CN103889903B - 液体处理装置以及液体处理方法 - Google Patents

液体处理装置以及液体处理方法 Download PDF

Info

Publication number
CN103889903B
CN103889903B CN201380003505.7A CN201380003505A CN103889903B CN 103889903 B CN103889903 B CN 103889903B CN 201380003505 A CN201380003505 A CN 201380003505A CN 103889903 B CN103889903 B CN 103889903B
Authority
CN
China
Prior art keywords
metal electrode
handling device
liquid handling
insulator
water
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
CN201380003505.7A
Other languages
English (en)
Chinese (zh)
Other versions
CN103889903A (zh
Inventor
今井伸
今井伸一
熊谷裕典
小野寺真里
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Intellectual Property Management Co Ltd
Original Assignee
Panasonic Intellectual Property Management Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Panasonic Intellectual Property Management Co Ltd filed Critical Panasonic Intellectual Property Management Co Ltd
Publication of CN103889903A publication Critical patent/CN103889903A/zh
Application granted granted Critical
Publication of CN103889903B publication Critical patent/CN103889903B/zh
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • DTEXTILES; PAPER
    • D06TREATMENT OF TEXTILES OR THE LIKE; LAUNDERING; FLEXIBLE MATERIALS NOT OTHERWISE PROVIDED FOR
    • D06FLAUNDERING, DRYING, IRONING, PRESSING OR FOLDING TEXTILE ARTICLES
    • D06F35/00Washing machines, apparatus, or methods not otherwise provided for
    • D06F35/002Washing machines, apparatus, or methods not otherwise provided for using bubbles
    • CCHEMISTRY; METALLURGY
    • C02TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02FTREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00Treatment of water, waste water, or sewage
    • C02F1/46Treatment of water, waste water, or sewage by electrochemical methods
    • C02F1/4608Treatment of water, waste water, or sewage by electrochemical methods using electrical discharges
    • CCHEMISTRY; METALLURGY
    • C02TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02FTREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00Treatment of water, waste water, or sewage
    • C02F1/46Treatment of water, waste water, or sewage by electrochemical methods
    • C02F1/461Treatment of water, waste water, or sewage by electrochemical methods by electrolysis
    • C02F1/46104Devices therefor; Their operating or servicing
    • C02F1/46109Electrodes
    • CCHEMISTRY; METALLURGY
    • C02TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02FTREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00Treatment of water, waste water, or sewage
    • C02F1/48Treatment of water, waste water, or sewage with magnetic or electric fields
    • DTEXTILES; PAPER
    • D06TREATMENT OF TEXTILES OR THE LIKE; LAUNDERING; FLEXIBLE MATERIALS NOT OTHERWISE PROVIDED FOR
    • D06FLAUNDERING, DRYING, IRONING, PRESSING OR FOLDING TEXTILE ARTICLES
    • D06F35/00Washing machines, apparatus, or methods not otherwise provided for
    • D06F35/003Washing machines, apparatus, or methods not otherwise provided for using electrochemical cells
    • CCHEMISTRY; METALLURGY
    • C02TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02FTREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00Treatment of water, waste water, or sewage
    • C02F1/46Treatment of water, waste water, or sewage by electrochemical methods
    • C02F1/461Treatment of water, waste water, or sewage by electrochemical methods by electrolysis
    • C02F1/46104Devices therefor; Their operating or servicing
    • C02F1/46109Electrodes
    • C02F2001/46133Electrodes characterised by the material
    • C02F2001/46138Electrodes comprising a substrate and a coating
    • CCHEMISTRY; METALLURGY
    • C02TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02FTREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00Treatment of water, waste water, or sewage
    • C02F1/46Treatment of water, waste water, or sewage by electrochemical methods
    • C02F1/461Treatment of water, waste water, or sewage by electrochemical methods by electrolysis
    • C02F1/46104Devices therefor; Their operating or servicing
    • C02F1/46109Electrodes
    • C02F2001/46152Electrodes characterised by the shape or form
    • C02F2001/46157Perforated or foraminous electrodes
    • CCHEMISTRY; METALLURGY
    • C02TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02FTREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00Treatment of water, waste water, or sewage
    • C02F1/46Treatment of water, waste water, or sewage by electrochemical methods
    • C02F1/461Treatment of water, waste water, or sewage by electrochemical methods by electrolysis
    • C02F1/46104Devices therefor; Their operating or servicing
    • C02F1/46109Electrodes
    • C02F2001/46152Electrodes characterised by the shape or form
    • C02F2001/46171Cylindrical or tubular shaped
    • CCHEMISTRY; METALLURGY
    • C02TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02FTREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2201/00Apparatus for treatment of water, waste water or sewage
    • C02F2201/46Apparatus for electrochemical processes
    • C02F2201/461Electrolysis apparatus
    • C02F2201/46105Details relating to the electrolytic devices
    • C02F2201/4619Supplying gas to the electrolyte

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Hydrology & Water Resources (AREA)
  • Electrochemistry (AREA)
  • Environmental & Geological Engineering (AREA)
  • Water Supply & Treatment (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Textile Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Water Treatment By Electricity Or Magnetism (AREA)
  • Plasma Technology (AREA)
  • Devices For Blowing Cold Air, Devices For Blowing Warm Air, And Means For Preventing Water Condensation In Air Conditioning Units (AREA)
  • Air Humidification (AREA)
CN201380003505.7A 2012-07-24 2013-06-25 液体处理装置以及液体处理方法 Active CN103889903B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2012163785 2012-07-24
JP2012-163785 2012-07-24
PCT/JP2013/003969 WO2014017020A1 (ja) 2012-07-24 2013-06-25 液体処理装置及び液体処理方法

Publications (2)

Publication Number Publication Date
CN103889903A CN103889903A (zh) 2014-06-25
CN103889903B true CN103889903B (zh) 2017-08-08

Family

ID=49996848

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201380003505.7A Active CN103889903B (zh) 2012-07-24 2013-06-25 液体处理装置以及液体处理方法

Country Status (6)

Country Link
US (1) US9688549B2 (enExample)
EP (1) EP2762453B1 (enExample)
JP (2) JP5796174B2 (enExample)
CN (1) CN103889903B (enExample)
IN (1) IN2014CN03441A (enExample)
WO (1) WO2014017020A1 (enExample)

Families Citing this family (27)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2014002364A1 (ja) * 2012-06-28 2014-01-03 パナソニック株式会社 液体中の元素分析装置
JP5884065B2 (ja) 2013-11-18 2016-03-15 パナソニックIpマネジメント株式会社 液体処理ユニット、洗浄便座、洗濯機および液体処理装置
CN105271475A (zh) 2014-06-06 2016-01-27 松下知识产权经营株式会社 处理液生成装置及处理液生成方法
JP6350986B2 (ja) * 2014-07-29 2018-07-04 一般財団法人電力中央研究所 水耕栽培用培養液の殺菌方法及び殺菌装置
CN104270882A (zh) * 2014-09-30 2015-01-07 赵岳虎 常压常温高频水体低温等离子体发生器
US10703653B2 (en) 2016-02-17 2020-07-07 Panasonic Intellectual Property Management Co., Ltd. Liquid treatment device utilizing plasma
JP6653475B2 (ja) * 2016-02-17 2020-02-26 パナソニックIpマネジメント株式会社 液体処理装置
CN105883979B (zh) * 2016-06-03 2018-08-10 成都科衡环保技术有限公司 一种气液混合式低温等离子体发生器及集成装置
CN108117135A (zh) 2016-11-28 2018-06-05 松下知识产权经营株式会社 液体处理装置
US10562797B2 (en) 2017-03-08 2020-02-18 Panasonic Intellectual Property Management Co., Ltd. Liquid treatment apparatus including flow channel, first and second electrodes, insulator surrounding lateral surface of first electrode, gas supply device, and power supply source
US10446375B2 (en) 2017-03-14 2019-10-15 Panasonic Intellectual Property Management Co., Ltd. Liquid processing apparatus including container, first and second electrodes, insulator surrounding at least part of side face of the first electrode, gas supply device, metallic member surrounding part of side face of the first electrode, and power source
SG11201912709VA (en) * 2017-06-22 2020-01-30 Kenneth Bailey The separation of hydrogen and oxygen from non-potable water and the recombining of said hydrogen and oxygen to drive a turbine or piston engine
JP6587159B2 (ja) * 2017-06-26 2019-10-09 パナソニックIpマネジメント株式会社 液体処理装置
JP2019083089A (ja) * 2017-10-27 2019-05-30 三星電子株式会社Samsung Electronics Co.,Ltd. プラズマ発生装置及び当該装置を搭載した家電製品
WO2019083329A2 (en) * 2017-10-27 2019-05-02 Samsung Electronics Co., Ltd. PLASMA GENERATOR AND ELECTRICAL APPLIANCE COMPRISING THE SAME
TWI832881B (zh) * 2018-09-13 2024-02-21 日商松下知識產權經營股份有限公司 洗衣機
CN109600902A (zh) * 2018-12-10 2019-04-09 杨春俊 低温等离子体活化液激发装置及其使用方法
US20220026061A1 (en) * 2020-07-27 2022-01-27 Archer Laboratories, LLC Methods and systems for radiofrequency plasma plume generation
CN113293099B (zh) * 2021-06-01 2023-12-22 中国科学院重庆绿色智能技术研究院 研究微纳米气泡与细胞相互作用的方法
CN113876278B (zh) * 2021-11-12 2025-07-25 珠海格力电器股份有限公司 洗碗机
CN113876275B (zh) * 2021-11-12 2025-04-25 珠海格力电器股份有限公司 洗碗机
CN113925431B (zh) * 2021-11-12 2024-03-12 珠海格力电器股份有限公司 一种消毒水发生装置和洗碗机
CN114098581A (zh) * 2021-11-12 2022-03-01 珠海格力电器股份有限公司 消毒水发生装置及洗碗机
CN113876274A (zh) * 2021-11-12 2022-01-04 珠海格力电器股份有限公司 洗碗机
CN113925424B (zh) * 2021-11-12 2025-09-12 珠海格力电器股份有限公司 洗碗机
CN113925430B (zh) * 2021-11-12 2025-06-27 珠海格力电器股份有限公司 一种洗碗机
DE102022129230A1 (de) * 2022-11-04 2024-05-08 Miele & Cie. Kg Waschautomat und Verfahren zum Betreiben eines Waschautomaten

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN202255488U (zh) * 2011-09-16 2012-05-30 开封威利流量仪表有限公司 电磁流量计用组合电极

Family Cites Families (36)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
SE467742B (sv) 1991-09-06 1992-09-07 Sonerud John Teodor Anordning foer snabbkoppling av ett redskap till en graevmaskin med samtidig anslutning till ett drivsystem
US5464513A (en) * 1994-01-11 1995-11-07 Scientific Utilization, Inc. Method and apparatus for water decontamination using electrical discharge
JP2759169B2 (ja) * 1996-05-09 1998-05-28 渡辺 紀夫 水の電気処理用電極ユニット
IT241781Y1 (it) * 1996-07-18 2001-05-17 Trafimet Spa Torcia per taglio al plasma con accensione senza alta frequenza condispositivi ad aria di raffreddamento dell'elettrodo migliorati.
JP2000005766A (ja) * 1998-06-22 2000-01-11 Masaaki Takarada 物質状態の変化法
JP4041224B2 (ja) 1998-09-25 2008-01-30 正之 佐藤 液体処理方法及び液体処理装置
JP3068363U (ja) * 1999-09-07 2000-05-12 日本イオン株式会社 金属イオン及び塩素による液体の殺菌殺藻装置
JP2003062579A (ja) 2001-08-27 2003-03-04 Kobe Steel Ltd 液体の処理方法及びその装置
AUPS220302A0 (en) * 2002-05-08 2002-06-06 Chang, Chak Man Thomas A plasma formed within bubbles in an aqueous medium and uses therefore
JP4515034B2 (ja) * 2003-02-28 2010-07-28 株式会社半導体エネルギー研究所 半導体装置の作製方法
JP2005021811A (ja) * 2003-07-02 2005-01-27 Hoshizaki Electric Co Ltd 金属イオン含有水生成装置
JP2005058887A (ja) * 2003-08-11 2005-03-10 Mitsubishi Heavy Ind Ltd 高電圧パルスを利用した廃水処理装置
US20050189278A1 (en) 2004-02-03 2005-09-01 Takanori Iijima Apparatus for decomposing organic matter with radical treatment method using electric discharge
JP4322728B2 (ja) * 2004-03-16 2009-09-02 株式会社東芝 水処理システム
JP2006110092A (ja) * 2004-10-14 2006-04-27 Sanyo Electric Co Ltd 洗濯機
DE112005003029B4 (de) * 2004-12-03 2012-10-04 Kabushiki Kaisha Toyota Jidoshokki In-Flüssigkeit-Plasmaelektrode, In-Flüssigkeit-Plasmaerzeugungsvorrichtung, und In-Flüssigkeit-Plasmaerzeugungsverfahren
JP5295485B2 (ja) * 2006-02-01 2013-09-18 株式会社栗田製作所 液中プラズマ型被処理液浄化方法及び液中プラズマ型被処理液浄化装置
JP5067802B2 (ja) * 2006-12-28 2012-11-07 シャープ株式会社 プラズマ発生装置、ラジカル生成方法および洗浄浄化装置
US20100126940A1 (en) 2007-04-10 2010-05-27 Han-Seong Ryu Underwater plasma processing apparatus and system and method for processing ballast water of ship using the same
JP4784624B2 (ja) 2007-12-20 2011-10-05 三菱電機株式会社 殺菌装置とその装置を用いた空調機、手乾燥機及び加湿器
JP5204061B2 (ja) * 2009-09-11 2013-06-05 国立大学法人東京工業大学 気液2相流プラズマ処理装置
JP5870279B2 (ja) 2010-07-21 2016-02-24 パナソニックIpマネジメント株式会社 プラズマ発生装置とラジカル生成方法、それらを用いた洗浄浄化装置および電器機器
JP2012075966A (ja) * 2010-09-30 2012-04-19 Daikin Industries Ltd プール用循環システム
JP2012075981A (ja) * 2010-09-30 2012-04-19 Daikin Industries Ltd 水中放電装置
JP2012164556A (ja) 2011-02-08 2012-08-30 Panasonic Corp プラズマ発生装置、当該プラズマ発生装置を用いた洗浄浄化装置および小型電器機器
JP2012164560A (ja) 2011-02-08 2012-08-30 Panasonic Corp プラズマ発生装置、当該プラズマ発生装置を用いた洗浄浄化装置および小型電器機器
JP2012164557A (ja) 2011-02-08 2012-08-30 Panasonic Corp プラズマ発生装置、当該プラズマ発生装置を用いた洗浄浄化装置および小型電器機器
JP2012164558A (ja) 2011-02-08 2012-08-30 Panasonic Corp プラズマ発生装置、当該プラズマ発生装置を用いた洗浄浄化装置および小型電器機器
JP5793661B2 (ja) 2011-02-08 2015-10-14 パナソニックIpマネジメント株式会社 プラズマ発生装置、当該プラズマ発生装置を用いた洗浄浄化装置および電器機器
JP2012204248A (ja) 2011-03-28 2012-10-22 Panasonic Corp プラズマ発生装置及びこれを用いた洗浄浄化装置
JP2012204249A (ja) 2011-03-28 2012-10-22 Panasonic Corp プラズマ発生装置及びこれを用いた洗浄浄化装置
JP5362934B2 (ja) * 2011-05-17 2013-12-11 パナソニック株式会社 プラズマ発生装置およびプラズマ発生方法
US20140054242A1 (en) 2011-05-17 2014-02-27 Panasonic Corporation Liquid treating apparatus and liquid treating method
JP2013022476A (ja) 2011-07-15 2013-02-04 Panasonic Corp プラズマ発生装置及びこれを用いた洗浄浄化装置
JP2013022475A (ja) 2011-07-15 2013-02-04 Panasonic Corp 洗浄装置
JP2013111312A (ja) 2011-11-30 2013-06-10 Panasonic Corp 洗浄装置

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN202255488U (zh) * 2011-09-16 2012-05-30 开封威利流量仪表有限公司 电磁流量计用组合电极

Also Published As

Publication number Publication date
JP5796174B2 (ja) 2015-10-21
US9688549B2 (en) 2017-06-27
EP2762453B1 (en) 2017-03-01
CN103889903A (zh) 2014-06-25
JP6156801B2 (ja) 2017-07-05
JP2015033694A (ja) 2015-02-19
EP2762453A4 (en) 2014-11-26
EP2762453A1 (en) 2014-08-06
US20140231329A1 (en) 2014-08-21
WO2014017020A1 (ja) 2014-01-30
JPWO2014017020A1 (ja) 2016-07-07
IN2014CN03441A (enExample) 2015-10-09

Similar Documents

Publication Publication Date Title
CN103889903B (zh) 液体处理装置以及液体处理方法
CN104379513B (zh) 液体处理装置
JP2015136644A (ja) 液体処理装置及び液体処理方法、ならびにプラズマ処理液
JP5884074B2 (ja) 液体処理装置及び液体処理方法
WO2012157034A1 (ja) 液体処理装置および液体処理方法
JP6097942B2 (ja) 液体処理装置及び液体処理方法
CN104718163B (zh) 液体处理装置、带清洗或净化功能的系统、液体处理方法
JP6544623B2 (ja) 処理液生成装置および処理液生成方法
JP5899455B2 (ja) 液体処理装置及び液体処理方法
KR20080094895A (ko) 액체가 보다 반응성이 되게 하는 방법 및 장치
JP2015223528A (ja) 液体処理装置および液体処理方法
JP2015080489A (ja) 歯ブラシ装置
Ni et al. Plasma inactivation of Escherichia coli cells by atmospheric pressure air brush-shape plasma
Theepharaksapan et al. Impact of multi-air plasma jets on nitrogen concentration variance in effluent of membrane bioreactor pilot-plant
Matra et al. Decolorization of Methylene Blue in an Ar Non-Thermal Plasma Reactor.
JP2012176347A (ja) 活性種の生成方法及び生成装置
JP2016004637A (ja) プラズマ生成装置
RU2130898C1 (ru) Способ очистки воды
JP2014010931A (ja) プラズマ処理方法及び処理装置
US20180099880A1 (en) Method for removing cyanotoxin from water using a plasma device
Zhan et al. Application of submerged plasma irradiation process for RNO treatment from an aqueous solution
RU2629250C1 (ru) Способ подготовки водно-грязевой смеси для физиотерапии и ионизатор для его осуществления
Nomura et al. 3D Integrated Micro-solution Plasma for The Treatment of Water-Effects of Discharge Gases
Stara et al. Treatment of humic acids solutions by DC diaphragm discharge
JP2015231604A (ja) 水処理装置

Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
C41 Transfer of patent application or patent right or utility model
TA01 Transfer of patent application right

Effective date of registration: 20160119

Address after: Japan Osaka

Applicant after: PANASONIC INTELLECTUAL PROPERTY MANAGEMENT Co.,Ltd.

Address before: Osaka Japan

Applicant before: Matsushita Electric Industrial Co.,Ltd.

GR01 Patent grant
GR01 Patent grant