CN104853902A - 用于产生均匀的光分布的方法 - Google Patents

用于产生均匀的光分布的方法 Download PDF

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Publication number
CN104853902A
CN104853902A CN201380067167.3A CN201380067167A CN104853902A CN 104853902 A CN104853902 A CN 104853902A CN 201380067167 A CN201380067167 A CN 201380067167A CN 104853902 A CN104853902 A CN 104853902A
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CN
China
Prior art keywords
light source
light
pixels
exposure field
illuminated
Prior art date
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Pending
Application number
CN201380067167.3A
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English (en)
Chinese (zh)
Inventor
C.鲍尔
M.施帕茨
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Kulzer GmbH
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Heraeus Kulzer GmbH
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Filing date
Publication date
Application filed by Heraeus Kulzer GmbH filed Critical Heraeus Kulzer GmbH
Publication of CN104853902A publication Critical patent/CN104853902A/zh
Pending legal-status Critical Current

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Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C64/00—Additive manufacturing, i.e. manufacturing of three-dimensional [3D] objects by additive deposition, additive agglomeration or additive layering, e.g. by 3D printing, stereolithography or selective laser sintering
    • B29C64/10—Processes of additive manufacturing
    • B29C64/106—Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material
    • B29C64/124—Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material using layers of liquid which are selectively solidified
    • B29C64/129—Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material using layers of liquid which are selectively solidified characterised by the energy source therefor, e.g. by global irradiation combined with a mask
    • B29C64/135—Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material using layers of liquid which are selectively solidified characterised by the energy source therefor, e.g. by global irradiation combined with a mask the energy source being concentrated, e.g. scanning lasers or focused light sources
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C64/00—Additive manufacturing, i.e. manufacturing of three-dimensional [3D] objects by additive deposition, additive agglomeration or additive layering, e.g. by 3D printing, stereolithography or selective laser sintering
    • B29C64/20—Apparatus for additive manufacturing; Details thereof or accessories therefor
    • B29C64/264—Arrangements for irradiation
    • B29C64/277—Arrangements for irradiation using multiple radiation means, e.g. micromirrors or multiple light-emitting diodes [LED]
    • B29C64/282—Arrangements for irradiation using multiple radiation means, e.g. micromirrors or multiple light-emitting diodes [LED] of the same type, e.g. using different energy levels
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C64/00—Additive manufacturing, i.e. manufacturing of three-dimensional [3D] objects by additive deposition, additive agglomeration or additive layering, e.g. by 3D printing, stereolithography or selective laser sintering
    • B29C64/20—Apparatus for additive manufacturing; Details thereof or accessories therefor
    • B29C64/264—Arrangements for irradiation
    • B29C64/286—Optical filters, e.g. masks
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C64/00—Additive manufacturing, i.e. manufacturing of three-dimensional [3D] objects by additive deposition, additive agglomeration or additive layering, e.g. by 3D printing, stereolithography or selective laser sintering
    • B29C64/30—Auxiliary operations or equipment
    • B29C64/386—Data acquisition or data processing for additive manufacturing
    • B29C64/393—Data acquisition or data processing for additive manufacturing for controlling or regulating additive manufacturing processes
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/0816—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70283—Mask effects on the imaging process
    • G03F7/70291—Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70416—2.5D lithography
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C64/00—Additive manufacturing, i.e. manufacturing of three-dimensional [3D] objects by additive deposition, additive agglomeration or additive layering, e.g. by 3D printing, stereolithography or selective laser sintering
    • B29C64/10—Processes of additive manufacturing
    • B29C64/106—Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material
    • B29C64/124—Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material using layers of liquid which are selectively solidified
    • B29C64/129—Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material using layers of liquid which are selectively solidified characterised by the energy source therefor, e.g. by global irradiation combined with a mask
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B33—ADDITIVE MANUFACTURING TECHNOLOGY
    • B33Y—ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3-D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3-D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
    • B33Y10/00—Processes of additive manufacturing
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/0816—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
    • G02B26/0833—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Optics & Photonics (AREA)
  • Manufacturing & Machinery (AREA)
  • Mechanical Engineering (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • General Physics & Mathematics (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Projection Apparatus (AREA)
  • Micromachines (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Transforming Electric Information Into Light Information (AREA)
CN201380067167.3A 2012-12-20 2013-12-17 用于产生均匀的光分布的方法 Pending CN104853902A (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE102012224005.5A DE102012224005B4 (de) 2012-12-20 2012-12-20 Verfahren zur Herstellung einer homogenen Lichtverteilung
DE102012224005.5 2012-12-20
PCT/EP2013/076902 WO2014095864A1 (de) 2012-12-20 2013-12-17 Verfahren zur herstellung einer homogenen lichtverteilung

Publications (1)

Publication Number Publication Date
CN104853902A true CN104853902A (zh) 2015-08-19

Family

ID=49885232

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201380067167.3A Pending CN104853902A (zh) 2012-12-20 2013-12-17 用于产生均匀的光分布的方法

Country Status (10)

Country Link
US (1) US9914265B2 (enExample)
EP (1) EP2934858B1 (enExample)
JP (1) JP6436912B2 (enExample)
KR (1) KR101860617B1 (enExample)
CN (1) CN104853902A (enExample)
AU (1) AU2013361779B2 (enExample)
BR (1) BR112015012368A2 (enExample)
CA (1) CA2888844A1 (enExample)
DE (1) DE102012224005B4 (enExample)
WO (1) WO2014095864A1 (enExample)

Cited By (6)

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CN106182772A (zh) * 2016-07-25 2016-12-07 哈尔滨工业大学 多种材料快速原型成型装置及方法
CN107193185A (zh) * 2016-03-14 2017-09-22 东京毅力科创株式会社 辅助曝光装置
CN107891596A (zh) * 2017-12-15 2018-04-10 博纳云智（天津）科技有限公司 一种dlp光固化3d打印机的光强均匀校正方法
CN110770626A (zh) * 2017-06-21 2020-02-07 依视路国际公司 光学物品的制造方法和光学成形设备
CN115464159A (zh) * 2017-05-11 2022-12-13 速尔特技术有限公司 用于增材制造的图案化光的开关站射束路由
CN118596582A (zh) * 2024-06-24 2024-09-06 广州黑格智造信息科技有限公司 三维打印设备的光调制器控制方法及三维打印设备

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RS61198B1 (sr) * 2014-12-30 2021-01-29 Visitech As Postupak za dobijanje uniformne osvetljenosti iz svetlosnog projektora na površini slike
DE102015104394B4 (de) 2015-03-24 2020-06-04 Kulzer Gmbh Verfahren zur Herstellung einer Teil- oder Totalprothese sowie Prothese erhältlich nach diesem Verfahren
US10180248B2 (en) 2015-09-02 2019-01-15 ProPhotonix Limited LED lamp with sensing capabilities
FR3041560B1 (fr) * 2015-09-29 2017-10-20 Prodways Procede de fabrication d'un produit par empilement de couche de matiere
EP3390303B1 (de) 2015-12-18 2024-02-07 Heraeus Quarzglas GmbH & Co. KG Herstellung von quarzglaskörpern mit taupunktkontrolle im schmelzofen
JP6940235B2 (ja) 2015-12-18 2021-09-22 ヘレウス クワルツグラス ゲーエムベーハー ウント コンパニー カーゲー 高融点金属の溶融坩堝内での石英ガラス体の調製
WO2017103131A1 (de) 2015-12-18 2017-06-22 Heraeus Quarzglas Gmbh & Co. Kg Verringern des erdalkalimetallgehalts von siliziumdioxidgranulat durch behandlung von kohlenstoffdotiertem siliziumdioxidgranulat bei hoher temperatur
CN108698883A (zh) 2015-12-18 2018-10-23 贺利氏石英玻璃有限两合公司 石英玻璃制备中的二氧化硅的喷雾造粒
TWI733723B (zh) 2015-12-18 2021-07-21 德商何瑞斯廓格拉斯公司 不透明石英玻璃體的製備
CN108698894A (zh) 2015-12-18 2018-10-23 贺利氏石英玻璃有限两合公司 在多腔式烘箱中制备石英玻璃体
KR20180094087A (ko) 2015-12-18 2018-08-22 헤래우스 크바르츠글라스 게엠베하 ＆ 컴파니 케이지 실리카 과립으로부터 실리카 유리 제품의 제조
WO2017103153A1 (de) 2015-12-18 2017-06-22 Heraeus Quarzglas Gmbh & Co. Kg Glasfasern und vorformen aus quarzglas mit geringem oh-, cl- und al-gehalt
KR20180095619A (ko) 2015-12-18 2018-08-27 헤래우스 크바르츠글라스 게엠베하 ＆ 컴파니 케이지 실리카 유리 제조 동안 규소 함량의 증가
CN109153593A (zh) 2015-12-18 2019-01-04 贺利氏石英玻璃有限两合公司 合成石英玻璃粉粒的制备
CN110394980A (zh) * 2018-04-24 2019-11-01 三纬国际立体列印科技股份有限公司 立体打印系统
US10503076B1 (en) * 2018-08-29 2019-12-10 Applied Materials, Inc. Reserving spatial light modulator sections to address field non-uniformities
NO20190617A1 (en) * 2019-05-16 2020-11-17 Visitech As System and method for exposing a material with images
FR3119562B1 (fr) * 2021-02-09 2024-08-30 Univ Claude Bernard Lyon Procédé d'impression d'un objet à imprimer, et imprimante adaptée pour la mise en oeuvre du procédé.
KR102443272B1 (ko) * 2021-07-20 2022-09-15 단국대학교 산학협력단 특정 경로를 따른 중복 광조사를 이용하는 3d 프린터 및 3d 프린팅 방법

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US6552777B2 (en) * 2000-03-14 2003-04-22 Fuji Photo Film Co., Ltd. Image exposing method and image exposing apparatus
US20070284547A1 (en) * 2004-05-05 2007-12-13 Sejersen Niels B Method for Enabling Transmission of Substantially Equal Amounts of Energy
CN1950191A (zh) * 2004-05-10 2007-04-18 想象科技有限公司 借助“像素偏移”生成分辨率提高的三维对象的方法

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107193185A (zh) * 2016-03-14 2017-09-22 东京毅力科创株式会社 辅助曝光装置
CN107193185B (zh) * 2016-03-14 2021-01-12 东京毅力科创株式会社 辅助曝光装置
CN106182772A (zh) * 2016-07-25 2016-12-07 哈尔滨工业大学 多种材料快速原型成型装置及方法
CN106182772B (zh) * 2016-07-25 2018-06-26 哈尔滨工业大学 多种材料快速原型成型装置及方法
CN115464159A (zh) * 2017-05-11 2022-12-13 速尔特技术有限公司 用于增材制造的图案化光的开关站射束路由
CN110770626A (zh) * 2017-06-21 2020-02-07 依视路国际公司 光学物品的制造方法和光学成形设备
CN107891596A (zh) * 2017-12-15 2018-04-10 博纳云智（天津）科技有限公司 一种dlp光固化3d打印机的光强均匀校正方法
CN118596582A (zh) * 2024-06-24 2024-09-06 广州黑格智造信息科技有限公司 三维打印设备的光调制器控制方法及三维打印设备

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Publication number Publication date
WO2014095864A1 (de) 2014-06-26
DE102012224005A1 (de) 2014-06-26
KR20150096386A (ko) 2015-08-24
US20150328834A1 (en) 2015-11-19
AU2013361779B2 (en) 2017-01-19
JP2016508232A (ja) 2016-03-17
AU2013361779A1 (en) 2015-06-04
EP2934858A1 (de) 2015-10-28
DE102012224005B4 (de) 2015-07-23
JP6436912B2 (ja) 2018-12-12
CA2888844A1 (en) 2014-06-26
WO2014095864A9 (de) 2014-08-14
KR101860617B1 (ko) 2018-05-23
BR112015012368A2 (pt) 2017-07-11
EP2934858B1 (de) 2023-02-08
US9914265B2 (en) 2018-03-13

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Application publication date: 20150819