—Integrated devices
    • H10F39/12—Image sensors
    • H10F39/15—Charge-coupled device [CCD] image sensors
    • H10F39/157—CCD or CID infrared image sensors
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F39/00—Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
    • H10F39/10—Integrated devices
    • H10F39/12—Image sensors
    • H10F39/18—Complementary metal-oxide-semiconductor [CMOS] image sensors; Photodiode array image sensors
    • H10F39/182—Colour image sensors
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F39/00—Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
    • H10F39/10—Integrated devices
    • H10F39/12—Image sensors
    • H10F39/18—Complementary metal-oxide-semiconductor [CMOS] image sensors; Photodiode array image sensors
    • H10F39/184—Infrared image sensors
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F39/00—Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
    • H10F39/80—Constructional details of image sensors
    • H10F39/806—Optical elements or arrangements associated with the image sensors
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F39/00—Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
    • H10F39/80—Constructional details of image sensors
    • H10F39/806—Optical elements or arrangements associated with the image sensors
    • H10F39/8067—Reflectors
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00—Organic light-emitting devices
    • H10K50/80—Constructional details
    • H10K50/85—Arrangements for extracting light from the devices
    • H10K50/852—Arrangements for extracting light from the devices comprising a resonant cavity structure, e.g. Bragg reflector pair
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
    • G01J3/12—Generating the spectrum; Monochromators
    • G01J2003/1204—Grating and filter
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
    • G01J3/28—Investigating the spectrum
    • G01J3/2803—Investigating the spectrum using photoelectric array detector
    • G01J2003/2806—Array and filter array
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
    • G01J3/28—Investigating the spectrum
    • G01J3/2823—Imaging spectrometer
    • G01J2003/2826—Multispectral imaging, e.g. filter imaging

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Optical Filters (AREA)
  • Spectrometry And Color Measurement (AREA)
  • Solid State Image Pick-Up Elements (AREA)
  • Light Receiving Elements (AREA)
  • Surface Treatment Of Optical Elements (AREA)
CN201611247730.7A 2015-12-29 2016-12-29 基于介质镜的多光谱滤波器阵列 Pending CN107015302A (zh)

Applications Claiming Priority (6)

Application Number Priority Date Filing Date Title
US201562272086P 2015-12-29 2015-12-29
US62/272,086 2015-12-29
US201662294970P 2016-02-12 2016-02-12
US62/294,970 2016-02-12
US15/388,543 US9960199B2 (en) 2015-12-29 2016-12-22 Dielectric mirror based multispectral filter array
US15/388,543 2016-12-22

Publications (1)

Publication Number Publication Date
CN107015302A true CN107015302A (zh) 2017-08-04

Family

ID=57714463

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201611247730.7A Pending CN107015302A (zh) 2015-12-29 2016-12-29 基于介质镜的多光谱滤波器阵列

Country Status (7)

Country Link
US (2) US9960199B2 (enExample)
EP (1) EP3187910B1 (enExample)
JP (3) JP2017126742A (enExample)
KR (1) KR102478185B1 (enExample)
CN (1) CN107015302A (enExample)
CA (1) CA2952908A1 (enExample)
TW (1) TWI731912B (enExample)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109932058A (zh) * 2019-03-28 2019-06-25 浙江大学 一种基于阵列滤光片的微型光谱仪
CN110190078A (zh) * 2019-05-29 2019-08-30 中国科学院微电子研究所 一种高光谱图像传感器的单片集成方法
CN110275226A (zh) * 2018-03-13 2019-09-24 唯亚威通讯技术有限公司 传感器窗口
CN111142179A (zh) * 2018-11-02 2020-05-12 唯亚威通讯技术有限公司 阶梯结构光滤波器
CN111164394A (zh) * 2017-09-28 2020-05-15 ams有限公司 光学感测装置和用于制造光学感测装置的方法
US11493676B2 (en) 2018-03-13 2022-11-08 Viavi Solutions Inc. Sensor window comprising a plurality of sets of layers to reflect one or more colors of light that match a surface adjacent to the sensor window
CN115993185A (zh) * 2021-10-18 2023-04-21 天津津航技术物理研究所 宽自由光谱范围的多光谱成像芯片结构

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10495516B2 (en) * 2015-06-30 2019-12-03 Imec Vzw Dedicated transformation spectroscopy
US9960199B2 (en) * 2015-12-29 2018-05-01 Viavi Solutions Inc. Dielectric mirror based multispectral filter array
US9923007B2 (en) 2015-12-29 2018-03-20 Viavi Solutions Inc. Metal mirror based multispectral filter array
US10247865B2 (en) * 2017-07-24 2019-04-02 Viavi Solutions Inc. Optical filter
US10802185B2 (en) * 2017-08-16 2020-10-13 Lumentum Operations Llc Multi-level diffractive optical element thin film coating
US10712475B2 (en) 2017-08-16 2020-07-14 Lumentum Operations Llc Multi-layer thin film stack for diffractive optical elements
US10677972B2 (en) * 2017-12-08 2020-06-09 Viavi Solutions Inc. Multispectral sensor response balancing
US11143803B2 (en) * 2018-07-30 2021-10-12 Viavi Solutions Inc. Multispectral filter
US11366011B2 (en) 2019-02-13 2022-06-21 Viavi Solutions Inc. Optical device
US11789188B2 (en) * 2019-07-19 2023-10-17 Viavi Solutions Inc. Optical filter
KR20210014491A (ko) * 2019-07-30 2021-02-09 삼성전자주식회사 광 필터 및 이를 포함하는 분광기
US11693164B2 (en) * 2019-10-09 2023-07-04 Viavi Solutions Inc. Multi-transmission optical filter
US11914181B2 (en) 2020-04-08 2024-02-27 Samsung Electronics Co., Ltd. Optical filter and spectrometer including the same
CN117309140A (zh) * 2022-06-21 2023-12-29 清华大学 针对特定应用光谱库的光谱芯片结构设计方法及装置

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102741671A (zh) * 2009-11-30 2012-10-17 Imec公司 用于光谱成像系统的集成电路

Family Cites Families (114)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3617331A (en) 1964-08-25 1971-11-02 Optical Coating Laboratory Inc Method for manufacture of rotatable variable filter
US3530824A (en) 1964-08-25 1970-09-29 Optical Coating Laboratory Inc Deposition apparatus including rotatable and orbital masking assembly
US3442572A (en) 1964-08-25 1969-05-06 Optical Coating Laboratory Inc Circular variable filter
JPS57184937A (en) 1981-05-08 1982-11-13 Omron Tateisi Electronics Co Color discriminating element
JPS6342429A (ja) * 1986-08-08 1988-02-23 Minolta Camera Co Ltd 分光測定センサ
US4822998A (en) * 1986-05-15 1989-04-18 Minolta Camera Kabushiki Kaisha Spectral sensor with interference filter
JPH0785034B2 (ja) 1986-05-15 1995-09-13 ミノルタ株式会社 分光測定センサ
US4756602A (en) * 1987-06-05 1988-07-12 Rockwell International Corporation Narrowband optical filter with partitioned cavity
US4957371A (en) 1987-12-11 1990-09-18 Santa Barbara Research Center Wedge-filter spectrometer
US5144498A (en) 1990-02-14 1992-09-01 Hewlett-Packard Company Variable wavelength light filter and sensor system
US5246803A (en) 1990-07-23 1993-09-21 Eastman Kodak Company Patterned dichroic filters for solid state electronic image sensors
US5784507A (en) 1991-04-05 1998-07-21 Holm-Kennedy; James W. Integrated optical wavelength discrimination devices and methods for fabricating same
US5872655A (en) 1991-07-10 1999-02-16 Optical Coating Laboratory, Inc. Monolithic linear variable filter and method of manufacture
US5337191A (en) 1993-04-13 1994-08-09 Photran Corporation Broad band pass filter including metal layers and dielectric layers of alternating refractive index
CN1074136C (zh) 1993-06-07 2001-10-31 卡西欧计算机公司 液晶显示装置
US5905571A (en) 1995-08-30 1999-05-18 Sandia Corporation Optical apparatus for forming correlation spectrometers and optical processors
JPH1062247A (ja) * 1996-08-26 1998-03-06 Yokogawa Electric Corp 分光装置
US5986808A (en) 1996-10-11 1999-11-16 California Institute Of Technology Surface-plasmon-wave-coupled tunable filter
US6297907B1 (en) 1997-09-02 2001-10-02 California Institute Of Technology Devices based on surface plasmon interference filters
EP0933925A3 (en) 1997-12-31 2002-06-26 Texas Instruments Inc. Photofinishing utilizing modulated light source array
US8928967B2 (en) 1998-04-08 2015-01-06 Qualcomm Mems Technologies, Inc. Method and device for modulating light
JP4111288B2 (ja) * 1998-07-09 2008-07-02 Ｔｄｋ株式会社 波長選択型光検出器
GB9901858D0 (en) 1999-01-29 1999-03-17 Secr Defence Optical filters
US6215802B1 (en) 1999-05-27 2001-04-10 Blue Sky Research Thermally stable air-gap etalon for dense wavelength-division multiplexing applications
JP3383942B2 (ja) 1999-08-02 2003-03-10 Ｈｏｙａ株式会社 Ｗｄｍ光学フィルター用ガラス基板、ｗｄｍ光学フィルター、ｗｄｍ用光合分波器
US6638668B2 (en) 2000-05-12 2003-10-28 Ocean Optics, Inc. Method for making monolithic patterned dichroic filter detector arrays for spectroscopic imaging
US6574490B2 (en) 2001-04-11 2003-06-03 Rio Grande Medical Technologies, Inc. System for non-invasive measurement of glucose in humans
US6912330B2 (en) 2001-05-17 2005-06-28 Sioptical Inc. Integrated optical/electronic circuits and associated methods of simultaneous generation thereof
US6891685B2 (en) 2001-05-17 2005-05-10 Sioptical, Inc. Anisotropic etching of optical components
US20030087121A1 (en) 2001-06-18 2003-05-08 Lawrence Domash Index tunable thin film interference coatings
US6841238B2 (en) * 2002-04-05 2005-01-11 Flex Products, Inc. Chromatic diffractive pigments and foils
US7002697B2 (en) 2001-08-02 2006-02-21 Aegis Semiconductor, Inc. Tunable optical instruments
US6850366B2 (en) 2002-10-09 2005-02-01 Jds Uniphase Corporation Multi-cavity optical filter
CN1314949C (zh) 2003-04-09 2007-05-09 重庆大学 微型集成化法－珀腔阵列光谱探测器
WO2005017570A2 (en) 2003-08-06 2005-02-24 University Of Pittsburgh Surface plasmon-enhanced nano-optic devices and methods of making same
JP2005107010A (ja) 2003-09-29 2005-04-21 Hitachi Metals Ltd 多層膜光学フィルターの製造方法および多層膜光学フィルター
CN1864091A (zh) 2003-10-07 2006-11-15 伊吉斯半导体公司 在热膨胀率匹配的透明衬底上具有加热体的可调谐光学滤波器
US7123796B2 (en) 2003-12-08 2006-10-17 University Of Cincinnati Light emissive display based on lightwave coupling
CN100405029C (zh) 2003-12-09 2008-07-23 重庆大学 微型集成化变折射率法-珀腔光谱探测器
JP4638356B2 (ja) 2004-01-15 2011-02-23 パナソニック株式会社 固体撮像装置、固体撮像装置の製造方法及びこれを用いたカメラ
US7133197B2 (en) 2004-02-23 2006-11-07 Jds Uniphase Corporation Metal-dielectric coating for image sensor lids
KR20050103027A (ko) 2004-04-23 2005-10-27 매그나칩 반도체 유한회사 노치 필터를 갖는 이미지센서 및 그 제조 방법
US7879209B2 (en) 2004-08-20 2011-02-01 Jds Uniphase Corporation Cathode for sputter coating
US7521666B2 (en) 2005-02-17 2009-04-21 Capella Microsystems Inc. Multi-cavity Fabry-Perot ambient light filter apparatus
CN1306288C (zh) 2005-04-27 2007-03-21 中国科学院上海技术物理研究所 具有平整谐振腔层的滤光片列阵
US8084728B2 (en) 2005-07-06 2011-12-27 Capella Microsystems, Corp. Optical sensing device
JP2007019143A (ja) * 2005-07-06 2007-01-25 Matsushita Electric Ind Co Ltd 固体撮像装置の製造方法、固体撮像装置及びカメラ
US7406394B2 (en) 2005-08-22 2008-07-29 Applied Materials, Inc. Spectra based endpointing for chemical mechanical polishing
US20070058182A1 (en) * 2005-08-30 2007-03-15 Texas Instruments Incorporated Multiple spatial light modulators in a package
US7315667B2 (en) 2005-12-22 2008-01-01 Palo Alto Research Center Incorporated Propagating light to be sensed
JP5028279B2 (ja) * 2006-01-24 2012-09-19 パナソニック株式会社 固体撮像装置及びカメラ
US7378346B2 (en) 2006-03-22 2008-05-27 Motorola, Inc. Integrated multi-wavelength Fabry-Perot filter and method of fabrication
KR100762204B1 (ko) 2006-04-25 2007-10-02 전자부품연구원 광학 다층 박막 제조방법
JP2007317750A (ja) * 2006-05-23 2007-12-06 Matsushita Electric Ind Co Ltd 撮像装置
FR2904432B1 (fr) 2006-07-25 2008-10-24 Commissariat Energie Atomique Structure matricielle de filtrage optique et capteur d'images associe
US8766385B2 (en) * 2006-07-25 2014-07-01 Commissariat A L'energie Atomique Et Aux Energies Alternatives Filtering matrix structure, associated image sensor and 3D mapping device
US7701024B2 (en) * 2006-12-13 2010-04-20 Panasonic Corporation Solid-state imaging device, manufactoring method thereof and camera
KR100819706B1 (ko) 2006-12-27 2008-04-04 동부일렉트로닉스 주식회사 씨모스 이미지센서 및 그 제조방법
US8274739B2 (en) 2006-12-29 2012-09-25 Nanolambda, Inc. Plasmonic fabry-perot filter
JP4958594B2 (ja) 2007-03-22 2012-06-20 富士フイルム株式会社 反射防止膜、光学素子および光学系
US7576860B2 (en) 2007-05-11 2009-08-18 Hewlett-Packard Development Company, L.P. Light filter having a wedge-shaped profile
KR101491889B1 (ko) 2007-06-08 2015-02-11 하마마츠 포토닉스 가부시키가이샤 분광기
JP4891841B2 (ja) 2007-06-08 2012-03-07 浜松ホトニクス株式会社 分光モジュール
US8284401B2 (en) 2007-07-10 2012-10-09 Nanolambda, Inc. Digital filter spectrum sensor
JP5017193B2 (ja) * 2008-06-30 2012-09-05 パナソニック株式会社 固体撮像装置及びカメラ
US8896839B2 (en) 2008-07-30 2014-11-25 Pason Systems Corp. Multiplex tunable filter spectrometer
FR2937425B1 (fr) * 2008-10-22 2010-12-31 Commissariat Energie Atomique Structure de filtrage optique en longueur d'onde et capteur d'images associe
FR2939887B1 (fr) * 2008-12-11 2017-12-08 Silios Tech Dispositif de spectroscopie optique comportant une pluralite de sources d'emission
WO2010108086A2 (en) 2009-03-20 2010-09-23 Nanolambda, Inc. Nano-optic filter array based sensor
JP5440110B2 (ja) 2009-03-30 2014-03-12 株式会社リコー 分光特性取得装置、分光特性取得方法、画像評価装置、及び画像形成装置
EP2443493B1 (en) 2009-06-17 2018-09-26 Philips Lighting Holding B.V. Interference filters with high transmission and large rejection range for mini-spectrometer
CN101959091B (zh) 2009-07-15 2013-12-18 华为技术有限公司 一种数据传输方法、系统以及运营商边缘节点
WO2011052331A1 (ja) 2009-10-30 2011-05-05 シャープ株式会社 表示装置
US8559113B2 (en) * 2009-12-10 2013-10-15 Raytheon Company Multi-spectral super-pixel filters and methods of formation
JP2011198853A (ja) * 2010-03-17 2011-10-06 Fujifilm Corp マイクロレンズ非搭載の光電変換膜積層型固体撮像素子及びその製造方法並びに撮像装置
JP5619666B2 (ja) 2010-04-16 2014-11-05 ジェイディーエス ユニフェイズ コーポレーションＪＤＳ Ｕｎｉｐｈａｓｅ Ｃｏｒｐｏｒａｔｉｏｎ マグネトロン・スパッタリング・デバイスで使用するためのリング・カソード
WO2012007147A1 (de) 2010-07-15 2012-01-19 Fraunhofer-Gesellschaft Zur Förderung Der Angewandten Forschung E.V. . Optisches bandpass-filtersystem, insbesondere für mehrkanalige spektralselektive messungen
JP2012042584A (ja) 2010-08-17 2012-03-01 Seiko Epson Corp 光フィルター、光フィルターモジュール、分光測定器および光機器
JP5634836B2 (ja) * 2010-11-22 2014-12-03 浜松ホトニクス株式会社 分光センサの製造方法
CN102798918B (zh) 2011-05-25 2016-08-03 苏州大学 一种反射式彩色滤光片
FR2977684A1 (fr) * 2011-07-08 2013-01-11 Commissariat Energie Atomique Procede de realisation par impression d'un filtre pour une radiation electromagnetique
TW201317665A (zh) 2011-10-28 2013-05-01 Subtron Technology Co Ltd 光學觸控結構及其製作方法
CN104040309B (zh) 2011-11-03 2019-06-07 威利食品有限公司 用于最终使用者食品分析的低成本光谱测定系统
EP2773989A4 (en) 2011-11-04 2015-10-21 Univ New York State Res Found PHOTONIC BANDWIDTH WIDTH STRUCTURES FOR MULTISPECTRAL IMAGING DEVICES
WO2013064507A1 (en) 2011-11-04 2013-05-10 Imec Spectral camera with overlapping segments of image copies interleaved onto sensor array
IN2014CN03038A (enExample) 2011-11-04 2015-07-03 Imec
EP2773929B1 (en) 2011-11-04 2023-12-13 IMEC vzw Spectral camera with mosaic of filters for each image pixel
JP2013190580A (ja) 2012-03-13 2013-09-26 Toshiba Corp 液晶表示装置
JP5710526B2 (ja) 2012-03-14 2015-04-30 株式会社東芝 固体撮像装置、及び固体撮像装置の製造方法
TWI648561B (zh) 2012-07-16 2019-01-21 美商唯亞威方案公司 光學濾波器及感測器系統
JP2015532725A (ja) 2012-08-13 2015-11-12 プレジデント アンド フェローズ オブ ハーバード カレッジ 光学装置、光フィルタの製造方法、画像形成装置およびその製造方法
US9793098B2 (en) 2012-09-14 2017-10-17 Vapor Technologies, Inc. Low pressure arc plasma immersion coating vapor deposition and ion treatment
US10197716B2 (en) 2012-12-19 2019-02-05 Viavi Solutions Inc. Metal-dielectric optical filter, sensor device, and fabrication method
US9448346B2 (en) 2012-12-19 2016-09-20 Viavi Solutions Inc. Sensor device including one or more metal-dielectric optical filters
EP2746740B1 (en) 2012-12-21 2019-05-08 IMEC vzw Spectral imaging device and method to calibrate the same
WO2014120686A1 (en) 2013-01-29 2014-08-07 Jds Uniphase Corporation A variable optical filter and a wavelength-selective sensor based thereon
WO2014123522A1 (en) 2013-02-06 2014-08-14 Empire Technology Development Llc Thermo-optic tunable spectrometer
TWI612649B (zh) 2013-03-18 2018-01-21 新力股份有限公司 半導體裝置及電子機器
US9443993B2 (en) 2013-03-28 2016-09-13 Seiko Epson Corporation Spectroscopic sensor and method for manufacturing same
US20140320611A1 (en) 2013-04-29 2014-10-30 nanoLambda Korea Multispectral Multi-Camera Display Unit for Accurate Color, Multispectral, or 3D Images
WO2015015493A2 (en) 2013-08-02 2015-02-05 Verifood, Ltd. Spectrometry system and method, spectroscopic devices and systems
US9212996B2 (en) 2013-08-05 2015-12-15 Tellspec, Inc. Analyzing and correlating spectra, identifying samples and their ingredients, and displaying related personalized information
US9635228B2 (en) 2013-08-27 2017-04-25 Semiconductor Components Industries, Llc Image sensors with interconnects in cover layer
JP6466851B2 (ja) * 2013-10-31 2019-02-06 浜松ホトニクス株式会社 光検出装置
JP6390090B2 (ja) 2013-11-19 2018-09-19 セイコーエプソン株式会社 光学フィルターデバイス、光学モジュール、及び電子機器
US9645075B2 (en) 2013-11-26 2017-05-09 nanoLambda Korea Multispectral imager with hybrid double layer filter array
KR102163727B1 (ko) 2014-04-03 2020-10-08 삼성전자주식회사 광 이용 효율이 향상된 이미지 센서
KR102240253B1 (ko) 2014-06-18 2021-04-13 비아비 솔루션즈 아이엔씨. 금속-유전체 광학 필터, 센서 디바이스, 및 제조 방법
US10247604B2 (en) 2014-10-30 2019-04-02 Infineon Technologies Ag Spectrometer, method for manufacturing a spectrometer, and method for operating a spectrometer
KR102323208B1 (ko) 2014-11-03 2021-11-08 삼성전자주식회사 수직 적층 구조를 갖는 분광기 및 이를 포함하는 비침습형 생체 센서
US20160238759A1 (en) 2015-02-18 2016-08-18 Materion Corporation Near infrared optical interference filters with improved transmission
EP3112828B1 (en) * 2015-06-30 2022-10-05 IMEC vzw Integrated circuit and method for manufacturing integrated circuit
US9923007B2 (en) * 2015-12-29 2018-03-20 Viavi Solutions Inc. Metal mirror based multispectral filter array
US9960199B2 (en) * 2015-12-29 2018-05-01 Viavi Solutions Inc. Dielectric mirror based multispectral filter array

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102741671A (zh) * 2009-11-30 2012-10-17 Imec公司 用于光谱成像系统的集成电路

Cited By (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN111164394A (zh) * 2017-09-28 2020-05-15 ams有限公司 光学感测装置和用于制造光学感测装置的方法
CN111164394B (zh) * 2017-09-28 2022-04-05 ams有限公司 光学感测装置和用于制造光学感测装置的方法
CN110275226A (zh) * 2018-03-13 2019-09-24 唯亚威通讯技术有限公司 传感器窗口
US11493676B2 (en) 2018-03-13 2022-11-08 Viavi Solutions Inc. Sensor window comprising a plurality of sets of layers to reflect one or more colors of light that match a surface adjacent to the sensor window
US11567251B2 (en) 2018-03-13 2023-01-31 Viavi Solutions Inc. Sensor window configured to pass near-infrared light and to reflect colors of light different from a color of a surface adjacent to the window
US12298545B2 (en) 2018-03-13 2025-05-13 Viavi Solutions Inc. Optical filter comprising a sensor window to provide a transmissivity of less than 5% between approximately 400 nm and approximately 780 nm and a blocker to block transmission at less than approximately 1000 nm
US12298546B2 (en) 2018-03-13 2025-05-13 Viavi Solutions Inc. Sensor window
CN111142179A (zh) * 2018-11-02 2020-05-12 唯亚威通讯技术有限公司 阶梯结构光滤波器
CN111142179B (zh) * 2018-11-02 2023-09-08 唯亚威通讯技术有限公司 阶梯结构光滤波器
CN109932058A (zh) * 2019-03-28 2019-06-25 浙江大学 一种基于阵列滤光片的微型光谱仪
CN110190078A (zh) * 2019-05-29 2019-08-30 中国科学院微电子研究所 一种高光谱图像传感器的单片集成方法
CN115993185A (zh) * 2021-10-18 2023-04-21 天津津航技术物理研究所 宽自由光谱范围的多光谱成像芯片结构

Also Published As

Publication number Publication date
JP2022000893A (ja) 2022-01-04
JP7663457B2 (ja) 2025-04-16
EP3187910A1 (en) 2017-07-05
KR102478185B1 (ko) 2022-12-15
US11450698B2 (en) 2022-09-20
JP2017126742A (ja) 2017-07-20
EP3187910B1 (en) 2025-12-10
JP2021007175A (ja) 2021-01-21
US20180247965A1 (en) 2018-08-30
TW201734416A (zh) 2017-10-01
US9960199B2 (en) 2018-05-01
US20170186794A1 (en) 2017-06-29
CA2952908A1 (en) 2017-06-29
KR20170078545A (ko) 2017-07-07
TWI731912B (zh) 2021-07-01

Similar Documents

Publication Publication Date Title
JP7663457B2 (ja) 誘電体ミラーベースのマルチスペクトルフィルタアレイ
CN107037520B (zh) 基于金属镜的多光谱滤波器阵列
HK1241983A1 (en) Dielectric mirror based multispectral filter array
HK40083123A (en) Metal mirror based multispectral filter array
HK1240654A1 (en) Dielectric mirror based multispectral filter array
HK1241036B (en) Metal mirror based multispectral filter array
HK1241036A1 (en) Metal mirror based multispectral filter array
TW202542554A (zh) 基於金屬鏡的多光譜濾光片陣列

Legal Events

Date Code Title Description
PB01 Publication
PB01 Publication
REG Reference to a national code

Ref country code: HK

Ref legal event code: DE

Ref document number: 1241983

Country of ref document: HK

CB02 Change of applicant information
CB02 Change of applicant information

Address after: California, USA

Applicant after: VIAVI SOLUTIONS Inc.

Address before: California, USA

Applicant before: VIAVI SOLUTIONS Inc.

SE01 Entry into force of request for substantive examination
SE01 Entry into force of request for substantive examination
CB02 Change of applicant information
CB02 Change of applicant information

Address after: Arizona

Applicant after: VIAVI SOLUTIONS Inc.

Address before: California, USA

Applicant before: VIAVI SOLUTIONS Inc.

RJ01 Rejection of invention patent application after publication
RJ01 Rejection of invention patent application after publication

Application publication date: 20170804

REG Reference to a national code

Ref country code: HK

Ref legal event code: WD

Ref document number: 1241983

Country of ref document: HK