CN106959576A - 感光性组合物及其应用 - Google Patents

感光性组合物及其应用 Download PDF

Info

Publication number
CN106959576A
CN106959576A CN201610842654.8A CN201610842654A CN106959576A CN 106959576 A CN106959576 A CN 106959576A CN 201610842654 A CN201610842654 A CN 201610842654A CN 106959576 A CN106959576 A CN 106959576A
Authority
CN
China
Prior art keywords
methyl
radical polymerization
free radical
acrylate
photosensitive composite
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
CN201610842654.8A
Other languages
English (en)
Chinese (zh)
Inventor
尾崎刚史
近藤学
奈良和美
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
JNC Corp
JNC Petrochemical Corp
Original Assignee
JNC Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by JNC Corp filed Critical JNC Corp
Publication of CN106959576A publication Critical patent/CN106959576A/zh
Withdrawn legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C08G59/20—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the epoxy compounds used
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/04—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of organic materials, e.g. plastics
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/14—Protective coatings, e.g. hard coatings
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0048—Photosensitive materials characterised by the solvents or agents facilitating spreading, e.g. tensio-active agents
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • G03F7/168—Finishing the coated layer, e.g. drying, baking, soaking
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
    • H01L27/144—Devices controlled by radiation
    • H01L27/146—Imager structures
    • H01L27/14601—Structural or functional details thereof
    • H01L27/1462—Coatings
    • H01L27/14621—Colour filter arrangements
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L33/02—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Optics & Photonics (AREA)
  • Power Engineering (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Chemical & Material Sciences (AREA)
  • Computer Hardware Design (AREA)
  • Structural Engineering (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Materials For Photolithography (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Manufacturing & Machinery (AREA)
  • Electromagnetism (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Architecture (AREA)
  • General Engineering & Computer Science (AREA)
  • Theoretical Computer Science (AREA)
  • Human Computer Interaction (AREA)
  • Epoxy Resins (AREA)
  • Optical Filters (AREA)
CN201610842654.8A 2015-11-25 2016-09-22 感光性组合物及其应用 Withdrawn CN106959576A (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2015229675 2015-11-25
JP2015-229675 2015-11-25

Publications (1)

Publication Number Publication Date
CN106959576A true CN106959576A (zh) 2017-07-18

Family

ID=59017431

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201610842654.8A Withdrawn CN106959576A (zh) 2015-11-25 2016-09-22 感光性组合物及其应用

Country Status (4)

Country Link
JP (1) JP2017102432A (ja)
KR (1) KR20170061056A (ja)
CN (1) CN106959576A (ja)
TW (1) TW201719285A (ja)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110007558A (zh) * 2017-12-29 2019-07-12 财团法人工业技术研究院 组合物、包含其的绝缘材料及其制法
CN110373080A (zh) * 2018-04-12 2019-10-25 捷恩智株式会社 热硬化性组合物、硬化膜及彩色滤光片

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2019065351A1 (ja) * 2017-09-26 2019-04-04 東レ株式会社 感光性樹脂組成物、硬化膜、硬化膜を具備する素子、硬化膜を具備する有機ｅｌ表示装置、硬化膜の製造方法、および有機ｅｌ表示装置の製造方法
JP2020164759A (ja) * 2019-03-29 2020-10-08 太陽インキ製造株式会社 硬化性樹脂組成物、ドライフィルム、硬化物、および、電子部品

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011185962A (ja) * 2010-03-04 2011-09-22 Asahi Kasei E-Materials Corp 光重合性樹脂組成物積層体
CN104246548A (zh) * 2012-04-23 2014-12-24 大日本印刷株式会社 彩色滤光片用色材分散液、彩色滤光片用着色树脂组合物、彩色滤光片、以及液晶显示装置及有机发光显示装置
CN104516202A (zh) * 2013-10-02 2015-04-15 捷恩智株式会社 感光性组合物及图案状透明体
CN104914666A (zh) * 2014-03-10 2015-09-16 东友精细化工有限公司 滤色器用着色感光性树脂组合物、滤色器及具备其的液晶显示装置

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011185962A (ja) * 2010-03-04 2011-09-22 Asahi Kasei E-Materials Corp 光重合性樹脂組成物積層体
CN104246548A (zh) * 2012-04-23 2014-12-24 大日本印刷株式会社 彩色滤光片用色材分散液、彩色滤光片用着色树脂组合物、彩色滤光片、以及液晶显示装置及有机发光显示装置
CN104516202A (zh) * 2013-10-02 2015-04-15 捷恩智株式会社 感光性组合物及图案状透明体
CN104914666A (zh) * 2014-03-10 2015-09-16 东友精细化工有限公司 滤色器用着色感光性树脂组合物、滤色器及具备其的液晶显示装置

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110007558A (zh) * 2017-12-29 2019-07-12 财团法人工业技术研究院 组合物、包含其的绝缘材料及其制法
CN110373080A (zh) * 2018-04-12 2019-10-25 捷恩智株式会社 热硬化性组合物、硬化膜及彩色滤光片
CN110373080B (zh) * 2018-04-12 2022-05-17 捷恩智株式会社 热硬化性组合物、硬化膜及彩色滤光片

Also Published As

Publication number Publication date
KR20170061056A (ko) 2017-06-02
TW201719285A (zh) 2017-06-01
JP2017102432A (ja) 2017-06-08

Similar Documents

Publication Publication Date Title
CN105086316B (zh) 热硬化性组合物、硬化膜、彩色滤光片、液晶显示元件、固体摄像元件及发光二极管发光体
JP6196363B2 (ja) 新規なβ‐オキシムエステルフルオレン化合物、それを含む光重合開始剤及びフォトレジスト組成物
JP5514854B2 (ja) 新規な高感度アルファケトオキシムエステル光重合開始剤及びこの化合物を含む光重合組成物
CN106959576A (zh) 感光性组合物及其应用
KR20160038797A (ko) 터치 패널용 감광성 수지 조성물 및 그 경화막, 그리고 당해 경화막을 갖는 터치 패널
CN106950800A (zh) 光敏组合物
CN105607419A (zh) 感光性组合物与其用途
KR20240032813A (ko) 감광성 수지 조성물 및 수지막이 형성된 기판의 제조 방법
CN106610565A (zh) 感光性组合物及其应用
KR20140097008A (ko) 터치 패널용 흑색 감광성 조성물 및 터치 패널
CN107778485A (zh) 聚酯酰胺酸及含有其的感光性组合物
CN104788613B (zh) 热硬化性树脂组合物、其硬化膜、热硬化型硬涂剂及显示元件
CN105954972A (zh) 感光性组合物、硬化膜、彩色滤光片、显示元件、固体摄像元件、触摸屏及led发光体
TW201607966A (zh) 環氧（甲基）丙烯酸酯化合物及含有該化合物之樹脂組成物以及其硬化物
TWI614309B (zh) 熱硬化性樹脂組成物、硬化膜、彩色濾光片、液晶顯示元件、固體攝影元件及發光二極體發光體
CN107608178A (zh) 感光性组合物及硬化膜
CN108628094A (zh) 感光性组合物、硬化膜、彩色滤光片及电子器件
CN108628097A (zh) 感光性组合物、硬化膜、彩色滤光片、显示元件、固体摄像元件及发光二极管发光体
CN109423192A (zh) 热硬化性组合物、硬化膜及彩色滤光片
TWI774872B (zh) 熱硬化性組合物、硬化膜以及彩色濾光片
CN107589632A (zh) 感光性组合物及硬化膜
CN108693706A (zh) 感光性组合物及其应用
CN108535958A (zh) 感光性组合物、硬化膜、彩色滤光片、层间绝缘膜及涂布型偏光板
CN109401605A (zh) 热硬化性组合物、硬化膜及彩色滤光片
CN108342044A (zh) 感光性组合物及其用途

Legal Events

Date Code Title Description
PB01 Publication
PB01 Publication
SE01 Entry into force of request for substantive examination
SE01 Entry into force of request for substantive examination
WW01 Invention patent application withdrawn after publication

Application publication date: 20170718

WW01 Invention patent application withdrawn after publication