CN1047866C - 自举器件 - Google Patents

自举器件 Download PDF

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Publication number
CN1047866C
CN1047866C CN95113193A CN95113193A CN1047866C CN 1047866 C CN1047866 C CN 1047866C CN 95113193 A CN95113193 A CN 95113193A CN 95113193 A CN95113193 A CN 95113193A CN 1047866 C CN1047866 C CN 1047866C
Authority
CN
China
Prior art keywords
diffusion zone
bootstrap
transistor
2nmos
grid
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CN95113193A
Other languages
English (en)
Chinese (zh)
Other versions
CN1135080A (zh
Inventor
郑昌镐
柳会峻
朴起雨
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
SK Hynix Inc
Original Assignee
Hyundai Electronics Industries Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hyundai Electronics Industries Co Ltd filed Critical Hyundai Electronics Industries Co Ltd
Publication of CN1135080A publication Critical patent/CN1135080A/zh
Application granted granted Critical
Publication of CN1047866C publication Critical patent/CN1047866C/zh
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Classifications

    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03K—PULSE TECHNIQUE
    • H03K19/00—Logic circuits, i.e. having at least two inputs acting on one output; Inverting circuits
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11C—STATIC STORES
    • G11C11/00—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor
    • G11C11/21—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements
    • G11C11/34—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using semiconductor devices
    • G11C11/40—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using semiconductor devices using transistors
    • G11C11/401—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using semiconductor devices using transistors forming cells needing refreshing or charge regeneration, i.e. dynamic cells
    • G11C11/4063—Auxiliary circuits, e.g. for addressing, decoding, driving, writing, sensing or timing
    • G11C11/407—Auxiliary circuits, e.g. for addressing, decoding, driving, writing, sensing or timing for memory cells of the field-effect type
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11C—STATIC STORES
    • G11C8/00—Arrangements for selecting an address in a digital store
    • G11C8/08—Word line control circuits, e.g. drivers, boosters, pull-up circuits, pull-down circuits, precharging circuits, for word lines
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D84/00—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
    • H10D84/80—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00, e.g. integration of IGFETs
    • H10D84/82—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00, e.g. integration of IGFETs of only field-effect components
    • H10D84/83—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00, e.g. integration of IGFETs of only field-effect components of only insulated-gate FETs [IGFET]

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Computer Hardware Design (AREA)
  • Physics & Mathematics (AREA)
  • Computing Systems (AREA)
  • General Engineering & Computer Science (AREA)
  • Mathematical Physics (AREA)
  • Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
  • Electronic Switches (AREA)
  • Dram (AREA)
  • Insulated Gate Type Field-Effect Transistor (AREA)
  • Read Only Memory (AREA)
CN95113193A 1994-12-31 1995-12-29 自举器件 Expired - Fee Related CN1047866C (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
KR1019940040581A KR0137693B1 (ko) 1994-12-31 1994-12-31 셀프 부스트랩 장치
KR9440581 1994-12-31
KR94-40581 1994-12-31

Publications (2)

Publication Number Publication Date
CN1135080A CN1135080A (zh) 1996-11-06
CN1047866C true CN1047866C (zh) 1999-12-29

Family

ID=19406218

Family Applications (1)

Application Number Title Priority Date Filing Date
CN95113193A Expired - Fee Related CN1047866C (zh) 1994-12-31 1995-12-29 自举器件

Country Status (7)

Country Link
US (1) US5973345A (enExample)
JP (1) JP3058250B2 (enExample)
KR (1) KR0137693B1 (enExample)
CN (1) CN1047866C (enExample)
DE (1) DE19600049B4 (enExample)
GB (1) GB2296820B (enExample)
TW (1) TW280915B (enExample)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7227170B2 (en) * 2003-03-10 2007-06-05 Energy Conversion Devices, Inc. Multiple bit chalcogenide storage device
US10395035B2 (en) * 2016-09-27 2019-08-27 Intel Corporation Photon emission attack resistance driver circuits

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3714525A (en) * 1970-03-02 1973-01-30 Gen Electric Field-effect transistors with self registered gate which acts as diffusion mask during formation
JPS5250182A (en) * 1975-10-21 1977-04-21 Toshiba Corp Semiconductor device
US4185319A (en) * 1978-10-04 1980-01-22 Rca Corp. Non-volatile memory device
JPS577162A (en) * 1980-06-17 1982-01-14 Toshiba Corp Nonvolatile semiconductor memory and manufacture therefor
JPS57133677A (en) * 1981-02-12 1982-08-18 Mitsubishi Electric Corp Semiconductor integrated circuit device
US4620299A (en) * 1985-03-04 1986-10-28 Motorola, Inc. Row decoder
DE69111096T2 (de) * 1990-03-05 1996-04-11 Fujitsu Ltd MOS-Transistor für hohe Spannungen und dessen Herstellungsverfahren und Halbleiterbauelement mit MOS-Transistor für hohe Spannungen und dessen Herstellungsverfahren.
JP2786307B2 (ja) * 1990-04-19 1998-08-13 三菱電機株式会社 電界効果トランジスタ及びその製造方法
JP2926969B2 (ja) * 1990-04-26 1999-07-28 富士電機株式会社 Ｍｉｓ型電界効果トランジスタを有する半導体装置
JPH07123145B2 (ja) * 1990-06-27 1995-12-25 株式会社東芝 半導体集積回路
JPH06260639A (ja) * 1993-03-04 1994-09-16 Fuji Electric Co Ltd Ｍｏｓｆｅｔ

Also Published As

Publication number Publication date
JP3058250B2 (ja) 2000-07-04
CN1135080A (zh) 1996-11-06
GB2296820A (en) 1996-07-10
KR960027325A (ko) 1996-07-22
GB2296820B (en) 1999-07-14
DE19600049A1 (de) 1996-07-04
US5973345A (en) 1999-10-26
KR0137693B1 (ko) 1998-06-15
GB9526692D0 (en) 1996-02-28
TW280915B (enExample) 1996-07-11
JPH08340050A (ja) 1996-12-24
DE19600049B4 (de) 2005-12-15

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Legal Events

Date Code Title Description
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
C06 Publication
PB01 Publication
C14 Grant of patent or utility model
GR01 Patent grant
C17 Cessation of patent right
CF01 Termination of patent right due to non-payment of annual fee

Granted publication date: 19991229

Termination date: 20131229