CN105038799A - 一种对ito膜进行刻蚀的刻蚀液 - Google Patents
一种对ito膜进行刻蚀的刻蚀液 Download PDFInfo
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- CN105038799A CN105038799A CN201510544291.5A CN201510544291A CN105038799A CN 105038799 A CN105038799 A CN 105038799A CN 201510544291 A CN201510544291 A CN 201510544291A CN 105038799 A CN105038799 A CN 105038799A
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- Weting (AREA)
- ing And Chemical Polishing (AREA)
- Surface Treatment Of Glass (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
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- Manufacturing Of Electric Cables (AREA)
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Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
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CN201510544291.5A CN105038799B (zh) | 2014-04-30 | 2014-04-30 | 一种对ito膜进行刻蚀的刻蚀液 |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
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CN201410182937.5A CN103937505B (zh) | 2014-04-30 | 2014-04-30 | Ito膜刻蚀液 |
CN201510544291.5A CN105038799B (zh) | 2014-04-30 | 2014-04-30 | 一种对ito膜进行刻蚀的刻蚀液 |
Related Parent Applications (1)
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CN201410182937.5A Division CN103937505B (zh) | 2014-04-30 | 2014-04-30 | Ito膜刻蚀液 |
Publications (2)
Publication Number | Publication Date |
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CN105038799A true CN105038799A (zh) | 2015-11-11 |
CN105038799B CN105038799B (zh) | 2017-12-12 |
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Family Applications (6)
Application Number | Title | Priority Date | Filing Date |
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CN201510539374.5A Active CN105087009B (zh) | 2014-04-30 | 2014-04-30 | 一种用于ito膜刻蚀的工艺 |
CN201510536476.1A Expired - Fee Related CN105087008B (zh) | 2014-04-30 | 2014-04-30 | 用于ito膜刻蚀的刻蚀液 |
CN201510539375.XA Pending CN105062491A (zh) | 2014-04-30 | 2014-04-30 | 一种ito膜刻蚀的方法 |
CN201410182937.5A Active CN103937505B (zh) | 2014-04-30 | 2014-04-30 | Ito膜刻蚀液 |
CN201510544292.XA Expired - Fee Related CN105224125B (zh) | 2014-04-30 | 2014-04-30 | 一种对ito膜进行刻蚀的方法 |
CN201510544291.5A Active CN105038799B (zh) | 2014-04-30 | 2014-04-30 | 一种对ito膜进行刻蚀的刻蚀液 |
Family Applications Before (5)
Application Number | Title | Priority Date | Filing Date |
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CN201510539374.5A Active CN105087009B (zh) | 2014-04-30 | 2014-04-30 | 一种用于ito膜刻蚀的工艺 |
CN201510536476.1A Expired - Fee Related CN105087008B (zh) | 2014-04-30 | 2014-04-30 | 用于ito膜刻蚀的刻蚀液 |
CN201510539375.XA Pending CN105062491A (zh) | 2014-04-30 | 2014-04-30 | 一种ito膜刻蚀的方法 |
CN201410182937.5A Active CN103937505B (zh) | 2014-04-30 | 2014-04-30 | Ito膜刻蚀液 |
CN201510544292.XA Expired - Fee Related CN105224125B (zh) | 2014-04-30 | 2014-04-30 | 一种对ito膜进行刻蚀的方法 |
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CN (6) | CN105087009B (zh) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN108559493A (zh) * | 2018-05-18 | 2018-09-21 | 南昌大学 | 一种氧化铝-氧化硅复合材料及制备方法 |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN112680229A (zh) * | 2021-01-29 | 2021-04-20 | 深圳市百通达科技有限公司 | 一种湿电子化学的硅基材料蚀刻液及其制备方法 |
Citations (9)
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CN101517712A (zh) * | 2006-09-13 | 2009-08-26 | 长瀬化成株式会社 | 蚀刻液组合物 |
JP2009218513A (ja) * | 2008-03-12 | 2009-09-24 | Nagase Chemtex Corp | アモルファスito透明導電膜用エッチング液組成物及びエッチング方法 |
CN101585662A (zh) * | 2009-05-11 | 2009-11-25 | 绵阳艾萨斯电子材料有限公司 | 平板显示用刻蚀液 |
KR20110105148A (ko) * | 2010-03-18 | 2011-09-26 | 삼성전자주식회사 | 금속 배선 식각액 및 이를 이용한 금속 배선 형성 방법 |
CN102226087A (zh) * | 2011-04-29 | 2011-10-26 | 西安东旺精细化学有限公司 | 透明导电膜湿法蚀刻液组合物 |
CN102369258A (zh) * | 2009-03-30 | 2012-03-07 | 东丽株式会社 | 导电膜去除剂及导电膜去除方法 |
CN102933690A (zh) * | 2010-06-16 | 2013-02-13 | E·I·内穆尔杜邦公司 | 蚀刻组合物及其在制备光伏电池的方法中的使用 |
CN103160909A (zh) * | 2011-12-15 | 2013-06-19 | 比亚迪股份有限公司 | 一种用于电蚀刻非晶合金材料件的电蚀刻液及蚀刻方法 |
TW201406932A (zh) * | 2012-05-18 | 2014-02-16 | Advanced Tech Materials | 用於自包含氮化鈦之表面脫除光阻劑之組成物及方法 |
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WO2000011107A1 (en) * | 1998-08-18 | 2000-03-02 | Ki Won Lee | Ito etching composition |
US20050215713A1 (en) * | 2004-03-26 | 2005-09-29 | Hessell Edward T | Method of producing a crosslinked coating in the manufacture of integrated circuits |
US20060226122A1 (en) * | 2005-04-08 | 2006-10-12 | Wojtczak William A | Selective wet etching of metal nitrides |
EP1880410A2 (en) * | 2005-05-13 | 2008-01-23 | Sachem, Inc. | Selective wet etching of oxides |
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JP5788701B2 (ja) * | 2011-04-11 | 2015-10-07 | 関東化学株式会社 | 透明導電膜用エッチング液組成物 |
JP2012253225A (ja) * | 2011-06-03 | 2012-12-20 | Hayashi Junyaku Kogyo Kk | エッチング液組成物およびエッチング方法 |
JP5913869B2 (ja) * | 2011-08-31 | 2016-04-27 | 林純薬工業株式会社 | エッチング液組成物およびエッチング方法 |
CN102382657B (zh) * | 2011-10-11 | 2013-08-07 | 绵阳艾萨斯电子材料有限公司 | 一种透明导电膜用蚀刻液及其制备方法 |
CN102585832A (zh) * | 2011-12-30 | 2012-07-18 | 江阴江化微电子材料股份有限公司 | 一种低张力ito蚀刻液及其制备方法 |
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2014
- 2014-04-30 CN CN201510539374.5A patent/CN105087009B/zh active Active
- 2014-04-30 CN CN201510536476.1A patent/CN105087008B/zh not_active Expired - Fee Related
- 2014-04-30 CN CN201510539375.XA patent/CN105062491A/zh active Pending
- 2014-04-30 CN CN201410182937.5A patent/CN103937505B/zh active Active
- 2014-04-30 CN CN201510544292.XA patent/CN105224125B/zh not_active Expired - Fee Related
- 2014-04-30 CN CN201510544291.5A patent/CN105038799B/zh active Active
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CN101517712A (zh) * | 2006-09-13 | 2009-08-26 | 长瀬化成株式会社 | 蚀刻液组合物 |
JP2009218513A (ja) * | 2008-03-12 | 2009-09-24 | Nagase Chemtex Corp | アモルファスito透明導電膜用エッチング液組成物及びエッチング方法 |
CN102369258A (zh) * | 2009-03-30 | 2012-03-07 | 东丽株式会社 | 导电膜去除剂及导电膜去除方法 |
CN101585662A (zh) * | 2009-05-11 | 2009-11-25 | 绵阳艾萨斯电子材料有限公司 | 平板显示用刻蚀液 |
KR20110105148A (ko) * | 2010-03-18 | 2011-09-26 | 삼성전자주식회사 | 금속 배선 식각액 및 이를 이용한 금속 배선 형성 방법 |
CN102933690A (zh) * | 2010-06-16 | 2013-02-13 | E·I·内穆尔杜邦公司 | 蚀刻组合物及其在制备光伏电池的方法中的使用 |
CN102226087A (zh) * | 2011-04-29 | 2011-10-26 | 西安东旺精细化学有限公司 | 透明导电膜湿法蚀刻液组合物 |
CN103160909A (zh) * | 2011-12-15 | 2013-06-19 | 比亚迪股份有限公司 | 一种用于电蚀刻非晶合金材料件的电蚀刻液及蚀刻方法 |
TW201406932A (zh) * | 2012-05-18 | 2014-02-16 | Advanced Tech Materials | 用於自包含氮化鈦之表面脫除光阻劑之組成物及方法 |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN108559493A (zh) * | 2018-05-18 | 2018-09-21 | 南昌大学 | 一种氧化铝-氧化硅复合材料及制备方法 |
Also Published As
Publication number | Publication date |
---|---|
CN105087008A (zh) | 2015-11-25 |
CN105062491A (zh) | 2015-11-18 |
CN103937505B (zh) | 2015-11-25 |
CN105224125A (zh) | 2016-01-06 |
CN105038799B (zh) | 2017-12-12 |
CN105087009A (zh) | 2015-11-25 |
CN105087009B (zh) | 2017-06-30 |
CN105224125B (zh) | 2017-11-14 |
CN103937505A (zh) | 2014-07-23 |
CN105087008B (zh) | 2017-09-26 |
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Inventor after: Li Zikao Inventor before: Wang Li |
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Effective date of registration: 20171023 Address after: 224000 Yantian District, Yancheng City, Jiangsu Province Yanlong Sub-district Office Weixin Road and Qinchuan Road Interchange (D) Applicant after: Yancheng China Star Optical Technology Co., Ltd. Address before: 510640 Guangdong City, Tianhe District Province, No. five, road, public education building, unit 371-1, unit 2401 Applicant before: Guangdong Gaohang Intellectual Property Operation Co., Ltd. |
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