CN104024220A - 酚磺酸芳基酯、显色剂及热敏记录材料 - Google Patents
酚磺酸芳基酯、显色剂及热敏记录材料 Download PDFInfo
- Publication number
- CN104024220A CN104024220A CN201280053323.6A CN201280053323A CN104024220A CN 104024220 A CN104024220 A CN 104024220A CN 201280053323 A CN201280053323 A CN 201280053323A CN 104024220 A CN104024220 A CN 104024220A
- Authority
- CN
- China
- Prior art keywords
- compound
- group
- recording medium
- thermal recording
- developer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 0 CC(C)c(cc1C)c(*)c(*)c1O Chemical compound CC(C)c(cc1C)c(*)c(*)c1O 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
- B41M5/00—Duplicating or marking methods; Sheet materials for use therein
- B41M5/26—Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used
- B41M5/30—Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used using chemical colour formers
- B41M5/333—Colour developing components therefor, e.g. acidic compounds
- B41M5/3333—Non-macromolecular compounds
- B41M5/3335—Compounds containing phenolic or carboxylic acid groups or metal salts thereof
- B41M5/3336—Sulfur compounds, e.g. sulfones, sulfides, sulfonamides
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
- B41M5/00—Duplicating or marking methods; Sheet materials for use therein
- B41M5/26—Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used
- B41M5/30—Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used using chemical colour formers
- B41M5/337—Additives; Binders
- B41M5/3375—Non-macromolecular compounds
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C309/00—Sulfonic acids; Halides, esters, or anhydrides thereof
- C07C309/63—Esters of sulfonic acids
- C07C309/72—Esters of sulfonic acids having sulfur atoms of esterified sulfo groups bound to carbon atoms of six-membered aromatic rings of a carbon skeleton
- C07C309/75—Esters of sulfonic acids having sulfur atoms of esterified sulfo groups bound to carbon atoms of six-membered aromatic rings of a carbon skeleton containing singly-bound oxygen atoms bound to the carbon skeleton
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C309/00—Sulfonic acids; Halides, esters, or anhydrides thereof
- C07C309/63—Esters of sulfonic acids
- C07C309/72—Esters of sulfonic acids having sulfur atoms of esterified sulfo groups bound to carbon atoms of six-membered aromatic rings of a carbon skeleton
- C07C309/77—Esters of sulfonic acids having sulfur atoms of esterified sulfo groups bound to carbon atoms of six-membered aromatic rings of a carbon skeleton containing carboxyl groups bound to the carbon skeleton
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Heat Sensitive Colour Forming Recording (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
Abstract
Description
Claims (10)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2011-239763 | 2011-10-31 | ||
JP2011239763 | 2011-10-31 | ||
PCT/JP2012/078096 WO2013065704A1 (ja) | 2011-10-31 | 2012-10-31 | フェノールスルホン酸アリールエステル、顕色剤および感熱記録材料 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN104024220A true CN104024220A (zh) | 2014-09-03 |
CN104024220B CN104024220B (zh) | 2016-03-16 |
Family
ID=48192049
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201280053323.6A Active CN104024220B (zh) | 2011-10-31 | 2012-10-31 | 酚磺酸芳基酯、显色剂及热敏记录材料 |
Country Status (9)
Country | Link |
---|---|
US (1) | US9073376B2 (zh) |
EP (1) | EP2774916B1 (zh) |
JP (1) | JP6184325B2 (zh) |
KR (1) | KR101668231B1 (zh) |
CN (1) | CN104024220B (zh) |
BR (1) | BR112014010513B1 (zh) |
IN (1) | IN2014DN03483A (zh) |
TW (1) | TWI568715B (zh) |
WO (1) | WO2013065704A1 (zh) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN105498623A (zh) * | 2015-12-15 | 2016-04-20 | 宁德师范学院 | 一种利用阴离子双子表面活性剂16-s-16为原料制得的粘弹溶液及其制备方法和应用 |
CN108367582A (zh) * | 2015-12-10 | 2018-08-03 | 白奎彻 | 热敏记录材料 |
CN110997341A (zh) * | 2017-08-09 | 2020-04-10 | 三菱化学株式会社 | 热敏记录材料和层叠体 |
CN111032626A (zh) * | 2017-08-31 | 2020-04-17 | 三光株式会社 | N,n’-二芳基脲衍生物及其制备方法以及使用其的热敏记录材料 |
CN114761379A (zh) * | 2019-11-28 | 2022-07-15 | 三菱化学株式会社 | 显色剂及热敏记录材料 |
Families Citing this family (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5808279B2 (ja) * | 2012-03-15 | 2015-11-10 | 日本製紙株式会社 | 感熱記録材料 |
JP5971864B2 (ja) * | 2013-06-05 | 2016-08-17 | 北越紀州製紙株式会社 | 感熱記録体の製造方法 |
ES2684629T3 (es) * | 2015-06-24 | 2018-10-03 | Mitsubishi Hitec Paper Europe Gmbh | Material de registro termosensible |
JP6922575B2 (ja) * | 2016-09-14 | 2021-08-18 | 三菱ケミカル株式会社 | 多価フェノール化合物およびその製造方法 |
EP3523134A1 (de) * | 2016-10-07 | 2019-08-14 | Mitsubishi HiTec Paper Europe GmbH | Wärmeempfindliches aufzeichnungsmaterial |
EP3305538A1 (de) * | 2016-10-07 | 2018-04-11 | Mitsubishi HiTec Paper Europe GmbH | Wärmeempfindliches aufzeichnungsmaterial |
US11370240B2 (en) * | 2017-01-30 | 2022-06-28 | Nippon Soda Co., Ltd. | Recording material and recording sheet |
CN110997340A (zh) * | 2017-08-09 | 2020-04-10 | 三菱化学株式会社 | 热敏记录材料和层叠体 |
JP7072130B1 (ja) * | 2020-07-27 | 2022-05-19 | 日本製紙株式会社 | 感熱記録体 |
JP7321600B2 (ja) * | 2021-10-29 | 2023-08-07 | 三光株式会社 | 新規な置換ヒドロキシ安息香酸エステル誘導体及びそれを用いた感熱記録材料 |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4583104A (en) * | 1983-09-05 | 1986-04-15 | Fuji Photo Film Co., Ltd. | Recording materials |
WO1996008483A1 (fr) * | 1994-09-16 | 1996-03-21 | Roussel Uclaf | Derives de l'acide gallique, leur procede de preparation et leur application a titre de medicaments |
CN1684840A (zh) * | 2002-09-24 | 2005-10-19 | 小西化学工业株式会社 | 显影剂以及含有该显影剂的热敏记录材料 |
Family Cites Families (23)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS53143223A (en) * | 1977-05-19 | 1978-12-13 | Konishiroku Photo Ind Co Ltd | Silver halide photographic material |
JPS5640629A (en) | 1979-09-10 | 1981-04-16 | Yoshitomi Pharmaceut Ind Ltd | Trisphenol hydrate |
JPS5882788A (ja) * | 1981-11-11 | 1983-05-18 | Fuji Photo Film Co Ltd | 感熱記録材料 |
US4531139A (en) * | 1983-10-02 | 1985-07-23 | The Standard Register Company | Color developers for pressure-sensitive or heat-sensitive recording papers |
JPS60176794A (ja) | 1984-02-23 | 1985-09-10 | Jujo Paper Co Ltd | 感熱記録紙 |
JP2500532B2 (ja) * | 1990-01-29 | 1996-05-29 | 吉富製薬株式会社 | ジフェニルスルホン化合物の製造法 |
JPH05246145A (ja) * | 1991-05-24 | 1993-09-24 | Daito Kagaku Kk | 記録材料 |
JPH0654884A (ja) * | 1992-08-11 | 1994-03-01 | Sanyo Electric Co Ltd | いす式マッサージ装置 |
JP2803078B2 (ja) | 1994-08-19 | 1998-09-24 | 日本製紙株式会社 | 新規なアミノベンゼンスルホンアミド誘導体及びそれらを使用した記録体 |
JP3913820B2 (ja) | 1995-10-31 | 2007-05-09 | 日本曹達株式会社 | ジフェニルスルホン架橋型化合物及びそれを用いた記録材料 |
JP3306491B2 (ja) | 1997-03-19 | 2002-07-24 | 日本製紙株式会社 | 感熱記録体 |
JP3358056B2 (ja) * | 1998-10-16 | 2002-12-16 | 日本製紙株式会社 | 感熱記録体 |
GB9827569D0 (en) | 1998-12-16 | 1999-02-10 | Ciba Geigy Ag | Heat sensitive recording material |
JP2002200847A (ja) * | 2000-10-24 | 2002-07-16 | Oji Paper Co Ltd | 感熱記録体 |
JP2002301873A (ja) | 2001-04-04 | 2002-10-15 | Nippon Soda Co Ltd | 記録材料及び記録シート |
ATE396056T1 (de) | 2001-04-04 | 2008-06-15 | Nippon Soda Co | Zusammensetzung, aufzeichnungsmaterial, und aufzeichnungsblatt |
EP1393923B1 (en) | 2001-06-01 | 2009-08-12 | API Corporation | Developers for thermal recording materials and thermal recording materials |
JP4004289B2 (ja) | 2002-01-11 | 2007-11-07 | 株式会社エーピーアイ コーポレーション | 感熱記録材料およびそれを含有する感熱記録体 |
JP4161778B2 (ja) * | 2002-04-09 | 2008-10-08 | 王子製紙株式会社 | 感熱記録体 |
CN101511762B (zh) | 2006-07-19 | 2012-08-29 | 日本化药株式会社 | 1,1-双(4-羟基苯基)-1-苯乙烷及使用此化合物的热敏记录材料 |
JP5485608B2 (ja) | 2008-07-30 | 2014-05-07 | 日本製紙株式会社 | フェノールスルホン酸エステル、顕色剤及び感熱記録材料 |
CN102448732B (zh) * | 2009-04-03 | 2013-05-22 | 日本制纸株式会社 | 感热显色层用的涂布溶液和感热记录材料 |
CN103221387B (zh) * | 2010-09-16 | 2014-11-05 | 三菱化学株式会社 | 新的苯酚磺酸芳基酯衍生物,以及使用该衍生物的热敏记录材料 |
-
2012
- 2012-10-31 BR BR112014010513A patent/BR112014010513B1/pt active IP Right Grant
- 2012-10-31 KR KR1020147014350A patent/KR101668231B1/ko active IP Right Grant
- 2012-10-31 WO PCT/JP2012/078096 patent/WO2013065704A1/ja active Application Filing
- 2012-10-31 JP JP2013541796A patent/JP6184325B2/ja active Active
- 2012-10-31 CN CN201280053323.6A patent/CN104024220B/zh active Active
- 2012-10-31 US US14/355,118 patent/US9073376B2/en active Active
- 2012-10-31 EP EP12846070.6A patent/EP2774916B1/en active Active
- 2012-10-31 TW TW101140242A patent/TWI568715B/zh active
- 2012-10-31 IN IN3483DEN2014 patent/IN2014DN03483A/en unknown
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4583104A (en) * | 1983-09-05 | 1986-04-15 | Fuji Photo Film Co., Ltd. | Recording materials |
WO1996008483A1 (fr) * | 1994-09-16 | 1996-03-21 | Roussel Uclaf | Derives de l'acide gallique, leur procede de preparation et leur application a titre de medicaments |
CN1684840A (zh) * | 2002-09-24 | 2005-10-19 | 小西化学工业株式会社 | 显影剂以及含有该显影剂的热敏记录材料 |
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN108367582A (zh) * | 2015-12-10 | 2018-08-03 | 白奎彻 | 热敏记录材料 |
CN105498623A (zh) * | 2015-12-15 | 2016-04-20 | 宁德师范学院 | 一种利用阴离子双子表面活性剂16-s-16为原料制得的粘弹溶液及其制备方法和应用 |
CN110997341A (zh) * | 2017-08-09 | 2020-04-10 | 三菱化学株式会社 | 热敏记录材料和层叠体 |
CN111032626A (zh) * | 2017-08-31 | 2020-04-17 | 三光株式会社 | N,n’-二芳基脲衍生物及其制备方法以及使用其的热敏记录材料 |
CN111032626B (zh) * | 2017-08-31 | 2022-05-17 | 三光株式会社 | N,n′-二芳基脲衍生物及其制备方法以及使用其的热敏记录材料 |
US11945769B2 (en) | 2017-08-31 | 2024-04-02 | Sanko Co., Ltd. | N,N′-diarylurea derivative, manufacturing method thereof, and thermosensitive recording material using same |
CN114761379A (zh) * | 2019-11-28 | 2022-07-15 | 三菱化学株式会社 | 显色剂及热敏记录材料 |
Also Published As
Publication number | Publication date |
---|---|
BR112014010513B1 (pt) | 2020-02-04 |
EP2774916A1 (en) | 2014-09-10 |
US9073376B2 (en) | 2015-07-07 |
TWI568715B (zh) | 2017-02-01 |
EP2774916A4 (en) | 2015-05-06 |
BR112014010513A2 (pt) | 2017-06-13 |
KR20140080557A (ko) | 2014-06-30 |
EP2774916B1 (en) | 2016-05-25 |
IN2014DN03483A (zh) | 2015-06-05 |
CN104024220B (zh) | 2016-03-16 |
US20140315713A1 (en) | 2014-10-23 |
KR101668231B1 (ko) | 2016-10-21 |
WO2013065704A1 (ja) | 2013-05-10 |
JP6184325B2 (ja) | 2017-08-23 |
TW201323385A (zh) | 2013-06-16 |
JPWO2013065704A1 (ja) | 2015-04-02 |
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Legal Events
Date | Code | Title | Description |
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C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
CP01 | Change in the name or title of a patent holder | ||
CP01 | Change in the name or title of a patent holder |
Address after: Tokyo, Japan Co-patentee after: MITSUBISHI CHEMICAL Corp. Patentee after: NIPPON PAPER INDUSTRIES Co.,Ltd. Address before: Tokyo, Japan Co-patentee before: MITSUBISHI RAYON Co.,Ltd. Patentee before: NIPPON PAPER INDUSTRIES Co.,Ltd. |
|
TR01 | Transfer of patent right | ||
TR01 | Transfer of patent right |
Effective date of registration: 20170919 Address after: Tokyo, Japan Co-patentee after: MITSUBISHI RAYON Co.,Ltd. Patentee after: NIPPON PAPER INDUSTRIES Co.,Ltd. Address before: Tokyo, Japan Co-patentee before: MITSUBISHI CHEMICAL Corp. Patentee before: NIPPON PAPER INDUSTRIES Co.,Ltd. |