TW201437403A - 於含有氧氣分壓環境下使用鋁源於基材上成長氧化鋁以產生透明、耐刮性視窗之方法 - Google Patents
於含有氧氣分壓環境下使用鋁源於基材上成長氧化鋁以產生透明、耐刮性視窗之方法 Download PDFInfo
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- TW201437403A TW201437403A TW103105074A TW103105074A TW201437403A TW 201437403 A TW201437403 A TW 201437403A TW 103105074 A TW103105074 A TW 103105074A TW 103105074 A TW103105074 A TW 103105074A TW 201437403 A TW201437403 A TW 201437403A
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- Prior art keywords
- substrate
- transparent
- translucent
- alumina
- aluminum
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- 239000000758 substrate Substances 0.000 title claims abstract description 119
- 238000000034 method Methods 0.000 title claims abstract description 48
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 title claims abstract description 21
- 230000003678 scratch resistant effect Effects 0.000 title claims abstract description 12
- 229910052782 aluminium Inorganic materials 0.000 title claims description 24
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 title claims description 22
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 title claims description 16
- 239000001301 oxygen Substances 0.000 title claims description 15
- 229910052760 oxygen Inorganic materials 0.000 title claims description 15
- 239000011521 glass Substances 0.000 claims abstract description 38
- 229910052594 sapphire Inorganic materials 0.000 claims abstract description 14
- 239000010980 sapphire Substances 0.000 claims abstract description 14
- 239000011159 matrix material Substances 0.000 claims abstract description 10
- 238000004544 sputter deposition Methods 0.000 claims abstract description 10
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 claims description 48
- 238000000151 deposition Methods 0.000 claims description 23
- 230000008021 deposition Effects 0.000 claims description 22
- AZDRQVAHHNSJOQ-UHFFFAOYSA-N alumane Chemical group [AlH3] AZDRQVAHHNSJOQ-UHFFFAOYSA-N 0.000 claims description 18
- 230000000087 stabilizing effect Effects 0.000 claims description 11
- 229910001233 yttria-stabilized zirconia Inorganic materials 0.000 claims description 10
- 238000005342 ion exchange Methods 0.000 claims description 9
- 239000012634 fragment Substances 0.000 claims description 7
- 238000010438 heat treatment Methods 0.000 claims description 6
- 229920003023 plastic Polymers 0.000 claims description 6
- KODMFZHGYSZSHL-UHFFFAOYSA-N aluminum bismuth Chemical compound [Al].[Bi] KODMFZHGYSZSHL-UHFFFAOYSA-N 0.000 claims description 5
- 239000005388 borosilicate glass Substances 0.000 claims description 5
- 238000013467 fragmentation Methods 0.000 claims description 5
- 238000006062 fragmentation reaction Methods 0.000 claims description 5
- 239000010453 quartz Substances 0.000 claims description 5
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 5
- 230000032798 delamination Effects 0.000 claims description 4
- 238000006748 scratching Methods 0.000 claims description 4
- 230000002393 scratching effect Effects 0.000 claims description 4
- BEJRNLMOMBGWFU-UHFFFAOYSA-N bismuth boron Chemical compound [B].[Bi] BEJRNLMOMBGWFU-UHFFFAOYSA-N 0.000 claims 2
- 230000003763 resistance to breakage Effects 0.000 claims 1
- 230000008569 process Effects 0.000 abstract description 12
- 239000011248 coating agent Substances 0.000 abstract description 9
- 238000000576 coating method Methods 0.000 abstract description 9
- -1 cell phones Substances 0.000 abstract description 4
- 239000013078 crystal Substances 0.000 abstract 1
- 239000000463 material Substances 0.000 description 18
- 239000010408 film Substances 0.000 description 15
- 239000007789 gas Substances 0.000 description 11
- 230000007246 mechanism Effects 0.000 description 11
- 239000010410 layer Substances 0.000 description 9
- 238000010586 diagram Methods 0.000 description 8
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 6
- 238000012545 processing Methods 0.000 description 5
- 230000008901 benefit Effects 0.000 description 4
- 238000004422 calculation algorithm Methods 0.000 description 3
- 238000005336 cracking Methods 0.000 description 3
- 238000001514 detection method Methods 0.000 description 3
- 238000005546 reactive sputtering Methods 0.000 description 3
- 230000006641 stabilisation Effects 0.000 description 3
- 238000011105 stabilization Methods 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- 230000007547 defect Effects 0.000 description 2
- 230000001788 irregular Effects 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 1
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 229910052796 boron Inorganic materials 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 239000011247 coating layer Substances 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 229910001882 dioxygen Inorganic materials 0.000 description 1
- 230000008030 elimination Effects 0.000 description 1
- 238000003379 elimination reaction Methods 0.000 description 1
- 230000004907 flux Effects 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 239000000543 intermediate Substances 0.000 description 1
- 238000003475 lamination Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 238000004886 process control Methods 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 238000005478 sputtering type Methods 0.000 description 1
- 230000008685 targeting Effects 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/0021—Reactive sputtering or evaporation
- C23C14/0036—Reactive sputtering
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/08—Oxides
- C23C14/081—Oxides of aluminium, magnesium or beryllium
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
- C03C17/23—Oxides
- C03C17/245—Oxides by deposition from the vapour phase
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/0021—Reactive sputtering or evaporation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3457—Sputtering using other particles than noble gas ions
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3485—Sputtering using pulsed power to the target
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/40—Oxides
- C23C16/403—Oxides of aluminium, magnesium or beryllium
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/20—Materials for coating a single layer on glass
- C03C2217/21—Oxides
- C03C2217/214—Al2O3
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/10—Deposition methods
- C03C2218/15—Deposition methods from the vapour phase
- C03C2218/154—Deposition methods from the vapour phase by sputtering
- C03C2218/155—Deposition methods from the vapour phase by sputtering by reactive sputtering
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
- Y10T428/24942—Structurally defined web or sheet [e.g., overall dimension, etc.] including components having same physical characteristic in differing degree
- Y10T428/2495—Thickness [relative or absolute]
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/26—Web or sheet containing structurally defined element or component, the element or component having a specified physical dimension
- Y10T428/263—Coating layer not in excess of 5 mils thick or equivalent
- Y10T428/264—Up to 3 mils
- Y10T428/265—1 mil or less
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- General Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Inorganic Chemistry (AREA)
- Surface Treatment Of Glass (AREA)
- Physical Vapour Deposition (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201361790786P | 2013-03-15 | 2013-03-15 | |
| US14/101,957 US20140272345A1 (en) | 2013-03-15 | 2013-12-10 | Method of growing aluminum oxide onto substrates by use of an aluminum source in an environment containing partial pressure of oxygen to create transparent, scratch-resistant windows |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| TW201437403A true TW201437403A (zh) | 2014-10-01 |
Family
ID=51528352
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW103105074A TW201437403A (zh) | 2013-03-15 | 2014-02-17 | 於含有氧氣分壓環境下使用鋁源於基材上成長氧化鋁以產生透明、耐刮性視窗之方法 |
| TW103105075A TW201500573A (zh) | 2013-03-15 | 2014-02-17 | 於氧氣環境下使用鋁源於基材上成長氧化鋁以產生透明、耐刮性視窗之方法 |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW103105075A TW201500573A (zh) | 2013-03-15 | 2014-02-17 | 於氧氣環境下使用鋁源於基材上成長氧化鋁以產生透明、耐刮性視窗之方法 |
Country Status (7)
| Country | Link |
|---|---|
| US (4) | US20140272345A1 (enExample) |
| JP (2) | JP2016513753A (enExample) |
| KR (2) | KR20150129703A (enExample) |
| CN (2) | CN105247096A (enExample) |
| DE (2) | DE112014001454T5 (enExample) |
| TW (2) | TW201437403A (enExample) |
| WO (2) | WO2014149193A2 (enExample) |
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| US9217144B2 (en) | 2010-01-07 | 2015-12-22 | Gen9, Inc. | Assembly of high fidelity polynucleotides |
| EP2637780B1 (en) | 2010-11-12 | 2022-02-09 | Gen9, Inc. | Protein arrays and methods of using and making the same |
| AU2011338841B2 (en) | 2010-11-12 | 2017-02-16 | Gen9, Inc. | Methods and devices for nucleic acids synthesis |
| AU2012300401B2 (en) | 2011-08-26 | 2018-02-08 | Ginkgo Bioworks, Inc. | Compositions and methods for high fidelity assembly of nucleic acids |
| US9150853B2 (en) | 2012-03-21 | 2015-10-06 | Gen9, Inc. | Methods for screening proteins using DNA encoded chemical libraries as templates for enzyme catalysis |
| EP2841601B1 (en) | 2012-04-24 | 2019-03-06 | Gen9, Inc. | Methods for sorting nucleic acids and multiplexed preparative in vitro cloning |
| US20150191719A1 (en) | 2012-06-25 | 2015-07-09 | Gen9, Inc. | Methods for Nucleic Acid Assembly and High Throughput Sequencing |
| US11097974B2 (en) | 2014-07-31 | 2021-08-24 | Corning Incorporated | Thermally strengthened consumer electronic glass and related systems and methods |
| US9359686B1 (en) | 2015-01-09 | 2016-06-07 | Apple Inc. | Processes to reduce interfacial enrichment of alloying elements under anodic oxide films and improve anodized appearance of heat treatable alloys |
| US20180009931A1 (en) * | 2015-01-14 | 2018-01-11 | Covestro Deutschland Ag | Composition for transparent shaped bodies based on polyurethane |
| CN105039917B (zh) * | 2015-06-05 | 2018-12-25 | 河源市璐悦自动化设备有限公司 | 一种具有蓝宝石表层的玻璃镜片及其制备方法 |
| US20170009334A1 (en) * | 2015-07-09 | 2017-01-12 | Rubicon Technology, Inc. | Hard aluminum oxide coating for various applications |
| US12338159B2 (en) | 2015-07-30 | 2025-06-24 | Corning Incorporated | Thermally strengthened consumer electronic glass and related systems and methods |
| US9970080B2 (en) | 2015-09-24 | 2018-05-15 | Apple Inc. | Micro-alloying to mitigate the slight discoloration resulting from entrained metal in anodized aluminum surface finishes |
| JP6923555B2 (ja) | 2016-01-12 | 2021-08-18 | コーニング インコーポレイテッド | 薄厚熱強化及び化学強化ガラス系物品 |
| US10174436B2 (en) | 2016-04-06 | 2019-01-08 | Apple Inc. | Process for enhanced corrosion protection of anodized aluminum |
| CN107263939A (zh) * | 2016-04-08 | 2017-10-20 | 优尔材料工业（深圳）有限公司 | 复合体及其制备方法 |
| US11352708B2 (en) | 2016-08-10 | 2022-06-07 | Apple Inc. | Colored multilayer oxide coatings |
| US11242614B2 (en) | 2017-02-17 | 2022-02-08 | Apple Inc. | Oxide coatings for providing corrosion resistance on parts with edges and convex features |
| TWI785156B (zh) | 2017-11-30 | 2022-12-01 | 美商康寧公司 | 具有高熱膨脹係數及對於熱回火之優先破裂行為的非離子交換玻璃 |
| US11549191B2 (en) | 2018-09-10 | 2023-01-10 | Apple Inc. | Corrosion resistance for anodized parts having convex surface features |
| CN109763116B (zh) * | 2019-01-30 | 2020-11-06 | 西北工业大学 | 用于cvd设备的双轴正交旋转系统及方法 |
| KR20210154825A (ko) | 2019-04-23 | 2021-12-21 | 코닝 인코포레이티드 | 확정 응력 프로파일을 갖는 유리 라미네이트 및 그 제조방법 |
| US11697617B2 (en) | 2019-08-06 | 2023-07-11 | Corning Incorporated | Glass laminate with buried stress spikes to arrest cracks and methods of making the same |
| KR102751151B1 (ko) | 2019-12-20 | 2025-01-07 | 삼성디스플레이 주식회사 | 유리 제품 및 이를 포함하는 디스플레이 장치 |
| KR102244873B1 (ko) * | 2019-12-31 | 2021-04-27 | 주식회사 이노션테크 | 디스플레이 기판용 기능성 코팅막 및 그 제조방법 |
| KR102562270B1 (ko) | 2021-12-09 | 2023-08-01 | 삼성디스플레이 주식회사 | 유리 강도 평가 장치 및 평가 방법 |
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-
2013
- 2013-12-10 US US14/101,957 patent/US20140272345A1/en not_active Abandoned
- 2013-12-10 US US14/101,980 patent/US20140272346A1/en not_active Abandoned
-
2014
- 2014-01-30 DE DE112014001454.0T patent/DE112014001454T5/de not_active Withdrawn
- 2014-01-30 JP JP2016500191A patent/JP2016513753A/ja active Pending
- 2014-01-30 CN CN201480015214.4A patent/CN105247096A/zh active Pending
- 2014-01-30 CN CN201480014889.7A patent/CN105209659A/zh active Pending
- 2014-01-30 WO PCT/US2014/013916 patent/WO2014149193A2/en not_active Ceased
- 2014-01-30 JP JP2016500192A patent/JP2016516133A/ja active Pending
- 2014-01-30 KR KR1020157024100A patent/KR20150129703A/ko not_active Withdrawn
- 2014-01-30 KR KR1020157024881A patent/KR20150129732A/ko not_active Withdrawn
- 2014-01-30 DE DE112014001447.8T patent/DE112014001447T5/de not_active Withdrawn
- 2014-01-30 WO PCT/US2014/013918 patent/WO2014149194A1/en not_active Ceased
- 2014-02-17 TW TW103105074A patent/TW201437403A/zh unknown
- 2014-02-17 TW TW103105075A patent/TW201500573A/zh unknown
-
2016
- 2016-03-30 US US15/085,075 patent/US20160215381A1/en not_active Abandoned
- 2016-06-28 US US15/195,630 patent/US20160369387A1/en not_active Abandoned
Also Published As
| Publication number | Publication date |
|---|---|
| JP2016513753A (ja) | 2016-05-16 |
| KR20150129703A (ko) | 2015-11-20 |
| DE112014001447T5 (de) | 2016-01-14 |
| DE112014001454T5 (de) | 2015-12-03 |
| US20140272346A1 (en) | 2014-09-18 |
| WO2014149194A1 (en) | 2014-09-25 |
| TW201500573A (zh) | 2015-01-01 |
| US20160215381A1 (en) | 2016-07-28 |
| CN105209659A (zh) | 2015-12-30 |
| JP2016516133A (ja) | 2016-06-02 |
| CN105247096A (zh) | 2016-01-13 |
| WO2014149193A2 (en) | 2014-09-25 |
| WO2014149193A3 (en) | 2015-01-15 |
| KR20150129732A (ko) | 2015-11-20 |
| US20160369387A1 (en) | 2016-12-22 |
| US20140272345A1 (en) | 2014-09-18 |
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