CN105518532B - 尤其用于微光刻投影曝光设备的镜子 - Google Patents

尤其用于微光刻投影曝光设备的镜子 Download PDF

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Publication number
CN105518532B
CN105518532B CN201480049179.8A CN201480049179A CN105518532B CN 105518532 B CN105518532 B CN 105518532B CN 201480049179 A CN201480049179 A CN 201480049179A CN 105518532 B CN105518532 B CN 105518532B
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CN
China
Prior art keywords
mirror
layer
nitride
mirror substrate
group iii
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Active
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CN201480049179.8A
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English (en)
Chinese (zh)
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CN105518532A (zh
Inventor
M.赫尔曼
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Carl Zeiss SMT GmbH
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Carl Zeiss SMT GmbH
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Publication of CN105518532A publication Critical patent/CN105518532A/zh
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/702—Reflective illumination, i.e. reflective optical elements other than folding mirrors, e.g. extreme ultraviolet [EUV] illumination systems
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/08—Mirrors
    • G02B5/0816—Multilayer mirrors, i.e. having two or more reflecting layers
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/08—Mirrors
    • G02B5/0891—Ultraviolet [UV] mirrors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70316—Details of optical elements, e.g. of Bragg reflectors, extreme ultraviolet [EUV] multilayer or bilayer mirrors or diffractive optical elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7095—Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient
    • G03F7/70958—Optical materials or coatings, e.g. with particular transmittance, reflectance or anti-reflection properties
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—HANDLING OF PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
    • G21K1/06—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators
    • G21K1/062—Devices having a multilayer structure

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Optics & Photonics (AREA)
  • High Energy & Nuclear Physics (AREA)
  • General Engineering & Computer Science (AREA)
  • Health & Medical Sciences (AREA)
  • Public Health (AREA)
  • Epidemiology (AREA)
  • Environmental & Geological Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Lenses (AREA)
CN201480049179.8A 2013-08-07 2014-06-25 尤其用于微光刻投影曝光设备的镜子 Active CN105518532B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE102013215541.7 2013-08-07
DE102013215541.7A DE102013215541A1 (de) 2013-08-07 2013-08-07 Spiegel, insbesondere für eine mikrolithographische Projektionsbelichtungsanlage
PCT/EP2014/063349 WO2015018560A2 (de) 2013-08-07 2014-06-25 Spiegel, insbesondere für eine mikrolithographische projektionsbelichtungsanlage

Publications (2)

Publication Number Publication Date
CN105518532A CN105518532A (zh) 2016-04-20
CN105518532B true CN105518532B (zh) 2018-10-09

Family

ID=51178880

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201480049179.8A Active CN105518532B (zh) 2013-08-07 2014-06-25 尤其用于微光刻投影曝光设备的镜子

Country Status (7)

Country Link
US (1) US10310382B2 (https=)
EP (1) EP3030936B1 (https=)
JP (1) JP6560670B2 (https=)
KR (1) KR102265041B1 (https=)
CN (1) CN105518532B (https=)
DE (1) DE102013215541A1 (https=)
WO (1) WO2015018560A2 (https=)

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102015213253A1 (de) * 2015-07-15 2017-01-19 Carl Zeiss Smt Gmbh Spiegel, insbesondere für eine mikrolithographische Projektionsbelichtungsanlage
EP3429825B1 (en) * 2016-05-12 2021-03-03 Hewlett-Packard Development Company, L.P. Temperature correction via print agent application
DE102016213831A1 (de) * 2016-07-27 2018-02-01 Carl Zeiss Smt Gmbh Reflektives optisches Element für die EUV-Lithographie
DE102016224113A1 (de) * 2016-12-05 2018-06-07 Carl Zeiss Smt Gmbh Intensitätsanpassungsfilter für die euv - mikrolithographie und verfahren zur herstellung desselben sowie beleuchtungssystem mit einem entsprechenden filter
DE102018211499A1 (de) 2018-07-11 2020-01-16 Carl Zeiss Smt Gmbh Reflektives optisches Element und Verfahren zum Herstellen eines reflektiven optischen Elements

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US20080004332A1 (en) * 2002-03-07 2008-01-03 Alkon Daniel L Methods for alzheimer's disease treatment and cognitive enhancement
JP3919599B2 (ja) * 2002-05-17 2007-05-30 キヤノン株式会社 光学素子、当該光学素子を有する光源装置及び露光装置
JP2004177587A (ja) * 2002-11-26 2004-06-24 Taiheiyo Cement Corp 低熱膨張ミラーおよびその製造方法
DE102004002757A1 (de) * 2004-01-20 2005-08-11 U-L-M Photonics Gmbh Aluminiumhaltiger Verbundhalbleiter und Verfahren zur Herstellung eines aluminiumhaltigen Verbundhalbleiters
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JP4460325B2 (ja) * 2004-02-20 2010-05-12 太平洋セメント株式会社 天体望遠鏡用ミラー
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JP5269079B2 (ja) * 2007-08-20 2013-08-21 カール・ツァイス・エスエムティー・ゲーエムベーハー 反射コーティングを備えたミラー要素を有する投影対物系
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JP6093753B2 (ja) * 2011-03-23 2017-03-08 カール・ツァイス・エスエムティー・ゲーエムベーハー Ｅｕｖミラー機構、ｅｕｖミラー機構を備えた光学系、及びｅｕｖミラー機構を備えた光学系を操作する方法
JP2012222349A (ja) * 2011-04-05 2012-11-12 Asml Netherlands Bv 多層ミラーおよびリソグラフィ装置
US9488760B2 (en) * 2013-02-28 2016-11-08 Corning Incorporated Enhanced, durable silver coating stacks for highly reflective mirrors

Also Published As

Publication number Publication date
EP3030936B1 (de) 2019-02-27
JP2016531319A (ja) 2016-10-06
JP6560670B2 (ja) 2019-08-14
US10310382B2 (en) 2019-06-04
WO2015018560A3 (de) 2015-04-09
WO2015018560A2 (de) 2015-02-12
KR20160040560A (ko) 2016-04-14
CN105518532A (zh) 2016-04-20
KR102265041B1 (ko) 2021-06-16
DE102013215541A1 (de) 2015-02-12
US20160154317A1 (en) 2016-06-02
EP3030936A2 (de) 2016-06-15

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