CN104321639A - 试样分析元件以及检测装置 - Google Patents
试样分析元件以及检测装置 Download PDFInfo
- Publication number
- CN104321639A CN104321639A CN201380020394.0A CN201380020394A CN104321639A CN 104321639 A CN104321639 A CN 104321639A CN 201380020394 A CN201380020394 A CN 201380020394A CN 104321639 A CN104321639 A CN 104321639A
- Authority
- CN
- China
- Prior art keywords
- metal
- light
- sample analysis
- analysis element
- wavelength
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000004458 analytical method Methods 0.000 title claims abstract description 31
- 238000001514 detection method Methods 0.000 title description 22
- 229910052751 metal Inorganic materials 0.000 claims abstract description 122
- 239000002184 metal Substances 0.000 claims abstract description 122
- 238000002310 reflectometry Methods 0.000 claims description 2
- 230000001678 irradiating effect Effects 0.000 claims 1
- 238000002198 surface plasmon resonance spectroscopy Methods 0.000 abstract description 31
- 230000001902 propagating effect Effects 0.000 abstract description 18
- 239000011295 pitch Substances 0.000 description 39
- 230000003287 optical effect Effects 0.000 description 18
- 230000005684 electric field Effects 0.000 description 12
- 238000001069 Raman spectroscopy Methods 0.000 description 10
- 239000010931 gold Substances 0.000 description 10
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 8
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 7
- 229910052737 gold Inorganic materials 0.000 description 7
- 239000000758 substrate Substances 0.000 description 7
- 238000001228 spectrum Methods 0.000 description 6
- 230000000052 comparative effect Effects 0.000 description 5
- 239000002086 nanomaterial Substances 0.000 description 5
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 4
- 239000011521 glass Substances 0.000 description 4
- 238000000034 method Methods 0.000 description 4
- 235000012239 silicon dioxide Nutrition 0.000 description 4
- 239000000377 silicon dioxide Substances 0.000 description 4
- 229910052709 silver Inorganic materials 0.000 description 4
- 239000004332 silver Substances 0.000 description 4
- 230000003595 spectral effect Effects 0.000 description 4
- 238000003491 array Methods 0.000 description 3
- 239000006185 dispersion Substances 0.000 description 3
- 230000003993 interaction Effects 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 239000002082 metal nanoparticle Substances 0.000 description 3
- 238000012986 modification Methods 0.000 description 3
- 230000004048 modification Effects 0.000 description 3
- 230000010287 polarization Effects 0.000 description 3
- 238000004088 simulation Methods 0.000 description 3
- 239000013076 target substance Substances 0.000 description 3
- 229910004298 SiO 2 Inorganic materials 0.000 description 2
- 108010003723 Single-Domain Antibodies Proteins 0.000 description 2
- 230000005284 excitation Effects 0.000 description 2
- 239000012212 insulator Substances 0.000 description 2
- 239000007769 metal material Substances 0.000 description 2
- 229910052755 nonmetal Inorganic materials 0.000 description 2
- 238000004416 surface enhanced Raman spectroscopy Methods 0.000 description 2
- 238000012795 verification Methods 0.000 description 2
- 241000709661 Enterovirus Species 0.000 description 1
- 241000725303 Human immunodeficiency virus Species 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- BJQHLKABXJIVAM-UHFFFAOYSA-N bis(2-ethylhexyl) phthalate Chemical compound CCCCC(CC)COC(=O)C1=CC=CC=C1C(=O)OCC(CC)CCCC BJQHLKABXJIVAM-UHFFFAOYSA-N 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 238000003475 lamination Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000003801 milling Methods 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 238000009751 slip forming Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 241000701161 unidentified adenovirus Species 0.000 description 1
- 241000712461 unidentified influenza virus Species 0.000 description 1
- 239000011800 void material Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/55—Specular reflectivity
- G01N21/552—Attenuated total reflection
- G01N21/553—Attenuated total reflection and using surface plasmons
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/62—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light
- G01N21/63—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light optically excited
- G01N21/65—Raman scattering
- G01N21/658—Raman scattering enhancement Raman, e.g. surface plasmons
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/55—Specular reflectivity
- G01N21/552—Attenuated total reflection
- G01N21/553—Attenuated total reflection and using surface plasmons
- G01N21/554—Attenuated total reflection and using surface plasmons detecting the surface plasmon resonance of nanostructured metals, e.g. localised surface plasmon resonance
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N2201/00—Features of devices classified in G01N21/00
- G01N2201/06—Illumination; Optics
- G01N2201/061—Sources
- G01N2201/06113—Coherent sources; lasers
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/249921—Web or sheet containing structurally defined element or component
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Physics & Mathematics (AREA)
- Nanotechnology (AREA)
- Pathology (AREA)
- General Health & Medical Sciences (AREA)
- Biochemistry (AREA)
- Immunology (AREA)
- Life Sciences & Earth Sciences (AREA)
- Analytical Chemistry (AREA)
- Nuclear Medicine, Radiotherapy & Molecular Imaging (AREA)
- Composite Materials (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Materials Engineering (AREA)
- Crystallography & Structural Chemistry (AREA)
- Investigating, Analyzing Materials By Fluorescence Or Luminescence (AREA)
- Investigating Or Analysing Materials By Optical Means (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2012094519A JP2013221883A (ja) | 2012-04-18 | 2012-04-18 | 試料分析素子および検出装置 |
| JP2012-094519 | 2012-04-18 | ||
| PCT/JP2013/002503 WO2013157233A1 (ja) | 2012-04-18 | 2013-04-12 | 試料分析素子および検出装置 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN104321639A true CN104321639A (zh) | 2015-01-28 |
Family
ID=49383205
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201380020394.0A Pending CN104321639A (zh) | 2012-04-18 | 2013-04-12 | 试样分析元件以及检测装置 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US9228944B2 (enExample) |
| EP (1) | EP2840383A4 (enExample) |
| JP (1) | JP2013221883A (enExample) |
| CN (1) | CN104321639A (enExample) |
| WO (1) | WO2013157233A1 (enExample) |
Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2014097886A1 (ja) * | 2012-12-18 | 2014-06-26 | 学校法人早稲田大学 | 光学デバイスおよび分析装置 |
| JP2014169955A (ja) | 2013-03-05 | 2014-09-18 | Seiko Epson Corp | 分析装置、分析方法、これらに用いる光学素子および電子機器、並びに光学素子の設計方法 |
| JP2015055482A (ja) * | 2013-09-10 | 2015-03-23 | セイコーエプソン株式会社 | 分析装置、分析方法、これらに用いる光学素子及び電子機器 |
| JP6365817B2 (ja) | 2014-02-17 | 2018-08-01 | セイコーエプソン株式会社 | 分析装置、及び電子機器 |
| WO2015154961A1 (en) | 2014-04-08 | 2015-10-15 | Insplorion Ab | Battery with sensor |
| JP2015215178A (ja) * | 2014-05-08 | 2015-12-03 | セイコーエプソン株式会社 | 電場増強素子、分析装置及び電子機器 |
| JP6613736B2 (ja) * | 2015-09-07 | 2019-12-04 | セイコーエプソン株式会社 | 物質検出方法および物質検出装置 |
| DE102017105113B4 (de) | 2017-03-10 | 2021-09-30 | Leibniz-Institut für Photonische Technologien e.V. (Engl.Leibniz Institute of Photonic Technology) | Anordnung und Verfahren für die Erfassung von Änderungen der optischen Weglänge in einem Nano-Kapillarkanal |
| US11959859B2 (en) * | 2021-06-02 | 2024-04-16 | Edwin Thomas Carlen | Multi-gas detection system and method |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2010020136A (ja) * | 2008-07-11 | 2010-01-28 | Ricoh Co Ltd | 微小構造体とその製造方法、微小構造体を有する光制御素子とその製造方法 |
| US20100233825A1 (en) * | 2007-11-02 | 2010-09-16 | Canon Kabushiki Kaisha | Chemical sensor element, sensing apparatus, and sensing method |
| US20110164252A1 (en) * | 2007-09-28 | 2011-07-07 | Canon Kabushiki Kaisha | Target substance-detecting apparatus and target substance-detecting method |
Family Cites Families (36)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3452837B2 (ja) | 1999-06-14 | 2003-10-06 | 理化学研究所 | 局在プラズモン共鳴センサー |
| JP4231701B2 (ja) | 2002-01-08 | 2009-03-04 | 富士フイルム株式会社 | プラズモン共鳴デバイス |
| US7079250B2 (en) | 2002-01-08 | 2006-07-18 | Fuji Photo Film Co., Ltd. | Structure, structure manufacturing method and sensor using the same |
| JP3897703B2 (ja) | 2002-01-11 | 2007-03-28 | キヤノン株式会社 | センサ装置およびそれを用いた検査方法 |
| US7399445B2 (en) | 2002-01-11 | 2008-07-15 | Canon Kabushiki Kaisha | Chemical sensor |
| US7088449B1 (en) | 2002-11-08 | 2006-08-08 | The Board Of Trustees Of The Leland Stanford Junior University | Dimension measurement approach for metal-material |
| EP1445601A3 (en) | 2003-01-30 | 2004-09-22 | Fuji Photo Film Co., Ltd. | Localized surface plasmon sensor chips, processes for producing the same, and sensors using the same |
| JP3957199B2 (ja) | 2003-03-19 | 2007-08-15 | 富士フイルム株式会社 | センサチップおよびセンサチップの製造方法並びにそのセンサチップを用いたセンサ |
| US7239076B2 (en) * | 2003-09-25 | 2007-07-03 | General Electric Company | Self-aligned gated rod field emission device and associated method of fabrication |
| NZ551786A (en) | 2004-05-19 | 2011-03-31 | Vp Holding Llc | Optical sensor with layered plasmon structure for enhanced detection of chemical groups by surface enhanced raman scattering |
| JP4156567B2 (ja) * | 2004-06-16 | 2008-09-24 | 日本電信電話株式会社 | Ｓｐｒセンサーおよび屈折率測定方法 |
| GB2419940B (en) | 2004-11-04 | 2007-03-07 | Mesophotonics Ltd | Metal nano-void photonic crystal for enhanced raman spectroscopy |
| JP2006208057A (ja) | 2005-01-25 | 2006-08-10 | Taiyo Yuden Co Ltd | プラズモン共鳴構造体，その制御方法，金属ドメイン製造方法 |
| JP2007218900A (ja) | 2006-01-18 | 2007-08-30 | Canon Inc | 標的物質検出用の素子 |
| WO2007083817A1 (en) | 2006-01-18 | 2007-07-26 | Canon Kabushiki Kaisha | Target substance-detecting element |
| JP2007240361A (ja) | 2006-03-09 | 2007-09-20 | Sekisui Chem Co Ltd | 局在プラズモン増強センサ |
| JP4994682B2 (ja) | 2006-03-16 | 2012-08-08 | キヤノン株式会社 | 検知素子、該検知素子を用いた標的物質検知装置及び標的物質を検知する方法 |
| JP5286515B2 (ja) | 2006-05-11 | 2013-09-11 | 国立大学法人秋田大学 | センサチップ及びセンサチップ製造方法 |
| WO2007132795A1 (en) | 2006-05-12 | 2007-11-22 | Canon Kabushiki Kaisha | Detecting element, detecting device and detecting method |
| JP2008025989A (ja) | 2006-07-15 | 2008-02-07 | Keio Gijuku | 局在表面プラズモン共鳴法と質量分析法によるリガンドの分析方法及びそのためのセンサー素子 |
| GB2447696A (en) | 2007-03-23 | 2008-09-24 | Univ Exeter | Photonic biosensor arrays |
| US7768640B2 (en) | 2007-05-07 | 2010-08-03 | The Board Of Trustees Of The University Of Illinois | Fluorescence detection enhancement using photonic crystal extraction |
| JP5116362B2 (ja) | 2007-05-28 | 2013-01-09 | 株式会社リコー | バイオセンサ |
| US7639355B2 (en) | 2007-06-26 | 2009-12-29 | Hewlett-Packard Development Company, L.P. | Electric-field-enhancement structure and detection apparatus using same |
| JP5080186B2 (ja) | 2007-09-26 | 2012-11-21 | 富士フイルム株式会社 | 分子分析光検出方法およびそれに用いられる分子分析光検出装置、並びにサンプルプレート |
| JP5175584B2 (ja) | 2008-03-13 | 2013-04-03 | 地方独立行政法人 東京都立産業技術研究センター | 局所表面プラズモン共鳴イメージング装置 |
| US8247216B2 (en) | 2008-09-30 | 2012-08-21 | Pacific Biosciences Of California, Inc. | Ultra-high multiplex analytical systems and methods |
| JP2010256161A (ja) | 2009-04-24 | 2010-11-11 | Konica Minolta Holdings Inc | プラズモン励起センサおよびそれを用いたアッセイ法 |
| US8259381B2 (en) * | 2009-06-05 | 2012-09-04 | Exelis Inc. | Phase-change materials and optical limiting devices utilizing phase-change materials |
| JP5621394B2 (ja) | 2009-11-19 | 2014-11-12 | セイコーエプソン株式会社 | センサーチップ、センサーカートリッジ及び分析装置 |
| EP2325635B1 (en) | 2009-11-19 | 2017-05-03 | Seiko Epson Corporation | Sensor chip, sensor cartridge, and analysis apparatus |
| JP5589656B2 (ja) | 2009-12-11 | 2014-09-17 | セイコーエプソン株式会社 | センサーチップ、センサーカートリッジ及び分析装置 |
| EP2537053B1 (en) | 2010-02-19 | 2016-11-02 | Pacific Biosciences of California, Inc. | An analytical device comprising an optode array chip |
| EP2372348A1 (en) | 2010-03-22 | 2011-10-05 | Imec | Methods and systems for surface enhanced optical detection |
| US8358419B2 (en) | 2011-04-05 | 2013-01-22 | Integrated Plasmonics Corporation | Integrated plasmonic sensing device and apparatus |
| EP2769214B1 (en) | 2011-10-18 | 2019-05-22 | Hewlett-Packard Development Company, L.P. | Molecular sensing device |
-
2012
- 2012-04-18 JP JP2012094519A patent/JP2013221883A/ja not_active Withdrawn
-
2013
- 2013-04-12 CN CN201380020394.0A patent/CN104321639A/zh active Pending
- 2013-04-12 EP EP13777779.3A patent/EP2840383A4/en not_active Withdrawn
- 2013-04-12 WO PCT/JP2013/002503 patent/WO2013157233A1/ja not_active Ceased
- 2013-04-12 US US14/395,243 patent/US9228944B2/en not_active Expired - Fee Related
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20110164252A1 (en) * | 2007-09-28 | 2011-07-07 | Canon Kabushiki Kaisha | Target substance-detecting apparatus and target substance-detecting method |
| US20100233825A1 (en) * | 2007-11-02 | 2010-09-16 | Canon Kabushiki Kaisha | Chemical sensor element, sensing apparatus, and sensing method |
| JP2010020136A (ja) * | 2008-07-11 | 2010-01-28 | Ricoh Co Ltd | 微小構造体とその製造方法、微小構造体を有する光制御素子とその製造方法 |
Non-Patent Citations (1)
| Title |
|---|
| YIZHUO CHU等: "Experimental study of the interaction between localized and propagating surface plasmons", 《OPTICS LETTERS》, vol. 34, no. 3, 1 February 2009 (2009-02-01), XP001521857, DOI: doi:10.1364/OL.34.000244 * |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2013221883A (ja) | 2013-10-28 |
| EP2840383A1 (en) | 2015-02-25 |
| WO2013157233A1 (ja) | 2013-10-24 |
| US9228944B2 (en) | 2016-01-05 |
| US20150103347A1 (en) | 2015-04-16 |
| EP2840383A4 (en) | 2015-11-18 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C02 | Deemed withdrawal of patent application after publication (patent law 2001) | ||
| WD01 | Invention patent application deemed withdrawn after publication |
Application publication date: 20150128 |