KR20150036541A - 하전 입자선 장치용 부재, 하전 입자선 장치 및 격막 부재 - Google Patents

하전 입자선 장치용 부재, 하전 입자선 장치 및 격막 부재 Download PDF

Info

Publication number
KR20150036541A
KR20150036541A KR1020157003635A KR20157003635A KR20150036541A KR 20150036541 A KR20150036541 A KR 20150036541A KR 1020157003635 A KR1020157003635 A KR 1020157003635A KR 20157003635 A KR20157003635 A KR 20157003635A KR 20150036541 A KR20150036541 A KR 20150036541A
Authority
KR
South Korea
Prior art keywords
diaphragm
sample
chamber
charged particle
casing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
KR1020157003635A
Other languages
English (en)
Korean (ko)
Inventor
노리유키 사쿠마
유스케 오미나미
Original Assignee
가부시키가이샤 히다치 하이테크놀로지즈
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 가부시키가이샤 히다치 하이테크놀로지즈 filed Critical 가부시키가이샤 히다치 하이테크놀로지즈
Publication of KR20150036541A publication Critical patent/KR20150036541A/ko
Ceased legal-status Critical Current

Links

Images

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/16—Vessels; Containers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/18—Vacuum locks ; Means for obtaining or maintaining the desired pressure within the vessel
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/20—Means for supporting or positioning the object or the material; Means for adjusting diaphragms or lenses associated with the support
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/006—Details of gas supplies, e.g. in an ion source, to a beam line, to a specimen or to a workpiece
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/02—Details
    • H01J2237/0203—Protection arrangements
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/06—Sources
    • H01J2237/063—Electron sources
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/16—Vessels
    • H01J2237/164—Particle-permeable windows
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/16—Vessels
    • H01J2237/166—Sealing means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/18—Vacuum control means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/18—Vacuum control means
    • H01J2237/182—Obtaining or maintaining desired pressure
    • H01J2237/1825—Evacuating means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/20—Positioning, supporting, modifying or maintaining the physical state of objects being observed or treated
    • H01J2237/2005—Seal mechanisms
    • H01J2237/2006—Vacuum seals
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/20—Positioning, supporting, modifying or maintaining the physical state of objects being observed or treated
    • H01J2237/202—Movement
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/26—Electron or ion microscopes
    • H01J2237/2602—Details
    • H01J2237/2605—Details operating at elevated pressures, e.g. atmosphere
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/26—Electron or ion microscopes
    • H01J2237/2602—Details
    • H01J2237/2605—Details operating at elevated pressures, e.g. atmosphere
    • H01J2237/2608—Details operating at elevated pressures, e.g. atmosphere with environmental specimen chamber
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/26—Electron or ion microscopes
    • H01J2237/28—Scanning microscopes
    • H01J2237/2801—Details

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
KR1020157003635A 2012-09-05 2013-07-11 하전 입자선 장치용 부재, 하전 입자선 장치 및 격막 부재 Ceased KR20150036541A (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2012194664A JP2014053073A (ja) 2012-09-05 2012-09-05 荷電粒子線装置用部材、荷電粒子線装置および隔膜部材
JPJP-P-2012-194664 2012-09-05
PCT/JP2013/069050 WO2014038287A1 (ja) 2012-09-05 2013-07-11 荷電粒子線装置用部材、荷電粒子線装置および隔膜部材

Publications (1)

Publication Number Publication Date
KR20150036541A true KR20150036541A (ko) 2015-04-07

Family

ID=50236905

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020157003635A Ceased KR20150036541A (ko) 2012-09-05 2013-07-11 하전 입자선 장치용 부재, 하전 입자선 장치 및 격막 부재

Country Status (5)

Country Link
US (1) US20150206705A1 (enExample)
JP (1) JP2014053073A (enExample)
KR (1) KR20150036541A (enExample)
CN (1) CN104584180A (enExample)
WO (1) WO2014038287A1 (enExample)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20230077436A (ko) * 2021-11-25 2023-06-01 재단법인 한국전자기계융합기술원 대기중으로 빔을 인출하는 빔 가공 장치 및 그 제어 방법
KR102817234B1 (ko) * 2025-02-02 2025-06-09 (주)코셈 수동 xy 얼라인 수단 및 가스 주입수단을 구비한 대기압 전자 현미경용 멤브레인 어댑터, 및 이를 구비하는 대기압 전자현미경

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6207824B2 (ja) * 2012-10-01 2017-10-04 株式会社日立ハイテクノロジーズ 荷電粒子線装置、隔膜の位置調整方法および隔膜位置調整ジグ
WO2014181685A1 (ja) * 2013-05-10 2014-11-13 株式会社日立ハイテクノロジーズ 荷電粒子線装置
DE112014003352B4 (de) * 2013-09-06 2023-02-02 Hitachi High-Tech Corporation Mit einem Strahl geladener Teilchen arbeitende Vorrichtung und Probenbilderfassungsverfahren
US9875878B2 (en) * 2013-12-05 2018-01-23 Hitachi, Ltd. Sample holder and analytical vacuum device
US10832885B2 (en) * 2015-12-23 2020-11-10 Massachusetts Institute Of Technology Electron transparent membrane for cold cathode devices
US20210233740A1 (en) * 2016-04-22 2021-07-29 Hitachi High-Technologies Corporation Charged Particle Microscope and Method of Imaging Sample
JP6916074B2 (ja) * 2017-09-20 2021-08-11 浜松ホトニクス株式会社 電子放出管、電子照射装置及び電子放出管の製造方法
CN110186944B (zh) * 2018-02-23 2021-11-09 台湾电镜仪器股份有限公司 检验容器以及电子显微镜
WO2022219699A1 (ja) * 2021-04-13 2022-10-20 株式会社日立ハイテク 透過型電子顕微鏡
WO2024142368A1 (ja) * 2022-12-28 2024-07-04 株式会社日立ハイテク 荷電粒子ビーム装置、及び荷電粒子ビーム装置の調整方法

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5142461A (enExample) * 1974-10-09 1976-04-10 Ryoji Takahashi
JPH01117028A (ja) * 1987-10-30 1989-05-09 Nec Corp 電子線位置検出基準マーク
JP3736487B2 (ja) * 2002-03-25 2006-01-18 三菱マテリアル株式会社 リソグラフィー用のダイヤモンドウェハ、マスクブランクス及びマスク並びにダイヤモンドウェハの製造方法
JP2006147430A (ja) * 2004-11-22 2006-06-08 Hokkaido Univ 電子顕微鏡
JP2010509709A (ja) * 2006-10-24 2010-03-25 ビー・ナノ・リミテッド インターフェース、非真空環境内で物体を観察する方法、および走査型電子顕微鏡
EP1956633A3 (en) * 2007-02-06 2009-12-16 FEI Company Particle-optical apparatus for simultaneous observing a sample with particles and photons
JP2008262886A (ja) * 2007-04-12 2008-10-30 Beam Seiko:Kk 走査型電子顕微鏡装置
JP5320418B2 (ja) * 2011-01-31 2013-10-23 株式会社日立ハイテクノロジーズ 荷電粒子線装置
JP5699023B2 (ja) * 2011-04-11 2015-04-08 株式会社日立ハイテクノロジーズ 荷電粒子線装置

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20230077436A (ko) * 2021-11-25 2023-06-01 재단법인 한국전자기계융합기술원 대기중으로 빔을 인출하는 빔 가공 장치 및 그 제어 방법
KR102817234B1 (ko) * 2025-02-02 2025-06-09 (주)코셈 수동 xy 얼라인 수단 및 가스 주입수단을 구비한 대기압 전자 현미경용 멤브레인 어댑터, 및 이를 구비하는 대기압 전자현미경

Also Published As

Publication number Publication date
JP2014053073A (ja) 2014-03-20
CN104584180A (zh) 2015-04-29
WO2014038287A1 (ja) 2014-03-13
US20150206705A1 (en) 2015-07-23

Similar Documents

Publication Publication Date Title
KR20150036541A (ko) 하전 입자선 장치용 부재, 하전 입자선 장치 및 격막 부재
KR101840232B1 (ko) 주사 전자 현미경 및 화상 생성 방법
KR101752164B1 (ko) 하전 입자선 장치 및 시료 화상 취득 방법
US8933400B2 (en) Inspection or observation apparatus and sample inspection or observation method
JP6078637B2 (ja) 荷電粒子線装置およびフィルタ部材
US9472375B2 (en) Charged particle beam device, sample stage unit, and sample observation method
US9466457B2 (en) Observation apparatus and optical axis adjustment method
EP2457078A1 (en) Nanofluidic cell
KR20150016349A (ko) 하전 입자선 장치
WO2014069470A1 (ja) 試料格納容器、荷電粒子線装置、及び画像取得方法
US20170069458A1 (en) Sample holder, observation system, and image generation method
KR102000407B1 (ko) 하전 입자 현미경의 관찰 지원 유닛 및 이것을 사용한 시료 관찰 방법
US9633817B2 (en) Diaphragm mounting member and charged particle beam device
US9240305B2 (en) Charged particle beam device and sample observation method
JP6419965B2 (ja) 試料高さ調整方法及び観察システム
WO2013129196A1 (ja) 荷電粒子線装置及び荷電粒子線照射方法
JP6668618B2 (ja) 電子顕微鏡観察用の試料保持チップ
JP2017004787A (ja) 電子顕微鏡用試料保持体及びその作製方法
KR101682522B1 (ko) 시료 관찰 방법

Legal Events

Date Code Title Description
A201 Request for examination
PA0105 International application

Patent event date: 20150211

Patent event code: PA01051R01D

Comment text: International Patent Application

PA0201 Request for examination
PG1501 Laying open of application
E902 Notification of reason for refusal
PE0902 Notice of grounds for rejection

Comment text: Notification of reason for refusal

Patent event date: 20160608

Patent event code: PE09021S01D

E601 Decision to refuse application
PE0601 Decision on rejection of patent

Patent event date: 20160818

Comment text: Decision to Refuse Application

Patent event code: PE06012S01D

Patent event date: 20160608

Comment text: Notification of reason for refusal

Patent event code: PE06011S01I