CN104425331A - Rotary plate positioning device, loading transmission system and plasma processing equipment - Google Patents
Rotary plate positioning device, loading transmission system and plasma processing equipment Download PDFInfo
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- CN104425331A CN104425331A CN201310406341.4A CN201310406341A CN104425331A CN 104425331 A CN104425331 A CN 104425331A CN 201310406341 A CN201310406341 A CN 201310406341A CN 104425331 A CN104425331 A CN 104425331A
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
- H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
- H01L21/68771—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by supporting more than one semiconductor substrate
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/68—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67242—Apparatus for monitoring, sorting or marking
- H01L21/67259—Position monitoring, e.g. misposition detection or presence detection
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67739—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
- H01L21/67742—Mechanical parts of transfer devices
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
- H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
- H01L21/68764—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by a movable susceptor, stage or support, others than those only rotating on their own vertical axis, e.g. susceptors on a rotating caroussel
Abstract
The invention provides a rotary plate positioning device, a loading transmission system and plasma processing equipment. The rotary plate positioning device comprises a rotary plate, an origin detecting unit and an in-place detecting unit, wherein a station is arranged on the rotary plate for bearing a workpiece; the origin detecting unit is used for detecting the origin position of the rotary plate; the in-place detecting unit comprises a first detecting module and a first identification module, wherein the first identification module is used for identifying the position, on the rotary plate, of the identified station; the first detecting module is used for detecting whether the station reaches a predetermined position or not by detecting the first identification module. The rotary plate positioning device provided by the invention can be used for monitoring whether the station of the rotary plate reaches the predetermined position or not, so that the position abnormity appearing in the station of the rotary plate can be timely obtained.
Description
Technical field
The invention belongs to semiconductor equipment and manufacture field, be specifically related to a kind of turntable positioning device, load transmission system and plasma processing device.
Background technology
Along with the development of microelectric technique, the competition of associated production enterprise is more and more fierce, reduces costs, enhances productivity, and is the conventional means improving enterprise competitiveness.Such as, in order to enhance productivity, reduce production cost, in the process of carrying out technique, utilize loading transmission system to realize carrying out different operations to multiple substrate, to tackle the market demand day by day increased simultaneously.
Fig. 1 is existing a kind of schematic diagram loading transmission system.Fig. 2 A is the vertical view of reaction chamber in Fig. 1.Fig. 2 B is the cutaway view of the A-A line along Fig. 2 A.As shown in Figure 1, load transmission system and comprise handling chamber 1, transmission chamber 2 and reaction chamber 3.Wherein, chamber 1 is loaded and unloaded for loading or unloading substrate; Transmission chamber 2 is arranged between handling chamber 1 and reaction chamber 3, and is provided with manipulator 21, in order to substrate transport between handling chamber 1 and reaction chamber 3.
As shown in Figure 2 A and 2 B, reaction chamber 3 comprises rotating disk 31, turntable rotation mechanism 35, target 32, thimble 33, thimble elevating mechanism 36, pedestal 34 and pedestal elevating mechanism 37.The main working process of reaction chamber 3 is: turntable rotation mechanism 35 drives rotating disk 31 to rotate, to make one of them station rotary in eight stations extremely for loading and unloading the loading position (as station in Fig. 11 position) of substrate 40; Thimble elevating mechanism 36 drives and to be arranged on bottom rotating disk 31 and the thimble 33 corresponding to this loading position rises, and runs through rotating disk 31 and higher than its upper surface to make the top of thimble 33; Substrate 40 is placed in the top of thimble 33 by manipulator 21; Thimble elevating mechanism 36 drives the thimble 33 carrying substrate 40 to decline, until the top of thimble 33 is positioned at the below of rotating disk 31, now substrate 40 drops on and is on the station of loading position, thus completes the loading of a substrate; After treating that all stations are all mounted with substrate 40, turntable rotation mechanism 35 drives rotating disk 31 to rotate, with the below making wherein four stations in eight stations be positioned at four targets 32 accordingly; Pedestal elevating mechanism 37 drives and is positioned at bottom rotating disk 31, and four pedestals 34 corresponding to each target 32 rise, rotating disk 31 is run through to make the upper surface of pedestal 34, and the substrate 40 held up on corresponding station, until arrive the bottom being arranged on through hole 38 on chamber roof and corresponding with target 32, now target 32, through hole 38 form sub-chamber with the upper surface of pedestal 34, and four sub-chamber are used for carrying out different operations to substrate 40 simultaneously; After completing when time operation, pedestal elevating mechanism 37 drives pedestal 34 to decline, until the upper surface of pedestal 34 is positioned at the below of rotating disk 31, now substrate 40 drops on the corresponding station of rotating disk 31; Turntable rotation mechanism 35 drives rotating disk 31 to rotate, and extremely corresponds to below the target 32 of subsequent processing to have made each station rotary when time operation; Repeat the step of above-mentioned " rising substrate ", " process substrates ", " decline substrate " and " rotary substrate ", until each substrate 40 completes all operations.
Before carrying out the above-mentioned course of work, also need to carry out initial point search by turntable positioning device to rotating disk, to enable rotating disk start to rotate from origin position, thus complete the rotational positioning of each station.Fig. 3 is the vertical view of existing a kind of turntable positioning device.As shown in Figure 3, turntable positioning device comprises the initial point projection 41 on the periphery wall being arranged on rotating disk 31, and the laser diffusion transducer 43 outside the transparent windows 42 being arranged on reaction chamber 3.When carrying out initial point search, when laser diffusion transducer 43 detect initial point protruding 41 time, can think that the motor in now turntable rotation mechanism is in origin position, then control this motor and carry out absolute movement, rotate specified angle to drive rotating disk 31.In addition, motor in turntable rotation mechanism has motion controller usually, and it can detect the anglec of rotation of motor in real time, thus according to the feedback signal provided by this motion controller, the anglec of rotation of rotating disk 31 can be known, and then can judge whether the station of rotating disk puts in place.
Inevitably there is following problem in above-mentioned turntable positioning device, that is: in actual applications
Because above-mentioned turntable positioning device only can carry out original point position to rotating disk, and whether the station cannot monitoring rotating disk in technical process arrives precalculated position, cause the malposition that the station cannot knowing rotating disk in time occurs, thus the course of work not only can be caused to continue, but also mechanical breakdown may be caused, and then reduce the safety and stability of plasma processing device.
Although the motion controller of motor can know the anglec of rotation of rotating disk indirectly by the anglec of rotation of detection motor, but, due to turntable rotation mechanism self and and rotating disk between transmission often cause the anglec of rotation of rotating disk to produce deviation because of machine error, thus cause the situation that occurs that in technical process motor is rotated in place and the station of rotating disk does not put in place, or occur that the angular deviation of turntable rotation mechanism does not exceed allowed band because disk edge the angular deviation of rotating disk can be amplified, and the angular deviation of disk edge exceeds the situation of allowed band.When there are above-mentioned two situations, the motion controller of motor still can provide the feedback signal representing that the station of rotating disk puts in place, whether cause putting in place misjudgment to the station of rotating disk, this can cause mechanical breakdown equally, thus reduces the safety and stability of plasma processing device.
Summary of the invention
The present invention is intended to solve the technical problem existed in prior art, provide a kind of turntable positioning device, load transmission system and plasma processing device, whether its station can monitoring rotating disk arrives precalculated position, thus can know the malposition that the station of rotating disk occurs in time.
Thering is provided a kind of turntable positioning device for realizing object of the present invention, comprising rotating disk and initial point detecting unit, wherein, described rotating disk is provided with station, in order to carry workpiece; Described initial point detecting unit, for detecting the origin position of rotating disk, is characterized in that, also comprises the detecting unit that puts in place, and it comprises first detection module and the first identification module, and wherein, described first identification module is for identifying the position of described station on described rotating disk; Described first detection module is used for judging whether described station arrives precalculated position by detecting described first identification module.
Wherein, described first identification module comprises the first protuberance, and described first protuberance is arranged on the periphery wall of described rotating disk, and is positioned at the position corresponding with described station; Described first detection module comprises the first range sensor and the first controller, wherein, described first range sensor is arranged on the periphery of described rotating disk periphery wall, in order to when described rotating disk rotates from its origin position, towards the outlet openings detection signal of described first protuberance process, and the feedback signal received from each position on this path, and described feedback signal is sent to described first controller; Described first controller is used for when described turntable rotation is to predetermined angular, judges that whether described feedback signal is from described first protuberance, if so, then determines that described station arrives precalculated position; If not, then determine that malposition appears in described station; The angle that described predetermined angular needs described rotating disk to rotate from its origin position when being default described station arrival precalculated position.
Wherein, the quantity of described station is multiple, and arranges along the circumferential interval of described rotating disk, and the quantity of described first range sensor is less than or equals the quantity of described station; The quantity of described first protuberance and the quantity of position and described station and position one_to_one corresponding, and when described rotating disk is in origin position, the position of each first range sensor is corresponding with the position of one of them in all first protuberances, and the first protuberance that each first range sensor is corresponding different.
Wherein, the quantity of described station is multiple, and arranges along the circumferential interval of described rotating disk, and the quantity of described first protuberance is less than or equals the quantity of described station; When described rotating disk is in origin position, the quantity of described first range sensor and the quantity of position and described station and position one_to_one corresponding, and the position of each first protuberance is corresponding with the position of one of them in all first range sensors, and the first range sensor that each first protuberance is corresponding different.
Wherein, described initial point detecting unit comprises the second detection module and the second identification module, and wherein said second identification module is for identifying the origin position of described rotating disk; Described second detection module is used for the origin position judging described rotating disk by detecting described second identification module.
Wherein, described second identification module comprises the second protuberance, and described second protuberance is arranged on the periphery wall of described rotating disk, and is positioned at the position corresponding with the origin position of described rotating disk; Described second detection module comprises second distance transducer and second controller, wherein, described second distance sensor setting is in the periphery of described rotating disk periphery wall, in order to when described turntable rotation, towards the outlet openings detection signal of described second protuberance process, and the feedback signal received from each position on this path, and described feedback signal is sent to described second controller; Described second controller, for judging that whether described feedback signal is from described second protuberance, if so, then determines according to the position of described second protuberance that described rotating disk arrives origin position.
Wherein, described first protuberance comprises the first extension of the lower surface stretching out described rotating disk, and described second protuberance comprises the second extension of the upper surface stretching out described rotating disk; Described first range sensor and second distance transducer are respectively towards the outlet openings detection signal of described first extension and the second extension process.
Wherein, described first protuberance comprises the first extension of the upper surface stretching out described rotating disk, and described second protuberance comprises the second extension of the lower surface stretching out described rotating disk; Described first range sensor and second distance transducer are respectively towards the outlet openings detection signal of described first extension and the second extension process.
Wherein, described first identification module comprises on the loading end at the station place being arranged on described rotating disk, and runs through the first through hole of described rotating disk thickness, and described first through hole is positioned at the position corresponding with described station; Described first detection module comprises the first opposite type sensor and the first controller, wherein, described first opposite type sensor comprises transmitting terminal and the receiving terminal of the both sides being up and down separately positioned on described rotating disk, described transmitting terminal is used for when described rotating disk rotates from its origin position, towards the outlet openings detection signal of the described first through hole process on described loading end; Described detection signal for receiving the detection signal through described first through hole from described transmitting terminal, and is sent to described first controller by described receiving terminal; Described first controller is used for when described turntable rotation is to predetermined angular, judges whether described receiving terminal receives described detection signal, if so, then determines that described station arrives precalculated position; If not, then determine that malposition appears in described station; The angle that described predetermined angular needs described rotating disk to rotate from its origin position when being default described station arrival precalculated position.
Wherein, the quantity of described station is multiple, and arranges along the circumferential interval of described rotating disk, and the quantity of described first opposite type sensor is less than or equals the quantity of described station; The quantity of described first through hole and the quantity of position and described station and position one_to_one corresponding, and when described rotating disk is in origin position, it is corresponding with the position of one of them in all first through holes with the position of receiving terminal that each first correlation puts the transmitting terminal of transducer, and the first through hole that the transmitting terminal of each the first opposite type sensor is corresponding different with receiving terminal.
Wherein, the quantity of described station is multiple, and arranges along the circumferential interval of described rotating disk, and the quantity of described first through hole is less than or equals the quantity of described station; When described rotating disk is in origin position, the quantity of described first opposite type sensor and the quantity of position and described station and position one_to_one corresponding, and the position of each first through hole is corresponding with the position of the transmitting terminal of one of them in all first opposite type sensor and receiving terminal, and the transmitting terminal of the first opposite type sensor corresponding to each first through hole and receiving terminal.
Wherein, described initial point detecting unit comprises the second detection module and the second identification module, and wherein said second identification module is for identifying the origin position of described rotating disk; Described second detection module is used for the origin position judging described rotating disk by detecting described second identification module.
Wherein, described second identification module comprises on the loading end at the station place being arranged on described rotating disk, and runs through the second through hole of described rotating disk thickness, and described second through hole is positioned at the position corresponding with the origin position of described rotating disk; Described second detection module comprises the second opposite type sensor and second controller, wherein, described second opposite type sensor comprises transmitting terminal and the receiving terminal of the both sides being up and down separately positioned on described rotating disk, described transmitting terminal is used for when described turntable rotation, towards the outlet openings detection signal of the described second through hole process on described loading end; Described detection signal for receiving the detection signal through described second through hole from described transmitting terminal, and is sent to described second controller by described receiving terminal; Described second controller, for judging whether described receiving terminal receives described detection signal, if so, then determines that described rotating disk arrives origin position.
Wherein, the centre-to-centre spacing between described first through hole and described rotating disk is not equal to the centre-to-centre spacing between described second through hole and described rotating disk.
Preferably, described second controller resets the anglec of rotation of described rotating disk when determining described rotating disk arrival origin position at every turn.
Also provide a kind of loading transmission system for realizing object of the present invention, comprise handling chamber, transmission chamber and reaction chamber, wherein, described handling chamber is used for loading or unloading substrate; Described transmission chamber is arranged between handling chamber and reaction chamber, and is provided with manipulator, in order to substrate transport between described handling chamber and reaction chamber; Described reaction chamber comprises turntable positioning device, and in order to rotate substrate to precalculated position, described turntable positioning device adopts above-mentioned turntable positioning device.
Also provide a kind of plasma processing device for realizing object of the present invention, it comprises loading transmission system, it is characterized in that, described loading transmission system adopts above-mentioned turntable positioning device.
The present invention has following beneficial effect:
Turntable positioning device provided by the invention, its detecting unit that puts in place is by detecting the first identification module for identifying the position of station on rotating disk by first detection module, can judge whether this station arrives precalculated position, thus the malposition that the station of rotating disk occurs can be known in time, and then not only can ensure normally carrying out of the course of work, and can avoid mechanical breakdown occurs, and then the safety and stability of plasma processing apparatus can be improved.
Loading transmission system provided by the invention, substrate rotates to precalculated position by adopting above-mentioned turntable positioning device provided by the invention by it, not only can ensure normally carrying out of the course of work, and can avoid mechanical breakdown occurs, thus the safety and stability of plasma processing apparatus can be improved.
Plasma processing device provided by the invention its by adopt above-mentioned loading transmission system provided by the invention, not only can ensure normally carrying out of the course of work, and can avoid mechanical breakdown occurs, thus the safety and stability of plasma processing apparatus can be improved.
Accompanying drawing explanation
Fig. 1 is existing a kind of schematic diagram loading transmission system;
Fig. 2 A is the vertical view of reaction chamber in Fig. 1;
Fig. 2 B is the cutaway view of the A-A line along Fig. 2 A;
Fig. 3 is the vertical view of existing a kind of turntable positioning device;
The vertical view of a kind of turntable positioning device that Fig. 4 A provides for the embodiment of the present invention one;
Fig. 4 B is that Fig. 4 A is at A end view upwards;
The vertical view of the another kind of turntable positioning device that Fig. 5 A provides for the embodiment of the present invention one;
Fig. 5 B is that Fig. 5 A is at A end view upwards;
The vertical view of the turntable positioning device that Fig. 6 A provides for the embodiment of the present invention two; And
Fig. 6 B is the cutaway view that in Fig. 6 A, A-A is along the line.
Embodiment
For making those skilled in the art understand technical scheme of the present invention better, below in conjunction with accompanying drawing, turntable positioning device provided by the invention, loading transmission system and plasma processing device are described in detail.
Turntable positioning device provided by the invention comprises rotating disk, initial point detecting unit and the detecting unit that puts in place.Wherein, rotating disk is provided with station, in order to carry workpiece; Initial point detecting unit comprises the second detection module and the second identification module, and the second identification module is for identifying the origin position of rotating disk; Second detection module is used for the origin position judging rotating disk by detecting the second identification module.The detecting unit that puts in place comprises first detection module and the first identification module, and the first identification module is for identifying the position of station on rotating disk; First detection module is used for judging whether station arrives precalculated position by detecting the first identification module.By detecting the first identification module by the first detection module of the detecting unit that puts in place, can judge whether station arrives precalculated position, thus the malposition that the station of rotating disk occurs can be known in time, and then not only can ensure normally carrying out of the course of work, and can avoid mechanical breakdown occurs, and then the safety and stability of plasma processing apparatus can be improved.
Embodiment one
The vertical view of a kind of turntable positioning device that Fig. 4 A provides for the embodiment of the present invention one.Fig. 4 B is that Fig. 4 A is at A end view upwards.See also Fig. 4 A and Fig. 4 B, in the present embodiment, rotating disk 50 is provided with station 51, the quantity of station 51 is multiple, and arranges along the circumferential interval of rotating disk 50.
Put in place in detecting unit, the first identification module comprises the first protuberance 54, first protuberance 54 and is arranged on the periphery wall of rotating disk 50, and the quantity of quantity and position and station 51 and position one_to_one corresponding; First detection module comprises the first range sensor 52 and the first controller (not shown), wherein, first range sensor 52 is arranged on the periphery of rotating disk 50 periphery wall, in order to when rotating disk 50 rotates from its origin position, towards the outlet openings detection signal of the first protuberance 54 process, and the feedback signal received from each position on this path, and this feedback signal is sent to the first controller.In the present embodiment, the quantity of the first range sensor 52 is less than or equals the quantity of station 51, and when rotating disk 50 is in origin position, the position of each first range sensor 52 is corresponding with the position of one of them in all first protuberances 54, and the first protuberance 54 that each first range sensor 52 is corresponding different.Such as, in Figure 4 A, station 51 and the respective quantity of the first protuberance 54 are eight; The quantity of the first range sensor 52 is one, and when rotating disk 50 is in origin position, this first range sensor 52 is corresponding with the first protuberance 54 being positioned at the top.First controller is used for when rotating disk 50 rotates to predetermined angular, judges that whether feedback signal is from the first protuberance 54, if so, then determines that station arrives precalculated position; If not, then determine that malposition appears in the station 51 of rotating disk.So-called predetermined angular, refers to the angle that default station needs rotating disk to rotate from its origin position when arriving precalculated position.Such as, in Figure 4 A, if the first protuberance 54 that setting is positioned at bottom arrives the precalculated position being positioned at the top of rotating disk 50, rotating disk 50 is then needed to rotate 180 ° from current origin position, now the first controller judges that whether feedback signal is from the first protuberance 54, if so, then determine that station 51 arrives precalculated position; If not, then the malposition that the station 51 of rotating disk occurs is determined.
In initial point detecting unit, the second identification module comprises the second protuberance 55, second protuberance 55 and is arranged on the periphery wall of rotating disk 50, and is positioned at the position corresponding with the origin position of rotating disk 50, as shown in Figure 4 A; Second detection module comprises second distance transducer 53 and second controller (not shown), wherein, second distance transducer 53 is arranged on the periphery of rotating disk 50 periphery wall, in order to when rotating disk 50 rotates, towards the outlet openings detection signal of the second protuberance 55 process, and the feedback signal received from each position on this path, and feedback signal is sent to second controller; According to the position of the second protuberance 55, second controller, for judging that whether feedback signal is from the second protuberance 55, if so, then determines that rotating disk 50 arrives origin position.
Preferably, second controller resets the anglec of rotation of rotating disk 50 when determining that rotating disk 50 arrives origin position at every turn, that is, in the process of rotating disk 50 rotation, as long as second controller judges that feedback signal is from the second protuberance 55, at once the anglec of rotation of rotating disk 50 is reset to zero.Radius due to rotating disk 50 can affect the anglec of rotation error of rotating disk 50, namely, the radius of rotating disk 50 is larger, then the anglec of rotation error of rotating disk 50 is larger, otherwise it is then less, again because the anglec of rotation error of rotating disk 50 constantly can increase along with the increase of the rotating cycle of rotating disk 50, finally cause the anglec of rotation error of rotating disk 50 to exceed the safe range of permission, thus cause the location of rotating disk 50 inaccurate.For this reason, by resetting the anglec of rotation of rotating disk 50 when determining that rotating disk 50 arrives origin position at every turn by second controller, rotating disk 50 can be removed rotate each and enclose the anglec of rotation error that produces, be equivalent to reorientate the origin position of rotating disk 50, thus can by the anglec of rotation control errors of rotating disk 50 in the safe range allowed.
In the present embodiment, one of them in second protuberance 55 and the first protuberance 54 is arranged on same position, and the two adopts integral structure, as shown in Figure 4 B, and, the first protuberance 54 only can be detected in order to make the first range sensor 52, and second distance transducer 53 only can detect the second protuberance 55, first protuberance 54 comprises the first extension 541 of the upper surface stretching out rotating disk 50, and the second protuberance 55 comprises the second extension 551 of the lower surface stretching out rotating disk, and the first range sensor 52 and second distance transducer 53 are respectively towards the outlet openings detection signal of the first extension 541 and the second extension 551 process.
Because the first extension 541 and the second extension 551 in the vertical direction have difference in height, this makes the first range sensor 52 path of the first extension 541 process only can be detected, and second distance transducer 53 only can detect the path of the second extension 551 process, thus can ensure that the first range sensor 52 and second distance transducer 53 can not be subject to the interference of the second protuberance 55 and the first protuberance 54.In addition, by the first extension 541 and the second extension 551, the periphery wall of detection signal higher or lower than rotating disk 50 of the first range sensor 52 and each spontaneous emission of second distance transducer 53 can be made, thus carrying out putting in place in the process of detection or initial point detection, only have when the first extension 541 and the second extension 551 are respectively through the first range sensor 52 and second distance transducer 53, first range sensor 52 and second distance transducer 53 just receive feedback signal, this not only can improve the detection sensitivity of the first range sensor 52 and second distance transducer 53, and without the need to the planarization of the periphery wall to rotating disk 50, very high requirement is proposed, thus can difficulty of processing be reduced, and then can cut down finished cost.
Certainly, in actual applications, first protuberance also can comprise the first extension of the lower surface stretching out rotating disk, and the second protuberance comprises the second extension of the upper surface stretching out rotating disk, and the first range sensor and second distance transducer are respectively towards the outlet openings detection signal of the first extension and the second extension process.
In addition, also the first extension and the second extension can be saved, and make the level interval between the detection faces of the first protuberance and the first range sensor be different from level interval between the detection faces of the second protuberance and second distance transducer, namely, first protuberance is different from the length of the second protuberance in the radial direction of rotating disk, to make the first range sensor and second distance transducer according to distance identification first protuberance detected and the second protuberance.
It should be noted that, in the present embodiment, first detection module and the second detection module all adopt laser reflection type range sensor to detect, but the present invention is not limited thereto, in actual applications, the transducer of other kinds can also be adopted, and according to the difference of kind of sensor, correspondingly can adjust the installation method of first detection module and the second detection module, the parameter such as position and distance relative to rotating disk, and the parameter such as the structure of the first identification module and the second identification module, size, material and mounting means also correspondingly should adjust.As long as initial point detecting unit can detect the origin position of rotating disk, and whether the station that the detecting unit that puts in place can monitor rotating disk arrives precalculated position.
Also it should be noted that, in the present embodiment, the quantity of the first protuberance 54 quantity and position and station 51 and position one_to_one corresponding, and the quantity of the first range sensor 52 is less than or equals the quantity of station 51, but the present invention is not limited thereto, in actual applications, also can adopt following set-up mode: as shown in Figure 5 A and 5B, make the quantity of the first protuberance 54 be less than or equal the quantity of station; When rotating disk is in origin position, the quantity of the first range sensor 52 and the quantity of position and station 51 and position one_to_one corresponding, and the position of each first protuberance 54 is corresponding with the position of one of them in all first range sensors 52, and the first range sensor 52 that each first protuberance 54 is corresponding different.Such as, in fig. 5, station 51 and the respective quantity of the first range sensor 52 are eight; The quantity of the first protuberance 54 is one, and when rotating disk 50 is in origin position, this first protuberance 54 is corresponding with the first range sensor 52 being positioned at the top.
It should be noted that further, in the present embodiment, one of them in second protuberance 55 and the first protuberance 54 is arranged on same position, and in other words, the origin position of rotating disk 50 is corresponding with the position of one of them station 51, but the present invention is not limited thereto, in actual applications, the origin position of rotating disk can free setting according to specific needs, namely, the position of the second protuberance can be different from the position of the first protuberance, and the two is separate.
It should be noted that further, in the present embodiment, the quantity of station 51 is multiple, and arrange along the circumferential interval of rotating disk 50, but the present invention is not limited thereto, in actual applications, station also can be one, and is arranged on the assigned address in rotating disk circumference according to specific needs.In addition, so-called first protuberance is positioned at the position corresponding with station, refers to have default position relationship between the first protuberance and station, when determining the position of the first protuberance, indirectly can obtain the position of station according to this corresponding relation.Similar with it, so-called second protuberance is positioned at the position corresponding with the origin position of rotating disk, referring to that the origin position of the second protuberance and rotating disk has default position relationship, when determining the position of the second protuberance, indirectly can obtain the origin position of rotating disk according to this corresponding relation.
Embodiment two
The vertical view of the turntable positioning device that Fig. 6 A provides for the embodiment of the present invention two.Fig. 6 B is the cutaway view that in Fig. 6 A, A-A is along the line.See also Fig. 6 A and Fig. 6 B, in the present embodiment, rotating disk 50 is provided with station 51, the quantity of station 51 is multiple, and arranges along the circumferential interval of rotating disk 50.
Put in place in detecting unit, (namely first identification module comprises the loading end at station 51 place being arranged on rotating disk 50, the surface for carrying workpiece of rotating disk), and run through the first through hole 61 of rotating disk 50 thickness, and the quantity of the first through hole 61 and the quantity of position and station 51 and position one_to_one corresponding; First detection module comprises the first opposite type sensor 63 and the first controller (not shown), wherein, first opposite type sensor 63 comprises transmitting terminal and the receiving terminal of the both sides being up and down separately positioned on rotating disk 50, this transmitting terminal is used for when rotating disk 50 rotates from its origin position, towards the outlet openings detection signal of the first through hole 61 process on the loading end of rotating disk 50; This detection signal for receiving the detection signal through the first through hole 63 from transmitting terminal, and is sent to the first controller by this receiving terminal.Easy understand, only when transmitting terminal, through hole and receiving terminal in the vertical direction are in straight line, the detection signal that spontaneous emission end sends just can pass through hole, and is received by receiving terminal.
In the present embodiment, the quantity of the first opposite type sensor 63 is less than or equals the quantity of station 51, and when rotating disk 50 is in origin position, each transmitting terminal of the first opposite type sensor 63 is corresponding with the position of one of them in all first through holes 61 with the position of receiving terminal, and the first through hole 61 that the transmitting terminal of each the first opposite type sensor 63 is corresponding different with receiving terminal.Such as, in fig. 6, station 51 and the respective quantity of the first through hole 61 are eight; The quantity of the first opposite type sensor 63 is one, and when rotating disk 50 is in origin position, the transmitting terminal of this first opposite type sensor 63 and receiving terminal corresponding with the first through hole 61 being positioned at rotating disk 50 rightmost side.First controller is used for when rotating disk 50 rotates to predetermined angular, judges whether receiving terminal receives detection signal, if so, then determines that station 51 arrives precalculated position; If not, then determine that malposition appears in station 51; So-called predetermined angular, refers to the angle that default station 51 needs rotating disk 50 to rotate from its origin position when arriving precalculated position.Such as, in fig. 6, if the first through hole 61 that setting is positioned at rotating disk 50 leftmost side arrives the precalculated position being positioned at rotating disk 50 rightmost side, rotating disk 50 is then needed to rotate 180 ° from current origin position, now the first controller judges whether receiving terminal receives detection signal, if so, then determine that station 51 arrives precalculated position; If not, then the malposition that the station 51 of rotating disk occurs is determined.
In initial point detecting unit, second identification module comprises on the loading end at station 51 place being arranged on rotating disk 50, and run through the second through hole 60 of rotating disk 50 thickness, and the second through hole 60 is positioned at the position corresponding with the origin position of rotating disk 50, as shown in Figure 6B; Second detection module comprises the second opposite type sensor 62 and second controller (not shown), wherein, second opposite type sensor 62 comprises transmitting terminal and the receiving terminal of the both sides being up and down separately positioned on rotating disk 50, this transmitting terminal is used for when rotating disk 50 rotates, towards the outlet openings detection signal of the second through hole 60 process on the loading end of rotating disk 50; Detection signal for receiving the detection signal through the second through hole 60 from transmitting terminal, and is sent to second controller by this receiving terminal; Second controller, for judging whether receiving terminal receives detection signal, if so, then determines that rotating disk 50 arrives origin position.
Preferably, second controller resets the anglec of rotation of rotating disk 50 when determining that rotating disk 50 arrives origin position at every turn, this remapping method and above-mentioned first embodiment similar, owing to there has been detailed description in the above-described first embodiment, do not repeat them here.
In the present embodiment, the first through hole 61 only can be detected in order to make the first opposite type sensor 63, and the second opposite type sensor 62 only can detect the second through hole 60, centre-to-centre spacing L1 between second through hole 60 and rotating disk is not equal to the centre-to-centre spacing L2 between the first through hole 61 and rotating disk 50, as shown in Figure 6B, namely, the path of the first through hole 61 and the second through hole 60 process lays respectively at the different radii place of rotating disk 50 circumference, this can make the first opposite type sensor 63 path of the first through hole 61 process only can be detected, and the second opposite type sensor 62 only can detect the path of the second through hole 60 process, thus can ensure that the first opposite type sensor 63 and the second opposite type sensor 62 can not be subject to the interference of the second through hole 60 and the first through hole 61.
It should be noted that, in the present embodiment, the quantity of the first through hole 61 and the quantity of position and station 51 and position one_to_one corresponding, and the quantity of the first opposite type sensor 63 is less than or equals the quantity of station 51, but the present invention is not limited thereto, in actual applications, also following set-up mode can be adopted: the quantity of the first through hole 61 is less than or equals the quantity of station 51; When rotating disk 50 is in origin position, the quantity of the first opposite type sensor 63 and the quantity of position and station 51 and position one_to_one corresponding, and the position of each first through hole 61 is corresponding with the position of one of them in all first opposite type sensor 63, and the first opposite type sensor 63 that each first through hole 61 is corresponding different.
The embodiment of the present invention also provides a kind of and loads transmission system, comprises handling chamber, transmission chamber and reaction chamber, and wherein, handling chamber is used for loading or unloading substrate; Transmission chamber is arranged between handling chamber and reaction chamber, and is provided with manipulator, in order to substrate transport between handling chamber and reaction chamber; Reaction chamber comprises turntable positioning device, and in order to rotate substrate to precalculated position, this turntable positioning device have employed the turntable positioning device that the various embodiments described above of the present invention provide.
The loading transmission system that the embodiment of the present invention provides, substrate is rotated to precalculated position by its above-mentioned turntable positioning device provided by the employing embodiment of the present invention, not only can ensure normally carrying out of the course of work, and can avoid mechanical breakdown occurs, thus the safety and stability of plasma processing apparatus can be improved.
The present invention also provides a kind of plasma processing device, and it comprises loading transmission system, and this loading transmission system have employed the above-mentioned turntable positioning device that the embodiment of the present invention provides.
The plasma processing device that the embodiment of the present invention provides, it is by adopting above-mentioned loading transmission system provided by the invention, not only can ensure normally carrying out of the course of work, and can avoid mechanical breakdown occurs, thus the safety and stability of plasma processing apparatus can be improved.
Be understandable that, the illustrative embodiments that above execution mode is only used to principle of the present invention is described and adopts, but the present invention is not limited thereto.For those skilled in the art, when not departing from principle of the present invention and essence, can make various modification and improvement, these modification and improvement are also considered as protection scope of the present invention.
Claims (17)
1. a turntable positioning device, comprises rotating disk and initial point detecting unit, wherein, described rotating disk is provided with station, in order to carry workpiece; Described initial point detecting unit, for detecting the origin position of rotating disk, is characterized in that, also comprises the detecting unit that puts in place, and it comprises first detection module and the first identification module, wherein
Described first identification module is for identifying the position of described station on described rotating disk;
Described first detection module is used for judging whether described station arrives precalculated position by detecting described first identification module.
2. turntable positioning device according to claim 1, is characterized in that, described first identification module comprises the first protuberance, and described first protuberance is arranged on the periphery wall of described rotating disk, and is positioned at the position corresponding with described station;
Described first detection module comprises the first range sensor and the first controller, wherein,
Described first range sensor is arranged on the periphery of described rotating disk periphery wall, in order to when described rotating disk rotates from its origin position, towards the outlet openings detection signal of described first protuberance process, and the feedback signal received from each position on this path, and described feedback signal is sent to described first controller;
Described first controller is used for when described turntable rotation is to predetermined angular, judges that whether described feedback signal is from described first protuberance, if so, then determines that described station arrives precalculated position; If not, then determine that malposition appears in described station; The angle that described predetermined angular needs described rotating disk to rotate from its origin position when being default described station arrival precalculated position.
3. turntable positioning device according to claim 2, is characterized in that, the quantity of described station is multiple, and arranges along the circumferential interval of described rotating disk, and the quantity of described first range sensor is less than or equals the quantity of described station;
The quantity of described first protuberance and the quantity of position and described station and position one_to_one corresponding, and when described rotating disk is in origin position, the position of each first range sensor is corresponding with the position of one of them in all first protuberances, and the first protuberance that each first range sensor is corresponding different.
4. turntable positioning device according to claim 2, is characterized in that, the quantity of described station is multiple, and arranges along the circumferential interval of described rotating disk, and the quantity of described first protuberance is less than or equals the quantity of described station;
When described rotating disk is in origin position, the quantity of described first range sensor and the quantity of position and described station and position one_to_one corresponding, and the position of each first protuberance is corresponding with the position of one of them in all first range sensors, and the first range sensor that each first protuberance is corresponding different.
5. turntable positioning device according to claim 2, is characterized in that, described initial point detecting unit comprises the second detection module and the second identification module, wherein
Described second identification module is for identifying the origin position of described rotating disk;
Described second detection module is used for the origin position judging described rotating disk by detecting described second identification module.
6. turntable positioning device according to claim 5, is characterized in that, described second identification module comprises the second protuberance, and described second protuberance is arranged on the periphery wall of described rotating disk, and is positioned at the position corresponding with the origin position of described rotating disk;
Described second detection module comprises second distance transducer and second controller, wherein,
Described second distance sensor setting is in the periphery of described rotating disk periphery wall, in order to when described turntable rotation, towards the outlet openings detection signal of described second protuberance process, and the feedback signal received from each position on this path, and described feedback signal is sent to described second controller;
Described second controller, for judging that whether described feedback signal is from described second protuberance, if so, then determines according to the position of described second protuberance that described rotating disk arrives origin position.
7. turntable positioning device according to claim 6, is characterized in that, described first protuberance comprises the first extension of the lower surface stretching out described rotating disk, and described second protuberance comprises the second extension of the upper surface stretching out described rotating disk;
Described first range sensor and second distance transducer are respectively towards the outlet openings detection signal of described first extension and the second extension process.
8. turntable positioning device according to claim 6, is characterized in that, described first protuberance comprises the first extension of the upper surface stretching out described rotating disk, and described second protuberance comprises the second extension of the lower surface stretching out described rotating disk;
Described first range sensor and second distance transducer are respectively towards the outlet openings detection signal of described first extension and the second extension process.
9. turntable positioning device according to claim 1, it is characterized in that, described first identification module comprises on the loading end at the station place being arranged on described rotating disk, and runs through the first through hole of described rotating disk thickness, and described first through hole is positioned at the position corresponding with described station;
Described first detection module comprises the first opposite type sensor and the first controller, wherein,
Described first opposite type sensor comprises transmitting terminal and the receiving terminal of the both sides being up and down separately positioned on described rotating disk, described transmitting terminal is used for when described rotating disk rotates from its origin position, towards the outlet openings detection signal of the described first through hole process on described loading end; Described detection signal for receiving the detection signal through described first through hole from described transmitting terminal, and is sent to described first controller by described receiving terminal;
Described first controller is used for when described turntable rotation is to predetermined angular, judges whether described receiving terminal receives described detection signal, if so, then determines that described station arrives precalculated position; If not, then determine that malposition appears in described station; The angle that described predetermined angular needs described rotating disk to rotate from its origin position when being default described station arrival precalculated position.
10. turntable positioning device according to claim 9, is characterized in that, the quantity of described station is multiple, and arranges along the circumferential interval of described rotating disk, and the quantity of described first opposite type sensor is less than or equals the quantity of described station;
The quantity of described first through hole and the quantity of position and described station and position one_to_one corresponding, and when described rotating disk is in origin position, it is corresponding with the position of one of them in all first through holes with the position of receiving terminal that each first correlation puts the transmitting terminal of transducer, and the first through hole that the transmitting terminal of each the first opposite type sensor is corresponding different with receiving terminal.
11. turntable positioning devices according to claim 9, is characterized in that, the quantity of described station is multiple, and arrange along the circumferential interval of described rotating disk, and the quantity of described first through hole is less than or equals the quantity of described station;
When described rotating disk is in origin position, the quantity of described first opposite type sensor and the quantity of position and described station and position one_to_one corresponding, and the position of each first through hole is corresponding with the position of the transmitting terminal of one of them in all first opposite type sensor and receiving terminal, and the transmitting terminal of the first opposite type sensor corresponding to each first through hole and receiving terminal.
12. turntable positioning devices according to claim 9, is characterized in that, described initial point detecting unit comprises the second detection module and the second identification module, wherein
Described second identification module is for identifying the origin position of described rotating disk;
Described second detection module is used for the origin position judging described rotating disk by detecting described second identification module.
13. turntable positioning devices according to claim 12, it is characterized in that, described second identification module comprises on the loading end at the station place being arranged on described rotating disk, and run through the second through hole of described rotating disk thickness, and described second through hole is positioned at the position corresponding with the origin position of described rotating disk;
Described second detection module comprises the second opposite type sensor and second controller, wherein,
Described second opposite type sensor comprises transmitting terminal and the receiving terminal of the both sides being up and down separately positioned on described rotating disk, and described transmitting terminal is used for when described turntable rotation, towards the outlet openings detection signal of the described second through hole process on described loading end; Described detection signal for receiving the detection signal through described second through hole from described transmitting terminal, and is sent to described second controller by described receiving terminal;
Described second controller, for judging whether described receiving terminal receives described detection signal, if so, then determines that described rotating disk arrives origin position.
14. turntable positioning devices according to claim 13, is characterized in that, the centre-to-centre spacing between described first through hole and described rotating disk is not equal to the centre-to-centre spacing between described second through hole and described rotating disk.
15. turntable positioning devices according to claim 6 or 13, is characterized in that, described second controller is determining that described rotating disk resets the anglec of rotation of described rotating disk when arriving origin position at every turn.
16. 1 kinds are loaded transmission system, comprise handling chamber, transmission chamber and reaction chamber, and wherein, described handling chamber is used for loading or unloading substrate; Described transmission chamber is arranged between handling chamber and reaction chamber, and is provided with manipulator, in order to substrate transport between described handling chamber and reaction chamber; Described reaction chamber comprises turntable positioning device, in order to rotate substrate to precalculated position, it is characterized in that, described turntable positioning device adopts the turntable positioning device described in claim 1-15 any one.
17. 1 kinds of plasma processing devices, it comprises loading transmission system, it is characterized in that, described loading transmission system adopts turntable positioning device according to claim 16.
Priority Applications (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201710992688.XA CN107818932B (en) | 2013-09-09 | 2013-09-09 | Turntable positioning device, loading and conveying system and plasma processing equipment |
| CN201310406341.4A CN104425331B (en) | 2013-09-09 | 2013-09-09 | Turntable positioning device, loading Transmission system and plasma processing device |
| TW102144392A TWI588077B (en) | 2013-09-09 | 2013-12-04 | Turntable positioning device, loading and conveying system and plasma processing equipment |
| PCT/CN2013/088656 WO2015032136A1 (en) | 2013-09-09 | 2013-12-05 | Rotary table positioning device, load transmission system and plasma processing device |
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| CN201310406341.4A CN104425331B (en) | 2013-09-09 | 2013-09-09 | Turntable positioning device, loading Transmission system and plasma processing device |
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Also Published As
| Publication number | Publication date |
|---|---|
| TW201509777A (en) | 2015-03-16 |
| CN107818932B (en) | 2020-02-14 |
| TWI588077B (en) | 2017-06-21 |
| WO2015032136A1 (en) | 2015-03-12 |
| CN107818932A (en) | 2018-03-20 |
| CN104425331B (en) | 2017-09-29 |
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Address after: 100176 No. 8 Wenchang Avenue, Beijing economic and Technological Development Zone Patentee after: Beijing North China microelectronics equipment Co Ltd Address before: 100176 Beijing economic and Technological Development Zone, Wenchang Road, No. 8, No. Patentee before: Beifang Microelectronic Base Equipment Proces Research Center Co., Ltd., Beijing |