CN107818932B - Turntable positioning device, loading and conveying system and plasma processing equipment - Google Patents
Turntable positioning device, loading and conveying system and plasma processing equipment Download PDFInfo
- Publication number
- CN107818932B CN107818932B CN201710992688.XA CN201710992688A CN107818932B CN 107818932 B CN107818932 B CN 107818932B CN 201710992688 A CN201710992688 A CN 201710992688A CN 107818932 B CN107818932 B CN 107818932B
- Authority
- CN
- China
- Prior art keywords
- turntable
- station
- positioning device
- hole
- stations
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/68—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
- H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
- H01L21/68771—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by supporting more than one semiconductor substrate
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67242—Apparatus for monitoring, sorting or marking
- H01L21/67259—Position monitoring, e.g. misposition detection or presence detection
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67739—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
- H01L21/67742—Mechanical parts of transfer devices
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
- H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
- H01L21/68764—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by a movable susceptor, stage or support, others than those only rotating on their own vertical axis, e.g. susceptors on a rotating caroussel
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Robotics (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Abstract
The invention provides a turntable positioning device, a loading transmission system and plasma processing equipment, which comprise a turntable, an original point detection unit and an in-place detection unit, wherein a station is arranged on the turntable and used for bearing a workpiece; the origin detection unit is used for detecting the origin position of the turntable; the in-place detection unit comprises a first detection module and a first identification module, wherein the first identification module is used for identifying the position of the station on the turntable; the first detection module is used for judging whether the station reaches a preset position by detecting the first identification module. The turntable positioning device provided by the invention can monitor whether the station of the turntable reaches the preset position or not, so that the position abnormality of the station of the turntable can be known in time.
Description
The invention is created as the application number: 201310406341.4, filing date: 09/2013, 09/h, invention creation name: the divisional application of a turntable positioning device, a loading and conveying system and plasma processing equipment.
Technical Field
The invention belongs to the field of semiconductor equipment manufacturing, and particularly relates to a turntable positioning device, a loading and conveying system and plasma processing equipment.
Background
With the continuous development of microelectronic technology, the competition of related production enterprises is more and more intense, and reducing the cost and improving the production efficiency are common means for improving the enterprise competitiveness. For example, in order to improve the production efficiency and reduce the production cost, different processes are simultaneously performed on a plurality of substrates by using a loading and conveying system in the process of performing the process, so as to meet the increasing market demand.
Fig. 1 is a schematic diagram of a conventional load transfer system. FIG. 2A is a top view of the reaction chamber of FIG. 1. Fig. 2B is a sectional view taken along line a-a of fig. 2A. As shown in fig. 1, the load-and-transfer system includes a loading and unloading chamber 1, a transfer chamber 2, and a reaction chamber 3. Wherein the loading and unloading chamber 1 is used for loading or unloading a substrate; the transfer chamber 2 is disposed between the loading and unloading chamber 1 and the reaction chamber 3, and is provided with a robot 21 for transferring substrates between the loading and unloading chamber 1 and the reaction chamber 3.
As shown in fig. 2A and 2B, the reaction chamber 3 includes a turntable 31, a turntable rotating mechanism 35, a target 32, an ejector pin 33, an ejector pin elevating mechanism 36, a susceptor 34, and a susceptor elevating mechanism 37. The main working processes of the reaction chamber 3 are: the turntable rotating mechanism 35 drives the turntable 31 to rotate, so that one of the eight stations rotates to a loading and unloading position (as the position of the station 1 in fig. 1) for loading and unloading the substrate 40; the thimble lifting mechanism 36 drives the thimble 33 which is arranged at the bottom of the turntable 31 and corresponds to the loading and unloading position to lift, so that the top end of the thimble 33 penetrates through the turntable 31 and is higher than the upper surface of the turntable; the manipulator 21 places the substrate 40 on the top end of the thimble 33; the thimble lifting mechanism 36 drives the thimble 33 carrying the substrate 40 to descend until the top end of the thimble 33 is positioned below the turntable 31, and the substrate 40 falls on the station at the loading and unloading position, thereby completing the loading of one substrate; after all the stations are loaded with the substrates 40, the turntable rotating mechanism 35 drives the turntable 31 to rotate, so that four of the eight stations are correspondingly positioned below the four targets 32; the base lifting mechanism 37 drives the four bases 34 which are positioned at the bottom of the turntable 31 and correspond to the targets 32 to ascend, so that the upper surfaces of the bases 34 penetrate through the turntable 31 and support the substrates 40 on the corresponding stations until the substrates reach the bottoms of the through holes 38 which are arranged on the top wall of the chamber and correspond to the targets 32, at the moment, sub-chambers are formed by the targets 32, the through holes 38 and the upper surfaces of the bases 34, and the four sub-chambers are used for simultaneously carrying out different processes on the substrates 40; after the secondary process is completed, the base lifting mechanism 37 drives the base 34 to descend until the upper surface of the base 34 is positioned below the turntable 31, and at this time, the substrate 40 falls on the corresponding station of the turntable 31; the turntable rotating mechanism 35 drives the turntable 31 to rotate, so that each station completing the current process rotates to the position below the target 32 corresponding to the next process; the above steps of "raising the substrate", "processing the substrate", "lowering the substrate", and "rotating the substrate" are repeated until each substrate 40 has completed all the processes.
Before the working process is carried out, the original point search is carried out on the rotary table by means of the rotary table positioning device, so that the rotary table can rotate from the original point position, and the rotary positioning of each station is completed. Fig. 3 is a top view of a conventional turntable positioning device. As shown in fig. 3, the turntable positioning means includes an origin protrusion 41 provided on the outer peripheral wall of the turntable 31, and a laser diffuse reflection sensor 43 provided outside a transparent observation window 42 of the reaction chamber 3. When the laser diffuse reflection sensor 43 detects the origin protrusion 41 at the time of performing the origin search, the motor in the turntable rotating mechanism can be considered to be at the origin position at this time, and then the motor is controlled to perform the absolute movement to drive the turntable 31 to rotate by the specified angle. In addition, the motor in the turntable rotating mechanism usually has a motion controller, which can detect the rotation angle of the motor in real time, so that the rotation angle of the turntable 31 can be known according to the feedback signal provided by the motion controller, and further whether the station of the turntable is in place can be judged.
The turntable positioning device inevitably has the following problems in practical application:
because the turntable positioning device can only perform origin positioning on the turntable, and whether the station of the turntable reaches the preset position can not be monitored in the process, the position abnormity of the station of the turntable can not be timely known, so that the working process can not be continued, mechanical faults can also be caused, and the safety and the stability of the plasma processing equipment are further reduced.
Although the motion controller of the motor can indirectly know the rotation angle of the turntable by detecting the rotation angle of the motor, the rotation angle of the turntable is deviated due to mechanical errors in the rotation mechanism of the turntable and transmission between the rotation mechanism and the turntable, so that the situation that the motor rotates in place but a station of the turntable does not reach the station in the process occurs, or the situation that the angle deviation of the rotation mechanism does not exceed the allowable range and the angle deviation of the edge of the turntable exceeds the allowable range occurs because the angle deviation of the turntable is amplified by the edge of the turntable. When the two conditions occur, the motion controller of the motor still provides a feedback signal indicating that the station of the turntable is in place, so that the judgment on whether the station of the turntable is in place is wrong, mechanical faults can be caused, and the safety and the stability of the plasma processing equipment are reduced.
Disclosure of Invention
The invention aims to solve the technical problems in the prior art and provides a turntable positioning device, a loading transmission system and plasma processing equipment, which can monitor whether the station of a turntable reaches a preset position or not, so that the position abnormality of the station of the turntable can be known in time.
The turntable positioning device comprises a turntable and an origin detection unit, wherein a station is arranged on the turntable and used for bearing a workpiece; the system comprises an origin detection unit, a position detection unit and a control unit, wherein the origin detection unit is used for detecting the origin position of a rotary table and is characterized by further comprising an in-place detection unit which comprises a first detection module and a first identification module, wherein the first identification module is used for identifying the position of a station on the rotary table; the first detection module is used for judging whether the station reaches a preset position or not by detecting the first identification module.
The first identification module comprises a first convex part, and the first convex part is arranged on the peripheral wall of the turntable and is positioned at a position corresponding to the station; the first detection module comprises a first distance sensor and a first controller, wherein the first distance sensor is arranged on the periphery of the peripheral wall of the turntable and used for transmitting a detection signal to a path through which the first convex part passes when the turntable rotates from the origin position of the turntable, receiving a feedback signal from each position on the path and transmitting the feedback signal to the first controller; the first controller is used for judging whether the feedback signal comes from the first convex part or not when the turntable rotates to a preset angle, and if so, determining that the station reaches a preset position; if not, determining that the position of the station is abnormal; the preset angle is an angle which is required for the turntable to rotate from the original point position when the preset station reaches the preset position.
The number of the stations is multiple and the stations are arranged at intervals along the circumferential direction of the turntable, and the number of the first distance sensors is less than or equal to that of the stations; the number and the positions of the first convex parts correspond to those of the stations one by one, when the turntable is at the origin position, the position of each first distance sensor corresponds to the position of one of all the first convex parts, and each first distance sensor corresponds to a different first convex part.
The number of the stations is multiple, the stations are arranged at intervals along the circumferential direction of the turntable, and the number of the first convex parts is less than or equal to that of the stations; when the turntable is located at the origin position, the number and the positions of the first distance sensors correspond to those of the stations one by one, the position of each first convex part corresponds to one of the positions of all the first distance sensors, and each first convex part corresponds to different first distance sensors.
The origin detection unit comprises a second detection module and a second identification module, wherein the second identification module is used for identifying the origin position of the turntable; the second detection module is used for judging the origin position of the turntable by detecting the second identification module.
The second identification module comprises a second convex part, and the second convex part is arranged on the peripheral wall of the turntable and is positioned at a position corresponding to the original position of the turntable; the second detection module comprises a second distance sensor and a second controller, wherein the second distance sensor is arranged on the periphery of the peripheral wall of the turntable and used for transmitting a detection signal to a path through which the second convex part passes when the turntable rotates, receiving a feedback signal from each position on the path and transmitting the feedback signal to the second controller; the second controller is used for judging whether the feedback signal comes from the second convex part, and if so, determining that the turntable reaches the origin position according to the position of the second convex part.
Wherein the first protrusion comprises a first extension extending out of a lower surface of the turntable, and the second protrusion comprises a second extension extending out of an upper surface of the turntable; the first and second distance sensors emit detection signals toward paths through which the first and second extension portions pass, respectively.
Wherein the first protrusion comprises a first extension extending out of an upper surface of the turntable, and the second protrusion comprises a second extension extending out of a lower surface of the turntable; the first and second distance sensors emit detection signals toward paths through which the first and second extension portions pass, respectively.
The first identification module comprises a first through hole which is arranged on a bearing surface where a station of the rotary table is located and penetrates through the thickness of the rotary table, and the first through hole is located at a position corresponding to the station; the first detection module comprises a first correlation sensor and a first controller, wherein the first correlation sensor comprises a transmitting end and a receiving end which are respectively arranged at the upper side and the lower side of the turntable, and the transmitting end is used for transmitting a detection signal towards a path through which the first through hole on the bearing surface passes when the turntable rotates from the original point position of the turntable; the receiving end is used for receiving a detection signal from the transmitting end and penetrating through the first through hole, and sending the detection signal to the first controller; the first controller is used for judging whether the receiving end receives the detection signal when the turntable rotates to a preset angle, and if so, determining that the station reaches a preset position; if not, determining that the position of the station is abnormal; the preset angle is an angle which is required for the turntable to rotate from the original point position when the preset station reaches the preset position.
The number of the stations is multiple and the stations are arranged at intervals along the circumferential direction of the turntable, and the number of the first correlation sensors is less than or equal to the number of the stations; the number and the positions of the first through holes correspond to those of the stations one to one, when the turntable is located at the original point position, the position of the transmitting end and the position of the receiving end of each first correlation sensor correspond to the position of one of the first through holes, and the transmitting end and the receiving end of each first correlation sensor correspond to different first through holes.
The number of the stations is multiple, the stations are arranged at intervals along the circumferential direction of the rotary table, and the number of the first through holes is less than or equal to that of the stations; when the turntable is located at the origin position, the number and the positions of the first opposite-shooting sensors correspond to those of the stations one to one, the position of each first through hole corresponds to the positions of the transmitting end and the receiving end of one of the first opposite-shooting sensors, and each first through hole corresponds to the transmitting end and the receiving end of the different first opposite-shooting sensors.
The origin detection unit comprises a second detection module and a second identification module, wherein the second identification module is used for identifying the origin position of the turntable; the second detection module is used for judging the origin position of the turntable by detecting the second identification module.
The second identification module comprises a second through hole which is arranged on a bearing surface where the station of the rotary table is located and penetrates through the thickness of the rotary table, and the second through hole is located at a position corresponding to the original point position of the rotary table; the second detection module comprises a second correlation sensor and a second controller, wherein the second correlation sensor comprises a transmitting end and a receiving end which are respectively arranged at the upper side and the lower side of the turntable, and the transmitting end is used for transmitting a detection signal towards a path through which the second through hole passes on the bearing surface when the turntable rotates; the receiving end is used for receiving a detection signal from the transmitting end and penetrating through the second through hole, and sending the detection signal to the second controller; the second controller is used for judging whether the receiving end receives the detection signal or not, and if so, determining that the turntable reaches the original point position.
Wherein a center distance between the first through hole and the turntable is not equal to a center distance between the second through hole and the turntable.
Preferably, the second controller resets the rotation angle of the dial each time it is determined that the dial reaches the origin position.
The loading and conveying system comprises a loading and unloading chamber, a conveying chamber and a reaction chamber, wherein the loading and unloading chamber is used for loading or unloading substrates; the transfer chamber is arranged between the loading and unloading chamber and the reaction chamber, and is provided with a manipulator for transferring the substrate between the loading and unloading chamber and the reaction chamber; the reaction chamber comprises a turntable positioning device used for rotating the substrate to a preset position, and the turntable positioning device adopts the turntable positioning device.
The plasma processing equipment comprises a loading conveying system, and is characterized in that the loading conveying system adopts the turntable positioning device.
The invention has the following beneficial effects:
according to the turntable positioning device provided by the invention, the in-place detection unit can judge whether the station reaches the preset position or not by detecting the first identification module for identifying the position of the station on the turntable by virtue of the first detection module, so that the position abnormality of the station of the turntable can be known in time, the normal operation of the working process can be ensured, the mechanical fault can be avoided, and the safety and the stability of plasma processing equipment can be further improved.
According to the loading and conveying system provided by the invention, the substrate is rotated to the preset position by adopting the turntable positioning device provided by the invention, so that the normal operation of the working process can be ensured, and the mechanical fault can be avoided, thereby improving the safety and stability of the plasma processing equipment.
By adopting the loading and conveying system provided by the invention, the plasma processing equipment provided by the invention not only can ensure the normal operation of the working process, but also can avoid mechanical failure, thereby improving the safety and stability of the plasma processing equipment.
Drawings
FIG. 1 is a schematic diagram of a load transfer system of the prior art;
FIG. 2A is a top view of the reaction chamber of FIG. 1;
FIG. 2B is a cross-sectional view taken along line A-A of FIG. 2A;
FIG. 3 is a top view of a prior art turntable positioning device;
fig. 4A is a top view of a turntable positioning device according to an embodiment of the present invention;
FIG. 4B is a side view of FIG. 4A taken in the direction A;
fig. 5A is a top view of another turntable positioning device according to an embodiment of the present invention;
FIG. 5B is a side view of FIG. 5A taken from above A;
fig. 6A is a top view of a turntable positioning device according to a second embodiment of the present invention; and
fig. 6B is a cross-sectional view taken along line a-a in fig. 6A.
Detailed Description
In order to make those skilled in the art better understand the technical solution of the present invention, the turntable positioning device, the load transfer system and the plasma processing apparatus provided by the present invention will be described in detail below with reference to the accompanying drawings.
The turntable positioning device provided by the invention comprises a turntable, an original point detection unit and an in-place detection unit. Wherein, a station is arranged on the turntable and used for bearing a workpiece; the origin detection unit comprises a second detection module and a second identification module, and the second identification module is used for identifying the origin position of the turntable; the second detection module is used for judging the origin position of the turntable by detecting the second identification module. The in-place detection unit comprises a first detection module and a first identification module, and the first identification module is used for identifying the position of the station on the turntable; the first detection module is used for judging whether the station reaches a preset position by detecting the first identification module. Whether the station reaches the preset position or not can be judged by detecting the first identification module by means of the first detection module of the in-place detection unit, so that the position abnormality of the station of the turntable can be timely known, the normal operation of the working process can be ensured, mechanical faults can be avoided, and the safety and the stability of the plasma processing equipment can be improved.
Example one
Fig. 4A is a top view of a turntable positioning device according to an embodiment of the present invention. Fig. 4B is a side view of fig. 4A in a direction a. Referring to fig. 4A and 4B, in the present embodiment, a plurality of stations 51 are disposed on the turntable 50, and the stations 51 are spaced along the circumferential direction of the turntable 50.
In the in-place detection unit, the first identification module comprises first convex parts 54, the first convex parts 54 are arranged on the peripheral wall of the turntable 50, and the number and the positions correspond to those of the stations 51 one by one; the first detection module includes a first distance sensor 52 and a first controller (not shown in the drawings), wherein the first distance sensor 52 is disposed at the periphery of the outer circumferential wall of the turntable 50 to emit a detection signal toward a path through which the first protrusion 54 passes when the turntable 50 rotates from its origin position, and to receive a feedback signal from each position on the path, and to transmit the feedback signal to the first controller. In the present embodiment, the number of the first distance sensors 52 is less than or equal to the number of the stations 51, and when the turntable 50 is at the home position, the position of each first distance sensor 52 corresponds to the position of one of all the first protrusions 54, and each first distance sensor 52 corresponds to a different first protrusion 54. For example, in fig. 4A, the number of each of the stations 51 and the first projections 54 is eight; the number of the first distance sensors 52 is one, and when the dial 50 is at the home position, the first distance sensors 52 correspond to the first convex portions 54 located uppermost. The first controller is used for judging whether the feedback signal comes from the first convex part 54 or not when the turntable 50 rotates to a preset angle, and if so, determining that the station reaches a preset position; if not, determining that the position of the station 51 of the turntable is abnormal. The preset angle is an angle that the turntable needs to rotate from the original position when the preset station reaches the preset position. For example, in fig. 4A, if it is set that the first protrusion 54 located at the lowermost position reaches the predetermined position located at the uppermost position of the turntable 50, the turntable 50 needs to rotate 180 ° from the current origin position, at this time, the first controller determines whether the feedback signal is from the first protrusion 54, and if so, it is determined that the station 51 reaches the predetermined position; if not, the position of the station 51 of the turntable is determined to be abnormal.
In the origin detection unit, the second identification module includes a second protrusion 55, and the second protrusion 55 is provided on the outer circumferential wall of the turntable 50 at a position corresponding to the origin position of the turntable 50, as shown in fig. 4A; the second detection module includes a second distance sensor 53 and a second controller (not shown in the figure), wherein the second distance sensor 53 is disposed at the periphery of the outer circumferential wall of the turntable 50, and is configured to emit a detection signal toward a path through which the second protrusion 55 passes when the turntable 50 rotates, and receive a feedback signal from each position on the path, and transmit the feedback signal to the second controller; the second controller is configured to determine whether the feedback signal is from the second protrusion 55, and if so, determine that the turntable 50 reaches the origin position according to the position of the second protrusion 55.
Preferably, the second controller resets the rotation angle of the dial 50 each time it is determined that the dial 50 reaches the origin position, that is, resets the rotation angle of the dial 50 to zero during the rotation of the dial 50 as long as the second controller judges that the feedback signal is from the second protrusion 55. The rotation angle error of the turntable 50 is affected by the radius of the turntable 50, that is, the larger the radius of the turntable 50 is, the larger the rotation angle error of the turntable 50 is, and vice versa, and the rotation angle error of the turntable 50 is increased with the increase of the number of rotation turns of the turntable 50, which finally results in the rotation angle error of the turntable 50 exceeding the allowable safety range, thereby causing inaccurate positioning of the turntable 50. For this reason, by resetting the rotation angle of the dial 50 every time it is determined that the dial 50 reaches the home position by means of the second controller, the rotation angle error generated every rotation of the dial 50 can be cleared, which corresponds to repositioning the home position of the dial 50, so that the rotation angle error of the dial 50 can be controlled within an allowable safety range.
In the present embodiment, the second protrusion 55 and one of the first protrusions 54 are provided at the same position, and both adopt an integrated structure, as shown in fig. 4B, and, in order that the first distance sensor 52 can detect only the first protrusion 54 and the second distance sensor 53 can detect only the second protrusion 55, the first protrusion 54 includes a first extension 541 protruding from the upper surface of the dial 50, and the second protrusion 55 includes a second extension 551 protruding from the lower surface of the dial, and the first distance sensor 52 and the second distance sensor 53 emit detection signals toward paths through which the first extension 541 and the second extension 551 pass, respectively.
Since the first and second extending portions 541 and 551 have a height difference in the vertical direction, this enables the first distance sensor 52 to detect only the path that the first extending portion 541 passes through, and the second distance sensor 53 to detect only the path that the second extending portion 551 passes through, so that it can be ensured that the first and second distance sensors 52 and 53 are not interfered with by the second and first convex portions 55 and 54. In addition, by means of the first extension portion 541 and the second extension portion 551, the detection signals emitted by the first distance sensor 52 and the second distance sensor 53 can be higher or lower than the outer peripheral wall of the turntable 50, so that in the process of performing the in-place detection or the origin detection, the first distance sensor 52 and the second distance sensor 53 receive the feedback signals only when the first extension portion 541 and the second extension portion 551 pass through the first distance sensor 52 and the second distance sensor 53, respectively, which not only improves the detection sensitivity of the first distance sensor 52 and the second distance sensor 53, but also does not require a high requirement on the flatness of the outer peripheral wall of the turntable 50, so that the processing difficulty can be reduced, and the processing cost can be reduced.
Of course, in practical applications, the first protrusion may also include a first extension extending out of the lower surface of the turntable, and the second protrusion includes a second extension extending out of the upper surface of the turntable, and the first distance sensor and the second distance sensor emit the detection signal toward paths through which the first extension and the second extension pass, respectively.
Further, the first extension portion and the second extension portion may be omitted, and the horizontal distance between the detection surface of the first protrusion and the first distance sensor may be made different from the horizontal distance between the detection surface of the second protrusion and the second distance sensor, that is, the lengths of the first protrusion and the second protrusion in the radial direction of the turntable may be made different, so that the first distance sensor and the second distance sensor recognize the first protrusion and the second protrusion from the detected distance.
In the present embodiment, the first detection module and the second detection module are both detected by using a laser reflection type distance sensor, but the present invention is not limited to this, and in practical applications, other types of sensors may be used, and according to the type of the sensor, parameters such as the mounting method of the first detection module and the second detection module, the position and the distance relative to the turntable, and the like may be adjusted accordingly, and parameters such as the structure, the size, the material, and the mounting manner of the first identification module and the second identification module should be adjusted accordingly. As long as the origin detecting unit can detect the origin position of the turntable, and the in-place detecting unit can monitor whether the station of the turntable reaches the preset position.
It should be noted that, in the present embodiment, the number and the positions of the first protruding portions 54 correspond to the number and the positions of the stations 51 one by one, and the number of the first distance sensors 52 is less than or equal to the number of the stations 51, but the present invention is not limited to this, and in practical applications, the following arrangement may also be adopted: as shown in fig. 5A and 5B, the number of the first projections 54 is made smaller than or equal to the number of the stations; when the turntable is at the home position, the number and positions of the first distance sensors 52 correspond to those of the stations 51 one-to-one, and the position of each first protrusion 54 corresponds to the position of one of all the first distance sensors 52, and each first protrusion 54 corresponds to a different first distance sensor 52. For example, in fig. 5A, each of the number of the stations 51 and the first distance sensors 52 is eight; the number of the first convex portions 54 is one, and when the dial 50 is at the origin position, the first convex portions 54 correspond to the first distance sensors 52 located uppermost.
It should be further noted that in the present embodiment, the second protrusion 55 and one of the first protrusions 54 are disposed at the same position, in other words, the origin position of the turntable 50 corresponds to the position of one of the stations 51, but the present invention is not limited thereto, and in practical applications, the origin position of the turntable may be freely set according to specific needs, that is, the position of the second protrusion may be different from the position of the first protrusion, and the two may be independent of each other.
It should be further noted that in the present embodiment, the number of the stations 51 is plural, and the stations are arranged at intervals along the circumferential direction of the turntable 50, but the present invention is not limited to this, and in practical application, the number of the stations may be one, and the stations are arranged at specific positions along the circumferential direction of the turntable according to specific needs. In addition, the first convex part is located at the position corresponding to the station, which means that the first convex part and the station have a preset position relationship, and when the position of the first convex part is determined, the position of the station can be indirectly obtained according to the corresponding relationship. Similarly, the fact that the second convex portion is located at a position corresponding to the origin position of the turntable means that the second convex portion has a preset positional relationship with the origin position of the turntable, and when the position of the second convex portion is determined, the origin position of the turntable can be indirectly obtained from the corresponding relationship.
Example two
Fig. 6A is a top view of a turntable positioning device according to a second embodiment of the present invention. Fig. 6B is a cross-sectional view taken along line a-a in fig. 6A. Referring to fig. 6A and 6B, in the present embodiment, a plurality of stations 51 are disposed on the turntable 50, and the stations 51 are spaced along the circumferential direction of the turntable 50.
In the in-place detection unit, the first identification module comprises first through holes 61 which are arranged on a bearing surface (namely, the surface of the turntable, which is used for bearing the workpiece) of the turntable 50 where the stations 51 are located and penetrate through the thickness of the turntable 50, and the number and the positions of the first through holes 61 correspond to those of the stations 51 one by one; the first detection module comprises a first correlation sensor 63 and a first controller (not shown in the figure), wherein the first correlation sensor 63 comprises an emitting end and a receiving end which are respectively arranged at the upper side and the lower side of the turntable 50, and the emitting end is used for emitting a detection signal towards a path which the first through hole 61 passes through on the bearing surface of the turntable 50 when the turntable 50 rotates from the origin position; the receiving end is configured to receive a detection signal from the transmitting end through the first through hole 63, and send the detection signal to the first controller. It is easily understood that the detection signal emitted from the transmitting terminal may pass through the through-hole and be received by the receiving terminal only in a case where the transmitting terminal, the through-hole, and the receiving terminal are in a straight line in the vertical direction.
In the present embodiment, the number of the first opposite-jet sensors 63 is less than or equal to the number of the stations 51, and when the turntable 50 is at the origin position, the position of the emitting end and the receiving end of each first opposite-jet sensor 63 corresponds to the position of one of all the first through holes 61, and the emitting end and the receiving end of each first opposite-jet sensor 63 correspond to different first through holes 61. For example, in fig. 6A, the number of each of the stations 51 and the first through holes 61 is eight; the number of the first opposite-radiation sensors 63 is one, and the transmitting end and the receiving end of the first opposite-radiation sensors 63 correspond to the first through hole 61 located at the rightmost side of the turntable 50 when the turntable 50 is at the origin position. The first controller is used for judging whether the receiving end receives the detection signal when the turntable 50 rotates to a preset angle, and if so, determining that the station 51 reaches a preset position; if not, determining that the position of the station 51 is abnormal; the predetermined angle is an angle at which the turntable 50 needs to be rotated from its original position when the predetermined station 51 reaches a predetermined position. For example, in fig. 6A, if it is set that the first through hole 61 located at the leftmost side of the turntable 50 reaches the predetermined position located at the rightmost side of the turntable 50, the turntable 50 needs to rotate 180 ° from the current origin position, at this time, the first controller determines whether the receiving end receives the detection signal, and if so, it determines that the station 51 reaches the predetermined position; if not, the position of the station 51 of the turntable is determined to be abnormal.
In the origin detection unit, the second identification module includes a second through hole 60 disposed on the bearing surface of the turntable 50 where the station 51 is located and penetrating through the thickness of the turntable 50, and the second through hole 60 is located at a position corresponding to the origin position of the turntable 50, as shown in fig. 6B; the second detection module comprises a second correlation sensor 62 and a second controller (not shown in the figure), wherein the second correlation sensor 62 comprises an emitting end and a receiving end which are respectively arranged at the upper side and the lower side of the turntable 50, and the emitting end is used for emitting a detection signal towards a path through which the second through hole 60 on the bearing surface of the turntable 50 passes when the turntable 50 rotates; the receiving end is used for receiving a detection signal from the transmitting end, which passes through the second through hole 60, and sending the detection signal to the second controller; the second controller is used for judging whether the receiving end receives the detection signal, and if so, determining that the turntable 50 reaches the original point position.
Preferably, the second controller resets the rotation angle of the dial 50 each time it is determined that the dial 50 reaches the origin position, and the resetting method is similar to that of the first embodiment described above, and since the detailed description has already been given in the first embodiment described above, it is not described here again.
In the present embodiment, in order to enable the first correlation sensor 63 to detect only the first through hole 61 and the second correlation sensor 62 to detect only the second through hole 60, the center distance L1 between the second through hole 60 and the turntable is not equal to the center distance L2 between the first through hole 61 and the turntable 50, as shown in fig. 6B, that is, the paths traveled by the first through hole 61 and the second through hole 60 are respectively located at different radii in the circumferential direction of the turntable 50, which may enable the first correlation sensor 63 to detect only the path traveled by the first through hole 61 and enable the second correlation sensor 62 to detect only the path traveled by the second through hole 60, thereby ensuring that the first correlation sensor 63 and the second correlation sensor 62 are not interfered by the second through hole 60 and the first through hole 61.
It should be noted that, in the present embodiment, the number and the positions of the first through holes 61 correspond to the number and the positions of the stations 51 one by one, and the number of the first correlation sensors 63 is less than or equal to the number of the stations 51, but the present invention is not limited to this, and in practical applications, the following arrangement may also be adopted: the number of first through holes 61 is less than or equal to the number of stations 51; when the turntable 50 is at the home position, the number and positions of the first registration sensors 63 correspond to those of the stations 51 one-to-one, and the position of each first through hole 61 corresponds to the position of one of all the first registration sensors 63, and each first through hole 61 corresponds to a different first registration sensor 63.
The embodiment of the invention also provides a loading and conveying system, which comprises a loading and unloading chamber, a conveying chamber and a reaction chamber, wherein the loading and unloading chamber is used for loading or unloading the substrate; the transfer chamber is arranged between the loading and unloading chamber and the reaction chamber and is provided with a manipulator for transferring the substrate between the loading and unloading chamber and the reaction chamber; the reaction chamber comprises a turntable positioning device for rotating the substrate to a predetermined position, wherein the turntable positioning device adopts the turntable positioning device provided by the above embodiments of the invention.
According to the loading and conveying system provided by the embodiment of the invention, the substrate is rotated to the preset position by adopting the turntable positioning device provided by the embodiment of the invention, so that the normal operation of the working process can be ensured, and the mechanical fault can be avoided, thereby improving the safety and stability of the plasma processing equipment.
The invention also provides plasma processing equipment which comprises a loading transmission system, wherein the loading transmission system adopts the turntable positioning device provided by the embodiment of the invention.
According to the plasma processing equipment provided by the embodiment of the invention, the loading and conveying system provided by the invention is adopted, so that the normal operation of the working process can be ensured, and the mechanical fault can be avoided, thereby improving the safety and stability of the plasma processing equipment.
It will be understood that the above embodiments are merely exemplary embodiments taken to illustrate the principles of the present invention, which is not limited thereto. It will be apparent to those skilled in the art that various changes and modifications can be made therein without departing from the spirit and scope of the invention, and these changes and modifications are to be considered as within the scope of the invention.
Claims (9)
1. A turntable positioning device comprises a turntable, wherein a station is arranged on the turntable and used for bearing a workpiece; the turntable positioning device is characterized by also comprising an in-place detection unit which comprises a first detection module and a first identification module, wherein the in-place detection unit is used for detecting the position of the origin of the turntable
The first identification module is used for identifying the position of the station on the turntable; the first detection module is used for judging whether the station reaches a preset position by detecting the first identification module;
the first identification module comprises a first through hole which is arranged on a bearing surface where the station of the rotary table is located and penetrates through the thickness of the rotary table, and the first through hole is located at a position corresponding to the station;
the first detection module includes a first correlation sensor and a first controller, wherein,
the first correlation sensor comprises an emitting end and a receiving end which are respectively arranged at the upper side and the lower side of the turntable, and the emitting end is used for emitting a detection signal towards a path which the first through hole on the bearing surface passes through when the turntable rotates from the original point position of the turntable; the receiving end is used for receiving a detection signal from the transmitting end and penetrating through the first through hole, and sending the detection signal to the first controller;
the first controller is used for judging whether the receiving end receives the detection signal when the turntable rotates to a preset angle, and if so, determining that the station reaches a preset position; if not, determining that the position of the station is abnormal; the preset angle is an angle which is required for the turntable to rotate from the original point position when the preset station reaches the preset position.
2. The turntable positioning device according to claim 1, wherein the number of the stations is plural and is arranged at intervals along the circumferential direction of the turntable, and the number of the first correlation sensors is less than or equal to the number of the stations;
the number and the positions of the first through holes correspond to those of the stations one to one, when the turntable is located at the original point position, the position of the transmitting end and the position of the receiving end of each first correlation sensor correspond to the position of one of the first through holes, and the transmitting end and the receiving end of each first correlation sensor correspond to different first through holes.
3. The rotary table positioning device as claimed in claim 1, wherein the number of the stations is plural and is arranged at intervals along the circumferential direction of the rotary table, and the number of the first through holes is less than or equal to the number of the stations;
when the turntable is located at the origin position, the number and the positions of the first opposite-shooting sensors correspond to those of the stations one to one, the position of each first through hole corresponds to the positions of the transmitting end and the receiving end of one of the first opposite-shooting sensors, and each first through hole corresponds to the transmitting end and the receiving end of the different first opposite-shooting sensors.
4. The turntable positioning device of claim 1, wherein the origin detection unit comprises a second detection module and a second identification module, wherein
The second identification module is used for identifying the origin position of the turntable;
the second detection module is used for judging the origin position of the turntable by detecting the second identification module.
5. The turntable positioning device according to claim 4, wherein the second identification module comprises a second through hole which is arranged on a bearing surface where the stations of the turntable are located and penetrates through the thickness of the turntable, and the second through hole is located at a position corresponding to the origin position of the turntable;
the second detection module comprises a second correlation sensor and a second controller, wherein,
the second correlation sensor comprises a transmitting end and a receiving end which are respectively arranged at the upper side and the lower side of the turntable, and the transmitting end is used for transmitting a detection signal towards a path through which the second through hole on the bearing surface passes when the turntable rotates; the receiving end is used for receiving a detection signal from the transmitting end and penetrating through the second through hole, and sending the detection signal to the second controller;
the second controller is used for judging whether the receiving end receives the detection signal or not, and if so, determining that the turntable reaches the original point position.
6. The apparatus of claim 5, wherein a center-to-center distance between the first through hole and the turntable is not equal to a center-to-center distance between the second through hole and the turntable.
7. The dial positioning device of claim 5, wherein the second controller resets the rotation angle of the dial each time it is determined that the dial reaches the home position.
8. A loading and transporting system comprises a loading and unloading chamber, a transporting chamber and a reaction chamber, wherein the loading and unloading chamber is used for loading or unloading substrates; the transfer chamber is arranged between the loading and unloading chamber and the reaction chamber, and is provided with a manipulator for transferring the substrate between the loading and unloading chamber and the reaction chamber; the reaction chamber comprises a turntable positioning device for rotating the substrate to a predetermined position, wherein the turntable positioning device adopts the turntable positioning device as claimed in any one of claims 1 to 7.
9. A plasma processing apparatus comprising a load transfer system, wherein the load transfer system employs the load transfer system of claim 8.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201710992688.XA CN107818932B (en) | 2013-09-09 | 2013-09-09 | Turntable positioning device, loading and conveying system and plasma processing equipment |
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201310406341.4A CN104425331B (en) | 2013-09-09 | 2013-09-09 | Turntable positioning device, loading Transmission system and plasma processing device |
| CN201710992688.XA CN107818932B (en) | 2013-09-09 | 2013-09-09 | Turntable positioning device, loading and conveying system and plasma processing equipment |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201310406341.4A Division CN104425331B (en) | 2013-09-09 | 2013-09-09 | Turntable positioning device, loading Transmission system and plasma processing device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN107818932A CN107818932A (en) | 2018-03-20 |
| CN107818932B true CN107818932B (en) | 2020-02-14 |
Family
ID=52627748
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201710992688.XA Active CN107818932B (en) | 2013-09-09 | 2013-09-09 | Turntable positioning device, loading and conveying system and plasma processing equipment |
| CN201310406341.4A Active CN104425331B (en) | 2013-09-09 | 2013-09-09 | Turntable positioning device, loading Transmission system and plasma processing device |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201310406341.4A Active CN104425331B (en) | 2013-09-09 | 2013-09-09 | Turntable positioning device, loading Transmission system and plasma processing device |
Country Status (3)
| Country | Link |
|---|---|
| CN (2) | CN107818932B (en) |
| TW (1) | TWI588077B (en) |
| WO (1) | WO2015032136A1 (en) |
Families Citing this family (27)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105063575B (en) * | 2015-09-15 | 2018-05-15 | 广东省中科宏微半导体设备有限公司 | Substrate pallet, substrate localization method and substrate alignment system |
| CN105203539A (en) * | 2015-10-15 | 2015-12-30 | 山东麦田生物技术有限公司 | Rotating disc type multi-project immune chromatographic quantitative analysis system |
| CN105300653A (en) * | 2015-12-09 | 2016-02-03 | 中国航空工业集团公司哈尔滨空气动力研究所 | Test section upper and lower rotating disk offset induction apparatus |
| CN106706947B (en) * | 2017-03-12 | 2018-06-19 | 济南海能仪器股份有限公司 | A kind of sample injection method of autosampler and kjeldahl apparatus detecting system |
| CN108987297B (en) * | 2017-05-31 | 2021-10-26 | 上海微电子装备（集团）股份有限公司 | Rotating device, chip bonding device and chip bonding method |
| CN107932166B (en) * | 2017-11-09 | 2020-10-23 | 广东天机工业智能系统有限公司 | Positioning method and device of multi-station turntable, storage medium and positioning equipment |
| CN108055624A (en) * | 2017-11-14 | 2018-05-18 | 佛山市南海科利华数控科技有限公司 | Convenient for the automatic voice coil winding machine scissors system of flying fork type of positioning |
| CN108381296B (en) * | 2018-03-23 | 2023-12-08 | 珠海格力智能装备有限公司 | Locating device and flange processing equipment with same |
| CN108688185B (en) * | 2018-04-04 | 2021-03-12 | 芜湖捷欧汽车部件有限公司 | Rotary conveying device of vacuum tank hot melting welding machine |
| TW201946581A (en) * | 2018-05-14 | 2019-12-16 | 瑞士商雀巢製品股份有限公司 | Apparatus for dispensing individual portions of beverage precursor for preparing a beverage therefrom |
| CN109018875A (en) * | 2018-08-23 | 2018-12-18 | 安徽纽创自动化装备有限公司 | A kind of automatic rotationally conveying device |
| CN111374516B (en) * | 2018-12-28 | 2021-12-03 | 浙江苏泊尔家电制造有限公司 | Cooking appliance and cooking method |
| CN110040446A (en) * | 2019-04-22 | 2019-07-23 | 苏州博众机器人有限公司 | A kind of delivering turntable and its delivering method |
| TWI686343B (en) * | 2019-06-26 | 2020-03-01 | 徐雅雯 | Positioning device for predicting feeding time and feeding position |
| KR20210026679A (en) * | 2019-08-30 | 2021-03-10 | 캐논 톡키 가부시키가이샤 | Deposition amount information acquiring apparatus, film forming apparatus, open-close apparatus, film forming method and manufacturing method of electronic device |
| CN110592560B (en) * | 2019-10-18 | 2022-02-22 | 北京北方华创微电子装备有限公司 | Process disc alignment method, process disc alignment device and semiconductor processing equipment |
| CN110817293B (en) * | 2019-11-23 | 2022-02-01 | 武汉佳悦涵发泡科技有限公司 | Disc type production platform |
| CN110919606A (en) * | 2019-11-29 | 2020-03-27 | 歌尔股份有限公司 | Automatic leveling and aligning device |
| CN111687063A (en) * | 2020-06-10 | 2020-09-22 | 重庆市机电设计研究院 | Omnibearing vision detection system and working method thereof |
| CN111562222A (en) * | 2020-06-10 | 2020-08-21 | 重庆市机电设计研究院 | All-round visual detection system |
| CN111933549B (en) * | 2020-07-28 | 2023-12-22 | 北京北方华创微电子装备有限公司 | Semiconductor processing equipment and method for detecting sliding sheets |
| CN113137942B (en) * | 2021-04-15 | 2022-12-06 | 珠海格力智能装备有限公司 | Positioning system and positioning method |
| CN114442554A (en) * | 2022-02-14 | 2022-05-06 | 众信方智(苏州)智能技术有限公司 | Control system and method for turntable machining system |
| CN114905167B (en) * | 2022-06-30 | 2024-01-02 | 广东舜元激光科技有限公司 | Cutting control method and system |
| CN115418629B (en) * | 2022-08-17 | 2024-01-12 | 杭州富芯半导体有限公司 | Method for thin film deposition |
| CN117049179B (en) * | 2023-07-11 | 2024-08-09 | 上海稷以科技有限公司 | Semiconductor automation device and automation control method |
| CN117583271A (en) * | 2024-01-03 | 2024-02-23 | 广州因明智能科技有限公司 | Feeding and sorting device |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1334959A (en) * | 1999-02-12 | 2002-02-06 | Lpe公司 | Device and method for handling substrates by means of self-levelling vacuum system in epitaxial induction reactors |
| CN101131953A (en) * | 2006-08-23 | 2008-02-27 | 北京北方微电子基地设备工艺研究中心有限责任公司 | Locating calibration device and locating calibration system |
| CN102095895A (en) * | 2010-12-14 | 2011-06-15 | 边文超 | Calibration system of wind direction sensor |
| TW201250048A (en) * | 2011-03-31 | 2012-12-16 | Taiyo Nippon Sanso Corp | Vapor deposition apparatus |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5533335B2 (en) * | 2009-07-22 | 2014-06-25 | 東京エレクトロン株式会社 | Processing apparatus and operation method thereof |
| JP5538291B2 (en) * | 2011-04-13 | 2014-07-02 | パナソニック株式会社 | Plasma processing apparatus and plasma processing method |
| CN103130922B (en) * | 2011-11-29 | 2015-04-15 | 中国石油化工股份有限公司 | Catalyst carrier used for olefin polymerization and preparation method thereof |
| JP6042196B2 (en) * | 2011-12-22 | 2016-12-14 | キヤノンアネルバ株式会社 | Sputtering apparatus, sputtering apparatus control apparatus, and film forming method |
| CN103144922B (en) * | 2012-12-25 | 2014-12-24 | 云南省烟草公司曲靖市公司 | Vertical lifting device of materials |
-
2013
- 2013-09-09 CN CN201710992688.XA patent/CN107818932B/en active Active
- 2013-09-09 CN CN201310406341.4A patent/CN104425331B/en active Active
- 2013-12-04 TW TW102144392A patent/TWI588077B/en active
- 2013-12-05 WO PCT/CN2013/088656 patent/WO2015032136A1/en active Application Filing
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1334959A (en) * | 1999-02-12 | 2002-02-06 | Lpe公司 | Device and method for handling substrates by means of self-levelling vacuum system in epitaxial induction reactors |
| CN101131953A (en) * | 2006-08-23 | 2008-02-27 | 北京北方微电子基地设备工艺研究中心有限责任公司 | Locating calibration device and locating calibration system |
| CN102095895A (en) * | 2010-12-14 | 2011-06-15 | 边文超 | Calibration system of wind direction sensor |
| TW201250048A (en) * | 2011-03-31 | 2012-12-16 | Taiyo Nippon Sanso Corp | Vapor deposition apparatus |
Also Published As
| Publication number | Publication date |
|---|---|
| TWI588077B (en) | 2017-06-21 |
| CN104425331A (en) | 2015-03-18 |
| CN104425331B (en) | 2017-09-29 |
| TW201509777A (en) | 2015-03-16 |
| WO2015032136A1 (en) | 2015-03-12 |
| CN107818932A (en) | 2018-03-20 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN107818932B (en) | Turntable positioning device, loading and conveying system and plasma processing equipment | |
| US10777445B2 (en) | Substrate processing apparatus and substrate transfer method | |
| KR102181121B1 (en) | Substrate transfer apparatus and control method of substrate transfer apparatus | |
| KR20220041171A (en) | Integrated Adaptive Positioning Systems and Routines for Automated Wafer Handling Robot Learning and Health Check (HEALTH CHECK) | |
| KR101335146B1 (en) | Probe card detecting apparatus, wafer position alignment apparatus and wafer position alignment method | |
| US20090182454A1 (en) | Method and apparatus for self-calibration of a substrate handling robot | |
| TW200527172A (en) | Auto-diagnostic method and apparatus | |
| CN104979229B (en) | Silicon chip distribution image combined detection method and device | |
| CN105097592A (en) | Photoelectric scanning method and device for silicon wafer distribution state in semiconductor device bearing area | |
| CN104916573A (en) | Combined detection method and device for silicon wafer distributed state on load bearing region of semiconductor device | |
| CN105097616A (en) | Manipulator movement-based silicon wafer distribution state combination detection method and device | |
| CN104752295A (en) | Position monitoring device, plasma processing device and method for loading and unloading workpiece | |
| CN102446802A (en) | Wafer platform | |
| CN104979245A (en) | Photoelectric detection method and photoelectric detection device for silicon wafer distribution state of semiconductor equipment carrying region | |
| CN114613711A (en) | Wafer adjusting device, adjusting method and semiconductor manufacturing equipment | |
| CN105514011A (en) | Mechanical arm and method for safely transferring silicon chips | |
| CN110364461B (en) | Wafer state detection equipment and method and wafer loading and unloading chamber | |
| CN104899887B (en) | The silicon chip distribution image detecting method and device of semiconductor equipment bearing area | |
| CN105789103B (en) | Rotating table system and semiconductor processing equipment | |
| CN111668131A (en) | System and method for detecting position deviation of mechanical arm and wafer | |
| KR20090029419A (en) | Apparatus and method for loading wafer in prober | |
| CN212967607U (en) | Device for detecting wafer integrity of Centura ACP machine | |
| KR100697661B1 (en) | Notch aligner and method for aligning the notch | |
| KR20080037785A (en) | Elevating drive apparatus for a elevator of the load-lock chamber | |
| KR102681106B1 (en) | Wafer aligner and aligner monitoring device that automatically generates status information by monitoring it |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| GR01 | Patent grant | ||
| GR01 | Patent grant |