CN106660884B - 耐蚀性部件、静电卡盘用部件及耐蚀性部件的制造方法 - Google Patents
耐蚀性部件、静电卡盘用部件及耐蚀性部件的制造方法 Download PDFInfo
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- CN106660884B CN106660884B CN201580044157.7A CN201580044157A CN106660884B CN 106660884 B CN106660884 B CN 106660884B CN 201580044157 A CN201580044157 A CN 201580044157A CN 106660884 B CN106660884 B CN 106660884B
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Abstract
本发明提供一种在使用于静电卡盘用部件的情况下能够增强施加电场时的静电卡盘的吸附力、且能够减小停止施加电场时的静电卡盘的剩余吸附力的耐蚀性部件、静电卡盘用部件及耐蚀性部件的制造方法。本发明的耐蚀性部件包含有含钐及铝且具有钙钛矿型结构的氧化物。本发明的静电卡盘用部件包含本发明的耐蚀性部件。本发明的耐蚀性部件的制造方法包括:混合氧化铝粉末及氧化钐粉末和溶剂而制作包含氧化铝粉末及氧化钐粉末的浆料的工序;干燥浆料而制作包含铝粉末及氧化钐粉末的混合粉末,并成型该混合粉末而制作成型体的工序;及烧制成型体而制作烧结体的工序。
Description
技术领域
本发明涉及一种耐蚀性部件、静电卡盘用部件及耐蚀性部件的制造方法,更详细而言,涉及一种对氟类腐蚀性气体、氯类腐蚀性气体等卤素类腐蚀性气体及这些气体的等离子体具有较高的耐蚀性的耐蚀性部件、包含耐蚀性部件的静电卡盘用部件及该耐蚀性部件的制造方法。
背景技术
在IC、LSI、VLSI等半导体装置的生产线上,存在使用氟类腐蚀性气体、氯类腐蚀性气体等卤素类腐蚀性气体及这些气体的等离子体的工序。这些工序中,对通过静电卡盘而被固定的半导体晶圆实施例如干式蚀刻、等离子体蚀刻、清洗等处理。在这些处理中使用CF4、SF6、HF、NF3、F2等氟类气体和Cl2、SiCl4、BCl3、HCl等氯类气体及那些气体的等离子体等。这些腐蚀性气体和等离子体的腐蚀性高,因此由这些腐蚀性气体和等离子体引起的构成静电卡盘的静电卡盘用部件的腐蚀构成问题。由此,以往使用的是钇铝石榴石(Y3Al5O12,以下简称为YAG)和将除了氧化钇以外的稀土氧化物添加到YAG的材料等作为使用于静电卡盘用部件的耐蚀性材料(例如,参考专利文献1~3)。
以往技术文献
专利文献
专利文献1:日本特开2004-315308号公报
专利文献2:日本特开2011-151336号公报
专利文献3:日本特开2012-94826号公报
发明内容
发明要解决的技术课题
专利文献1~3中所记载的耐蚀性部件对氟类腐蚀性气体、氯类腐蚀性气体等卤素类腐蚀性气体及这些气体的等离子体具有较高的腐蚀性。由于这些耐蚀性部件特别使用于静电卡盘用部件,因此重要的是不仅要腐蚀性高,而且在作为静电卡盘用部件而使用的情况下,施加电场时的静电卡盘的吸附力强,且停止施加电场时的静电卡盘的剩余吸附力弱。由此,本发明的目的在于提供一种在使用于静电卡盘用部件的情况下能够比以往进一步增强施加电场时的静电卡盘的吸附力,且能够比以往进一步减小停止施加电场时的静电卡盘的剩余吸附力的耐蚀性部件、静电卡盘用部件及耐蚀性部件的制造方法。
用于解决技术课题的手段
以往,大部分钙钛矿型化合物具有四方晶、正交晶、三方晶等立方晶格所扭曲的结构,因此显示出铁电性,被认为不适合使用于被施加较强的电场的静电卡盘用部件。然而,本发明人发现尽管SmAlO3为正交晶钙钛矿型结构(LaAlO3型结构)但适合使用于静电卡盘用部件,并完成了本发明。即,本发明为如下。
[1]一种耐蚀性部件,其包含有含钐及铝且具有钙钛矿型结构的氧化物。
[2]根据上述[1]所述的耐蚀性部件,其中,上述耐蚀性部件中的上述氧化物的比例为80体积%以上。
[3]根据上述[1]或[2]所述的耐蚀性部件,其中,上述氧化物中的钐:铝(摩尔比)的范围是73:27~9:91。
[4]根据上述[1]~[3]中任一项所述的耐蚀性部件,其中,在压力小于0.5Pa的气氛下,对具有1mm厚度的耐蚀性部件施加2.0kV的电压60秒钟,从而使1英寸的硅晶圆吸附于耐蚀性部件之后,停止施加电压时的剩余吸附力为0.1~0.9kPa。
[5]一种静电卡盘用部件,包含上述[1]~[4]中任一项所述的耐蚀性部件。
[6]一种耐蚀性部件的制造方法,其包括:混合氧化铝粉末及氧化钐粉末和溶剂而制作包含氧化铝粉末及氧化钐粉末的浆料的工序;干燥浆料而制作包含铝粉末及氧化钐粉末的混合粉末,并成型该混合粉末而制作成型体的工序;及烧制成型体而制作烧结体的工序。
[7]根据上述[6]所述的耐蚀性部件的制造方法,其中,还包括对烧结体进行退火的工序。
发明效果
根据本发明能够提供在使用于静电卡盘用部件的情况下能够增强施加电场时的静电卡盘的吸附力且能够减小停止施加电场时的静电卡盘的剩余吸附力的耐蚀性部件、静电卡盘用部件及耐蚀性部件的制造方法。
附图说明
图1是表示实施例1的X射线衍射图案的图。
具体实施方式
[耐蚀性部件]
本发明的耐蚀性部件包含有含钐及铝且具有钙钛矿型结构的氧化物。含钐及铝且具有钙钛矿型结构的氧化物,例如为SmAlO3。
本发明的耐蚀性部件只要是含钐及铝且具有钙钛矿型结构的氧化物,就可以包含其它元素。然而,该氧化物优选为构成氧化物的原子为钐、铝及氧且占大部分的氧化物。
上述氧化物中的钐:铝(摩尔比)的范围优选为73:27~9:91,更优选为73:27~14:86,更优选为73:27~19:81,更优选为73:27~26:74,更优选为73:27~35:65,进一步优选为65:35~40:60,尤其优选为60:40~45:55,进一步优选为60:40~47:53。若上述氧化物中的钐:铝(摩尔比)的范围为73:27~9:91,则能够将上述氧化物的主要结构设为钙钛矿型结构。
本发明的耐蚀性部件中的上述氧化物的比例优选为80体积%以上,更优选为90体积%以上,进一步优选为95体积%以上。若耐蚀性部件中的上述氧化物的比例为80体积%以上,则能够提高耐蚀性部件的介电常数,并且在将本发明的耐蚀性部件使用于静电卡盘用部件的情况下,能够增强施加电场时的静电卡盘的吸附力,且能够减小停止施加电场时的静电卡盘的剩余吸附力。
本发明的耐蚀性部件在40Hz的频率下的相对介电常数优选为20以上,更优选为23以上,进一步优选为25以上。若本发明的耐蚀性部件中的相对介电常数为20以上,则在将耐蚀性部件使用于静电卡盘用部件的情况下,能够增强施加电场时的静电卡盘的吸附力。
本发明的耐蚀性部件的弯曲强度优选为150MPa以上,更优选为160MPa以上,进一步优选为170MPa以上。在此,弯曲强度是依据JISR1601通过4点弯曲试验所测定的值。若耐蚀性部件的弯曲强度为150MPa以上,则在将耐蚀性部件使用于静电卡盘用部件的情况下,不会产生有关强度的实际应用上的问题。
本发明的耐蚀性部件中的相对密度优选为97%以上,更优选为97.5%以上,进一步优选为98%以上。若耐蚀性部件中的相对密度为97%以上,则能够增强耐蚀性部件的强度,且能够提高耐蚀性部件的相对介电常数。并且,耐蚀性部件中的气孔成为介电损耗增大的原因,因此若耐蚀性部件中的相对密度为97%以上,则能够减少耐蚀性部件的介电损耗。
在压力小于0.5Pa的气氛下,对具有1mm厚度的耐蚀性部件施加2.0kV的电压,从而使1英寸的硅晶圆吸附于本发明的耐蚀性部件时的吸附力优选为10~30kPa,更优选为12~30kPa。若吸附力为10~30kPa,则通过将本发明的耐蚀性部件使用于静电卡盘用部件,能够将硅晶圆等基板可靠地固定于静电卡盘。
在压力小于0.5Pa的气氛下,对具有1mm厚度的本发明的耐蚀性部件施加2.0kV的电压60秒钟,从而使1英寸的硅晶圆吸附于耐蚀性部件之后,停止施加电压时的剩余吸附力优选为0.1~0.9kPa。若剩余吸附力为0.1~0.9kPa,则通过将本发明的耐蚀性部件使用于静电卡盘用部件,在硅晶圆等基板的处理结束之后,能够容易从静电卡盘卸下基板。
[耐蚀性部件的制造方法]
本发明的耐蚀性部件的制造方法包括:工序(A),混合氧化铝粉末及氧化钐粉末和溶剂而制作包含氧化铝粉末及氧化钐粉末的浆料;工序(B),干燥浆料而制作包含铝粉末及氧化钐粉末的混合粉末,并成型该混合粉末而制作成型体;及工序(C),烧制成型体而制作烧结体。
(工序(A))
在工序(A)中,混合氧化铝粉末及氧化钐粉末和溶剂而制作包含氧化铝粉末及氧化钐粉末的浆料。氧化铝粉末及氧化钐粉末的平均粒径分别优选为0.01~1.0μm。若氧化铝粉末及氧化钐粉末的平均粒径为0.01~1.0μm,则能够得到相对密度大的耐蚀性部件。并且,能够抑制耐蚀性部件中的铝及钐的偏析。并且,氧化铝粉末及氧化钐粉末的混合粉末的平均粒径优选为0.01~1.0μm。另外,平均粒径为1次粒子的平均粒径,是通过激光衍射/散射法而测定的体积平均粒径。
氧化铝粉末及氧化钐粉末的BET比表面积优选为5~25m2/g。若氧化铝粉末及氧化钐粉末的BET比表面积为5~25m2/g,则能够得到相对密度大的耐蚀性部件。BET比表面积是通过使用氮气的BET法而测定的比表面积。
作为在工序(A)中使用的溶剂,可以举出例如水、甲醇、乙醇、丙醇、丁醇、甲苯、二甲苯、丙酮、二氯甲烷、乙酸乙酯、二甲基甲酰胺、二乙醚等。优选的溶剂是选自包括水、甲醇、乙醇、丙醇及丁醇中的至少1种。由于使用溶剂来混合氧化铝粉末及氧化钐粉末,因此能够均匀地混合氧化铝粉末及氧化钐粉末。
在混合氧化铝粉末及氧化钐粉末和溶剂时所使用的装置,只要能够制作均匀地包含氧化铝粉末及氧化钐粉末的浆料,就无特别限定。作为在混合氧化铝粉末及氧化钐粉末和溶剂时所使用的装置,可以举出例如球磨机、珠磨机、分散式研磨机、均质器、振动磨机、砂磨机、磨碎机、超声波分散机及高压分散机等。
(工序(B))
在工序(B)中,干燥上述浆料而制作包含氧化铝粉末及氧化钐粉末的混合粉末,并成型该混合粉末而制作成型体。
包含氧化铝粉末及氧化钐粉末的混合粉末优选为颗粒状,以便混合粉末容易成型。从而,优选通过干燥浆料且形成颗粒的方法来实施浆料的干燥。在干燥浆料时可以使用例如喷雾干燥机、气流干燥机、流体层等。为了形成混合粉末的颗粒,可以将聚丙烯酸盐等分散剂、聚乙二醇类消泡剂等消泡剂、硬脂酸等润滑剂、聚乙烯醇等粘结材料、聚乙二醇等增塑剂等添加于浆料中。在工序(B)中,例如通过在模具中对所得到的混合粉末进行单轴压制或者在橡胶模具中进行等静压而得到成型体。
为了从颗粒状的混合粉末中去除粘结材料等有机成分,优选在成型之前对混合粉末进行脱脂。对混合粉末进行脱脂的温度例如为50~600℃。
(工序(C))
在工序(C)中,烧制成型体而制作烧结体。烧制成型体时的烧制温度优选为1400~1800℃,更优选为1450~1750℃,进一步优选为1500~1700℃。若烧制温度为1400~1800℃,则能够得到致密的烧结体,并且能够抑制烧结体熔融。在上述烧制温度的烧制中的烧制时间优选为1~5小时,更优选为1~4小时,进一步优选为1.5~3小时。若烧制时间为1~5小时,则能够得到致密的烧结体,并且能够抑制在烧结体中引起异常晶粒生长。可以在大气中烧制成型体,也可以在惰性气体气氛下烧制成型体。
成型体的烧制可以是常压烧制,但从可获得更致密的烧结体的观点考虑,更优选为加压烧制。作为加压烧制,可以举出例如热等静压(HIP)烧制、热压(HP)单轴加压烧制、超高压压制(UHP)多轴加压烧制等。通过加压烧制来烧制成型体时对成型体的压力例如为10~40MPa。
(进行退火的工序(D))
本发明的耐蚀性部件的制造方法还可以包括对烧结体进行退火的工序(D)。由此能够减少烧结体中的氧缺陷。另外,若在烧结体中氧缺陷较多,则介电常数变大,且吸附力变大,而电阻值减小,因此剩余吸附力变大。以减少氧缺陷为目的,优选在空气中实施烧结体的退火处理。退火处理温度优选为1300~1600℃,更优选为1350~1550℃,进一步优选为1400~1500℃。若退火处理温度为1300~1600℃,则能够充分地减少氧缺陷,并且能够抑制吸附力过度减小。上述退火处理温度中的退火处理时间优选为2~10小时,更优选为3~10小时。若退火处理时间为2~10小时,则能够充分地减少氧缺陷,并且能够抑制吸附力过度减小。
[静电卡盘用部件]
本发明的静电卡盘用部件包含本发明的耐蚀性部件。静电卡盘用部件具有例如:板状体,具有用来静电吸附试样的试样载置面;静电吸附用内部电极层,设置于所述板状体的背面;粘接剂层,埋设静电吸附用内部电极层;及绝缘性材料层,设置于粘接剂层中的板状体的相反侧。在静电卡盘部件中的板状体的至少在试样载置面上使用本发明的耐蚀性部件。
实施例
接着,根据实施例对本发明进一步详细地进行说明,但本发明并不受这些实施例的任何限定。
如下进行后述的实施例及比较例中的测定及评价。
(1)原料粉体的平均粒径
使原料粉体在水中分散之后,使用粒度分布测定装置(Shimadzu Corporation制造,SALD-2000J)来测定原料粉体的平均粒径。
(2)耐蚀性部件的相对密度
根据阿基米德法测定在实施例及比较例中得到的耐蚀性部件的密度,以所测定的密度除以由下述式求出的理论密度,从而算出相对密度。
晶胞重量(g)=氧化钐铝晶相的各个晶胞重量×各个晶相的mol%
晶胞体积(cm3)=氧化钐铝晶相的各个晶胞体积×各个晶相的mol%
理论密度(g/cm3)=晶胞重量/晶胞体积
另外,由原料粉体的加入量算出氧化钐铝的各个晶相%的mol%。
(3)耐蚀性部件的晶相的鉴定
根据粉末X射线衍射法进行了在实施例及比较例中得到的耐蚀性部件的晶相的鉴定。在粉末X射线衍射中使用了X射线衍射装置(PANalytical公司制造,X’Pert PRO MPD)。
(4)耐蚀性部件的相对介电常数
将在实施例及比较例中所得到的耐蚀性部件加工为φ48×1mm之后,使用充放电评价装置(Toyo-System Co.,Ltd.制造,TOSCAT-3000)测定了40MHz下的耐蚀性部件的相对介电常数。
(5)耐蚀性部件的吸附力
将在实施例及比较例中得到的耐蚀性部件加工为1.0mm的厚度,且在所加工的耐蚀性部件与氧化铝陶瓷之间形成埋设有电极的粘接层,从而制作出静电卡盘。将静电卡盘的试样载置面温度设为25℃,将2.0kV的电压施加于电极60秒钟,从而使1英寸的硅晶圆在真空中(<0.5Pa)吸附于静电卡盘。然后,测定出对1英寸的硅晶圆的吸附力。通过使用测力传感器的剥离来进行测定,并将此时产生的最大剥离应力设为吸附力。
(6)耐蚀性部件的剩余吸附力
将在实施例及比较例中得到的耐蚀性部件加工为1.0mm的厚度,且在所加工的耐蚀性部件与氧化铝陶瓷之间形成埋设有电极的粘接层,从而制作出静电卡盘。将静电卡盘的试样载置面温度设为25℃,将2.0kV的电压施加于电极60秒钟,从而使1英寸的硅晶圆在真空中(<0.5Pa)吸附于静电卡盘。之后,停止施加电压,测定出刚停止施加电压之后对1英寸的硅晶圆的剩余吸附力。通过使用测力传感器的剥离来进行测定,并将此时产生的最大剥离应力设为剩余吸附力。
(7)耐蚀性部件的弯曲强度
依据JIS R1601,通过4点弯曲试验而测定出在实施例及比较例中得到的耐蚀性部件的弯曲强度。使用弯曲试验器(MARUTO Testing Machine Company.制造,MARUTO JIS弯曲试验机MZ-401)进行了测定。
(8)耐蚀性评价
对实施例及比较例中所得到的耐蚀性部件照射(i)CF4/O2/Ar(2/2/16mL/分钟)及(ii)SF6(10mL/分钟)的气态物质并进行了等离子体暴露试验。条件为真空度:1mTorr、电极频率:2.5GHz、偏置频率:13.56MHz、电压:3400V、电流:1.8A、等离子体功率:420W(CF4)及400W(SF6)。
测定未暴露的部分和暴露后的部分的表面粗糙度,由该差值来算出蚀刻速率。
(实施例1)
以成为表1所示的组成的方式,分别称取氧化铝(Al2O3)粉末(TAIMEI CHEMICALSCo.,Ltd.制造,型号:TM-5D)及氧化钐(Sm2O3)粉末(Nippon Yttrium Co.,Ltd.,制造,型号:N-SM3CP)。将所称取的氧化铝粉末和氧化钐粉末及相对于氧化铝粉末和氧化钐粉末的总质量为1质量%的分散剂(CHUKYO YUSHI CO.,LTD.制造,型号:D-735)投入到装有水的烧杯中。以固体成分成为30%的方式量取水的量。接着,通过搅拌叶片进行湿式混合之后,用球磨机使其分散,从而制作出氧化铝粉末及氧化钐粉末的混合粉末浆料。采集该浆料的一部分来测定氧化铝粉末及氧化钐粉末的混合粉末的平均粒径,结果为0.541μm。
使用喷雾干燥器(Nihon BUCHI.K.K.制造,型号:B-290),干燥该浆料并进行造粒,从而制作出混合粉末的颗粒。对该混合粉末的颗粒在500℃下进行4小时的热处理而进行了脱脂。接着,将该混合粉末成型为规定形状。然后,使用热压机(Fujidempa Kogyo.Co.,ltd.制造,型号:HIGH-MULTI5000),在1600℃的烧制温度、2小时的烧制时间、20MPa的压力及氩气中,对成型体进行加压烧制而得到烧结体。以1480℃的退火温度及3小时的退火时间来对所得到的烧结体进行退火处理,制作出实施例1的耐蚀性部件。
(实施例2)
将烧制温度设为1700℃,除此以外,以与实施例1相同的方法制作出实施例2的耐蚀性部件。另外,氧化铝粉末及氧化钐粉末的混合粉末的平均粒径为0.662μm。
(实施例3)
将烧制温度设为1500℃,除此以外,以与实施例1相同的方法制作出实施例3的耐蚀性部件。另外,氧化铝粉末及氧化钐粉末的混合粉末的平均粒径为0.578μm。
(实施例4)
将烧制温度设为1450℃,除此以外,以与实施例1相同的方法制作出实施例4的耐蚀性部件。另外,氧化铝粉末及氧化钐粉末的混合粉末的平均粒径为0.521μm。
(实施例5)
将钐:铝(摩尔比)设为9:91,除此以外,以与实施例1相同的方法制作出实施例5的耐蚀性部件。另外,氧化铝粉末及氧化钐粉末的混合粉末的平均粒径为0.552μm。
(实施例6)
将钐:铝(摩尔比)设为14:86且将烧制温度设为1400℃,除此以外,以与实施例1相同的方法制作出实施例6的耐蚀性部件。另外,氧化铝粉末及氧化钐粉末的混合粉末的平均粒径为0.548μm。
(实施例7)
将钐:铝(摩尔比)设为19:81,除此以外,以与实施例1相同的方法制作出实施例6的耐蚀性部件。另外,氧化铝粉末及氧化钐粉末的混合粉末的平均粒径为0.531μm。
(实施例8)
将钐:铝(摩尔比)设为26:74且将烧制温度设为1500℃,除此以外,以与实施例1相同的方法制作出实施例8的耐蚀性部件。另外,氧化铝粉末及氧化钐粉末的混合粉末的平均粒径为0.529μm。
(实施例9)
将钐:铝(摩尔比)设为47:53且将烧制温度设为1550℃,除此以外,以与实施例1相同的方法制作出实施例8的耐蚀性部件。另外,氧化铝粉末及氧化钐粉末的混合粉末的平均粒径为0.520μm。
(比较例1)
使用氧化钇(Y2O3)粉末(Nippon Yttrium Co.,Ltd.,制造,型号:YT3S)来代替氧化钐粉末,除此以外,以与实施例1相同的方法制作出比较例1的耐蚀性部件。另外,采集氧化铝粉末及氧化钇粉末的混合粉末浆料的一部分来测定氧化铝粉末及氧化钇粉末的混合粉末的平均粒径,结果为0.674μm。
(比较例2)
使用氧化钇(Y2O3)粉末(Nippon Yttrium Co.,Ltd.,制造,型号:YT3S)来代替氧化钐粉末,且以成为表1所示的组成分别称取氧化铝粉末及氧化钇粉末,除此以外,以与实施例1相同的方法制作出比较例2的耐蚀性部件。另外,采集氧化铝粉末及氧化钇粉末的混合粉末浆料的一部分来测定氧化铝粉末及氧化钇粉末的混合粉末的平均粒径,结果为0.564μm。
(比较例3)
除了使用氧化铝粉末及氧化钐粉末以外,还使用氧化钇(Y2O3)粉末(NipponYttrium Co.,Ltd.,制造,型号:YT3S),并以成为表1所示的组成分别称取氧化铝粉末、氧化钐粉末及氧化钇粉末,除此以外,以与实施例1相同的方法制作出比较例3的耐蚀性部件。另外,采集氧化铝粉末、氧化钐粉末及氧化钇粉末的混合粉末浆料的一部分来测定氧化铝粉末、氧化钐及氧化钇粉末的混合粉末的平均粒径,结果0.775μm。
作为用来鉴定在实施例1~4及比较例1~3中得到的耐蚀性部件的晶相而测定的X射线衍射图案的一例,将实施例1的X射线衍射图案示于图1中。在实施例1~4及比较例1中得到的耐蚀性部件的晶体结构为钙钛矿型结构,与此相对,在比较例2及3中得到的耐蚀性部件的晶体结构为石榴石结构。
表1~3中示出实施例1~9及比较例1~3中得到的耐蚀性部件的评价结果。
[表1]
[表2]
[表3]
可知如表1~3所示在实施例1~9及比较例1~3中得到的耐蚀性部件的相对密度均为97%以上,实施例1~9及比较例1~3中得到的耐蚀性部件为致密的烧结体。并且,这些耐蚀性部件具有良好的耐蚀性。
在实施例1~9中得到的耐蚀性部件的相对介电常数大于在比较例1~3中得到的耐蚀性部件的相对介电常数。这些结果可根据钙钛矿型结构比石榴石结构容易引起极化、以及因钐的离子半径大于钇的离子半径而极化较大而预测。
另一方面,在实施例1~9中得到的耐蚀性部件的吸附力大于在比较例1~3中得到的耐蚀性部件的吸附力。由此,可知通过使用在实施例1~9中得到的耐蚀性部件来作为静电卡盘用部件,能够将硅晶圆等基板更可靠地固定于静电卡盘。
并且,在实施例1~9中得到的耐蚀性部件的剩余吸附力小于在比较例1~3中得到的耐蚀性部件的剩余吸附力。由此,可知通过使用在实施例1~9中得到的耐蚀性部件来作为静电卡盘用部件,在规定的处理结束之后,使硅晶圆等基板从静电卡盘容易卸下。
在实施例1~9中得到的耐蚀性部件的弯曲强度大于在比较例2及3中得到的耐蚀性部件的弯曲强度。由此,可知通过使用在实施例1~9中得到的耐蚀性部件来作为静电卡盘用部件,能够提高静电卡盘的强度。
Claims (3)
1.一种静电卡盘用部件,其包含具有钙钛矿型结构的氧化钐和氧化铝的烧结体的耐蚀性部件,所述氧化钐和氧化铝的烧结体中,钐:铝的摩尔比为73:27~9:91,所述耐蚀性部件中,所述氧化钐和氧化铝的烧结体的比例为80体积%以上。
2.根据权利要求1所述的静电卡盘用部件,其中,
在压力小于0.5Pa的气氛下,对具有1mm厚度的所述耐蚀性部件施加2.0kV的电压60秒钟,从而使1英寸的硅晶圆吸附于所述耐蚀性部件之后,停止施加电压时的剩余吸附力为0.1~0.9kPa。
3.一种耐蚀性部件的制造方法,其包括:
以钐:铝的摩尔比为73:27~9:91的方式混合氧化铝粉末及氧化钐粉末和溶剂而制作包含所述氧化铝粉末及所述氧化钐粉末的浆料的工序;
干燥所述浆料而制作包含所述铝粉末及所述氧化钐粉末的混合粉末,并成型该混合粉末而制作成型体的工序;
烧制所述成型体而制作具有钙钛矿型结构烧结体的工序;以及
在1300~1600℃的退火处理温度下对所述烧结体进行退火的工序。
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