CN105518532B - 尤其用于微光刻投影曝光设备的镜子 - Google Patents

尤其用于微光刻投影曝光设备的镜子 Download PDF

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Publication number
CN105518532B
CN105518532B CN201480049179.8A CN201480049179A CN105518532B CN 105518532 B CN105518532 B CN 105518532B CN 201480049179 A CN201480049179 A CN 201480049179A CN 105518532 B CN105518532 B CN 105518532B
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CN
China
Prior art keywords
mirror
layer
nitride
mirror substrate
group iii
Prior art date
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Active
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CN201480049179.8A
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English (en)
Chinese (zh)
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CN105518532A (zh
Inventor
M.赫尔曼
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Carl Zeiss SMT GmbH
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Carl Zeiss SMT GmbH
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Publication of CN105518532A publication Critical patent/CN105518532A/zh
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/702—Reflective illumination, i.e. reflective optical elements other than folding mirrors, e.g. extreme ultraviolet [EUV] illumination systems
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/08—Mirrors
    • G02B5/0816—Multilayer mirrors, i.e. having two or more reflecting layers
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/08—Mirrors
    • G02B5/0891—Ultraviolet [UV] mirrors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70316—Details of optical elements, e.g. of Bragg reflectors, extreme ultraviolet [EUV] multilayer or bilayer mirrors or diffractive optical elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7095—Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient
    • G03F7/70958—Optical materials or coatings, e.g. with particular transmittance, reflectance or anti-reflection properties
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—HANDLING OF PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
    • G21K1/06—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators
    • G21K1/062—Devices having a multilayer structure

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Engineering & Computer Science (AREA)
  • Optics & Photonics (AREA)
  • Health & Medical Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Lenses (AREA)
CN201480049179.8A 2013-08-07 2014-06-25 尤其用于微光刻投影曝光设备的镜子 Active CN105518532B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE102013215541.7 2013-08-07
DE102013215541.7A DE102013215541A1 (de) 2013-08-07 2013-08-07 Spiegel, insbesondere für eine mikrolithographische Projektionsbelichtungsanlage
PCT/EP2014/063349 WO2015018560A2 (de) 2013-08-07 2014-06-25 Spiegel, insbesondere für eine mikrolithographische projektionsbelichtungsanlage

Publications (2)

Publication Number Publication Date
CN105518532A CN105518532A (zh) 2016-04-20
CN105518532B true CN105518532B (zh) 2018-10-09

Family

ID=51178880

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201480049179.8A Active CN105518532B (zh) 2013-08-07 2014-06-25 尤其用于微光刻投影曝光设备的镜子

Country Status (7)

Country Link
US (1) US10310382B2 (https=)
EP (1) EP3030936B1 (https=)
JP (1) JP6560670B2 (https=)
KR (1) KR102265041B1 (https=)
CN (1) CN105518532B (https=)
DE (1) DE102013215541A1 (https=)
WO (1) WO2015018560A2 (https=)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102015213253A1 (de) * 2015-07-15 2017-01-19 Carl Zeiss Smt Gmbh Spiegel, insbesondere für eine mikrolithographische Projektionsbelichtungsanlage
JP6734398B2 (ja) * 2016-05-12 2020-08-05 ヒューレット−パッカード デベロップメント カンパニー エル．ピー．Ｈｅｗｌｅｔｔ‐Ｐａｃｋａｒｄ Ｄｅｖｅｌｏｐｍｅｎｔ Ｃｏｍｐａｎｙ， Ｌ．Ｐ． 印刷剤の適用による温度補正
DE102016213831A1 (de) * 2016-07-27 2018-02-01 Carl Zeiss Smt Gmbh Reflektives optisches Element für die EUV-Lithographie
DE102016224113A1 (de) * 2016-12-05 2018-06-07 Carl Zeiss Smt Gmbh Intensitätsanpassungsfilter für die euv - mikrolithographie und verfahren zur herstellung desselben sowie beleuchtungssystem mit einem entsprechenden filter
DE102018211499A1 (de) 2018-07-11 2020-01-16 Carl Zeiss Smt Gmbh Reflektives optisches Element und Verfahren zum Herstellen eines reflektiven optischen Elements

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JPH04164297A (ja) * 1990-10-29 1992-06-09 Seiko Instr Inc Ｘ線反射鏡
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US6377655B1 (en) 1998-05-08 2002-04-23 Nikon Corporation Reflective mirror for soft x-ray exposure apparatus
JPH11326598A (ja) * 1998-05-08 1999-11-26 Nikon Corp 反射鏡およびその製造方法
US6778404B1 (en) * 2000-06-02 2004-08-17 Micron Technology Inc Stackable ball grid array
US7843632B2 (en) * 2006-08-16 2010-11-30 Cymer, Inc. EUV optics
US6710351B2 (en) * 2001-09-18 2004-03-23 Euv, Llc EUV mirror based absolute incident flux detector
US20080004332A1 (en) * 2002-03-07 2008-01-03 Alkon Daniel L Methods for alzheimer's disease treatment and cognitive enhancement
JP3919599B2 (ja) * 2002-05-17 2007-05-30 キヤノン株式会社 光学素子、当該光学素子を有する光源装置及び露光装置
JP2004177587A (ja) * 2002-11-26 2004-06-24 Taiheiyo Cement Corp 低熱膨張ミラーおよびその製造方法
DE102004002757A1 (de) * 2004-01-20 2005-08-11 U-L-M Photonics Gmbh Aluminiumhaltiger Verbundhalbleiter und Verfahren zur Herstellung eines aluminiumhaltigen Verbundhalbleiters
US7193228B2 (en) 2004-03-10 2007-03-20 Cymer, Inc. EUV light source optical elements
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JP4926523B2 (ja) * 2006-03-31 2012-05-09 Ｈｏｙａ株式会社 反射型マスクブランクス及び反射型マスク並びに半導体装置の製造方法
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Also Published As

Publication number Publication date
EP3030936A2 (de) 2016-06-15
US20160154317A1 (en) 2016-06-02
CN105518532A (zh) 2016-04-20
DE102013215541A1 (de) 2015-02-12
US10310382B2 (en) 2019-06-04
JP6560670B2 (ja) 2019-08-14
JP2016531319A (ja) 2016-10-06
EP3030936B1 (de) 2019-02-27
KR20160040560A (ko) 2016-04-14
KR102265041B1 (ko) 2021-06-16
WO2015018560A3 (de) 2015-04-09
WO2015018560A2 (de) 2015-02-12

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