KR20080037785A - Elevating drive apparatus for a elevator of the load-lock chamber - Google Patents

Elevating drive apparatus for a elevator of the load-lock chamber Download PDF

Info

Publication number
KR20080037785A
KR20080037785A KR1020060104856A KR20060104856A KR20080037785A KR 20080037785 A KR20080037785 A KR 20080037785A KR 1020060104856 A KR1020060104856 A KR 1020060104856A KR 20060104856 A KR20060104856 A KR 20060104856A KR 20080037785 A KR20080037785 A KR 20080037785A
Authority
KR
South Korea
Prior art keywords
elevator
step motor
control unit
lock chamber
encoder
Prior art date
Application number
KR1020060104856A
Other languages
Korean (ko)
Other versions
KR100850063B1 (en
Inventor
김종훈
Original Assignee
동부일렉트로닉스 주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 동부일렉트로닉스 주식회사 filed Critical 동부일렉트로닉스 주식회사
Priority to KR1020060104856A priority Critical patent/KR100850063B1/en
Publication of KR20080037785A publication Critical patent/KR20080037785A/en
Application granted granted Critical
Publication of KR100850063B1 publication Critical patent/KR100850063B1/en

Links

Images

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67703Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
    • H01L21/6773Conveying cassettes, containers or carriers
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67703Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
    • H01L21/67712Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations the substrate being handled substantially vertically
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67739Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67739Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
    • H01L21/67742Mechanical parts of transfer devices
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67763Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading
    • H01L21/67772Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading involving removal of lid, door, cover

Abstract

An elevating drive apparatus for an elevator of a load-lock chamber is provided to prevent the collision of a robot arm for a transfer and the damage of a wafer by forming a linear movement detecting unit additionally. A lead screw(106a) is screw-coupled to an elevating driving shaft(104b) of an elevator(104) so that the elevator elevates according to the rotation thereof. A step motor(106c) rotates the lead screw. An encoder(106d) measures the revolution of the step motor. A control unit(108) controls the operation of the step motor. The control unit checks whether the step motor is exactly operated through the encoder. A linear movement detecting unit(106e) measures the elevation of the elevator to send it to the control unit. The linear movement detecting unit makes the control unit check whether the elevator elevates up to the target spot by comparing it with the rotated value of the step motor transmitted from the encoder.

Description

로드락 챔버의 엘리베이터 승강구동장치{ELEVATING DRIVE APPARATUS FOR A ELEVATOR OF THE LOAD-LOCK CHAMBER}Elevator lifting and driving device of the load lock chamber {ELEVATING DRIVE APPARATUS FOR A ELEVATOR OF THE LOAD-LOCK CHAMBER}

도 1은 종래의 로드락 챔버를 보여주는 개략 구성도, 1 is a schematic configuration diagram showing a conventional load lock chamber,

도 2는 본 발명의 바람직한 실시예에 따른 로드락 챔버의 엘리베이터 승강구동장치를 보여주는 개략 구성도이다. Figure 2 is a schematic diagram showing the elevator lift drive device of the load lock chamber according to an embodiment of the present invention.

<도면의 주요부분에 대한 부호의 설명><Description of the symbols for the main parts of the drawings>

10 : 웨이퍼 카세트 20 : 트랜스퍼용 로봇암10 wafer cassette 20 robot arm for transfer

100 : 로드락 챔버 102 : 본체100: load lock chamber 102: main body

102a : 도어 104 : 엘리베이터102a: Door 104: Elevator

104a : 스테이지 104b : 승강구동축104a: stage 104b: lifting drive shaft

104c : 드라이브암 104c-1 : 너트부104c: drive arm 104c-1: nut part

106 : 승강구동장치부 106a : 리드스크류106: lifting drive unit 106a: lead screw

106a-1 : 리드스크류측 풀리 106b : 전동벨트106a-1: Lead screw side pulley 106b: Electric belt

106c : 스텝모터 106c-1 : 회전축106c: step motor 106c-1: rotation axis

106c-2 : 모터측 풀리 106d : 엔코더106c-2: Motor side pulley 106d: Encoder

106e : 선형이동검출수단 106e-1 : 가동부106e: linear movement detecting means 106e-1: movable part

106e-2 : 실린더부 106e-2-1 : 유체106e-2: Cylinder portion 106e-2-1: Fluid

106e-2-2 : 변형판 106e-2-3 : 변형검출수단106e-2-2: deformation plate 106e-2-3: deformation detection means

106e-3 : 고정부 106e-4 : 피스톤부106e-3: Fixed part 106e-4: Piston part

108 : 제어부 w : 웨이퍼 108: control unit w: wafer

본 발명은 반도체 소자 제조용 로드락 챔버(load-lock chamber)의 엘리베이터(elevator) 승강구동장치에 관한 것으로서, 더욱 상세하게는 스텝모터의 회전 구동에 따라 엘리베이터가 실제로 정확하게 승강되었는지를 검출하여 엘리베이터가 비정상적으로 승강 작동된 경우 바로 이상조치를 취할 수 있게 됨으로써 이후의 엘리베이터상에 놓인 웨이퍼 카세트에 대한 트랜스퍼용 로봇암의 충돌 및 그에 따른 웨이퍼 파손을 미연에 방지할 수 있게 되는 로드락 챔버의 엘리베이터 승강구동장치에 관한 것이다. BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an elevator lift drive device of a load-lock chamber for manufacturing a semiconductor device. More specifically, the elevator is abnormally detected by detecting whether the elevator actually lifts correctly according to the rotational drive of the step motor. When the lifting operation is carried out, the elevator lifting and lowering device of the load lock chamber which can prevent the collision of the transfer robot arm and subsequent wafer damage to the wafer cassette placed on the elevator afterwards can be taken immediately. It is about.

일반적으로, 반도체 소자를 제조하기 위한 여러 단위 공정장치들은 대부분 밀폐된 가공공간을 형성하기 위하여 공정챔버(chamber)를 구비하게 되며, 해당 공정챔버의 내부는 통상 고진공, 고압, 고온과 같은 특수환경 조건으로 조성되게 된다. In general, various unit processing apparatuses for manufacturing a semiconductor device have a process chamber to form an enclosed processing space, and the interior of the process chamber is usually subjected to special environmental conditions such as high vacuum, high pressure, and high temperature. It will be composed.

그리고, 특수환경 조건의 공정챔버내로 공정대상물인 웨이퍼(wafer)를 바로 직접적으로 투입하게 되면, 해당 웨이퍼가 급격한 스트레스(stress)를 받아 손상되게 되고, 또한 외부 영향으로 공정챔버내의 환경 조건이 불량해질 수 있게 된다. In addition, if a wafer, which is a process object, is directly injected into a process chamber under a special environmental condition, the wafer may be damaged by a sudden stress, and environmental conditions in the process chamber may be poor due to external influences. It becomes possible.

따라서, 이러한 문제점들을 방지하고자 웨이퍼가 공정챔버내로 투입되기에 앞서 해당 공정챔버와 내부 환경조건이 근접하는 로드락 챔버(load-lock chamber)내에 우선적으로 웨이퍼를 투입한 다음, 해당 웨이퍼를 다시 공정챔버내로 옮겨 로딩(loading)하게 되며, 즉 로드락 챔버는 일종의 완충 챔버의 역할을 하게 된다. Therefore, in order to prevent these problems, prior to the wafer being introduced into the process chamber, the wafer is preferentially introduced into a load-lock chamber in which the process chamber is close to the internal environmental conditions, and then the wafer is placed back into the process chamber. It will be loaded into and loaded, that is, the load lock chamber will act as a kind of buffer chamber.

도 1은 종래의 반도체 소자 제조용 로드락 챔버에 대한 개략 구성도이다. 1 is a schematic configuration diagram of a load lock chamber for manufacturing a conventional semiconductor device.

로드락 챔버(100)는, 다수매의 웨이퍼(w)가 상하로 적재되어 있는 웨이퍼 카세트(cassette)(10)의 출입을 위한 도어(door)(102a)가 일측에 형성되고 그 밀폐되는 내부에는 공정챔버와 근접하는 환경조건이 형성되게 되는 본체(102)와, 본체(102)내에 구비되어 로딩되는 웨이퍼 카세트(10)를 상면상에 안착한 상태에서 승강되게 되는 엘리베이터(elevator)(104)와, 엘리베이터(104)를 승강 구동시키기 위해 외부에 구비되게 되는 승강구동장치부(106)와, 승강구동장치부(106)에 대한 작동 제어를 실시하게 되는 제어부(108)를 포함하게 된다. In the load lock chamber 100, a door 102a for entering and exiting a wafer cassette 10 in which a plurality of wafers w are stacked up and down is formed at one side, and the inside of the load lock chamber 100 is sealed. A main body 102 to form an environmental condition close to the process chamber, an elevator 104 to be elevated in a state where the wafer cassette 10 provided and loaded in the main body 102 is seated on an upper surface thereof, Lifting drive unit 106 to be provided to the outside to drive the elevator 104, and the control unit 108 to perform the operation control for the lifting drive unit 106.

전술한 엘리베이터(104)는, 본체(102)내에 구비되어 그 상면상에 웨이퍼 카세트(10)가 안착되게 되는 스테이지(stage)(104a)와, 이 스테이지(104a)의 하부측에 그 상단부가 결합되어 본체(102) 외부로 연장되도록 수직되게 구비되게 되는 승강구동축(104b)과, 일단은 승강구동축(104b)에 고정 결합을 이루고 타단은 후술하는 리드스크류(106a)측과 나사 결합을 이루는 너트부(104c-1)로 형성되어 수평방향으로 구비되게 되는 드라이브암(drive arm)(104c)으로 구성되게 된다. The above-mentioned elevator 104 is provided in the main body 102 so that the stage 104a in which the wafer cassette 10 is seated on the upper surface thereof, and the upper end thereof are coupled to the lower side of the stage 104a. And a lift drive shaft 104b vertically provided to extend outside the main body 102, and one end of which is fixedly coupled to the lift drive shaft 104b, and the other end of which is a screw portion that forms a screw connection with the side of the lead screw 106a. And a drive arm 104c formed in the horizontal direction.

승강구동장치부(106)는, 엘리베이터(104)의 승강구동축(104b)과 평행하도록 일측에 수직되게 구비되게 되는 리드스크류(lead screw)(106a)와, 제어부(108)의 제어에 따라 작동되어 리드스크류(106a)를 소정량 회전시키게 되는 스텝모터(step motor)(106c)와, 스텝모터(106c)의 회전축(106c-1)상의 모터측 풀리(pully)(106c-2)와 리드스크류(106a)측 풀리(106a-1)간을 전동 연결하도록 구비되게 되는 전동벨트(belt)(106b)와, 스텝모터(106c)의 실제 회전된 양을 측정하여 제어부(108)로 송출함으로써 제어부(108)로 하여금 스텝모터(106c)가 정확하게 작동되었는지를 확인할 수 있도록 하기 위해 스텝모터(106c)의 회전축(106c-1)에 대해 구비되게 되는 엔코더(encoder)(106d)로 이루어지게 된다. The elevating drive unit 106 is operated under the control of the lead screw 106a and the control unit 108 which are provided vertically on one side so as to be parallel to the elevating drive shaft 104b of the elevator 104. A step motor 106c for rotating the screw 106a by a predetermined amount, a motor side pulley 106c-2 and a lead screw 106a on the rotation shaft 106c-1 of the step motor 106c. The control unit 108 by measuring the actual amount of rotation of the transmission belt (106b) and the step motor (106c) which is provided to electrically connect between the side pulley (106a-1) and sent to the control unit 108 The encoder 106d is provided with respect to the rotational axis 106c-1 of the stepper motor 106c so as to confirm that the stepper motor 106c is correctly operated.

따라서, 외부로부터 웨이퍼 카세트(10)가 이송되어 본체(102)내의 엘리베이터(104)의 스테이지(104a)상에 안착된 상태에서, 제어부(108)의 작동 제어에 따라 스텝모터(106c)가 회전 작동되게 되면, 스텝모터(106c)의 회전 구동력이 전동벨트(106b)를 통해 리드스크류(106a)측으로 전달되어 리드스크류(106a)가 회전되게 되고, 리드스크류(106a)의 회전에 따라 해당 리드스크류(106a)에 대해 일단의 너트부(104c-1)를 통해 나사 결합을 이루고 있는 드라이브암(104c)이 승강되게 되며, 해당 드라이브암(104c)의 승강에 따라 고정 결합을 이루고 있는 엘리베이터(104)의 승강구동축(104b) 및 스테이지(104a)가 함께 승강되게 된다. Therefore, in a state where the wafer cassette 10 is transferred from the outside and seated on the stage 104a of the elevator 104 in the main body 102, the step motor 106c rotates in accordance with the operation control of the controller 108. In this case, the rotational driving force of the step motor 106c is transmitted to the lead screw 106a through the electric belt 106b so that the lead screw 106a is rotated, and the lead screw 106a is rotated according to the rotation of the lead screw 106a. The drive arm 104c, which is screwed together, is raised and lowered through the end of the nut portion 104c-1 with respect to 106a), and the elevator 104 which is fixedly fixed according to the elevation of the drive arm 104c is lifted. The lifting driving shaft 104b and the stage 104a are lifted together.

그리고, 이와 같이 엘리베이터(104)가 승강되게 되면, 해당 스테이지(104a)상의 웨이퍼 카세트(10)가 승강되게 되고, 웨이퍼 카세트(10)가 승강됨에 따라 해당 웨이퍼 카세트(10)내에 상하로 적재되어 있는 웨이퍼들(w)의 높이 위치가 변화하게 되므로, 별도로 로드락 챔버(100)와 공정챔버간에 구비되어 있는 트랜스퍼(transfer)용 로봇암(robot arm)(20)이 그와 동일한 높이 위치로 맞추어지게 되 는 웨이퍼 카세트(10)내의 웨이퍼(w)를 한매씩 꺼내어 공정챔버측으로 순차적으로 이송하게 된다. When the elevator 104 is lifted and lifted in this manner, the wafer cassette 10 on the stage 104a is lifted up and down, and the wafer cassette 10 is lifted up and down in the wafer cassette 10 as it is lifted up and down. Since the height positions of the wafers w are changed, the robot arm 20 for transfer, which is provided between the load lock chamber 100 and the process chamber separately, is set to the same height position. The wafers w in the wafer cassette 10 are taken out one by one and sequentially transferred to the process chamber side.

이때, 엘리베이터(104)가 승강되는 정도는 제어부(108)가 스텝모터(106c)를 작동 제어하는 것에 의해 조정되게 되며, 즉 제어부(108)가 작동신호를 스텝모터(106c)측으로 발신하여 스텝모터(106c)가 적당량 작동되도록 하고, 그에 대해 스텝모터(106c)가 정확하게 작동되었는지를 엔코더(106d)를 이용하여 확인하게 된다. At this time, the degree to which the elevator 104 is elevated is adjusted by the control unit 108 to control the operation of the step motor 106c, that is, the control unit 108 sends an operation signal to the step motor 106c side to the step motor Encoder 106c is operated in an appropriate amount, and it is checked using encoder 106d that the step motor 106c is operated correctly.

덧붙여, 주지된 바와 같이, 엔코더(106d)는 스텝모터(106c)의 회전축(106c-1)에 대해 구비되어 스텝모터(106c)와 동기화되어 작용되게 되는 것으로, 스텝모터(106c)의 회전축(106c-1)에 대해 결합되어 있는 패턴원판상에 등간격으로 형성되어 있는 패턴들이 회전시 통과하는 개수를 광검출수단 등으로 검출하여 그 검출 결과를 제어부(108)측으로 송출하여 제어부(108)가 그 결과신호를 통해 스텝모터(106c)의 회전된 정도를 확인할 수 있도록 하게 된다. In addition, as is well known, the encoder 106d is provided with respect to the rotational axis 106c-1 of the step motor 106c to operate in synchronization with the step motor 106c, and the rotation axis 106c of the step motor 106c. -1) detects the number of passes of the patterns formed at equal intervals on the pattern disk coupled to each other at the time of rotation by the light detecting means, and sends the detection result to the control section 108 so that the control section 108 Through the result signal, the degree of rotation of the step motor 106c can be confirmed.

그러나, 이상과 같은 종래에 있어서는 제어부(108)의 작동 제어에 의해 스텝모터(106c)가 정확하게 회전 작동되어 엔코더(106d)를 통해서는 스텝모터(106c)가 정확하게 작동된 것으로 확인되더라도, 실제로는 엘리베이터(104)의 승강구동축(104b)이 그에 상응하도록 승강되지 못하는 경우가 발생되고 있다. However, in the conventional art as described above, even if the step motor 106c is precisely rotated by the operation control of the control unit 108 and the step motor 106c is confirmed to be correctly operated through the encoder 106d, the elevator is actually an elevator. There is a case where the lifting drive shaft 104b of 104 cannot be lifted correspondingly.

이는, 스텝모터(106c)측으로부터 리드스크류(106a)측으로의 구동력 전달에 있어서의 이상에 의해 주로 발생되는 것으로 확인되고 있으며, 즉 장시간 사용에 따라 풀리(106a-1, 106c-2) 및 전동벨트(106b)에 마모가 발생되고, 또한 전동벨트(106b)의 장력이 느슨해지게 됨으로써, 회전시 전동벨트(106b)가 겉돌게 되는 이 상이 발생되게 되어, 그에 따라 결국 리드스크류(106a)가 비정상적인 양만큼만 회전되어 엘리베이터(104)의 승강구동축(104b)이 충분히 승강되지 못하게 된다. It is confirmed that this is mainly caused by an abnormality in the transmission of the driving force from the step motor 106c side to the lead screw 106a side, that is, the pulleys 106a-1 and 106c-2 and the electric belt according to the long time use. Abrasion occurs in the 106b, and the tension of the electric belt 106b is loosened, thereby causing an abnormality in which the electric belt 106b turns over during rotation, thereby causing an abnormal amount of the lead screw 106a. As much as it is rotated, the lifting drive shaft 104b of the elevator 104 is not sufficiently lifted.

이와 같이, 엘리베이터(104)가 정확하게 승강되지 못하게 되면, 이후 트랜스퍼용 로봇암(20)이 잘못된 높이 위치에 있게 되는 웨이퍼 카세트(10)나 엘리베이터(104)에 대해 충돌하게 됨으로써, 웨이퍼(w) 파손과 같은 심각한 사고를 유발하게 되어, 생산수율을 저하시키고 또한 원활한 공정수행을 방해하게 된다. As such, when the elevator 104 is not lifted correctly, the transfer robot arm 20 subsequently collides against the wafer cassette 10 or the elevator 104, which is at an incorrect height position, thereby breaking the wafer w. This can cause serious accidents such as lowering the production yield and preventing the smooth performance of the process.

본 발명은 상기와 같은 제반 문제점을 해결하기 위하여 창안된 것으로서, 엘리베이터의 승강구동축이 실제로 승강된 정도를 검출하여 제어부로 송출할 수 있는 선형이동검출수단을 추가로 구비함으로써 엔코더를 통해서는 정상적인 작동이 확인되더라도 선형이동검출수단을 통해 비정상적인 작동이 확인되는 경우 공정진행 중지와 같은 이상조치를 즉시 발생시켜 이후의 트랜스퍼용 로봇암의 충돌 및 그에 따른 웨이퍼 파손을 방지할 수 있게 되는 로드락 챔버의 엘리베이터 승강구동장치를 제공하는데 그 목적이 있다. The present invention was devised to solve the above problems, and further includes a linear movement detecting means capable of detecting the degree of actually lifting the elevator drive shaft and sending it to the control unit. Even if it is confirmed, if abnormal operation is confirmed through the linear movement detection means, an elevator hatch in the load lock chamber can immediately prevent an abnormal action such as stopping the process to prevent a collision of the transfer robot arm and subsequent wafer breakage. The purpose is to provide a copper device.

상술한 목적을 달성하기 위한 본 발명의 로드락 챔버의 엘리베이터 승강구동장치는, 로드락 챔버의 엘리베이터를 승강시키기 위해 상기 엘리베이터의 승강구동축측이 나사 결합을 이루어 그 회전에 따라 상기 엘리베이터가 승강되도록 하게 되는 리드스크류와, 상기 리드스크류를 회전시키기 위한 스텝모터와, 상기 스텝모터의 회전 정도를 측정하게 되는 엔코더와, 상기 스텝모터에 대한 작동 제어를 실시하고 상기 엔코더를 통해 상기 스텝모터가 정확히 작동되었는지를 확인하게 되는 제어부를 구비하는 로드락 챔버의 엘리베이터 승강구동장치에 있어서, 상기 엘리베이터의 실제 승강된 정도를 측정하여 상기 제어부로 송출함으로써 상기 제어부가 상기 엔코더로부터 전송되는 상기 스텝모터의 회전된 정도값과 대비하여 상기 엘리베이터가 목표량 만큼 정확하게 승강되었는지를 확인하도록 하게 되는 선형이동검출수단을 포함하는 것을 특징으로 한다. Elevator lifting drive device of the load lock chamber of the present invention for achieving the above object, the lifting drive shaft side of the elevator to make the elevator in order to lift the elevator of the load lock chamber so that the elevator is lifted according to its rotation A lead screw, a step motor for rotating the lead screw, an encoder for measuring the degree of rotation of the step motor, operation control of the step motor, and the step motor is operated correctly through the encoder. In the elevator lift drive device of the load lock chamber having a control unit for checking the, the degree of rotation of the step motor transmitted from the encoder by the control unit by measuring the actual lifting degree of the elevator and sending it to the control unit In contrast with the elevator is aimed It characterized in that it comprises a linear movement detecting means to confirm whether the lift as accurately as the amount.

본 발명의 상기 목적과 여러 가지 장점은 이 기술분야에 숙련된 사람들에 의해 첨부된 도면을 참조하여 아래에 기술되는 발명의 바람직한 실시예로부터 더욱 명확하게 될 것이다. The above objects and various advantages of the present invention will become more apparent from the preferred embodiments of the invention described below with reference to the accompanying drawings by those skilled in the art.

이하, 첨부된 도면을 참조로 본 발명의 바람직한 실시예를 상세히 설명하기로 한다. Hereinafter, exemplary embodiments of the present invention will be described in detail with reference to the accompanying drawings.

도 2는 본 발명의 바람직한 실시예에 따른 로드락 챔버의 엘리베이터 승강구동장치를 보여주는 개략 구성도이다. Figure 2 is a schematic diagram showing the elevator lift drive device of the load lock chamber according to an embodiment of the present invention.

설명에 앞서, 종래와 동일한 구성요소에 대해서는 동일한 도면부호를 부기하고, 그에 대한 상세한 설명을 일부 생략함을 밝힌다. Prior to the description, the same reference numerals are given to the same elements as in the related art, and a detailed description thereof will be omitted.

본 발명에 따르면, 리드스크류(106a)에 대해 나사 결합을 이루어 리드스크류(106a)의 회전에 따라 승강되게 되는 엘리베이터(104)의 승강구동축(104b)의 실제적인 승강 정도를 검출할 수 있는 선형이동검출수단(106e)이 추가적으로 구비되게 되며, 이 선형이동검출수단(106e)은 엘리베이터(104)의 승강구동축(104b)의 실제 승강된 정도를 측정하여 제어부(108)로 송출하게 된다. According to the present invention, a linear movement capable of detecting the actual lifting degree of the elevating drive shaft 104b of the elevator 104, which is screwed with respect to the lead screw 106a and is elevated according to the rotation of the lead screw 106a. The detection means 106e is additionally provided, and the linear movement detecting means 106e measures the actual lifted degree of the elevating drive shaft 104b of the elevator 104 and sends it to the control unit 108.

즉, 제어부(108)의 작동 제어에 의해 스텝모터(106c)가 적당량 회전 구동되어 엘리베이터(104)가 승강됨에 있어서, 스텝모터(106c)에 대해 구비되어 있는 엔코더(106d)로부터 스텝모터(106c)가 회전 작동된 정도가 측정되어 제어부(108)로 송출되게 됨과 아울러, 선형이동검출수단(106e)으로부터 엘리베이터(104)가 실제 승강 이동된 정도가 측정되어 또한 제어부(108)로 송출되게 되며, 따라서 제어부(108)는 스텝모터(106c)가 실제 회전 작동된 정도와 엘리베이터(104)가 실제 승강 이동된 정도를 대비하여 확인함으로써, 스텝모터(106c)의 회전된 정도에 비례하여 엘리베이터(104)가 승강 이동되지 못한 것으로 확인되는 경우에는 즉시 이상조치를 발생시키게 된다. That is, the step motor 106c is driven by an appropriate amount of rotation by the operation control of the control unit 108, and the elevator 104 is lifted and raised. Thus, the step motor 106c is provided from the encoder 106d provided for the step motor 106c. The degree of rotation operation is measured and sent to the control unit 108, and the degree of actual lifting and lowering of the elevator 104 from the linear movement detecting means 106e is also measured and sent to the control unit 108, The controller 108 checks the degree in which the step motor 106c is actually rotated and the degree in which the elevator 104 is actually moved up and down, so that the elevator 104 is proportional to the degree of rotation of the step motor 106c. If it is confirmed that the lift is not moved, an abnormal action is immediately caused.

이때, 제어부(108)가 이상조치로서 발생시킬 수 있는 것으로는 이후의 공정진행을 전반적으로 정지시켜 즉, 트랜스퍼용 로봇암(20)의 작동을 정지시켜 해당 트랜스퍼용 로봇암(20)이 잘못된 높이에 위치되어 있는 웨이퍼 카세트(10)에 대해 충돌하는 것이 방지되도록 하면서, 외부로 이상 상황을 알리는 알람(alarm)을 발생시켜 작업자 등이 인식할 수 있도록 하는 방식 등으로 실시될 수 있다. At this time, the control unit 108 may generate the abnormal action to stop the overall process progress, that is, stop the operation of the transfer robot arm 20, the transfer robot arm 20 is the wrong height While preventing the collision with respect to the wafer cassette 10 is located in the can be implemented in a manner such as to generate an alarm (alarm) to inform the abnormal situation to the operator or the like.

바람직하게, 전술한 선형이동검출수단(106e)은, 승강되는 엘리베이터(104)의 승강구동축(104b)이나 그 승강구동축(104b)에 대해 고정 결합을 이루고 있는 드라이브암(104c)에 대해 고정되도록 결합을 이루어 승강구동축(104b)의 승강에 따라 함께 선형 이동되게 되는 가동부(106e-1)와, 이 가동부(106e-1)에 대해 이격되어 대향되도록 고정되게 구비되게 되는 고정부(106e-3)와, 전술한 가동부(106e-1) 또는 고정부(106e-3)의 어느 하나에 대해 결합되도록 구비되게 되는 피스톤부(106e- 4)와, 이 피스톤부(106e-4)가 일부 삽입되도록 가동부(106e-1) 또는 고정부(106e-3)의 다른 하나에 대해 결합되도록 구비되며 그 내부에는 오일과 같은 유체가 충진되게 되고 삽입된 피스톤부(106e-4)에 의해 가해지는 압력에 의해 내부 유체(106e-2-1)가 변형됨에 따라 변형되게 되는 변형판(106e-2-2)과 이 변형판(106e-2-2)의 변형을 감지하기 위한 스트레인 게이지(strain gauge)와 같은 변형검출수단(106e-2-3)을 구비하게 되는 실린더부(106e-2)로 이루어질 수 있다. Preferably, the above-described linear movement detecting means 106e is coupled to be fixed with respect to the drive shaft 104b of the elevator 104 to be lifted and the drive arm 104c which is fixedly coupled to the lift drive shaft 104b. And a movable part 106e-1 which is linearly moved together as the elevating drive shaft 104b moves up and down, and a fixing part 106e-3 which is fixed to be spaced apart from and opposed to the movable part 106e-1. And a piston portion 106e-4 which is provided to be coupled to any one of the above-described movable portion 106e-1 or the fixed portion 106e-3, and a movable portion such that the piston portion 106e-4 is partially inserted. 106e-1) or the other of the fixed portion 106e-3, which is provided with a fluid such as oil filled therein, and the internal fluid by the pressure exerted by the inserted piston portion 106e-4. Deformation plate (106e-2-2) which is to be deformed as (106e-2-1) is deformed, and It may be made of a cylinder portion (106e-2) having a deformation detection means (106e-2-3), such as a strain gauge (strain gauge) for detecting the deformation of the deformation plate (106e-2-2).

여기서, 실린더부(106e-2)내에 내장되는 변형판(106e-2-2)은 두께가 매우 얇은 탄성체 판으로 형성될 수 있고, 해당 변형판(106e-2-2)의 가장자리부는 실린더부(106e-2)의 내측벽측에 대해 고정될 수 있으며, 변형판(106e-2-2)의 일측, 즉 피스톤부(106e-4)가 위치한 측의 실린더부(106e-2)내에는 전술한 유체(106e-2-1)가 채워지게 되고, 변형판(106e-2-2)의 타측면상에는 변형검출수단(106e-2-3)이 부착되어 구비될 수 있다. Here, the deformation plate 106e-2-2 embedded in the cylinder portion 106e-2 may be formed of an elastic plate having a very thin thickness, and the edge portion of the deformation plate 106e-2-2 may have a cylinder portion 106e−. It can be fixed to the inner wall side of 2), the above-described fluid 106e in one side of the deformation plate 106e-2-2, that is, the cylinder portion 106e-2 on the side where the piston portion 106e-4 is located. -2-1) may be filled, and deformation detection means 106e-2-3 may be attached to the other side of the deformation plate 106e-2-2.

따라서, 스텝모터(106c)가 회전 작동되어 리드스크류(106a)가 회전함에 따라 승강되게 되는 엘리베이터(104)의 승강구동축(104b) 및 드라이브암(104c)측에 대해 고정되도록 결합되어 있는 가동부(106e-1)가 대향되는 고정부(106e-3)에 대해 상대적으로 선형 이동하게 되면, 피스톤부(106e-4)가 실린더부(106e-2)내로 삽입되는 정도가 변화하게 되고, 이에 따라 피스톤부(106e-4)에 의해 실린더부(106e-2)내의 유체(106e-2-1)가 가압되는 정도가 변경되게 되어 해당 유체(106e-2-1)를 매개로 민감하게 변형판(106e-2-2)이 형상 변화를 하게 되며, 이 형상 변화를 변형검출수단(106e-2-3)이 검출하여 제어부(108)측으로 송출하게 됨으로써, 제어부(108)가 엘 리베이터(104)의 실제 승강된 정도를 확인할 수 있게 된다. Accordingly, the movable part 106e is coupled to be fixed to the lifting drive shaft 104b and the drive arm 104c side of the elevator 104, in which the step motor 106c is rotated to move up and down as the lead screw 106a rotates. When -1) moves relatively linearly with respect to the opposing fixing part 106e-3, the degree to which the piston part 106e-4 is inserted into the cylinder part 106e-2 changes, and accordingly, the piston part The degree to which the fluid 106e-2-1 in the cylinder portion 106e-2 is pressurized by the 106e-4 is changed so that the deformation plate 106e-2 is sensitively transmitted through the fluid 106e-2-1. -2) causes the shape change, and the deformation detection means 106e-2-3 detects and sends the shape change to the control unit 108, whereby the control unit 108 actually raises and lowers the elevator 104. You can check the degree.

이로써, 제어부(108)는 엔코더(106d)로부터는 스텝모터(106c)가 실제 회전 작동된 정도값을 송출받게 되고, 또한 변형검출수단(106e-2-3)으로부터는 엘리베이터(104)가 실제로 승강된 정도값을 송출받게 되므로, 전송되는 두 값의 비례성 여부를 확인하는 것에 의해 엘리베이터(104)가 정확하게 승강되었는지를 확인할 수 있게 된다. As a result, the control unit 108 receives the degree value at which the step motor 106c is actually rotated from the encoder 106d, and the elevator 104 is actually lifted from the deformation detecting unit 106e-2-3. Since the received degree value is transmitted, it is possible to confirm whether the elevator 104 is correctly lifted by checking whether the two values transmitted are proportional.

이상에서, 선형이동검출수단(106e)의 가동부(106e-1)가 바람직하게 엘리베이터(104)의 승강구동축(104b)이나 드라이브암(104c)측에 대해 고정 결합되도록 구비되는 것으로 나타내었으나, 해당 가동부(106e-1)는 직접 리드스크류(106a)에 대해 나사 결합되는 너트부를 갖어 리드스크류(106a)의 회전시 또한 독립적으로 승강되도록 구비될 수도 있을 것이다. In the above, although the movable portion 106e-1 of the linear movement detecting means 106e is preferably provided to be fixedly coupled to the lifting drive shaft 104b or the drive arm 104c side of the elevator 104, the movable portion 106e-1 may have a nut portion directly screwed with respect to the lead screw 106a so that the lead screw 106a may also be provided to be independently lifted upon rotation of the lead screw 106a.

또한, 이상에서 선형이동검출수단(106e)이 실린더 형태인 것에 대하여 예시적으로 설명하였으나, 그 외의 다른 구성으로는 가동부(106e-1) 또는 고정부(106e-3)의 어느 하나측에는 일직선상에 등간격씩 다수개의 패턴이 형성되고 다른 하나측에는 가동부(106e-1)의 선형 이동에 따라 통과되는 해당 패턴의 개수를 인식할 수 있는 센서 등이 구비되는 것으로 이루어질 수도 있는 등, 기타 여러 다양한 수단이 채택될 수 있음은 물론이다. In addition, although the linear movement detecting means 106e has been exemplarily described in the form of a cylinder, other configurations include a straight line on either side of the movable portion 106e-1 or the fixed portion 106e-3. A plurality of patterns are formed at equal intervals, and on the other side, various other means may be provided, such as having a sensor for recognizing the number of the corresponding patterns passed along the linear movement of the movable part 106e-1. Of course, it can be adopted.

이로써, 본 발명에 의하면, 스텝모터(106c)가 정상적으로 작동되었더라도 실제로는 엘리베이터(104)가 적절히 승강되지 못한 경우를 바로 검출하여 이상조치를 취할 수 있게 되므로, 이후의 웨이퍼 카세트(10)에 대한 트랜스퍼용 로봇암(20)의 충돌을 차단하여 웨이퍼(w)가 파손되는 것을 방지할 수 있게 됨으로써, 생산수율 향상 및 안정적인 공정수행이 가능하도록 할 수 있게 된다. As a result, according to the present invention, even if the step motor 106c is normally operated, it is possible to immediately detect a case where the elevator 104 is not properly lifted and take an abnormal action, so that the transfer to the wafer cassette 10 thereafter is performed. By preventing the collision of the robotic arm 20 for preventing the wafer w from being broken, it is possible to improve the production yield and to perform a stable process.

이상, 상기 내용은 본 발명의 바람직한 일 실시예를 단지 예시한 것으로 본 발명의 당업자는 본 발명의 요지를 변경시킴이 없이 본 발명에 대한 수정과 변경을 가할 수 있음을 인지해야 한다.In the foregoing description, it should be understood that those skilled in the art can make modifications and changes to the present invention without changing the gist of the present invention as merely illustrative of a preferred embodiment of the present invention.

본 발명에 따르면, 엘리베이터가 정확한 높이 위치로 승강 작동되지 않은 경우를 검출하여 바로 이상조치를 취할 수 있게 되므로, 엘리베이터상에 놓인 웨이퍼 카세트에 대한 트랜스퍼용 로봇암의 충돌 및 그에 따른 웨이퍼 파손을 미연에 방지할 수 있게 되어, 생산수율 향상 및 안정적인 공정수행이 가능하도록 할 수 있는 효과가 달성될 수 있다. According to the present invention, it is possible to detect abnormal cases in which the elevator is not lifted to the correct height position and take an abnormal action immediately, thereby preventing the collision of the transfer robot arm to the wafer cassette placed on the elevator and the resulting wafer breakage. It can be prevented, the effect can be achieved to improve the production yield and enable stable process performance.

Claims (3)

로드락 챔버(100)의 엘리베이터(104)를 승강시키기 위해 상기 엘리베이터(104)의 승강구동축(104b)측이 나사 결합을 이루어 그 회전에 따라 상기 엘리베이터(104)가 승강되도록 하게 되는 리드스크류(106a)와, 상기 리드스크류(106a)를 회전시키기 위한 스텝모터(106c)와, 상기 스텝모터(106c)의 회전 정도를 측정하게 되는 엔코더(106d)와, 상기 스텝모터(106c)에 대한 작동 제어를 실시하고 상기 엔코더(106d)를 통해 상기 스텝모터(106c)가 정확히 작동되었는지를 확인하게 되는 제어부(108)를 구비하는 로드락 챔버의 엘리베이터 승강구동장치에 있어서, In order to elevate the elevator 104 of the load lock chamber 100, the elevating drive shaft 104b side of the elevator 104 is screwed so that the lead screw 106a is lifted according to the rotation thereof. ), The step motor 106c for rotating the lead screw 106a, the encoder 106d for measuring the degree of rotation of the step motor 106c, and the operation control for the step motor 106c. In the elevator lift drive device of the load lock chamber having a control unit 108 to perform and confirm that the step motor (106c) is correctly operated through the encoder (106d), 상기 엘리베이터(104)의 실제 승강된 정도를 측정하여 상기 제어부(108)로 송출함으로써 상기 제어부(108)가 상기 엔코더(106d)로부터 전송되는 상기 스텝모터(106c)의 회전된 정도값과 대비하여 상기 엘리베이터(104)가 목표량 만큼 정확하게 승강되었는지를 확인하도록 하게 되는 선형이동검출수단(106e)을 포함하는 것을 특징으로 하는 로드락 챔버의 엘리베이터 승강구동장치. The control unit 108 is compared with the rotated degree value of the step motor 106c transmitted from the encoder 106d by measuring the actual lifted degree of the elevator 104 and sending it to the control unit 108. Elevator lift drive device of the load lock chamber, characterized in that it comprises a linear movement detecting means (106e) to ensure that the elevator 104 is ascended precisely the target amount. 제 1 항에 있어서, The method of claim 1, 상기 선형이동검출수단(106e)은, The linear movement detecting means 106e, 상기 엘리베이터(104)의 승강구동축(104b)측에 대해 고정 결합되거나 상기 리드스크류(106a)에 대해 나사 결합을 이루어 상기 리드스크류(106a)의 회전에 따라 승강되도록 구비되게 되는 가동부(106e-1)와, Movable part 106e-1 fixedly coupled to the elevating drive shaft 104b side of the elevator 104 or screwed to the lead screw 106a to be elevated according to the rotation of the lead screw 106a. Wow, 상기 가동부(106e-1)에 대해 이격되어 대향되도록 고정되게 구비되게 되는 고정부(106e-3)와, A fixing part 106e-3 which is fixed to be spaced apart from the movable part 106e-1 to face the movable part 106e-1, 상기 가동부(106e-1) 또는 상기 고정부(106e-3)의 어느 하나에 대해 결합되도록 구비되게 되는 피스톤부(106e-4)와, A piston portion 106e-4 which is provided to be coupled to either the movable portion 106e-1 or the fixed portion 106e-3; 상기 피스톤부(106e-4)가 일부 삽입되도록 상기 가동부(106e-1) 또는 상기 고정부(106e-3)의 다른 하나에 대해 결합되도록 구비되며 상기 피스톤부(106e-4)에 의해 가압됨에 따라 내부에 충진되어 있는 유체(106e-2-1)의 변형에 따라 변형되게 되는 변형판(106e-2-2)과 상기 변형판(106e-2-2)의 변형을 검출하여 상기 제어부(108)측으로 송출하게 되는 변형검출수단(106e-2-3)을 구비하게 되는 실린더부(106e-2)를 포함하는 것을 특징으로 하는 로드락 챔버의 엘리베이터 승강구동장치. The piston part 106e-4 is provided to be coupled to the other of the movable part 106e-1 or the fixed part 106e-3 so that the piston part 106e-4 is partially inserted, and is pressed by the piston part 106e-4. Deformation of the deformed plate 106e-2-2 and the deformed plate 106e-2-2 to be deformed according to the deformation of the fluid 106e-2-1 filled therein and sent to the control unit 108 Elevator lift drive device of the load lock chamber, characterized in that it comprises a cylinder portion (106e-2) having a deformation detection means (106e-2-3). 제 1 항 또는 제 2 항에 있어서, The method according to claim 1 or 2, 상기 제어부(108)는, The control unit 108, 상기 엔코더(106d)로부터 전송되는 값과 상기 선형이동검출수단(106e)으로부터 전송되는 값의 비례성을 확인하는 것에 의해 상기 엘리베이터(104)가 정확한 거리 이동되었는지를 확인하고 비정상적으로 이동된 경우 이상조치를 취하게 되는 것을 특징으로 하는 로드락 챔버의 엘리베이터 승강구동장치.By checking the proportionality of the value transmitted from the encoder 106d and the value transmitted from the linear movement detecting means 106e, it is confirmed that the elevator 104 is moved at an accurate distance and abnormally corrected when it is moved abnormally. Elevator lift drive device of the load lock chamber characterized in that to take.
KR1020060104856A 2006-10-27 2006-10-27 Elevating drive apparatus for a elevator of the load-lock chamber KR100850063B1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR1020060104856A KR100850063B1 (en) 2006-10-27 2006-10-27 Elevating drive apparatus for a elevator of the load-lock chamber

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1020060104856A KR100850063B1 (en) 2006-10-27 2006-10-27 Elevating drive apparatus for a elevator of the load-lock chamber

Publications (2)

Publication Number Publication Date
KR20080037785A true KR20080037785A (en) 2008-05-02
KR100850063B1 KR100850063B1 (en) 2008-08-04

Family

ID=39646680

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020060104856A KR100850063B1 (en) 2006-10-27 2006-10-27 Elevating drive apparatus for a elevator of the load-lock chamber

Country Status (1)

Country Link
KR (1) KR100850063B1 (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20190002935A (en) * 2017-06-30 2019-01-09 주식회사 케이씨텍 Substrate processing chamber and Control method for lift position of the substrate processing chamber
WO2020219241A1 (en) * 2019-04-26 2020-10-29 Applied Materials, Inc. Pedestal lift for semiconductor processing chambers

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103663262B (en) * 2012-09-03 2016-02-10 北京北方微电子基地设备工艺研究中心有限责任公司 Lifting mechanism and the substrate loading device with it

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR200267583Y1 (en) 2001-11-29 2002-03-09 아남반도체 주식회사 Apparatus for sensing a home position of load lock chamber
KR200297282Y1 (en) 2002-09-17 2002-12-11 아남반도체 주식회사 Load lock chamber of an ion implanter
KR20040079615A (en) * 2003-03-08 2004-09-16 삼성전자주식회사 Load-lock chamber for semiconductor device manufacture including the sensor for position control of wafer cassette

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20190002935A (en) * 2017-06-30 2019-01-09 주식회사 케이씨텍 Substrate processing chamber and Control method for lift position of the substrate processing chamber
WO2020219241A1 (en) * 2019-04-26 2020-10-29 Applied Materials, Inc. Pedestal lift for semiconductor processing chambers
CN113795608A (en) * 2019-04-26 2021-12-14 应用材料公司 Susceptor lift for semiconductor processing chamber
US11251067B2 (en) 2019-04-26 2022-02-15 Applied Materials, Inc. Pedestal lift for semiconductor processing chambers
CN113795608B (en) * 2019-04-26 2024-02-20 应用材料公司 Susceptor elevation for semiconductor processing chamber

Also Published As

Publication number Publication date
KR100850063B1 (en) 2008-08-04

Similar Documents

Publication Publication Date Title
KR102181121B1 (en) Substrate transfer apparatus and control method of substrate transfer apparatus
CN107818932B (en) Turntable positioning device, loading and conveying system and plasma processing equipment
US7750818B2 (en) System and method for introducing a substrate into a process chamber
KR100387525B1 (en) system for detecting position of semiconductor wafer and method of detecting wafer position
KR100850063B1 (en) Elevating drive apparatus for a elevator of the load-lock chamber
JP2008300608A (en) Substrate carrier provided with elevating/lowering position confirmation means and semiconductor manufacturing device provided with the same
KR101350145B1 (en) Apparatus for discriminating existence of substrate using lift pin and method for carrying in and testing substrate using the same
KR20100013124A (en) Substrate processing appratus
CN110444493B (en) Device for preventing arm from impacting wafer
US20220384233A1 (en) Substrate processing apparatus and substrate processing method
CN116581059A (en) Wafer position detection device, machine and detection method in chamber
KR100763251B1 (en) Apparatus for moving wafer
KR20130002796U (en) Wafer lifting apparatus for semiconductor manufacturing equipment
KR101870163B1 (en) Apparatus for Transferring Substrate
KR20220161926A (en) Wafer test and cleaning apparatus
JP3674063B2 (en) Wafer transfer device
KR100503285B1 (en) A safety apparatus of elevator for load lock chamber
KR20120006492U (en) Wafer lifting apparatus for semiconductor manufacturing equipment
KR20070013913A (en) Wafer transfer
KR20040079615A (en) Load-lock chamber for semiconductor device manufacture including the sensor for position control of wafer cassette
KR100974425B1 (en) Apparatus for sensing loading state of wafer and methods of the same
KR100564693B1 (en) Wafer flat zone aligner and apparatus for processing a wafer having the same
US20240087843A1 (en) Apparatus for treating substrate and method for treating substrate
KR101005675B1 (en) Apparatus for removing a boat of a vertical furnace
KR20040009243A (en) cassette loader equipment of semiconductor device manufacturing equipment

Legal Events

Date Code Title Description
A201 Request for examination
E902 Notification of reason for refusal
E701 Decision to grant or registration of patent right
GRNT Written decision to grant
LAPS Lapse due to unpaid annual fee