CN105209659A - 在氧环境中通过使用铝源在基材上生长氧化铝以产生透明的抗刮窗的方法 - Google Patents
在氧环境中通过使用铝源在基材上生长氧化铝以产生透明的抗刮窗的方法 Download PDFInfo
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- CN105209659A CN105209659A CN201480014889.7A CN201480014889A CN105209659A CN 105209659 A CN105209659 A CN 105209659A CN 201480014889 A CN201480014889 A CN 201480014889A CN 105209659 A CN105209659 A CN 105209659A
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- Prior art keywords
- transparent
- base material
- shatter
- resistant
- scratch
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000000034 method Methods 0.000 title claims abstract description 83
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 title claims abstract description 37
- 239000000758 substrate Substances 0.000 title claims abstract description 36
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 title claims abstract description 35
- 229910052760 oxygen Inorganic materials 0.000 title claims abstract description 34
- 239000001301 oxygen Substances 0.000 title claims abstract description 34
- 230000003678 scratch resistant effect Effects 0.000 title claims abstract description 5
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 title claims description 79
- 229910052782 aluminium Inorganic materials 0.000 title claims description 79
- 239000011521 glass Substances 0.000 claims abstract description 31
- 239000011159 matrix material Substances 0.000 claims abstract description 27
- 239000000463 material Substances 0.000 claims description 118
- 239000004411 aluminium Substances 0.000 claims description 36
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 claims description 36
- 230000008021 deposition Effects 0.000 claims description 27
- 229920003023 plastic Polymers 0.000 claims description 12
- 229910052594 sapphire Inorganic materials 0.000 claims description 11
- 239000010980 sapphire Substances 0.000 claims description 11
- 239000005388 borosilicate glass Substances 0.000 claims description 10
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 claims description 9
- 238000005336 cracking Methods 0.000 claims description 9
- SIWVEOZUMHYXCS-UHFFFAOYSA-N oxo(oxoyttriooxy)yttrium Chemical compound O=[Y]O[Y]=O SIWVEOZUMHYXCS-UHFFFAOYSA-N 0.000 claims description 9
- 208000034189 Sclerosis Diseases 0.000 claims description 8
- 239000005368 silicate glass Substances 0.000 claims description 8
- 230000006872 improvement Effects 0.000 claims description 6
- 230000007246 mechanism Effects 0.000 claims description 6
- 238000010438 heat treatment Methods 0.000 claims description 5
- 239000010453 quartz Substances 0.000 claims description 5
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 5
- 238000013517 stratification Methods 0.000 claims description 4
- 238000006243 chemical reaction Methods 0.000 claims description 2
- 230000002708 enhancing effect Effects 0.000 claims description 2
- 230000008520 organization Effects 0.000 claims 1
- 230000008569 process Effects 0.000 abstract description 32
- 238000002207 thermal evaporation Methods 0.000 abstract description 16
- 230000008901 benefit Effects 0.000 abstract description 8
- 239000011248 coating agent Substances 0.000 abstract description 8
- 238000000576 coating method Methods 0.000 abstract description 8
- 230000005684 electric field Effects 0.000 abstract description 5
- 238000005546 reactive sputtering Methods 0.000 abstract description 5
- -1 cell phones Substances 0.000 abstract 1
- 239000013078 crystal Substances 0.000 abstract 1
- 238000000151 deposition Methods 0.000 description 21
- 239000007789 gas Substances 0.000 description 14
- 238000005516 engineering process Methods 0.000 description 8
- 239000010410 layer Substances 0.000 description 6
- 238000010586 diagram Methods 0.000 description 5
- 230000014759 maintenance of location Effects 0.000 description 5
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 4
- 230000001276 controlling effect Effects 0.000 description 4
- 238000001816 cooling Methods 0.000 description 4
- 238000007254 oxidation reaction Methods 0.000 description 4
- 238000004422 calculation algorithm Methods 0.000 description 3
- 230000008859 change Effects 0.000 description 3
- 230000004907 flux Effects 0.000 description 3
- 230000033001 locomotion Effects 0.000 description 3
- 230000003647 oxidation Effects 0.000 description 3
- 239000005354 aluminosilicate glass Substances 0.000 description 2
- 229910052786 argon Inorganic materials 0.000 description 2
- 238000013461 design Methods 0.000 description 2
- 230000002349 favourable effect Effects 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 239000005361 soda-lime glass Substances 0.000 description 2
- 238000003860 storage Methods 0.000 description 2
- 238000005728 strengthening Methods 0.000 description 2
- 238000012360 testing method Methods 0.000 description 2
- 230000001133 acceleration Effects 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 239000011247 coating layer Substances 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 230000006353 environmental stress Effects 0.000 description 1
- 238000000227 grinding Methods 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 230000003993 interaction Effects 0.000 description 1
- 230000001788 irregular Effects 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 230000024241 parasitism Effects 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 230000002028 premature Effects 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 230000001105 regulatory effect Effects 0.000 description 1
- 238000004062 sedimentation Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 239000004575 stone Substances 0.000 description 1
- 230000035882 stress Effects 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/0021—Reactive sputtering or evaporation
- C23C14/0036—Reactive sputtering
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/08—Oxides
- C23C14/081—Oxides of aluminium, magnesium or beryllium
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
- C03C17/23—Oxides
- C03C17/245—Oxides by deposition from the vapour phase
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/0021—Reactive sputtering or evaporation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3457—Sputtering using other particles than noble gas ions
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3485—Sputtering using pulsed power to the target
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/40—Oxides
- C23C16/403—Oxides of aluminium, magnesium or beryllium
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/20—Materials for coating a single layer on glass
- C03C2217/21—Oxides
- C03C2217/214—Al2O3
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/10—Deposition methods
- C03C2218/15—Deposition methods from the vapour phase
- C03C2218/154—Deposition methods from the vapour phase by sputtering
- C03C2218/155—Deposition methods from the vapour phase by sputtering by reactive sputtering
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
- Y10T428/24942—Structurally defined web or sheet [e.g., overall dimension, etc.] including components having same physical characteristic in differing degree
- Y10T428/2495—Thickness [relative or absolute]
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/26—Web or sheet containing structurally defined element or component, the element or component having a specified physical dimension
- Y10T428/263—Coating layer not in excess of 5 mils thick or equivalent
- Y10T428/264—Up to 3 mils
- Y10T428/265—1 mil or less
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- General Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Inorganic Chemistry (AREA)
- Surface Treatment Of Glass (AREA)
- Physical Vapour Deposition (AREA)
Applications Claiming Priority (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201361790786P | 2013-03-15 | 2013-03-15 | |
| US61/790786 | 2013-03-15 | ||
| US14/101,980 US20140272346A1 (en) | 2013-03-15 | 2013-12-10 | Method of growing aluminum oxide onto substrates by use of an aluminum source in an oxygen environment to create transparent, scratch resistant windows |
| US14/101980 | 2013-12-10 | ||
| PCT/US2014/013918 WO2014149194A1 (en) | 2013-03-15 | 2014-01-30 | Method of growing aluminum oxide onto substrates by use of an aluminum source in an oxygen environment to create transparent, scratch resistant windows |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN105209659A true CN105209659A (zh) | 2015-12-30 |
Family
ID=51528352
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201480014889.7A Pending CN105209659A (zh) | 2013-03-15 | 2014-01-30 | 在氧环境中通过使用铝源在基材上生长氧化铝以产生透明的抗刮窗的方法 |
| CN201480015214.4A Pending CN105247096A (zh) | 2013-03-15 | 2014-01-30 | 通过在含氧分压的环境中使用铝源在基材上生长氧化铝以产生透明的抗刮窗的方法 |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201480015214.4A Pending CN105247096A (zh) | 2013-03-15 | 2014-01-30 | 通过在含氧分压的环境中使用铝源在基材上生长氧化铝以产生透明的抗刮窗的方法 |
Country Status (7)
| Country | Link |
|---|---|
| US (4) | US20140272346A1 (enExample) |
| JP (2) | JP2016516133A (enExample) |
| KR (2) | KR20150129703A (enExample) |
| CN (2) | CN105209659A (enExample) |
| DE (2) | DE112014001447T5 (enExample) |
| TW (2) | TW201437403A (enExample) |
| WO (2) | WO2014149193A2 (enExample) |
Families Citing this family (28)
| Publication number | Priority date | Publication date | Assignee | Title |
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| US8053191B2 (en) | 2006-08-31 | 2011-11-08 | Westend Asset Clearinghouse Company, Llc | Iterative nucleic acid assembly using activation of vector-encoded traits |
| US9217144B2 (en) | 2010-01-07 | 2015-12-22 | Gen9, Inc. | Assembly of high fidelity polynucleotides |
| EP2637780B1 (en) | 2010-11-12 | 2022-02-09 | Gen9, Inc. | Protein arrays and methods of using and making the same |
| WO2012078312A2 (en) | 2010-11-12 | 2012-06-14 | Gen9, Inc. | Methods and devices for nucleic acids synthesis |
| IL302248A (en) | 2011-08-26 | 2023-06-01 | Gen9 Inc | Compositions and methods for high fidelity assembly of nucleic acids |
| US9150853B2 (en) | 2012-03-21 | 2015-10-06 | Gen9, Inc. | Methods for screening proteins using DNA encoded chemical libraries as templates for enzyme catalysis |
| AU2013251701A1 (en) | 2012-04-24 | 2014-10-30 | Gen9, Inc. | Methods for sorting nucleic acids and multiplexed preparative in vitro cloning |
| EP2864531B2 (en) | 2012-06-25 | 2022-08-03 | Gen9, Inc. | Methods for nucleic acid assembly and high throughput sequencing |
| US11097974B2 (en) | 2014-07-31 | 2021-08-24 | Corning Incorporated | Thermally strengthened consumer electronic glass and related systems and methods |
| US9359686B1 (en) | 2015-01-09 | 2016-06-07 | Apple Inc. | Processes to reduce interfacial enrichment of alloying elements under anodic oxide films and improve anodized appearance of heat treatable alloys |
| CN107108841A (zh) * | 2015-01-14 | 2017-08-29 | 科思创德国股份有限公司 | 用于聚氨酯基透明成型体的组合物 |
| CN105039917B (zh) * | 2015-06-05 | 2018-12-25 | 河源市璐悦自动化设备有限公司 | 一种具有蓝宝石表层的玻璃镜片及其制备方法 |
| US20170009334A1 (en) * | 2015-07-09 | 2017-01-12 | Rubicon Technology, Inc. | Hard aluminum oxide coating for various applications |
| US12338159B2 (en) | 2015-07-30 | 2025-06-24 | Corning Incorporated | Thermally strengthened consumer electronic glass and related systems and methods |
| US9970080B2 (en) | 2015-09-24 | 2018-05-15 | Apple Inc. | Micro-alloying to mitigate the slight discoloration resulting from entrained metal in anodized aluminum surface finishes |
| KR102492060B1 (ko) | 2016-01-12 | 2023-01-26 | 코닝 인코포레이티드 | 얇은, 열적 및 화학적으로 강화된 유리-계 제품 |
| US10174436B2 (en) | 2016-04-06 | 2019-01-08 | Apple Inc. | Process for enhanced corrosion protection of anodized aluminum |
| CN107263939A (zh) * | 2016-04-08 | 2017-10-20 | 优尔材料工业（深圳）有限公司 | 复合体及其制备方法 |
| US11352708B2 (en) | 2016-08-10 | 2022-06-07 | Apple Inc. | Colored multilayer oxide coatings |
| US11242614B2 (en) | 2017-02-17 | 2022-02-08 | Apple Inc. | Oxide coatings for providing corrosion resistance on parts with edges and convex features |
| TWI785156B (zh) | 2017-11-30 | 2022-12-01 | 美商康寧公司 | 具有高熱膨脹係數及對於熱回火之優先破裂行為的非離子交換玻璃 |
| US11549191B2 (en) | 2018-09-10 | 2023-01-10 | Apple Inc. | Corrosion resistance for anodized parts having convex surface features |
| CN109763116B (zh) * | 2019-01-30 | 2020-11-06 | 西北工业大学 | 用于cvd设备的双轴正交旋转系统及方法 |
| WO2020219290A1 (en) | 2019-04-23 | 2020-10-29 | Corning Incorporated | Glass laminates having determined stress profiles and methods of making the same |
| CN116811379A (zh) | 2019-08-06 | 2023-09-29 | 康宁股份有限公司 | 具有用于阻止裂纹的埋入式应力尖峰的玻璃层压体及其制造方法 |
| KR102751151B1 (ko) | 2019-12-20 | 2025-01-07 | 삼성디스플레이 주식회사 | 유리 제품 및 이를 포함하는 디스플레이 장치 |
| KR102244873B1 (ko) * | 2019-12-31 | 2021-04-27 | 주식회사 이노션테크 | 디스플레이 기판용 기능성 코팅막 및 그 제조방법 |
| KR102562270B1 (ko) | 2021-12-09 | 2023-08-01 | 삼성디스플레이 주식회사 | 유리 강도 평가 장치 및 평가 방법 |
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| CN102471867A (zh) * | 2009-07-23 | 2012-05-23 | Msg里松格莱斯股份公司 | 在基体、涂层基体和包含涂层基体的半成品上产生结构化涂层的方法 |
| WO2012146312A1 (en) * | 2011-04-29 | 2012-11-01 | Applied Materials, Inc. | Gas system for reactive deposition process |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| JPS63501223A (ja) * | 1985-10-31 | 1988-05-12 | エヌ・シ−・ア−ル・コ−ポレ−シヨン | 透明基板上に耐摩傷コ−テイングを形成する方法 |
| US5350607A (en) * | 1992-10-02 | 1994-09-27 | United Technologies Corporation | Ionized cluster beam deposition of sapphire |
| JP3478561B2 (ja) * | 1993-05-26 | 2003-12-15 | キヤノン株式会社 | スパッタ成膜方法 |
| DE69422666T2 (de) * | 1993-07-02 | 2000-07-27 | Sumitomo Electric Industries, Ltd. | Verfahren zur Herstellung eines hochkristallinen, dünnen SrTiO3 Oxidfilms |
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2014
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- 2014-01-30 JP JP2016500192A patent/JP2016516133A/ja active Pending
- 2014-01-30 DE DE112014001447.8T patent/DE112014001447T5/de not_active Withdrawn
- 2014-01-30 JP JP2016500191A patent/JP2016513753A/ja active Pending
- 2014-01-30 DE DE112014001454.0T patent/DE112014001454T5/de not_active Withdrawn
- 2014-01-30 CN CN201480014889.7A patent/CN105209659A/zh active Pending
- 2014-01-30 CN CN201480015214.4A patent/CN105247096A/zh active Pending
- 2014-01-30 WO PCT/US2014/013916 patent/WO2014149193A2/en not_active Ceased
- 2014-01-30 KR KR1020157024881A patent/KR20150129732A/ko not_active Withdrawn
- 2014-01-30 WO PCT/US2014/013918 patent/WO2014149194A1/en not_active Ceased
- 2014-02-17 TW TW103105074A patent/TW201437403A/zh unknown
- 2014-02-17 TW TW103105075A patent/TW201500573A/zh unknown
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2016
- 2016-03-30 US US15/085,075 patent/US20160215381A1/en not_active Abandoned
- 2016-06-28 US US15/195,630 patent/US20160369387A1/en not_active Abandoned
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Also Published As
| Publication number | Publication date |
|---|---|
| TW201437403A (zh) | 2014-10-01 |
| WO2014149193A3 (en) | 2015-01-15 |
| JP2016516133A (ja) | 2016-06-02 |
| US20140272345A1 (en) | 2014-09-18 |
| WO2014149193A2 (en) | 2014-09-25 |
| US20140272346A1 (en) | 2014-09-18 |
| WO2014149194A1 (en) | 2014-09-25 |
| US20160215381A1 (en) | 2016-07-28 |
| DE112014001454T5 (de) | 2015-12-03 |
| JP2016513753A (ja) | 2016-05-16 |
| KR20150129732A (ko) | 2015-11-20 |
| US20160369387A1 (en) | 2016-12-22 |
| TW201500573A (zh) | 2015-01-01 |
| CN105247096A (zh) | 2016-01-13 |
| KR20150129703A (ko) | 2015-11-20 |
| DE112014001447T5 (de) | 2016-01-14 |
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