CN103213935B - 二维器件阵列 - Google Patents

二维器件阵列 Download PDF

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Publication number
CN103213935B
CN103213935B CN201310075846.7A CN201310075846A CN103213935B CN 103213935 B CN103213935 B CN 103213935B CN 201310075846 A CN201310075846 A CN 201310075846A CN 103213935 B CN103213935 B CN 103213935B
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Prior art keywords
substrate
stretchable
interconnection
device array
strain
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Chinese (zh)
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CN103213935A (zh
Inventor
J·A·罗杰斯
M·梅尔特
孙玉刚
高興助
A·卡尔森
W·M·崔
M·斯托伊克维奇
H·江
Y·黄
R·G·诺奥
李建宰
姜晟俊
朱正涛
E·梅纳德
安钟贤
H-S·金
姜达荣
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University of Illinois System
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University of Illinois System
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
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    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/48Manufacture or treatment of parts, e.g. containers, prior to assembly of the devices, using processes not provided for in a single one of the groups H01L21/18 - H01L21/326 or H10D48/04 - H10D48/07
    • H01L21/4814Conductive parts
    • H01L21/4846Leads on or in insulating or insulated substrates, e.g. metallisation
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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B81MICROSTRUCTURAL TECHNOLOGY
    • B81BMICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
    • B81B3/00Devices comprising flexible or deformable elements, e.g. comprising elastic tongues or membranes
    • B81B3/0064Constitution or structural means for improving or controlling the physical properties of a device
    • B81B3/0067Mechanical properties
    • B81B3/0078Constitution or structural means for improving mechanical properties not provided for in B81B3/007 - B81B3/0075
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B82NANOTECHNOLOGY
    • B82YSPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
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    • H01L21/18Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
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    • H01L21/768Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics
    • H01L21/76801Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the dielectrics, e.g. smoothing
    • H01L21/76829Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the dielectrics, e.g. smoothing characterised by the formation of thin functional dielectric layers, e.g. dielectric etch-stop, barrier, capping or liner layers
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    • H01L23/538Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames the interconnection structure between a plurality of semiconductor chips being formed on, or in, insulating substrates
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    • H10D30/471High electron mobility transistors [HEMT] or high hole mobility transistors [HHMT]
    • H10D30/472High electron mobility transistors [HEMT] or high hole mobility transistors [HHMT] having lower bandgap active layer formed on top of wider bandgap layer, e.g. inverted HEMT
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    • H10D84/02Manufacture or treatment characterised by using material-based technologies
    • H10D84/03Manufacture or treatment characterised by using material-based technologies using Group IV technology, e.g. silicon technology or silicon-carbide [SiC] technology
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    • H01L2924/13Discrete devices, e.g. 3 terminal devices
    • H01L2924/1304Transistor
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    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
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  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Computer Hardware Design (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Power Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Mechanical Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • Ceramic Engineering (AREA)
  • Theoretical Computer Science (AREA)
  • Mathematical Physics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Led Device Packages (AREA)
  • Thin Film Transistor (AREA)
  • Micromachines (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
  • Optical Integrated Circuits (AREA)
  • Electroluminescent Light Sources (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)
  • Light Receiving Elements (AREA)
  • Junction Field-Effect Transistors (AREA)
  • Pressure Sensors (AREA)
  • Electrodes Of Semiconductors (AREA)
  • Mechanical Light Control Or Optical Switches (AREA)
  • Recrystallisation Techniques (AREA)
  • Structure Of Printed Boards (AREA)
CN201310075846.7A 2006-09-06 2007-09-06 二维器件阵列 Active CN103213935B (zh)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US82468306P 2006-09-06 2006-09-06
US60/824,683 2006-09-06
US94462607P 2007-06-18 2007-06-18
US60/944,626 2007-06-18
CN2007800411276A CN101681695B (zh) 2006-09-06 2007-09-06 在用于可拉伸电子元件的半导体互连和纳米膜中的受控弯曲结构

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
CN2007800411276A Division CN101681695B (zh) 2006-09-06 2007-09-06 在用于可拉伸电子元件的半导体互连和纳米膜中的受控弯曲结构

Publications (2)

Publication Number Publication Date
CN103213935A CN103213935A (zh) 2013-07-24
CN103213935B true CN103213935B (zh) 2017-03-01

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2023187834A1 (en) * 2022-03-30 2023-10-05 Council Of Scientific And Industrial Research Method for fabricating silicon chip carriers using wet bulk micromachining for ir detector applications

Families Citing this family (180)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7557433B2 (en) 2004-10-25 2009-07-07 Mccain Joseph H Microelectronic device with integrated energy source
US7799699B2 (en) 2004-06-04 2010-09-21 The Board Of Trustees Of The University Of Illinois Printable semiconductor structures and related methods of making and assembling
CN102097458B (zh) 2004-06-04 2013-10-30 伊利诺伊大学评议会 用于制造并组装可印刷半导体元件的方法和设备
US7521292B2 (en) 2004-06-04 2009-04-21 The Board Of Trustees Of The University Of Illinois Stretchable form of single crystal silicon for high performance electronics on rubber substrates
US8217381B2 (en) 2004-06-04 2012-07-10 The Board Of Trustees Of The University Of Illinois Controlled buckling structures in semiconductor interconnects and nanomembranes for stretchable electronics
TWI438827B (zh) 2006-09-20 2014-05-21 美國伊利諾大學理事會 用於製造可印刷半導體結構、裝置及裝置元件的脫離對策
KR101610885B1 (ko) 2007-01-17 2016-04-08 더 보오드 오브 트러스티스 오브 더 유니버시티 오브 일리노이즈 프린팅­기반 어셈블리에 의해 제조되는 광학 시스템
EP2963675A1 (en) 2008-03-05 2016-01-06 The Board of Trustees of The University of Illinois Stretchable and foldable electronic devices
US8470701B2 (en) 2008-04-03 2013-06-25 Advanced Diamond Technologies, Inc. Printable, flexible and stretchable diamond for thermal management
US7927976B2 (en) 2008-07-23 2011-04-19 Semprius, Inc. Reinforced composite stamp for dry transfer printing of semiconductor elements
WO2010036807A1 (en) 2008-09-24 2010-04-01 The Board Of Trustees Of The University Of Illinois Arrays of ultrathin silicon solar microcells
US8389862B2 (en) 2008-10-07 2013-03-05 Mc10, Inc. Extremely stretchable electronics
US9545216B2 (en) 2011-08-05 2017-01-17 Mc10, Inc. Catheter balloon methods and apparatus employing sensing elements
WO2010042653A1 (en) 2008-10-07 2010-04-15 Mc10, Inc. Catheter balloon having stretchable integrated circuitry and sensor array
US8886334B2 (en) 2008-10-07 2014-11-11 Mc10, Inc. Systems, methods, and devices using stretchable or flexible electronics for medical applications
US9123614B2 (en) 2008-10-07 2015-09-01 Mc10, Inc. Methods and applications of non-planar imaging arrays
US8372726B2 (en) 2008-10-07 2013-02-12 Mc10, Inc. Methods and applications of non-planar imaging arrays
US9119533B2 (en) 2008-10-07 2015-09-01 Mc10, Inc. Systems, methods, and devices having stretchable integrated circuitry for sensing and delivering therapy
US8097926B2 (en) 2008-10-07 2012-01-17 Mc10, Inc. Systems, methods, and devices having stretchable integrated circuitry for sensing and delivering therapy
KR101041139B1 (ko) * 2008-11-04 2011-06-13 삼성모바일디스플레이주식회사 박막트랜지스터, 그의 제조방법 및 그를 포함하는 유기전계발광표시장치
WO2010056857A2 (en) * 2008-11-12 2010-05-20 Mc10, Inc. Extremely stretchable electronics
WO2010059781A1 (en) 2008-11-19 2010-05-27 Semprius, Inc. Printing semiconductor elements by shear-assisted elastomeric stamp transfer
EP2386117A4 (en) * 2009-01-12 2017-12-27 Mc10, Inc. Methods and applications of non-planar imaging arrays
WO2010086034A1 (en) 2009-01-30 2010-08-05 Interuniversitair Microelektronica Centrum Vzw Stretchable electronic device
US8865489B2 (en) 2009-05-12 2014-10-21 The Board Of Trustees Of The University Of Illinois Printed assemblies of ultrathin, microscale inorganic light emitting diodes for deformable and semitransparent displays
FR2947063B1 (fr) 2009-06-19 2011-07-01 Commissariat Energie Atomique Retroprojecteur
US8261660B2 (en) 2009-07-22 2012-09-11 Semprius, Inc. Vacuum coupled tool apparatus for dry transfer printing semiconductor elements
KR101077789B1 (ko) 2009-08-07 2011-10-28 한국과학기술원 Led 디스플레이 제조 방법 및 이에 의하여 제조된 led 디스플레이
KR101113692B1 (ko) 2009-09-17 2012-02-27 한국과학기술원 태양전지 제조방법 및 이에 의하여 제조된 태양전지
WO2011041727A1 (en) 2009-10-01 2011-04-07 Mc10, Inc. Protective cases with integrated electronics
US10441185B2 (en) 2009-12-16 2019-10-15 The Board Of Trustees Of The University Of Illinois Flexible and stretchable electronic systems for epidermal electronics
JP6046491B2 (ja) 2009-12-16 2016-12-21 ザ ボード オブ トラスティーズ オブ ザ ユニヴァーシティー オブ イリノイ コンフォーマル電子機器を使用した生体内での電気生理学
US9936574B2 (en) 2009-12-16 2018-04-03 The Board Of Trustees Of The University Of Illinois Waterproof stretchable optoelectronics
WO2011087301A2 (ko) 2010-01-15 2011-07-21 성균관대학교산학협력단 기체 및 수분 차단용 그래핀 보호막, 이의 형성 방법 및 그의 용도
US8450779B2 (en) * 2010-03-08 2013-05-28 International Business Machines Corporation Graphene based three-dimensional integrated circuit device
TWI646988B (zh) 2010-03-12 2019-01-11 美國伊利諾大學理事會 生物醫學裝置及其製造方法、流體遞送監視器、監視在管子中流動之流體的方法、近接感測器及感測兩個物件之間的距離的方法
JP5751728B2 (ja) 2010-03-17 2015-07-22 ザ ボード オブ トラスティーズ オブ ザ ユニヴァーシティー オブ イリノイ 生体吸収性基板上の埋め込み型バイオメディカルデバイス
CA2832795C (en) 2010-04-12 2018-01-09 Tufts University Silk electronic components and the method for fabricating the same
US9744563B2 (en) * 2010-09-27 2017-08-29 Techtonic Pty Ltd Undulatory structures
CN102001622B (zh) * 2010-11-08 2013-03-20 中国科学技术大学 空气桥式纳米器件的制备方法
US9442285B2 (en) 2011-01-14 2016-09-13 The Board Of Trustees Of The University Of Illinois Optical component array having adjustable curvature
EP2681538B1 (en) 2011-03-11 2019-03-06 Mc10, Inc. Integrated devices to facilitate quantitative assays and diagnostics
TWI455341B (zh) * 2011-03-21 2014-10-01 Motech Ind Inc Method for manufacturing solar cells
CA2833440A1 (en) * 2011-04-18 2012-10-26 Bennett Fleet (Quebec) Inc. Process and apparatus for continuously encapsulating elongated components and encapsulated elongated components obtained
WO2012158709A1 (en) 2011-05-16 2012-11-22 The Board Of Trustees Of The University Of Illinois Thermally managed led arrays assembled by printing
JP2014523633A (ja) 2011-05-27 2014-09-11 エムシー10 インコーポレイテッド 電子的、光学的、且つ/又は機械的装置及びシステム並びにこれらの装置及びシステムを製造する方法
WO2012167096A2 (en) 2011-06-03 2012-12-06 The Board Of Trustees Of The University Of Illinois Conformable actively multiplexed high-density surface electrode array for brain interfacing
CN102244015B (zh) * 2011-06-17 2012-12-19 华中科技大学 一种在预拉伸的弹性基板上进行柔性电子图案化的方法
US9757050B2 (en) 2011-08-05 2017-09-12 Mc10, Inc. Catheter balloon employing force sensing elements
JP6129838B2 (ja) 2011-09-01 2017-05-17 エムシー10 インコーポレイテッドMc10,Inc. 組織の状態を検出する電子装置
JP6277130B2 (ja) 2011-10-05 2018-02-14 エムシーテン、インコーポレイテッド 医療用の装置およびそれの製造方法
EP2786644B1 (en) 2011-12-01 2019-04-10 The Board of Trustees of the University of Illionis Transient devices designed to undergo programmable transformations
FR2985371A1 (fr) * 2011-12-29 2013-07-05 Commissariat Energie Atomique Procede de fabrication d'une structure multicouche sur un support
US8492208B1 (en) * 2012-01-05 2013-07-23 International Business Machines Corporation Compressive (PFET) and tensile (NFET) channel strain in nanowire FETs fabricated with a replacement gate process
CN102610534A (zh) * 2012-01-13 2012-07-25 华中科技大学 一种可伸缩rfid电子标签及其制造方法
KR102034575B1 (ko) 2012-03-19 2019-10-21 루미리즈 홀딩 비.브이. 인광체의 도포 전 및 후의 발광 장치들에 대한 싱귤레이션
CN102610672A (zh) * 2012-03-23 2012-07-25 合肥工业大学 一种异质结型光电探测器及其制备方法
JP2015521303A (ja) * 2012-03-30 2015-07-27 ザ ボード オブ トラスティーズ オブ ザ ユニヴァーシ 表面への形状適合可能な付属物装着可能電子デバイス
US9247637B2 (en) 2012-06-11 2016-01-26 Mc10, Inc. Strain relief structures for stretchable interconnects
US9226402B2 (en) 2012-06-11 2015-12-29 Mc10, Inc. Strain isolation structures for stretchable electronics
KR20150031324A (ko) 2012-07-05 2015-03-23 엠씨10, 인크 유동 감지를 포함하는 카테터 장치
US9295842B2 (en) 2012-07-05 2016-03-29 Mc10, Inc. Catheter or guidewire device including flow sensing and use thereof
CN102903841B (zh) * 2012-09-18 2015-09-09 中国科学院宁波材料技术与工程研究所 一种温度控制的磁电子器件、其制备方法及应用
US9171794B2 (en) 2012-10-09 2015-10-27 Mc10, Inc. Embedding thin chips in polymer
CN105008949A (zh) 2012-10-09 2015-10-28 Mc10股份有限公司 与服装整合的保形电子装置
CN102983791A (zh) * 2012-10-26 2013-03-20 苏州大学 温差交流发电装置及其发电方法
KR102495290B1 (ko) 2012-12-28 2023-02-06 가부시키가이샤 한도오따이 에네루기 켄큐쇼 반도체 장치
KR102051519B1 (ko) 2013-02-25 2019-12-03 삼성전자주식회사 파이버 상에 형성된 박막 트랜지스터 및 그 제조 방법
EP2984912B1 (en) 2013-04-12 2020-06-24 The Board of Trustees of the University of Illionis Transient electrochemical devices
US9706647B2 (en) 2013-05-14 2017-07-11 Mc10, Inc. Conformal electronics including nested serpentine interconnects
US9372123B2 (en) 2013-08-05 2016-06-21 Mc10, Inc. Flexible temperature sensor including conformable electronics
CN105705093A (zh) 2013-10-07 2016-06-22 Mc10股份有限公司 用于感测和分析的适形传感器系统
CN103560157B (zh) * 2013-11-19 2016-02-24 中国科学院上海微系统与信息技术研究所 应变结构及其制作方法
CN105813545A (zh) 2013-11-22 2016-07-27 Mc10股份有限公司 用于感测和分析心搏的适形传感器系统
WO2015103580A2 (en) 2014-01-06 2015-07-09 Mc10, Inc. Encapsulated conformal electronic systems and devices, and methods of making and using the same
WO2015134588A1 (en) 2014-03-04 2015-09-11 Mc10, Inc. Multi-part flexible encapsulation housing for electronic devices
JP6661242B2 (ja) 2014-03-12 2020-03-11 エムシー10 インコーポレイテッドMc10,Inc. アッセイの変化の定量化のための測定装置および方法
CN103869607A (zh) * 2014-03-18 2014-06-18 无锡中微掩模电子有限公司 二元掩模铬金属膜去除方法
JP6393407B2 (ja) 2014-05-02 2018-09-19 シノプシス, インコーポレイテッドSyn0Psys, Inc. 3次元tcadシミュレーション
WO2015183534A1 (en) 2014-05-28 2015-12-03 3M Innovative Properties Company Mems devices on flexible substrate
EP3172048A4 (en) * 2014-07-11 2018-04-18 Intel Corporation Bendable and stretchable electronic devices and methods
EP3170197B1 (en) * 2014-07-20 2021-09-01 X Display Company Technology Limited Apparatus and methods for micro-transfer printing
KR102161644B1 (ko) 2014-08-20 2020-10-06 삼성디스플레이 주식회사 스트레쳐블 표시 패널 및 이를 포함하는 표시 장치
CN104153128B (zh) * 2014-08-26 2017-03-08 青岛大学 一种基于有序排列扭曲结构柔性可拉伸器件的制备方法
US9899330B2 (en) 2014-10-03 2018-02-20 Mc10, Inc. Flexible electronic circuits with embedded integrated circuit die
US10297572B2 (en) 2014-10-06 2019-05-21 Mc10, Inc. Discrete flexible interconnects for modules of integrated circuits
USD781270S1 (en) 2014-10-15 2017-03-14 Mc10, Inc. Electronic device having antenna
US9398705B2 (en) * 2014-12-02 2016-07-19 Flextronics Ap, Llc. Stretchable printed electronic sheets to electrically connect uneven two dimensional and three dimensional surfaces
US9991326B2 (en) 2015-01-14 2018-06-05 Panasonic Intellectual Property Management Co., Ltd. Light-emitting device comprising flexible substrate and light-emitting element
KR102456698B1 (ko) 2015-01-15 2022-10-19 삼성디스플레이 주식회사 신축성 표시 장치
KR102356697B1 (ko) * 2015-01-15 2022-01-27 삼성디스플레이 주식회사 신축성 표시 장치 및 그의 제조 방법
KR102320382B1 (ko) 2015-01-28 2021-11-02 삼성디스플레이 주식회사 전자 장치
EP3258837A4 (en) 2015-02-20 2018-10-10 Mc10, Inc. Automated detection and configuration of wearable devices based on on-body status, location, and/or orientation
WO2016140961A1 (en) 2015-03-02 2016-09-09 Mc10, Inc. Perspiration sensor
KR102335807B1 (ko) * 2015-03-10 2021-12-08 삼성디스플레이 주식회사 표시 장치
KR102385327B1 (ko) * 2015-04-06 2022-04-12 삼성디스플레이 주식회사 플렉서블 표시 장치 및 이의 제조 방법
JP2018524677A (ja) 2015-06-01 2018-08-30 ザ ボード オブ トラスティーズ オブ ザ ユニヴァーシティー オブ イリノイ 無線電力及び近距離無線通信機能を備えた小型電子システム
WO2016196673A1 (en) 2015-06-01 2016-12-08 The Board Of Trustees Of The University Of Illinois Alternative approach to uv sensing
US9841548B2 (en) 2015-06-30 2017-12-12 Apple Inc. Electronic devices with soft input-output components
US10026721B2 (en) 2015-06-30 2018-07-17 Apple Inc. Electronic devices with soft input-output components
CN105049033B (zh) * 2015-07-01 2017-11-24 东南大学 基于砷化镓基低漏电流双悬臂梁开关的或非门
WO2017015000A1 (en) 2015-07-17 2017-01-26 Mc10, Inc. Conductive stiffener, method of making a conductive stiffener, and conductive adhesive and encapsulation layers
WO2017031129A1 (en) 2015-08-19 2017-02-23 Mc10, Inc. Wearable heat flux devices and methods of use
WO2017059215A1 (en) 2015-10-01 2017-04-06 Mc10, Inc. Method and system for interacting with a virtual environment
WO2017062508A1 (en) 2015-10-05 2017-04-13 Mc10, Inc. Method and System for Neuromodulation and Stimulation
DE102015014256B4 (de) 2015-11-05 2020-06-18 Airbus Defence and Space GmbH Mikroelektronisches Modul zur Reinigung einer Oberfläche, Modularray und Verfahren zur Reinigung einer Oberfläche
US10925543B2 (en) 2015-11-11 2021-02-23 The Board Of Trustees Of The University Of Illinois Bioresorbable silicon electronics for transient implants
WO2017085849A1 (ja) * 2015-11-19 2017-05-26 三井金属鉱業株式会社 誘電体層を有するプリント配線板の製造方法
CN105405983B (zh) * 2015-12-14 2017-05-10 吉林大学 具有周期性规则褶皱结构的可拉伸有机电致发光器件
CN106920800B (zh) * 2015-12-25 2019-07-23 昆山工研院新型平板显示技术中心有限公司 柔性显示器件及其形成方法
US10277386B2 (en) 2016-02-22 2019-04-30 Mc10, Inc. System, devices, and method for on-body data and power transmission
EP3420733A4 (en) 2016-02-22 2019-06-26 Mc10, Inc. SYSTEM, DEVICE AND METHOD FOR ACQUIRING ON THE BODY OF SENSOR AND CONCENTRATOR NODE COUPLED WITH SENSOR INFORMATION
KR102455039B1 (ko) * 2016-03-18 2022-10-17 삼성디스플레이 주식회사 신축성 디스플레이 장치
CN109310340A (zh) 2016-04-19 2019-02-05 Mc10股份有限公司 用于测量汗液的方法和系统
ITUA20162943A1 (it) * 2016-04-27 2017-10-27 Pilegrowth Tech S R L Metodo per la fabbricazione industriale di una struttura a semiconduttore a ridotto incurvamento.
WO2017209869A2 (en) * 2016-05-31 2017-12-07 E Ink Corporation Stretchable electro-optic displays
US10002222B2 (en) * 2016-07-14 2018-06-19 Arm Limited System and method for perforating redundant metal in self-aligned multiple patterning
US10447347B2 (en) 2016-08-12 2019-10-15 Mc10, Inc. Wireless charger and high speed data off-loader
CN106229038B (zh) * 2016-09-07 2017-10-24 东华大学 一种基于多级结构石墨烯的可拉伸透明导电弹性体的制备方法
JP2018060932A (ja) * 2016-10-06 2018-04-12 ローム株式会社 Ledパッケージ
EP3529595B1 (en) 2016-10-20 2023-05-31 Quantum Diamond Technologies Inc. Methods and apparatus for magnetic particle analysis using wide-field diamond magnetic imaging
JP2018078272A (ja) * 2016-10-31 2018-05-17 スリーエム イノベイティブ プロパティズ カンパニー 三次元形状熱伝導性成形体、及びその製造方法
CN106601933B (zh) * 2016-12-12 2018-02-23 吉林大学 一种具有规则褶皱结构的可拉伸电子器件的制备方法
US11513115B2 (en) 2016-12-23 2022-11-29 Quantum Diamond Technologies Inc. Methods and apparatus for magnetic multi-bead assays
DE102017100053A1 (de) 2017-01-03 2018-07-05 Infineon Technologies Ag Rahmenmontage nach Folienexpansion
WO2018153421A2 (en) * 2017-02-24 2018-08-30 Flexucell Aps Light emitting transducer
JP2018179501A (ja) * 2017-04-03 2018-11-15 日本精工株式会社 近接覚センサ
CN110710072B (zh) * 2017-04-12 2022-07-22 感应光子公司 具有结合光束转向的超小型垂直腔表面发射激光发射器的器件
US20180323239A1 (en) * 2017-05-03 2018-11-08 Innolux Corporation Display device
CN107248518B (zh) * 2017-05-26 2020-04-17 京东方科技集团股份有限公司 光电传感器及其制作方法、显示装置
WO2018229609A1 (en) * 2017-06-12 2018-12-20 3M Innovative Properties Company Stretchable conductors
EP3652786B1 (en) 2017-07-14 2022-08-03 King Abdullah University Of Science And Technology Flexible and stretchable imager, method of making a flexible and stretchable imager
ES2932362T3 (es) 2017-07-31 2023-01-18 Quantum Diamond Tech Inc Sistema sensor que comprende un cartucho de muestras que incluye una membrana flexible para soportar una muestra
CN115582155B (zh) * 2017-09-01 2025-08-26 因特格拉生物科学股份公司 数字微流控设备及其使用方法
CN107634054A (zh) * 2017-09-18 2018-01-26 天津大学 柔性衬底上硅纳米膜转数字逻辑反相器及其制作方法
US10205303B1 (en) * 2017-10-18 2019-02-12 Lumentum Operations Llc Vertical-cavity surface-emitting laser thin wafer bowing control
WO2019093069A1 (ja) * 2017-11-07 2019-05-16 大日本印刷株式会社 伸縮性回路基板および物品
CN108009317A (zh) * 2017-11-09 2018-05-08 武汉大学 一种复合材料的热导率研究仿真和建模方法
EP3709943B1 (en) * 2017-11-15 2024-07-24 Smith & Nephew PLC Integrated sensor enabled wound monitoring and/or therapy dressings and systems
CN109859623B (zh) * 2017-11-30 2021-05-18 云谷(固安)科技有限公司 阵列基板及其制备方法及显示屏
KR101974575B1 (ko) * 2017-12-01 2019-05-02 포항공과대학교 산학협력단 싱크로트론 엑스선을 이용한 초소형 다중 경사 구조체 제조 방법
CN108417592A (zh) * 2018-02-12 2018-08-17 中国科学院半导体研究所 红外成像器件及其制备方法、仿生红外球面相机
KR102077306B1 (ko) * 2018-02-14 2020-02-13 광운대학교 산학협력단 실시간 당 모니터링 센서 시스템 및 저온 용액 공정에 기반한 당센서의 제조 방법
CN109346504B (zh) * 2018-09-30 2021-06-29 云谷(固安)科技有限公司 柔性显示面板及显示装置
CN109437091A (zh) * 2018-10-23 2019-03-08 中山大学 一种在弹性衬底上制备微纳结构的方法
CN111148364B (zh) * 2018-11-05 2021-01-26 北京梦之墨科技有限公司 一种柔性可拉伸电路及其制作方法
US12091357B2 (en) 2021-08-05 2024-09-17 Corning Incorporated Dynamically bendable automotive interior display systems
WO2020123367A1 (en) * 2018-12-10 2020-06-18 Corning Incorporated Dynamically bendable automotive interior display systems
CN109671869B (zh) * 2018-12-12 2020-06-16 武汉华星光电半导体显示技术有限公司 复合膜层的制作方法及显示器件
CN109637366B (zh) * 2018-12-28 2020-10-09 厦门天马微电子有限公司 治具和显示模组的弯折方法
CN111724676B (zh) * 2019-03-21 2022-09-02 昆山工研院新型平板显示技术中心有限公司 可拉伸导线及其制作方法和显示装置
DE102019111964A1 (de) * 2019-05-08 2020-11-12 Danfoss Silicon Power Gmbh Halbleitermodul mit einem ersten Substrat, einem zweiten Substrat und einen Abstandhalter, der die Substrate voneinander trennt
CN110393507B (zh) * 2019-08-01 2020-12-25 清华大学 柔性可延展电子器件的结构设计及其制造方法
CN110797148B (zh) * 2019-10-08 2021-07-30 上海交通大学 适用于无绝缘线圈的超导带材、无绝缘线圈及其制备方法
CN110683508B (zh) * 2019-10-18 2023-05-23 北京元芯碳基集成电路研究院 一种碳纳米管平行阵列的制备方法
CN110808295B (zh) * 2019-11-11 2021-04-23 重庆中易智芯科技有限责任公司 一种三维电致伸缩收集电极的半导体探测器及其制备方法
CN110697646A (zh) * 2019-11-22 2020-01-17 上海幂方电子科技有限公司 一种电子皮肤及其制备方法
US11062936B1 (en) 2019-12-19 2021-07-13 X Display Company Technology Limited Transfer stamps with multiple separate pedestals
CN111063658B (zh) * 2019-12-30 2020-09-29 清华大学 柔性可延展的电子器件的制造方法
WO2021159214A1 (en) * 2020-02-12 2021-08-19 Rayleigh Solar Tech Inc. High performance perovskite solar cells, module design, and manufacturing processes therefor
GB2593864B (en) * 2020-02-28 2023-01-04 X Fab France Sas Improved transfer printing for RF applications
CN112967971B (zh) * 2020-05-27 2023-04-18 重庆康佳光电技术研究院有限公司 一种Micro-LED的转移基板及其制备方法
KR102393781B1 (ko) * 2020-07-07 2022-05-04 서울대학교산학협력단 유연 소자
CN112133198B (zh) * 2020-09-29 2022-04-22 厦门天马微电子有限公司 可拉伸显示面板及可拉伸显示装置
CN112606585B (zh) * 2020-12-02 2022-05-31 潍坊歌尔微电子有限公司 器件转印处理方法及微型麦克风防尘装置转印处理方法
KR102591096B1 (ko) * 2020-12-15 2023-10-18 연세대학교 산학협력단 인장 변형을 이용한 광 검출기 제조 방법, 이에 의해 제조되는 광 검출기, 및 그 제조 장치
KR102412729B1 (ko) 2021-01-18 2022-06-23 연세대학교 산학협력단 신축성 디스플레이 장치
KR102553142B1 (ko) * 2021-06-25 2023-07-06 경희대학교 산학협력단 감도 향상 구조를 갖는 전도성 고분자 복합재 기반 압저항 압력센서 및 그 제조방법
KR102582188B1 (ko) * 2021-07-22 2023-09-26 한국과학기술원 레이저 커팅된 플라스틱 기판을 활용한 신축 유기 발광 다이오드 및 그 제작 방법
CN113542755B (zh) * 2021-07-27 2022-06-21 展讯通信(上海)有限公司 二维楔形遮罩的产生方法及系统
CN115915816A (zh) * 2021-08-16 2023-04-04 华为技术有限公司 可拉伸装置及其制作方法
WO2023023976A1 (zh) * 2021-08-25 2023-03-02 京东方科技集团股份有限公司 射频微电子机械开关、射频装置
CN114286513B (zh) * 2021-11-30 2024-02-06 通元科技(惠州)有限公司 一种非对称预应力消除型led背板及其制作方法
CN114355489B (zh) * 2022-01-13 2023-05-16 西华大学 一种基于dmd数字光刻的曲面复眼透镜及其制备方法
KR102711952B1 (ko) 2022-01-20 2024-09-27 국립공주대학교 산학협력단 물결 모양 배선 및 이의 제조방법
WO2023137539A1 (en) * 2022-01-21 2023-07-27 Decorby Raymond Monolithic optical pressure sensors and transducers
KR102749617B1 (ko) * 2022-07-08 2025-01-02 국립공주대학교 산학협력단 물결형 연신 배선 및 그 제조 방법
CN116313797B (zh) * 2023-03-24 2025-08-15 厦门市三安集成电路有限公司 Hemt射频器件的制作方法及hemt射频器件
IT202300009687A1 (it) * 2023-05-15 2024-11-15 Istituto Naz Fisica Nucleare Contenitore per rivelatore di radiazioni e apparato rivelatore
CN119761127B (zh) * 2024-12-20 2025-12-05 湖北江城实验室 半导体结构的设计方法、设计设备及计算机可读存储介质

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1773725A (zh) * 2004-09-16 2006-05-17 St微电子公司 具有可变形的栅极的mos晶体管

Family Cites Families (32)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5763864A (en) * 1980-09-29 1982-04-17 Messerschmitt Boelkow Blohm Solar battery mechanism
US4766670A (en) * 1987-02-02 1988-08-30 International Business Machines Corporation Full panel electronic packaging structure and method of making same
US5086785A (en) * 1989-08-10 1992-02-11 Abrams/Gentille Entertainment Inc. Angular displacement sensors
US5475514A (en) * 1990-12-31 1995-12-12 Kopin Corporation Transferred single crystal arrayed devices including a light shield for projection displays
US5375397B1 (en) * 1993-06-22 1998-11-10 Robert J Ferrand Curve-conforming sensor array pad and method of measuring saddle pressures on a horse
JPH08298334A (ja) * 1995-04-26 1996-11-12 Mitsubishi Electric Corp 太陽電池板
US6784023B2 (en) * 1996-05-20 2004-08-31 Micron Technology, Inc. Method of fabrication of stacked semiconductor devices
DE19637626A1 (de) * 1996-09-16 1998-03-26 Bosch Gmbh Robert Flexible Leiterbahnverbindung
FR2786037B1 (fr) * 1998-11-16 2001-01-26 Alstom Technology Barre de conduction electrique de type blinde pour poste electrique haute tension
US6150602A (en) * 1999-05-25 2000-11-21 Hughes Electronics Corporation Large area solar cell extended life interconnect
DE60043441D1 (de) * 1999-07-21 2010-01-14 E Ink Corp Bevorzugte methode, elektrische leiterbahnen für dellen
JP2001352089A (ja) * 2000-06-08 2001-12-21 Showa Shell Sekiyu Kk 熱膨張歪み防止型太陽電池モジュール
US6743982B2 (en) * 2000-11-29 2004-06-01 Xerox Corporation Stretchable interconnects using stress gradient films
GB0029312D0 (en) * 2000-12-01 2001-01-17 Philips Corp Intellectual Pty Flexible electronic device
KR20020093113A (ko) * 2001-03-06 2002-12-12 코닌클리케 필립스 일렉트로닉스 엔.브이. 디스플레이 디바이스
US7273987B2 (en) * 2002-03-21 2007-09-25 General Electric Company Flexible interconnect structures for electrical devices and light sources incorporating the same
JP3980918B2 (ja) * 2002-03-28 2007-09-26 株式会社東芝 アクティブマトリクス基板及びその製造方法、表示装置
JP2003323741A (ja) 2002-04-30 2003-11-14 National Institute Of Advanced Industrial & Technology 光学的メモリ
US7465678B2 (en) * 2003-03-28 2008-12-16 The Trustees Of Princeton University Deformable organic devices
US7491892B2 (en) * 2003-03-28 2009-02-17 Princeton University Stretchable and elastic interconnects
US20050227389A1 (en) * 2004-04-13 2005-10-13 Rabin Bhattacharya Deformable organic devices
GB0323285D0 (en) * 2003-10-04 2003-11-05 Koninkl Philips Electronics Nv Device and method of making a device having a patterned layer on a flexible substrate
WO2005098969A1 (ja) * 2004-04-08 2005-10-20 Sharp Kabushiki Kaisha 太陽電池及び太陽電池モジュール
CN102097458B (zh) * 2004-06-04 2013-10-30 伊利诺伊大学评议会 用于制造并组装可印刷半导体元件的方法和设备
US7521292B2 (en) * 2004-06-04 2009-04-21 The Board Of Trustees Of The University Of Illinois Stretchable form of single crystal silicon for high performance electronics on rubber substrates
US7629691B2 (en) * 2004-06-16 2009-12-08 Honeywell International Inc. Conductor geometry for electronic circuits fabricated on flexible substrates
US20060132025A1 (en) * 2004-12-22 2006-06-22 Eastman Kodak Company Flexible display designed for minimal mechanical strain
US20060160943A1 (en) * 2005-01-18 2006-07-20 Weir James P Water-based flock adhesives for thermoplastic substrates
CN2779218Y (zh) * 2005-02-01 2006-05-10 广德利德照明有限公司 一种管状led装饰灯的连接导线
TWI533459B (zh) * 2005-06-02 2016-05-11 美國伊利諾大學理事會 可印刷半導體結構及製造和組合之相關方法
JP7099160B2 (ja) 2018-08-10 2022-07-12 住友電気工業株式会社 光ファイバの製造方法
US11394720B2 (en) 2019-12-30 2022-07-19 Itron, Inc. Time synchronization using trust aggregation

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1773725A (zh) * 2004-09-16 2006-05-17 St微电子公司 具有可变形的栅极的mos晶体管

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2023187834A1 (en) * 2022-03-30 2023-10-05 Council Of Scientific And Industrial Research Method for fabricating silicon chip carriers using wet bulk micromachining for ir detector applications

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