KR20150129703A - 투명한 스크래치 저항성 윈도우를 생성하기 위하여 산소 분위기에서 알루미늄 공급원을 사용하여 기판에 알루미늄 산화물을 성장시키는 방법 - Google Patents

투명한 스크래치 저항성 윈도우를 생성하기 위하여 산소 분위기에서 알루미늄 공급원을 사용하여 기판에 알루미늄 산화물을 성장시키는 방법 Download PDF

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KR20150129703A
KR20150129703A KR1020157024100A KR20157024100A KR20150129703A KR 20150129703 A KR20150129703 A KR 20150129703A KR 1020157024100 A KR1020157024100 A KR 1020157024100A KR 20157024100 A KR20157024100 A KR 20157024100A KR 20150129703 A KR20150129703 A KR 20150129703A
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South Korea
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transparent
substrate
aluminum
aluminum oxide
resistant
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English (en)
Korean (ko)
Inventor
조나단 비. 레빈
존 피. 씨랄도
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루비콘 테크놀로지, 주식회사
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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08—Oxides
    • C23C14/081—Oxides of aluminium, magnesium or beryllium
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0021—Reactive sputtering or evaporation
    • C23C14/0036—Reactive sputtering
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
    • C03C17/23—Oxides
    • C03C17/245—Oxides by deposition from the vapour phase
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0021—Reactive sputtering or evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3457—Sputtering using other particles than noble gas ions
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3485—Sputtering using pulsed power to the target
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/50—Substrate holders
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process
    • C23C14/541—Heating or cooling of the substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/40—Oxides
    • C23C16/403—Oxides of aluminium, magnesium or beryllium
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/20—Materials for coating a single layer on glass
    • C03C2217/21—Oxides
    • C03C2217/214—Al2O3
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2218/00—Methods for coating glass
    • C03C2218/10—Deposition methods
    • C03C2218/15—Deposition methods from the vapour phase
    • C03C2218/154—Deposition methods from the vapour phase by sputtering
    • C03C2218/155—Deposition methods from the vapour phase by sputtering by reactive sputtering
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24942—Structurally defined web or sheet [e.g., overall dimension, etc.] including components having same physical characteristic in differing degree
    • Y10T428/2495—Thickness [relative or absolute]
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/26—Web or sheet containing structurally defined element or component, the element or component having a specified physical dimension
    • Y10T428/263—Coating layer not in excess of 5 mils thick or equivalent
    • Y10T428/264—Up to 3 mils
    • Y10T428/265—1 mil or less

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • General Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Inorganic Chemistry (AREA)
  • Surface Treatment Of Glass (AREA)
  • Physical Vapour Deposition (AREA)
KR1020157024100A 2013-03-15 2014-01-30 투명한 스크래치 저항성 윈도우를 생성하기 위하여 산소 분위기에서 알루미늄 공급원을 사용하여 기판에 알루미늄 산화물을 성장시키는 방법 Withdrawn KR20150129703A (ko)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US201361790786P 2013-03-15 2013-03-15
US61/790,786 2013-03-15
US14/101,980 2013-12-10
US14/101,980 US20140272346A1 (en) 2013-03-15 2013-12-10 Method of growing aluminum oxide onto substrates by use of an aluminum source in an oxygen environment to create transparent, scratch resistant windows
PCT/US2014/013918 WO2014149194A1 (en) 2013-03-15 2014-01-30 Method of growing aluminum oxide onto substrates by use of an aluminum source in an oxygen environment to create transparent, scratch resistant windows

Publications (1)

Publication Number Publication Date
KR20150129703A true KR20150129703A (ko) 2015-11-20

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KR1020157024100A Withdrawn KR20150129703A (ko) 2013-03-15 2014-01-30 투명한 스크래치 저항성 윈도우를 생성하기 위하여 산소 분위기에서 알루미늄 공급원을 사용하여 기판에 알루미늄 산화물을 성장시키는 방법
KR1020157024881A Withdrawn KR20150129732A (ko) 2013-03-15 2014-01-30 투명한 스크래치 저항성 윈도우를 생성하기 위하여 산소 분압을 포함하는 분위기에서 알루미늄 공급원을 사용하여 기판에 알루미늄 산화물을 성장시키는 방법

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KR1020157024881A Withdrawn KR20150129732A (ko) 2013-03-15 2014-01-30 투명한 스크래치 저항성 윈도우를 생성하기 위하여 산소 분압을 포함하는 분위기에서 알루미늄 공급원을 사용하여 기판에 알루미늄 산화물을 성장시키는 방법

Country Status (7)

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US (4) US20140272345A1 (enExample)
JP (2) JP2016513753A (enExample)
KR (2) KR20150129703A (enExample)
CN (2) CN105247096A (enExample)
DE (2) DE112014001454T5 (enExample)
TW (2) TW201437403A (enExample)
WO (2) WO2014149193A2 (enExample)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9957190B2 (en) 2016-01-12 2018-05-01 Corning Incorporated Thin thermally and chemically strengthened glass-based articles
US11697617B2 (en) 2019-08-06 2023-07-11 Corning Incorporated Glass laminate with buried stress spikes to arrest cracks and methods of making the same
US11891324B2 (en) 2014-07-31 2024-02-06 Corning Incorporated Thermally strengthened consumer electronic glass and related systems and methods
US12064938B2 (en) 2019-04-23 2024-08-20 Corning Incorporated Glass laminates having determined stress profiles and methods of making the same
US12338159B2 (en) 2015-07-30 2025-06-24 Corning Incorporated Thermally strengthened consumer electronic glass and related systems and methods
US12410090B2 (en) 2017-11-30 2025-09-09 Corning Incorporated Non-iox glasses with high coefficient of thermal expansion and preferential fracture behavior for thermal tempering

Families Citing this family (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2008027558A2 (en) 2006-08-31 2008-03-06 Codon Devices, Inc. Iterative nucleic acid assembly using activation of vector-encoded traits
US9217144B2 (en) 2010-01-07 2015-12-22 Gen9, Inc. Assembly of high fidelity polynucleotides
EP2637780B1 (en) 2010-11-12 2022-02-09 Gen9, Inc. Protein arrays and methods of using and making the same
AU2011338841B2 (en) 2010-11-12 2017-02-16 Gen9, Inc. Methods and devices for nucleic acids synthesis
AU2012300401B2 (en) 2011-08-26 2018-02-08 Ginkgo Bioworks, Inc. Compositions and methods for high fidelity assembly of nucleic acids
US9150853B2 (en) 2012-03-21 2015-10-06 Gen9, Inc. Methods for screening proteins using DNA encoded chemical libraries as templates for enzyme catalysis
EP2841601B1 (en) 2012-04-24 2019-03-06 Gen9, Inc. Methods for sorting nucleic acids and multiplexed preparative in vitro cloning
US20150191719A1 (en) 2012-06-25 2015-07-09 Gen9, Inc. Methods for Nucleic Acid Assembly and High Throughput Sequencing
US9359686B1 (en) 2015-01-09 2016-06-07 Apple Inc. Processes to reduce interfacial enrichment of alloying elements under anodic oxide films and improve anodized appearance of heat treatable alloys
US20180009931A1 (en) * 2015-01-14 2018-01-11 Covestro Deutschland Ag Composition for transparent shaped bodies based on polyurethane
CN105039917B (zh) * 2015-06-05 2018-12-25 河源市璐悦自动化设备有限公司 一种具有蓝宝石表层的玻璃镜片及其制备方法
US20170009334A1 (en) * 2015-07-09 2017-01-12 Rubicon Technology, Inc. Hard aluminum oxide coating for various applications
US9970080B2 (en) 2015-09-24 2018-05-15 Apple Inc. Micro-alloying to mitigate the slight discoloration resulting from entrained metal in anodized aluminum surface finishes
US10174436B2 (en) 2016-04-06 2019-01-08 Apple Inc. Process for enhanced corrosion protection of anodized aluminum
CN107263939A (zh) * 2016-04-08 2017-10-20 优尔材料工业（深圳）有限公司 复合体及其制备方法
US11352708B2 (en) 2016-08-10 2022-06-07 Apple Inc. Colored multilayer oxide coatings
US11242614B2 (en) 2017-02-17 2022-02-08 Apple Inc. Oxide coatings for providing corrosion resistance on parts with edges and convex features
US11549191B2 (en) 2018-09-10 2023-01-10 Apple Inc. Corrosion resistance for anodized parts having convex surface features
CN109763116B (zh) * 2019-01-30 2020-11-06 西北工业大学 用于cvd设备的双轴正交旋转系统及方法
KR102751151B1 (ko) 2019-12-20 2025-01-07 삼성디스플레이 주식회사 유리 제품 및 이를 포함하는 디스플레이 장치
KR102244873B1 (ko) * 2019-12-31 2021-04-27 주식회사 이노션테크 디스플레이 기판용 기능성 코팅막 및 그 제조방법
KR102562270B1 (ko) 2021-12-09 2023-08-01 삼성디스플레이 주식회사 유리 강도 평가 장치 및 평가 방법

Family Cites Families (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63501223A (ja) * 1985-10-31 1988-05-12 エヌ・シ−・ア−ル・コ−ポレ−シヨン 透明基板上に耐摩傷コ−テイングを形成する方法
US5350607A (en) * 1992-10-02 1994-09-27 United Technologies Corporation Ionized cluster beam deposition of sapphire
JP3478561B2 (ja) * 1993-05-26 2003-12-15 キヤノン株式会社 スパッタ成膜方法
EP0633331B1 (en) * 1993-07-02 2000-01-19 Sumitomo Electric Industries, Limited Process for preparing high crystallinity SrTiO3 oxide thin film
US5911856A (en) * 1993-09-03 1999-06-15 Canon Kabushiki Kaisha Method for forming thin film
US5472795A (en) * 1994-06-27 1995-12-05 Board Of Regents Of The University Of The University Of Wisconsin System, On Behalf Of The University Of Wisconsin-Milwaukee Multilayer nanolaminates containing polycrystalline zirconia
JP3689524B2 (ja) * 1996-03-22 2005-08-31 キヤノン株式会社 酸化アルミニウム膜及びその形成方法
CN100420058C (zh) * 1998-12-17 2008-09-17 剑桥显示技术有限公司 制作有机光发射装置的方法
JP2003517111A (ja) * 1999-12-16 2003-05-20 コーロン インダストリーズ インク 触感に優れる経編地及びその製造方法
US6869644B2 (en) * 2000-10-24 2005-03-22 Ppg Industries Ohio, Inc. Method of making coated articles and coated articles made thereby
US6858865B2 (en) * 2001-02-23 2005-02-22 Micron Technology, Inc. Doped aluminum oxide dielectrics
DE10219812A1 (de) * 2002-05-02 2003-11-13 Univ Dresden Tech Bauteile mit kristallinen Beschichtungen des Systems Aluminiumoxid/Siliziumoxid und Verfahren zu deren Herstellung
US7339139B2 (en) * 2003-10-03 2008-03-04 Darly Custom Technology, Inc. Multi-layered radiant thermal evaporator and method of use
US7229669B2 (en) * 2003-11-13 2007-06-12 Honeywell International Inc. Thin-film deposition methods and apparatuses
US7160578B2 (en) * 2004-03-10 2007-01-09 Pilkington North America Method for depositing aluminum oxide coatings on flat glass
KR100671422B1 (ko) * 2004-12-21 2007-01-19 재단법인 포항산업과학연구원 스퍼터링에 의한 알루미늄 피막 형성방법
US8460522B2 (en) * 2006-10-24 2013-06-11 Ulvac, Inc. Method of forming thin film and apparatus for forming thin film
CN102137822B (zh) * 2008-07-29 2015-12-09 康宁股份有限公司 用于化学强化玻璃的双阶段离子交换
DE102009034532A1 (de) * 2009-07-23 2011-02-03 Msg Lithoglas Ag Verfahren zum Herstellen einer strukturierten Beschichtung auf einem Substrat, beschichtetes Substrat sowie Halbzeug mit einem beschichteten Substrat
KR101638765B1 (ko) * 2011-04-29 2016-07-13 어플라이드 머티어리얼스, 인코포레이티드 반응성 증착 프로세스를 위한 가스 시스템
JP2013028018A (ja) * 2011-07-27 2013-02-07 Daicel Corp ガスバリアフィルム及びデバイス
US9127344B2 (en) * 2011-11-08 2015-09-08 Sakti3, Inc. Thermal evaporation process for manufacture of solid state battery devices
US9701580B2 (en) * 2012-02-29 2017-07-11 Corning Incorporated Aluminosilicate glasses for ion exchange
CN104718071B (zh) * 2012-10-03 2018-09-04 康宁股份有限公司 表面改进的玻璃基材

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US11891324B2 (en) 2014-07-31 2024-02-06 Corning Incorporated Thermally strengthened consumer electronic glass and related systems and methods
US12338159B2 (en) 2015-07-30 2025-06-24 Corning Incorporated Thermally strengthened consumer electronic glass and related systems and methods
US9957190B2 (en) 2016-01-12 2018-05-01 Corning Incorporated Thin thermally and chemically strengthened glass-based articles
US10457587B2 (en) 2016-01-12 2019-10-29 Corning Incorporated Thin thermally and chemically strengthened glass-based articles
US11643355B2 (en) 2016-01-12 2023-05-09 Corning Incorporated Thin thermally and chemically strengthened glass-based articles
US12410090B2 (en) 2017-11-30 2025-09-09 Corning Incorporated Non-iox glasses with high coefficient of thermal expansion and preferential fracture behavior for thermal tempering
US12064938B2 (en) 2019-04-23 2024-08-20 Corning Incorporated Glass laminates having determined stress profiles and methods of making the same
US11697617B2 (en) 2019-08-06 2023-07-11 Corning Incorporated Glass laminate with buried stress spikes to arrest cracks and methods of making the same
US12043575B2 (en) 2019-08-06 2024-07-23 Corning Incorporated Glass laminate with buried stress spikes to arrest cracks and methods of making the same

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DE112014001447T5 (de) 2016-01-14
DE112014001454T5 (de) 2015-12-03
US20140272346A1 (en) 2014-09-18
WO2014149194A1 (en) 2014-09-25
TW201500573A (zh) 2015-01-01
US20160215381A1 (en) 2016-07-28
CN105209659A (zh) 2015-12-30
JP2016516133A (ja) 2016-06-02
TW201437403A (zh) 2014-10-01
CN105247096A (zh) 2016-01-13
WO2014149193A2 (en) 2014-09-25
WO2014149193A3 (en) 2015-01-15
KR20150129732A (ko) 2015-11-20
US20160369387A1 (en) 2016-12-22
US20140272345A1 (en) 2014-09-18

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