CN104425331B - Turntable positioning device, loading Transmission system and plasma processing device - Google Patents
Turntable positioning device, loading Transmission system and plasma processing device Download PDFInfo
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- CN104425331B CN104425331B CN201310406341.4A CN201310406341A CN104425331B CN 104425331 B CN104425331 B CN 104425331B CN 201310406341 A CN201310406341 A CN 201310406341A CN 104425331 B CN104425331 B CN 104425331B
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
- H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
- H01L21/68771—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by supporting more than one semiconductor substrate
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/68—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
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- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67242—Apparatus for monitoring, sorting or marking
- H01L21/67259—Position monitoring, e.g. misposition detection or presence detection
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67739—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
- H01L21/67742—Mechanical parts of transfer devices
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- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
- H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
- H01L21/68764—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by a movable susceptor, stage or support, others than those only rotating on their own vertical axis, e.g. susceptors on a rotating caroussel
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Abstract
Turntable positioning device that the present invention is provided, Transmission system and plasma processing device are loaded, it includes rotating disk, origin detection unit and detection unit in place, wherein, station is provided with rotating disk, to carry workpiece；Origin detection unit is used for the origin position for detecting rotating disk；Detection unit includes first detection module and the first mark module in place, wherein, the first mark module is used to identify position of the station on rotating disk；First detection module is used to judge whether station reaches precalculated position by detecting the first mark module.Whether the turntable positioning device that the present invention is provided, its station that can monitor rotating disk reaches precalculated position, so as to the malposition for the station appearance for knowing rotating disk in time.
Description
Technical field
The invention belongs to semiconductor equipment manufacture field, and in particular to a kind of turntable positioning device, load Transmission system and
Plasma processing device.
Background technology
With continuing to develop for microelectric technique, the competition of associated production enterprise is more and more fierce, reduces cost, improves life
Production efficiency is then the conventional means for improving enterprise competitiveness.For example, in order to improve production efficiency, reduction production cost, carrying out
During technique, using Transmission system realization is loaded to multiple substrates while carrying out different processes, increasingly increased with tackling
The market demand.
Fig. 1 is a kind of existing schematic diagram for loading Transmission system.Fig. 2A is the top view of reaction chamber in Fig. 1.Fig. 2 B
For along the sectional view of Fig. 2A line A-A.As shown in figure 1, loading Transmission system includes handling chamber 1, transmission chamber 2 and reaction chamber
Room 3.Wherein, handling chamber 1 is used to load or unloading substrate；Transmission chamber 2 is arranged between handling chamber 1 and reaction chamber 3,
And manipulator 21 is provided with, to the substrate transport between handling chamber 1 and reaction chamber 3.
As shown in Figure 2 A and 2 B, reaction chamber 3 includes rotating disk 31, turntable rotation mechanism 35, target 32, thimble 33, top
Needle lifting mechanism 36, pedestal 34 and pedestal elevating mechanism 37.The main working process of reaction chamber 3 is：Turntable rotation mechanism 35
Driving rotating disk 31 rotates, so that one of station rotary in eight stations is extremely used for the loading position for loading and unloading substrate 40（Such as
The position of station 1 in Fig. 1）；Thimble elevating mechanism 36, which drives, is arranged on the bottom of rotating disk 31 and corresponding to the top of the loading position
Pin 33 rises, so that the top of thimble 33 is through rotating disk 31 and higher than its upper surface；Substrate 40 is placed in thimble 33 by manipulator 21
Top；Thimble elevating mechanism 36 drives the thimble 33 for carrying substrate 40 to decline, until the top of thimble 33 is located at rotating disk 31
Lower section, now substrate 40 falls on the station in loading position, so as to complete the loading of a substrate；Treat all stations
It is mounted with after substrate 40, the driving rotating disk 31 of turntable rotation mechanism 35 rotates, so that wherein four stations in eight stations
It is correspondingly located at the lower section of four targets 32；The driving of pedestal elevating mechanism 37 is located at the bottom of rotating disk 31, and corresponding to each target
32 four pedestals 34 rise, so that rotating disk 31 is run through in the upper surface of pedestal 34, and hold up the substrate 40 on corresponding station, until
Reach be arranged on chamber roof and the through hole 38 corresponding with target 32 bottom, now target 32, through hole 38 and pedestal 34
Upper surface form sub-chamber, four sub-chamber are used to carry out substrate 40 different processes simultaneously；Treat after the completion of time process,
The driving pedestal 34 of pedestal elevating mechanism 37 declines, until the upper surface of pedestal 34 is located at the lower section of rotating disk 31, now substrate 40 falls
On the corresponding station of rotating disk 31；The driving rotating disk 31 of turntable rotation mechanism 35 rotates, so as to complete when each station of time process
Below rotation to the target 32 corresponding to subsequent processing；Repeat above-mentioned " rising substrate ", " processing substrate ", " decline substrate " and
The step of " rotary substrate ", until each substrate 40 completes all processes.
Before the above-mentioned course of work is carried out, in addition it is also necessary to carry out origin search to rotating disk by turntable positioning device, so that
Rotating disk can rotate since origin position, so as to complete the rotational positioning of each station.Fig. 3 is a kind of existing rotating disk positioning
The top view of device.As shown in figure 3, turntable positioning device includes the origin projection 41 being arranged on the periphery wall of rotating disk 31, with
And it is arranged on the laser diffusion sensor 43 in the outside of transparent windows 42 of reaction chamber 3.When carrying out origin search, when sharp
When light diffusing reflection sensor 43 detects origin projection 41, it is believed that now the motor in turntable rotation mechanism is in origin position
Put, then control the motor to carry out absolute movement, specified angle is rotated with driving rotating disk 31.In addition, in turntable rotation mechanism
Motor generally has motion controller, and it can detect the anglec of rotation of motor in real time, so as to be carried according to by the motion controller
The feedback signal of confession, can know the anglec of rotation of rotating disk 31, and then whether in place may determine that the station of rotating disk.
Above-mentioned turntable positioning device is inevitably present problems with actual applications, i.e.,：
Because above-mentioned turntable positioning device can only carry out original point position to rotating disk, and it can not monitor and turn in technical process
Whether the station of disk reaches precalculated position, leads to not the malposition for knowing that the station of rotating disk occurs in time, so as to not only can
Cause the course of work not continue, and may also result in mechanical breakdown, and then reduce the safety of plasma processing device
Property and stability.
Although the motion controller of motor can know the anglec of rotation of rotating disk indirectly by detecting the anglec of rotation of motor
Degree, still, transmission due to turntable rotation mechanism itself and its between rotating disk often because machine error and caused by rotating disk
The anglec of rotation produces deviation, so as to cause to occur motor in technical process to be rotated in place and the feelings of the station of rotating disk not in place
Condition, or because the angular deviation amplification of rotating disk the angular deviation of turntable rotation mechanism can be occurred without departing from fair by disk edge
Perhaps scope, and the angular deviation of disk edge exceeds the situation of allowed band.When there are above-mentioned two situations, the motion of motor
Whether in place controller can still provide the station feedback signal in place for representing rotating disk, cause to the misjudgment of the station of rotating disk,
This can equally cause mechanical breakdown, so as to reduce the safety and stability of plasma processing device.
The content of the invention
Present invention seek to address that technical problem present in prior art is passed there is provided a kind of turntable positioning device, loading
Whether defeated system and plasma processing device, its station that can monitor rotating disk reach precalculated position, so as to obtain in time
Know the malposition that the station of rotating disk occurs.
To realize that the purpose of the present invention provides a kind of turntable positioning device, including rotating disk and origin detection unit, wherein,
Station is provided with the rotating disk, to carry workpiece；The origin detection unit is used for the origin position for detecting rotating disk, its
It is characterised by, in addition to detection unit in place, it includes first detection module and the first mark module, wherein, first mark
Knowing module is used to identify position of the station on the rotating disk；The first detection module is used for by detecting described first
Mark module judges whether the station reaches precalculated position.
Wherein, first mark module includes the first convex portion, and first convex portion is arranged on the periphery wall of the rotating disk
On, and at the position corresponding with the station；The first detection module includes the first range sensor and the first control
Device processed, wherein, first range sensor is arranged on the periphery of the rotating disk periphery wall, in the rotating disk from its origin
When position rotates, signal is detected towards the outlet openings that first convex portion is passed through, and receive from each position on the path
Feedback signal, and the feedback signal is sent to first controller；First controller is used in the rotating disk
When rotation is to predetermined angular, judge whether the feedback signal comes from first convex portion, if, it is determined that the station is reached
Precalculated position；If not, it is determined that malposition occurs in the station；The predetermined angular reaches predetermined for the default station
The angle for needing the rotating disk to be rotated from its origin position during position.
Wherein, the quantity of the station is multiple, and being provided at circumferentially spaced along the rotating disk, and first distance
The quantity of sensor is less equal than the quantity of the station；The quantity of first convex portion and position and the quantity of the station
Corresponded with position, and when the rotating disk is in origin position, the position of each first range sensor and all first
The position of one of them in convex portion is corresponding, and the first different convex portion of each first range sensor correspondence.
Wherein, the quantity of the station is multiple, and being provided at circumferentially spaced along the rotating disk, and first convex portion
Quantity be less equal than the station quantity；When the rotating disk is in origin position, first range sensor
Quantity and position are corresponded with the quantity of the station and position, and the position of each first convex portion is passed with all first distances
The position of one of them in sensor is corresponding, and the first different range sensor of each first convex portion correspondence.
Wherein, the origin detection unit includes the second detection module and the second mark module, wherein second mark
Module is used for the origin position for identifying the rotating disk；Second detection module be used for by detect second mark module come
Judge the origin position of the rotating disk.
Wherein, second mark module includes the second convex portion, and second convex portion is arranged on the periphery wall of the rotating disk
On, and at the position corresponding with the origin position of the rotating disk；Second detection module is sensed including second distance
Device and second controller, wherein, the second distance sensor is arranged on the periphery of the rotating disk periphery wall, at described turn
During disc spins, signal is detected towards the outlet openings that second convex portion is passed through, and receive each position on the path
Feedback signal, and the feedback signal is sent to the second controller；The second controller is used to judge the feedback
Whether signal comes from second convex portion, if so, then determining that the rotating disk reaches origin according to the position of second convex portion
Position.
Wherein, first convex portion includes stretching out the first extension of the lower surface of the rotating disk, and second convex portion
Including the second extension of the upper surface for stretching out the rotating disk；First range sensor and second distance sensor court respectively
The outlet openings passed through to first extension and the second extension detect signal.
Wherein, first convex portion includes stretching out the first extension of the upper surface of the rotating disk, and second convex portion
Including the second extension of the lower surface for stretching out the rotating disk；First range sensor and second distance sensor court respectively
The outlet openings passed through to first extension and the second extension detect signal.
Wherein, on loading end of first mark module where including being arranged on the station of the rotating disk, and through institute
The first through hole of rotating disk thickness is stated, and the first through hole is located at the position corresponding with the station；First inspection
Surveying module includes the first opposite type sensor and the first controller, wherein, first opposite type sensor includes being separately positioned on institute
The transmitting terminal and receiving terminal of the both sides up and down of rotating disk are stated, the transmitting terminal is used for when the rotating disk rotates from its origin position,
Signal is detected towards the outlet openings that the first through hole on the loading end is passed through；The receiving terminal, which is used to receive, comes from institute
The detection signal through the first through hole of transmitting terminal is stated, and the detection signal is sent to first controller；Institute
Stating the first controller is used in the turntable rotation to predetermined angular, judges whether the receiving terminal receives the detection letter
Number, if, it is determined that the station reaches precalculated position；If not, it is determined that malposition occurs in the station；The predetermined angle
Spend the angle for needing the rotating disk to be rotated from its origin position when reaching precalculated position for the default station.
Wherein, the quantity of the station is multiple, and being provided at circumferentially spaced along the rotating disk, and described first pair is penetrated
The quantity of sensor is less equal than the quantity of the station；The quantity of the first through hole and position and the quantity of the station
Corresponded with position, and when the rotating disk is in origin position, each first pair is penetrated the transmitting terminal for putting sensor and reception
The position at end is corresponding with the position of one of them in all first through hole, and the transmitting terminal of each the first opposite type sensor
Different first through hole corresponding with receiving terminal.
Wherein, the quantity of the station is multiple, and being provided at circumferentially spaced along the rotating disk, and the first through hole
Quantity be less equal than the station quantity；When the rotating disk is in origin position, first opposite type sensor
Quantity and position are corresponded with the quantity of the station and position, and biography is penetrated in the position of each first through hole with all first pairs
The transmitting terminal of one of them in sensor is corresponding with the position of receiving terminal, and different the first couple of each first through hole correspondence
Penetrate the transmitting terminal and receiving terminal of sensor.
Wherein, the origin detection unit includes the second detection module and the second mark module, wherein second mark
Module is used for the origin position for identifying the rotating disk；Second detection module be used for by detect second mark module come
Judge the origin position of the rotating disk.
Wherein, on loading end of second mark module where including being arranged on the station of the rotating disk, and through institute
The second through hole of rotating disk thickness is stated, and second through hole is located at the position corresponding with the origin position of the rotating disk；
Second detection module includes the second opposite type sensor and second controller, wherein, second opposite type sensor includes dividing
The transmitting terminal and receiving terminal of the both sides up and down of the rotating disk are not arranged on, and the transmitting terminal is used in the turntable rotation, court
The outlet openings passed through to second through hole on the loading end detect signal；The receiving terminal is used to receive from described
The detection signal through second through hole of transmitting terminal, and the detection signal is sent to the second controller；It is described
Second controller is used to judge whether the receiving terminal receives the detection signal, if, it is determined that the rotating disk reaches former
Point position.
Wherein, the centre-to-centre spacing between the first through hole and the rotating disk be not equal to second through hole and the rotating disk it
Between centre-to-centre spacing.
Preferably, the second controller resets the rotation of the rotating disk when determining that the rotating disk reaches origin position every time
Gyration.
To realize that the purpose of the present invention also provides a kind of loading Transmission system, including handling chamber, transmission chamber and reaction
Chamber, wherein, the handling chamber is used to load or unloading substrate；The transmission chamber is arranged on handling chamber and reaction chamber
Between, and manipulator is provided with, to the substrate transport between the handling chamber and reaction chamber；The reaction chamber includes
Turntable positioning device, substrate is rotated to precalculated position, the turntable positioning device uses above-mentioned turntable positioning device.
To realize that the purpose of the present invention also provides a kind of plasma processing device, it includes loading Transmission system, and it is special
Levy and be, the loading Transmission system uses above-mentioned turntable positioning device.
The present invention has following beneficial effects：
The turntable positioning device that the present invention is provided, its in place detection unit by being detected by first detection module for marking
Know the first mark module of position of the station on rotating disk, it can be determined that whether the station reaches precalculated position, so as to and
When know the malposition that the station of rotating disk occurs, and then can not only ensure being normally carried out for the course of work, and can keep away
Exempt from occur mechanical breakdown, and then the safety and stability of plasma processing apparatus can be improved.
The loading Transmission system that the present invention is provided, it is by using the above-mentioned turntable positioning device that provides of the present invention by substrate
Rotation can not only ensure being normally carried out for the course of work to precalculated position, and can avoid occurring mechanical breakdown, so as to
To improve the safety and stability of plasma processing apparatus.
The plasma processing device that the present invention is provided its by using the above-mentioned loading Transmission system that provides of the present invention, no
Being normally carried out for the course of work can only be ensured, and can avoid occurring mechanical breakdown, so as to improve gas ions processing
The safety and stability of equipment.
Brief description of the drawings
Fig. 1 is a kind of existing schematic diagram for loading Transmission system；
Fig. 2A is the top view of reaction chamber in Fig. 1；
Fig. 2 B are the sectional view along Fig. 2A line A-A；
Fig. 3 is a kind of existing top view of turntable positioning device；
Fig. 4 A are a kind of top view for turntable positioning device that the embodiment of the present invention one is provided；
Fig. 4 B are Fig. 4 A in side view upward A；
Fig. 5 A are the top view for another turntable positioning device that the embodiment of the present invention one is provided；
Fig. 5 B are Fig. 5 A in side view upward A；
Fig. 6 A are the top view for the turntable positioning device that the embodiment of the present invention two is provided；And
Fig. 6 B are the sectional view along A-A in Fig. 6 A.
Embodiment
To make those skilled in the art more fully understand technical scheme, the present invention is carried below in conjunction with the accompanying drawings
Turntable positioning device, loading Transmission system and the plasma processing device of confession are described in detail.
The turntable positioning device that the present invention is provided includes rotating disk, origin detection unit and detection unit in place.Wherein, turning
Station is provided with disk, to carry workpiece；Origin detection unit includes the second detection module and the second mark module, the second mark
Know the origin position that module is used to identify rotating disk；Second detection module is used to judge rotating disk by detecting the second mark module
Origin position.Detection unit includes first detection module and the first mark module in place, and the first mark module is used to identify station
Position on rotating disk；First detection module is used to judge whether station reaches pre-determined bit by detecting the first mark module
Put.By detecting the first mark module by the first detection module of detection unit in place, it can be determined that it is pre- whether station reaches
Positioning is put, and so as to the malposition for the station appearance for knowing rotating disk in time, and then not only can ensure the course of work just
Often carry out, and can avoid occurring mechanical breakdown, and then the safety and stability of plasma processing apparatus can be improved.
Embodiment one
Fig. 4 A are a kind of top view for turntable positioning device that the embodiment of the present invention one is provided.Fig. 4 B are that Fig. 4 A are upward in A
Side view.Also referring to Fig. 4 A and Fig. 4 B, in the present embodiment, station 51, the number of station 51 are provided with rotating disk 50
Measure to be multiple, and being provided at circumferentially spaced along rotating disk 50.
In detection unit in place, the first mark module includes the first convex portion 54, and the first convex portion 54 is arranged on rotating disk 50
On periphery wall, and quantity and position are corresponded with the quantity of station 51 and position；First detection module includes the first distance and passed
The controller of sensor 52 and first（Not shown in figure）, wherein, the first range sensor 52 is arranged on the periphery of the periphery wall of rotating disk 50,
When rotating disk 50 rotates from its origin position, signal is detected towards the outlet openings that the first convex portion 54 is passed through, and receive
Feedback signal from each position on the path, and the feedback signal is sent to the first controller.In the present embodiment, first
The quantity of range sensor 52 be less equal than station 51 quantity, and rotating disk 50 be in origin position when, each first away from
Position from sensor 52 is corresponding with the position of one of them in all first convex portions 54, and each first Distance-sensing
The first different convex portion 54 of the correspondence of device 52.For example, in Figure 4 A, the respective quantity in 51 and first convex portion of station 54 is eight；
The quantity of first range sensor 52 is one, and when rotating disk 50 is in origin position, first range sensor 52 and position
The first convex portion 54 in the top is corresponding.First controller is used for when rotating disk 50 is rotated to predetermined angular, judges feedback letter
Number whether come from the first convex portion 54, if, it is determined that station reach precalculated position；If not, it is determined that the station 51 of rotating disk occurs
Malposition.So-called predetermined angular, refers to need what rotating disk rotated from its origin position when default station reaches precalculated position
Angle.For example, in Figure 4 A, if setting reaches the pre-determined bit positioned at the top of rotating disk 50 positioned at the first convex portion 54 of bottom
Put, then need rotating disk 50 to rotate 180 ° from current origin position, now the first controller judges whether feedback signal comes from the
One convex portion 54, if, it is determined that station 51 reaches precalculated position；If not, it is determined that the malposition that the station 51 of rotating disk occurs.
In origin detection unit, the second mark module includes the second convex portion 55, and the second convex portion 55 is arranged on rotating disk 50
On periphery wall, and at the position corresponding with the origin position of rotating disk 50, as shown in Figure 4 A；Second detection module includes the
Two range sensors 53 and second controller（Not shown in figure）, wherein, second distance sensor 53 is arranged on the periphery of rotating disk 50
The periphery of wall, to when rotating disk 50 rotates, the outlet openings of the second convex portion 55 of direction process detect signal, and reception comes from and is somebody's turn to do
The feedback signal of each position on path, and feedback signal is sent to second controller；Second controller is used to judge to feed back
Whether signal comes from the second convex portion 55, if so, then determining that rotating disk 50 reaches origin position according to the position of the second convex portion 55.
Preferably, second controller resets the anglec of rotation of rotating disk 50 when determining that rotating disk 50 reaches origin position every time,
That is, during rotating disk 50 rotates, as long as second controller judges that feedback signal is to come from the second convex portion 55, it will turn at once
The anglec of rotation of disk 50 resets to zero.Because the radius of rotating disk 50 can influence the anglec of rotation error of rotating disk 50, i.e. rotating disk 50
Radius is bigger, then the anglec of rotation error of rotating disk 50 is bigger, on the contrary then smaller, and because the anglec of rotation error of rotating disk 50 can be with
The increase of the rotating cycle of rotating disk 50 and constantly increase, ultimately result in the anglec of rotation error of rotating disk 50 beyond the safety allowed
Scope, so as to cause the positioning to rotating disk 50 inaccurate.Therefore, by determining that rotating disk 50 is reached every time by second controller
The anglec of rotation of rotating disk 50 is reset during origin position, rotating disk 50 can be removed and rotate anglec of rotation error produced by each circle,
Equivalent to the repositioning of the origin position of rotating disk 50, so as to by the anglec of rotation control errors of rotating disk 50 permission peace
In gamut.
In the present embodiment, one of them in the second convex portion 55 and the first convex portion 54 is arranged on same position, and two
Person uses integral structure, as shown in Figure 4 B, also, in order that the first range sensor 52 is only capable of detecting the first convex portion 54,
And second distance sensor 53 is only capable of detecting the second convex portion 55, the first convex portion 54 includes stretching out the first of the upper surface of rotating disk 50
Extension 541, and the second convex portion 55 includes the second extension 551 of the lower surface of stretching rotating disk, and the first range sensor
52 and second distance sensor 53 be respectively facing the outlet openings detection letter that the first extension 541 and the second extension 551 pass through
Number.
Because the first extension 541 and the in the vertical direction of the second extension 551 have difference in height, this causes the first distance
Sensor 52 is only capable of detecting the path of the first extension 541 process, and second distance sensor 53 is only capable of detecting second and prolonged
The path that extending portion 551 is passed through, thereby may be ensured that the first range sensor 52 and second distance sensor 53 will not be by second
The interference of the convex portion 54 of convex portion 55 and first.In addition, by the first extension 541 and the second extension 551, the first distance can be made
Sensor 52 and the detection signal of each spontaneous emission of second distance sensor 53 are higher or lower than the periphery wall of rotating disk 50, so as to enter
During row detection in place or origin detection, only when the first extension 541 and the second extension 551 respectively through first away from
During from sensor 52 and second distance sensor 53, the first range sensor 52 and second distance sensor 53 just receive feedback
Signal, this can not only improve the detection sensitivity of the first range sensor 52 and second distance sensor 53, and without to turning
The planarization of the periphery wall of disk 50 proposes very high requirement, so as to reduce difficulty of processing, and then can reduce processing cost.
Certainly, in actual applications, the first convex portion can also include the first extension for stretching out the lower surface of rotating disk, and the
Two convex portions include stretching out the second extension of the upper surface of rotating disk, and the first range sensor and second distance sensor difference
The outlet openings detection signal passed through towards the first extension and the second extension.
In addition it is also possible to save the first extension and the second extension, and make the detection faces and the first distance of the first convex portion
Level interval between sensor is different from the level interval between the detection faces of the second convex portion and second distance sensor, i.e.
First convex portion is different in the length radially of rotating disk from the second convex portion, so that the first range sensor and second distance sensor
First convex portion and the second convex portion are recognized according to the distance detected.
It should be noted that in the present embodiment, first detection module and the second detection module use laser reflection type
Range sensor is detected, but the invention is not limited in this, in actual applications, can also be passed using other kinds of
Sensor, and according to the difference of kind of sensor, can correspondingly adjust the installation side of first detection module and the second detection module
Method, the position relative to rotating disk and apart from etc. parameter, and structure and size, the material of the first identification module and the second identification module
The parameter such as material and mounting means also should be correspondingly adjusted.As long as origin detection unit can detect the origin position of rotating disk,
And detection unit can monitor the station of rotating disk and whether reach precalculated position in place.
It should also be noted that, in the present embodiment, the quantity and position of the quantity of the first convex portion 54 and position with station 51
Correspond, and quantity of the quantity less equal than station 51 of the first range sensor 52, but the invention is not limited in
This, in actual applications, it would however also be possible to employ following set-up modes：As shown in Figure 5 A and 5B, it is less than the quantity of the first convex portion 54
Or equal to the quantity of station；When rotating disk is in origin position, the quantity of the first range sensor 52 and position and station 51
Quantity and position are corresponded, and the position of each first convex portion 54 and one of them in all first range sensors 52
Position is corresponding, and the first different range sensor 52 of each first convex portion 54 correspondence.For example, in fig. 5, station 51
It it is eight with the respective quantity of the first range sensor 52；The quantity of first convex portion 54 is one, and is in original in rotating disk 50
During point position, first convex portion 54 is corresponding with the first range sensor 52 positioned at the top.
Explanation is needed further exist for, in the present embodiment, the second convex portion 55 is set with one of them in the first convex portion 54
Put on same position, in other words, the origin position of rotating disk 50 is corresponding with the position of one of station 51, but of the invention
It is not limited thereto, in actual applications, the origin position of rotating disk can according to specific needs and freely be set, i.e. second is convex
The position in portion can be different from the position of the first convex portion, and the two is separate.
Explanation is needed further exist for, in the present embodiment, the quantity of station 51 is multiple, and along between the circumference of rotating disk 50
Every setting, but the invention is not limited in this, in actual applications, station can also be one, and set according to specific needs
Put the specified location in rotating disk circumference.In addition, so-called first convex portion is located at the position corresponding with station, refer to that first is convex
Between portion and station have default position relationship, it is determined that the first convex portion position when, can be indirect according to the corresponding relation
Obtain the position of station.Similar therewith, so-called second convex portion is located at the position corresponding with the origin position of rotating disk, is
Referring to the origin position of the second convex portion and rotating disk has default position relationship, it is determined that the second convex portion position when, can basis
The corresponding relation obtains the origin position of rotating disk indirectly.
Embodiment two
Fig. 6 A are the top view for the turntable positioning device that the embodiment of the present invention two is provided.Fig. 6 B are in Fig. 6 A along A-A
Sectional view.Also referring to Fig. 6 A and Fig. 6 B, in the present embodiment, station 51, the quantity of station 51 are provided with rotating disk 50
To be multiple, and being provided at circumferentially spaced along rotating disk 50.
In detection unit in place, the first mark module includes being arranged on the loading end where the station 51 of rotating disk 50（That is,
The surface for being used to carry workpiece of rotating disk）On, and run through the first through hole 61 of the thickness of rotating disk 50, and the quantity of first through hole 61
Corresponded with the quantity and position of position and station 51；First detection module includes the first opposite type sensor 63 and the first control
Device（Not shown in figure）, wherein, the first opposite type sensor 63 include be separately positioned on rotating disk 50 both sides up and down transmitting terminal and
Receiving terminal, the transmitting terminal is used for when rotating disk 50 rotates from its origin position, the first through hole towards on the loading end of rotating disk 50
The 61 outlet openings detection signals passed through；The receiving terminal, which is used to receive the detection through first through hole 63 from transmitting terminal, to be believed
Number, and the detection signal is sent to the first controller.It is readily appreciated that, only in transmitting terminal, through hole and receiving terminal in vertical side
In the case of being in straight line upwards, the detection signal that spontaneous emission end is sent can just pass through through hole, and be received by receiving terminal.
In the present embodiment, the quantity of the first opposite type sensor 63 is less equal than the quantity of station 51, and in rotating disk 50
During in origin position, in the transmitting terminal of each first opposite type sensor 63 and the position of receiving terminal and all first through hole 61
The position of one of them is corresponding, and the transmitting terminal corresponding with receiving terminal different first of each the first opposite type sensor 63 leads to
Hole 61.For example, in fig. 6, station 51 and the respective quantity of first through hole 61 are eight；The number of first opposite type sensor 63
Measure as one, and when rotating disk 50 is in origin position, the transmitting terminal and receiving terminal of first opposite type sensor 63 turn with being located at
The first through hole 61 of the rightmost side of disk 50 is corresponding.First controller is used for when rotating disk 50 is rotated to predetermined angular, judges to receive
Whether end receives detection signal, if, it is determined that station 51 reaches precalculated position；If not, it is determined that position occurs in station 51
It is abnormal；So-called predetermined angular, refers to need what rotating disk 50 rotated from its origin position when default station 51 reaches precalculated position
Angle.For example, in fig. 6, if first through hole 61 of the setting positioned at the leftmost side of rotating disk 50 is reached positioned at the pre- of the rightmost side of rotating disk 50
Positioning is put, then needs rotating disk 50 to rotate 180 ° from current origin position, and now the first controller judges whether receiving terminal receives
To detection signal, if, it is determined that station 51 reaches precalculated position；If not, it is determined that the position that the station 51 of rotating disk occurs is different
Often.
In origin detection unit, the second mark module includes being arranged on the loading end at the place of station 51 of rotating disk 50,
And through the second through hole 60 of the thickness of rotating disk 50, and the second through hole 60 is located at the position corresponding with the origin position of rotating disk 50
Place, as shown in Figure 6B；Second detection module includes the second opposite type sensor 62 and second controller（Not shown in figure）, wherein,
Second opposite type sensor 62 includes being separately positioned on the transmitting terminal and receiving terminal of the both sides up and down of rotating disk 50, and the transmitting terminal is used for
When rotating disk 50 rotates, signal is detected towards the outlet openings that the second through hole 60 on the loading end of rotating disk 50 passes through；The receiving terminal
Sent for receiving the detection signal through the second through hole 60 from transmitting terminal, and by detection signal to second controller；The
Two controllers are used to judge whether receiving terminal receives detection signal, if, it is determined that rotating disk 50 reaches origin position.
Preferably, second controller resets the anglec of rotation of rotating disk 50 when determining that rotating disk 50 reaches origin position every time,
The remapping method and above-mentioned first embodiment are similar, due to there has been detailed description in the above-described first embodiment, herein not
Repeat again.
In the present embodiment, in order that the first opposite type sensor 63 is only capable of detecting first through hole 61, and second pair is penetrated biography
Sensor 62 is only capable of detecting the second through hole 60, and the centre-to-centre spacing L1 between the second through hole 60 and rotating disk is not equal to first through hole 61 with turning
Centre-to-centre spacing L2 between disk 50, as shown in Figure 6B, i.e. the path that the through hole 60 of first through hole 61 and second passes through is located at rotating disk respectively
At 50 circumferential different radiis, this can cause the first opposite type sensor 63 to be only capable of detecting the path of the process of first through hole 61,
And second opposite type sensor 62 be only capable of detecting the path of the second through hole 60 process, thereby may be ensured that the first opposite type sensor 63
With the second opposite type sensor 62 will not by the second through hole 60 and first through hole 61 interference.
It should be noted that in the present embodiment, the quantity and position of the quantity of first through hole 61 and position with station 51
Correspond, and quantity of the quantity less equal than station 51 of the first opposite type sensor 63, but the invention is not limited in
This, in actual applications, it would however also be possible to employ following set-up modes：The quantity of first through hole 61 is less equal than the number of station 51
Amount；When rotating disk 50 is in origin position, the quantity and position one of the quantity of the first opposite type sensor 63 and position with station 51
One correspondence, and the position of each first through hole 61 is corresponding with the position of one of them in all first opposite type sensors 63,
And the first different opposite type sensor 63 of each first through hole 61 correspondence.
The embodiment of the present invention also provides a kind of loading Transmission system, including handling chamber, transmission chamber and reaction chamber, its
In, handling chamber is used to load or unloading substrate；Transmission chamber is arranged between handling chamber and reaction chamber, and is set organic
Tool hand, to the substrate transport between handling chamber and reaction chamber；Reaction chamber includes turntable positioning device, to by substrate
Rotation is to precalculated position, and the turntable positioning device employs the turntable positioning device that the various embodiments described above of the present invention are provided.
Loading Transmission system provided in an embodiment of the present invention, it is fixed by using above-mentioned rotating disk provided in an embodiment of the present invention
Position device rotates substrate to precalculated position, can not only ensure being normally carried out for the course of work, and can avoid generation machine
Tool failure, so as to improve the safety and stability of plasma processing apparatus.
The present invention also provides a kind of plasma processing device, and it includes loading Transmission system, and the loading Transmission system is adopted
With above-mentioned turntable positioning device provided in an embodiment of the present invention.
Plasma processing device provided in an embodiment of the present invention, its above-mentioned loading provided by using the present invention is transmitted
System, can not only ensure being normally carried out for the course of work, and can avoid occurring mechanical breakdown, so as to improve ion
The safety and stability of body process equipment.
It is understood that the principle that embodiment of above is intended to be merely illustrative of the present and the exemplary implementation that uses
Mode, but the invention is not limited in this.For those skilled in the art, the original of the present invention is not being departed from
In the case of reason and essence, various changes and modifications can be made therein, and these variations and modifications are also considered as protection scope of the present invention.
Claims (10)
1. a kind of turntable positioning device, including rotating disk, are provided with station, to carry workpiece on the rotating disk；The rotating disk
Positioner also includes origin detection unit, the origin position for detecting rotating disk, it is characterised in that also including detecting list in place
Member, it includes first detection module and the first mark module, wherein
First mark module is used to identify position of the station on the rotating disk；The first detection module is used to lead to
Cross and detect first mark module to judge whether the station reaches precalculated position；
First mark module includes the first convex portion, and first convex portion is arranged on the periphery wall of the rotating disk, and is located at
At the position corresponding with the station；
The first detection module includes the first range sensor and the first controller, wherein,
First range sensor is arranged on the periphery of the rotating disk periphery wall, to be revolved in the rotating disk from its origin position
When turning, signal is detected towards the outlet openings that first convex portion is passed through, and receive the feedback of each position on the path
Signal, and the feedback signal is sent to first controller；
Whether first controller is used in the turntable rotation to predetermined angular, judge the feedback signal from described
First convex portion, if, it is determined that the station reaches precalculated position；If not, it is determined that malposition occurs in the station；It is described
Predetermined angular needs the angle that the rotating disk rotates from its origin position when reaching precalculated position for the default station.
2. turntable positioning device according to claim 1, it is characterised in that the quantity of the station is multiple, and along institute
State being provided at circumferentially spaced for rotating disk, and quantity of the quantity less equal than the station of first range sensor；
The quantity of first convex portion and position are corresponded with the quantity of the station and position, and are in original in the rotating disk
During point position, the position of each first range sensor is corresponding with the position of one of them in all first convex portions, and
The first different convex portion of each first range sensor correspondence.
3. turntable positioning device according to claim 1, it is characterised in that the quantity of the station is multiple, and along institute
State being provided at circumferentially spaced for rotating disk, and quantity of the quantity less equal than the station of first convex portion；
When the rotating disk is in origin position, the quantity of the quantity of first range sensor and position and the station and
Position is corresponded, and the position of each first convex portion is relative with the position of one of them in all first range sensors
Should, and the first different range sensor of each first convex portion correspondence.
4. turntable positioning device according to claim 1, it is characterised in that the origin detection unit includes the second detection
Module and the second mark module, wherein
Second mark module is used for the origin position for identifying the rotating disk；
Second detection module is used to judge the origin position of the rotating disk by detecting second mark module.
5. turntable positioning device according to claim 4, it is characterised in that it is convex that second mark module includes second
Portion, second convex portion is arranged on the periphery wall of the rotating disk, and positioned at the position corresponding with the origin position of the rotating disk
Put place；
Second detection module includes second distance sensor and second controller, wherein,
The second distance sensor is arranged on the periphery of the rotating disk periphery wall, in the turntable rotation, towards institute
The outlet openings detection signal of the second convex portion process is stated, and receives the feedback signal of each position on the path, and by institute
Feedback signal is stated to send to the second controller；
The second controller is used to judge whether the feedback signal comes from second convex portion, if so, then according to described the
The position of two convex portions and determine the rotating disk and reach origin position.
6. turntable positioning device according to claim 5, it is characterised in that first convex portion includes stretching out the rotating disk
Lower surface the first extension, and second convex portion includes stretching out the second extension of the upper surface of the rotating disk；
First range sensor and second distance sensor are respectively facing first extension and the second extension passes through
Outlet openings detection signal.
7. turntable positioning device according to claim 5, it is characterised in that first convex portion includes stretching out the rotating disk
Upper surface the first extension, and second convex portion includes stretching out the second extension of the lower surface of the rotating disk；
First range sensor and second distance sensor are respectively facing first extension and the second extension passes through
Outlet openings detection signal.
8. turntable positioning device according to claim 5, it is characterised in that the second controller is described in each determine
Rotating disk resets the anglec of rotation of the rotating disk when reaching origin position.
9. one kind loads Transmission system, including handling chamber, transmission chamber and reaction chamber, wherein, the handling chamber is used for
Load or unloading substrate；The transmission chamber is arranged between handling chamber and reaction chamber, and is provided with manipulator, to
Substrate transport between the handling chamber and reaction chamber；The reaction chamber includes turntable positioning device, substrate to be revolved
Go to precalculated position, it is characterised in that the turntable positioning device is using the rotating disk positioning described in claim 1-8 any one
Device.
10. a kind of plasma processing device, it includes loading Transmission system, it is characterised in that the loading Transmission system is adopted
With the loading Transmission system described in claim 9.
Priority Applications (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201310406341.4A CN104425331B (en) | 2013-09-09 | 2013-09-09 | Turntable positioning device, loading Transmission system and plasma processing device |
| CN201710992688.XA CN107818932B (en) | 2013-09-09 | 2013-09-09 | Turntable positioning device, loading and conveying system and plasma processing equipment |
| TW102144392A TWI588077B (en) | 2013-09-09 | 2013-12-04 | Turntable positioning device, loading and conveying system and plasma processing equipment |
| PCT/CN2013/088656 WO2015032136A1 (en) | 2013-09-09 | 2013-12-05 | Rotary table positioning device, load transmission system and plasma processing device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201310406341.4A CN104425331B (en) | 2013-09-09 | 2013-09-09 | Turntable positioning device, loading Transmission system and plasma processing device |
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| Application Number | Title | Priority Date | Filing Date |
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| CN201710992688.XA Division CN107818932B (en) | 2013-09-09 | 2013-09-09 | Turntable positioning device, loading and conveying system and plasma processing equipment |
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| CN104425331A CN104425331A (en) | 2015-03-18 |
| CN104425331B true CN104425331B (en) | 2017-09-29 |
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| CN201710992688.XA Active CN107818932B (en) | 2013-09-09 | 2013-09-09 | Turntable positioning device, loading and conveying system and plasma processing equipment |
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| Country | Link |
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| CN (2) | CN104425331B (en) |
| TW (1) | TWI588077B (en) |
| WO (1) | WO2015032136A1 (en) |
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| CN105300653A (en) * | 2015-12-09 | 2016-02-03 | 中国航空工业集团公司哈尔滨空气动力研究所 | Test section upper and lower rotating disk offset induction apparatus |
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| CN107932166B (en) * | 2017-11-09 | 2020-10-23 | 广东天机工业智能系统有限公司 | Positioning method and device of multi-station turntable, storage medium and positioning equipment |
| CN108055624A (en) * | 2017-11-14 | 2018-05-18 | 佛山市南海科利华数控科技有限公司 | Convenient for the automatic voice coil winding machine scissors system of flying fork type of positioning |
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| TW201946581A (en) * | 2018-05-14 | 2019-12-16 | 瑞士商雀巢製品股份有限公司 | Apparatus for dispensing individual portions of beverage precursor for preparing a beverage therefrom |
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| CN111374516B (en) * | 2018-12-28 | 2021-12-03 | 浙江苏泊尔家电制造有限公司 | Cooking appliance and cooking method |
| CN110040446A (en) * | 2019-04-22 | 2019-07-23 | 苏州博众机器人有限公司 | A kind of delivering turntable and its delivering method |
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| KR20210026679A (en) * | 2019-08-30 | 2021-03-10 | 캐논 톡키 가부시키가이샤 | Deposition amount information acquiring apparatus, film forming apparatus, open-close apparatus, film forming method and manufacturing method of electronic device |
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Also Published As
| Publication number | Publication date |
|---|---|
| TW201509777A (en) | 2015-03-16 |
| WO2015032136A1 (en) | 2015-03-12 |
| TWI588077B (en) | 2017-06-21 |
| CN107818932B (en) | 2020-02-14 |
| CN104425331A (en) | 2015-03-18 |
| CN107818932A (en) | 2018-03-20 |
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