CN105492473B - (甲基)丙烯酸系树脂 - Google Patents

(甲基)丙烯酸系树脂 Download PDF

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Publication number
CN105492473B
CN105492473B CN201480046869.8A CN201480046869A CN105492473B CN 105492473 B CN105492473 B CN 105492473B CN 201480046869 A CN201480046869 A CN 201480046869A CN 105492473 B CN105492473 B CN 105492473B
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Prior art keywords
methyl
acrylic resin
weight
optical film
formula
Prior art date
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CN201480046869.8A
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English (en)
Chinese (zh)
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CN105492473A (zh
Inventor
大西隆司
盐谷佳之
安村和成
中西秀高
今泉洋平
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Nippon Shokubai Co Ltd
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Nippon Shokubai Co Ltd
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Publication of CN105492473A publication Critical patent/CN105492473A/zh
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    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F8/00Chemical modification by after-treatment
    • C08F8/30Introducing nitrogen atoms or nitrogen-containing groups
    • C08F8/32Introducing nitrogen atoms or nitrogen-containing groups by reaction with amines
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F20/00Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
    • C08F20/02Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
    • C08F20/10Esters
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F20/00Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
    • C08F20/02Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
    • C08F20/52Amides or imides
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J5/00Manufacture of articles or shaped materials containing macromolecular substances
    • C08J5/18Manufacture of films or sheets
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/04Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of organic materials, e.g. plastics
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/12Optical coatings produced by application to, or surface treatment of, optical elements by surface treatment, e.g. by irradiation
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/14Protective coatings, e.g. hard coatings
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J2333/00Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Derivatives of such polymers
    • C08J2333/04Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Derivatives of such polymers esters
    • C08J2333/06Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Derivatives of such polymers esters of esters containing only carbon, hydrogen, and oxygen, the oxygen atom being present only as part of the carboxyl radical
    • C08J2333/10Homopolymers or copolymers of methacrylic acid esters
    • C08J2333/12Homopolymers or copolymers of methyl methacrylate

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  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Materials Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Polarising Elements (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Manufacture Of Macromolecular Shaped Articles (AREA)
  • Laminated Bodies (AREA)
CN201480046869.8A 2013-08-30 2014-08-28 (甲基)丙烯酸系树脂 Active CN105492473B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2013180617 2013-08-30
JP2013-180617 2013-08-30
PCT/JP2014/072587 WO2015030118A1 (ja) 2013-08-30 2014-08-28 (メタ)アクリル系樹脂

Publications (2)

Publication Number Publication Date
CN105492473A CN105492473A (zh) 2016-04-13
CN105492473B true CN105492473B (zh) 2017-11-28

Family

ID=52586666

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201480046869.8A Active CN105492473B (zh) 2013-08-30 2014-08-28 (甲基)丙烯酸系树脂

Country Status (4)

Country Link
JP (1) JP6253655B2 (ja)
KR (1) KR102179714B1 (ja)
CN (1) CN105492473B (ja)
WO (1) WO2015030118A1 (ja)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102638927B1 (ko) * 2016-12-28 2024-02-20 니폰 제온 가부시키가이샤 광학 필름 및 편광판
CN114986863A (zh) * 2017-03-15 2022-09-02 株式会社钟化 拉伸薄膜和拉伸薄膜的制造方法
JP7129181B2 (ja) * 2017-03-17 2022-09-01 旭化成株式会社 ヘッドマウントディスプレイ用部材
TWI821234B (zh) 2018-01-09 2023-11-11 美商康寧公司 具光改變特徵之塗覆製品及用於製造彼等之方法
JP7437900B2 (ja) * 2019-09-20 2024-02-26 株式会社日本触媒 アクリル系ポリマー及びその製造方法
US20220011477A1 (en) 2020-07-09 2022-01-13 Corning Incorporated Textured region to reduce specular reflectance including a low refractive index substrate with higher elevated surfaces and lower elevated surfaces and a high refractive index material disposed on the lower elevated surfaces
JPWO2022145174A1 (ja) * 2020-12-28 2022-07-07
CN112778986A (zh) * 2021-01-26 2021-05-11 西安通源正合石油工程有限公司 低渗透页岩稳固型钻井液及其制备方法
TWI806308B (zh) * 2021-07-14 2023-06-21 南韓商可隆股份有限公司 具有改良可見度之光學膜以及包括其之顯示元件

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4246374A (en) * 1979-04-23 1981-01-20 Rohm And Haas Company Imidized acrylic polymers
FR2508466B1 (fr) * 1981-06-25 1986-09-12 Du Pont Procede de preparation de polymeres acryliques imidises
JPS624704A (ja) * 1985-07-01 1987-01-10 Asahi Chem Ind Co Ltd 六員環イミド基含有重合体の製造方法
DE4142572A1 (de) * 1991-12-21 1993-06-24 Basf Ag N-aryl-substituierte poly(meth)acrylimide
JPH05222119A (ja) * 1992-02-14 1993-08-31 Mitsubishi Rayon Co Ltd メタクリルイミド基含有重合体
JPH06102547A (ja) 1992-09-18 1994-04-15 Hitachi Ltd 非線形光学材料及び素子
JPH0812722A (ja) * 1994-06-28 1996-01-16 Ube Ind Ltd 耐熱性樹脂の製造法
JPH09100321A (ja) * 1995-10-05 1997-04-15 Toray Ind Inc イミド化共重合体の製造方法
KR100536845B1 (ko) * 2003-03-17 2005-12-14 주식회사 엘지화학 초임계 상태의 유체를 이용한 폴리글루타르이미드의 제조방법
KR20080091405A (ko) 2003-12-02 2008-10-10 가부시키가이샤 가네카 이미드 수지, 및 그의 제조 방법 및 이용
WO2005108438A1 (ja) 2004-05-10 2005-11-17 Kaneka Corporation イミド樹脂とその製造方法、およびそれを用いた成形体
JP2006328329A (ja) * 2005-05-30 2006-12-07 Kaneka Corp 表面保護フィルム用基材、および表面保護フィルム
JP2009107180A (ja) 2007-10-29 2009-05-21 Kaneka Corp 光学フィルムの製造方法および光学フィルム
JP2009265174A (ja) 2008-04-22 2009-11-12 Nitto Denko Corp 光学フィルムの製造方法、光学フィルム、偏光板、液晶パネルおよび液晶表示装置
JP2011225699A (ja) * 2010-04-19 2011-11-10 Kaneka Corp 複素環系塩基触媒を用いた変性アクリル樹脂とその製造方法
WO2012114718A1 (ja) * 2011-02-21 2012-08-30 株式会社カネカ アクリル系樹脂フィルム

Also Published As

Publication number Publication date
WO2015030118A1 (ja) 2015-03-05
JPWO2015030118A1 (ja) 2017-03-02
JP6253655B2 (ja) 2017-12-27
CN105492473A (zh) 2016-04-13
KR102179714B1 (ko) 2021-03-25
KR20160049506A (ko) 2016-05-09

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