CN105762092B - A kind of semiconductor processing equipment - Google Patents
A kind of semiconductor processing equipment Download PDFInfo
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- CN105762092B CN105762092B CN201410781221.7A CN201410781221A CN105762092B CN 105762092 B CN105762092 B CN 105762092B CN 201410781221 A CN201410781221 A CN 201410781221A CN 105762092 B CN105762092 B CN 105762092B
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Abstract
The present invention provides a kind of semiconductor processing equipments.The semiconductor processing equipment, including pallet original point position system, pallet original point position system includes rotatable pallet, controller and detector, multiple carrying positions for carrying substrates are provided at circumferentially spaced along it on pallet, are provided at circumferentially spaced at least two for the original point position portion as origin along it on pallet；The check bit of detector is setting on the pallet circumference where at least two original point position portions；Controller is for controlling pallet rotation；Whether detector, which is used to detect any one original point position portion during pallet rotation to rotate to it, detects position, if so, determining when front tray present position is pallet origin position.Semiconductor processing equipment provided by the invention, the problem of can solve the low yield for causing semiconductor processing equipment low due to pallet original point position rate in the prior art.
Description
Technical field
The invention belongs to microelectronic processing technique fields, and in particular to a kind of semiconductor processing equipment.
Background technique
Chemical vapor deposition (Chemical Vapor Deposition, hereinafter referred to as CVD) technology is a kind of using different
Gas reacting to each other at high temperature prepares the technology of epitaxial thin-film layer on the surface of the substrate.Currently, usually being set on pallet
Multiple carrying positions for carrying substrates are set, to improve the yield of single process；Pick-and-place piece is carried out to multiple carrying positions to realize,
It needs to rotate by pallet so that each carrying position, which successively accurately rotates to, picks and places piece position, then by manipulator to positioned at taking
The carrying position of film releasing position picks and places piece.
During picking and placing piece, it is vital that each carrying position, which is accurately rotated to piece position is picked and placed, for this reason, it may be necessary to
It is rotated in each carrying position and original point position is carried out to pallet by pallet original point position system to before picking and placing piece position, specifically
Ground, as shown in Figure 1, pallet original point position system includes rotatable pallet 10, detector and controller (not shown).Its
In, it is arranged jagged 12 on 10 upper surface of pallet, the origin position for presetting pallet 10 is 12 position of notch；Controller
For controlling pallet rotation；The surface of pallet 10 is arranged in detector, and detection position 11 is located at 12 place pallet of notch circle
On all L, detector be used for pallet 10 rotate during detection notch 12 whether rotate to detection position 11 at (that is, being located at
The underface of detector 11), if so, determining when 10 present position of front tray is pallet origin position, that is, pallet 10 finds original
Point.
It finds in practical applications: although location tray origin position may be implemented using above-mentioned pallet original point position system
Set, still, be inevitably present following problems: if pallet 10 is in state shown in FIG. 1, pallet 10 is rotated clockwise,
In this case, pallet 10 needs access to one Zhou Caineng of rotation and finds origin, and pallet 10 is during original point position
Revolving speed it is very low, therefore, pallet 10 rotation close to once week need expend some time, causes the speed of pallet original point position too
Slowly, to cause the time for picking and placing the consuming of piece process more, the low yield of semiconductor processing equipment is in turn resulted in.
Summary of the invention
The present invention is directed at least solve one of the technical problems existing in the prior art, proposes a kind of semiconductor machining and set
It is standby, it can solve asking due to the pallet low low yield for causing semiconductor processing equipment of original point position rate in the prior art
Topic.
One of in order to solve the above problem, the present invention provides a kind of semiconductor processing equipments, including pallet original point position system
System, the pallet original point position system includes rotatable pallet, controller and detector, on the pallet between its circumferential direction
Every being provided with multiple carrying positions for carrying substrates, at least two have been provided at circumferentially spaced for making along it on the pallet
For the original point position portion of origin；The check bit of the detector is setting in the pallet circle where at least two original point position portions
Zhou Shang；The controller is for controlling the pallet rotation；The detector is used to detect during pallet rotation
Whether any one of original point position portion, which rotates to it, is detected position, if so, determining that presently described pallet present position is
For the pallet origin position.
Wherein, the structure in at least two original point position portions is different, so that the detector can determine whether out each
Original point position portion.
Wherein, be provided in the controller it is one-to-one with each original point position portion, in its rotation to institute
Each carrying position rotates the specified time to needed for picking and placing piece position when stating detection position；The detector is for detecting
When being located at detection position to any one of original point position portion, and current origin positioning region is judged, and to the controller
Send the signal for indicating current origin positioning region；The controller is used to receive the signal for indicating current origin positioning region, according to
The signal acquisition current origin positioning region corresponding multiple specified times, when control pallet continuation successively rotates multiple described specified
Between, realize that multiple carrying positions are rotated according to preset order to pick-and-place piece position.
Wherein, the preset order is when the current origin positioning region is rotated to the detection position along pallet rotation
Turn direction near the sequence for carrying position to the last one carrying position for picking and placing piece position.
Wherein, the semiconductor processing equipment further includes manipulator and film magazine, and the film magazine includes multiple film traps, and described
Slot and the carrying position correspond, and each film trap is used to place the substrate carried on the corresponding carrying position；
The controller is used to rotate in each carrying position to after picking and placing piece position, and control manipulator is to positioned at the pick-and-place piece
The current carrying position of position loads the substrate in film trap corresponding with current carrying position, alternatively, the base on the current carrying position of unloading
In piece to corresponding film trap.
Wherein, there are differences in height between each original point position portion and the tray surface, and the detector is for examining
The distance between itself and detection position are surveyed, judges whether any one of original point position portion rotates to its detection according to this distance
Position.
Wherein, there are differences in height between each original point position portion and the tray surface, and difference in height is different；It is described
Whether detector judges any one of original point position portion for detecting the distance between itself and detection position according to this distance
Rotation detects position to it and judges current origin positioning region.
Wherein, each original point position portion is the groove being arranged on the pallet or boss or notch.
Wherein, multiple carrying positions along the circumferentially-spaced of the pallet and are uniformly arranged.
Wherein, at least two original point position portions are circumferentially-spaced along the pallet and are uniformly arranged.
The invention has the following advantages:
Semiconductor processing equipment provided by the invention is provided at circumferentially spaced on the pallet of pallet original point position system along it
Have at least two for the original point position portion as origin, the check bit of detector is setting in where at least two original point position portions
Pallet circumference on, which is divided at least two arc length by least two original point position portions, in original point position process
In, pallet, which at most needs to be rotated up to the corresponding pallet horizontal sextant angle of arc length or shared pallet swing circle, can find wherein
One original point position portion, to realize that pallet finds origin, this at most needs to rotate a circle just with pallet in the prior art to look for
It is compared to origin, the rate of pallet original point position can be improved, so as to improve the rate for picking and placing piece process, and then improve half
The yield of conductor process equipment.
Detailed description of the invention
Fig. 1 is the positional diagram of pallet and detector in existing pallet original point position system；
Fig. 2 is pallet and detector in the pallet original point position system of semiconductor processing equipment provided in an embodiment of the present invention
Positional diagram；
Fig. 3 a~3e is respectively that along two original point position portions of line A-A, there are five kinds of cross-sectional views of difference in height in Fig. 2；
Fig. 4 a~4c is respectively three kinds of cross-sectional views that two original point position portions in Fig. 2 along line A-A do not have difference in height；
Specific embodiment
To make those skilled in the art more fully understand technical solution of the present invention, come with reference to the accompanying drawing to the present invention
The semiconductor processing equipment of offer is described in detail.
Semiconductor processing equipment provided in an embodiment of the present invention includes pallet original point position system, manipulator and film magazine.Its
In, Fig. 2 is the position of pallet and detector in the pallet original point position system of semiconductor processing equipment provided in an embodiment of the present invention
Set relation schematic diagram；Referring to Fig. 2, original point position system is used to carry out original point position to pallet comprising rotatable pallet
20, detector and controller are provided at circumferentially spaced multiple carrying positions 1~8 for carrying substrates along it on pallet 20, and
Carrying position 1~8 is spaced setting along clockwise direction.
At least two are provided at circumferentially spaced for the original point position portion as origin, in Fig. 2 along it on pallet 20
Original point position portion 201a and 201b.The detection position 21 of detector is located at the pallet circumference where at least two original point position portions
On L, so-called detection position 21 refers to the intersection position in the detection path and 20 surface of pallet of detector.Controller is for controlling support
Disc spins.Detector is used to detect whether any one original point position portion rotates to detection position during pallet rotation
21, if so, determining when front tray present position is pallet origin position, that is, pallet finds origin.
It is appreciated that in the pallet original point position system, at least two original point position portions are by the pallet circumference L where it
At least two arc length are divided into, during original point position, pallet at most needs to be rotated up to the corresponding pallet level folder of arc length
Angle or shared pallet swing circle can find one of original point position portion, this at most needs to revolve with pallet in the prior art
Origin can just be found by, which circling, compares, and the rate of pallet original point position can be improved, so as to improve the speed for picking and placing piece process
Rate, and then improve the yield of semiconductor processing equipment.
Specifically, to realize that detector is capable of detecting when that any one original point position portion is rotated to detection position 21, speech is changed
It, is to realize that detector can judge original point position portion and tray surface, in the present embodiment, each original point position portion and support
There are difference in height between 20 surface of disk so that when each original point position portion and 20 surface of pallet are rotated to detection position 21 with detection
The distance between device difference.Specifically, each original point position portion is the groove being arranged on pallet 20 or boss or notch, notch
Including through-hole.Detector judges that any one origin is fixed for detecting the distance between itself and detection position 21 according to this distance
Whether position portion rotates to detection position 21, that is to say, that goes out original point position portion and tray surface according to the Distance Judgment of detection.More
Specifically, detector is range sensor.For example: in Fig. 2, if original point position portion 201a is boss, original point position
Portion 201b be notch, if the distance detected be more than or less than (or, being not equal to) pallet be located at check bit set detected when 23 away from
From when, then detector detect original point position portion 201a or 201b rotate to detection position 21.
As shown in Fig. 2, original point position portion 201a and 201b are arranged on the upper surface of pallet 20.In practical applications, until
Few two original point position portions can also be arranged on lower surface or the side wall of pallet 20, as long as being arranged according to above-mentioned set-up mode
?.
Preferably, at least two original point position portions along the circumferentially-spaced of pallet 20 and are uniformly arranged, so that pallet circumference L quilt
The each arc length being divided into is equal, in the case, maximum arc length be circumference L divided by original point position portion quantity, this at least
Two original point position portions, which are unevenly arranged, to be compared, and maximum arc length can be made minimum, fixed so as to further improve pallet
Bit rate.
The semiconductor processing equipment of the present embodiment picks and places piece to each carrying position to realize, is arranged as follows:
The structure at least two original point position portions is different, so that detector can determine whether out each original point position portion.Tool
Body, each original point position portion is different from the difference in height on 20 surface of pallet, so that each original point position device is rotated to detection position
It is different from the distance between detector when 21；Original point position portion and support are gone out according to the Distance Judgment of its detection based on above-mentioned detector
The similar principle of panel surface goes out current origin positioning region according to the Distance Judgment of its detection in this detector, repeats no more.
Be provided in controller it is one-to-one with each original point position portion, its rotation to detection position 21 when it is every
A carrying position rotates the specified time to needed for picking and placing piece position.It is appreciated that specified time is according in each original point position portion
It rotates to the relationship, the setting of pallet direction of rotation when detecting position 21, between current each carrying position and pick-and-place piece position.
Detector is used for when detecting that any one original point position portion is located at detection position 21, and judges current origin
Positioning region, and the signal for indicating current origin positioning region is sent to controller.
Controller is used to receive the signal for indicating current origin positioning region, according to the signal acquisition and current origin positioning region
Corresponding multiple specified times, control pallet continuation successively rotate multiple specified time, realize multiple carrying positions according to default
Sequence rotation extremely picks and places piece position.
The quantity of film trap is multiple in film magazine, and film trap and carrying position correspond, for placing corresponding carrying position
The substrate of upper carrying；Controller is rotated for each carrying position to after picking and placing piece position, and control manipulator is to positioned at pick-and-place piece
The current carrying position of position loads the substrate on film trap corresponding with current carrying position, alternatively, the base on the current carrying position of unloading
On piece to corresponding film trap.
It is how to realize to pick and place piece process below with reference to Fig. 2 semiconductor processing equipment that this embodiment is illustrated by way of example provides
's.Specifically, the current state of pallet 20, pick-and-place piece position P and detection position 21 are as shown in Figure 2.Original point position portion 201a and
201b is different from the difference in height of tray surface, and detector detects that original point position portion 201a and 201b is located at detection 21 time-division of position
Low signal and high signal are not sent to controller.Carrying corresponding with original point position portion 201a position is provided in controller
1~8 rotation specified time to needed for picking and placing piece position P, and carrying position 1~8 corresponding with original point position portion 201b respectively
Rotation specified time to needed for picking and placing piece position P respectively；Also, preset order are as follows: carrying position 1, carrying position 2, carrying position 3,
Carry position 4, carrying position 5, carrying position 6, carrying position 7, carrying position 8.
The first pick and place piece process the following steps are included:
Step S1, controller control pallet 20 are rotated in the counterclockwise direction；
Step S2, due to original point position portion 201a in the counterclockwise direction near detection position 21, with pallet 20
Rotation original point position portion 201a rotate at first to detection position 21, detector according to its detection Distance Judgment go out original point position
Portion is rotated to detection position 21, and judges that current origin positioning region is original point position portion 201a, sends low letter to controller
Number, at this point, carrying position 1 is in the counterclockwise direction near pick-and-place piece position P；
Step S3, controller obtain original point position portion 201a corresponding 8 specified times, and root according to the low signal
According to above-mentioned preset order, control pallet 20 first continues the rotation carrying corresponding specified time of position 1, so that its rotation extremely picks and places piece
Position P, control control manipulator loads the substrate on film trap corresponding with the carrying position 1 to carrying position 1 later, alternatively,
The substrate carried on position 1 is offloaded on corresponding film trap, carrying position 1 is completed to pick and place piece to realize；
Then, control pallet 20 continues the rotation carrying corresponding specified time of position 2, so that its rotation extremely picks and places piece position P,
Control control manipulator loads the substrate on film trap corresponding with the carrying position 2 to carrying position 2 later, alternatively, will carrying
Substrate on position 2 is offloaded on corresponding film trap, completes to pick and place piece to carrying position 2 to realize；
Continue successively to carry out as above to the process of carrying position 1 or 2 pick-and-place piece, so that carrying carrying position 3~carrying position 8
Position 1~8 is successively rotated according to above-mentioned preset order to pick-and-place piece position P, and is realized and completed to pick and place piece to carrying position 1~8.
Second of pick-and-place piece process is similar with the first above-mentioned pick-and-place piece process, equally includes above-mentioned steps S1~S3,
The two difference is: in the step S1 of this second pick-and-place piece process, controller control pallet is rotated in a clockwise direction；Step
In rapid S2, since original point position portion 201b is along clockwise direction near detection position 21, as the rotation of pallet 20 is former
Point location portion 201b rotate at first to detection position 21, detector according to its detection Distance Judgment go out original point position portion rotate to
Position 21 is detected, and judges that current origin positioning region is original point position portion 201b, sends high signal to controller, at this point,
Position 4 is carried along clockwise direction near pick-and-place piece position P；Controller is according to the high signal, acquisition and origin in step S3
Positioning region 201b corresponding multiple specified times.
Analyze above-mentioned the first and second of pick-and-places piece process: in step s 2, it is former in pallet that the first picks and places piece process
After point location, carrying position 1 is along 20 direction of rotation of pallet near pick-and-place piece position P；Second of pick-and-place piece process is in pallet origin
After positioning, position 4 is carried along 20 direction of rotation of pallet near pick-and-place piece position P, and is carried position 1 and apart picked and placed piece position P farther out,
Therefore, above-mentioned preset order is executed during the first picks and places piece, that is, uses nearest realization principle, and second of pick-and-place piece mistake
Above-mentioned preset order is executed in journey and does not use nearest realization principle, so that multiple carrying positions be caused successively to rotate to pick-and-place piece position
The time that P expends is less.
It is therefore preferred that preset order be current origin positioning region rotate to detection position 21 when along 20 side of rotation of pallet
To the sequence from the carrying position near pick-and-place piece position P to the last one carrying position, specifically, in second of pick-and-place piece process
In, it is preferable that preset order is then are as follows: carrying position 4, carrying position 3, carrying position 2, carrying position 1, carrying position 8, carrying position 7, carrying position
6, position 5 is carried, this is similar with the first pick-and-place piece process, is all made of nearest realization principle, takes so as to further decrease
The time that film releasing process expends, and then can be further improved the yield of semiconductor processing equipment.In practical applications, due to not
With original point position portion, corresponding above-mentioned preferred preset order can be different, therefore, each origin is provided in controller
The corresponding above-mentioned preferred preset order in positioning region.
Further, it is preferable that multiple carrying positions and at least two original point position portions along the circumferentially-spaced of pallet 20 and
Be uniformly arranged, as in Fig. 2 carrying position 1~8 and original point position portion 201a and 201b, different original point position portions can be made to revolve
Position is carried up to the last one carrying position near pick-and-place piece position P along pallet direction of rotation when going to detection position 21
Specified time one-to-one correspondence is identical, so as to the setting of simplified control device.Specifically, the first in the present embodiment picks and places piece
In the process, specified time needed for first carrying position (carrying position 1) is t1, and second carrying position (carrying position 2) is to last
Specified time needed for one carrying position (carrying position 8) is respectively t2~t8；During second of pick-and-place piece, first is held
Specified time needed for carrying position (carrying position 4) corresponds to t1, and second carrying position (carrying position 3) to the last one carrying position (is held
Carry position 5) needed for specified time be respectively t2~t8.
To realize that original point position portion 201a and 201b is different from the difference in height on 20 surface of pallet, present embodiment illustrates five kinds
Mode please refers in Fig. 3 a~Fig. 3 e, Fig. 3 a, and original point position portion 201a is the notch through 20 upper and lower surface of pallet, and origin is fixed
Position portion 201b is groove；In Fig. 3 b, original point position portion 201a is the notch through 20 upper and lower surface of pallet, original point position portion 201b
For protrusion；In Fig. 3 c, original point position portion 201a is protrusion, and original point position portion 201b is groove；In Fig. 3 d, original point position portion 201a
It is groove with 201b, and the depth of groove is different；In Fig. 3 e, original point position portion 201a and 201b are protrusion, and protrusion
Height is different.
It should be noted that although the film trap in film magazine and carrying position correspond in the present embodiment；But it is of the invention
It is not limited thereto, in practical applications, can not be corresponded with the film trap in film magazine with carrying position.In these cases,
After controller is located in each carrying position and picks and places piece position, control manipulator is loaded the carrying position on any film trap in film magazine
Substrate or the substrate on the carrying position is offloaded on any film trap in film magazine.
It should also be noted that, in practical applications, it can also be equal in multiple carrying positions and at least two original point position portions
Along the circumferentially-spaced of pallet 20 and in the case where being uniformly arranged, the structure that at least two original point position portions are arranged is identical, detector
Signal is sent to controller detecting that original point position portion is rotated to the rear of detection position 21, controller is controlled according to the signal and held in the palm
Disk continues to rotate, so as to successively rotate along pallet direction of rotation near carrying position to the last one the carrying position for picking and placing piece position
To pick-and-place piece position P.It is appreciated that due to multiple carrying positions and at least two original point position portions along the circumferentially-spaced of pallet and
It is uniformly arranged, so that different original point position portions is corresponding straight from the carrying position near pick-and-place piece position along pallet direction of rotation
The specified time one-to-one correspondence for rotating the rotation to needed for picking and placing piece position pallet to the last one carrying position is identical, therefore, no matter
Whether the structure at least two original point position portions is identical, it is only necessary to be arranged in controller and revolve after original point position according to along pallet
Turn direction near multiple specified times of the carrying position up to the last one carrying position for picking and placing piece position.
The structure at least two original point position portions is identical, specific set-up mode are as follows: each original point position portion and tray surface
Difference in height it is identical, for realize in Fig. 2 the difference in height of original point position portion 201a and 201b it is identical, use following three kinds of sides
Formula: please referring in Fig. 4 a~Fig. 4 c, Fig. 4 a, and original point position portion 201a and 201b are the notch through pallet upper and lower surface；Figure
In 4b, original point position portion 201a and 201b are groove, and the depth of groove is identical；In Fig. 4 c, original point position portion 201a and
201b is protrusion, and the height of protrusion is identical.
It also should be noted that although detector is by detecting itself and rotation to detection position 21 in the present embodiment
Height between the original point position portion at place and tray surface judges different original point position portion and pallet.But the present invention is simultaneously
It is not limited to this, in practical applications, detector can also by detection rotation to detection position 21 at original point position portion and
The reflection signal of tray surface judges different original point position portion and pallet.Specifically, original point position portion and tray surface is anti-
The reflectivity for penetrating rate difference and each original point position portion is different.More specifically, original point position portion is to be arranged on tray surface
The film layers different from material pallet.
It is understood that the principle that embodiment of above is intended to be merely illustrative of the present and the exemplary implementation that uses
Mode, however the present invention is not limited thereto.For those skilled in the art, essence of the invention is not being departed from
In the case where mind and essence, various changes and modifications can be made therein, these variations and modifications are also considered as protection scope of the present invention.
Claims (8)
1. a kind of semiconductor processing equipment, including pallet original point position system, the pallet original point position system includes rotatable
Pallet, controller and detector, be provided at circumferentially spaced multiple carrying positions for carrying substrates along it on the pallet,
It is characterized in that, being provided at circumferentially spaced at least two for the original point position portion as origin along it on the pallet；Extremely
The structure in few two original point position portions is different, so that the detector can determine whether out each original point position portion；
The check bit of the detector is setting on the pallet circumference where at least two original point position portions；The controller
For controlling the pallet rotation；Be provided in the controller it is one-to-one with each original point position portion, at it
Each carrying position rotates the specified time to needed for picking and placing piece position when rotation to the detection position；The detector is used
In the pallet rotation during detect any one of original point position portion whether rotate to its detect position, if so,
Then determine that presently described pallet present position is the pallet origin position；The detector be also used to detect it is any one
When a original point position portion is located at detection position, and judge current origin positioning region, and sends expression to the controller
The signal of current origin positioning region；The controller is also used to receive the signal for indicating current origin positioning region, according to the signal
Current origin positioning region corresponding multiple specified times are obtained, control pallet continuation successively rotates multiple specified times, real
Existing multiple carrying positions are rotated according to preset order to pick-and-place piece position.
2. semiconductor processing equipment according to claim 1, which is characterized in that the preset order is the current origin
Along the pallet direction of rotation near picking and placing the carrying position of piece position to last when positioning region is rotated to the detection position
The sequence of one carrying position.
3. semiconductor processing equipment according to claim 1 or 2, which is characterized in that the semiconductor processing equipment also wraps
Manipulator and film magazine are included, the film magazine includes multiple film traps, and the film trap and the carrying position correspond, each film trap
For placing the substrate carried on the corresponding carrying position；
The controller is used to rotate in each carrying position to after picking and placing piece position, and control manipulator takes to positioned at described
The current carrying position of film releasing position loads the substrate in film trap corresponding with current carrying position, alternatively, on the current carrying position of unloading
Substrate to corresponding film trap in.
4. semiconductor processing equipment according to claim 1, which is characterized in that each original point position portion and the support
There are difference in height between panel surface,
The detector judges that any one of origin is fixed for detecting the distance between itself and detection position according to this distance
Whether position portion, which rotates to it, is detected position.
5. semiconductor processing equipment according to claim 2, which is characterized in that each original point position portion and the support
There are differences in height between panel surface, and difference in height is different；
The detector judges that any one of origin is fixed for detecting the distance between itself and detection position according to this distance
Whether position portion, which rotates to it, is detected position and judges current origin positioning region.
6. semiconductor processing equipment according to claim 4 or 5, which is characterized in that each original point position portion be
The groove or boss or notch being arranged on the pallet.
7. semiconductor processing equipment according to claim 1 or 2, which is characterized in that multiple carrying positions are along the support
It disk circumferentially-spaced and is uniformly arranged.
8. semiconductor processing equipment according to claim 1 or 2, which is characterized in that at least two original point position portions
It is circumferentially-spaced along the pallet and be uniformly arranged.
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| CN110592560B (en) * | 2019-10-18 | 2022-02-22 | 北京北方华创微电子装备有限公司 | Process disc alignment method, process disc alignment device and semiconductor processing equipment |
| CN113135209B (en) * | 2021-03-10 | 2022-11-01 | 拓荆科技股份有限公司 | Multi-silicon-chip transportation and taking-off vehicle |
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|---|---|---|---|---|
| CN103443912A (en) * | 2011-03-31 | 2013-12-11 | 大阳日酸株式会社 | Vapor phase growth device |
| CN103378067A (en) * | 2012-04-25 | 2013-10-30 | 台湾积体电路制造股份有限公司 | Wafer assembly with carrier wafer |
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| CN105762092A (en) | 2016-07-13 |
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