CN103717788B - 硬质碳层的脱层方法 - Google Patents

硬质碳层的脱层方法 Download PDF

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Publication number
CN103717788B
CN103717788B CN201280038683.9A CN201280038683A CN103717788B CN 103717788 B CN103717788 B CN 103717788B CN 201280038683 A CN201280038683 A CN 201280038683A CN 103717788 B CN103717788 B CN 103717788B
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CN
China
Prior art keywords
delamination
carbon
substrate
base material
coating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
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CN201280038683.9A
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English (en)
Chinese (zh)
Other versions
CN103717788A (zh
Inventor
J.拉姆
B.维德里希
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Oerlikon Surface Solutions AG Pfaeffikon
Original Assignee
Oerlikon Surface Solutions AG Pfaeffikon
Oerlikon Trading AG Truebbach
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Publication of CN103717788A publication Critical patent/CN103717788A/zh
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Publication of CN103717788B publication Critical patent/CN103717788B/zh
Expired - Fee Related legal-status Critical Current
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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23G—CLEANING OR DE-GREASING OF METALLIC MATERIAL BY CHEMICAL METHODS OTHER THAN ELECTROLYSIS
    • C23G5/00—Cleaning or de-greasing metallic material by other methods; Apparatus for cleaning or de-greasing metallic material with organic solvents
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/02—Pretreatment of the material to be coated

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
  • Physical Vapour Deposition (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • ing And Chemical Polishing (AREA)
  • Cutting Tools, Boring Holders, And Turrets (AREA)
  • Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)
  • Analytical Chemistry (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
CN201280038683.9A 2011-06-07 2012-05-31 硬质碳层的脱层方法 Expired - Fee Related CN103717788B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE102011105645A DE102011105645A1 (de) 2011-06-07 2011-06-07 Entschichtungsverfahren für harte Kohlenstoffschichten
DE102011105645.2 2011-06-07
PCT/EP2012/002305 WO2012167886A1 (de) 2011-06-07 2012-05-31 Entschichtungsverfahren für harte kohlenstoffschichten

Publications (2)

Publication Number Publication Date
CN103717788A CN103717788A (zh) 2014-04-09
CN103717788B true CN103717788B (zh) 2016-06-29

Family

ID=47220581

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201280038683.9A Expired - Fee Related CN103717788B (zh) 2011-06-07 2012-05-31 硬质碳层的脱层方法

Country Status (11)

Country Link
EP (1) EP2718481B1 (https=)
JP (1) JP5933701B2 (https=)
KR (2) KR20140019018A (https=)
CN (1) CN103717788B (https=)
BR (1) BR112013031584B1 (https=)
CA (1) CA2846434C (https=)
DE (1) DE102011105645A1 (https=)
PH (1) PH12014500059A1 (https=)
RU (1) RU2606899C2 (https=)
SG (1) SG2014001168A (https=)
WO (1) WO2012167886A1 (https=)

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* Cited by examiner, † Cited by third party
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JP6381984B2 (ja) * 2014-06-13 2018-08-29 学校法人 芝浦工業大学 脱膜方法及び脱膜装置
CN106796863B (zh) * 2015-04-08 2018-08-07 新明和工业株式会社 通过离子照射进行的包覆件的除膜方法及除膜装置
JP2018525528A (ja) * 2015-08-18 2018-09-06 タタ、スティール、ネダーランド、テクノロジー、ベスローテン、フェンノートシャップＴａｔａ Ｓｔｅｅｌ Ｎｅｄｅｒｌａｎｄ Ｔｅｃｈｎｏｌｏｇｙ Ｂｖ 金属ストリップの洗浄及びコーティングのための方法及び装置
RU2632702C1 (ru) * 2016-10-28 2017-10-09 Арчил Важаевич Цискарашвили Антиадгезивное антибактериальное покрытие для ортопедических имплантатов из титана и нержавеющей стали
US10347463B2 (en) * 2016-12-09 2019-07-09 Fei Company Enhanced charged particle beam processes for carbon removal
CN108987255A (zh) * 2018-06-19 2018-12-11 广东先导先进材料股份有限公司 类金刚石膜表面处理工艺
CN108754520A (zh) * 2018-06-29 2018-11-06 四川大学 硬质合金表面涂层去除方法和设备
CN114207178B (zh) * 2019-07-31 2024-06-04 欧瑞康表面处理解决方案股份公司普费菲孔 涂覆于基材上的梯级无氢碳基硬材料层
JP7422540B2 (ja) * 2019-12-26 2024-01-26 東京エレクトロン株式会社 成膜方法および成膜装置
CN111871973A (zh) * 2020-07-30 2020-11-03 成都光明光电股份有限公司 Dlc膜的脱膜方法及脱膜机
CN114645281B (zh) * 2022-04-06 2023-11-24 岭南师范学院 一种褪除金属工件表面碳膜的方法
CN115954269B (zh) * 2022-12-20 2024-08-16 西安理工大学 实现离子轰击和电子轰击辅助转换的氧等离子体刻蚀方法

Citations (3)

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Publication number Priority date Publication date Assignee Title
EP0510340A1 (de) * 1991-04-23 1992-10-28 Balzers Aktiengesellschaft Verfahren zur Abtragung von Material von einer Oberfläche in einer Vakuumkammer
US5993680A (en) * 1996-08-15 1999-11-30 Citizen Watch Co., Ltd. Method of removing hard carbon film formed on inner circumferential surface of guide bush
DE102008053254A1 (de) * 2008-10-25 2010-04-29 Ab Solut Chemie Gmbh Verfahren zum substratschonenden Entfernen von Hartstoffschichten

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JPS63211630A (ja) * 1988-01-29 1988-09-02 Hitachi Ltd プラズマ処理装置
JP3513811B2 (ja) * 1988-08-11 2004-03-31 株式会社半導体エネルギー研究所 炭素または炭素を主成分とする被膜の形成方法
JP2763172B2 (ja) * 1990-03-19 1998-06-11 株式会社神戸製鋼所 ダイヤモンド薄膜のエッチング方法
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US5401543A (en) 1993-11-09 1995-03-28 Minnesota Mining And Manufacturing Company Method for forming macroparticle-free DLC films by cathodic arc discharge
DE4401986A1 (de) 1994-01-25 1995-07-27 Dresden Vakuumtech Gmbh Verfahren zum Betreiben eines Vakuumlichtbogenverdampfers und Stromversorgungseinrichtung dafür
DE19831914A1 (de) 1998-07-16 2000-01-20 Laser & Med Tech Gmbh Verfahren und Vorrichtung zur Säuberung und Entschichtung transparenter Werkstücke
US6605175B1 (en) * 1999-02-19 2003-08-12 Unaxis Balzers Aktiengesellschaft Process for manufacturing component parts, use of same, with air bearing supported workpieces and vacuum processing chamber
CN1138020C (zh) 1999-09-29 2004-02-11 永源科技股份有限公司 阴极电弧蒸镀方式淀积类金刚石碳膜的制备方法
JP3439423B2 (ja) * 2000-04-11 2003-08-25 オーエスジー株式会社 ダイヤモンド被膜除去方法およびダイヤモンド被覆部材の製造方法
JP3997084B2 (ja) 2001-12-27 2007-10-24 株式会社不二越 硬質炭素被覆膜の脱膜方法及び再生方法並びに再生基材
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US7695763B2 (en) * 2004-01-28 2010-04-13 Tokyo Electron Limited Method for cleaning process chamber of substrate processing apparatus, substrate processing apparatus, and method for processing substrate
WO2005073433A1 (de) 2004-01-29 2005-08-11 Unaxis Balzers Ag Entschichtungsverfahren und einkammeranlage zur durchführung des entschichtungsverfahrens
DE112005002085A5 (de) * 2004-09-23 2007-08-16 Cemecon Ag Zerspanungswerkzeug und Verfahren zu seiner Herstellung
JP2007134425A (ja) * 2005-11-09 2007-05-31 Sony Corp 半導体装置および半導体装置の製造方法
DE102006032568A1 (de) * 2006-07-12 2008-01-17 Stein, Ralf Verfahren zur plasmagestützten chemischen Gasphasenabscheidung an der Innenwand eines Hohlkörpers
US7914692B2 (en) * 2006-08-29 2011-03-29 Ngk Insulators, Ltd. Methods of generating plasma, of etching an organic material film, of generating minus ions, of oxidation and nitriding
CN101308764B (zh) 2007-05-15 2011-03-23 中芯国际集成电路制造(上海)有限公司 消除蚀刻工序残留聚合物的方法
WO2008149824A1 (ja) * 2007-06-01 2008-12-11 Onward Ceramic Coating Co., Ltd. Ｄｌｃ被覆工具
ES2764249T3 (es) 2008-05-02 2020-06-02 Oerlikon Surface Solutions Ag Pfaeffikon Procedimiento para decapar piezas de trabajo y solución de decapado

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0510340A1 (de) * 1991-04-23 1992-10-28 Balzers Aktiengesellschaft Verfahren zur Abtragung von Material von einer Oberfläche in einer Vakuumkammer
US5993680A (en) * 1996-08-15 1999-11-30 Citizen Watch Co., Ltd. Method of removing hard carbon film formed on inner circumferential surface of guide bush
DE102008053254A1 (de) * 2008-10-25 2010-04-29 Ab Solut Chemie Gmbh Verfahren zum substratschonenden Entfernen von Hartstoffschichten

Also Published As

Publication number Publication date
KR20160017662A (ko) 2016-02-16
KR20140019018A (ko) 2014-02-13
CA2846434A1 (en) 2013-12-13
SG2014001168A (en) 2014-05-29
BR112013031584B1 (pt) 2020-11-03
WO2012167886A1 (de) 2012-12-13
BR112013031584A8 (pt) 2018-02-06
EP2718481A1 (de) 2014-04-16
EP2718481B1 (de) 2017-04-05
CA2846434C (en) 2019-01-15
RU2606899C2 (ru) 2017-01-10
PH12014500059A1 (en) 2014-03-24
RU2013158315A (ru) 2015-07-20
CN103717788A (zh) 2014-04-09
JP2014525982A (ja) 2014-10-02
WO2012167886A8 (de) 2014-01-23
DE102011105645A1 (de) 2012-12-13
BR112013031584A2 (pt) 2016-12-13
KR101784638B1 (ko) 2017-10-11
JP5933701B2 (ja) 2016-06-15

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SE01 Entry into force of request for substantive examination
C14 Grant of patent or utility model
CB02 Change of applicant information

Address after: Swiss hole

Applicant after: OERLIKON SURFACE SOLUTIONS AG, PFAFFIKON

Address before: Swiss Te Lui Bach

Applicant before: OERLIKON TRADING AG, TRUBBACH

Address after: Swiss Te Lui Bach

Applicant after: OERLIKON TRADING AG, TRuBBACH

Address before: Swiss Te Lui Bach

Applicant before: Oerlikon Trading AG, Trubbach

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CF01 Termination of patent right due to non-payment of annual fee

Granted publication date: 20160629

CF01 Termination of patent right due to non-payment of annual fee