WO2002053267A1 - Element de filtre de ventilateur, dispositif d'exposition et leur procede de fabrication - Google Patents

Element de filtre de ventilateur, dispositif d'exposition et leur procede de fabrication Download PDF

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Publication number
WO2002053267A1
WO2002053267A1 PCT/JP2001/011479 JP0111479W WO02053267A1 WO 2002053267 A1 WO2002053267 A1 WO 2002053267A1 JP 0111479 W JP0111479 W JP 0111479W WO 02053267 A1 WO02053267 A1 WO 02053267A1
Authority
WO
WIPO (PCT)
Prior art keywords
exposure apparatus
filter unit
gas
chamber
chemical
Prior art date
Application number
PCT/JP2001/011479
Other languages
English (en)
Japanese (ja)
Inventor
Satoru Oshikawa
Masayuki Murayama
Takaaki Kimura
Original Assignee
Nikon Corporation
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corporation filed Critical Nikon Corporation
Priority to JP2002554212A priority Critical patent/JPWO2002053267A1/ja
Publication of WO2002053267A1 publication Critical patent/WO2002053267A1/fr

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Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/02—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by adsorption, e.g. preparative gas chromatography
    • B01D53/04—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by adsorption, e.g. preparative gas chromatography with stationary adsorbents
    • B01D53/0407—Constructional details of adsorbing systems
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2257/00—Components to be removed
    • B01D2257/30—Sulfur compounds
    • B01D2257/302—Sulfur oxides
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2257/00—Components to be removed
    • B01D2257/40—Nitrogen compounds
    • B01D2257/404—Nitrogen oxides other than dinitrogen oxide
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2257/00—Components to be removed
    • B01D2257/40—Nitrogen compounds
    • B01D2257/406—Ammonia
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/02—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by adsorption, e.g. preparative gas chromatography
    • B01D53/04—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by adsorption, e.g. preparative gas chromatography with stationary adsorbents
    • B01D53/0407—Constructional details of adsorbing systems
    • B01D53/0446—Means for feeding or distributing gases

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Analytical Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

L'invention concerne un élément de filtre de ventilateur (100) comprenant un corps (180) et une partie filtrante (140) permettant d'éliminer sélectivement l'ammoniac, les oxydes de soufre, les oxydes d'azote et les substances chimiques sous forme de substances organiques contenues dans le gaz passant par un circuit d'écoulement (130) formé dans le corps (180). Cet élément permet d'obtenir un gaz d'alimentation chimiquement propre selon une technique consistant à éliminer sélectivement, dans une installation, les substances contaminées par des agents chimiques contenues dans les gaz, un espace situé dans une chambre peut être maintenu dans un état chimiquement propre, par exemple, puis à connecter l'élément de filtre de ventilateur (100) à la chambre d'un dispositif d'exposition.
PCT/JP2001/011479 2000-12-27 2001-12-26 Element de filtre de ventilateur, dispositif d'exposition et leur procede de fabrication WO2002053267A1 (fr)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2002554212A JPWO2002053267A1 (ja) 2000-12-27 2001-12-26 ファンフィルタユニット及びその製造方法、露光装置、並びにデバイス製造方法

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2000396648 2000-12-27
JP2000-396648 2000-12-27

Publications (1)

Publication Number Publication Date
WO2002053267A1 true WO2002053267A1 (fr) 2002-07-11

Family

ID=18861905

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2001/011479 WO2002053267A1 (fr) 2000-12-27 2001-12-26 Element de filtre de ventilateur, dispositif d'exposition et leur procede de fabrication

Country Status (2)

Country Link
JP (1) JPWO2002053267A1 (fr)
WO (1) WO2002053267A1 (fr)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004239690A (ja) * 2003-02-04 2004-08-26 Takenaka Komuten Co Ltd 化学物質放散量測定用の実験装置
WO2004108252A1 (fr) * 2003-06-03 2004-12-16 Nikon Corporation Appareil de filtration, appareil d'exposition, et procede de production de dispositif
WO2005031822A1 (fr) * 2003-09-29 2005-04-07 Nikon Corporation Chambre de service, procede d'entretien, dispositif d'insolation et salle a environnement controle
JP2005161214A (ja) * 2003-12-03 2005-06-23 Taikisha Ltd 電子製品製造設備
JPWO2005038887A1 (ja) * 2003-10-21 2007-02-01 株式会社ニコン 環境制御装置、デバイス製造装置、デバイス製造方法、露光装置
WO2019082450A1 (fr) * 2017-10-27 2019-05-02 信越半導体株式会社 Procédé de fabrication de plaquette épitaxique

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08193736A (ja) * 1995-01-13 1996-07-30 Nippon Steel Corp フィルターユニット
JPH11111593A (ja) * 1997-10-01 1999-04-23 Canon Inc 環境制御装置
JPH11128643A (ja) * 1997-10-30 1999-05-18 Toshiba Eng & Constr Co Ltd フィルタユニット
JPH11188329A (ja) * 1997-12-26 1999-07-13 Ums:Kk 処理装置
JP2000164507A (ja) * 1998-11-27 2000-06-16 Canon Inc デバイス製造システム

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08193736A (ja) * 1995-01-13 1996-07-30 Nippon Steel Corp フィルターユニット
JPH11111593A (ja) * 1997-10-01 1999-04-23 Canon Inc 環境制御装置
JPH11128643A (ja) * 1997-10-30 1999-05-18 Toshiba Eng & Constr Co Ltd フィルタユニット
JPH11188329A (ja) * 1997-12-26 1999-07-13 Ums:Kk 処理装置
JP2000164507A (ja) * 1998-11-27 2000-06-16 Canon Inc デバイス製造システム

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004239690A (ja) * 2003-02-04 2004-08-26 Takenaka Komuten Co Ltd 化学物質放散量測定用の実験装置
WO2004108252A1 (fr) * 2003-06-03 2004-12-16 Nikon Corporation Appareil de filtration, appareil d'exposition, et procede de production de dispositif
US7416574B2 (en) 2003-06-03 2008-08-26 Nikon Corporation Filter apparatus, exposure apparatus, and device-producing method
WO2005031822A1 (fr) * 2003-09-29 2005-04-07 Nikon Corporation Chambre de service, procede d'entretien, dispositif d'insolation et salle a environnement controle
JPWO2005038887A1 (ja) * 2003-10-21 2007-02-01 株式会社ニコン 環境制御装置、デバイス製造装置、デバイス製造方法、露光装置
JP2005161214A (ja) * 2003-12-03 2005-06-23 Taikisha Ltd 電子製品製造設備
JP4557533B2 (ja) * 2003-12-03 2010-10-06 株式会社大気社 電子製品製造設備
WO2019082450A1 (fr) * 2017-10-27 2019-05-02 信越半導体株式会社 Procédé de fabrication de plaquette épitaxique

Also Published As

Publication number Publication date
JPWO2002053267A1 (ja) 2004-04-30

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