CN104584180A - 带电粒子线装置用部件、带电粒子线装置以及隔膜部件 - Google Patents

带电粒子线装置用部件、带电粒子线装置以及隔膜部件 Download PDF

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Publication number
CN104584180A
CN104584180A CN201380043744.5A CN201380043744A CN104584180A CN 104584180 A CN104584180 A CN 104584180A CN 201380043744 A CN201380043744 A CN 201380043744A CN 104584180 A CN104584180 A CN 104584180A
Authority
CN
China
Prior art keywords
charged particle
sample
diaphragm
room
diaphragm element
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN201380043744.5A
Other languages
English (en)
Chinese (zh)
Inventor
佐久间宪之
大南佑介
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Publication of CN104584180A publication Critical patent/CN104584180A/zh
Pending legal-status Critical Current

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/20—Means for supporting or positioning the object or the material; Means for adjusting diaphragms or lenses associated with the support
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/16—Vessels; Containers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/18—Vacuum locks ; Means for obtaining or maintaining the desired pressure within the vessel
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/006—Details of gas supplies, e.g. in an ion source, to a beam line, to a specimen or to a workpiece
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/02—Details
    • H01J2237/0203—Protection arrangements
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/06—Sources
    • H01J2237/063—Electron sources
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/16—Vessels
    • H01J2237/164—Particle-permeable windows
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/16—Vessels
    • H01J2237/166—Sealing means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/18—Vacuum control means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/18—Vacuum control means
    • H01J2237/182—Obtaining or maintaining desired pressure
    • H01J2237/1825—Evacuating means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/20—Positioning, supporting, modifying or maintaining the physical state of objects being observed or treated
    • H01J2237/2005—Seal mechanisms
    • H01J2237/2006—Vacuum seals
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/20—Positioning, supporting, modifying or maintaining the physical state of objects being observed or treated
    • H01J2237/202—Movement
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/26—Electron or ion microscopes
    • H01J2237/2602—Details
    • H01J2237/2605—Details operating at elevated pressures, e.g. atmosphere
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/26—Electron or ion microscopes
    • H01J2237/2602—Details
    • H01J2237/2605—Details operating at elevated pressures, e.g. atmosphere
    • H01J2237/2608—Details operating at elevated pressures, e.g. atmosphere with environmental specimen chamber
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/26—Electron or ion microscopes
    • H01J2237/28—Scanning microscopes
    • H01J2237/2801—Details
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
CN201380043744.5A 2012-09-05 2013-07-11 带电粒子线装置用部件、带电粒子线装置以及隔膜部件 Pending CN104584180A (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2012194664A JP2014053073A (ja) 2012-09-05 2012-09-05 荷電粒子線装置用部材、荷電粒子線装置および隔膜部材
JP2012-194664 2012-09-05
PCT/JP2013/069050 WO2014038287A1 (ja) 2012-09-05 2013-07-11 荷電粒子線装置用部材、荷電粒子線装置および隔膜部材

Publications (1)

Publication Number Publication Date
CN104584180A true CN104584180A (zh) 2015-04-29

Family

ID=50236905

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201380043744.5A Pending CN104584180A (zh) 2012-09-05 2013-07-11 带电粒子线装置用部件、带电粒子线装置以及隔膜部件

Country Status (5)

Country Link
US (1) US20150206705A1 (enExample)
JP (1) JP2014053073A (enExample)
KR (1) KR20150036541A (enExample)
CN (1) CN104584180A (enExample)
WO (1) WO2014038287A1 (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110186944A (zh) * 2018-02-23 2019-08-30 台湾电镜仪器股份有限公司 检验容器以及电子显微镜

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6207824B2 (ja) * 2012-10-01 2017-10-04 株式会社日立ハイテクノロジーズ 荷電粒子線装置、隔膜の位置調整方法および隔膜位置調整ジグ
WO2014181685A1 (ja) * 2013-05-10 2014-11-13 株式会社日立ハイテクノロジーズ 荷電粒子線装置
DE112014003352B4 (de) * 2013-09-06 2023-02-02 Hitachi High-Tech Corporation Mit einem Strahl geladener Teilchen arbeitende Vorrichtung und Probenbilderfassungsverfahren
US9875878B2 (en) * 2013-12-05 2018-01-23 Hitachi, Ltd. Sample holder and analytical vacuum device
US10832885B2 (en) * 2015-12-23 2020-11-10 Massachusetts Institute Of Technology Electron transparent membrane for cold cathode devices
US20210233740A1 (en) * 2016-04-22 2021-07-29 Hitachi High-Technologies Corporation Charged Particle Microscope and Method of Imaging Sample
JP6916074B2 (ja) * 2017-09-20 2021-08-11 浜松ホトニクス株式会社 電子放出管、電子照射装置及び電子放出管の製造方法
WO2022219699A1 (ja) * 2021-04-13 2022-10-20 株式会社日立ハイテク 透過型電子顕微鏡
KR102791688B1 (ko) * 2021-11-25 2025-04-07 참엔지니어링(주) 대기중으로 빔을 인출하는 빔 가공 장치 및 그 제어 방법
WO2024142368A1 (ja) * 2022-12-28 2024-07-04 株式会社日立ハイテク 荷電粒子ビーム装置、及び荷電粒子ビーム装置の調整方法
KR102817234B1 (ko) * 2025-02-02 2025-06-09 (주)코셈 수동 xy 얼라인 수단 및 가스 주입수단을 구비한 대기압 전자 현미경용 멤브레인 어댑터, 및 이를 구비하는 대기압 전자현미경

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003282411A (ja) * 2002-03-25 2003-10-03 Mitsubishi Materials Corp リソグラフィー用のダイヤモンドウェハ、マスクブランクス及びマスク並びにダイヤモンドウェハの製造方法
JP2006147430A (ja) * 2004-11-22 2006-06-08 Hokkaido Univ 電子顕微鏡
CN101241026A (zh) * 2007-02-06 2008-08-13 Fei公司 用于同时利用粒子和光子来观察试样的粒子-光学装置
WO2012104942A1 (ja) * 2011-01-31 2012-08-09 株式会社 日立ハイテクノロジーズ 荷電粒子線装置

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5142461A (enExample) * 1974-10-09 1976-04-10 Ryoji Takahashi
JPH01117028A (ja) * 1987-10-30 1989-05-09 Nec Corp 電子線位置検出基準マーク
JP2010509709A (ja) * 2006-10-24 2010-03-25 ビー・ナノ・リミテッド インターフェース、非真空環境内で物体を観察する方法、および走査型電子顕微鏡
JP2008262886A (ja) * 2007-04-12 2008-10-30 Beam Seiko:Kk 走査型電子顕微鏡装置
JP5699023B2 (ja) * 2011-04-11 2015-04-08 株式会社日立ハイテクノロジーズ 荷電粒子線装置

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003282411A (ja) * 2002-03-25 2003-10-03 Mitsubishi Materials Corp リソグラフィー用のダイヤモンドウェハ、マスクブランクス及びマスク並びにダイヤモンドウェハの製造方法
JP2006147430A (ja) * 2004-11-22 2006-06-08 Hokkaido Univ 電子顕微鏡
CN101241026A (zh) * 2007-02-06 2008-08-13 Fei公司 用于同时利用粒子和光子来观察试样的粒子-光学装置
WO2012104942A1 (ja) * 2011-01-31 2012-08-09 株式会社 日立ハイテクノロジーズ 荷電粒子線装置

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110186944A (zh) * 2018-02-23 2019-08-30 台湾电镜仪器股份有限公司 检验容器以及电子显微镜
CN110186944B (zh) * 2018-02-23 2021-11-09 台湾电镜仪器股份有限公司 检验容器以及电子显微镜

Also Published As

Publication number Publication date
JP2014053073A (ja) 2014-03-20
KR20150036541A (ko) 2015-04-07
WO2014038287A1 (ja) 2014-03-13
US20150206705A1 (en) 2015-07-23

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Application publication date: 20150429