CN105164794B - 用于声学监视及控制穿透硅的通孔显露处理的设备及方法 - Google Patents

用于声学监视及控制穿透硅的通孔显露处理的设备及方法 Download PDF

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Publication number
CN105164794B
CN105164794B CN201480024607.1A CN201480024607A CN105164794B CN 105164794 B CN105164794 B CN 105164794B CN 201480024607 A CN201480024607 A CN 201480024607A CN 105164794 B CN105164794 B CN 105164794B
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China
Prior art keywords
hole
substrate
sonic transducer
polishing pad
pressing plate
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CN201480024607.1A
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Chinese (zh)
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CN105164794A (zh
Inventor
X·Y·周
K·苏布拉马尼亚姆
U·玛哈简
B·A·斯韦德克
R·巴贾杰
J·唐
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Applied Materials Inc
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Applied Materials Inc
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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B24B37/005—Control means for lapping machines or devices
    • B24B37/0053—Control means for lapping machines or devices detecting loss or breakage of a workpiece during lapping

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  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Constituent Portions Of Griding Lathes, Driving, Sensing And Control (AREA)
CN201480024607.1A 2013-05-01 2014-04-28 用于声学监视及控制穿透硅的通孔显露处理的设备及方法 Active CN105164794B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US13/874,495 US20140329439A1 (en) 2013-05-01 2013-05-01 Apparatus and methods for acoustical monitoring and control of through-silicon-via reveal processing
US13/874,495 2013-05-01
PCT/US2014/035756 WO2014179241A1 (en) 2013-05-01 2014-04-28 Apparatus and methods for acoustical monitoring and control of through-silicon-via reveal processing

Publications (2)

Publication Number Publication Date
CN105164794A CN105164794A (zh) 2015-12-16
CN105164794B true CN105164794B (zh) 2019-01-11

Family

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CN201480024607.1A Active CN105164794B (zh) 2013-05-01 2014-04-28 用于声学监视及控制穿透硅的通孔显露处理的设备及方法

Country Status (6)

Country Link
US (1) US20140329439A1 (enExample)
JP (1) JP6397896B2 (enExample)
KR (1) KR102242321B1 (enExample)
CN (1) CN105164794B (enExample)
TW (1) TWI686264B (enExample)
WO (1) WO2014179241A1 (enExample)

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US10695907B2 (en) * 2017-09-29 2020-06-30 Intel Corporation Methods and apparatus for monitoring robot health in manufacturing environments
US11565365B2 (en) * 2017-11-13 2023-01-31 Taiwan Semiconductor Manufacturing Co., Ltd. System and method for monitoring chemical mechanical polishing
CN108188931A (zh) * 2017-12-22 2018-06-22 华侨大学 双面行星磨削/研磨加工中工件破碎的在线控制系统
WO2019152222A1 (en) * 2018-02-05 2019-08-08 Applied Materials, Inc. Piezo-electric end-pointing for 3d printed cmp pads
JP7354131B2 (ja) 2018-03-13 2023-10-02 アプライド マテリアルズ インコーポレイテッド 化学機械研磨中の振動のモニタリング
JP7116645B2 (ja) * 2018-09-12 2022-08-10 キオクシア株式会社 研磨装置
JP7325913B2 (ja) * 2019-11-22 2023-08-15 株式会社ディスコ ウェーハ加工装置
US11289387B2 (en) * 2020-07-31 2022-03-29 Applied Materials, Inc. Methods and apparatus for backside via reveal processing
JP7682641B2 (ja) * 2021-02-22 2025-05-26 株式会社荏原製作所 基板処理装置
WO2022186992A1 (en) 2021-03-03 2022-09-09 Applied Materials, Inc. Acoustic monitoring and sensors for chemical mechanical polishing
KR20240025029A (ko) 2021-07-06 2024-02-26 어플라이드 머티어리얼스, 인코포레이티드 광 센서를 사용한 화학적 기계적 연마 진동 측정
CN117677465A (zh) * 2021-07-06 2024-03-08 应用材料公司 用于化学机械抛光的包含声学窗口的抛光垫
US12403561B2 (en) 2022-03-09 2025-09-02 Applied Materials, Inc. Eddy current monitoring to detect vibration in polishing
US12403560B2 (en) 2022-06-03 2025-09-02 Applied Materials, Inc. Determining substrate precession with acoustic signals

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US7537511B2 (en) * 2006-03-14 2009-05-26 Micron Technology, Inc. Embedded fiber acoustic sensor for CMP process endpoint

Also Published As

Publication number Publication date
KR102242321B1 (ko) 2021-04-21
TW201503995A (zh) 2015-02-01
US20140329439A1 (en) 2014-11-06
CN105164794A (zh) 2015-12-16
JP2016517185A (ja) 2016-06-09
WO2014179241A1 (en) 2014-11-06
KR20160003247A (ko) 2016-01-08
TWI686264B (zh) 2020-03-01
JP6397896B2 (ja) 2018-09-26

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