CN106716598B - 容器收纳装置 - Google Patents

容器收纳装置 Download PDF

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Publication number
CN106716598B
CN106716598B CN201580051716.7A CN201580051716A CN106716598B CN 106716598 B CN106716598 B CN 106716598B CN 201580051716 A CN201580051716 A CN 201580051716A CN 106716598 B CN106716598 B CN 106716598B
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CN
China
Prior art keywords
container
mounting table
liquid
storage device
moving member
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
CN201580051716.7A
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English (en)
Chinese (zh)
Other versions
CN106716598A (zh
Inventor
园田主税
宫原强
大川胜宏
宇都宫由典
赤田光
长谷部和久
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokyo Electron Ltd
Original Assignee
Tokyo Electron Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Electron Ltd filed Critical Tokyo Electron Ltd
Priority claimed from PCT/JP2015/076422 external-priority patent/WO2016047542A1/ja
Publication of CN106716598A publication Critical patent/CN106716598A/zh
Application granted granted Critical
Publication of CN106716598B publication Critical patent/CN106716598B/zh
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C11/00—Component parts, details or accessories not specifically provided for in groups B05C1/00 - B05C9/00
    • B05C11/10—Storage, supply or control of liquid or other fluent material; Recovery of excess liquid or other fluent material
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Coating Apparatus (AREA)
  • Feeding, Discharge, Calcimining, Fusing, And Gas-Generation Devices (AREA)
CN201580051716.7A 2014-09-24 2015-09-17 容器收纳装置 Active CN106716598B (zh)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
JP2014193581 2014-09-24
JP2014-193581 2014-09-24
JP2015158322A JP6342368B2 (ja) 2014-09-24 2015-08-10 容器収容装置
JP2015-158322 2015-08-10
PCT/JP2015/076422 WO2016047542A1 (ja) 2014-09-24 2015-09-17 容器収容装置

Publications (2)

Publication Number Publication Date
CN106716598A CN106716598A (zh) 2017-05-24
CN106716598B true CN106716598B (zh) 2020-08-14

Family

ID=55805865

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201580051716.7A Active CN106716598B (zh) 2014-09-24 2015-09-17 容器收纳装置

Country Status (3)

Country Link
JP (1) JP6342368B2 (enExample)
CN (1) CN106716598B (enExample)
TW (1) TWI639540B (enExample)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI763944B (zh) * 2017-11-01 2022-05-11 日商東京威力科創股份有限公司 處理液供給系統、處理液供給裝置及載具保管裝置
EP3914475B1 (en) 2019-01-22 2023-12-13 Shanghai Yanfeng Jinqiao Automotive Trim Systems Co. Ltd Vehicle interior component

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20040082483A (ko) * 2003-03-19 2004-09-30 삼성전자주식회사 포토레지스트 공급장치
KR20050088734A (ko) * 2004-03-03 2005-09-07 삼성전자주식회사 포토레지스트 공급 장치
CN101364046A (zh) * 2007-08-06 2009-02-11 力晶半导体股份有限公司 液体与液位的侦测预警系统及方法

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3060136B2 (ja) * 1991-12-04 2000-07-10 東京エレクトロン株式会社 半導体製造装置
JP3680907B2 (ja) * 1998-06-02 2005-08-10 大日本スクリーン製造株式会社 基板処理装置
JP4708044B2 (ja) * 2005-02-10 2011-06-22 大日本スクリーン製造株式会社 基板処理装置
JP5612265B2 (ja) * 2009-01-23 2014-10-22 株式会社Ｓｃｒｅｅｎセミコンダクターソリューションズ 基板処理装置及び基板処理方法
JP5841007B2 (ja) * 2012-05-28 2016-01-06 株式会社Ｓｃｒｅｅｎセミコンダクターソリューションズ 薬液供給方法と基板処理装置

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20040082483A (ko) * 2003-03-19 2004-09-30 삼성전자주식회사 포토레지스트 공급장치
KR20050088734A (ko) * 2004-03-03 2005-09-07 삼성전자주식회사 포토레지스트 공급 장치
CN101364046A (zh) * 2007-08-06 2009-02-11 力晶半导体股份有限公司 液体与液位的侦测预警系统及方法

Also Published As

Publication number Publication date
TWI639540B (zh) 2018-11-01
JP6342368B2 (ja) 2018-06-13
JP2016066784A (ja) 2016-04-28
CN106716598A (zh) 2017-05-24
TW201632435A (zh) 2016-09-16

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