CN104030969B - 肟酯系化合物、光聚合引发剂、光聚合性组合物、滤色器和液晶显示装置 - Google Patents

肟酯系化合物、光聚合引发剂、光聚合性组合物、滤色器和液晶显示装置 Download PDF

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Publication number
CN104030969B
CN104030969B CN201410267782.5A CN201410267782A CN104030969B CN 104030969 B CN104030969 B CN 104030969B CN 201410267782 A CN201410267782 A CN 201410267782A CN 104030969 B CN104030969 B CN 104030969B
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group
alkyl
ring
carbon atoms
photoepolymerizationinitiater initiater
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CN104030969A (zh
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水上润二
田中俊行
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Mitsubishi Chemical Corp
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Mitsubishi Chemical Corp
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D209/00—Heterocyclic compounds containing five-membered rings, condensed with other rings, with one nitrogen atom as the only ring hetero atom
    • C07D209/56—Ring systems containing three or more rings
    • C07D209/80—[b, c]- or [b, d]-condensed
    • C07D209/82—Carbazoles; Hydrogenated carbazoles
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D209/00—Heterocyclic compounds containing five-membered rings, condensed with other rings, with one nitrogen atom as the only ring hetero atom
    • C07D209/56—Ring systems containing three or more rings
    • C07D209/80—[b, c]- or [b, d]-condensed
    • C07D209/82—Carbazoles; Hydrogenated carbazoles
    • C07D209/86—Carbazoles; Hydrogenated carbazoles with only hydrogen atoms, hydrocarbon or substituted hydrocarbon radicals, directly attached to carbon atoms of the ring system
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D409/00—Heterocyclic compounds containing two or more hetero rings, at least one ring having sulfur atoms as the only ring hetero atoms
    • C07D409/02—Heterocyclic compounds containing two or more hetero rings, at least one ring having sulfur atoms as the only ring hetero atoms containing two hetero rings
    • C07D409/06—Heterocyclic compounds containing two or more hetero rings, at least one ring having sulfur atoms as the only ring hetero atoms containing two hetero rings linked by a carbon chain containing only aliphatic carbon atoms
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/04—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of organic materials, e.g. plastics
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable

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  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Optics & Photonics (AREA)
  • Medicinal Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Polymers & Plastics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Nonlinear Science (AREA)
  • Mathematical Physics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Materials For Photolithography (AREA)
  • Optical Filters (AREA)
  • Plural Heterocyclic Compounds (AREA)
  • Indole Compounds (AREA)
  • Polymerisation Methods In General (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
CN201410267782.5A 2006-12-20 2007-12-06 肟酯系化合物、光聚合引发剂、光聚合性组合物、滤色器和液晶显示装置 Active CN104030969B (zh)

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JP2006343065 2006-12-20
JP2006-343065 2006-12-20
CN200780040202.7A CN101528693B (zh) 2006-12-20 2007-12-06 肟酯系化合物、光聚合引发剂、光聚合性组合物、滤色器和液晶显示装置

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CN104030969A CN104030969A (zh) 2014-09-10
CN104030969B true CN104030969B (zh) 2016-09-07

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CN200780040202.7A Active CN101528693B (zh) 2006-12-20 2007-12-06 肟酯系化合物、光聚合引发剂、光聚合性组合物、滤色器和液晶显示装置

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JP (1) JP5151433B2 (enExample)
KR (3) KR101337283B1 (enExample)
CN (2) CN104030969B (enExample)
TW (1) TWI448453B (enExample)
WO (1) WO2008075564A1 (enExample)

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JP2009040762A (ja) * 2007-08-09 2009-02-26 Ciba Holding Inc オキシムエステル光開始剤
KR101947474B1 (ko) * 2008-07-09 2019-02-13 도쿄 오카 고교 가부시키가이샤 착색 감광성 수지 조성물 및 옥심계 광중합 개시제
KR101678028B1 (ko) * 2009-06-17 2016-11-21 토요잉크Sc홀딩스주식회사 옥심에스테르 화합물, 라디칼 중합개시제, 중합성 조성물, 네가티브형 레지스트 및 화상 패턴
CA2780036C (en) 2009-12-07 2017-08-22 Agfa-Gevaert Photoinitiators for uv-led curable compositions and inks
WO2011069943A1 (en) 2009-12-07 2011-06-16 Agfa-Gevaert Uv-led curable compositions and inks
WO2011152066A1 (ja) * 2010-06-04 2011-12-08 ダイトーケミックス株式会社 オキシムエステル化合物、オキシムエステル化合物の製造方法、光重合開始剤および感光性組成物
JP2013101337A (ja) * 2011-10-20 2013-05-23 Mitsubishi Chemicals Corp 着色樹脂組成物、カラーフィルタ、液晶表示装置及び有機ｅｌ表示装置
JP6175259B2 (ja) * 2012-03-26 2017-08-02 大阪ガスケミカル株式会社 酸無水物変性フルオレン含有アクリル系樹脂及びその製造方法
KR101664121B1 (ko) 2012-12-13 2016-10-10 제일모직 주식회사 컬러필터용 감광성 수지 조성물 및 이를 이용한 컬러필터
KR101609634B1 (ko) 2012-12-26 2016-04-06 제일모직 주식회사 감광성 수지 조성물 및 이를 이용한 차광층
KR102281546B1 (ko) * 2013-08-05 2021-07-27 도쿄 오카 고교 가부시키가이샤 안료 분산액, 그것을 포함하는 감광성 수지 조성물 및 분산 조제
CN105531260B (zh) 2013-09-10 2019-05-31 巴斯夫欧洲公司 肟酯光引发剂
TWI668210B (zh) * 2013-11-28 2019-08-11 塔可馬科技股份有限公司 光起始劑及包括該光起始劑之光敏性組合物
KR101799845B1 (ko) * 2015-11-02 2017-11-22 고오 가가쿠고교 가부시키가이샤 감광성 수지 조성물, 드라이 필름, 프린트 배선판
CN107325206B (zh) * 2016-04-12 2018-12-18 常州强力先端电子材料有限公司 一种含硝基咔唑肟酯类光引发剂及其制备方法和应用
JP6713112B2 (ja) * 2016-04-27 2020-06-24 東京応化工業株式会社 化合物及びその製造方法
JP7151215B2 (ja) * 2017-07-06 2022-10-12 三菱ケミカル株式会社 光重合性組成物、硬化物、画像表示装置及びオキシムエステル系化合物
JP7182627B2 (ja) * 2018-06-12 2022-12-02 富士フイルム株式会社 光学異方性層の製造方法
CN109233540A (zh) * 2018-08-13 2019-01-18 宁波高新区诠宝绶新材料科技有限公司 一种具有优异热稳定性的聚醚醚酮包线漆新材料的制备方法
WO2020253283A1 (zh) 2019-06-21 2020-12-24 江苏英力科技发展有限公司 一种新的二芳酰基咔唑化合物及其作为增感剂的应用
CN112111028A (zh) 2019-06-21 2020-12-22 江苏英力科技发展有限公司 一种含有酰基咔唑衍生物和咔唑基肟酯的光引发剂组合物及其在光固化组合物中的应用
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WO2025225377A1 (ja) * 2024-04-23 2025-10-30 富士フイルム株式会社 光硬化性組成物、画素の製造方法、膜、光学フィルタ、固体撮像素子、画像表示装置および光重合開始剤

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JP2008179611A (ja) 2008-08-07
WO2008075564A1 (ja) 2008-06-26
CN101528693B (zh) 2014-07-02
TWI448453B (zh) 2014-08-11
TW200840813A (en) 2008-10-16
CN101528693A (zh) 2009-09-09
KR20130018934A (ko) 2013-02-25
KR101477026B1 (ko) 2014-12-29
KR101337283B1 (ko) 2013-12-06
CN104030969A (zh) 2014-09-10
JP5151433B2 (ja) 2013-02-27
KR20090090296A (ko) 2009-08-25
KR101370818B1 (ko) 2014-03-07
KR20130130872A (ko) 2013-12-02

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