CN105242498A - 曝光设备和装置制造方法 - Google Patents

曝光设备和装置制造方法 Download PDF

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Publication number
CN105242498A
CN105242498A CN201510685960.0A CN201510685960A CN105242498A CN 105242498 A CN105242498 A CN 105242498A CN 201510685960 A CN201510685960 A CN 201510685960A CN 105242498 A CN105242498 A CN 105242498A
Authority
CN
China
Prior art keywords
exposure
vibration
controller
substrate
period
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN201510685960.0A
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English (en)
Chinese (zh)
Inventor
远藤正俊
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Publication of CN105242498A publication Critical patent/CN105242498A/zh
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P76/00—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography
    • H10P76/20—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography of masks comprising organic materials
    • H10P76/204—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography of masks comprising organic materials of organic photoresist masks
    • H10P76/2041—Photolithographic processes
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70775—Position control, e.g. interferometers or encoders for determining the stage position
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/709—Vibration, e.g. vibration detection, compensation, suppression or isolation

Landscapes

  • Health & Medical Sciences (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Toxicology (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
CN201510685960.0A 2012-06-12 2013-06-06 曝光设备和装置制造方法 Pending CN105242498A (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2012-133273 2012-06-12
JP2012133273A JP6066592B2 (ja) 2012-06-12 2012-06-12 露光装置及びデバイス製造方法
CN201310222560.7A CN103488053B (zh) 2012-06-12 2013-06-06 曝光设备和装置制造方法

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
CN201310222560.7A Division CN103488053B (zh) 2012-06-12 2013-06-06 曝光设备和装置制造方法

Publications (1)

Publication Number Publication Date
CN105242498A true CN105242498A (zh) 2016-01-13

Family

ID=49715063

Family Applications (2)

Application Number Title Priority Date Filing Date
CN201510685960.0A Pending CN105242498A (zh) 2012-06-12 2013-06-06 曝光设备和装置制造方法
CN201310222560.7A Active CN103488053B (zh) 2012-06-12 2013-06-06 曝光设备和装置制造方法

Family Applications After (1)

Application Number Title Priority Date Filing Date
CN201310222560.7A Active CN103488053B (zh) 2012-06-12 2013-06-06 曝光设备和装置制造方法

Country Status (4)

Country Link
US (1) US9946169B2 (https=)
JP (1) JP6066592B2 (https=)
KR (2) KR101697231B1 (https=)
CN (2) CN105242498A (https=)

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003258559A (ja) * 2002-03-04 2003-09-12 Matsushita Electric Ind Co Ltd ポップノイズ防止用ミュート回路およびスピーカー駆動回路
JP6438219B2 (ja) 2014-06-17 2018-12-12 キヤノン株式会社 ステージ装置、リソグラフィ装置、物品の製造方法、および決定方法
CN117837838A (zh) 2016-07-28 2024-04-09 莱施菲公司 人造睫毛嫁接物
US9835959B1 (en) * 2016-10-17 2017-12-05 Cymer, Llc Controlling for wafer stage vibration
KR102709427B1 (ko) 2016-12-20 2024-09-25 래쉬파이 인코포레이티드 인공 속눈썹 연장부에 사용하는 어플리케이터 및 케이스
JP7005183B2 (ja) * 2017-06-19 2022-01-21 キヤノン株式会社 露光方法、露光装置および、物品製造方法
KR102761588B1 (ko) 2018-10-19 2025-02-03 래쉬파이 인코포레이티드 속눈썹 연장물 보관 케이스 및 그의 사용 및 제조 방법
JP1687380S (https=) 2018-10-19 2021-06-07
USD863679S1 (en) 2018-10-19 2019-10-15 Lashify, Inc. False eyelash applicator
USD995914S1 (en) 2022-07-20 2023-08-15 Lashify, Inc. Combined tweezer and applicator for artificial lash extensions
USD984050S1 (en) 2022-07-20 2023-04-18 Lashify, Inc. Combined curler and applicator for natural lashes and artificial lash extensions
USD980521S1 (en) 2022-07-20 2023-03-07 Lashify, Inc. Artificial lash extension separating comb
USD1072354S1 (en) 2024-01-08 2025-04-22 Lashify, Inc. Rounded tweezer and applicator for artificial lash extensions

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH10199795A (ja) * 1997-01-14 1998-07-31 Nikon Corp 走査露光方法及び装置
JP2002110526A (ja) * 2000-10-03 2002-04-12 Canon Inc 走査露光方法及び走査露光装置
US20060061742A1 (en) * 2004-09-21 2006-03-23 Jang-Sun Kim Exposure equipment with optical system positioning mechanism and related exposure method

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5760878A (en) 1995-08-30 1998-06-02 Canon Kabushiki Kaisha Exposure apparatus and alignment discrimination method
JP3564833B2 (ja) * 1995-11-10 2004-09-15 株式会社ニコン 露光方法
JPH09219361A (ja) * 1996-02-09 1997-08-19 Nikon Corp 露光装置
JPH1187233A (ja) * 1997-09-08 1999-03-30 Canon Inc 投影露光装置
JP4194160B2 (ja) 1998-02-19 2008-12-10 キヤノン株式会社 投影露光装置
JP4272750B2 (ja) 1998-06-23 2009-06-03 キヤノン株式会社 露光装置及び除振装置、システム同定装置及びその方法
JP2001291662A (ja) * 2000-02-04 2001-10-19 Nikon Corp 露光方法及び露光装置、並びにデバイス製造方法
US7417714B2 (en) 2004-11-02 2008-08-26 Nikon Corporation Stage assembly with measurement system initialization, vibration compensation, low transmissibility, and lightweight fine stage
KR20130014602A (ko) 2005-06-02 2013-02-07 칼 짜이스 에스엠테 게엠베하 광학 결상 장치
US7804579B2 (en) 2007-06-21 2010-09-28 Asml Netherlands B.V. Control system, lithographic projection apparatus, method of controlling a support structure, and a computer program product

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH10199795A (ja) * 1997-01-14 1998-07-31 Nikon Corp 走査露光方法及び装置
JP2002110526A (ja) * 2000-10-03 2002-04-12 Canon Inc 走査露光方法及び走査露光装置
US20060061742A1 (en) * 2004-09-21 2006-03-23 Jang-Sun Kim Exposure equipment with optical system positioning mechanism and related exposure method

Also Published As

Publication number Publication date
US20130329207A1 (en) 2013-12-12
KR101697231B1 (ko) 2017-01-17
CN103488053B (zh) 2015-11-18
US9946169B2 (en) 2018-04-17
CN103488053A (zh) 2014-01-01
JP2013258283A (ja) 2013-12-26
KR20170010027A (ko) 2017-01-25
JP6066592B2 (ja) 2017-01-25
KR101839358B1 (ko) 2018-03-16
KR20130139177A (ko) 2013-12-20

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Effective date of abandoning: 20181102