CN102821828A - 过滤器保持装置、曝光装置、及元件制造方法 - Google Patents

过滤器保持装置、曝光装置、及元件制造方法 Download PDF

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Publication number
CN102821828A
CN102821828A CN2011800168666A CN201180016866A CN102821828A CN 102821828 A CN102821828 A CN 102821828A CN 2011800168666 A CN2011800168666 A CN 2011800168666A CN 201180016866 A CN201180016866 A CN 201180016866A CN 102821828 A CN102821828 A CN 102821828A
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CN
China
Prior art keywords
aforementioned
framework
change
filter
shape portion
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN2011800168666A
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English (en)
Chinese (zh)
Inventor
桂公一
松浦惠二
堀田佳成
增川孝志
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Nikon Corp
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Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Publication of CN102821828A publication Critical patent/CN102821828A/zh
Pending legal-status Critical Current

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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/02—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by adsorption, e.g. preparative gas chromatography
    • B01D53/04—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by adsorption, e.g. preparative gas chromatography with stationary adsorbents
    • B01D53/0407—Constructional details of adsorbing systems
    • B01D53/0415—Beds in cartridges
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D46/00—Filters or filtering processes specially modified for separating dispersed particles from gases or vapours
    • B01D46/0002—Casings; Housings; Frame constructions
    • B01D46/0005—Mounting of filtering elements within casings, housings or frames
    • B01D46/0008—Two or more filter elements not fluidly connected positioned in the same housing
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D46/00—Filters or filtering processes specially modified for separating dispersed particles from gases or vapours
    • B01D46/42—Auxiliary equipment or operation thereof
    • B01D46/4227—Manipulating filters or filter elements, e.g. handles or extracting tools
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/02—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by adsorption, e.g. preparative gas chromatography
    • B01D53/04—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by adsorption, e.g. preparative gas chromatography with stationary adsorbents
    • B01D53/0407—Constructional details of adsorbing systems
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
    • H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
    • H01L21/0274—Photolithographic processes
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2253/00—Adsorbents used in seperation treatment of gases and vapours
    • B01D2253/10—Inorganic adsorbents
    • B01D2253/102—Carbon
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2253/00—Adsorbents used in seperation treatment of gases and vapours
    • B01D2253/20—Organic adsorbents
    • B01D2253/206—Ion exchange resins
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2257/00—Components to be removed
    • B01D2257/40—Nitrogen compounds
    • B01D2257/406—Ammonia
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2258/00—Sources of waste gases
    • B01D2258/02—Other waste gases
    • B01D2258/0216—Other waste gases from CVD treatment or semi-conductor manufacturing

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Analytical Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Separation Of Gases By Adsorption (AREA)
CN2011800168666A 2010-04-05 2011-04-04 过滤器保持装置、曝光装置、及元件制造方法 Pending CN102821828A (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US32092210P 2010-04-05 2010-04-05
US61/320,922 2010-04-05
PCT/JP2011/058511 WO2011125973A1 (ja) 2010-04-05 2011-04-04 フィルタ保持装置、露光装置、及びデバイス製造方法

Publications (1)

Publication Number Publication Date
CN102821828A true CN102821828A (zh) 2012-12-12

Family

ID=44762908

Family Applications (1)

Application Number Title Priority Date Filing Date
CN2011800168666A Pending CN102821828A (zh) 2010-04-05 2011-04-04 过滤器保持装置、曝光装置、及元件制造方法

Country Status (5)

Country Link
JP (1) JPWO2011125973A1 (ko)
KR (1) KR20130019416A (ko)
CN (1) CN102821828A (ko)
TW (1) TW201231144A (ko)
WO (1) WO2011125973A1 (ko)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102013020653A1 (de) * 2013-12-05 2015-06-11 Rt-Filtertechnik Gmbh Filtervorrichtung, insbesondere in Form einer Luftfiltervorrichtung
JP6511858B2 (ja) * 2015-02-27 2019-05-15 シンフォニアテクノロジー株式会社 搬送室
CN110652804A (zh) * 2019-10-10 2020-01-07 极达鑫环境科技(重庆)有限公司 一种高密闭型高效滤网安装框

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5013971A (ko) * 1973-06-08 1975-02-13
JPH09113028A (ja) * 1995-10-17 1997-05-02 Matsushita Electric Ind Co Ltd 空気清浄フィルタ用収納ケース
JP2002158170A (ja) * 2000-09-08 2002-05-31 Nikon Corp 露光装置及びデバイス製造方法

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6320930U (ko) * 1986-07-23 1988-02-12
JPH09249024A (ja) * 1996-03-14 1997-09-22 Zexel Corp 空調ユニット
JPH1147531A (ja) * 1997-07-31 1999-02-23 Tennex:Kk 室内空気処理用のフィルタ部材
JP2004045573A (ja) * 2002-07-09 2004-02-12 Canon Inc 画像形成装置
JP5104472B2 (ja) * 2008-03-31 2012-12-19 パナソニック株式会社 ファンフィルタユニット

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5013971A (ko) * 1973-06-08 1975-02-13
JPH09113028A (ja) * 1995-10-17 1997-05-02 Matsushita Electric Ind Co Ltd 空気清浄フィルタ用収納ケース
JP2002158170A (ja) * 2000-09-08 2002-05-31 Nikon Corp 露光装置及びデバイス製造方法

Also Published As

Publication number Publication date
WO2011125973A1 (ja) 2011-10-13
TW201231144A (en) 2012-08-01
KR20130019416A (ko) 2013-02-26
JPWO2011125973A1 (ja) 2013-07-11

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Application publication date: 20121212