CN103732573B - 四烷基铵盐溶液的制造方法 - Google Patents

四烷基铵盐溶液的制造方法 Download PDF

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Publication number
CN103732573B
CN103732573B CN201280038087.0A CN201280038087A CN103732573B CN 103732573 B CN103732573 B CN 103732573B CN 201280038087 A CN201280038087 A CN 201280038087A CN 103732573 B CN103732573 B CN 103732573B
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China
Prior art keywords
ion
solution
exchange resin
concentration
metal ion
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CN201280038087.0A
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English (en)
Chinese (zh)
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CN103732573A (zh
Inventor
渡边淳
梅津直幸
山下喜文
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TOKUNOYAMA CO Ltd
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TOKUNOYAMA CO Ltd
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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J39/00—Cation exchange; Use of material as cation exchangers; Treatment of material for improving the cation exchange properties
    • B01J39/04—Processes using organic exchangers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J49/00—Regeneration or reactivation of ion-exchangers; Apparatus therefor
    • B01J49/05—Regeneration or reactivation of ion-exchangers; Apparatus therefor of fixed beds
    • B01J49/06—Regeneration or reactivation of ion-exchangers; Apparatus therefor of fixed beds containing cationic exchangers
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/42—Treatment of water, waste water, or sewage by ion-exchange
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C209/00—Preparation of compounds containing amino groups bound to a carbon skeleton
    • C07C209/82—Purification; Separation; Stabilisation; Use of additives
    • C07C209/84—Purification
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/42—Treatment of water, waste water, or sewage by ion-exchange
    • C02F2001/425—Treatment of water, waste water, or sewage by ion-exchange using cation exchangers
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2101/00—Nature of the contaminant
    • C02F2101/30—Organic compounds
    • C02F2101/38—Organic compounds containing nitrogen
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2103/00—Nature of the water, waste water, sewage or sludge to be treated
    • C02F2103/34—Nature of the water, waste water, sewage or sludge to be treated from industrial activities not provided for in groups C02F2103/12 - C02F2103/32
    • C02F2103/40—Nature of the water, waste water, sewage or sludge to be treated from industrial activities not provided for in groups C02F2103/12 - C02F2103/32 from the manufacture or use of photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers
    • G03F7/322—Aqueous alkaline compositions
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/42—Stripping or agents therefor
    • G03F7/422—Stripping or agents therefor using liquids only
    • G03F7/425—Stripping or agents therefor using liquids only containing mineral alkaline compounds; containing organic basic compounds, e.g. quaternary ammonium compounds; containing heterocyclic basic compounds containing nitrogen

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Hydrology & Water Resources (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Water Supply & Treatment (AREA)
  • Treatment Of Water By Ion Exchange (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
CN201280038087.0A 2011-10-28 2012-10-26 四烷基铵盐溶液的制造方法 Active CN103732573B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2011-237128 2011-10-28
JP2011237128A JP5808221B2 (ja) 2011-10-28 2011-10-28 テトラアルキルアンモニウム塩溶液の製造方法
PCT/JP2012/077779 WO2013062100A1 (ja) 2011-10-28 2012-10-26 テトラアルキルアンモニウム塩溶液の製造方法

Publications (2)

Publication Number Publication Date
CN103732573A CN103732573A (zh) 2014-04-16
CN103732573B true CN103732573B (zh) 2016-05-18

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Family Applications (1)

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CN201280038087.0A Active CN103732573B (zh) 2011-10-28 2012-10-26 四烷基铵盐溶液的制造方法

Country Status (5)

Country Link
JP (1) JP5808221B2 (ja)
KR (1) KR101987409B1 (ja)
CN (1) CN103732573B (ja)
TW (1) TWI549753B (ja)
WO (1) WO2013062100A1 (ja)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN108623052A (zh) * 2017-03-22 2018-10-09 三福化工股份有限公司 显影废液的二次废液中四甲基氢氧化铵的回收方法
US20220033343A1 (en) * 2018-09-28 2022-02-03 Tokuyama Corporation Method for producing organic solvent solution of quaternary ammonium hydroxide
CN112999694A (zh) * 2021-03-24 2021-06-22 沧州信联化工有限公司 一种四甲基氢氧化铵加工用原料精制装置及其使用方法
CN114920658B (zh) * 2022-06-28 2024-05-03 大连理工大学盘锦产业技术研究院 一种离子交换树脂纯化氢氧化胆碱的方法

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003340449A (ja) * 2002-05-27 2003-12-02 Babcock Hitachi Kk テトラアルキルアンモニウムヒドロキシド含有廃水の処理方法
CN1469845A (zh) * 2000-10-20 2004-01-21 ��������ķ������ 从包含鎓化合物的溶液回收鎓氢氧化物的方法
WO2011074495A1 (ja) * 2009-12-15 2011-06-23 株式会社トクヤマ テトラアルキルアンモニウムイオン除去廃液の再利用方法

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3109525B2 (ja) 1990-12-27 2000-11-20 クロリンエンジニアズ株式会社 水酸化テトラアルキルアンモニムの再生方法
JP3110513B2 (ja) 1991-10-16 2000-11-20 クロリンエンジニアズ株式会社 水酸化テトラアルキルアンモニムの再生方法
US5439564A (en) * 1992-11-10 1995-08-08 Tama Chemicals Co. Ltd. Method of processing organic quaternary ammonium hydroxide-containing waste liquid
JP2688009B2 (ja) 1992-11-26 1997-12-08 多摩化学工業株式会社 廃液から水酸化有機第四アンモニウムを回収する方法
JP3216998B2 (ja) 1996-08-12 2001-10-09 昭和電工株式会社 現像廃液からの水酸化テトラアルキルアンモニウムの精製回収方法
US5968338A (en) 1998-01-20 1999-10-19 Sachem, Inc. Process for recovering onium hydroxides from solutions containing onium compounds
JP2004066102A (ja) 2002-08-06 2004-03-04 Babcock Hitachi Kk 廃液処理方法及び装置
JP4385407B2 (ja) 2007-04-05 2009-12-16 オルガノ株式会社 テトラアルキルアンモニウムイオン含有液の処理方法
JP5483958B2 (ja) * 2009-06-03 2014-05-07 株式会社トクヤマ 水酸化テトラアルキルアンモニウムの製造方法
CN103080070B (zh) * 2010-12-28 2015-02-25 德山株式会社 四烷基铵盐的制造方法及以其为原料的氢氧化四烷基铵的制造方法

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1469845A (zh) * 2000-10-20 2004-01-21 ��������ķ������ 从包含鎓化合物的溶液回收鎓氢氧化物的方法
JP2003340449A (ja) * 2002-05-27 2003-12-02 Babcock Hitachi Kk テトラアルキルアンモニウムヒドロキシド含有廃水の処理方法
WO2011074495A1 (ja) * 2009-12-15 2011-06-23 株式会社トクヤマ テトラアルキルアンモニウムイオン除去廃液の再利用方法

Also Published As

Publication number Publication date
KR101987409B1 (ko) 2019-06-10
JP2013095673A (ja) 2013-05-20
JP5808221B2 (ja) 2015-11-10
TW201323089A (zh) 2013-06-16
WO2013062100A1 (ja) 2013-05-02
TWI549753B (zh) 2016-09-21
CN103732573A (zh) 2014-04-16
KR20140079762A (ko) 2014-06-27

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